JPS6355744A - Auto-tracking mechanism - Google Patents

Auto-tracking mechanism

Info

Publication number
JPS6355744A
JPS6355744A JP19985686A JP19985686A JPS6355744A JP S6355744 A JPS6355744 A JP S6355744A JP 19985686 A JP19985686 A JP 19985686A JP 19985686 A JP19985686 A JP 19985686A JP S6355744 A JPS6355744 A JP S6355744A
Authority
JP
Japan
Prior art keywords
electron
tracking
electron beam
electron beams
auto
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19985686A
Other languages
Japanese (ja)
Other versions
JP2715070B2 (en
Inventor
Yasuhiko Ishiwatari
恭彦 石渡
Ryuichi Arai
竜一 新井
Mamoru Miyawaki
守 宮脇
Yukio Masuda
増田 幸男
Nobutoshi Mizusawa
水澤 伸俊
Hitoshi Oda
織田 仁
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP61199856A priority Critical patent/JP2715070B2/en
Publication of JPS6355744A publication Critical patent/JPS6355744A/en
Priority to US07/972,732 priority patent/US5270990A/en
Application granted granted Critical
Publication of JP2715070B2 publication Critical patent/JP2715070B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Optical Recording Or Reproduction (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To use one electron beam for detecting a tracking signal and to precisely converge the other electron beams in their recording positions in terms of a recording and reproducing device employing a host of electron beams. CONSTITUTION:Among plural electron beams coming out of an electron beam head 3, one is used for detecting the tracking signal and projected on an autotracking detection groove 2. A secondary electron detector 8 detects the intensity of a secondary electron generated in the groove 2. A signal from the detector 8 is fed back. A deflecting electromagnetic lens 5 adjusts the deflection of the electron beam concerned, and attains a state where tracking is removed. Thus the remaining electron beams are deflected as the same as the beam for detecting the tracking signal, and therefore all the electron beams can be precisely recorded in their recording positions.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、電子ビームを用いた記録再生装置におけるオ
ートトラッキング機構に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an auto-tracking mechanism in a recording/reproducing apparatus using an electron beam.

[従来の技術] 電子ビームを用いた記録再生装置において、電子ビーム
発生源から出射された電子ビームが、電磁レンズ、収束
レンズを経て集束されて記録媒体に達する際に、高密度
記録会再生を高い信号対雑音比(S/N比)で実行する
ためには、電子ビームの集束位音を記録媒体上の情報記
録位置に常に一致させる高精度のトラッキング技術が必
要である。特に、多数の電子ビームを用いて並列的に同
時に記録争再生するシステムでは、多数の電子ビームを
同時に各電子ビームに対応する記録位置に正確に集束さ
せなければならず、より精密なオートトラッキング機構
が必要となるが、現在このための適当な手法は見い出さ
れていない。
[Prior Art] In a recording/reproducing device using an electron beam, when the electron beam emitted from an electron beam generation source passes through an electromagnetic lens and a converging lens and is focused on a recording medium, high-density recording reproduction is performed. In order to perform with a high signal-to-noise ratio (S/N ratio), a highly accurate tracking technique is required to always align the focused position of the electron beam with the information recording position on the recording medium. In particular, in a system that uses multiple electron beams to play back records simultaneously in parallel, it is necessary to accurately focus the multiple electron beams on the recording position corresponding to each electron beam at the same time, and a more precise auto-tracking mechanism is required. is required, but no suitable method has been found at present.

[発明の目的] 本発明の目的は、多数の電子ビームを用いた記録再生装
置において、1つの電子ビームをトラッキング信号検出
用として用いて帰還をかけ、他の全ての電子ビームを各
記録地点に正確に集束させるオートトラッキング機構を
提供することにある。
[Object of the Invention] An object of the present invention is to use one electron beam for tracking signal detection in a recording and reproducing apparatus using a large number of electron beams, and to send all other electron beams to each recording point. The object of the present invention is to provide an auto-tracking mechanism that allows accurate focusing.

[発明の概要] 上述の目的を達成するための本発明の要旨は、多数の電
子ビームを出力する電子ビームヘッドを有する記録再生
装置において、記録媒体上に形成したトラッキングパタ
ーン部分に前記電子ビームの内の1つの電子ビームを照
射し、該パターン部分から発生する二次電子の二次電子
強度を検出器により検出してトラッキング信号とするこ
とを特徴とするオートトラッキング機構である。
[Summary of the Invention] The gist of the present invention for achieving the above-mentioned object is to provide a recording/reproducing apparatus having an electron beam head that outputs a large number of electron beams, in which the electron beams are applied to a tracking pattern portion formed on a recording medium. This is an auto-tracking mechanism characterized in that one of the electron beams is irradiated, and the intensity of the secondary electrons generated from the pattern portion is detected by a detector and used as a tracking signal.

[発明の実施例] 本発明を図示の実施例に基づいて詳細に説明する。[Embodiments of the invention] The present invention will be explained in detail based on illustrated embodiments.

第1図は電子ビーム記録再生装置の構成図である。1は
平板状の記録媒体であり、その上面に電子ビームにより
記録される部分を有し、更にエツチング等によって形成
されたオートトラッキング信号検出用の溝2が形成され
ている。また、記録媒体1の上方には、多数の電子ビー
ムを発生する固体電子ビームヘッド3が配置され、電子
ビームへラド3と記録媒体1間の両側に、複数の電子ビ
ームを集束するための集束用電磁レンズ4、集束された
電子ビームを偏向するための偏向用電磁レンズ5が設け
られている。なお、6は記録媒体1からの信号処理部、
7は電子ビーム偏向用の制御部7であり、制御部7はオ
ートトラッキング信号検出用溝2に電子ビームが照射さ
れた際に発生する二次電子を検出する検出°器8からの
信号を基に、偏向用電磁レンズ5の駆動制御装置9を制
御するようになっている。なお、10は集束用電磁、レ
ンズ4の駆動制御装置である。
FIG. 1 is a block diagram of an electron beam recording/reproducing apparatus. Reference numeral 1 denotes a flat recording medium, which has a portion recorded by an electron beam on its upper surface, and is further provided with a groove 2 for detecting an auto-tracking signal formed by etching or the like. Further, a solid-state electron beam head 3 that generates a large number of electron beams is arranged above the recording medium 1, and a focusing head 3 for focusing the plurality of electron beams is placed on both sides between the electron beam head 3 and the recording medium 1. A deflection electromagnetic lens 4 and a deflection electromagnetic lens 5 for deflecting the focused electron beam are provided. Note that 6 is a signal processing unit from the recording medium 1;
7 is a control unit 7 for electron beam deflection, and the control unit 7 is based on a signal from a detector 8 that detects secondary electrons generated when the auto-tracking signal detection groove 2 is irradiated with an electron beam. In addition, a drive control device 9 for the deflection electromagnetic lens 5 is controlled. Note that 10 is a focusing electromagnetic device and a drive control device for the lens 4.

このような構成において、電子ビームへラド3から出射
した電子ビームは集束用電磁レンズ4でそれぞれ集束さ
れ、更に偏向用電磁レンズ5で所望の記録位置に向けて
偏向される。そして、電子ビームのうちの1つはトラッ
キング信号検出専用に用いられ、オートトラッキング信
号検出用溝2を照射するようになっている。この電子ビ
ームとトラッキング信号検出用溝2が、第2図(a)に
示すような関係にあるときをトラッキングがとれている
状態とし、(b)に示すように電子ビームがトラッキン
グ信号検出用溝2から外れた位置を照射しているときを
トラッキングがとれていない状態とする。
In such a configuration, the electron beams emitted from the RAD 3 are respectively focused by the focusing electromagnetic lens 4, and further deflected by the deflection electromagnetic lens 5 toward a desired recording position. One of the electron beams is used exclusively for tracking signal detection, and is designed to irradiate the auto-tracking signal detection groove 2. Tracking is achieved when the electron beam and the tracking signal detection groove 2 are in the relationship as shown in FIG. 2(a), and as shown in FIG. A state in which tracking is not achieved is when a position outside of 2 is irradiated.

一般にS E M (Scanning Electr
on Nicrograph)観察における二次電子像
では、試料端又は凸部の角で二次電子の検出量が多くな
り、明るく輝くエツジ効果が知られているが、第2図(
b)の状態では表面以外に側面からも二次電子が放出さ
れるので、(a)の状態に比べると二次電子検出量が増
加している。従って、トラッキングがとれているか否か
により二次電子検出量が大きく異なり、電子検出器8か
らの信号を帰還して制御@!&7、駆動制御装置9を介
して偏向用電磁レンズ5により電子ビームの偏向を調整
し、常に(a)の状態になるようにすると、残りの電子
ビームもトラッキング信号検出用電子ビームと全く同じ
偏向を受けるので、全電子ビームをそれぞれの記録位置
に正確に一致させることができる。
Generally, SEM (Scanning Electr
In secondary electron images observed in on nicrographs, it is known that there is an edge effect in which the amount of secondary electrons detected increases at the edges of the sample or at the corners of convex parts, causing them to shine brightly.
In state b), secondary electrons are emitted not only from the surface but also from the side surfaces, so the amount of detected secondary electrons is increased compared to state (a). Therefore, the amount of secondary electrons detected varies greatly depending on whether tracking is achieved or not, and the signal from the electron detector 8 is fed back to control @! &7. If the deflection of the electron beam is adjusted by the deflection electromagnetic lens 5 via the drive control device 9 so that it is always in the state (a), the remaining electron beams will have exactly the same deflection as the tracking signal detection electron beam. Therefore, all electron beams can be precisely aligned with each recording position.

第3図にオートトラッキング信号検出用溝2の幾つかの
形態について示す、第3図(a)は記録媒体1の表面に
エツチング等によって掘られた溝2である。第3図(b
)においては、(a)と同様な溝2の内面に記録媒体1
の表面よりも電子ビーム照射に対して二次電子放出効率
の高い物質11が蒸着法やスパッタ法を用いて被膜され
ている。この(b)に示した溝2を用いると、溝2の内
部全面に渡って二次電子放出量が第3図(a)に示した
溝2を用いたときよりも多くなるため、S/N比の高い
トラッキング信号を得ることができる。更に、第3図(
C)に示すオートトラッキング信号検出用溝2は、溝2
の外側のエツジだけに二次電子放出効果の高い物質11
が被膜されているが、この場合も勿論同様の効果が得ら
れる。
FIG. 3 shows several forms of the auto-tracking signal detection groove 2. FIG. 3(a) shows the groove 2 dug on the surface of the recording medium 1 by etching or the like. Figure 3 (b
), the recording medium 1 is placed on the inner surface of the groove 2 similar to (a).
A substance 11 having a higher secondary electron emission efficiency than the surface of the substrate 11 when irradiated with an electron beam is coated using a vapor deposition method or a sputtering method. When the groove 2 shown in FIG. 3(b) is used, the amount of secondary electrons emitted over the entire interior of the groove 2 is larger than when the groove 2 shown in FIG. 3(a) is used, so the S/ A tracking signal with a high N ratio can be obtained. Furthermore, Figure 3 (
The auto tracking signal detection groove 2 shown in C) is the groove 2.
Substance 11 that has a high secondary electron emission effect only at the outer edges of
Of course, the same effect can be obtained in this case as well.

即ち、第2図に示すようにトラッキングがとれている状
態では二次電子放出2が少なく、第2図(b)のように
トラッキングがとれていない状態になると、二次電子放
出効果の高い物質11に電子ビームが照射されることに
なるので、二次電子放出量が物質11を用いないときよ
りも多くなり、よりS/N比の高いトラッキング信号が
得られる。
That is, in a state where tracking is achieved as shown in Figure 2, secondary electron emission 2 is small, and when tracking is not achieved as shown in Figure 2(b), the material has a high secondary electron emission effect. Since the material 11 is irradiated with the electron beam, the amount of secondary electrons emitted is greater than when the material 11 is not used, and a tracking signal with a higher S/N ratio can be obtained.

また、上述の実施例では溝2の断面形状を四角形とした
が、これは断面半円形、半楕円形、三角形など任意の形
状のものが使用できる。つまり、溝2の端部が極めてシ
ャープな形状をしていれば、その端部における二次電子
放出量は溝2の内部及び外部の平面部よりも多くなるの
で、断面形状は如何なるものを使用しても同様の効果が
得られる。
Further, in the above embodiment, the groove 2 has a rectangular cross-sectional shape, but any cross-sectional shape such as a semicircular, semielliptical, triangular, etc. can be used. In other words, if the end of the groove 2 has an extremely sharp shape, the amount of secondary electrons emitted at that end will be greater than the flat parts inside and outside of the groove 2, so any cross-sectional shape can be used. The same effect can be obtained.

更に、このエツジ部分は第4図(a)に示すような凸型
の端部でもよい、即ち、溝2の代りに凸部12の上面に
電子ビームが照射されている状態で検出される二次電子
量と、凸部12のエツジに照射されている状態で検出さ
れる二次電子量との差を、トラッキング信号として利用
すればよい、この場合に、凸部12はエツチングで形成
してもよいし、また二次電子放出率の異なる材料13を
34図(b)に示すように貼り合せたものでも、又’f
a fliとして形成したものでもよく、第3図の場合
と同様にS/N比の高いトラッキング信号が得られる。
Furthermore, this edge portion may be a convex end as shown in FIG. The difference between the amount of secondary electrons and the amount of secondary electrons detected when the edges of the convex portions 12 are irradiated can be used as a tracking signal.In this case, the convex portions 12 are formed by etching. Alternatively, materials 13 with different secondary electron emission rates may be bonded together as shown in Figure 34(b), or 'f
It may be formed as a fli, and a tracking signal with a high S/N ratio can be obtained as in the case of FIG.

[発明の効果] 以上説明したように本発明に係るオートトラッキング機
構によれば、固体電子ビームを用いた高密度記録方式に
おいて、1つの電子ビームをトラッキング信号検出に用
いられるので、集束用、偏向用電磁レンズを制御し、他
の残りの記録ゆ再生用の電子ビームの位置をそれぞれの
記録媒体ライン又はスポットに常に正確に一致させるこ
とができると共に、電子ビームを用いているため精度が
良好であり、更に二次電子検出を用いているためにS/
N比の高いトラッキング信号を得ることができる。
[Effects of the Invention] As explained above, according to the auto-tracking mechanism according to the present invention, one electron beam can be used for tracking signal detection in a high-density recording method using a solid-state electron beam, so that it can be used for focusing, deflection, etc. By controlling the electromagnetic lens for recording and reproducing, the position of the remaining recording and reproducing electron beams can always be accurately aligned with each recording medium line or spot. In addition, since secondary electron detection is used, S/
A tracking signal with a high N ratio can be obtained.

【図面の簡単な説明】[Brief explanation of drawings]

図面は本発明に係るオートトラッキング機構の実施例を
示すものであり、第1図はその電子ビーム記録再生装置
の構成図、第2図はオートトラッキング用信号検出溝に
電子ビームが照射されている状態の断面図、第3図はオ
ートトラッキング用溝の断面図、第4図はオートトラッ
キング用凸部の断面図である。 符号1は記録媒体、2はオートトラッキング信号検出用
溝、3は固体電子ビーム発生装置、4は集束用電磁レン
ズ、5は偏向用電磁レンズ、6は信号処理部、7は制御
部、8は二次電子検出器。 9.10は駆動制御装置、11はオートトラッキング信
号検出用凸部である。
The drawings show an embodiment of the auto-tracking mechanism according to the present invention, and FIG. 1 is a configuration diagram of the electron beam recording/reproducing device, and FIG. 2 shows an auto-tracking signal detection groove irradiated with an electron beam. 3 is a sectional view of the auto-tracking groove, and FIG. 4 is a sectional view of the auto-tracking convex portion. 1 is a recording medium, 2 is an auto-tracking signal detection groove, 3 is a solid-state electron beam generator, 4 is a focusing electromagnetic lens, 5 is a deflection electromagnetic lens, 6 is a signal processing section, 7 is a control section, and 8 is a Secondary electron detector. 9.10 is a drive control device, and 11 is a protrusion for detecting an auto-tracking signal.

Claims (1)

【特許請求の範囲】 1、多数の電子ビームを出力する電子ビームヘッドを有
する記録再生装置において、記録媒体上に形成したトラ
ッキングパターン部分に前記電子ビームの内の1つの電
子ビームを照射し、該パターン部分から発生する二次電
子の二次電子強度を検出器により検出してトラッキング
信号とすることを特徴とするオートトラッキング機構。 2、前記パターン部分は溝の端部とした特許請求の範囲
第1項に記載のオートトラッキング機構。 3、前記パターン部分は凸型の端部とした特許請求の範
囲第1項に記載のオートトラッキング機構。
[Scope of Claims] 1. In a recording/reproducing apparatus having an electron beam head that outputs a large number of electron beams, one of the electron beams is irradiated onto a tracking pattern portion formed on a recording medium; An auto-tracking mechanism characterized in that the intensity of secondary electrons generated from a pattern portion is detected by a detector and used as a tracking signal. 2. The auto-tracking mechanism according to claim 1, wherein the pattern portion is an end portion of a groove. 3. The auto-tracking mechanism according to claim 1, wherein the pattern portion has a convex end.
JP61199856A 1986-08-15 1986-08-26 Auto tracking mechanism Expired - Lifetime JP2715070B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP61199856A JP2715070B2 (en) 1986-08-26 1986-08-26 Auto tracking mechanism
US07/972,732 US5270990A (en) 1986-08-15 1992-11-06 Tracking error signal detecting apparatus using an electron beam and apparatus for effecting recording/reproduction of information by the utilization of a plurality of electron beams

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61199856A JP2715070B2 (en) 1986-08-26 1986-08-26 Auto tracking mechanism

Publications (2)

Publication Number Publication Date
JPS6355744A true JPS6355744A (en) 1988-03-10
JP2715070B2 JP2715070B2 (en) 1998-02-16

Family

ID=16414788

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61199856A Expired - Lifetime JP2715070B2 (en) 1986-08-15 1986-08-26 Auto tracking mechanism

Country Status (1)

Country Link
JP (1) JP2715070B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5929452A (en) * 1997-03-18 1999-07-27 Kabushiki Kaisha Toshiba Electrostatic deflecting electrode unit for use in charged beam lithography apparatus and method of manufacture the same

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50131814A (en) * 1974-03-30 1975-10-18
JPS6029953A (en) * 1983-07-28 1985-02-15 Fujitsu Ltd Electron beam recording and reproducing device
JPS6029952A (en) * 1983-07-28 1985-02-15 Fujitsu Ltd Electron beam recording disk

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50131814A (en) * 1974-03-30 1975-10-18
JPS6029953A (en) * 1983-07-28 1985-02-15 Fujitsu Ltd Electron beam recording and reproducing device
JPS6029952A (en) * 1983-07-28 1985-02-15 Fujitsu Ltd Electron beam recording disk

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5929452A (en) * 1997-03-18 1999-07-27 Kabushiki Kaisha Toshiba Electrostatic deflecting electrode unit for use in charged beam lithography apparatus and method of manufacture the same

Also Published As

Publication number Publication date
JP2715070B2 (en) 1998-02-16

Similar Documents

Publication Publication Date Title
JPH081705B2 (en) Semiconductor laser and multi-beam optical head using the same
US5319198A (en) Electron beam projection apparatus
MY118961A (en) Beam irradiation apparatus, optical apparatus having beam irradiation apparatus for information recording medium, method for manufacturing original disk for information recording medium, and method for manufacturing information recording medium
US4001493A (en) Single lens, multi-beam system and method for high resolution recording of information on a moving recording medium and article
US5270990A (en) Tracking error signal detecting apparatus using an electron beam and apparatus for effecting recording/reproduction of information by the utilization of a plurality of electron beams
JPH02304722A (en) Tracking error detecting part for multi-beam optical disk device
US5631113A (en) Electron-beam exposure system for reduced distortion of electron beam spot
JPS631651B2 (en)
JPS6355744A (en) Auto-tracking mechanism
US4786922A (en) Electron beam recording and reproducing apparatus
JP2706240B2 (en) Electron beam irradiation state detection method
US5473586A (en) Optical pickup for an optical disc
JPS62245530A (en) Ultrahigh density recording system utilizing fine beam
JP2595212B2 (en) Information recording / reproducing device
JP2715069B2 (en) Information recording / reproducing device
JPS5834011B2 (en) Contactless pick-up
JP2702566B2 (en) Focus signal correction method for optical pickup
JPS61174629A (en) Electron beam image drawing apparatus
JP2730132B2 (en) Optical card processing equipment
JP3802538B2 (en) Focus detection emitter, electronic data storage device, electron beam focus adjustment method, and electron beam focus determination method
JPS60217691A (en) Electromagnetic radiation generator as well as reader and writer having same
JPH02214046A (en) Electron beam recording and reproducing device
JPH02260142A (en) Optical device
JPH11339301A (en) Optical information recording/reproducing device
JP2003248981A (en) Information recording method by beam with fine reciprocative vibration deflection added

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term