JPS55100974A - Parts for formation of film - Google Patents

Parts for formation of film

Info

Publication number
JPS55100974A
JPS55100974A JP676479A JP676479A JPS55100974A JP S55100974 A JPS55100974 A JP S55100974A JP 676479 A JP676479 A JP 676479A JP 676479 A JP676479 A JP 676479A JP S55100974 A JPS55100974 A JP S55100974A
Authority
JP
Japan
Prior art keywords
base material
film
surface area
formation
ion implantation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP676479A
Other languages
Japanese (ja)
Inventor
Kyoyu Sasanuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Citizen Watch Co Ltd
Original Assignee
Citizen Watch Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Citizen Watch Co Ltd filed Critical Citizen Watch Co Ltd
Priority to JP676479A priority Critical patent/JPS55100974A/en
Publication of JPS55100974A publication Critical patent/JPS55100974A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/027—Graded interfaces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/48—Ion implantation

Abstract

PURPOSE:To permit the formation of a compound film on the surface of base material by treating the surface area to be formed so as to obtain a film on a base material for time piece parts so as to obtain a characteristic property similar to the film. CONSTITUTION:Oxygen ion, etc., is struck into the base material 10 for time piece case, etc., by using an ion implantation device, etc., and the base material is heat- treated to diffuse the oxygen element from the surface of the base material 10 to a fixed depth at a concentration gradient in order to form the surface area 11. Then, the transparent hard film 12 composed primarily of Al2O3, etc., is formed on the surface area 11 under a fixed condition by using an ion implantation device, etc. Thus, a film of oxide, carbide, boride, etc., which is excellent in corrosion resistance, wear resistance, etc., can be easily formed on the base material 10 at low temperatures.
JP676479A 1979-01-23 1979-01-23 Parts for formation of film Pending JPS55100974A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP676479A JPS55100974A (en) 1979-01-23 1979-01-23 Parts for formation of film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP676479A JPS55100974A (en) 1979-01-23 1979-01-23 Parts for formation of film

Publications (1)

Publication Number Publication Date
JPS55100974A true JPS55100974A (en) 1980-08-01

Family

ID=11647235

Family Applications (1)

Application Number Title Priority Date Filing Date
JP676479A Pending JPS55100974A (en) 1979-01-23 1979-01-23 Parts for formation of film

Country Status (1)

Country Link
JP (1) JPS55100974A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58181863A (en) * 1982-04-14 1983-10-24 Sumitomo Electric Ind Ltd Surface treatment method
JPS6017065A (en) * 1983-07-06 1985-01-28 Seikosha Co Ltd Formation of titanium nitride film on steel by sputtering
JPS60128262A (en) * 1983-12-15 1985-07-09 Toshiba Corp Manufacture of composite substrate having high heat conductivity
JPS60141869A (en) * 1983-12-29 1985-07-26 Nissin Electric Co Ltd Method and device for forming film
JPS62260058A (en) * 1986-05-01 1987-11-12 Nippon Light Metal Co Ltd Production of aluminum material having crystalline aluminum nitride layer
JPS637365A (en) * 1986-06-28 1988-01-13 Pentel Kk External part for ornamentation and production thereof
WO1998053114A1 (en) * 1997-05-20 1998-11-26 Siemens Aktiengesellschaft Method for covering a component with a corrosion inhibiting foreign oxide coating and component covered with one such coating

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58181863A (en) * 1982-04-14 1983-10-24 Sumitomo Electric Ind Ltd Surface treatment method
JPS6219503B2 (en) * 1982-04-14 1987-04-28 Sumitomo Electric Industries
JPS6017065A (en) * 1983-07-06 1985-01-28 Seikosha Co Ltd Formation of titanium nitride film on steel by sputtering
JPS60128262A (en) * 1983-12-15 1985-07-09 Toshiba Corp Manufacture of composite substrate having high heat conductivity
JPS60141869A (en) * 1983-12-29 1985-07-26 Nissin Electric Co Ltd Method and device for forming film
JPS62260058A (en) * 1986-05-01 1987-11-12 Nippon Light Metal Co Ltd Production of aluminum material having crystalline aluminum nitride layer
JPS637365A (en) * 1986-06-28 1988-01-13 Pentel Kk External part for ornamentation and production thereof
WO1998053114A1 (en) * 1997-05-20 1998-11-26 Siemens Aktiengesellschaft Method for covering a component with a corrosion inhibiting foreign oxide coating and component covered with one such coating

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