JPS6357774B2 - - Google Patents

Info

Publication number
JPS6357774B2
JPS6357774B2 JP17816881A JP17816881A JPS6357774B2 JP S6357774 B2 JPS6357774 B2 JP S6357774B2 JP 17816881 A JP17816881 A JP 17816881A JP 17816881 A JP17816881 A JP 17816881A JP S6357774 B2 JPS6357774 B2 JP S6357774B2
Authority
JP
Japan
Prior art keywords
layout
point
information
image
original
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP17816881A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5890640A (ja
Inventor
Kazuya Kitagawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP56178168A priority Critical patent/JPS5890640A/ja
Publication of JPS5890640A publication Critical patent/JPS5890640A/ja
Publication of JPS6357774B2 publication Critical patent/JPS6357774B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/90Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by montage processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Editing Of Facsimile Originals (AREA)
JP56178168A 1981-11-06 1981-11-06 画像処理方法 Granted JPS5890640A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56178168A JPS5890640A (ja) 1981-11-06 1981-11-06 画像処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56178168A JPS5890640A (ja) 1981-11-06 1981-11-06 画像処理方法

Publications (2)

Publication Number Publication Date
JPS5890640A JPS5890640A (ja) 1983-05-30
JPS6357774B2 true JPS6357774B2 (US20110009641A1-20110113-C00256.png) 1988-11-14

Family

ID=16043798

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56178168A Granted JPS5890640A (ja) 1981-11-06 1981-11-06 画像処理方法

Country Status (1)

Country Link
JP (1) JPS5890640A (US20110009641A1-20110113-C00256.png)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0262770U (US20110009641A1-20110113-C00256.png) * 1988-10-28 1990-05-10
JPH0262768U (US20110009641A1-20110113-C00256.png) * 1988-10-28 1990-05-10

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0763173B2 (ja) * 1985-05-23 1995-07-05 大日本印刷株式会社 スキヤナ用原稿角度貼りゲ−ジの作成装置
JPS61295758A (ja) * 1985-06-24 1986-12-26 Dainippon Printing Co Ltd スキヤナ用原稿貼付シ−トの作成装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5231762A (en) * 1975-09-05 1977-03-10 Hitachi Ltd Method of measuring thickness and composition of thin film formed on s ubstrate
JPS5276836A (en) * 1975-12-23 1977-06-28 Fujitsu Ltd Information input unit
JPS5550235A (en) * 1978-10-05 1980-04-11 Toppan Printing Co Ltd Determining method and apparatus of reference line for halftone photography

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5231762A (en) * 1975-09-05 1977-03-10 Hitachi Ltd Method of measuring thickness and composition of thin film formed on s ubstrate
JPS5276836A (en) * 1975-12-23 1977-06-28 Fujitsu Ltd Information input unit
JPS5550235A (en) * 1978-10-05 1980-04-11 Toppan Printing Co Ltd Determining method and apparatus of reference line for halftone photography

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0262770U (US20110009641A1-20110113-C00256.png) * 1988-10-28 1990-05-10
JPH0262768U (US20110009641A1-20110113-C00256.png) * 1988-10-28 1990-05-10

Also Published As

Publication number Publication date
JPS5890640A (ja) 1983-05-30

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