JPS6354513B2 - - Google Patents

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Publication number
JPS6354513B2
JPS6354513B2 JP2475180A JP2475180A JPS6354513B2 JP S6354513 B2 JPS6354513 B2 JP S6354513B2 JP 2475180 A JP2475180 A JP 2475180A JP 2475180 A JP2475180 A JP 2475180A JP S6354513 B2 JPS6354513 B2 JP S6354513B2
Authority
JP
Japan
Prior art keywords
polishing
abrasive
abrasive grains
foam
abrasive material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP2475180A
Other languages
Japanese (ja)
Other versions
JPS56126581A (en
Inventor
Tsuneaki Narumya
Torao Hashimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bridgestone Corp
Original Assignee
Bridgestone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bridgestone Corp filed Critical Bridgestone Corp
Priority to JP2475180A priority Critical patent/JPS56126581A/en
Publication of JPS56126581A publication Critical patent/JPS56126581A/en
Publication of JPS6354513B2 publication Critical patent/JPS6354513B2/ja
Granted legal-status Critical Current

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  • Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
  • Polishing Bodies And Polishing Tools (AREA)

Description

【発明の詳細な説明】 本発明は研磨材、特にレンズ、ブラウン管、板
ガラス等の磨き、つや出しに好適な研磨材の製造
方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an abrasive material, particularly a method for producing an abrasive material suitable for polishing and polishing lenses, cathode ray tubes, glass plates, etc.

従来、レンズの研磨方法として、酸化セリウ
ム、酸化ジルコニウム等の砥粒を添加したポリウ
レタンフオーム配合原料を発泡させることにより
得られる砥粒配合のポリウレタン低発泡フオーム
のパツドを研磨材として使用し、レンズを研磨す
るときにレンズとパツドの接触面に酸化セリウム
等の砥粒を分散した水を補給しつつ研磨する方法
が知られている。
Conventionally, as a method for polishing lenses, a pad of low-expansion polyurethane foam containing abrasive grains obtained by foaming a raw material containing polyurethane foam containing abrasive grains such as cerium oxide or zirconium oxide is used as an abrasive material. A known method is to polish the lens while replenishing the contact surface between the lens and the pad with water in which abrasive grains such as cerium oxide are dispersed.

しかし、この方法は、ポリウレタン低発泡フオ
ームに配合されている酸化セリウム、酸化ジルコ
ニウム等の砥粒がフオーム中に埋め込まれた如き
状態で固定されているため、パツド表面側の砥粒
は一応研磨に有効に使用され得るが、パツド内部
の砥粒は表面側に流動してくることがないので研
磨時に作用せず、従つて高価な原料である酸化セ
リウム、酸化ジルコニウム等の砥粒の大半以上が
研磨に有効に使用されない問題がある。更に、こ
のような砥粒を配合、分散させたポリウレタンフ
オームパツドの研磨材は発泡反応及びフオーム物
性に及ぼす影響から砥粒配合量を多くすることが
できず、また砥粒を配合して発泡させる制約上、
得られるフオーム物性(柔軟性、硬さ、強度等)
の自由度がせまくなる問題があり、パツド(研磨
材)のあらさの調節も困難である。また、この研
磨材はポリウレタンフオームパツドより形成され
ているため微孔(連続気泡)を有しており、この
微孔は研磨時に補給される砥粒分散液の保持、放
出に役立つものであるが、この微孔のサイズ、分
布が不均一であるため、分散液の保持、放出がム
ラになる問題もある。
However, in this method, the abrasive grains of cerium oxide, zirconium oxide, etc. contained in the polyurethane low foam foam are embedded and fixed in the foam, so the abrasive grains on the surface side of the pad cannot be polished. Although it can be used effectively, the abrasive grains inside the pad do not flow toward the surface and do not work during polishing. There is a problem that it cannot be used effectively for polishing. Furthermore, in polyurethane foam pad abrasive materials in which such abrasive grains are blended and dispersed, the amount of abrasive grains cannot be increased due to the effect on the foaming reaction and the physical properties of the foam. Due to the constraints of
Obtained foam properties (flexibility, hardness, strength, etc.)
There is a problem that the degree of freedom of polishing is limited, and it is also difficult to adjust the roughness of the pad (abrasive material). In addition, since this abrasive material is made of polyurethane foam pad, it has micropores (open cells), and these micropores are useful for retaining and releasing the abrasive dispersion liquid that is replenished during polishing. However, since the size and distribution of these micropores are non-uniform, there is also the problem that retention and release of the dispersion become uneven.

また、ブラウン管や板ガラスなどを研磨する方
法として、従来羊毛フエルトを使用し、レンズ研
磨と同様の砥粒分散液を補給しつつ研磨すること
が行なわれているが、羊毛フエルトは天然繊維で
あるため産地、収穫時期等により品質が大きくば
らつき、研磨時にこのばらつきを吸収するようプ
ロセスを調整しなければならない等の問題があ
る。
In addition, as a method of polishing cathode ray tubes and glass plates, wool felt is conventionally used and polished while replenishing an abrasive dispersion similar to lens polishing, but since wool felt is a natural fiber, There are problems such as the quality varies widely depending on the production area, harvest time, etc., and the process must be adjusted to absorb this variation during polishing.

本発明は上記事情に鑑みなされたもので、セル
膜のない三次元網目状骨格を有する軟質ポリウレ
タンフオームに砥粒を付着させ、これを130〜220
℃の温度に加熱した熱プレスにより前記軟質ポリ
ウレタンフオームの原付の1/2〜1/15に圧縮し、
永久変形させることにより、砥粒の付着量を容易
に調節することができ、また硬さが柔軟性を研磨
の目的に応じた所望のものに形成できて、レン
ズ、ブラウン管、ガラス板、金属、木材、プラス
チツク等の表面を良好に研磨し、或いはつや出し
することができると共に、付着した砥粒の殆んど
が流動砥粒として働き、このため高価な砥粒が研
磨に有効に使用され、従つて研磨時において高価
な砥粒分散液の使用を減少させ、もしくは分散液
の使用をなくして研磨することができる特性を有
する研磨材を確実にかつ簡単に製造することがで
きる研磨材の製造方法を提供するものである。
The present invention was made in view of the above circumstances, and consists of attaching abrasive grains to a soft polyurethane foam having a three-dimensional network skeleton without a cell membrane, and polishing the abrasive grains to
Compress the soft polyurethane foam to 1/2 to 1/15 of the original size using a heat press heated to a temperature of ℃,
By permanently deforming, the amount of abrasive grains attached can be easily adjusted, and the hardness and flexibility can be adjusted to suit the purpose of polishing. The surface of wood, plastic, etc. can be well polished or polished, and most of the attached abrasive grains act as fluid abrasive grains, so expensive abrasive grains can be effectively used for polishing, and conventional A method for producing an abrasive material that can reliably and easily produce an abrasive material that has the characteristics of reducing or eliminating the use of expensive abrasive grain dispersions during polishing. It provides:

以下、本発明につき更に詳しく説明する。 The present invention will be explained in more detail below.

本発明の研磨材の製造方法は、発泡体の格子に
砥粒を付着させたものを圧縮成形するものであ
り、この場合発泡体としては、軟質ポリウレタン
フオームのうちセル膜のない三次元網目状骨格構
造を有するものが使用され、この種のセル膜のな
い軟質ポリウレタンフオームを使用することによ
り、セルサイズを種々に調整し得、またセルサイ
ズをほぼ均一にすることができ、このため表面の
あらさの程度を研磨の目的に合わせることが容易
であると共に、砥粒をフオーム骨格格子に容易
に、しかも均一に付着させることができ、またこ
のセル膜のない軟質ポリウレタンフオームを圧縮
成形することにより得られた研磨材は、セル膜が
ないので吸水性が良く、水或いは砥粒を分散した
水を補給しつつレンズ等を研磨する場合、これら
媒体の保持及び放出性能に非常に優れている。な
お、セル膜のない三次元網状骨格構造を有するポ
リウレタンフオームは、通常のセル膜を有するポ
リウレタンフオームに熱処理、加水分解処理等の
後処理を施すことにより、或いは発泡時にセル膜
のない配合系を用いて発泡させるなどの方法によ
り製造することができる。
The method for manufacturing an abrasive material of the present invention involves compression molding a foam lattice with abrasive grains attached to it. By using this type of flexible polyurethane foam without a cell membrane, the cell size can be adjusted in various ways, and the cell size can be made almost uniform, so that the surface It is easy to adjust the degree of roughness to suit the purpose of polishing, and the abrasive grains can be easily and evenly attached to the foam skeleton lattice, and by compression molding this soft polyurethane foam without a cell membrane, The obtained abrasive material has good water absorption properties since it does not have a cell membrane, and when polishing a lens or the like while replenishing water or water in which abrasive grains are dispersed, it has excellent retention and release performance for these media. Polyurethane foam with a three-dimensional network skeleton structure without a cell membrane can be produced by subjecting a polyurethane foam having a normal cell membrane to post-treatments such as heat treatment and hydrolysis treatment, or by adding a compound system without a cell membrane during foaming. It can be manufactured by a method such as foaming using a foam.

前記発泡体に付着させる砥粒は、研磨の目的等
に応じて種々の砥粒を使用することができ、その
種類に特に制御はないが、例えばレンズ、ブラウ
ン管、板ガラス等の研磨に対しては酸化セリウ
ム、酸化ジルコニウム等が使用され、その他酸化
クロム、酸化鉄、微粉アルミナ、エメリー、コラ
ンダムなども用いられる。なお、砥粒の粒径は使
用目的に応じ適宜なものを選定できる。
Various types of abrasive grains can be used depending on the purpose of polishing, and there is no particular control on the type of abrasive grains attached to the foam, but for example, for polishing lenses, cathode ray tubes, plate glass, etc. Cerium oxide, zirconium oxide, etc. are used, and chromium oxide, iron oxide, fine powder alumina, emery, corundum, etc. are also used. Note that the particle size of the abrasive grains can be appropriately selected depending on the purpose of use.

発泡体に前記砥粒を付着させる方法としては、
一般的には砥粒を水又は接着剤液(ラテツクス、
エマルジヨン、溶剤タイプ)に分散させ、この分
散液に発泡体を浸漬後、絞りローラーや遠心分離
機にかけて所望の含浸量となし、含浸液に見合つ
た乾燥条件で乾燥する方法が採用できる。これに
より、発泡体表面及び内部の格子全体に砥粒が付
着せしめられる。
The method for attaching the abrasive grains to the foam is as follows:
Generally, abrasive grains are mixed with water or adhesive liquid (latex,
A method can be adopted in which the foam is dispersed in an emulsion (solvent type), immersed in this dispersion, passed through a squeezing roller or centrifugal separator to obtain the desired amount of impregnation, and then dried under drying conditions commensurate with the impregnating liquid. This causes the abrasive grains to adhere to the entire foam surface and internal lattice.

本発明はこのようにして砥粒を付着させた発泡
体を圧縮成形するものであるが、この場合使用目
的等に応じた硬度、柔軟性、厚さとなるように圧
縮倍率を選んで成形する。一般には加熱圧縮成形
法が採用され、温度130〜220℃において発泡体原
寸の1/2〜1/15の圧縮率で圧縮成形することによ
り良好な特性の研磨材を確実に得ることができ
る。即ち、圧縮倍率が1/2より低く、特に圧縮倍
率が1、即ち圧縮しない状態では研磨材が柔らか
すぎ、レンズ、ブラウン管、ガラス板などの研磨
には不適であり、また表面側に顕出している発泡
体細胞密度(単位長さ当りの細胞数)も疎である
ため、表面側に顕出している砥粒の量も少なく、
しかも研磨に際し被研磨面に砥粒がむらに当ると
共に、連続気泡の大きさ(容積)が大きいので、
研磨時に水や砥粒分散液を供給した場合、これら
の適度な保持、放出が達成されない。また、圧縮
倍率が1/15より大きいと、研磨材が硬くなりす
ぎ、また研磨時に水、砥粒分散液を供給してもこ
れらの保持、放出性能が劣る。これに対し、圧縮
倍率を1/2〜1/15とすることにより、良好な腰を
有し、硬さ、柔軟性、表面荒さが適度な上、研磨
時に被研磨面に対し適量の砥粒が均一な状態で当
り、水や砥粒分散液を供給した場合における保
持、放出性能の優れた研磨材を確実に製造するこ
とができる。
In the present invention, the foam to which abrasive grains have been attached in this manner is compression molded, and in this case, the compression ratio is selected to obtain the hardness, flexibility, and thickness depending on the purpose of use. Generally, a heating compression molding method is employed, and by compression molding at a temperature of 130 to 220°C and a compression rate of 1/2 to 1/15 of the original size of the foam, an abrasive with good properties can be reliably obtained. In other words, when the compression ratio is lower than 1/2, especially when the compression ratio is 1, i.e. in an uncompressed state, the abrasive material is too soft and unsuitable for polishing lenses, cathode ray tubes, glass plates, etc. Since the foam cell density (number of cells per unit length) is sparse, the amount of abrasive grains exposed on the surface is small.
Moreover, during polishing, the abrasive grains hit the polished surface unevenly, and the size (volume) of the open cells is large.
If water or abrasive dispersion is supplied during polishing, appropriate retention and release of these particles cannot be achieved. Furthermore, if the compression ratio is greater than 1/15, the abrasive material becomes too hard, and even if water and abrasive dispersion are supplied during polishing, the retention and release performance of these materials will be poor. On the other hand, by setting the compression ratio to 1/2 to 1/15, it has good stiffness, moderate hardness, flexibility, and surface roughness, and the appropriate amount of abrasive grains are applied to the surface to be polished during polishing. It is possible to reliably produce an abrasive material that hits in a uniform state and has excellent retention and release performance when water or an abrasive dispersion is supplied.

次に、図面に示す本発明研磨材の実施例につき
説明すると、第1図は研磨材1を全体として平板
状に形成したものであり、第2図は研磨材1の一
面に波状凹凸2を形成したもの、第3図は研磨材
1に多数の貫通孔3を形成したものである。第2
図に示すように研磨材1に凹凸2を形成すること
により(なお、凹凸2は研磨材1の一面のみでな
く、両面に形成するようにしてもよく、また凹凸
2の形状も波状に限られることはない。)、研磨時
において研磨圧力により凸部が被研磨物表面に沿
つて確実に当り、かつ凹部に水、分散液が良好に
保持されて、非常に良好な研磨が達成される。な
お、凹凸2は例えばプレス定板にエンボス用のパ
ターンを施したものを使用するなどの方法により
形成できる。また、第3図に示すように研磨材1
に貫通孔3を形成することにより、水や砥粒分散
液の保持、放出性能をより良好にすることができ
る。なお、貫通孔2の形成は、圧縮成形後、キリ
や打抜型等を使用し、所望のサイズ、所望の分散
度合の貫通孔2を穿設することによつて行なわれ
る。
Next, to explain the embodiments of the abrasive material of the present invention shown in the drawings, FIG. 1 shows an abrasive material 1 formed into a flat plate shape as a whole, and FIG. FIG. 3 shows an abrasive material 1 with a large number of through holes 3 formed therein. Second
As shown in the figure, by forming unevenness 2 on the abrasive material 1 (the unevenness 2 may be formed not only on one side of the abrasive material 1 but also on both sides, and the shape of the unevenness 2 is also limited to a wavy shape). ), during polishing, the polishing pressure ensures that the convex portions contact the surface of the object to be polished, and water and dispersion are well retained in the concave portions, achieving very good polishing. . Incidentally, the unevenness 2 can be formed by a method such as using a press plate provided with an embossing pattern. In addition, as shown in FIG.
By forming the through-holes 3 in , it is possible to improve the retention and release performance of water and abrasive grain dispersion. The through-holes 2 are formed after compression molding by using a drill, punching die, or the like to drill through-holes 2 of a desired size and desired degree of dispersion.

第4図は本発明研磨材1の一部を拡大したもの
で、これはセル膜のない三次元網状骨格構造を有
するポリエステルポリウレタンフオームを圧縮成
形してなるものの例であり、第5図はこの研磨材
1の格子1aの断面図で、この格子1aの表面に
砥粒4が付着している状態を示したものである。
Fig. 4 is an enlarged view of a part of the abrasive material 1 of the present invention, which is an example of a product made by compression molding a polyester polyurethane foam having a three-dimensional network skeleton structure without a cell membrane. This is a cross-sectional view of the grating 1a of the abrasive material 1, showing a state in which abrasive grains 4 are attached to the surface of the grating 1a.

本発明の研磨材は、使用する砥粒の種類、研磨
材の硬さ、表面あらさ等に応じ、レンズ、ガラス
板等のガラス表面、或いは金属、木材、プラスチ
ツクの表面などの研磨やつや出しに用いるもので
あるが、研磨法としては手磨き法、研磨機に取り
付け、研磨する方法など、通常の方法を採用し得
る。この場合、必要により水、或いは水に砥粒を
分散させたものを供給しつつ研磨することができ
る。
The abrasive material of the present invention can be used for polishing or polishing glass surfaces such as lenses and glass plates, or surfaces of metals, wood, and plastics, depending on the type of abrasive grains used, the hardness of the abrasive material, the surface roughness, etc. However, as a polishing method, a conventional method such as a manual polishing method, a method of attaching it to a polishing machine and polishing it, etc. can be adopted. In this case, polishing can be performed while supplying water or water with abrasive grains dispersed therein, if necessary.

本発明の研磨材の製造方法は、砥粒をセル膜の
ない三次元網目状骨格構造を有する軟質ポリウレ
タンフオームの格子に付着させ、これを圧縮成形
するものであり、得られる研磨材に対する砥粒の
付着量を研磨の目的に合せて調節することが容易
であると共に、発泡体素材の種類、砥粒の付着に
使用する接着剤の種類、圧縮倍率を適宜選択する
ことにより、研磨材の硬さ、柔軟性、研磨面のあ
らさを研磨の目的に合せて所望のものに形成で
き、従つて要求する研磨目的を確実に達成し得る
ものである。また、砥粒は、これが接着剤を介し
て発泡体格子に付着している場合でも、その付着
力は強いものではなく、研磨時における研磨圧力
によりその殆んどの砥粒が流動砥粒として作用
し、従つて高価な砥粒が有効に研磨目的に使用さ
れる。また、このため砥粒分散液を供給しながら
研磨する場合、分散液の使用量を低減させること
ができ、或いは単に水を補給するだけでもよく、
経済的である。更に、本発明の研磨材製造法によ
れば、上記した良好な性能を有する研磨材を確実
にかつ簡単に製造することができる。
In the method for producing an abrasive material of the present invention, abrasive grains are attached to a lattice of a soft polyurethane foam having a three-dimensional network skeleton structure without a cell membrane, and this is compression-molded. It is easy to adjust the adhesion amount according to the purpose of polishing, and the hardness of the abrasive can be increased by appropriately selecting the type of foam material, the type of adhesive used to adhere the abrasive grains, and the compression ratio. The hardness, flexibility, and roughness of the polished surface can be adjusted to suit the purpose of polishing, and the desired polishing purpose can therefore be achieved reliably. Furthermore, even if the abrasive grains are attached to the foam lattice via an adhesive, the adhesion force is not strong, and most of the abrasive grains act as fluid abrasive grains due to the polishing pressure during polishing. Therefore, expensive abrasive grains are effectively used for polishing purposes. Furthermore, when polishing is performed while supplying an abrasive grain dispersion, the amount of dispersion used can be reduced, or it is sufficient to simply replenish water.
Economical. Furthermore, according to the abrasive manufacturing method of the present invention, an abrasive having the above-mentioned good performance can be reliably and easily manufactured.

次に、本発明の具体的な実施例を示す。 Next, specific examples of the present invention will be shown.

実施例 下記処方 酸化セリウム(新日本金属化学社製セリコ)
50重量部 アクリル酸系エマルジヨン(住友化学社製スミテ
ツクスAMH−3000) 200 〃 水 50 〃 の酸化セリウム含有液を厚さ10mm、セル数30個/
25mmのセル膜のない三次元網状骨格構造を有する
軟質ポリエステルポリウレタンフオームに含浸さ
せた後、酸化セリウム付着量がフオーム重量に対
し3倍となるように絞つた。これを100℃で乾燥
させ、次いで180℃の熱プレス機でスペーサーを
用いて1.25mmに圧縮成形した(圧縮率87.5%)。
Example The following formulation cerium oxide (Celico manufactured by Nippon Metal Chemical Co., Ltd.)
50 parts by weight of acrylic acid emulsion (Sumitex AMH-3000, manufactured by Sumitomo Chemical Co., Ltd.) 200 parts water 50 parts cerium oxide-containing solution was added to a thickness of 10 mm and 30 cells/
After impregnating a 25 mm soft polyester polyurethane foam with a three-dimensional network skeleton structure without a cell membrane, the amount of cerium oxide deposited was reduced to three times the weight of the foam. This was dried at 100°C, and then compression molded to 1.25 mm using a spacer in a heat press at 180°C (compression rate: 87.5%).

この研磨材はレンズ用として適度な柔軟性、硬
さ、表面あらさ及び微孔性を有し、レンズ研磨時
に酸化セリウムが流動砥粒として有効に作用し、
レンズ用研磨材として好適なものである。
This abrasive material has appropriate flexibility, hardness, surface roughness, and microporosity for lenses, and cerium oxide acts effectively as a fluid abrasive grain during lens polishing.
It is suitable as an abrasive material for lenses.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図乃至第3図はそれぞれ本発明の一実施例
を示す断面図、第4図は発泡体としてセル膜のな
い軟質ポリウレタンフオームを使用した場合の実
施例を示す一部省略拡大斜視図、第5図は発泡体
格子の拡大断面図である。 1……研磨材、2……凹凸、3……貫通孔、4
……砥粒。
1 to 3 are cross-sectional views showing one embodiment of the present invention, and FIG. 4 is a partially omitted enlarged perspective view showing an embodiment in which a flexible polyurethane foam without a cell membrane is used as the foam. FIG. 5 is an enlarged cross-sectional view of the foam lattice. 1... Abrasive material, 2... Unevenness, 3... Through hole, 4
...abrasive grains.

Claims (1)

【特許請求の範囲】[Claims] 1 セル膜のない三次元網目状骨格を有する軟質
ポリウレタンフオームに砥粒を付着させ、これを
130〜220℃の温度に加熱した熱プレスにより前記
軟質ポリウレタンフオームの原寸の1/2〜1/15に
圧縮し、永久変形させることを特徴とする研磨材
の製造方法。
1. Abrasive grains are attached to a soft polyurethane foam that has a three-dimensional network skeleton without a cell membrane, and
A method for producing an abrasive material, which comprises compressing the soft polyurethane foam to 1/2 to 1/15 of its original size using a hot press heated to a temperature of 130 to 220°C to permanently deform it.
JP2475180A 1980-02-29 1980-02-29 Abrasive and its manufacture Granted JPS56126581A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2475180A JPS56126581A (en) 1980-02-29 1980-02-29 Abrasive and its manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2475180A JPS56126581A (en) 1980-02-29 1980-02-29 Abrasive and its manufacture

Publications (2)

Publication Number Publication Date
JPS56126581A JPS56126581A (en) 1981-10-03
JPS6354513B2 true JPS6354513B2 (en) 1988-10-28

Family

ID=12146842

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2475180A Granted JPS56126581A (en) 1980-02-29 1980-02-29 Abrasive and its manufacture

Country Status (1)

Country Link
JP (1) JPS56126581A (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2707264B2 (en) * 1987-12-28 1998-01-28 ハイ・コントロール・リミテッド Polishing sheet and method for producing the same
US4962562A (en) * 1989-01-18 1990-10-16 Minnesota Mining And Manufacturing Company Compounding, glazing or polishing pad
JP2587071Y2 (en) * 1990-10-03 1998-12-14 石原薬品株式会社 Polishing buff body
EP0619165A1 (en) * 1993-04-07 1994-10-12 Minnesota Mining And Manufacturing Company Abrasive article
JPH09300227A (en) * 1996-05-09 1997-11-25 Soft Kyukyu Corp:Kk Compound applicator
JP2013086239A (en) * 2011-10-21 2013-05-13 Hoya Corp Polishing tool for plastic lens, polishing method of plastic lens and method for manufacturing plastic lens
JP2015054368A (en) * 2013-09-10 2015-03-23 株式会社シード Sheet-like polishing material
CN108698205B (en) * 2016-02-29 2021-05-14 锐必克科技有限公司 Porous polishing tool and polishing tool provided with same

Also Published As

Publication number Publication date
JPS56126581A (en) 1981-10-03

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