JPS6361752U - - Google Patents
Info
- Publication number
- JPS6361752U JPS6361752U JP15763186U JP15763186U JPS6361752U JP S6361752 U JPS6361752 U JP S6361752U JP 15763186 U JP15763186 U JP 15763186U JP 15763186 U JP15763186 U JP 15763186U JP S6361752 U JPS6361752 U JP S6361752U
- Authority
- JP
- Japan
- Prior art keywords
- cup
- beam cup
- wall
- front face
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000011156 evaluation Methods 0.000 claims description 2
- 238000010884 ion-beam technique Methods 0.000 claims 1
- 239000002245 particle Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Electron Sources, Ion Sources (AREA)
Description
第１図はこの考案の一実施例のビーム評価装置
を示す斜視図、第２図はその要部の断面図、第３
図は出力波形図、第４図はマスクの他の例を示す
平面図、第５図は従来例を示す概略斜視図、第６
図はビーム発散角度分布の説明図である。
１…ビームカツプ、２…スリツト、３…しやへ
い板、４…マグネツト、５…移動機構。
Fig. 1 is a perspective view showing a beam evaluation device according to an embodiment of this invention, Fig. 2 is a cross-sectional view of its main parts, and Fig. 3
4 is a plan view showing another example of the mask, FIG. 5 is a schematic perspective view showing a conventional example, and FIG. 6 is an output waveform diagram.
The figure is an explanatory diagram of beam divergence angle distribution. 1...beam cup, 2...slit, 3...shield plate, 4...magnet, 5...movement mechanism.
Claims (1)
ツプと、直線状のスリツトを有し前記ビームカツ
プの前面開口に取付けたしやへい板と、前記ビー
ムカツプ内の空間に前記ビームカツプの中心軸と
交差する方向の磁場を作り前記ビームカツプの内
壁へのイオン粒子の衝突により前記ビームカツプ
の内壁から飛び出した二次電子を前記ビームカツ
プの内壁に再衝突させるマグネツトと、前記ビー
ムカツプを前記スリツトの幅方向に移動させる移
動機構とを備えたビーム評価装置。 a beam cup having an open front face for receiving the ion beam; a shield plate having a linear slit attached to the front face opening of the beam cup; and a magnetic field in a direction perpendicular to the central axis of the beam cup in the space inside the beam cup. a magnet that causes secondary electrons ejected from the inner wall of the beam cup due to the collision of ion particles with the inner wall of the beam cup to re-collide with the inner wall of the beam cup; and a moving mechanism that moves the beam cup in the width direction of the slit. Beam evaluation device equipped with.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15763186U JPS6361752U (en) | 1986-10-14 | 1986-10-14 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15763186U JPS6361752U (en) | 1986-10-14 | 1986-10-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6361752U true JPS6361752U (en) | 1988-04-23 |
Family
ID=31080360
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15763186U Pending JPS6361752U (en) | 1986-10-14 | 1986-10-14 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6361752U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008257931A (en) * | 2007-04-03 | 2008-10-23 | Nissin Ion Equipment Co Ltd | Measurement method of beam width and divergence angle of ion beam, and ion implantation device |
-
1986
- 1986-10-14 JP JP15763186U patent/JPS6361752U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008257931A (en) * | 2007-04-03 | 2008-10-23 | Nissin Ion Equipment Co Ltd | Measurement method of beam width and divergence angle of ion beam, and ion implantation device |
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