JPS6369461U - - Google Patents
Info
- Publication number
- JPS6369461U JPS6369461U JP16347386U JP16347386U JPS6369461U JP S6369461 U JPS6369461 U JP S6369461U JP 16347386 U JP16347386 U JP 16347386U JP 16347386 U JP16347386 U JP 16347386U JP S6369461 U JPS6369461 U JP S6369461U
- Authority
- JP
- Japan
- Prior art keywords
- flange
- ion source
- insulator
- flanges
- bonded portion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000012212 insulator Substances 0.000 claims description 4
- 238000010884 ion-beam technique Methods 0.000 claims description 2
- 238000001816 cooling Methods 0.000 claims 2
- 239000000853 adhesive Substances 0.000 claims 1
- 230000001070 adhesive effect Effects 0.000 claims 1
- 238000000605 extraction Methods 0.000 claims 1
- 230000013011 mating Effects 0.000 claims 1
- 238000007789 sealing Methods 0.000 claims 1
- 239000000498 cooling water Substances 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Description
第１図は、この考案の一実施例に係るイオン源
を示す断面図である。第２図は、この考案の他の
実施例に係るイオン源を部分的に示す断面図であ
る。第３図は、従来のイオン源の一例を示す断面
図である。
４……アークチヤンバー、１２……引出し電極
、１４……イオンビーム、３４……相手側機器、
３６……第１のフランジ、３８……冷却水通路、
４０……絶縁碍子、４２……第２のフランジ。
FIG. 1 is a sectional view showing an ion source according to an embodiment of this invention. FIG. 2 is a sectional view partially showing an ion source according to another embodiment of the invention. FIG. 3 is a cross-sectional view showing an example of a conventional ion source. 4... Arc chamber, 12... Extracting electrode, 14... Ion beam, 34... Other device,
36...first flange, 38...cooling water passage,
40...Insulator, 42...Second flange.
Claims (1)
ランジをそれぞれ取付け、第１のフランジでプラ
ズマ生成用の容器およびそこからイオンビームを
引き出すための正電位にされる引出し電極を支持
し、第２のフランジで当該イオン源を相手側機器
へ取り付ける構造のイオン源において、第１およ
び第２のフランジと絶縁碍子間を接着剤でそれぞ
れ接着することによつてそれらの間の機械的固定
と真空シールを行い、かつ第１のフランジと絶縁
碍子間の接着部の近傍にそこを冷却するための冷
却手段を設けていることを特徴とするイオン源。 First and second flanges are respectively attached to both ends of a cylindrical insulator, and the first flange supports a plasma generation container and an extraction electrode set to a positive potential for extracting an ion beam from the container, In an ion source that has a structure in which the ion source is attached to a mating device using a second flange, the mechanical fixation between the first and second flanges and the insulator is achieved by bonding them with adhesive. An ion source that performs vacuum sealing and is provided with cooling means for cooling the bonded portion between the first flange and the insulator in the vicinity of the bonded portion.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16347386U JPS6369461U (en) | 1986-10-23 | 1986-10-23 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16347386U JPS6369461U (en) | 1986-10-23 | 1986-10-23 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6369461U true JPS6369461U (en) | 1988-05-10 |
Family
ID=31091704
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16347386U Pending JPS6369461U (en) | 1986-10-23 | 1986-10-23 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6369461U (en) |
-
1986
- 1986-10-23 JP JP16347386U patent/JPS6369461U/ja active Pending