JPS6373601A - Method of manufacture of nonlinear resistance path and rotary potentiometer manufactured by the method - Google Patents

Method of manufacture of nonlinear resistance path and rotary potentiometer manufactured by the method

Info

Publication number
JPS6373601A
JPS6373601A JP62226738A JP22673887A JPS6373601A JP S6373601 A JPS6373601 A JP S6373601A JP 62226738 A JP62226738 A JP 62226738A JP 22673887 A JP22673887 A JP 22673887A JP S6373601 A JPS6373601 A JP S6373601A
Authority
JP
Japan
Prior art keywords
support
strip
resistance
mass
resistive mass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62226738A
Other languages
Japanese (ja)
Inventor
フランツ・グリーベル
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Preh Industrieausruestungen GmbH
Original Assignee
Preh Industrieausruestungen GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Preh Industrieausruestungen GmbH filed Critical Preh Industrieausruestungen GmbH
Publication of JPS6373601A publication Critical patent/JPS6373601A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C10/00—Adjustable resistors
    • H01C10/30—Adjustable resistors the contact sliding along resistive element
    • H01C10/32—Adjustable resistors the contact sliding along resistive element the contact moving in an arcuate path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C10/00—Adjustable resistors
    • H01C10/04—Adjustable resistors with specified mathematical relationship between movement of resistor actuating means and value of resistance, other than direct proportional relationship
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49082—Resistor making
    • Y10T29/49087—Resistor making with envelope or housing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49082—Resistor making
    • Y10T29/49099—Coating resistive material on a base

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 本発明は、抵抗路の抵抗値の推移が支持体ストリップの
長手方向に非線形である様な、支持体ストリップに切断
される支持体上に抵抗路を製造するための方法に関する
。DETAILED DESCRIPTION OF THE INVENTION The invention provides a method for producing resistance tracks on a support that is cut into support strips, such that the course of the resistance value of the resistance track is non-linear in the longitudinal direction of the support strip. Regarding the method.

抵抗路をスクリーンプリント技術で抵抗値の非線形推移
を持つように製造することは知られている。その際抵抗
路の個々の部分領域の間には鮮明な境界付けが生ずる。It is known to produce resistive paths with a non-linear course of resistance using screen printing techniques. In this case, sharp demarcations occur between the individual partial areas of the resistance path.

このことは、そこには抵抗路に沿って抵抗値の著しい飛
躍が生ずるので好ましくない。This is undesirable since there occurs a significant jump in resistance along the resistance path.

同様に抵抗塊状体を連続して噴霧化し沈着させることに
よって非線形の抵抗路を製造することも知られている。It is likewise known to produce non-linear resistance paths by successive atomization and deposition of resistance masses.

この方法は周囲の環境に迷惑をかけ、結果的に抵抗路の
抵抗をかなり漏洩することになった。更に型板を常に準
備する必要があった。This method disturbs the surrounding environment and results in significant leakage of the resistance of the resistance path. Furthermore, it was necessary to constantly prepare templates.

穿孔した支持体ストリップ上に抵抗用インキを滴らすこ
とによって抵抗路を製造することも知られている。この
方法は高価であり、大量生産には殆ど適していない。It is also known to produce resistance tracks by dripping resistance ink onto perforated carrier strips. This method is expensive and hardly suitable for mass production.

ヨーロッパ特許公開第０１７９９１７号公報には、唯１
個のノズルを用いて支持体上に抵抗塊状体を塗る方法が
記載されている。このノズルはこの場合支持体に対して
走行しうるものである。European Patent Publication No. 0179917 contains only one
A method of applying a resistive mass onto a support using multiple nozzles is described. The nozzle in this case can be moved relative to the support.

米国特許第４４３０６３４号公報には、可撓性の支持体
ストリップ上の抵抗が円筒状室の周辺壁に沿って設けら
れている回転式ポテンシオメータが記載されている。US Pat. No. 4,430,634 describes a rotary potentiometer in which a resistor on a flexible support strip is provided along the peripheral wall of a cylindrical chamber.

本発明の課題は、抵抗値の非線形推移を有する抵抗を合
理的に且つ均一に抵抗部分領域の間に一定の移行部をも
って製造される様な、初めに述べた種の方法を提案する
ことである。The object of the invention is to propose a method of the type mentioned at the outset, in which resistors with a non-linear progression of resistance values can be manufactured rationally and uniformly with constant transitions between resistor sub-regions. be.

本発明によれば初めに述べた種の方法の場合この課題は
次のようにして解決される。即ち目論まれる支持体スト
リップの長手方向に対して横方向に支持体が、抵抗塊状
体用の塗布装置の下を貫通して動かされ、その塗布装置
が緊密に相並んだ数本の抵抗塊状体ストリップを濡らし
て支持体上に塗り付け、従ってその縁部領域が互いにま
ざり合い、その際抵抗塊状体ストリップを形成する抵抗
塊状体が目論まれる非線形の抵抗推移に相応して違った
抵抗値を備え、そして支持体ストリップがその後抵抗塊
状体で成層された支持体から切断される様にして解決さ
れる。According to the invention, this problem is achieved in the case of a method of the type mentioned at the outset as follows. That is, transversely to the longitudinal direction of the carrier strip considered, the support is moved under an applicator device for the resistor mass, which applicator device applies several resistors closely next to each other. The mass strip is wetted and smeared onto the support so that its edge regions blend into one another, the resistive mass forming the resistive mass strip being different in accordance with the intended non-linear resistance course. A resistance value is provided and resolved in such a way that the support strip is then cut from the support laminated with the resistance mass.

まだ濡れた状態で抵抗塊状体が合流し、混合されること
によって、個々の抵抗値間の移行部が連続することにな
る。従って均一な特性曲線が得られることになる。The merging and mixing of the resistive mass while still wet results in a continuous transition between the individual resistance values. Therefore, a uniform characteristic curve can be obtained.

支持体状に抵抗塊状体ストリップを連続的に塗ることに
よって、合理的な製造が可能となる。Continuous application of the resistive mass strips onto the support allows for rational manufacturing.

抵抗塊状体の乾燥の後切断される支持体ストリップは特
に非常に小さなポテンシオメータを製造するのにも適し
ている。The carrier strip, which is cut after drying the resistive mass, is also particularly suitable for producing very small potentiometers.

上記した方法では抵抗塊状体の使用量が比較的少ない。The method described above uses a relatively small amount of resistive mass.

この方法はそれによって周囲の環境を汚さずに、なじむ
ものである。This method blends in without polluting the surrounding environment.

上記の方法により製造された支持体ストリップで作動す
る回転式ポテンシオメータは、抵抗塊状体ストリップが
可撓性の支持体薄膜の上に塗られ、支持体ストリップが
、その長手方向周りに湾曲してケーシングの円筒状の内
部室内に、内壁の周辺周りに延びる様に挿入され、そし
て面記内部室内に測定部材が挿入されるという特徴を有
している。A rotary potentiometer operating with a support strip produced by the method described above has a resistive mass strip coated on a flexible support thin film, the support strip being curved around its longitudinal direction. The measuring member is inserted into the cylindrical internal chamber of the casing so as to extend around the periphery of the internal wall, and the measuring member is inserted into the cylindrical internal chamber.

本発明の更に有利な実施形態は一実施例の以下の記載か
ら明らかとなる。Further advantageous embodiments of the invention emerge from the following description of an exemplary embodiment.

多数のカニユーレ（套管）２を有する塗布装置ｌが設け
られている。これらカニユーレ２は緊密に相並んで段を
付けて設けられ、それらから抵抗塊状体１８が支持体３
上に流れる。これらカニユーレ２には異なる抵抗値を有
する抵抗塊状体１８が供給される。An application device l having a number of cannulae 2 is provided. These cannulae 2 are provided in steps closely next to each other and from them a resistive mass 18 is extended to the support 3.
flows upwards. These cannulae 2 are supplied with resistance masses 18 having different resistance values.

これらカニユーレ２の下で可撓性の支持体薄膜３が矢印
Ｐの方向に貫通して引っ張られる。Beneath these cannulae 2 a flexible support membrane 3 is pulled through in the direction of arrow P.

支持体薄膜３はその際ロールから供給されても良い。The carrier film 3 can then be supplied from a roll.

カニユーレ２は支持体薄膜３上に抵抗塊状体ストリップ
４を濡らして塗布する。これらのストリップはその際そ
れらに平行する縁部５でまざり合う。The cannula 2 is applied by wetting a resistive mass strip 4 onto a support membrane 3. These strips then meet at edges 5 parallel to them.

これに続いて抵抗塊状体ストリップ４で成層された支持
体薄膜３は乾燥器６を通して走行する。この乾燥器６の
後で成層された支持体薄膜３が別のロール上を転がり、
その後切断されうるものである。Following this, the carrier membrane 3 laminated with the resistive mass strip 4 is run through a dryer 6 . After this dryer 6, the layered support thin film 3 is rolled on another roll,
It can then be severed.

切断装置７内で成層された支持体薄膜３から支持体スト
リップ８が穿孔される。支持体ストリップ８の長手方向
は支持体薄膜３乃至はその長手方向の運搬方向Ｐに対し
て横方向に延びている。支持体ストリップ８上には従っ
て全ての抵抗塊状体ストリップ４から抵抗領域が直接相
並んで配列されている。A carrier strip 8 is perforated from the laminated carrier film 3 in a cutting device 7 . The longitudinal direction of the carrier strip 8 extends transversely to the carrier membrane 3 or its longitudinal conveying direction P. On the carrier strip 8, the resistance regions from all the resistance mass strips 4 are therefore arranged directly next to each other.

回転式ポテンシオメータ（第３図参照）は円筒状の内部
室１０を有するケーシング９を備えている。この内部室
１０内には、内部室１０の内壁１１の周辺にぐるっと延
びる様に支持体ストリップ８が湾曲して挿入されている
。この支持体ストリップ８はその際、その抵抗路上に測
定部材１３の接触スライダー１２が当たるように挿入さ
れている。支持体ストリップ８の可撓性によってその際
測定部材１３の回転軸に対して同心的な抵抗路が作られ
ており、抵抗路の上に接触スライダーＩ２がラジアル方
向に当接する。The rotary potentiometer (see FIG. 3) comprises a casing 9 having a cylindrical interior chamber 10. A support strip 8 is inserted into this interior chamber 10 in a curved manner so as to extend around the inner wall 11 of the interior chamber 10 . This carrier strip 8 is then inserted in such a way that the contact slide 12 of the measuring element 13 rests on its resistance path. Due to the flexibility of the support strip 8, a resistance path concentric to the axis of rotation of the measuring element 13 is created, on which the contact slide I2 rests in the radial direction.

支持体ストリップ８のこの配置によって非常に小さなポ
テンシオメータか構成される。この内部室１０は例えば
７　ｍｍ以下の直径を持ちうる。更に接触スライダーＩ
２の抵抗路への押圧力はケーシング９内の測定部材１３
の嵌め込みには関係しない。抵抗路の等電位線が測定部
材１３の回転軸線に平行に及び互いに平行に並んでおり
、従って回転軸線に対してラジアル方向には延びていな
いので、抵抗路には比較的高い電流を真情させることが
出来る。This arrangement of the support strip 8 constitutes a very small potentiometer. This internal chamber 10 can have a diameter of eg 7 mm or less. Further contact slider I
The pressing force on the resistance path No. 2 is determined by the measuring member 13 in the casing 9.
It has nothing to do with the inset. Since the equipotential lines of the resistance path are aligned parallel to the axis of rotation of the measuring element 13 and parallel to each other, and therefore do not extend radially with respect to the axis of rotation, a relatively high current is applied to the resistance path. I can do it.

内壁ＩＩには更に別の支持体ストリップ１４が配設され
ている。このストリップには導体層が設けられている。A further support strip 14 is arranged on the inner wall II. This strip is provided with a conductor layer.

そのストリップ上に接触スライダー１２と結合された接
触スライダー１５が当接している。これら導体路及び抵
抗路にはそれらの端部に電気的接続部１６が設けられて
いる。ケーシング９のカバー１７はケーシング９内の測
定部材１３を保持している。A contact slide 15 connected to the contact slide 12 rests on the strip. These conductor paths and resistance paths are provided with electrical connections 16 at their ends. A cover 17 of the casing 9 holds the measuring element 13 inside the casing 9.

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は本発明に従う方法を実施するための装置の略図
であり、第２図は第１図による装置の側面図であり、第
３図はこの方法により製造された抵抗を有する回転式ポ
テンシオメータを示すものである。 図中参照番号 １・・・・・・塗布装置 ２・・・・・・カニユーレ（套管） ３・・・・・・支持体、支持体薄膜 ４・・・・・・抵抗塊状体ストリップ ５・・・・・・縁部 ６・・・・・・乾燥器 ７・・・・・・切断装置 ８・・・・・・支持体ストリップ ９・・・・・・ケーシング ＩＯ・・・・・内部室 １１・・・・・内壁 １２・・・・・接触スライダー １３・・・・・測定部材 Ｉ４・・・・・別の支持体ストリップ １５・・・・・接触スライダー １６・・・・・接続部 １７・・・・・カバー １８・・・・・抵抗塊状体 Ｐ・・・・・・矢印1 is a schematic representation of an apparatus for implementing the method according to the invention, FIG. 2 is a side view of the apparatus according to FIG. 1, and FIG. 3 is a rotary pole with a resistor manufactured by this method. This shows a tensiometer. Reference number in the figure 1... Coating device 2... Cannula 3... Support, thin support film 4... Resistance mass strip 5 ... Edge 6 ... Dryer 7 ... Cutting device 8 ... Support strip 9 ... Casing IO ... Internal chamber 11...Inner wall 12...Contact slider 13...Measuring element I4...Further support strip 15...Contact slider 16... Connection part 17...Cover 18...Resistance mass P...Arrow

Claims (4)

【特許請求の範囲】[Claims] （１）抵抗路の抵抗値の推移が支持体ストリップの長手
方向に非線形である様な、支持体ストリップに切断され
る支持体上に抵抗路を製造するための方法において、目
論まれる支持体ストリップの長手方向に対して横方向に
支持体が、抵抗塊状体用の塗布装置の下を貫通して動か
され、その塗布装置が緊密に相並んだ数本の抵抗塊状体
ストリップを濡らして支持体上に塗り付け、従ってその
縁部領域が互いにまざり合い、その際抵抗塊状体ストリ
ップを形成する抵抗塊状体が目論まれる非線形の抵抗推
移に相応して違った抵抗値を備え、そして支持体ストリ
ップがその後抵抗塊状体で成層された支持体から切断さ
れることを特徴とする方法。(1) A support contemplated in a method for producing a resistance path on a support that is cut into support strips, such that the course of the resistance value of the resistance path is non-linear in the longitudinal direction of the support strip. Transversely to the longitudinal direction of the body strip, the support is moved under an applicator for the resistive mass, the applicator wetting several closely adjacent resistive mass strips. The resistive mass which is applied onto the carrier, so that its edge regions blend into one another, forming a resistive mass strip, has a different resistance value in accordance with the intended non-linear resistance course, and A method characterized in that the support strip is then cut from the support laminated with the resistive mass. （２）塗布装置が数個の段を付けて互いに並んで設けら
れたカニューレ（套管）を有していることを特徴とする
特許請求の範囲第１項に記載の方法。2. A method as claimed in claim 1, characterized in that the application device has several cannulas arranged next to each other in steps. （３）支持体が、抵抗塊状体ストリップを塗り付けた後
及びそれら縁部領域をまざり合わせた後乾燥器を通して
貫通運搬されることを特徴とする特許請求の範囲第１項
または第２項に記載の方法。(3) The support according to claim 1 or 2, characterized in that the support is conveyed through the dryer after applying the resistive mass strips and after intermingling their edge areas. Method described. （４）目論まれる支持体ストリップの長手方向に対して
横方向に支持体が、抵抗塊状体用の塗布装置の下を貫通
して動かされ、その塗布装置が緊密に相並んだ数本の抵
抗塊状体ストリップを濡らして支持体上に塗り付け、従
ってその縁部領域が互いにまざり合い、その際抵抗塊状
体ストリップを形成する抵抗塊状体が目論まれる非線形
の抵抗推移に相応して違った抵抗値を備え、そして支持
体ストリップがその後抵抗塊状体で成層された支持体か
ら切断される、抵抗路の抵抗値の推移が支持体ストリッ
プの長手方向に非線形である様な、支持体ストリップに
切断される支持体上に抵抗路を製造するための方法によ
り製造された支持体ストリップを有する回転式ポテンシ
オメータにおいて、抵抗塊状体ストリップ（４）が可撓
性の支持体薄膜（３）の上に塗られ、支持体ストリップ
（８）が、その長手方向周りに湾曲してケーシング（９
）の円筒状の内部室（１０）内に、内壁（１１）の周辺
周りに延びる様に挿入され、そして前記内部室（１０）
内に測定部材（１３）が挿入されることを特徴とする回
転式ポテンシオメータ。(4) The support is moved transversely to the longitudinal direction of the contemplated support strip under an applicator device for the resistive mass, which applicator device includes several applicator devices arranged closely next to each other. of the resistive mass strips are wetted and smeared onto the carrier so that their edge regions blend into one another, corresponding to the nonlinear resistance profile of the resistive mass forming the resistive mass strip. Supports with different resistance values and such that the course of the resistance value of the resistance path is non-linear in the longitudinal direction of the support strip, and the support strip is then cut from the support laminated with the resistive mass. In a rotary potentiometer with a support strip produced by a method for producing a resistance path on a support that is cut into strips, the resistance mass strip (4) is formed by a flexible support thin film (3). A support strip (8) is applied over the casing (9) and curved around its longitudinal direction.
) into a cylindrical internal chamber (10) extending around the periphery of the internal wall (11), and said internal chamber (10)
A rotary potentiometer, characterized in that a measuring member (13) is inserted therein.
JP62226738A 1986-09-12 1987-09-11 Method of manufacture of nonlinear resistance path and rotary potentiometer manufactured by the method Pending JPS6373601A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3631057.3 1986-09-12
DE19863631057 DE3631057A1 (en) 1986-09-12 1986-09-12 METHOD FOR PRODUCING NON-LINEAR RESISTANCE TRACKS AND ROTATION POTENTIOMETER PRODUCED BY THIS METHOD

Publications (1)

Publication Number Publication Date
JPS6373601A true JPS6373601A (en) 1988-04-04

Family

ID=6309436

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62226738A Pending JPS6373601A (en) 1986-09-12 1987-09-11 Method of manufacture of nonlinear resistance path and rotary potentiometer manufactured by the method

Country Status (4)

Country Link
US (1) US4841626A (en)
EP (1) EP0259763A3 (en)
JP (1) JPS6373601A (en)
DE (1) DE3631057A1 (en)

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JPS60219791A (en) * 1984-04-16 1985-11-02 松下電器産業株式会社 Method of forming thick film circuit

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DE3631057C2 (en) 1989-11-23
EP0259763A2 (en) 1988-03-16
DE3631057A1 (en) 1988-03-24
EP0259763A3 (en) 1990-01-17
US4841626A (en) 1989-06-27

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