JPS6361417A - Magnetic recording medium and its production - Google Patents
Magnetic recording medium and its productionInfo
- Publication number
- JPS6361417A JPS6361417A JP20617886A JP20617886A JPS6361417A JP S6361417 A JPS6361417 A JP S6361417A JP 20617886 A JP20617886 A JP 20617886A JP 20617886 A JP20617886 A JP 20617886A JP S6361417 A JPS6361417 A JP S6361417A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- magnetic
- film layer
- plasma
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 70
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 229910052751 metal Inorganic materials 0.000 claims abstract description 27
- 239000002184 metal Substances 0.000 claims abstract description 27
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 239000000178 monomer Substances 0.000 claims abstract description 15
- 239000000314 lubricant Substances 0.000 claims description 24
- 238000006116 polymerization reaction Methods 0.000 claims description 14
- 150000002894 organic compounds Chemical class 0.000 claims description 11
- 239000002923 metal particle Substances 0.000 claims description 9
- 229910001111 Fine metal Inorganic materials 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 6
- 238000001704 evaporation Methods 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 3
- 229920006267 polyester film Polymers 0.000 abstract description 9
- 229910052782 aluminium Inorganic materials 0.000 abstract description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 abstract description 4
- 229910045601 alloy Inorganic materials 0.000 abstract description 4
- 239000000956 alloy Substances 0.000 abstract description 4
- 239000011737 fluorine Substances 0.000 abstract description 4
- 229910052731 fluorine Inorganic materials 0.000 abstract description 4
- 150000002430 hydrocarbons Chemical class 0.000 abstract description 4
- 229910052742 iron Inorganic materials 0.000 abstract description 4
- 229910052759 nickel Inorganic materials 0.000 abstract description 4
- 239000004215 Carbon black (E152) Substances 0.000 abstract description 3
- 229930195733 hydrocarbon Natural products 0.000 abstract description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052804 chromium Inorganic materials 0.000 abstract description 2
- 239000010703 silicon Substances 0.000 abstract description 2
- 229910052710 silicon Inorganic materials 0.000 abstract description 2
- 229910052719 titanium Inorganic materials 0.000 abstract description 2
- 239000013528 metallic particle Substances 0.000 abstract 4
- 238000013329 compounding Methods 0.000 abstract 1
- 239000010408 film Substances 0.000 description 37
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 18
- 239000007789 gas Substances 0.000 description 17
- 239000010409 thin film Substances 0.000 description 12
- 230000005294 ferromagnetic effect Effects 0.000 description 10
- 235000021355 Stearic acid Nutrition 0.000 description 9
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 9
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 9
- 239000008117 stearic acid Substances 0.000 description 9
- 239000010419 fine particle Substances 0.000 description 7
- 239000000843 powder Substances 0.000 description 7
- -1 c2F4 Chemical class 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 5
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 229910052725 zinc Inorganic materials 0.000 description 5
- 239000011701 zinc Substances 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- SZVJSHCCFOBDDC-UHFFFAOYSA-N ferrosoferric oxide Chemical compound O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 235000014113 dietary fatty acids Nutrition 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229930195729 fatty acid Natural products 0.000 description 3
- 239000000194 fatty acid Substances 0.000 description 3
- 239000006247 magnetic powder Substances 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 238000007738 vacuum evaporation Methods 0.000 description 3
- 229910020676 Co—N Inorganic materials 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- 229910001096 P alloy Inorganic materials 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- UKMSUNONTOPOIO-UHFFFAOYSA-N docosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCC(O)=O UKMSUNONTOPOIO-UHFFFAOYSA-N 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- 150000004665 fatty acids Chemical class 0.000 description 2
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- RNYJXPUAFDFIQJ-UHFFFAOYSA-N hydron;octadecan-1-amine;chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[NH3+] RNYJXPUAFDFIQJ-UHFFFAOYSA-N 0.000 description 2
- 238000001883 metal evaporation Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- GLDOVTGHNKAZLK-UHFFFAOYSA-N octadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCCCO GLDOVTGHNKAZLK-UHFFFAOYSA-N 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 229920002545 silicone oil Polymers 0.000 description 2
- PRAKJMSDJKAYCZ-UHFFFAOYSA-N squalane Chemical compound CC(C)CCCC(C)CCCC(C)CCCCC(C)CCCC(C)CCCC(C)C PRAKJMSDJKAYCZ-UHFFFAOYSA-N 0.000 description 2
- 239000000057 synthetic resin Substances 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- HLZKNKRTKFSKGZ-UHFFFAOYSA-N tetradecan-1-ol Chemical compound CCCCCCCCCCCCCCO HLZKNKRTKFSKGZ-UHFFFAOYSA-N 0.000 description 2
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 2
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- 235000021357 Behenic acid Nutrition 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- 239000005639 Lauric acid Substances 0.000 description 1
- REYJJPSVUYRZGE-UHFFFAOYSA-N Octadecylamine Chemical compound CCCCCCCCCCCCCCCCCCN REYJJPSVUYRZGE-UHFFFAOYSA-N 0.000 description 1
- 235000021314 Palmitic acid Nutrition 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229920006311 Urethane elastomer Polymers 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229940116226 behenic acid Drugs 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- ULBTUVJTXULMLP-UHFFFAOYSA-N butyl octadecanoate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCCCC ULBTUVJTXULMLP-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- AMFIJXSMYBKJQV-UHFFFAOYSA-L cobalt(2+);octadecanoate Chemical compound [Co+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O AMFIJXSMYBKJQV-UHFFFAOYSA-L 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 150000002191 fatty alcohols Chemical class 0.000 description 1
- KTWOOEGAPBSYNW-UHFFFAOYSA-N ferrocene Chemical compound [Fe+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 KTWOOEGAPBSYNW-UHFFFAOYSA-N 0.000 description 1
- 239000003302 ferromagnetic material Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- NEXSMEBSBIABKL-UHFFFAOYSA-N hexamethyldisilane Chemical compound C[Si](C)(C)[Si](C)(C)C NEXSMEBSBIABKL-UHFFFAOYSA-N 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229940043348 myristyl alcohol Drugs 0.000 description 1
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 1
- JXTPJDDICSTXJX-UHFFFAOYSA-N n-Triacontane Natural products CCCCCCCCCCCCCCCCCCCCCCCCCCCCCC JXTPJDDICSTXJX-UHFFFAOYSA-N 0.000 description 1
- GOQYKNQRPGWPLP-UHFFFAOYSA-N n-heptadecyl alcohol Natural products CCCCCCCCCCCCCCCCCO GOQYKNQRPGWPLP-UHFFFAOYSA-N 0.000 description 1
- WTBAHSZERDXKKZ-UHFFFAOYSA-N octadecanoyl chloride Chemical compound CCCCCCCCCCCCCCCCCC(Cl)=O WTBAHSZERDXKKZ-UHFFFAOYSA-N 0.000 description 1
- UPHWVVKYDQHTCF-UHFFFAOYSA-N octadecylazanium;acetate Chemical compound CC(O)=O.CCCCCCCCCCCCCCCCCCN UPHWVVKYDQHTCF-UHFFFAOYSA-N 0.000 description 1
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 1
- QWPNJOHZHSJFIY-UHFFFAOYSA-N octyl tetradecanoate Chemical compound CCCCCCCCCCCCCC(=O)OCCCCCCCC QWPNJOHZHSJFIY-UHFFFAOYSA-N 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 239000010702 perfluoropolyether Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229940032094 squalane Drugs 0.000 description 1
- HSXKFDGTKKAEHL-UHFFFAOYSA-N tantalum(v) ethoxide Chemical compound [Ta+5].CC[O-].CC[O-].CC[O-].CC[O-].CC[O-] HSXKFDGTKKAEHL-UHFFFAOYSA-N 0.000 description 1
- TUNFSRHWOTWDNC-HKGQFRNVSA-N tetradecanoic acid Chemical compound CCCCCCCCCCCCC[14C](O)=O TUNFSRHWOTWDNC-HKGQFRNVSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- ZRLCXMPFXYVHGS-UHFFFAOYSA-N tetramethylgermane Chemical compound C[Ge](C)(C)C ZRLCXMPFXYVHGS-UHFFFAOYSA-N 0.000 description 1
- VXKWYPOMXBVZSJ-UHFFFAOYSA-N tetramethyltin Chemical compound C[Sn](C)(C)C VXKWYPOMXBVZSJ-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- XOOUIPVCVHRTMJ-UHFFFAOYSA-L zinc stearate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O XOOUIPVCVHRTMJ-UHFFFAOYSA-L 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Landscapes
- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は磁気記録媒体およびその製造方法に関し、さ
らに詳しくは摩擦係数が小さくて耐久性に優れた磁気記
録媒体およびその製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a magnetic recording medium and a method of manufacturing the same, and more particularly to a magnetic recording medium with a small coefficient of friction and excellent durability and a method of manufacturing the same.
〔従来の技術〕。[Conventional technology].
一般に、金属もしくはそれらの合金などを真空蒸着、ス
パッタリング等によって基体フィルム上に被着するか、
あるいは磁性粉末を結合剤成分とともに基体フィルム上
に結着してつくられる磁気記録媒体は、記録再生時に磁
気ヘッド等と激しく摺接するため磁性層が摩耗されやす
く、特に真空蒸着等によって形成される強磁性金属薄膜
層は、高密度記録に適した特性を有する反面、磁気ヘッ
ドとの摩擦係数が太き(て、摩耗や損傷を受は易い。Generally, metals or their alloys are deposited on a base film by vacuum evaporation, sputtering, etc.
Alternatively, magnetic recording media made by bonding magnetic powder together with a binder component onto a base film are susceptible to abrasion of the magnetic layer due to violent sliding contact with a magnetic head etc. during recording and reproduction. Although the magnetic metal thin film layer has characteristics suitable for high-density recording, it has a large coefficient of friction with the magnetic head and is easily subject to wear and damage.
このため、従来から磁性層上に種々の保護PI層を設け
るなどして耐久性を改善することが行われており、たと
えば、高級脂肪酸やフッ素系化合物等の潤滑剤を被着さ
せたり(特開昭53−88704号、特開昭58−94
130号)、あるいは、有機化合物のモノマーガスのプ
ラズマ重合により高分子化合物の薄膜を設けたり(特開
昭58−88828号、特開昭58−60427号)、
またイオン化プラズマ分解重合により炭素水素質被H臭
を形成する(特開昭60−157726号)ことが提案
されている。For this reason, durability has been conventionally improved by providing various protective PI layers on the magnetic layer. Publication No. 53-88704, Japanese Patent Publication No. 58-94
130), or by forming a thin film of a polymer compound by plasma polymerization of a monomer gas of an organic compound (JP-A-58-88828, JP-A-58-60427),
It has also been proposed to form a carbon-hydrogen-based hydrogen odor by ionization plasma decomposition polymerization (Japanese Unexamined Patent Publication No. 157726/1983).
ところが、これらの保護膜層を磁性層上に設けたものは
耐久性が未だ充分ではなく、磁気ヘッドとの摺接により
比較的短時間で摩耗しやすくて、未だ充分に満足できる
耐久性は得られていない。However, these protective film layers provided on the magnetic layer do not yet have sufficient durability, and are likely to wear out in a relatively short period of time due to sliding contact with the magnetic head, and have not yet achieved sufficient durability. It has not been done.
この発明はかかる現状に鑑み種々検討を行った結果なさ
れたもので、基体上に金属微粒子を含有させて表面に凹
凸を形成したプラズマ重合膜層を形成し、このプラズマ
重合膜層上に磁性層を形成することによって、表面に凹
凸をもつプラズマ重合膜層の影響で、磁性層表面に凹凸
を形成して、磁気ヘッド等との摺動の際の真実接触面積
を低減し、摩擦係数を充分に小さくして耐久性を充分に
向上させたものである。また磁性層上にさらに潤滑剤層
を形成することによって、耐久性をさらに一段と同上さ
せたものである。This invention was made as a result of various studies in view of the current situation, and consists of forming a plasma polymerized film layer containing fine metal particles and forming an uneven surface on a substrate, and forming a magnetic layer on this plasma polymerized film layer. By forming a plasma polymerized film layer with an uneven surface, unevenness is formed on the surface of the magnetic layer, reducing the actual contact area when sliding with a magnetic head, etc., and increasing the coefficient of friction. It has been made smaller and its durability has been sufficiently improved. Further, by further forming a lubricant layer on the magnetic layer, the durability is further improved.
この発明において、基体上に形成するプラズマ重合膜層
は、基体を夏空雰囲気内で有機化合物のモノマーガスの
プラズマ中にさらしてプラズマ重合を行うと同時に、金
属を加熱蒸発させて得た蒸気流を基体に差し向けること
によって形成され、このように有機化合物のプラズマ重
合と同時に金属の加熱蒸発が行われると、加熱蒸発され
た金属が微粒子となって基体上に被着し、金属の微粒子
を含有して表面に凹凸を形成した有機化合物のプラズマ
重合膜層が形成される。しかして、このプラズマ重合膜
層の凹凸によって、この上に磁性層を形成すると、この
プラズマ重合I!!lI層の凹凸に沿って磁性層の表面
に凹凸が形成されるため、磁気ヘッド等との摺動の際の
真実接触面積が低減され、摩擦係数が充分に小さくなっ
て走行性が改善され、耐久性が充分に向上される。In this invention, the plasma polymerized film layer formed on the substrate is formed by exposing the substrate to a plasma of monomer gas of an organic compound in a summer air atmosphere to perform plasma polymerization, and at the same time, a vapor stream obtained by heating and evaporating the metal. When the metal is heated and evaporated at the same time as the plasma polymerization of the organic compound, the heated and evaporated metal becomes fine particles and adheres to the substrate, forming fine metal particles. A plasma-polymerized film layer of an organic compound containing the organic compound and having an uneven surface is formed. Due to the unevenness of this plasma polymerized film layer, when a magnetic layer is formed thereon, this plasma polymerized I! ! Since irregularities are formed on the surface of the magnetic layer along the irregularities of the II layer, the actual contact area when sliding with a magnetic head etc. is reduced, the coefficient of friction is sufficiently reduced, and running properties are improved. Durability is sufficiently improved.
このように、プラズマ重合と同時に金属蒸発源で加熱蒸
発されて使用される金属としては、亜鉛、アルミニウム
、ニッケル、コバルト、クロム、チタン、鉄等の金属ま
たはこれらの合金が好適なものとして使用され、これら
の金属は抵抗加熱や電子銃加熱により加熱蒸発され、基
体に差し向けられて微粒子となって基体上に被着する。As described above, metals such as zinc, aluminum, nickel, cobalt, chromium, titanium, and iron, or alloys thereof, are preferably used as metals that are heated and evaporated in a metal evaporation source at the same time as plasma polymerization. These metals are heated and evaporated by resistance heating or electron gun heating, directed toward the substrate, and deposited on the substrate in the form of fine particles.
また、プラズマ重合に使用される有機化合物のモノマー
ガスとしては、たとえば、メタン、プロパン、エチレン
、プロピレンなどの炭化水素系化合物のモノマーガス、
c2F4 、c3F6、C3F、等のフッ素系有機化合
物のモノマーガス、テトラメチルシラン、ヘキサメチル
ジシラン、ヘキサメチルジシラザン、ヘキサメチルシロ
キサン、オクタメチルシクロテトラシロキサンなどのケ
イ素系有機化合物のモノマーガス、テトラメチルスズ、
テトラメチルゲルマニウム、フェロセン、ペンタエトキ
シタンタル、チタニウムテトライソプロポキサイドなど
の有機金属化合物のモノマーガス等が好ましく使用され
る。これらの有機化合物のモノマーガスは、単独あるい
は希ガス、水素ガス、酸素ガス等と混合し、13.56
MHzの高周波や、2.56GHzのマイクロ波によ
りプラズマ化して基体上でプラズマ重合され、このとき
同時に金属の蒸気流が差し向けられるため、金属の微粒
子を含有して表面に凹凸を形成したプラズマ重合膜層が
基体上に形成される。In addition, monomer gases for organic compounds used in plasma polymerization include, for example, monomer gases for hydrocarbon compounds such as methane, propane, ethylene, and propylene;
Monomer gas of fluorine-based organic compounds such as c2F4, c3F6, C3F, monomer gas of silicon-based organic compounds such as tetramethylsilane, hexamethyldisilane, hexamethyldisilazane, hexamethylsiloxane, octamethylcyclotetrasiloxane, tetramethyl tin,
Monomer gases of organometallic compounds such as tetramethylgermanium, ferrocene, pentaethoxytantalum, and titanium tetraisopropoxide are preferably used. The monomer gas of these organic compounds can be used alone or mixed with rare gas, hydrogen gas, oxygen gas, etc.
Plasma polymerization occurs on the substrate by MHz high frequency or 2.56 GHz microwave, and at the same time a metal vapor flow is directed, resulting in plasma polymerization that contains fine metal particles and forms irregularities on the surface. A membrane layer is formed on the substrate.
このようにして形成されるプラズマ重合膜層における金
属微粒子の配合割合は、プラズマ重合膜層の全成分に対
して10〜70重9%の範囲内であることが好ましく、
少なすぎても多すぎても表面に凹凸を良好に形成するこ
とができない。またプラズマ重合膜層の表面の凹凸は、
幅0.01〜0.20μmの範囲内のものが、lX10
12〜lX1014個/cd形成されているのが好まし
く、幅が狭すぎたり、少なすぎると所期の効果が得られ
ず、幅が広すぎたり、多すぎたりすると電磁変換特性に
悪影響を及ぼす。この凹凸の幅の大きさおよび個数等は
、金属の加熱蒸発とプラズマ重合を同時に行う際のガス
圧および高周波電力、マイクロ波電力等を制御すること
によってコントロールされ、従って、金属の加熱蒸発と
プラズマ重合を同時に行う場合のガス圧および高周波の
電力やマイクロ波電力は、プラズマ重合保護膜層の表面
に良好な凹凸を形成し、また金属微粒子を含有したプラ
ズマ重合膜層と磁性層との接着性を良好にするため、ガ
ス圧を0.01〜5トールの範囲内とし、高周波電力を
0.01〜2 W/cd、マイクロ波電力を0.01〜
2W/cdの範囲内とするのが好ましく、ガス圧を0.
03〜1.5 トールとし、高周波電力を、0.05
〜1W/cn!、マイクロ波電力を0.05〜I W
/ an!の範囲内とするのがより好ましい。また、こ
のようにして形成される表面に凹凸を有するプラズマ重
合膜層の膜厚は、50〜1000人の範囲内であること
が好ましく、膜厚が薄すぎると充分な凹凸を有するプラ
ズマ重合膜層が得られず、走行性および耐久性が充分に
向上されない。また厚すぎると内部応力によりクラック
が生じ好ましくない。The proportion of metal fine particles in the plasma polymerized film layer formed in this way is preferably within the range of 10 to 70% by weight based on the total components of the plasma polymerized film layer,
If the amount is too small or too large, unevenness cannot be formed satisfactorily on the surface. In addition, the unevenness on the surface of the plasma polymerized film layer is
The width within the range of 0.01 to 0.20 μm is 1×10
It is preferable that 12 to 1×10 14 pieces/cd are formed. If the width is too narrow or too small, the desired effect cannot be obtained, and if the width is too wide or too large, it will adversely affect the electromagnetic conversion characteristics. The width and number of these irregularities are controlled by controlling the gas pressure, high frequency power, microwave power, etc. when simultaneously performing metal heating evaporation and plasma polymerization. When polymerization is performed simultaneously, the gas pressure, high frequency power, and microwave power form good irregularities on the surface of the plasma polymerized protective film layer, and also improve the adhesion between the plasma polymerized film layer containing fine metal particles and the magnetic layer. In order to improve
It is preferably within the range of 2W/cd, and the gas pressure is 0.
03 to 1.5 torr, and the high frequency power is 0.05
~1W/cn! , the microwave power is 0.05~I W
/an! It is more preferable to set it within the range of . In addition, the thickness of the plasma polymerized film layer formed in this manner with an uneven surface is preferably within the range of 50 to 1000 layers, and if the film thickness is too thin, the plasma polymerized film layer with sufficient unevenness No layer is obtained, and runnability and durability are not sufficiently improved. Moreover, if it is too thick, cracks may occur due to internal stress, which is not preferable.
このようにして形成されたプラズマ重合膜層上に形成さ
れる磁性層は、γ−Fe203粉末、Fe3O4粉末、
Co含有r−Fe203粉末、CO含有Fe3O4粉末
、Fe粉末、CO粉末、Fe−Ni粉末などの磁性粉末
を結合剤成分および有R?g剤等とともに基体上に塗布
、乾燥するか、あるいは、Co、Fe、Ni、Co−N
i合金、Co−Cr合金、Co−P合金、Co−N1−
P合金などの強磁性材を、真空蒸着、イオンブレーティ
ング、スパッタリング、メッキ等の手段によって基体上
に被着するなどの方法で形成される。The magnetic layer formed on the plasma polymerized film layer thus formed consists of γ-Fe203 powder, Fe3O4 powder,
Magnetic powders such as Co-containing r-Fe203 powder, CO-containing Fe3O4 powder, Fe powder, CO powder, and Fe-Ni powder are combined with the binder component and R? Co, Fe, Ni, Co-N, Co, Fe, Ni, Co-N, etc.
i alloy, Co-Cr alloy, Co-P alloy, Co-N1-
It is formed by depositing a ferromagnetic material such as P alloy on a substrate by means such as vacuum evaporation, ion blasting, sputtering, or plating.
このようにして形成された磁性層は、さらに潤滑剤層が
積層されると摩擦係数がさらに低減されて耐久性が一段
と向上される。磁性層上に積層形成される潤滑剤層は、
潤滑剤を、たとえば、メチルイソブチルケトン、メチル
エチルケトン、イソプロピルアルコール、ベンゼン、ト
ルエン、フレオン、シクロヘキサノン、酢酸エチル、テ
トラヒドロフラン、ジメチルホルムアミド、ジオキサン
等の適当な溶剤に溶解し、溶解によって得られた溶液中
に磁性層を浸漬するか、或いは上記溶液を予め形成され
た磁性層上に塗布または噴霧するなどの方法で被着され
、さらに潤滑剤を、プラズマ重合、CVD、スパッタリ
ング、真空蒸着等の方法で磁性層上に被着する方法でも
被着される。When the magnetic layer thus formed is further laminated with a lubricant layer, the friction coefficient is further reduced and the durability is further improved. The lubricant layer laminated on the magnetic layer is
A lubricant is dissolved in a suitable solvent such as methyl isobutyl ketone, methyl ethyl ketone, isopropyl alcohol, benzene, toluene, freon, cyclohexanone, ethyl acetate, tetrahydrofuran, dimethylformamide, dioxane, etc., and a magnetic material is added to the solution obtained by dissolving the lubricant. The magnetic layer is deposited by dipping the layer, or by coating or spraying the solution on the preformed magnetic layer, and then a lubricant is applied to the magnetic layer by a method such as plasma polymerization, CVD, sputtering, or vacuum deposition. It can also be deposited by a method of depositing on top.
使用される潤滑剤としては、脂肪族系潤滑剤、フッ素系
潤滑剤、シリコーン系潤滑剤および炭化水素系潤滑剤等
がいずれも好適なものとして使用され、脂肪族系潤滑剤
としては、ラウリン酸、ミリスチン酸、パルミチン酸、
ステアリン酸、ベヘン酸等の脂肪酸、ステアリン酸亜鉛
、ステアリン酸コバルト等の脂肪酸の金属塩、ステアリ
ン酸−n−ブチル、ミリスチン酸オクチル等の脂肪酸エ
ステル、ステアリルアルコール、ミリスチルアルコール
等の脂肪族アルコール、トリメチルステアリルアンモニ
ウムクロライド、塩化ステアロイル等の塩化物、ステア
リルアミン、ステアリルアミンアセテート、ステアリル
アミンハイドロクロライド等のアミン等が挙げられる。Suitable lubricants used include aliphatic lubricants, fluorine-based lubricants, silicone-based lubricants, and hydrocarbon-based lubricants. Among the aliphatic lubricants, lauric acid , myristic acid, palmitic acid,
Fatty acids such as stearic acid and behenic acid, metal salts of fatty acids such as zinc stearate and cobalt stearate, fatty acid esters such as n-butyl stearate and octyl myristate, fatty alcohols such as stearyl alcohol and myristyl alcohol, trimethyl Examples include chlorides such as stearyl ammonium chloride and stearoyl chloride, and amines such as stearylamine, stearylamine acetate, and stearylamine hydrochloride.
またフッ素系潤滑剤としては、パーフルオロポリエーテ
ル、パーフルオロアルキルポリエーテルなどが好適なも
のとして使用され、市販品の具体例としては、ダイキン
社製グイフロイル#20、デュポン社製タライトックス
M1クライトソクスI(、パイダックスAR、モンテジ
ソン社製フォンブリンZ等が挙げられる。さらにシリコ
ーン系潤滑剤としては、シリコーンオイル、変性シリコ
ーンオイル等が挙げられ、炭化水素系潤滑剤としては、
パラフィン、スクアラン、ワックス等が挙げられる。な
お、これらの潤滑剤のうち、極性基を有するものは磁性
層との密着性がよく、特に摩擦係数を下げる効果がある
ためより好ましく使用される。As the fluorine-based lubricant, perfluoropolyether, perfluoroalkyl polyether, etc. are preferably used, and specific examples of commercially available products include Guyfroil #20 manufactured by Daikin Corporation and Talytox M1 Clytox I manufactured by DuPont. Examples of silicone lubricants include silicone oil, modified silicone oil, etc., and hydrocarbon lubricants include:
Examples include paraffin, squalane, wax, and the like. Among these lubricants, those having polar groups are more preferably used because they have good adhesion to the magnetic layer and are particularly effective in lowering the coefficient of friction.
使用に際しては、その1種または2種以上が混合して使
用され、また被着量は、磁性層上に20〜200人の被
膜が形成される範囲内で被着させるのが好ましく、20
人より膜厚が薄いと所期の効果が得られず、200人よ
り膜厚が厚いとスペーシングロスが大きくなりすぎて電
気的特性に悪影響を及ぼす。When used, one type or a mixture of two or more of them is used, and the amount of coating is preferably within the range of forming a film of 20 to 200 layers on the magnetic layer.
If the thickness is thinner than 200 mm, the desired effect cannot be obtained, and if the thickness is thicker than 200 mm, the spacing loss will be too large, which will adversely affect the electrical characteristics.
このようにして形成される磁気記録媒体としては、ポリ
エステルフィルム、ポリイミドフィルムなどの合成樹脂
フィルムを基体とする磁気テープ、合成樹脂フィルム、
アルミニウム板およびガラス板等からなる円盤やドラム
を基体とする磁気ディスクや磁気ドラムなど、磁気ヘッ
ドと摺接する構造の種々の形態を包含する。Magnetic recording media formed in this way include magnetic tapes based on synthetic resin films such as polyester films and polyimide films, synthetic resin films,
It includes various forms of structures that come into sliding contact with a magnetic head, such as magnetic disks and magnetic drums whose bases are disks and drums made of aluminum plates, glass plates, etc.
次に、この発明の実施例について説明する。 Next, embodiments of the invention will be described.
実施例1
第1図に示すプラズマ処理装置を使用し、厚さ10μm
のポリエステルフィルムlを処理槽2内の原反ロール3
からガイドロール4を介し、円筒状キャン5に沿って2
m/分の速度で移動させ、さらにガイドロール6を介し
て巻き取りロール7に巻き取るようにセントした。続い
て、円筒状キャン5の下方に配設した金属蒸発源8で亜
鉛9を電子銃で加熱蒸発させると同時に、処理槽2に取
りつけたガス導入管10から処理槽2内にメタンのモノ
マーガスを100secmの流量で導入して、ガス圧を
0.07トールとし、電極11に13.56MHzの高
周波を100Wで印加してプラズマ重合を行い、プラズ
マ重合膜層を形成した。このときのプラズマ重合膜層の
層厚は300人で、亜鉛および亜鉛酸化物の微粒子を含
み、表面に幅0.03μmの凹凸が1.3X 1013
個/d形成されていた。次いで、このプラズマ重合膜層
を形成したポリエステルフィルムを真空蒸着装置に装填
し、lXl0−5トールの真空下でコバルトを加熱蒸発
させて、ポリエステルフィルム上に厚さ1500人のコ
バルトからなる強磁性金属薄膜層を形成した。しかる後
、所定の幅に裁断して、第2図に示すようなポリエステ
ルフィルム1上に凹凸を有する金属微粒子含有プラズマ
重合膜層14および強磁性金属薄膜層15を順次に積層
形成した磁気テープAをつくった。なお、第1図中12
は処理槽2内を減圧するための排気系であり、13は電
極11に高周波を印加するための高周波電源である。Example 1 Using the plasma processing apparatus shown in FIG.
The polyester film l is placed in the raw roll 3 in the processing tank 2.
2 along the cylindrical can 5 via the guide roll 4.
The film was moved at a speed of m/min, and further wound onto a winding roll 7 via a guide roll 6. Next, zinc 9 is heated and evaporated with an electron gun in a metal evaporation source 8 disposed below the cylindrical can 5, and at the same time, methane monomer gas is introduced into the processing tank 2 from a gas introduction pipe 10 attached to the processing tank 2. was introduced at a flow rate of 100 seconds, the gas pressure was set to 0.07 Torr, and a high frequency of 13.56 MHz was applied to the electrode 11 at 100 W to perform plasma polymerization to form a plasma polymerized film layer. The thickness of the plasma polymerized film layer at this time was 300 mm, containing fine particles of zinc and zinc oxide, and having irregularities of 0.03 μm in width on the surface of 1.3×1013
pcs/d were formed. Next, the polyester film with the plasma-polymerized film layer formed thereon was loaded into a vacuum evaporation device, and the cobalt was heated and evaporated under a vacuum of lXl0-5 torr to form a ferromagnetic metal made of cobalt with a thickness of 1500 μm on the polyester film. A thin film layer was formed. Thereafter, the magnetic tape A is cut to a predetermined width, and a plasma polymerized film layer 14 containing uneven metal particles and a ferromagnetic metal thin film layer 15 are sequentially laminated on a polyester film 1 as shown in FIG. I made it. In addition, 12 in Figure 1
1 is an exhaust system for reducing the pressure inside the processing tank 2, and 13 is a high frequency power source for applying high frequency to the electrode 11.
実施例2
実施例1におけるプラズマ重合膜層の形成において、亜
鉛に代えてアルミニウムを加熱蒸発させた以外は、実施
例1と同様にして基体上に、厚さ400人で、アルミニ
ウムおよびアルミニウム酸化物の微粒子を含み、幅0.
05μmの凹凸が2.1×1013個/d形成されたプ
ラズマ重合膜層を形成し、磁気テープAをつくった。Example 2 Aluminum and aluminum oxide were deposited on the substrate to a thickness of 400 mm in the same manner as in Example 1, except that aluminum was heated and evaporated instead of zinc in the formation of the plasma polymerized film layer in Example 1. Contains fine particles with a width of 0.
A magnetic tape A was prepared by forming a plasma polymerized film layer having 2.1×10 13/d of unevenness of 0.5 μm.
実施例3
実施例1におけるプラズマ重合膜層の形成において、メ
タンのモノマーガスに代えて、テトラメチルシランのモ
ノマーガスを200 secmの流量で導入した以外は
、実施例1と同様にして基体上に、厚さ300人で、亜
鉛および亜鉛酸化物の微粒子を含み、幅0.02μmの
凹凸が4×1013個/ crA形成されたプラズマ重
合膜層を形成し、磁気テープAをつくった。Example 3 A plasma-polymerized film layer was formed on the substrate in the same manner as in Example 1, except that tetramethylsilane monomer gas was introduced at a flow rate of 200 seconds instead of methane monomer gas. A magnetic tape A was produced by forming a plasma polymerized film layer having a thickness of 300 mm, containing fine particles of zinc and zinc oxide, and having 4×1013 unevenness/crA with a width of 0.02 μm.
実施例4
実施例1において、強磁性金属薄膜層を形成した後、さ
らにこの強磁性金属薄膜層上に、ステアリン酸の0.1
重量%トルエン溶液を塗布、乾燥して、ステアリン酸か
らなる厚さ50人の潤滑剤層を形成した以外は、実施例
1と同様にして第3図に示すような、ポリエステルフィ
ルム1上に、凹凸を有する金属微粒子含有プラズマ重合
膜ML4、強磁性金属薄膜層15、および潤滑剤層16
を順次に積層形成した磁気テープBをつくった。Example 4 In Example 1, after forming the ferromagnetic metal thin film layer, 0.1% of stearic acid was further applied on the ferromagnetic metal thin film layer.
On a polyester film 1 as shown in FIG. 3 in the same manner as in Example 1 except that a 50% by weight toluene solution was applied and dried to form a 50 mm thick lubricant layer made of stearic acid, Plasma polymerized film ML4 containing metal fine particles having irregularities, ferromagnetic metal thin film layer 15, and lubricant layer 16
A magnetic tape B was prepared by sequentially laminating the following layers.
実施例5
実施例2において、強磁性金属薄膜層を形成した後、さ
らにこの強磁性金属薄膜層上に、ステアリン酸の0.1
重量%トルエン溶液を塗布、乾燥して、ステアリン酸か
らなる厚さ50人の潤滑剤層を形成した以外は、実施例
2と同様にして第3図に示すような磁気テープBをつく
った。Example 5 In Example 2, after forming the ferromagnetic metal thin film layer, 0.1% of stearic acid was further applied on the ferromagnetic metal thin film layer.
A magnetic tape B as shown in FIG. 3 was prepared in the same manner as in Example 2, except that a 50% by weight toluene solution was applied and dried to form a 50 mm thick lubricant layer made of stearic acid.
実施例6
実施例3において、強磁性全屈薄膜層を形成した後、さ
らにこの強磁性金属薄膜層上に、ステアリン酸の0.1
重量%トルエン溶液を塗布、乾燥して、ステアリン酸か
らなる厚さ50人の潤滑剤層を形成した以外は、実施例
3と同様にして第3図に示すような磁気テープBをつく
った。Example 6 In Example 3, after forming the ferromagnetic fully refracting thin film layer, 0.1% of stearic acid was further applied on the ferromagnetic metal thin film layer.
A magnetic tape B as shown in FIG. 3 was prepared in the same manner as in Example 3, except that a 50% by weight toluene solution was applied and dried to form a lubricant layer of stearic acid with a thickness of 50 mm.
実施例7
α−Fe磁性粉末 600重量部エスレッ
クCN(積木化学工業 80〃社製、塩化ビニル−酢
酸ヒニ
ル共重合体)
バンデソクスT−5250(大 30〃日本インキ化
学工業社製、ウ
レタンエラストマー)
コロネートL(日本ポリウレタ 10〃ン工業社製、
三官能性低分子
量イソシアネート化合物)
メチルイソブチルケトン 400〃トルエン
400〃この組成物をボールミル中
で72時間混合分散して磁性塗料を調製し、この磁性塗
料を、実施例1でポリエステルフィルム上に形成したプ
ラズマ重合膜層上に、乾燥厚が4μmとなるように塗布
、乾燥して磁性層を形成した以外は、実施例1と同様に
して磁気テープをつくった。Example 7 α-Fe magnetic powder 600 parts by weight S-LEC CN (manufactured by Miki Kagaku Kogyo 80, vinyl chloride-hinyl acetate copolymer) Bandesox T-5250 (large 30, manufactured by Nippon Ink Chemical Co., Ltd., urethane elastomer) Coronate L (manufactured by Nippon Polyurethane Industry Co., Ltd.,
Trifunctional low molecular weight isocyanate compound) Methyl isobutyl ketone 400〃Toluene
400 This composition was mixed and dispersed in a ball mill for 72 hours to prepare a magnetic paint, and this magnetic paint was applied onto the plasma polymerized film layer formed on the polyester film in Example 1 so that the dry thickness was 4 μm. A magnetic tape was produced in the same manner as in Example 1, except that the magnetic layer was formed by coating and drying.
実施例8
実施例7において、磁性層を形成した後、さらにこの磁
性層上に、ステアリン酸の0.1重量%トルエン溶液を
塗布、乾燥して、ステアリン酸からなる厚さ50人の潤
滑剤層を形成した以外は、実施例7と同様にして磁気テ
ープをつくった。Example 8 After forming the magnetic layer in Example 7, a 0.1% by weight toluene solution of stearic acid was applied on the magnetic layer and dried to form a lubricant made of stearic acid with a thickness of 50 mm. A magnetic tape was produced in the same manner as in Example 7 except that the layers were formed.
比較例1
実施例1において、プラズマ重合膜層の形成を省いた以
外は実施例1と同様にして磁気テープをつくった。Comparative Example 1 A magnetic tape was produced in the same manner as in Example 1 except that the formation of the plasma polymerized film layer was omitted.
比較例2
実施例4において、プラズマ重合膜層の形成を省いた以
外は実施例4と同様にして磁気テープをつくった。Comparative Example 2 A magnetic tape was produced in the same manner as in Example 4 except that the formation of the plasma polymerized film layer was omitted.
比較例3
実施例7において、プラズマ重合膜層の形成を省いた以
外は実施例7と同様にして磁気テープをつくった。Comparative Example 3 A magnetic tape was produced in the same manner as in Example 7 except that the formation of the plasma polymerized film layer was omitted.
比較例4
実施例8において、プラズマ重合膜層の形成を省いた以
外は実施例8と同様にして磁気テープをつくった。Comparative Example 4 A magnetic tape was produced in the same manner as in Example 8 except that the formation of the plasma polymerized film layer was omitted.
各実施例および各比較例で得られた磁気テープについて
、摩擦係数を測定し、耐久性を試験した。耐久性試験は
、スチル試験機でスチル寿命を測定して行った。The coefficient of friction was measured for the magnetic tapes obtained in each Example and each Comparative Example, and the durability was tested. The durability test was conducted by measuring the still life using a still testing machine.
下記第1表はその結果である。Table 1 below shows the results.
第1表
〔発明の効果〕
上表から明らかなように、この発明で得られた磁気テー
プ(実施例1ないし8)は、いずれも比較例1ないし4
で得られた磁気テープに比し、摩擦係数が小さくて、ス
チル寿命が長く、このことからこの発明によって得られ
る磁気記録媒体は、−段と耐久性に優れていることがわ
かる。Table 1 [Effects of the Invention] As is clear from the above table, the magnetic tapes obtained according to the present invention (Examples 1 to 8) are the same as Comparative Examples 1 to 4.
Compared to the magnetic tape obtained by the present invention, the coefficient of friction is smaller and the still life is longer, which indicates that the magnetic recording medium obtained by the present invention is significantly more durable.
第1図はプラズマ処理装置の1例を示す概略断面図、第
2図および第3図はこの発明によって得られた磁気テー
プの部分拡大断面図である。
1・・・ポリエステルフィルム(基体)、14・・・プ
ラズマ重合膜層、15・・・強磁性金属薄膜層(磁性層
)、16・・・潤滑剤層、A、B・・・磁気テープ(磁
気記録媒体)
特許出願人 日立マクセル株式会社
第1図FIG. 1 is a schematic sectional view showing one example of a plasma processing apparatus, and FIGS. 2 and 3 are partially enlarged sectional views of a magnetic tape obtained according to the present invention. DESCRIPTION OF SYMBOLS 1... Polyester film (substrate), 14... Plasma polymerized film layer, 15... Ferromagnetic metal thin film layer (magnetic layer), 16... Lubricant layer, A, B... Magnetic tape ( (Magnetic recording media) Patent applicant Hitachi Maxell Ltd. Figure 1
Claims (1)
したプラズマ重合膜層を形成し、このプラズマ重合膜層
上に磁性層を設けたことを特徴とする磁気記録媒体 2、基体上に金属微粒子を含有させて表面に凹凸を形成
したプラズマ重合膜層を形成し、このプラズマ重合膜層
上に磁性層を設け、さらにこの磁性層上に潤滑剤層を設
けたことを特徴とする磁気記録媒体 3、基体を真空雰囲気内で有機化合物のモノマーガスの
プラズマ中にさらしてプラズマ重合を行うと同時に、金
属を加熱蒸発させて得た蒸気流を基体に差し向けて、金
属微粒子を含有させて表面に凹凸を形成したプラズマ重
合膜層を基体上に形成し、次いで、このプラズマ重合膜
層上に磁性層を形成することを特徴とする磁気記録媒体
の製造方法 4、基体を真空雰囲気内で有機化合物のモノマーガスの
プラズマ中にさらしてプラズマ重合を行うと同時に、金
属を加熱蒸発させて得た蒸気流を基体に差し向けて、金
属微粒子を含有させて表面に凹凸を形成したプラズマ重
合膜層を基体上に形成し、次いで、このプラズマ重合膜
層上に磁性層を形成し、さらにこの磁性層上に潤滑剤層
を形成することを特徴とする磁気記録媒体の製造方法[Claims] 1. Magnetic recording characterized in that a plasma polymerized film layer containing fine metal particles and having an uneven surface is formed on a substrate, and a magnetic layer is provided on the plasma polymerized film layer. Medium 2: A plasma polymerized film layer containing fine metal particles and having an uneven surface was formed on the substrate, a magnetic layer was provided on the plasma polymerized film layer, and a lubricant layer was further provided on the magnetic layer. A magnetic recording medium 3 characterized in that a substrate is exposed to plasma of a monomer gas of an organic compound in a vacuum atmosphere to perform plasma polymerization, and at the same time, a vapor flow obtained by heating and evaporating the metal is directed toward the substrate. A method for manufacturing a magnetic recording medium 4, which comprises forming a plasma polymerized film layer containing fine metal particles to form an uneven surface on a substrate, and then forming a magnetic layer on this plasma polymerized film layer. , the substrate is exposed to a plasma of monomer gas of an organic compound in a vacuum atmosphere to perform plasma polymerization, and at the same time, a vapor flow obtained by heating and evaporating the metal is directed toward the substrate to contain fine metal particles and coat the surface. A magnetic recording medium characterized in that a plasma polymerized film layer with unevenness is formed on a substrate, a magnetic layer is then formed on this plasma polymerized film layer, and a lubricant layer is further formed on this magnetic layer. manufacturing method
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20617886A JPS6361417A (en) | 1986-09-01 | 1986-09-01 | Magnetic recording medium and its production |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20617886A JPS6361417A (en) | 1986-09-01 | 1986-09-01 | Magnetic recording medium and its production |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6361417A true JPS6361417A (en) | 1988-03-17 |
Family
ID=16519103
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20617886A Pending JPS6361417A (en) | 1986-09-01 | 1986-09-01 | Magnetic recording medium and its production |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6361417A (en) |
-
1986
- 1986-09-01 JP JP20617886A patent/JPS6361417A/en active Pending
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