JPS637365A - External part for ornamentation and production thereof - Google Patents
External part for ornamentation and production thereofInfo
- Publication number
- JPS637365A JPS637365A JP15209586A JP15209586A JPS637365A JP S637365 A JPS637365 A JP S637365A JP 15209586 A JP15209586 A JP 15209586A JP 15209586 A JP15209586 A JP 15209586A JP S637365 A JPS637365 A JP S637365A
- Authority
- JP
- Japan
- Prior art keywords
- film
- base material
- plating film
- ornamentation
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 238000007747 plating Methods 0.000 claims abstract description 23
- 239000000463 material Substances 0.000 claims abstract description 18
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 12
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 10
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 8
- 238000004544 sputter deposition Methods 0.000 claims abstract description 8
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 18
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 14
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 9
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 7
- 239000011651 chromium Substances 0.000 claims description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 abstract description 4
- 239000002184 metal Substances 0.000 abstract description 4
- 229910000838 Al alloy Inorganic materials 0.000 abstract description 2
- 229930182556 Polyacetal Natural products 0.000 abstract description 2
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 abstract description 2
- 229910052782 aluminium Inorganic materials 0.000 abstract description 2
- 229910052802 copper Inorganic materials 0.000 abstract description 2
- 229910052742 iron Inorganic materials 0.000 abstract description 2
- 239000010956 nickel silver Substances 0.000 abstract description 2
- 229920000515 polycarbonate Polymers 0.000 abstract description 2
- 239000004417 polycarbonate Substances 0.000 abstract description 2
- 229920006324 polyoxymethylene Polymers 0.000 abstract description 2
- 229920005989 resin Polymers 0.000 abstract description 2
- 239000011347 resin Substances 0.000 abstract description 2
- 238000009713 electroplating Methods 0.000 abstract 1
- 229920000728 polyester Polymers 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 4
- 229910001873 dinitrogen Inorganic materials 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000011282 treatment Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 238000005422 blasting Methods 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000010849 ion bombardment Methods 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 150000003609 titanium compounds Chemical class 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- MOFOBJHOKRNACT-UHFFFAOYSA-N nickel silver Chemical compound [Ni].[Ag] MOFOBJHOKRNACT-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920006149 polyester-amide block copolymer Polymers 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は装飾用外装部品及びその製造方法の改良に係る
ものである。DETAILED DESCRIPTION OF THE INVENTION (Industrial Field of Application) The present invention relates to improvements in decorative exterior parts and manufacturing methods thereof.
１（従来の技術とその問題点）
従来、追記具９時計、メガネ、ライター、カメラ等とい
ったものは、その外観に於ける装飾的要素によって部品
としての価値が大きく左右１さｎ、またこれによって消
費者の購買意欲も多大な影響を受けるため各種の表面処
理が施されている。1 (Prior art and its problems) Traditionally, items such as clocks, glasses, lighters, cameras, etc. have had a large value as parts due to the decorative elements in their appearance, and their value has been greatly increased by this. Various surface treatments are applied to the product because it has a great influence on consumers' purchasing intentions.
一般には、ニッケル及び金、ロジウム、銀等の貴金属の
皮膜を湿式めっき法によって基材上に形成し、その装飾
的効果を高めて来たものであるが、これらのものは皮膜
硬度が不十分となり、またコスト高になるといったこと
から、近年ではこれらを解消し得るものとしてイオンブ
レーティング処理を利用した表面処理方法が提案されて
いる。Generally, coatings of precious metals such as nickel, gold, rhodium, and silver are formed on substrates by wet plating to enhance the decorative effect, but these coatings have insufficient hardness. In recent years, a surface treatment method using ion blating treatment has been proposed as a solution to these problems.
即ち、その−例としてイオンブレーティングによって基
材上に金属チタン層、金属チタンと窒化チタンとの混在
層、窒化チタン層の三層を順次形成してなるものがある
が、このものは。That is, as an example of this, there is a method in which three layers, a metal titanium layer, a mixed layer of metal titanium and titanium nitride, and a titanium nitride layer are sequentially formed on a base material by ion blasting.
基材上にその光沢を表出すべくニッケルやクロムのめっ
き皮膜が形成しであると、その皮膜表面の自然酸化層に
よって以後の膜形成に支障を来たす、換言すれば基材に
対する膜の密着性が悪化し、またチタン自体の硬度が低
い事より膜厚を厚くするとクラ、りの原因にもなりかね
ないといった不都合を有して七りその後の改良が望まれ
ていた。If a nickel or chromium plating film is formed on the base material in order to express its luster, the natural oxidation layer on the surface of the film will hinder subsequent film formation.In other words, the adhesion of the film to the base material will be impaired. Further, due to the low hardness of titanium itself, increasing the thickness of the film may cause cracking and cracking.Therefore, improvements have been desired.
（間゛照点を解決するための手段）
本発明はこの様な従来の諸々の不都合を解消すべくなさ
れたもので、装飾用外装部品に於ける新規な皮膜構造と
バイアススパッタリングを利用したその為の新規な製造
方法を提供するものである。(Means for solving the problem of blind spots) The present invention was made in order to solve the various disadvantages of the conventional art, and it is a method for solving the problem of blind spots by utilizing a novel film structure and bias sputtering in decorative exterior parts. The objective is to provide a new manufacturing method for this purpose.
即ち本発明の要旨とするところは、基材上にニッケル及
び／又はクロムのめっき皮膜を形成し、該めっき皮膜上
に窒素及び／又は炭素を含有し、外方に向って次第にそ
の含有量を増加せしめたチタンの窒化物、炭化物または
炭窒化物の皮膜を形成してなる装飾用外装部品、並びに
基材上にニッケル及び／又はクロムのめっき皮膜を形成
する工程と、該めっき皮膜表面をイオンボンバードする
工程と、該工程の後めっき皮膜上に窒素及び／又は炭素
を含有し、外方に向って次第にその含有量を増加せしめ
る様バイアススパッタリングによってチタンの窒化物、
炭償ヒ物または炭窒化物の皮膜を形成する工程とからな
る装飾用外装部品の製造方法にある。That is, the gist of the present invention is to form a nickel and/or chromium plating film on a base material, to contain nitrogen and/or carbon on the plating film, and to gradually increase the content outward. Decorative exterior parts formed by forming a film of increased titanium nitride, carbide, or carbonitride, and a step of forming a nickel and/or chromium plating film on the base material, and ionizing the surface of the plating film. After the bombardment process, titanium nitride is formed by bias sputtering so that nitrogen and/or carbon is contained on the plating film and the content gradually increases outward.
The present invention provides a method for manufacturing decorative exterior parts, comprising the step of forming a film of carbon atomizer or carbonitride.
以下２本発明を詳述する。Two aspects of the present invention will be described in detail below.
本発明における装飾用外装部品の基材としては、銅、銅
合金、鉄、鉄合金、アルミニウム。The base materials for the decorative exterior parts in the present invention include copper, copper alloys, iron, iron alloys, and aluminum.
アルミニウム合金、洋白等の金属や、ポリアセタール、
ＡＢＳ、 ポリカーボネート、ボリアリレート、ポリエ
ステル、ポリアミド等の樹脂が使用され、これら基材上
には湿式めっき法等によりニッケル及び／又はクロムの
めっき皮膜が形成されているものである。即ち、このめ
っき皮膜ｆｄ 、先の基材自体のみの光沢度では不完全
であり、これによって以後の皮膜の見映えが著しく劣る
という理由から形成されているもので。Metals such as aluminum alloys and nickel silver, polyacetal,
Resins such as ABS, polycarbonate, polyarylate, polyester, and polyamide are used, and nickel and/or chromium plating films are formed on these substrates by wet plating or the like. That is, this plating film fd is formed because the gloss of the base material itself is incomplete, and the appearance of the subsequent film is therefore significantly inferior.
装飾用外装部品としての外観意匠上の効果に大きく寄与
するものである。It greatly contributes to the appearance design effect as a decorative exterior part.
而してこのめっき皮膜上には、窒素及び／又は炭素を微
量含有し、外方、つまり最表面に向って次第にその含有
量（！Ｉ度）を増加せしめ。This plating film contains a small amount of nitrogen and/or carbon, and its content (!I degrees) gradually increases outward, that is, toward the outermost surface.
最終的に所定の含有量（濃度）を有するチタンの窒化物
、炭化物または炭窒化物の皮膜が形成されている。従っ
てこれにより本発明では、見映えの良い、しかも耐摩耗
性に優れた装飾用外装部品として最適な皮膜が提供でき
るものである。Finally, a film of titanium nitride, carbide, or carbonitride having a predetermined content (concentration) is formed. Therefore, the present invention can provide a film that is suitable for use as a decorative exterior component that has good appearance and excellent wear resistance.
次に２本発明による皮膜の製造方法について述べる。Next, two methods of manufacturing a film according to the present invention will be described.
基本的には物理蒸着法の中でもバイアススパッタリング
法が採用されるもので、これは、被蒸着物にバイアスを
かけて電位（負）を与え。Bias sputtering is basically used among physical vapor deposition methods, and in this method a bias is applied to the object to be deposited to give it a potential (negative).
これによって蒸着エネルギーを高め、もって密着性良好
な皮膜を形成し得るものであるが、バイアスによって蒸
着エネルギーが高められる分だけ基材の高温化による劣
化が避けられるという利点も有している。This increases the deposition energy, thereby forming a film with good adhesion, but it also has the advantage that deterioration of the substrate due to high temperature can be avoided to the extent that the deposition energy is increased by the bias.
尚、基材におけるめっき皮膜上にバイアススパッタリン
グによってチタンの化合物の皮膜を形成するに当たって
は、めっき皮膜表面に存在する酸化層を確実に除去する
ためｆｃ、イオンボンバード処理することが必らず必要
となる。In addition, when forming a titanium compound film on the plating film on the base material by bias sputtering, it is absolutely necessary to perform fc and ion bombardment treatment to ensure the removal of the oxide layer existing on the surface of the plating film. Become.
（実施例） 以下、これを実施例に基き更に詳細に説明する。(Example) This will be explained in more detail below based on examples.
実施例に
ニッケルめっき皮膜を厚さ １０μｍ有する真鍮基材を
アルゴンガスによってイオンボンバード処理し１次いで
公知のバイアススパッタリング装置を用いてこれに窒化
チタンの皮膜を厚さ６μｍ形成した。その際の条件とし
ては、アルゴンガス圧カフＸ１０ Ｔｏｒｒ、基材加
熱温度室温程度、放電電力５００Ｖｘ １．４Ａ、バイ
アス電圧−７５Ｖに設定しそして窒素ガス圧力をＩ Ｘ
１０−’Ｔ ｏｒｒ〜３ｘ１０ Ｔｏｒｒと次第に
増加せしめた。In the example, a brass base material having a nickel plating film of 10 μm in thickness was ion bombarded with argon gas, and then a titanium nitride film of 6 μm in thickness was formed thereon using a known bias sputtering device. The conditions at that time were: argon gas pressure cuff X10 Torr, base material heating temperature around room temperature, discharge power 500V x 1.4A, bias voltage set to -75V, and nitrogen gas pressure set at IX
It was gradually increased from 10-' Torr to 3x10 Torr.
実施例２
実施例１で用いた基材のニッケルめっき皮膜上て更にク
ロムめっき皮膜を０，５μｍ形成し、他は全て実施例１
と同様になして厚さ６μｍの窒化チタンの皮膜を形成し
た。Example 2 A chromium plating film of 0.5 μm was further formed on the nickel plating film of the base material used in Example 1, and everything else was the same as in Example 1.
A titanium nitride film having a thickness of 6 μm was formed in the same manner as above.
比較例１
実施例１で用いた基材上にイオンブレーティングによっ
て窒化チタンの皮膜を厚さ６μｍ形成した。その際の条
件としては、アルゴンガスを２Ｘ１０− Ｔｏｒｒ導入
し、イオン化電圧＋３０Ｖ〜＋ ６０ Ｖ、基材に一４
００Ｖ 〜−１２００Ｖの電圧を印加後、窒素ガスを徐
々に導入しながら蒸発源からチタンを蒸発させ、窒素ガ
ス圧力を６ｘ１０−’Ｔｏｒｒに維持して２０分間反応
性イオンブレーティングを行なうというものである。Comparative Example 1 A titanium nitride film with a thickness of 6 μm was formed on the base material used in Example 1 by ion blasting. The conditions at that time were to introduce argon gas at 2X10-Torr, apply an ionization voltage of +30V to +60V, and apply a voltage of 14V to the base material.
After applying a voltage of 00V to -1200V, titanium was evaporated from the evaporation source while gradually introducing nitrogen gas, and reactive ion blating was performed for 20 minutes while maintaining the nitrogen gas pressure at 6 x 10-'Torr. be.
比較例２
実施例１においてイオンボンバード処理を行なわなかっ
た以外は、全て実施例１と同様になしたものを比較例２
とした。Comparative Example 2 Comparative Example 2 was prepared in the same manner as in Example 1 except that the ion bombardment treatment was not performed in Example 1.
And so.
比較例３
実施例１において窒素ガス圧力を変化せしめる事なく、
これを３ｘｌＯＴｏｒｒと一定に維持して行なった以外
は全て実施例１と同様になしたものを比較例３とした。Comparative Example 3 Without changing the nitrogen gas pressure in Example 1,
Comparative Example 3 was prepared in the same manner as in Example 1 except that this was carried out at a constant value of 3xlOTorr.
（効果）
以上実施例１，２及び比較例１〜３で得られた各皮膜に
ついてその密着性試験を行なった。(Effects) Adhesion tests were conducted on each of the films obtained in Examples 1 and 2 and Comparative Examples 1 to 3 above.
結果は下表のとおりである。The results are shown in the table below.
※密着性試験・・・・・・・・折り曲げ試験による皮膜
剥離発生の目視による観察。*Adhesion test: Visual observation of film peeling during bending test.
この様に本発明の装飾用外装部品は、その皮膜がチタン
化合物ゆえの高硬度を有し優れた耐摩耗性を具備するこ
とは勿論、皮膜にクラック等が発生し難く、基材に対す
る密着性も著しく良好となるもので、もって外観上１機
能上従来にない優れた装飾用外装部品が提供できるもの
である。As described above, the decorative exterior parts of the present invention have high hardness due to the titanium compound, and have excellent abrasion resistance, as well as being resistant to cracks, etc., and having good adhesion to the base material. As a result, it is possible to provide decorative exterior parts that are superior in appearance and function to those previously unparalleled.
Claims (2)
を形成し、該めっき皮膜上に窒素及び／又は炭素を含有
し、外方に向って次第にその含有量を増加せしめたチタ
ンの窒化物、炭化物または炭窒化物の皮膜を形成してな
る装飾用外装部品。(1) Titanium nitride in which a nickel and/or chromium plating film is formed on a base material, nitrogen and/or carbon is contained on the plating film, and the content gradually increases outward. , decorative exterior parts formed by forming a film of carbide or carbonitride.
を形成する工程と、該めっき皮膜表面をイオンボンバー
ドする工程と、該工程の後めっき皮膜上に窒素及び／又
は炭素を含有し、外方に向って次第にその含有量を増加
せしめる様バイアススパッタリングによってチタンの窒
化物、炭化物または炭窒化物の皮膜を形成する工程とか
らなる装飾用外装部品の製造方法。(2) A step of forming a nickel and/or chromium plating film on the base material, a step of ion bombarding the surface of the plating film, and a step of containing nitrogen and/or carbon on the plating film after the step, A method for manufacturing decorative exterior parts, comprising the step of forming a film of titanium nitride, carbide, or carbonitride by bias sputtering so as to gradually increase the content toward the surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15209586A JPS637365A (en) | 1986-06-28 | 1986-06-28 | External part for ornamentation and production thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15209586A JPS637365A (en) | 1986-06-28 | 1986-06-28 | External part for ornamentation and production thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS637365A true JPS637365A (en) | 1988-01-13 |
Family
ID=15532937
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15209586A Pending JPS637365A (en) | 1986-06-28 | 1986-06-28 | External part for ornamentation and production thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS637365A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06192853A (en) * | 1991-08-01 | 1994-07-12 | Kagawa Pref Gov | Method for hardening surface constituted of film formed by electroplating method and film formed by physical vapor growth method |
| JPH07118877A (en) * | 1994-02-04 | 1995-05-09 | Silver Roi:Kk | Sintered cemented carbide coating member |
| EP1116801A1 (en) * | 2000-01-13 | 2001-07-18 | Hauzer Techno Coating Europe Bv | Method of applying a coating by physical vapour deposition |
| EP1742103A1 (en) * | 2005-07-08 | 2007-01-10 | Samsung Electronics Co., Ltd. | Front frame of an image photographing apparatus and a method of manufacturing the same |
| CN102534526A (en) * | 2010-12-27 | 2012-07-04 | 鸿富锦精密工业（深圳）有限公司 | Coating piece and preparation method thereof |
| CN102560394A (en) * | 2010-12-27 | 2012-07-11 | 鸿富锦精密工业（深圳）有限公司 | Coated part and manufacturing method thereof |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5319325A (en) * | 1976-08-09 | 1978-02-22 | Shigeji Sugaya | Structural tough gypsum board reinforced with canvas laths etc |
| JPS55100974A (en) * | 1979-01-23 | 1980-08-01 | Citizen Watch Co Ltd | Parts for formation of film |
| JPS57140875A (en) * | 1981-02-25 | 1982-08-31 | Toppan Printing Co Ltd | Continuous sputtering method |
| JPS58181863A (en) * | 1982-04-14 | 1983-10-24 | Sumitomo Electric Ind Ltd | Surface treatment method |
| JPS60128262A (en) * | 1983-12-15 | 1985-07-09 | Toshiba Corp | Manufacture of composite substrate having high heat conductivity |
| JPS60141869A (en) * | 1983-12-29 | 1985-07-26 | Nissin Electric Co Ltd | Method and device for forming film |
-
1986
- 1986-06-28 JP JP15209586A patent/JPS637365A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5319325A (en) * | 1976-08-09 | 1978-02-22 | Shigeji Sugaya | Structural tough gypsum board reinforced with canvas laths etc |
| JPS55100974A (en) * | 1979-01-23 | 1980-08-01 | Citizen Watch Co Ltd | Parts for formation of film |
| JPS57140875A (en) * | 1981-02-25 | 1982-08-31 | Toppan Printing Co Ltd | Continuous sputtering method |
| JPS58181863A (en) * | 1982-04-14 | 1983-10-24 | Sumitomo Electric Ind Ltd | Surface treatment method |
| JPS60128262A (en) * | 1983-12-15 | 1985-07-09 | Toshiba Corp | Manufacture of composite substrate having high heat conductivity |
| JPS60141869A (en) * | 1983-12-29 | 1985-07-26 | Nissin Electric Co Ltd | Method and device for forming film |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06192853A (en) * | 1991-08-01 | 1994-07-12 | Kagawa Pref Gov | Method for hardening surface constituted of film formed by electroplating method and film formed by physical vapor growth method |
| JPH07118877A (en) * | 1994-02-04 | 1995-05-09 | Silver Roi:Kk | Sintered cemented carbide coating member |
| EP1116801A1 (en) * | 2000-01-13 | 2001-07-18 | Hauzer Techno Coating Europe Bv | Method of applying a coating by physical vapour deposition |
| US6503373B2 (en) | 2000-01-13 | 2003-01-07 | Ingersoll-Rand Company | Method of applying a coating by physical vapor deposition |
| EP1742103A1 (en) * | 2005-07-08 | 2007-01-10 | Samsung Electronics Co., Ltd. | Front frame of an image photographing apparatus and a method of manufacturing the same |
| CN102534526A (en) * | 2010-12-27 | 2012-07-04 | 鸿富锦精密工业（深圳）有限公司 | Coating piece and preparation method thereof |
| CN102560394A (en) * | 2010-12-27 | 2012-07-11 | 鸿富锦精密工业（深圳）有限公司 | Coated part and manufacturing method thereof |
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