JPS6366116U - - Google Patents
Info
- Publication number
- JPS6366116U JPS6366116U JP16196386U JP16196386U JPS6366116U JP S6366116 U JPS6366116 U JP S6366116U JP 16196386 U JP16196386 U JP 16196386U JP 16196386 U JP16196386 U JP 16196386U JP S6366116 U JPS6366116 U JP S6366116U
- Authority
- JP
- Japan
- Prior art keywords
- chemical solution
- housing
- chemical
- etching
- filters
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000126 substance Substances 0.000 claims description 7
- 238000001914 filtration Methods 0.000 claims description 5
- 239000007788 liquid Substances 0.000 claims description 5
- 238000004140 cleaning Methods 0.000 claims 1
- 238000005530 etching Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 4
Landscapes
- Weting (AREA)
- Degasification And Air Bubble Elimination (AREA)
Description
第１図、第２図は本考案の実施例を示す構成図
、第３図、第４図は本考案による薬液過システ
ムの概要図、第５図は従来の薬液過装置を示す
構成図、第６図は従来の薬液過システムの概要
図である。
１……ハウジング、２……主フイルター、３ａ
，３ｂ……補助フイルター、４……処理液。
1 and 2 are block diagrams showing an embodiment of the present invention, FIGS. 3 and 4 are schematic diagrams of a chemical liquid filtration system according to the present invention, and FIG. 5 is a block diagram showing a conventional chemical liquid filtration device. FIG. 6 is a schematic diagram of a conventional chemical liquid filtration system. 1...Housing, 2...Main filter, 3a
, 3b...auxiliary filter, 4...processing liquid.
Claims (1)
置において、ハウジング内の薬液の過を行う主
フイルターと、薬液中より発してハウジング外部
へ流出するエアーの流路に設けた補助フイルター
とを有することを特徴とする薬液過装置。 A chemical solution filtration device used for etching or cleaning processing, etc., is characterized by having a main filter that filters the chemical solution inside the housing, and an auxiliary filter provided in the flow path of air that is emitted from the chemical solution and flows out to the outside of the housing. Chemical liquid filtration equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16196386U JPS6366116U (en) | 1986-10-22 | 1986-10-22 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16196386U JPS6366116U (en) | 1986-10-22 | 1986-10-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6366116U true JPS6366116U (en) | 1988-05-02 |
Family
ID=31088773
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16196386U Pending JPS6366116U (en) | 1986-10-22 | 1986-10-22 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6366116U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04176125A (en) * | 1990-11-08 | 1992-06-23 | Nec Corp | Wafer treatment device |
-
1986
- 1986-10-22 JP JP16196386U patent/JPS6366116U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04176125A (en) * | 1990-11-08 | 1992-06-23 | Nec Corp | Wafer treatment device |
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