JPS6373352U - - Google Patents
Info
- Publication number
- JPS6373352U JPS6373352U JP16515286U JP16515286U JPS6373352U JP S6373352 U JPS6373352 U JP S6373352U JP 16515286 U JP16515286 U JP 16515286U JP 16515286 U JP16515286 U JP 16515286U JP S6373352 U JPS6373352 U JP S6373352U
- Authority
- JP
- Japan
- Prior art keywords
- evaporation
- shutter
- substrate
- cuts
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001704 evaporation Methods 0.000 claims description 7
- 230000008020 evaporation Effects 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 4
- 238000010884 ion-beam technique Methods 0.000 claims description 3
- 238000007738 vacuum evaporation Methods 0.000 claims 2
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Physical Vapour Deposition (AREA)
Description
第１図は、この考案の一実施例に係る膜形成装
置を示す概略図である。第２図は、第１図の装置
における制御の一例を示すタイムチヤートである
。第３図は、従来の膜形成装置の一例を示す概略
図である。
４…イオン源、６…イオンビーム、８…蒸発源
、１０…蒸発物、１６…基板、１８…膜厚モニタ
、２０…蒸発源シヤツター、２１…膜厚モニタシ
ヤツター、２２…基板シヤツター、２４〜２６…
駆動装置、３２…制御装置。
FIG. 1 is a schematic diagram showing a film forming apparatus according to an embodiment of this invention. FIG. 2 is a time chart showing an example of control in the apparatus shown in FIG. FIG. 3 is a schematic diagram showing an example of a conventional film forming apparatus. 4... Ion source, 6... Ion beam, 8... Evaporation source, 10... Evaporated material, 16... Substrate, 18... Film thickness monitor, 20... Evaporation source shutter, 21... Film thickness monitor shutter, 22... Substrate shutter, 24 ~26…
Drive device, 32...control device.
Claims (1)
空中で基板上に膜を形成する装置であつて、真空
蒸着用の蒸発源から出る蒸発物を断続するシヤツ
ターと、蒸着速度制御用の膜厚モニタに入射する
蒸発物を断続するシヤツターと、基板に入射する
イオンビームおよび蒸発物を断続するシヤツター
とを有するものにおいて、前記各シヤツターをそ
れぞれ予め定められた所定のタイミングで自動的
に少なくとも開かせることができる制御手段を備
えることを特徴とする膜形成装置。 This is a device that forms a film on a substrate in a vacuum using a combination of ion beam irradiation and vacuum evaporation, and includes a shutter that cuts off the evaporation material from the evaporation source for vacuum evaporation, and a film thickness monitor that controls the evaporation rate. In a device having a shutter that cuts off the evaporation material incident on the substrate, and a shutter that cuts off the ion beam and the evaporation material that enter the substrate, each of the shutters is automatically opened at least at a predetermined timing. 1. A film forming apparatus characterized by comprising a control means capable of controlling.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16515286U JPS6373352U (en) | 1986-10-27 | 1986-10-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16515286U JPS6373352U (en) | 1986-10-27 | 1986-10-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6373352U true JPS6373352U (en) | 1988-05-16 |
Family
ID=31094922
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16515286U Pending JPS6373352U (en) | 1986-10-27 | 1986-10-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6373352U (en) |
-
1986
- 1986-10-27 JP JP16515286U patent/JPS6373352U/ja active Pending
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