JP2015054368A - Sheet-like polishing material - Google Patents

Sheet-like polishing material Download PDF

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JP2015054368A
JP2015054368A JP2013187794A JP2013187794A JP2015054368A JP 2015054368 A JP2015054368 A JP 2015054368A JP 2013187794 A JP2013187794 A JP 2013187794A JP 2013187794 A JP2013187794 A JP 2013187794A JP 2015054368 A JP2015054368 A JP 2015054368A
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abrasive
sheet
polishing
polished
weight
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悠介 藤田
Yusuke Fujita
悠介 藤田
森本 和樹
Kazuki Morimoto
和樹 森本
成希 秋山
Seiki Akiyama
成希 秋山
詩織 亀山
Shiori KAMEYAMA
詩織 亀山
裕太 水口
Hirota Mizuguchi
裕太 水口
玲奈 須田
Reina SUDA
玲奈 須田
宗一 谷脇
Soichi Taniwaki
宗一 谷脇
誠 奥田
Makoto Okuda
誠 奥田
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Seed Co Ltd
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Seed Co Ltd
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Priority to JP2013187794A priority Critical patent/JP2015054368A/en
Publication of JP2015054368A publication Critical patent/JP2015054368A/en
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Abstract

PROBLEM TO BE SOLVED: To provide a sheet-like polishing material capable of being widely applied for polishing of an article to be polished having a spherical surface or a complicated shape surface, and capable of maintaining excellent polishing force over a long period of time.SOLUTION: There is provided a sheet-like polishing material 1 obtained by kneading and including a polishing agent formed of fine abrasive grains to a base material formed of an elastic material, the sheet-like polishing material has sufficient flexibility and stability, and polishing surfaces 1a and 1b are capable of being brought into contact with surfaces (surface to be polished) of articles to be polished 5a, 5b and 6a having a spherical surface or a complicated shape surface correctly. Thereby without polishing unevenness, polishing effects having high accuracy are achieved.

Description

本発明はシート状研磨材に関し、さらに詳細には、球面等の曲面や複雑な形状表面を有する被研磨物体の研磨にも広く適用することができる研磨技術に関する。   The present invention relates to a sheet-like abrasive, and more particularly, to a polishing technique that can be widely applied to polishing an object to be polished having a curved surface such as a spherical surface or a complicatedly shaped surface.

各種機械・器具等の表面、各種スポーツ器械・器具の表面、パイプやパイプ部品等の円筒表面、あるいは家庭用器具の表面など、凹凸のある表面や円筒面、球面等の曲面、あるいは角部等の角張った面などの錆取りや艶出し作業に用いる研摩材としては、研摩布紙が一般的に使用されている。   Surfaces of various machines and equipment, surfaces of various sports equipment and equipment, cylindrical surfaces of pipes and pipe parts, etc., uneven surfaces, cylindrical surfaces, curved surfaces such as spherical surfaces, corners, etc. Abrasive cloth is generally used as an abrasive material for rust removal and polishing work on the square surfaces of the surface.

研磨布紙は、金属・木材などの研削・研磨に適したもので、基材である布または紙の表面に、多数の研磨剤(砥粒)が接着剤層により接着保持されてなり、上記接着剤層は、研磨剤を保持する機能に加えて、研磨剤をこぼれにくく、かつ研磨布紙の柔軟性を高める機能も有している。   Abrasive cloth paper is suitable for grinding and polishing of metal, wood, etc., and a large number of abrasives (abrasive grains) are adhered and held on the surface of cloth or paper as a base by the adhesive layer. In addition to the function of holding the abrasive, the adhesive layer has a function of hardly spilling the abrasive and increasing the flexibility of the abrasive cloth.

しかしながら、このような研磨布紙では、接着剤層による柔軟性付与機能だけでは十分な柔軟性が得られず、被研磨面が凹凸のある表面である場合や曲率の大きな曲面には、研磨布紙の研磨面を被研磨面に忠実に沿って接触させることができず、研磨ムラが生じてしまう。また、角部等の角張った面を研磨布紙で研磨する場合に、角張った面に沿って研摩布紙を折り曲げなければならず、やはり研磨ムラが生じる傾向があるばかりか、その折り曲げた部分で早期に切断されてしまい、研磨面の使用位置を変えなければならないなど、不経済であった。さらに、研磨布紙においては、被研磨材から剥離除去された錆等で研磨面が目詰まりを起こし、研磨面の研磨力が早期に低下してしまうという問題があった。   However, with such abrasive cloth paper, sufficient flexibility cannot be obtained only by the function of imparting flexibility by the adhesive layer, and when the surface to be polished is an uneven surface or a curved surface having a large curvature, The polishing surface of the paper cannot be brought into contact with the surface to be polished faithfully, resulting in uneven polishing. In addition, when polishing an angular surface such as a corner with abrasive cloth, the abrasive cloth must be bent along the angular surface, which also tends to cause uneven polishing, and the bent portion It was uneconomical because it was cut early and the use position of the polished surface had to be changed. Furthermore, in the polishing cloth, there is a problem that the polishing surface is clogged with rust or the like peeled and removed from the material to be polished, and the polishing power of the polishing surface is quickly reduced.

この点に関して、特許文献1に開示されるようなシート状研摩ゴムが開発されている。この研摩ゴムは、ゴムまたは合成樹脂のマトリックスに繊維が含有されてなり、シート表面において、繊維の先端がマトリックス面から突出して、所定本数以上の平均密度で分布されてなるものである。   In this regard, a sheet-like abrasive rubber as disclosed in Patent Document 1 has been developed. This abrasive rubber is a rubber or synthetic resin matrix in which fibers are contained, and on the sheet surface, the tips of the fibers protrude from the matrix surface and are distributed with an average density of a predetermined number or more.

この研摩ゴムによれば、何回研摩を続けても折れ目が生せず、形状,材質に関わらずいかなる面にも適用でき、しかも滑らかな研摩を得ることができる。   According to this polishing rubber, no crease is produced no matter how many times polishing is continued, and it can be applied to any surface regardless of shape and material, and smooth polishing can be obtained.

特開平8−1526号公報JP-A-8-1526

しかしながら、上記研磨ゴムは、構成が複雑で製造条件も厳しく、所期の効果を十分に得難く、さらなる改良の余地があった。   However, the above-mentioned abrasive rubber has a complicated structure and severe manufacturing conditions, and it is difficult to obtain the desired effect sufficiently, and there is room for further improvement.

本発明はかかる従来の問題点に鑑みてなされたものであって、その目的とするところは、被研磨物体の表面の形状に関わりなく、球面等の曲面や複雑な形状表面を有する被研磨物体の研磨に広く適用することができ、しかも長期にわたり優れた研磨力を持続することができるシート状研磨材を提供することにある。   The present invention has been made in view of such conventional problems, and the object of the present invention is to be a polished object having a curved surface such as a spherical surface or a complicatedly shaped surface regardless of the shape of the surface of the object to be polished. It is an object of the present invention to provide a sheet-like abrasive that can be widely applied to polishing of the above and that can maintain an excellent polishing power over a long period of time.

この目的を達成するため、本発明のシート状研磨材は、被研磨物体の表面に沿って弾性変形可能なものであって、弾性材料からなる基材に、微細な砥粒からなる研磨剤が均一に混練含有されてなることを特徴とする。   In order to achieve this object, the sheet-like abrasive of the present invention can be elastically deformed along the surface of the object to be polished, and a polishing agent made of fine abrasive grains is formed on a substrate made of an elastic material. It is characterized by being uniformly kneaded and contained.

好適な実施態様として、以下の構成が採用される。
(1)板厚が0.5〜5.0mmに設定されている。
The following configuration is adopted as a preferred embodiment.
(1) The plate thickness is set to 0.5 to 5.0 mm.

(2)研磨材表裏両面が平面状の研磨面とされている。 (2) Both surfaces of the abrasive material are flat polished surfaces.

(3)研磨材表裏両面の少なくとも一方は、凹溝が複数等間隔をもって配されてなる波状凹凸模様の研磨面とされている。 (3) At least one of the front and back surfaces of the abrasive is a polished surface having a wavy uneven pattern in which a plurality of concave grooves are arranged at equal intervals.

(4)研磨材表裏両面は、凹溝が複数等間隔をもって配されてなる波状凹凸模様の研磨面とされるとともに、表裏両面の凹溝同士が互いに対向配置しないように設けられている。 (4) The front and back surfaces of the abrasive material are provided with a wavy concavo-convex polished surface in which a plurality of concave grooves are arranged at equal intervals, and the concave grooves on the front and rear surfaces are provided so as not to face each other.

(5)研磨材表裏両面の少なくとも一方は、凹溝が複数等間隔をもって交差状に配されてなる格子状凹凸模様の研磨面とされている。 (5) At least one of the front and back surfaces of the abrasive is a polished surface with a lattice-like uneven pattern in which a plurality of concave grooves are arranged at equal intervals.

(6)研磨材表裏両面は、凹溝が複数等間隔をもって交差状に配されてなる格子状凹凸模様の研磨面とされるとともに、表裏両面の凹溝が互いに対向配置しないように設けられている。 (6) The front and back surfaces of the abrasive are provided with a grid-like concavo-convex pattern polished surface in which a plurality of concave grooves are arranged in an intersecting manner at equal intervals, and the concave and convex grooves on the front and rear surfaces are provided so as not to face each other. Yes.

(7)研磨材表裏面は、孔部が複数均等に表裏面に貫設して配されてなる水玉凹凸模様の研磨面とされている。 (7) The abrasive front and back surfaces have a polka-dot concavo-convex pattern with a plurality of holes that are evenly provided on the front and back surfaces.

(8)上記基材がスチレン系樹脂である。 (8) The base material is a styrene resin.

(9)スチレン系樹脂100重量部に対し、研磨剤が10〜1300重量部である。 (9) An abrasive | polishing agent is 10-1300 weight part with respect to 100 weight part of styrene resin.

(10)上記基材がオレフィン系樹脂である。 (10) The base material is an olefin resin.

(11)オレフィン系樹脂100重量部に対し、研磨剤が10〜1300重量部である。 (11) The abrasive is 10 to 1300 parts by weight with respect to 100 parts by weight of the olefin resin.

(12)上記基材がエチレン−酢酸ビニル系樹脂である。 (12) The base material is an ethylene-vinyl acetate resin.

(13)エチレン−酢酸ビニル系樹脂100重量部に対し、研磨剤が10〜1300重量部である。 (13) The abrasive is 10 to 1300 parts by weight with respect to 100 parts by weight of the ethylene-vinyl acetate resin.

(14)上記基材が塩化ビニル系樹脂である。 (14) The base material is a vinyl chloride resin.

(15)塩化ビニル系樹脂100重量部に対し、研磨剤が10〜1300重量部である。 (15) The abrasive is 10 to 1300 parts by weight with respect to 100 parts by weight of the vinyl chloride resin.

(16)上記基材がゴム系樹脂である。 (16) The base material is a rubber-based resin.

(17)ゴム系樹脂100重量部に対し、研磨剤が10〜1300重量部である。 (17) The abrasive is 10 to 1300 parts by weight with respect to 100 parts by weight of the rubber-based resin.

(18)上記研磨剤の砥粒の粒径が0.5μm〜2.5mmである。 (18) The abrasive grain size of the abrasive is 0.5 μm to 2.5 mm.

(19)上記研磨剤が天然砥粒からなる。 (19) The abrasive comprises natural abrasive grains.

(20)上記天然砥粒は、ダイヤモンド、コランダム、エメリー、ガーネット、珪石、スピネル、珪藻土、ドロマイド、トリポリ、浮石粉から選ばれた少なくとも1種の砥粒からなる。 (20) The natural abrasive is composed of at least one abrasive selected from diamond, corundum, emery, garnet, silica, spinel, diatomaceous earth, dolomide, tripoly, and pumice powder.

(21)上記天然砥粒は、植物性研磨剤である。 (21) The natural abrasive is a vegetable abrasive.

(22)上記植物性研磨剤は、ピーチの種、杏の種、クルミの殻、コーンの芯から選ばれた少なくとも1種の乾燥粉砕物からなる。 (22) The above-mentioned vegetable abrasive comprises at least one dry pulverized material selected from peach seed, apricot seed, walnut shell, and corn core.

(23)上記研磨剤が人造砥粒からなる。 (23) The abrasive is made of artificial abrasive grains.

(24)上記人造砥粒は、人造ダイヤモンド、炭化ホウ素、炭化ケイ素、溶融アルミナ、酸化鉄、酸化クロム、仮焼アルミナから選ばれた少なくとも1種の砥粒からなる。 (24) The artificial abrasive is composed of at least one abrasive selected from artificial diamond, boron carbide, silicon carbide, fused alumina, iron oxide, chromium oxide, and calcined alumina.

本発明のシート状研磨材によれば、被研磨物体の表面に沿って弾性変形可能なものであって、弾性材料からなる基材に、微細な砥粒からなる研磨剤が均一に混練含有されてなるから、以下に列挙するような種々の優れた特有の効果が発揮され、被研磨物体の表面の形状に関わりなく、球面等の曲面や複雑な形状表面を有する被研磨物体の研磨に広く適用することができ、しかも長期にわたり優れた研磨力を持続することができるシート状研磨材を提供することができる。   According to the sheet-like abrasive material of the present invention, it is elastically deformable along the surface of the object to be polished, and the abrasive material made of fine abrasive grains is uniformly kneaded and contained in the base material made of the elastic material. Therefore, various excellent specific effects as listed below are exhibited, and it is widely used for polishing objects to be polished having curved surfaces such as spherical surfaces or complicated shapes regardless of the shape of the surface of the object to be polished. It is possible to provide a sheet-like abrasive that can be applied and can maintain an excellent polishing force over a long period of time.

(1)基材が弾性材料からなり、柔軟性および復元性に富み、被研磨面が凹凸のある表面である場合や曲率の大きな曲面である場合、あるいは角部等の角張った面でも、研磨面を被研磨面に忠実に沿って接触させることができ、研磨ムラを生じることなく、高精度な研磨効果が得られる。 (1) The base material is made of an elastic material and is rich in flexibility and resilience. Polishing is possible even when the surface to be polished is an uneven surface, a curved surface with a large curvature, or an angular surface such as a corner. The surface can be brought into contact with the surface to be polished faithfully, and a highly accurate polishing effect can be obtained without causing uneven polishing.

(2)本発明の研磨材が被研磨物体表面の汚れを除去する(研磨する)メカニズムは、研磨材を被研磨面上の錆等の汚れに密着摩擦させることにより、研磨面上の基材に含有された研磨剤(砥粒)が、研磨材から離脱しながら被研磨面上の錆等の汚れを剥離除去するとともに、上記研磨剤(砥粒)の研磨面からの離脱による研磨面の自生作用により、研磨材の研磨面が新たに再生し露出する。したがって、本発明の研磨材は、使用済みの研磨剤(砥粒)が脱落しても、研磨時の自生作用により新しい研磨面が常時再生し露出して、研磨面は目詰まりを起こすことなく常時所期の研磨力を持続でき、これにより、優れた汚れ除去効果を長期にわたり発揮し得る。 (2) The mechanism of removing (polishing) the dirt on the surface of the object to be polished by the abrasive of the present invention is based on the fact that the abrasive is brought into close contact with the dirt such as rust on the surface to be polished, whereby the substrate on the polished surface The abrasive (abrasive grains) contained in the surface peels and removes dirt such as rust on the surface to be polished while being detached from the abrasive, and the abrasive surface (the abrasive grains) is removed from the polished surface. Due to the self-generated action, the polished surface of the abrasive is newly regenerated and exposed. Therefore, in the abrasive of the present invention, even if used abrasives (abrasive grains) fall off, a new polished surface is always regenerated and exposed due to the self-generated action during polishing, and the polished surface is not clogged. The desired polishing force can be maintained at all times, and thereby an excellent dirt removal effect can be exhibited over a long period of time.

(3)また、上記研磨面の自生作用により、研磨剤(砥粒)と共に研磨面から離脱する基材は、その特性(粘性)により、研磨剤(砥粒)と上記被研磨面から剥離除去された錆等の汚れを一緒に取り込んでまとまるため、研磨材で被研磨面の錆等を剥離除去した際に発生する研磨屑のまとまり性が良好で、研磨屑が周囲に散乱することがなく、作業環境や作業者の着衣を汚すといったトラブルを有効に防止することができる。 (3) Also, the substrate that is detached from the polishing surface together with the abrasive (abrasive grains) due to the self-generated action of the polishing surface is peeled and removed from the abrasive (abrasive grains) and the surface to be polished due to its characteristics (viscosity). Since the dirt such as rust is collected and collected together, the abrasive waste generated when the rust etc. on the surface to be polished is peeled and removed with an abrasive is good, and the abrasive waste is not scattered around It is possible to effectively prevent troubles such as contaminating the work environment and the clothes of the worker.

本発明の実施形態1であるシート状研磨材を示す斜視図である。It is a perspective view which shows the sheet-like abrasive | polishing material which is Embodiment 1 of this invention. 同研磨材により汚れを除去するメカニズムを説明するための図で、図2(a)は、研磨材で被研磨面を摩擦除去する状態を示す斜視図、図2(b)は同摩擦除去により生じた研磨屑を拡大して示す平面図である。FIG. 2A is a perspective view showing a state in which the surface to be polished is frictionally removed with the abrasive, and FIG. 2B is a diagram for explaining the mechanism for removing the dirt with the abrasive. It is a top view which expands and shows the generated grinding | polishing waste. 同研磨材の使用状態を示す斜視図で、図3(a)は水道の蛇口パイプの直円筒部分表面を研磨する状態、図3(b)は同じく同蛇口パイプの曲折円筒部分表面を研磨する状態、図3(c)はシンクの内側面角部表面を研磨する状態をそれぞれ示す。FIG. 3A is a perspective view showing a usage state of the abrasive, FIG. 3A is a state where a straight cylindrical portion surface of a tap pipe is polished, and FIG. 3B is a state where a bent cylindrical portion surface of the tap pipe is also polished. FIG. 3C shows a state in which the surface of the inner side corner of the sink is polished. 同じく同研磨材の使用状態を示す斜視図で、図4(a)は水道の蛇口操作部の円筒段部を研磨する状態、図4(b)はやかん本体の曲面状表面を研磨する状態、図4(c)はゴルフクラブのアイアンのシャフト表面を研磨する状態をそれぞれ示す。FIG. 4A is a perspective view showing the use state of the same abrasive, FIG. 4A is a state of polishing a cylindrical step portion of a tap faucet operation unit, FIG. 4B is a state of polishing a curved surface of a kettle body, FIG. 4C shows a state where the shaft surface of the iron of the golf club is polished. 同じく同研磨材の使用状態を示す斜視図で、図5(a)は研磨材を静止状態において、その研磨面に被研磨物体表面を擦り付けて研磨する状態、図5(b)は手に保持した被研磨物体表面を研磨材で研磨する状態をそれぞれ示す。Similarly, FIG. 5A is a perspective view showing the usage state of the abrasive, FIG. 5A is a state where the abrasive is in a stationary state, and the surface to be polished is rubbed against the polishing surface, and FIG. 5B is held in the hand. The state where the polished object surface is polished with an abrasive is shown. 本発明の実施形態2に係るシート状研磨材を示す斜視図である。It is a perspective view which shows the sheet-like abrasive | polishing material which concerns on Embodiment 2 of this invention. 同研磨材の使用態様を示し、図7(a)は掌で研磨材を裏面側へ円筒状に折り曲げた状態、図7(b)は同じく掌で研磨材を表面側へ円筒状に折り曲げた状態、図7(c)は図7(b)に示す状態に折り曲げて円筒パイプ表面を研磨する状態をそれぞれ示す。FIG. 7 (a) shows a state in which the abrasive is bent with a palm in a cylindrical shape toward the back side, and FIG. 7 (b) shows a state where the abrasive is bent in a cylindrical shape with the palm toward the front side. FIG. 7 (c) shows a state where the cylindrical pipe surface is polished by bending to the state shown in FIG. 7 (b). 本発明の実施形態3に係るシート状研磨材を示す斜視図である。It is a perspective view which shows the sheet-like abrasive | polishing material which concerns on Embodiment 3 of this invention. 同研磨材でやかん本体の曲面状表面を研磨する状態を示す斜視図である。It is a perspective view which shows the state which grind | polishes the curved surface of a kettle main body with the abrasive material. 本発明の実施形態4に係るシート状研磨材を示す斜視図である。It is a perspective view which shows the sheet-like abrasive | polishing material which concerns on Embodiment 4 of this invention. 同研磨材の使用態様を示し、図11(a)は円筒パイプの表面を研磨する状態、図11(b)はこの研磨時における研磨屑が柔軟性を付与するための円形孔部に進入集約された状態をそれぞれ示している。FIG. 11 (a) shows a state where the surface of the cylindrical pipe is polished, and FIG. 11 (b) shows a state where the polishing scraps at the time of polishing enter a circular hole for providing flexibility. Each state is shown. 本発明の実施形態5に係るシート状研磨材を示し、図12(a)は同シート状研磨材の斜視図、図12(b)は同研磨材が工具ボードに吊持状に係止保持された状態、図12(c)は同研磨材でドアノブ表面を研磨する状態をそれぞれ示している。12 shows a sheet-like abrasive according to Embodiment 5 of the present invention, FIG. 12 (a) is a perspective view of the sheet-like abrasive, and FIG. 12 (b) is a diagram showing the abrasive being suspended and held on a tool board. FIG. 12C shows a state where the surface of the doorknob is polished with the abrasive. 本発明の実施形態6に係るシート状研磨材を示し、図13(a)は同シート状研磨材の斜視図、図13(b)は同研磨材で細い円筒パイプ表面を研磨する状態をそれぞれ示している。FIG. 13A shows a perspective view of the sheet-like abrasive according to Embodiment 6 of the present invention, and FIG. 13B shows a state where a thin cylindrical pipe surface is polished with the abrasive. Show. 本発明に係るシート状研磨材のさらなる改変例を示す斜視図で、図14(a)は図6の実施形態2に係るシート状研磨材の改変例、図14(b)は図8の実施形態3に係るシート状研磨材の改変例をそれぞれ示している。FIG. 14A is a perspective view showing a further modified example of the sheet-like abrasive according to the present invention, FIG. 14A is a modified example of the sheet-like abrasive according to Embodiment 2 of FIG. 6, and FIG. 14B is the implementation of FIG. The modification of the sheet-like abrasive | polishing material which concerns on form 3 is shown, respectively.

以下、本発明の実施形態を図面に基づいて詳細に説明する。なお、図面全体にわたって同一の符号は同一の構成部材または要素を示している。   Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. Throughout the drawings, the same reference numeral indicates the same component or element.

実施形態1
本発明に係るシート状研磨材を図1〜図5に示し、この研磨材1は、具体的には、被研磨物体の表面に沿って弾性変形可能な弾性シートの形態とされ、図示の実施形態においては、図2〜5に示すように、片手Hによる手持ち作業に適した形状寸法の薄板状矩形シートの形態とされている。
Embodiment 1
A sheet-like abrasive according to the present invention is shown in FIGS. 1 to 5, and this abrasive 1 is specifically in the form of an elastic sheet that can be elastically deformed along the surface of an object to be polished. In the form, as shown in FIGS. 2 to 5, it is a form of a thin rectangular sheet having a shape and size suitable for a hand-held work with one hand H.

研磨材1の構成材料は、弾性材料からなる基材に、微細な砥粒からなる研磨剤が均一に混練含有されてなる。   The constituent material of the abrasive 1 is obtained by uniformly kneading and containing an abrasive made of fine abrasive grains in a base material made of an elastic material.

上記基材としては、安全性や環境保全の面から、スチレン系樹脂、オレフィン系樹脂、エチレン−酢酸ビニル系樹脂、塩化ビニル系樹脂、ゴム系樹脂の基材が好適で、これらは単独で、または必要に応じ2種以上組み合わせて用いられるが、特に、スチレン系樹脂、オレフィン系樹脂、ゴム系樹脂基材が好適である。   As the base material, from the viewpoint of safety and environmental conservation, a styrene resin, an olefin resin, an ethylene-vinyl acetate resin, a vinyl chloride resin, and a rubber resin base material are suitable, and these are independent. Alternatively, two or more types are used in combination as required, and styrene resins, olefin resins, and rubber resin substrates are particularly suitable.

スチレン系樹脂基材としては、例えば、スチレン−イソプレン−スチレン共重合体、スチレン−エチレンブチレン−スチレン共重合体、スチレン−ブタジエン−スチレン共重合体、スチレン−エチレンプロピレン−スチレン共重合体、スチレン系熱可塑性エラストマーコンパウンド等のスチレン系熱可塑性エラストマーが挙げられ、これらは単独で、または必要に応じ2種以上組み合わせて用いられる。さらに、他の基材と組み合わせても何ら差し支えない。   Examples of the styrene resin base material include styrene-isoprene-styrene copolymer, styrene-ethylenebutylene-styrene copolymer, styrene-butadiene-styrene copolymer, styrene-ethylenepropylene-styrene copolymer, and styrene-based resin. Examples thereof include styrenic thermoplastic elastomers such as thermoplastic elastomer compounds, which are used alone or in combination of two or more as required. Further, it may be combined with other base materials.

オレフィン系樹脂基材としては、例えば、住友TPE(住友化学工業株式会社)、ミラストマー(三井化学株式会社)、エチレン−αオレフィン共重合体、プロピレン−αオレフィン共重合体、エチレン−αオレフィン共重合体(メタロセン触媒)、非晶性ポリαオレフィン、高密度ポリエチレン、低密度ポリエチレン、超低密度ポリエチレン、ポリプロピレン等のオレフィン系エラストマーが挙げられ、これらは単独で、または必要に応じ2種以上組み合わせて用いられる。さらに、他の基材と組み合わせても何ら差し支えない。   Examples of the olefin-based resin substrate include Sumitomo TPE (Sumitomo Chemical Co., Ltd.), Miralastomer (Mitsui Chemicals), ethylene-α olefin copolymer, propylene-α olefin copolymer, ethylene-α olefin copolymer. Examples include olefin elastomers such as coalescence (metallocene catalyst), amorphous poly-α-olefin, high-density polyethylene, low-density polyethylene, ultra-low-density polyethylene, and polypropylene. These may be used alone or in combination of two or more as required. Used. Further, it may be combined with other base materials.

エチレン−酢酸ビニル系樹脂基材としては、例えば、エバフレックス(商品名、三井デュポン・ポリケミカル株式会社)、ウルトラセン(東ソー株式会社)が挙げられ、これらは単独で、または必要に応じ2種以上組み合わせて用いられる。さらに、他の基材と組み合わせても何ら差し支えない。   Examples of the ethylene-vinyl acetate resin substrate include EVAFLEX (trade name, Mitsui DuPont Polychemical Co., Ltd.) and Ultrasen (Tosoh Corp.). These may be used alone or as needed. Used in combination. Further, it may be combined with other base materials.

塩化ビニル系樹脂基材としては、従来用いられている塩化ビニル系樹脂が全て用いられ、例えば、重合度400〜3000程度のポリ塩化ビニルのほか、塩化ビニル−酢酸ビニル共重合体、エチレン−塩化ビニル共重合体等が挙げられ、これらは単独で、または必要に応じ2種以上組み合わせて用いられる。さらに、他の基材と組み合わせても何ら差し支えない。   As the vinyl chloride resin base material, all conventionally used vinyl chloride resins are used. For example, in addition to polyvinyl chloride having a polymerization degree of about 400 to 3000, a vinyl chloride-vinyl acetate copolymer, ethylene chloride. A vinyl copolymer etc. are mentioned, These are used individually or in combination of 2 or more types as needed. Further, it may be combined with other base materials.

ゴム系樹脂基材としては、例えば、IIR(ブチルゴム)、IR(イソプレンゴム)、SBR(スチレン−ブタジエンゴム)、BR(ブタジエンゴム)、EPM(エチレンプロピレンゴム)、EPDM(エチレンプロピレン三元共重合体)、アクリルゴム、ポリイソブチレン、NR(天然ゴム)が挙げられ、これらは単独で、または必要に応じ2種以上組み合わせて用いられる。さらに、他の基材と組み合わせても何ら差し支えない。   Examples of rubber-based resin base materials include IIR (butyl rubber), IR (isoprene rubber), SBR (styrene-butadiene rubber), BR (butadiene rubber), EPM (ethylene propylene rubber), and EPDM (ethylene propylene ternary copolymer). Coalesced), acrylic rubber, polyisobutylene, and NR (natural rubber). These may be used alone or in combination of two or more as required. Further, it may be combined with other base materials.

上記研磨剤としては、従来用いられている研磨剤が全て用いられ、例えば、代表例として、ダイヤモンド、コランダム、エメリー、ガーネット、珪石、スピネル、珪藻土、ドロマイド、トリポリ、浮石粉等の天然砥粒、あるいは、人造ダイヤモンド、炭化ホウ素、炭化ケイ素、溶融アルミナ、酸化鉄、酸化クロム、仮焼アルミナ等の人造砥粒が挙げられ、これらは単独で、または必要に応じ2種以上組み合わせて用いられる。   As the abrasive, all conventionally used abrasives are used. For example, as a representative example, natural abrasive grains such as diamond, corundum, emery, garnet, quartzite, spinel, diatomaceous earth, dolomide, tripoly, float stone powder, Alternatively, artificial abrasive grains such as artificial diamond, boron carbide, silicon carbide, fused alumina, iron oxide, chromium oxide, calcined alumina and the like can be mentioned, and these can be used alone or in combination of two or more as required.

また、上記天然砥粒として、コーンの芯、クルミの殻、杏の種、ピーチの種等の植物性研磨剤もあり、環境保全や廃物の有効利用の点からはこれら植物性研磨剤が好ましい。植物性研磨剤は乾燥し粉砕した乾燥粉砕物が用いられ、これらは、単独で、または必要に応じ2種以上組み合わせて用いられる。   In addition, as the above-mentioned natural abrasive grains, there are also plant abrasives such as corn core, walnut shell, apricot seed, peach seed, etc., and these vegetable abrasives are preferable from the viewpoint of environmental conservation and effective use of waste. . As the plant abrasive, a dried and pulverized dried product is used, and these are used alone or in combination of two or more as required.

上記研磨剤の砥粒の粒径は、0.5μm〜2.5mmが好ましい。0.5μm未満では研磨材表面(研磨面)の凹凸が小さ過ぎて、研磨効果は小さい。一方、粒径が大きいほど研磨効果は大きいが、2.5mmより大きいと研磨剤の基材からの脱落が増加するので好ましくない。   The particle diameter of the abrasive grains of the abrasive is preferably 0.5 μm to 2.5 mm. If it is less than 0.5 μm, the unevenness on the surface of the abrasive (polishing surface) is too small and the polishing effect is small. On the other hand, the larger the particle size, the greater the polishing effect. However, when the particle size is larger than 2.5 mm, it is not preferable because the removal of the abrasive from the substrate increases.

スチレン系樹脂基材と研磨剤の配合割合は、スチレン系樹脂100重量部に対し、研磨剤が10〜1300重量部である。研磨剤が10重量部未満では研磨剤と汚れの接触が減少し、研磨効果は小さくなる。一方、研磨剤が1300重量部より大きいと、研磨剤のスチレン系樹脂基材からの脱落が増加する。   The blending ratio of the styrene resin base material and the abrasive is 10 to 1300 parts by weight of the abrasive with respect to 100 parts by weight of the styrene resin. When the abrasive is less than 10 parts by weight, the contact between the abrasive and dirt is reduced, and the polishing effect is reduced. On the other hand, when the polishing agent is larger than 1300 parts by weight, dropping of the polishing agent from the styrene resin substrate increases.

オレフィン系樹脂基材と研磨剤の配合割合は、オレフィン系樹脂100重量部に対し、研磨剤が10〜1300重量部である。研磨剤が10重量部未満では研磨剤と汚れの接触が減少し、研磨効果は小さくなる。一方、研磨剤が1300重量部より大きいと、研磨剤のオレフィン系樹脂基材からの脱落が増加する。   The blending ratio of the olefin resin substrate and the abrasive is 10 to 1300 parts by weight of the abrasive with respect to 100 parts by weight of the olefin resin. When the abrasive is less than 10 parts by weight, the contact between the abrasive and dirt is reduced, and the polishing effect is reduced. On the other hand, when the polishing agent is larger than 1300 parts by weight, dropping of the polishing agent from the olefin resin substrate increases.

エチレン−酢酸ビニル系樹脂基材と研磨剤の配合割合は、エチレン−酢酸ビニル系樹脂100重量部に対し、研磨剤が10〜1300重量部である。研磨剤が10重量部未満では研磨剤と汚れの接触が減少し、研磨効果は小さくなる。一方、研磨剤が1300重量部より大きいと、研磨剤のエチレン−酢酸ビニル系樹脂基材からの脱落が増加する。   The blending ratio of the ethylene-vinyl acetate resin base material and the abrasive is 10 to 1300 parts by weight of the abrasive with respect to 100 parts by weight of the ethylene-vinyl acetate resin. When the abrasive is less than 10 parts by weight, the contact between the abrasive and dirt is reduced, and the polishing effect is reduced. On the other hand, when the polishing agent is larger than 1300 parts by weight, dropping of the polishing agent from the ethylene-vinyl acetate resin substrate increases.

塩化ビニル系樹脂基材と研磨剤の配合割合は、塩化ビニル系樹脂100重量部に対し、研磨剤が10〜1300重量部である。研磨剤が10重量部未満では研磨剤と汚れの接触が減少し、研磨効果は小さくなる。一方、研磨剤が1300重量部より大きいと、研磨剤の塩化ビニル系樹脂基材からの脱落が増加する。   The blending ratio of the vinyl chloride resin substrate and the abrasive is 10 to 1300 parts by weight of the abrasive with respect to 100 parts by weight of the vinyl chloride resin. When the abrasive is less than 10 parts by weight, the contact between the abrasive and dirt is reduced, and the polishing effect is reduced. On the other hand, when the polishing agent is larger than 1300 parts by weight, dropping of the polishing agent from the vinyl chloride resin base material increases.

ゴム系樹脂基材と研磨剤の配合割合は、ゴム系樹脂100重量部に対し、研磨剤が10〜1300重量部である。研磨剤が10重量部未満では研磨剤と汚れの接触が減少し、研磨効果は小さくなる。一方、研磨剤が1300重量部より大きいと、研磨剤のゴム系樹脂基材からの脱落が増加する。   The mixing ratio of the rubber-based resin substrate and the abrasive is 10 to 1300 parts by weight of the abrasive with respect to 100 parts by weight of the rubber-based resin. When the abrasive is less than 10 parts by weight, the contact between the abrasive and dirt is reduced, and the polishing effect is reduced. On the other hand, when the polishing agent is larger than 1300 parts by weight, dropping of the polishing agent from the rubber-based resin substrate increases.

以上のようなスチレン系樹脂、オレフィン系樹脂、エチレン−酢酸ビニル系樹脂、塩化ビニル系樹脂あるいはゴム系樹脂の基材単独のほか、これら基材を2種以上組み合わせてなる基材と研磨材の配合割合も、上記と同様の理由から、基材100重量部に対し、研磨材が10〜1300重量部である。   In addition to the above-mentioned styrene resins, olefin resins, ethylene-vinyl acetate resins, vinyl chloride resins or rubber resins alone, a combination of two or more of these substrates and abrasives For the same reason as above, the blending ratio is 10 to 1300 parts by weight of the abrasive with respect to 100 parts by weight of the base material.

さらに、必要に応じて、重質炭酸カルシウム、軽質炭酸カルシウム、シリカ、珪藻土、酸化マグネシウム、タルク、セリサイト、石英粉末、モンモリロナイト、ホタテ、カキ、しじみなどの貝殻粉末などの充填剤および有機・無機顔料、染料などの着色材、安定剤、滑剤、酸化防止剤、紫外線吸収剤、防カビ剤などの他の添加物も適宜任意に使用することも可能である。   In addition, fillers such as heavy calcium carbonate, light calcium carbonate, silica, diatomaceous earth, magnesium oxide, talc, sericite, quartz powder, shell powder such as montmorillonite, scallops, oysters, and stains, as well as organic and inorganic Other additives such as colorants such as pigments and dyes, stabilizers, lubricants, antioxidants, ultraviolet absorbers, and fungicides can be used as appropriate.

上記基材と研磨剤とからなる配合物は、均一に混練され、プレス成形、射出成形、押出成形等により成形され、所望の形状寸法に裁断されて図1に示されるシート状研磨材1とされる。   The composition comprising the base material and the abrasive is uniformly kneaded, molded by press molding, injection molding, extrusion molding or the like, cut into a desired shape dimension, and the sheet-shaped abrasive 1 shown in FIG. Is done.

このようにして製作されたシート状研磨材1は、図1に示すように、表裏両面1a、1bが平面状の研磨面とされるとともに、その板厚tが0.5〜5.0mmに設定されている。板厚tが0.5mm未満であると、強度不足で早期に破損してしまい、所期の寿命が得られず、一方、板厚tが5.0mmより大きいと柔軟性が損なわれて、所期の撓み性ないしは湾曲性が得られない。
図示の実施形態のシート状研磨材1の板厚tは0.7mmに設定されている。
As shown in FIG. 1, the sheet-like abrasive 1 produced in this way has both front and back surfaces 1a and 1b made flat and has a plate thickness t of 0.5 to 5.0 mm. Is set. If the plate thickness t is less than 0.5 mm, it will be damaged early due to insufficient strength, and the expected life will not be obtained, while if the plate thickness t is greater than 5.0 mm, the flexibility will be impaired, The desired flexibility or curvature cannot be obtained.
The sheet thickness t of the sheet-like abrasive 1 of the illustrated embodiment is set to 0.7 mm.

なお、シート状研磨材1は、上記基材に研磨剤が均一に混練含有されてなる構成であることから、全体が研磨材として機能し、後述するように、表裏研磨面1a、1bのみならず、薄肉側面1cも研磨面ないしは研磨部として機能し得る。この薄肉側面1cは、特に狭い箇所や角張った凹部の隅部分を研磨するのに適している。   In addition, since the sheet-like abrasive 1 has a configuration in which the abrasive is uniformly mixed and contained in the base material, the entire sheet functions as an abrasive and, as will be described later, only the front and back polishing surfaces 1a and 1b. In addition, the thin side surface 1c can also function as a polishing surface or a polishing portion. The thin side surface 1c is particularly suitable for polishing a narrow portion or a corner portion of an angular recess.

また、上記研磨材1が被研磨物体表面の汚れを除去する(研磨する)メカニズムは、図2(a)に示すように、研磨材1を被研磨物体例えばステンレス製テーブル2の表面(被研磨面)2a上の錆等の汚れに密着摩擦させることにより、研磨面1a上の基材に含有された研磨剤(砥粒)が、研磨材1から離脱しながら被研磨面2a上の錆等の汚れを剥離除去するとともに、上記研磨剤(砥粒)の研磨面1aからの離脱による研磨面1aの自生作用により、研磨材1の研磨面1aが新たに再生し露出する。   The polishing material 1 removes (polishes) dirt on the surface of the object to be polished, as shown in FIG. 2A. The mechanism of polishing material 1 is the surface of the object to be polished such as a stainless steel table 2 (to be polished). Surface) By rubbing closely against dirt such as rust on the surface 2a, the abrasive (abrasive grains) contained in the base material on the polishing surface 1a is detached from the abrasive 1 while rusting on the surface 2a to be polished. The polishing surface 1a of the abrasive 1 is newly regenerated and exposed by the self-generated action of the polishing surface 1a due to the removal of the abrasive (abrasive grains) from the polishing surface 1a.

これにより、上記研磨材1は、研磨時の自生作用により、剥離除去された錆等の汚れが研磨面1aに付着して目詰まりを起こすことがなく、新しく露出した研磨面1aにより、常時優れた汚れ除去効果(研磨効果)を長期にわたり発揮し得る。   As a result, the polishing material 1 is always excellent by the newly exposed polishing surface 1a without causing dirt such as rust that has been peeled and removed to adhere to the polishing surface 1a due to the self-generated action during polishing. The dirt removal effect (polishing effect) can be demonstrated over a long period of time.

一方、上記研磨面1aの自生作用により、研磨剤(砥粒)と共に研磨面から離脱した基材は、その特性(粘性)により、研磨剤(砥粒)と上記被研磨面2aから剥離除去された錆等の汚れを一緒に取り込んで、図2(b)に示すように、被研磨面2a上に研磨屑sとしてまとまり、周囲に散乱することがない。   On the other hand, the base material detached from the polishing surface together with the polishing agent (abrasive grains) due to the self-generated action of the polishing surface 1a is peeled off from the polishing agent (abrasive grains) and the surface to be polished 2a due to its characteristics (viscosity). As shown in FIG. 2 (b), dirt such as rust is collected together on the surface 2a to be polished as scraps s and is not scattered around.

しかして、以上のように構成された研磨材1により被研磨物体の表面を研磨するには、図3および図4に示すように、片手Hに研磨材1を把持して、その研磨面例えば研磨面1aを固定的に設けられた被研磨物体の表面(被研磨面)に沿わせながら密着摩擦したり、図5(a)に示すように、研磨材1を安定した場所に静止状態で置き、その研磨面1aに被研磨物体表面を擦り付けたり、あるいは、図5(b)に示すように、片手Hに保持した被研磨物体表面をもう一方の片手Hで把持した研磨材1で密着摩擦する。   Thus, in order to polish the surface of the object to be polished with the polishing material 1 configured as described above, as shown in FIGS. 3 and 4, the polishing material 1 is held by one hand H and the polishing surface, for example, The polishing surface 1a is rubbed in close contact with the surface (surface to be polished) of the object to be polished fixedly provided, or the abrasive 1 is placed in a stationary state in a stable place as shown in FIG. 5 (a). Place the surface of the object to be polished against the polishing surface 1a, or attach the surface of the object to be polished held in one hand H with the abrasive 1 held by the other hand H as shown in FIG. Rubbing.

具体的には、図3(a)は、被研磨物体として、水道の蛇口3におけるパイプ5の直円筒部分5a表面を、研磨材1の研磨面1aで研磨する状態、図3(b)は、被研磨物体として、同じく同蛇口3のパイプ5の曲折円筒部分5b表面を、研磨材1の研磨面1aで研磨する状態、および図3(c)は、被研磨物体として、シンク6の内側面角部6aの表面を、研磨材1の研磨面1aで研磨する状態をそれぞれ示しており、いずれの場合も、研磨材1の研磨面1aは、パイプ5の直円筒部分5aの円筒面、パイプ5の曲折円筒部分5bの凸湾曲した円筒面およびシンク6の内側面角部6aの凹湾曲面に、それぞれ忠実に沿って密着摩擦できる。   Specifically, FIG. 3A shows a state where the surface of the straight cylindrical portion 5a of the pipe 5 in the tap 3 is polished with the polishing surface 1a of the abrasive 1 as an object to be polished, and FIG. Similarly, the surface of the bent cylindrical portion 5b of the pipe 5 of the faucet 3 is polished by the polishing surface 1a of the abrasive 1 as shown in FIG. The surface of the side corner 6a is shown in a state where it is polished by the polishing surface 1a of the abrasive 1, and in each case, the polishing surface 1a of the abrasive 1 is the cylindrical surface of the straight cylindrical portion 5a of the pipe 5, The pipe 5 can be rubbed closely along the convex curved cylindrical surface of the bent cylindrical portion 5b and the concave curved surface of the inner side corner portion 6a of the sink 6.

また、図4(a)は、被研磨物体として、水道の蛇口5の操作部の円筒段部7を、研磨材1の薄肉側面1cで研磨する状態、図4(b)は、被研磨物体として、やかん8の本体の曲面状表面8aを、研磨材1の研磨面1aで研磨する状態、図4(c)は、被研磨物体として、ゴルフクラブのアイアン9のシャフト9aの表面を、研磨材1の研磨面1aで研磨する状態をそれぞれ示しており、いずれの場合も、研磨材1の薄肉側面1cおよび研磨面1aは、蛇口5の操作部の円筒段部7、やかん8の曲面状表面8aおよびアイアン9のシャフト9aの表面に、それぞれ忠実に沿って密着摩擦できる。   4A shows a state where the cylindrical stepped portion 7 of the operation portion of the tap 5 is polished with the thin side surface 1c of the abrasive 1, and FIG. 4B shows the object to be polished. As shown in FIG. 4C, the curved surface 8a of the main body of the kettle 8 is polished by the polishing surface 1a of the abrasive 1, and the surface of the shaft 9a of the golf club iron 9 is polished as an object to be polished. In each case, the thin-walled side surface 1c and the polished surface 1a of the abrasive material 1 are curved on the cylindrical step 7 of the operation portion of the faucet 5 and the curved shape of the kettle 8 respectively. The surface 8a and the surface of the shaft 9a of the iron 9 can be rubbed closely along the surfaces.

また、図5(a)は、研磨材1を安定した場所に研磨面1aを上にして静止状態で置き、その研磨面1aに被研磨物体としての円環状部材10の表面を擦り付けて研磨する状態、図5(b)は、片手Hに保持した被研磨物体としての円環状部材10の表面を、もう一方の片手Hで把持した研磨材1の研磨面1b、1cで研磨する状態をそれぞれ示しており、いずれの場合も、研磨材1の研磨面1a、1bまたは薄肉側面1cに、円環状部材10の表面をそれぞれ忠実に沿って密着摩擦できる。   In FIG. 5A, the polishing material 1 is placed in a stable position with the polishing surface 1a facing upward, and the surface of the annular member 10 as the object to be polished is rubbed against the polishing surface 1a for polishing. FIG. 5B shows a state in which the surface of the annular member 10 as an object to be polished held in one hand H is polished by the polishing surfaces 1b and 1c of the abrasive 1 held by the other hand H, respectively. In any case, the surface of the annular member 10 can be rubbed closely against the polishing surfaces 1a, 1b or the thin side surface 1c of the polishing material 1 along the respective faithfully.

以上のように、本実施形態のシート状研磨材1は、被研磨物体5a、5b、6a、7、8の表面に沿って弾性変形可能なものであって、弾性材料からなる基材に、微細な砥粒からなる研磨剤が均一に混練含有されてなるから、以下に列挙するような優れた特有の効果が発揮され、被研磨物体5a、5b、6a、7、8の表面の形状に関わりなく、球面等の曲面や複雑な形状表面を有する被研磨物体5a、5b、6a、7、8の研磨に広く適用することができる。   As described above, the sheet-like abrasive 1 of the present embodiment is elastically deformable along the surfaces of the objects to be polished 5a, 5b, 6a, 7, and 8, and is formed on a base material made of an elastic material. Since the abrasive comprising fine abrasive grains is uniformly kneaded and contained, the excellent specific effects listed below are exhibited, and the surface shapes of the objects to be polished 5a, 5b, 6a, 7, and 8 are obtained. Regardless, the present invention can be widely applied to the polishing of objects to be polished 5a, 5b, 6a, 7, 8 having curved surfaces such as spherical surfaces or surfaces having complicated shapes.

(a)基材が弾性材料からなり、柔軟性および復元性に富み、被研磨面が凹凸のある表面である場合や曲率の大きな曲面である場合、あるいは角部等の角張った面でも、研磨面を被研磨面に忠実に沿って接触させることができ、研磨ムラを生じることなく、高精度な研磨効果が得られる。 (A) The base material is made of an elastic material and is rich in flexibility and resilience. Polishing is possible even when the surface to be polished is an uneven surface, a curved surface with a large curvature, or an angular surface such as a corner. The surface can be brought into contact with the surface to be polished faithfully, and a highly accurate polishing effect can be obtained without causing uneven polishing.

(b)本実施形態の研磨材1が被研磨物体5a、5b、6a、7、8表面の汚れを除去する(研磨する)メカニズムは、研磨材1を被研磨面上の錆等の汚れに密着摩擦させることにより、研磨面1a上の基材に含有された研磨剤(砥粒)が、研磨材1から離脱しながら被研磨面上の錆等の汚れを剥離除去するとともに、上記研磨剤(砥粒)の研磨面からの離脱による研磨面の自生作用により、研磨材1の研磨面が新たに再生し露出する。したがって、本実施形態の研磨材1は、この研磨時の自生作用により露出する新しい研磨面1aによって、常時優れた汚れ除去効果を長期にわたり発揮し得る。 (B) The polishing material 1 of this embodiment removes (polishes) the surface of the objects 5a, 5b, 6a, 7, and 8 to be polished. The abrasive (abrasive grain) contained in the base material on the polishing surface 1a peels and removes dirt such as rust on the surface to be polished while being detached from the polishing material 1 by the close contact friction. The polished surface of the abrasive 1 is newly regenerated and exposed by the self-generated action of the polished surface due to the removal of the (abrasive grains) from the polished surface. Therefore, the abrasive 1 of the present embodiment can always exhibit an excellent dirt removing effect over a long period of time due to the new polished surface 1a exposed by the self-generated action during polishing.

(c)また、上記研磨面1aの自生作用により、研磨剤(砥粒)と共に研磨面1aから離脱する基材は、その特性(粘性)により、研磨剤(砥粒)と上記被研磨面から剥離除去された錆等の汚れを一緒に取り込んでまとまるため、研磨材1で被研磨面の錆等を剥離除去した際に発生する研磨屑sのまとまり性が良好で、研磨屑sが周囲に散乱することがなく、作業環境や作業者の着衣を汚すといったトラブルを有効に防止することができる。 (C) Further, the base material that is detached from the polishing surface 1a together with the polishing agent (abrasive grains) due to the self-generated action of the polishing surface 1a is separated from the polishing agent (abrasive grains) and the surface to be polished by its characteristics (viscosity). Since the dirt such as rust that has been peeled and removed is collected and collected together, the abrasive waste s that is generated when the abrasive 1 peels and removes the rust and the like on the surface to be polished is well organized. It does not scatter and can effectively prevent troubles such as dirty work environment and worker clothes.

実施形態2
本実施形態は図6および図7に示されており、具体的な形状構造が改変されたものである。
Embodiment 2
This embodiment is shown in FIG. 6 and FIG. 7, and a specific shape structure is modified.

すなわち、本実施形態のシート状研磨材11は、図6に示すように、実施形態1のシート状研磨材1よりも板厚tが大きく設定され、具体的には3.0mmに設定されている。なお、シート状研磨材11の板厚tが、目的に応じて、0.5〜5.0mmの範囲内で設定されるのは、実施型態1の場合と同様である。   That is, as shown in FIG. 6, the sheet-like abrasive 11 of the present embodiment has a thickness t set larger than that of the sheet-like abrasive 1 of the first embodiment, specifically, is set to 3.0 mm. Yes. The thickness t of the sheet-like abrasive 11 is set within the range of 0.5 to 5.0 mm depending on the purpose, as in the case of the embodiment 1.

上記研磨材11の表面11aには、凹溝12が複数本等間隔をもって直線状に配されてなり、これにより表面11aは波状凹凸模様の研磨面とされている。一方、研磨材11の裏面11bは実施形態1の研磨材1と同様に、平面状の研磨面とされている。   On the surface 11a of the abrasive 11, a plurality of concave grooves 12 are linearly arranged at equal intervals, whereby the surface 11a is a polished surface with a wavy uneven pattern. On the other hand, the back surface 11b of the abrasive 11 is a flat polished surface, similar to the abrasive 1 of the first embodiment.

本実施形態の研磨材11においては、上記複数の凹溝12、12、…の部分で板厚tが小さくなり、これにより研磨材11には、凹溝12、12、…の配列方向に対して実施形態1の研磨材1と同等の柔軟性が付与される。その結果、図7(a)および図7(b)に示すように、片手Hの掌に研磨材11を抱持状に持って握ることにより、研磨材11が図示のごとく筒状に容易に曲がる。   In the abrasive material 11 of the present embodiment, the plate thickness t is reduced at the portions of the plurality of concave grooves 12, 12,..., Thereby causing the abrasive material 11 to have the concave grooves 12, 12,. Thus, the same flexibility as that of the abrasive 1 of the first embodiment is provided. As a result, as shown in FIGS. 7 (a) and 7 (b), the abrasive 11 can be easily held in a cylindrical shape as shown in the figure by holding the abrasive 11 in the shape of a hand in the palm of one hand H. Bend.

なお、研磨材11に要求される具体的な柔軟度は、研磨材11の板厚tと、凹溝12の断面形状寸法、および配列ピッチ等とを適宜設定調整することにより得ることができる。   Note that the specific flexibility required for the abrasive 11 can be obtained by appropriately setting and adjusting the plate thickness t of the abrasive 11, the cross-sectional shape dimensions of the grooves 12, the arrangement pitch, and the like.

しかして、以上のように構成された研磨材11によれば、図7(c)に示すように、片手Hの掌に持った研磨材11を、被研磨物体である円筒パイプ13の外周円筒面に巻き付けて、掌により抱持状に握ることで、その研磨面(図示の場合は研磨面1a)が円筒パイプ13の外周円筒面(被研磨面)に忠実に沿って接触し、この状態で、研磨材11を円筒パイプ13に対して軸線方向および/または円周方向へ相対的に移動させることで、研磨ムラを生じることなく、高精度な研磨効果が得られる。   Thus, according to the polishing material 11 configured as described above, as shown in FIG. 7C, the polishing material 11 held in the palm of one hand H is used as the outer peripheral cylinder of the cylindrical pipe 13 that is the object to be polished. By wrapping around the surface and holding it with a palm, the polished surface (in the illustrated case, the polished surface 1a) is in close contact with the outer peripheral cylindrical surface (surface to be polished) of the cylindrical pipe 13 in this state. Thus, by moving the abrasive 11 relative to the cylindrical pipe 13 in the axial direction and / or the circumferential direction, a highly accurate polishing effect can be obtained without causing uneven polishing.

また、研磨材11の表面11aが凹溝12、12、…による波状凹凸模様の研磨面とされることで、被研磨物体の被研磨面に対する接触面積が実施形態1の平面からなる研磨面1aに比較して小さくなり、この結果、例えば図示の実施形態の円筒パイプ13の外周円筒面(被研磨面)を研磨する場合に、実施形態1の場合よりも上記被研磨面との摩擦係数が少なくて滑りが良く、より円滑な研磨作業が実現する。   Further, the surface 11a of the abrasive 11 is a polished surface having a wavy uneven pattern formed by the grooves 12, 12,..., So that the contact area of the object to be polished with the surface to be polished is the polishing surface 1a having the flat surface of the first embodiment. As a result, for example, when the outer peripheral cylindrical surface (surface to be polished) of the cylindrical pipe 13 of the illustrated embodiment is polished, the coefficient of friction with the surface to be polished is larger than in the case of Embodiment 1. Less slippery and smoother polishing work.

さらに、上記凹溝12は、研磨時における研磨屑の収容溝としても機能する。すなわち、図2(a)および(b)を参照して、研磨時に研磨材11から離脱した研磨屑sは、図2(b)に示すように、基材の特性(粘性)により、研磨剤(砥粒)と上記被研磨面から剥離除去された錆等の汚れを取り込んで被研磨面上にまとまり、さらに研磨材11の凹溝12、12、…の収容作用により、これら凹溝12、12、…に進入集約されて、周囲に散乱することがない。
その他の構成および作用は実施形態1と同様である。
Further, the concave groove 12 also functions as a receiving groove for polishing waste during polishing. That is, referring to FIGS. 2 (a) and 2 (b), as shown in FIG. 2 (b), the polishing debris s detached from the abrasive 11 at the time of polishing is caused by the characteristics (viscosity) of the base material. (Abrasive grains) and dirt such as rust removed from the surface to be polished are collected and collected on the surface to be polished, and further, the concave grooves 12, 12,... 12 and so on, and are not scattered around.
Other configurations and operations are the same as those of the first embodiment.

実施形態3
本実施形態は図8および図9に示されており、具体的な形状構造が改変されたものである。
Embodiment 3
This embodiment is shown in FIG. 8 and FIG. 9, and a specific shape structure is modified.

すなわち、本実施形態のシート状研磨材21は、図8に示すように、実施形態1のシート状研磨材1よりも板厚tが大きく設定され、具体的には3.0mmに設定されている。なお、シート状研磨材11の板厚tが、目的に応じて、0.5〜5.0mmの範囲内で設定されるのは、実施型態1の場合と同様である。   That is, as shown in FIG. 8, the sheet-like abrasive 21 of the present embodiment has a plate thickness t larger than that of the sheet-like abrasive 1 of the first embodiment, specifically, is set to 3.0 mm. Yes. The thickness t of the sheet-like abrasive 11 is set within the range of 0.5 to 5.0 mm depending on the purpose, as in the case of the embodiment 1.

上記研磨材21の表面21aには、凹溝12、22が複数等間隔をもって交差状に配されてなり、これにより表面21aは格子状凹凸模様23の研磨面とされている。一方、研磨材11の裏面11bは実施形態1の研磨材1と同様に、平面状の研磨面とされている。   On the surface 21 a of the abrasive 21, a plurality of concave grooves 12, 22 are arranged in an intersecting manner at equal intervals, whereby the surface 21 a is a polished surface of the lattice-shaped uneven pattern 23. On the other hand, the back surface 11b of the abrasive 11 is a flat polished surface, similar to the abrasive 1 of the first embodiment.

本実施形態の研磨材21においては、上記複数の凹溝12、12、…および22、22、…の部分で板厚tが小さくなり、これにより研磨材21には、凹溝12、12、…の配列方向に対して実施形態1の研磨材1と同等の柔軟性が付与されるとともに、凹溝22、22、…の配列方向に対しても実施形態1の研磨材1と同等の柔軟性が付与される。その結果、研磨材21は凹溝12、22に沿った両方向(直交する2方向)つまり二次元方向へ実施形態1の研磨材1と同程度の柔軟性をもって曲がり、これにより研磨材21は略球状に実施形態1の研磨材1と同等の柔軟性が付与されることになる。   In the abrasive 21 of the present embodiment, the plate thickness t is reduced at the portions of the plurality of concave grooves 12, 12,..., 22, 22,. The same flexibility as that of the abrasive 1 of the first embodiment is imparted to the arrangement direction of... And the same flexibility as that of the abrasive 1 of the first embodiment also in the arrangement direction of the concave grooves 22, 22. Sex is imparted. As a result, the abrasive 21 bends in both directions (two orthogonal directions) along the concave grooves 12 and 22, that is, in a two-dimensional direction, with the same degree of flexibility as the abrasive 1 of the first embodiment. Flexibility equivalent to that of the abrasive 1 of Embodiment 1 is imparted in a spherical shape.

なお、研磨材21に要求される具体的な柔軟度は、実施形態2と同様に、研磨材21の板厚tと、凹溝12、22の断面形状寸法、およびこれら凹溝12、22の配列ピッチ等とを適宜設定調整することにより得ることができる。   Note that the specific flexibility required for the abrasive 21 is the same as in the second embodiment, the plate thickness t of the abrasive 21, the cross-sectional shape dimensions of the grooves 12, 22, and the grooves 12, 22. It can be obtained by appropriately setting and adjusting the arrangement pitch and the like.

しかして、以上のように構成された研磨材21によれば、図9に示すように、片手Hの掌に持った研磨材21を、被研磨物体であるやかん8の本体の曲面状表面8aに覆い被せるように当てることで、その研磨面(図示の場合は研磨面21b)がやかん8の曲面状表面(被研磨面)8aに忠実に沿って接触し、この状態で、研磨材21を円筒パイプ13に対して相対的に移動させることで、研磨ムラを生じることなく、高精度な研磨効果が得られる。   Thus, according to the abrasive 21 configured as described above, as shown in FIG. 9, the abrasive 21 held in the palm of one hand H is used as the curved surface 8a of the main body of the kettle 8 that is the object to be polished. The polishing surface (the polishing surface 21b in the illustrated case) is in contact with the curved surface (surface to be polished) 8a of the kettle 8 faithfully along the surface. By moving relative to the cylindrical pipe 13, a highly accurate polishing effect can be obtained without causing uneven polishing.

また、研磨材21の表面21aが凹溝12、22、…による格子状凹凸模様23の研磨面とされることで、被研磨物体の被研磨面に対する接触面積が実施形態1の研磨面1aに比較して実施形態2の場合よるもさらに小さくなり、この結果、例えば図示の実施形態のやかん8の曲面状表面(被研磨面)8aを研磨する場合に、実施形態1の場合よりも上記被研磨面8aとの摩擦係数が少なくて滑りが良く、より円滑な研磨作業が実現する。   Further, the surface 21a of the abrasive 21 is used as a polishing surface of the lattice-shaped uneven pattern 23 formed by the grooves 12, 22,..., So that the contact area of the object to be polished with the surface to be polished is the polishing surface 1a of the first embodiment. Compared to the case of the second embodiment, the size is further reduced. As a result, for example, when the curved surface (surface to be polished) 8a of the kettle 8 of the illustrated embodiment is polished, the above-described coverage is reduced compared to the case of the first embodiment. The friction coefficient with the polishing surface 8a is small, and the sliding is good, thereby realizing a smoother polishing operation.

さらに、上記凹溝12、22は、実施形態2の場合と同様に、研磨時における研磨屑の収容溝としても機能する。すなわち、図2(a)および(b)を参照して、研磨時に研磨材21から離脱した研磨屑sは、図2(b)に示すように、基材の特性(粘性)により、研磨剤(砥粒)と上記被研磨面から剥離除去された錆等の汚れを取り込んで被研磨面上にまとまり、さらに研磨材21の凹溝12、22、…の収容作用により、これら凹溝12、22、…に進入集約されて、周囲に散乱することがない。
その他の構成および作用は実施形態1と同様である。
Furthermore, the concave grooves 12 and 22 also function as a polishing waste storage groove during polishing, as in the second embodiment. That is, referring to FIGS. 2 (a) and 2 (b), as shown in FIG. 2 (b), the polishing debris s detached from the abrasive 21 at the time of polishing becomes abrasive due to the characteristics (viscosity) of the substrate. (Abrasive grains) and dirt such as rust removed from the surface to be polished are collected and collected on the surface to be polished, and further, the concave grooves 12, 22,... 22 and so on, and are not scattered around.
Other configurations and operations are the same as those of the first embodiment.

実施形態4
本実施形態は図10および図11示されており、具体的な形状構造が改変されたものである。
Embodiment 4
This embodiment is shown in FIG. 10 and FIG. 11 and has a specific shape structure modified.

すなわち、本実施形態のシート状研磨材31は、図10に示すように、実施形態1のシート状研磨材1よりも板厚tが大きく設定され、具体的には、実施形態2および3と同様の3.0mmに設定されている。なお、シート状研磨材11の板厚tが、目的に応じて、0.5〜5.0mmの範囲内で設定されるのは、実施型態1の場合と同様である。   That is, as shown in FIG. 10, the sheet-like abrasive 31 of the present embodiment is set to have a plate thickness t larger than that of the sheet-like abrasive 1 of the first embodiment. The same 3.0 mm is set. The thickness t of the sheet-like abrasive 11 is set within the range of 0.5 to 5.0 mm depending on the purpose, as in the case of the embodiment 1.

上記研磨材31の表裏面31a、31bには、柔軟性を付与するための円形孔部32が複数均等に表裏面31a、31bに貫設して配されてなり、これにより表裏面31a、31bは水玉凹凸模様の研磨面とされている。   The front and back surfaces 31a and 31b of the abrasive 31 are provided with a plurality of circular hole portions 32 for imparting flexibility evenly penetrating the front and back surfaces 31a and 31b. Is a polished surface with polka dots.

本実施形態の研磨材31においては、上記複数の円形孔部32、32、…の存在により、研磨材31には実施形態1の研磨材1と同等の柔軟性が付与される。その結果、研磨材31は、実施形態3の研磨材21と同様に略球状に容易に曲がることができる。   In the abrasive 31 of the present embodiment, the same flexibility as the abrasive 1 of the first embodiment is imparted to the abrasive 31 due to the presence of the plurality of circular holes 32, 32,. As a result, the abrasive 31 can be easily bent into a substantially spherical shape like the abrasive 21 of the third embodiment.

なお、研磨材31に要求される具体的な柔軟度は、研磨材31の板厚tと、円形孔部32の形状寸法、および円形孔部32の配設ピッチ等とを適宜設定調整することにより得ることができる。   The specific flexibility required for the abrasive 31 is appropriately set and adjusted for the thickness t of the abrasive 31, the shape of the circular holes 32, the arrangement pitch of the circular holes 32, and the like. Can be obtained.

しかして、以上のように構成された研磨材31によれば、図11(a)に示すように、片手Hの掌に持った研磨材31を、被研磨物体である円筒パイプ33の外周円筒面に巻き付けて、掌により抱持状に握ることで、その研磨面(図示の場合は研磨面31a)が円筒パイプ33の外周円筒面(被研磨面)に忠実に沿って接触し、この状態で、研磨材31を円筒パイプ33に対して軸線方向および/または円周方向へ相対的に移動させることで、研磨ムラを生じることなく、高精度な研磨効果が得られる。   Thus, according to the abrasive 31 configured as described above, as shown in FIG. 11A, the abrasive 31 held in the palm of one hand H is used as the outer peripheral cylinder of the cylindrical pipe 33 that is the object to be polished. By wrapping around the surface and holding it with a palm, the polished surface (in the illustrated case, the polished surface 31a) is in close contact with the outer peripheral cylindrical surface (surface to be polished) of the cylindrical pipe 33 in this state. Thus, by moving the abrasive 31 relative to the cylindrical pipe 33 in the axial direction and / or the circumferential direction, a highly accurate polishing effect can be obtained without causing uneven polishing.

また、この研磨時に生じる研磨屑sは、図2(b)に示すように、基材の特性(粘性)により、研磨剤(砥粒)と上記被研磨面から剥離除去された錆等の汚れを取り込んで被研磨面上にまとまり、さらに研磨材31の円形孔部32、32、…の作用により、これら円形孔部32、32、…に進入集約されて(図11(b)参照)、周囲に散乱することがない。
その他の構成および作用は実施形態1と同様である。
Further, as shown in FIG. 2 (b), the polishing scrap s generated during polishing is contaminated with rust or the like peeled off from the polishing agent (abrasive grains) and the surface to be polished due to the characteristics (viscosity) of the substrate. Are collected on the surface to be polished, and are further collected by the action of the circular holes 32, 32,... Of the abrasive 31 into the circular holes 32, 32,... (See FIG. 11B). There is no scattering around.
Other configurations and operations are the same as those of the first embodiment.

実施形態5
本実施形態は図12に示されており、具体的な形状構造が改変されたものである。
Embodiment 5
This embodiment is shown in FIG. 12, and a specific shape structure is modified.

すなわち、本実施形態のシート状研磨材41は、図12(a)に示すように、実施形態1のシート状研磨材1と同様の板厚t(=0.7mm)を有するとともに、小物の被研磨物体の研磨作業に適した小さな薄肉矩形シートの形態とされている。   That is, the sheet-like abrasive 41 of the present embodiment has a plate thickness t (= 0.7 mm) similar to that of the sheet-like abrasive 1 of the first embodiment as shown in FIG. It is in the form of a small thin rectangular sheet suitable for polishing work on the object to be polished.

この研磨材41の矩形隅部には、係止孔42が設けられており、研磨材41の不使用時に、図12(b)に示すように、スパナ45等の小物工具を保持する工具ボード43の係止くぎ44に、上記係止孔42を介して吊持状に係止保持させることができる。   A locking hole 42 is provided at the rectangular corner of the abrasive 41, and a tool board for holding a small tool such as a spanner 45 when the abrasive 41 is not used, as shown in FIG. The latching nail 44 of 43 can be latched and held via the locking hole 42 in a suspended manner.

しかして、以上のように構成された研磨材41は、図12(c)に示すように、片手Hの掌に持った研磨材41により、被研磨物体である開きドア46のドアノブ47を握ることにより、その研磨面(図示の場合は研磨面41a)がドアノブ47の外周円筒面(被研磨面)に忠実に沿って接触し、この状態で、研磨材41をドアノブ47に対して相対的に移動させることで、研磨ムラを生じることなく、高精度な研磨効果が得られる。
その他の構成および作用は実施形態1と同様である。
Thus, the abrasive 41 configured as described above holds the door knob 47 of the opening door 46, which is the object to be polished, by the abrasive 41 held in the palm of one hand H as shown in FIG. As a result, the polishing surface (the polishing surface 41a in the case of illustration) is in contact with the outer peripheral cylindrical surface (surface to be polished) of the door knob 47 faithfully, and in this state, the polishing material 41 is relative to the door knob 47. By moving to, a highly accurate polishing effect can be obtained without causing uneven polishing.
Other configurations and operations are the same as those of the first embodiment.

実施形態6
本実施形態は図13示されており、具体的な形状構造が改変されたものである。
Embodiment 6
This embodiment is shown in FIG. 13, and the specific shape structure is modified.

すなわち、本実施形態のシート状研磨材51は、図13(a)に示すように、実施形態1のシート状研磨材1と同様の板厚t(=0.7mm)を有するとともに、細い棒状の被研磨物体の研磨作業に適した細長い薄肉矩形シートの形態とされている。   That is, the sheet-like abrasive 51 of the present embodiment has a plate thickness t (= 0.7 mm) similar to that of the sheet-like abrasive 1 of Embodiment 1, as shown in FIG. It is made into the form of the elongate thin-walled rectangular sheet suitable for the grinding | polishing operation | work of the to-be-polished object.

しかして、以上のように構成された研磨材51は、図13(b)に示すように、被研磨物体である細い円筒パイプ52の外周円筒面に1回または複数回(図示の場合は3回)巻き付けることで、その研磨面(図示の場合は研磨面51a)が円筒パイプ52の外周円筒面(被研磨面)に忠実に沿って接触し、この状態で、研磨材51の両端を掴んで交互に引いて、円筒パイプ52に対して相対的に円周方向へ移動させることで、研磨ムラを生じることなく、高精度な研磨効果が得られる。
その他の構成および作用は実施形態1と同様である。
Thus, the abrasive 51 configured as described above is applied to the outer peripheral cylindrical surface of the thin cylindrical pipe 52, which is an object to be polished, once or a plurality of times (in the illustrated case, 3) as shown in FIG. The polishing surface (in the illustrated case, the polishing surface 51a) is in close contact with the outer peripheral cylindrical surface (surface to be polished) of the cylindrical pipe 52, and in this state, grips both ends of the polishing material 51. By alternately pulling and moving in the circumferential direction relative to the cylindrical pipe 52, a highly accurate polishing effect can be obtained without causing uneven polishing.
Other configurations and operations are the same as those of the first embodiment.

続いて、本発明に係るシート状研磨材を実施例および比較例に基づいてさらに詳細に説明するが、これらは本発明の範囲を何ら制限するものではない。   Subsequently, the sheet-like abrasive according to the present invention will be described in more detail based on Examples and Comparative Examples, but these do not limit the scope of the present invention.

実施例1
「ゴム系」
RSS1級(天然ゴム、インドネシア産) 100.0重量部
白サブ#1(ファクチス、天満サブ化工株式会社) 200.0重量部
ダイアナプロセスNP−24(軟化剤、出光興産株式会社) 33.0重量部
酸化亜鉛(堺化学工業株式会社) 7.0重量部
チタンJA3(酸化チタン、テイカ株式会社) 13.0重量部
硫黄(硫黄粉末、軽井沢精錬所製) 9.0重量部
硫黄ノクセラーDM(加硫促進剤、大内新興化学株式会社) 8.0重量部
ハイシリカ(研磨材、株式会社ニッチツ) 230.0重量部
Example 1
"Rubber"
RSS 1 grade (natural rubber, Indonesia) 100.0 parts by weight White sub # 1 (Factis, Tenma Sub Chemical Co., Ltd.) 200.0 parts by weight Diana Process NP-24 (softener, Idemitsu Kosan Co., Ltd.) 33.0 parts by weight Part Zinc Oxide (Sakai Chemical Industry Co., Ltd.) 7.0 parts by weight Titanium JA3 (Titanium Oxide, Teika Co., Ltd.) 13.0 parts by weight Sulfur (sulfur powder, manufactured by Karuizawa Smelter) 9.0 parts by weight Sulfur Noxeller DM Sulfur accelerator, Ouchi Shinsei Chemical Co., Ltd.) 8.0 parts by weight High Silica (Abrasive, Nichetsu Co., Ltd.) 230.0 parts by weight

上記配合に示すように、基材樹脂成分としてゴム系樹脂基材を使用して、2本ロールを用いて天然ゴムに全ての配合材を練り込んで混練しゴム混合物を得た。この得られたゴム混合物を所定の金型の寸法に合わせて予備成形した後、熱プレスを用いて130℃、20分の条件で加硫、成形を行った。得られたゴム成形物を所定の形状寸法に裁断して、図1に示されるシート状研磨材1を得た。   As shown in the above formulation, a rubber-based resin substrate was used as the substrate resin component, and all the compounding materials were kneaded and kneaded into natural rubber using two rolls to obtain a rubber mixture. The obtained rubber mixture was preformed according to the dimensions of a predetermined mold, and then vulcanized and molded using a hot press at 130 ° C. for 20 minutes. The obtained rubber molding was cut into a predetermined shape and a sheet-like abrasive 1 shown in FIG. 1 was obtained.

実施例2
「スチレン系」
アサプレンT−475(SBS、旭化成工業株式会社) 70.0重量部
セプトン2043(SEPS、株式会社クラレ) 30.0重量部
重質炭酸カルシウム(重質炭酸カルシウム、丸尾カルシウム株式会社)
200.0重量部
PW−32(プロセス油、出光興産株式会社) 30.0重量部
ハイシリカ(研磨材、株式会社ニッチツ) 100.0重量部
Example 2
"Styrene"
Asaprene T-475 (SBS, Asahi Kasei Corporation) 70.0 parts by weight Septon 2043 (SEPS, Kuraray Co., Ltd.) 30.0 parts by weight Heavy calcium carbonate (heavy calcium carbonate, Maruo Calcium Co., Ltd.)
200.0 parts by weight PW-32 (process oil, Idemitsu Kosan Co., Ltd.) 30.0 parts by weight high silica (abrasive, Nichetsu Co., Ltd.) 100.0 parts by weight

上記配合に示すように、基材樹脂成分としてスチレン系熱可塑性エラストマーを使用して、所定の割合で配合した生地を、120℃に加熱した2本のロールに投入して十分混練りを行った後、プレス成型により図1に示される所定形状寸法のシート状研磨材1を得た。   As shown in the above blending, using a styrene-based thermoplastic elastomer as the base resin component, the dough blended at a predetermined ratio was put into two rolls heated to 120 ° C. and sufficiently kneaded. Thereafter, a sheet-shaped abrasive 1 having a predetermined shape and dimension shown in FIG. 1 was obtained by press molding.

実施例3
「オレフィン系」
ミラストマー5030N(オレフィン系熱可塑性エラストマー、三井化学株式会社) 60.0重量部
タフマーP−0180(エチレンαオレフィン共重合体、三井化学株式会社)
40.0重量部
重質炭酸カルシウム(重質炭酸カルシウム、丸尾カルシウム株式会社)
200.0重量部
PW−32(プロセス油、出光興産株式会社) 30.0重量部
ハイシリカ(研磨材、株式会社ニッチツ) 100.0重量部
Example 3
"Olefin"
Miralastomer 5030N (olefin-based thermoplastic elastomer, Mitsui Chemicals) 60.0 parts by weight Toughmer P-0180 (ethylene α-olefin copolymer, Mitsui Chemicals)
40.0 parts by weight heavy calcium carbonate (heavy calcium carbonate, Maruo Calcium Co., Ltd.)
200.0 parts by weight PW-32 (process oil, Idemitsu Kosan Co., Ltd.) 30.0 parts by weight high silica (abrasive, Nichetsu Co., Ltd.) 100.0 parts by weight

上記配合に示すように、基材樹脂成分としてオレフィン系熱可塑性エラストマーを使用して、所定の割合で配合した生地を、120℃に加熱した2本のロールに投入して十分混練りを行った後、プレス成型により図1に示される所定形状寸法のシート状研磨材1を得た。   As shown in the above blending, using a olefinic thermoplastic elastomer as a base resin component, the dough blended at a predetermined ratio was put into two rolls heated to 120 ° C. and sufficiently kneaded. Thereafter, a sheet-shaped abrasive 1 having a predetermined shape and dimension shown in FIG. 1 was obtained by press molding.

実施例4
「エチレン−酢酸ビニル系」
エバフレックス640(エチレン酢酸ビニル共重合体、三井デュポン・ポリケミカル株式会社) 60.0重量部
EPゴム(エチレン・プロピレン共重合体、JSR株式会社) 40.0重量部
重質炭酸カルシウム(重質炭酸カルシウム、丸尾カルシウム株式会社)
200.0重量部
PW−32(プロセス油、出光興産株式会社) 30.0重量部
ハイシリカ(研磨材、株式会社ニッチツ) 100.0重量部
Example 4
"Ethylene-vinyl acetate"
EVAFLEX 640 (ethylene vinyl acetate copolymer, Mitsui DuPont Polychemical Co., Ltd.) 60.0 parts by weight EP rubber (ethylene propylene copolymer, JSR Corporation) 40.0 parts by weight heavy calcium carbonate (heavy Calcium carbonate, Maruo calcium)
200.0 parts by weight PW-32 (process oil, Idemitsu Kosan Co., Ltd.) 30.0 parts by weight high silica (abrasive, Nichetsu Co., Ltd.) 100.0 parts by weight

上記配合に示すように、基材樹脂成分としてエチレン‐酢酸ビニル系熱可塑性エラストマーを使用して、所定の割合で配合した生地を、120℃に加熱した2本のロールに投入して十分混練りを行った後、プレス成型により図1に示されるシート状研磨材1を得た。   As shown in the above blending, using ethylene-vinyl acetate thermoplastic elastomer as the base resin component, the dough blended at a predetermined ratio is put into two rolls heated to 120 ° C and kneaded sufficiently. Then, the sheet-like abrasive 1 shown in FIG. 1 was obtained by press molding.

実施例5
「塩ビ系」
ZEST P−21(PVC、新第一塩ビ株式会社) 100.0重量部
DBP(可塑剤、協和発酵株式会社) 30.0重量部
DOP(可塑剤、協和発酵株式会社) 100.0重量部
ハイシリカ(研磨材、株式会社ニッチツ) 100.0重量部
NS−Z(安定剤、鉛市化学株式会社) 2.0重量部
Example 5
"PVC"
ZEST P-21 (PVC, Shin-Daiichi PVC Co., Ltd.) 100.0 parts by weight DBP (plasticizer, Kyowa Hakko Co., Ltd.) 30.0 parts by weight DOP (plasticizer, Kyowa Hakko Co., Ltd.) 100.0 parts by weight High Silica (Abrasive, Niche Co., Ltd.) 100.0 parts by weight NS-Z (stabilizer, Lead City Chemical Co.) 2.0 parts by weight

上記配合に示すように、基材樹脂成分として塩化ビニル系樹脂を使用して、所定の割合で配合した生地を130℃に保温した所定形状寸法の成形型に流し込んで20分間加熱した後冷却し、上記成形型より取り出して、図1に示されるシート状研磨材1を得た。   As shown in the above formulation, using a vinyl chloride resin as a base resin component, the dough blended at a predetermined ratio is poured into a mold having a predetermined shape and kept at 130 ° C., heated for 20 minutes, and then cooled. The sheet-shaped abrasive 1 shown in FIG.

比較例
一般市販のサンドペーパ(研磨紙:理研コランダム株式会社製研磨布紙 AA−120)を使用した。
Comparative Example A commercially available sandpaper (abrasive paper: abrasive cloth paper AA-120 manufactured by Riken Corundum Co., Ltd.) was used.

実施例1〜5および比較例で得たシート状研磨材(100mm×100mmの形状寸法を有する矩形状試験片)を試料として、以下の5つの性能を測定、評価した。試験結果を表1に示す。   The following five performances were measured and evaluated using the sheet-like abrasives (rectangular test pieces having a shape of 100 mm × 100 mm) obtained in Examples 1 to 5 and Comparative Example as samples. The test results are shown in Table 1.

1.密着性試験:
a)試験方法:
直径19mmのポール(被研磨物体)を試料(実施例1〜5、比較例)で掴み握った時の研磨面の密着具合を目視で確認して、評価した。
(b)試験結果:
表1に示すように、実施例1〜5(本発明品)についてはすべて、その研磨面が上記ポールの外周円筒面(被研磨面)に隙間なくしっかりと密着していて(密着良好)、研磨面を被研磨面に忠実に沿って接触させることができ、研磨ムラを生じ難いことが判明した。これに対して、比較例(比較品)については、その研磨面と上記被研磨面との間に隙間を生じる部位が存在し(密着不良)、その結果、研磨面を被研磨面に忠実に沿って接触させることが困難で、研磨ムラを生じ易いことが判明した。
1. Adhesion test:
a) Test method:
The degree of adhesion of the polished surface was visually confirmed and evaluated when a 19 mm diameter pole (object to be polished) was gripped with a sample (Examples 1 to 5, Comparative Example).
(B) Test result:
As shown in Table 1, in all of Examples 1 to 5 (product of the present invention), the polished surface is firmly adhered to the outer peripheral cylindrical surface (surface to be polished) of the pole without any gap (good adhesion), It has been found that the polished surface can be brought into contact with the surface to be polished faithfully, and polishing unevenness is unlikely to occur. On the other hand, in the comparative example (comparative product), there is a portion where a gap is generated between the polished surface and the surface to be polished (adhesion failure), and as a result, the polished surface is faithful to the surface to be polished. It was found that it was difficult to make contact along the surface, and uneven polishing was likely to occur.

2.まとまり性試験:
(a)試験方法:
試料(実施例1〜5、比較例)を錆びた鉄板(被研磨物体)の表面(被研磨面)に密着させて100回往復研磨し、被研磨面上にまとまって残る研磨屑(図2(b)参照)を取り除いた後、この被研磨面を布で拭きとって、この時に上記拭き取り布に汚れ(錆、鉄粉等)が付着しないか確認し、評価した。
(b)試験結果:
表1に示すように、実施例1〜5(本発明品)についてはすべて、上記拭き取り布に汚れが付着せず、その結果、研磨剤(砥粒)と共に研磨面から離脱した基材が、研磨剤(砥粒)と上記被研磨面から剥離除去された錆、鉄粉等の汚れを一緒に取り込んで、被研磨面上に研磨屑としてまとまり(まとまり良好)、周囲に散乱しないことが判明した。これに対して、比較例(比較品)については、上記被研磨面から剥離除去された錆、鉄粉等の汚れが研磨屑としてまとまることはなく(まとまり不良)、被研磨面上に広く散在することが目視でも明確に確認でき、周囲に散乱しやすいことが判明した。
2. Coherency test:
(A) Test method:
The sample (Examples 1 to 5 and Comparative Example) is brought into close contact with the surface (surface to be polished) of a rusted iron plate (object to be polished) and polished 100 times, and polishing scraps remaining on the surface to be polished (FIG. 2). After removing (see (b)), the surface to be polished was wiped with a cloth, and at this time, it was confirmed whether or not dirt (rust, iron powder, etc.) adhered to the wiped cloth.
(B) Test result:
As shown in Table 1, all of Examples 1 to 5 (product of the present invention) did not adhere to the wipe, and as a result, the base material detached from the polishing surface together with the abrasive (abrasive grains) It is found that the abrasive (abrasive grains) and dirt such as rust and iron powder peeled and removed from the surface to be polished are taken together and collected as polishing scraps on the surface to be polished (good unity) and do not scatter around. did. On the other hand, in the comparative example (comparative product), dirt such as rust and iron powder peeled and removed from the surface to be polished is not collected as polishing scraps (cohesion failure) and is widely scattered on the surface to be polished. It can be clearly confirmed visually, and it has been found that it is easily scattered around.

3.柔軟性試験:
(a)試験方法:
直径19mmのポール(被研磨物体)を試料(実施例1〜5、比較例)で掴み握った時の試料の曲げ易さを手の感触で確認して、評価した。
(b)試験結果:
表1に示すように、実施例1〜5(本発明品)についてはすべて、弾性に富んで曲げ易すく、また手を離すと元の平板に弾性復帰し、実用上使いやすい柔軟性を有していることが判明した。これに対して、比較例(比較品)については、弾性に乏しく、手を離しても元の平板には戻らず、本発明品に比較して柔軟性に乏しく実用上使いにくいことが判明した。
3. Flexibility test:
(A) Test method:
The ease of bending of the sample when grasping and grasping a 19 mm diameter pole (object to be polished) with the sample (Examples 1 to 5 and Comparative Example) was evaluated by hand feeling.
(B) Test result:
As shown in Table 1, all of Examples 1 to 5 (product of the present invention) are rich in elasticity and easy to bend, and when released, return to the original flat plate and have flexibility that is easy to use practically. Turned out to be. On the other hand, it was found that the comparative example (comparative product) was poor in elasticity and did not return to the original flat plate even when the hand was released, and was less flexible and practically difficult to use compared to the product of the present invention. .

4.折れの有無試験:
(a)試験方法:
直径19mmのポール(被研磨物体)を試料(実施例1〜5、比較例)で掴み握った時の試料の折れ目の有無を目視で確認して、評価した。
(b)試験結果:
表1に示すように、実施例1〜5(本発明品)についてはすべて、弾性に富んで折れ目が生じず、実用上使いやすいことが判明した。これに対して、比較例(比較品)については、弾性に乏しくて、手を離しても元の平板には戻らず、本発明品に比較して実用上使いにくいことが判明した。
4). Bending test:
(A) Test method:
When a 19 mm diameter pole (object to be polished) was gripped with a sample (Examples 1 to 5 and Comparative Example), the sample was visually checked for the presence or absence of a fold.
(B) Test result:
As shown in Table 1, all of Examples 1 to 5 (product of the present invention) were found to be practically easy to use because they are highly elastic and do not fold. On the other hand, it was found that the comparative example (comparative product) was poor in elasticity and did not return to the original flat plate even when the hand was released, making it practically difficult to use compared to the product of the present invention.

5.持続性試験:
(a)試験方法:
試料(実施例1〜5、比較例)を錆びた鉄板(被研磨物体)の表面(被研磨面)に密着させて100回往復研磨し、研磨前と研磨後の試料の研磨面の変化の有無を目視と手の感触で確認し、評価した。
(b)試験結果:
表1に示すように、実施例1〜5(本発明品)についてはすべて、研磨面の自生作用により、使用済みの研磨剤(砥粒)が脱落しても、新しい研磨面が常時再生し露出して(変化なし)、研磨面は目詰まりを起こすことなく常時所期の研磨力を持続でき、これにより、優れた汚れ除去効果を長期にわたり発揮し得ることが判明した。これに対して、比較例(比較品)については、研磨面に自生作用はなく、これがため、被研磨面から剥離除去された錆等が研磨面の目詰まりを起こしたり、使用済みの研磨剤(砥粒)が脱落して(大きく変化)、研磨面の研磨力が急激に低下し、これにより、汚れ除去効果が早期に低下してしまうことが判明した。
5. Sustainability test:
(A) Test method:
The sample (Examples 1-5, Comparative Example) was brought into close contact with the surface (surface to be polished) of a rusted iron plate (object to be polished) and reciprocally polished 100 times, and the change in the polished surface of the sample before and after polishing was changed. The presence or absence was confirmed by visual inspection and hand feeling and evaluated.
(B) Test result:
As shown in Table 1, in all of Examples 1 to 5 (product of the present invention), a new polished surface is always regenerated even if used abrasives (abrasive grains) fall off due to the self-generated action of the polished surface. When exposed (no change), it has been found that the polished surface can always maintain the desired polishing force without causing clogging, and can thereby exhibit an excellent soil removal effect over a long period of time. On the other hand, in the comparative example (comparative product), there is no self-generated action on the polished surface, so that the rust removed from the polished surface may cause clogging of the polished surface or a used polishing agent. It was found that (abrasive grains) dropped (changed greatly), and the polishing power of the polishing surface was rapidly reduced, thereby leading to the early removal of the dirt removal effect.

Figure 2015054368

(表1において、密着性:〇―密着良好、×―密着不良、まとまり性:〇―まとまり良好、×―まとまり不良、柔軟性:〇―曲げやすい、×―曲げにくい、折れの有無:〇―折れ目がない、×―折れ目がある、持続性:〇―あまり変化しない、×―大きく変化する。)
Figure 2015054368

(In Table 1, Adhesiveness: 〇—Good adhesion, × —Inadequate adhesion, Cohesiveness: ◯ —Good cohesion, x—Cohesion failure, Flexibility: 〇—Easy to bend, X—Difficult to bend, Existence of breakage: 〇— No crease, x-crease, persistence: 〇-not much change, x-big change.)

なお、上述した実施形態1〜6はあくまでも本発明の好適な実施態様を示すものであって、本発明はこれらに限定されることなく、その範囲内で種々の設計変更が可能である。   In addition, Embodiment 1-6 mentioned above shows the suitable embodiment of this invention to the last, This invention is not limited to these, A various design change is possible within the range.

例えば、図6の実施形態2に係るシート状研磨材11および図8の実施形態3に係るシート状研磨材21は、それぞれ、表面11aおよび21aが波状凹凸模様12、12、…および格子状凹凸模様23の研磨面とされる一方、裏面11bおよび21bは平面状の研磨面とされているが、図14(a)および(b)に示すシート状研磨材61、71のように、表裏両面61a、61bおよび71a、71bが上記波状凹凸模様12、12、…および格子状凹凸模様23の研磨面とされてもよい。   For example, in the sheet-like abrasive 11 according to Embodiment 2 in FIG. 6 and the sheet-like abrasive 21 according to Embodiment 3 in FIG. 8, the surfaces 11a and 21a have wavy uneven patterns 12, 12,. While the back surface 11b and 21b are planar polishing surfaces, the pattern 23 is a polishing surface, but both the front and back surfaces are like sheet-like abrasives 61 and 71 shown in FIGS. 14 (a) and 14 (b). 61a, 61b and 71a, 71b may be the polished surfaces of the wavy uneven patterns 12, 12,.

この場合、表裏両面61a、61bおよび71a、71bの凹溝12、12、…または22、22、…同士が互いに対向配置しないように設けられる。   In this case, the concave and convex grooves 12, 12,..., Or 22, 22,... Of the front and back surfaces 61a, 61b and 71a, 71b are provided so as not to be opposed to each other.

t シート状研磨材の板厚
s 研磨屑
1 シート状研磨材
1a、1b、1c 研磨面
2 ステンレス製テーブル(被研磨物体)
2a 被研磨面
5a 水道蛇口のパイプの直円筒部分(被研磨物体)
5b 水道蛇口のパイプの曲折円筒(被研磨物体)
6a シンクの内側面角部(被研磨物体)
7 水道蛇口の円筒段部(被研磨物体)
8 やかん(被研磨物体)
8a 曲面状表面(被研磨面)
9a ゴルフクラブのアイアンのシャフト(被研磨物体)
10 円環状部材(被研磨物体)
11 シート状研磨材
11a、11b、11c 研磨面
12 凹溝
13 円筒パイプ(被研磨物体)
21 シート状研磨材
21a、21b、21c 研磨面
22 凹溝
23 格子状凹凸模様
31 シート状研磨材
31a、31b、31c 研磨面
32 円形孔部
33 円筒パイプ(被研磨物体)
41 シート状研磨材
41a、41b、41c 研磨面
42 係止孔
43 工具ボード
47 開きドアのドアノブ(被研磨物体)
51 シート状研磨材
51a、51b、51c 研磨面
52 円筒パイプ(被研磨物体)
61 シート状研磨材
61a、61b、61c 研磨面
71 シート状研磨材
71a、71b、71c 研磨面
t Thickness of sheet abrasive s Polishing scrap 1 Sheet abrasive 1a, 1b, 1c Polished surface 2 Stainless steel table (object to be polished)
2a Surface to be polished 5a Straight cylindrical part of pipe of water tap (object to be polished)
5b Curved cylinder of pipe for water faucet (object to be polished)
6a Inner side corner of sink (object to be polished)
7 Cylindrical step of water faucet (object to be polished)
8 Kettle (object to be polished)
8a Curved surface (surface to be polished)
9a Golf club iron shaft (object to be polished)
10 Toroidal member (object to be polished)
11 Sheet-like abrasives 11a, 11b, 11c Polishing surface 12 Concave groove 13 Cylindrical pipe (object to be polished)
21 Sheet-like abrasive 21a, 21b, 21c Polishing surface 22 Concave groove 23 Grid-like uneven pattern 31 Sheet-like abrasive 31a, 31b, 31c Polishing surface 32 Circular hole 33 Cylindrical pipe (object to be polished)
41 Sheet-like abrasive 41a, 41b, 41c Polishing surface 42 Locking hole 43 Tool board 47 Door knob of opening door (object to be polished)
51 Sheet-like abrasive 51a, 51b, 51c Polishing surface 52 Cylindrical pipe (object to be polished)
61 Sheet-like abrasives 61a, 61b, 61c Polishing surface 71 Sheet-like abrasives 71a, 71b, 71c Polishing surface

Claims (25)

被研磨物体の表面に沿って弾性変形可能なシート状研磨材であって、
弾性材料からなる基材に、微細な砥粒からなる研磨剤が均一に混練含有されてなる
ことを特徴とするシート状研磨材。
A sheet-like abrasive that is elastically deformable along the surface of the object to be polished,
A sheet-like abrasive comprising a base material made of an elastic material and an abrasive material made of fine abrasive grains uniformly mixed therein.
板厚が0.5〜5.0mmに設定されている
ことを特徴とするシート状研磨材。
A sheet-like abrasive having a plate thickness of 0.5 to 5.0 mm.
研磨材表裏両面が平面状の研磨面とされている
ことを特徴とする請求項1に記載のシート状研磨材。
The sheet-like abrasive according to claim 1, wherein both surfaces of the abrasive material are flat abrasive surfaces.
研磨材表裏両面の少なくとも一方は、凹溝が複数等間隔をもって配されてなる波状凹凸模様の研磨面とされている
ことを特徴とする請求項1に記載のシート状研磨材。
2. The sheet-like abrasive according to claim 1, wherein at least one of the front and back surfaces of the abrasive is a polishing surface having a wavy uneven pattern in which a plurality of concave grooves are arranged at equal intervals.
研磨材表裏両面は、凹溝が複数等間隔をもって配されてなる波状凹凸模様の研磨面とされるとともに、表裏両面の凹溝同士が互いに対向配置しないように設けられている
ことを特徴とする請求項4に記載のシート状研磨材。
The front and back surfaces of the abrasive material are characterized by a wavy uneven pattern with a plurality of concave grooves arranged at equal intervals, and the concave and convex grooves on the front and rear surfaces are provided so as not to face each other. The sheet-like abrasive according to claim 4.
研磨材表裏両面の少なくとも一方は、凹溝が複数等間隔をもって交差状に配されてなる格子状凹凸模様の研磨面とされている
ことを特徴とする請求項1に記載のシート状研磨材。
2. The sheet-like abrasive according to claim 1, wherein at least one of the front and back surfaces of the abrasive is a polishing surface having a grid-like concavo-convex pattern in which a plurality of concave grooves are arranged at equal intervals.
研磨材表裏両面は、凹溝が複数等間隔をもって交差状に配されてなる格子状凹凸模様の研磨面とされるとともに、表裏両面の凹溝が互いに対向配置しないように設けられている
ことを特徴とする請求項6に記載のシート状研磨材。
The front and back surfaces of the abrasive material are provided with a plurality of concave grooves arranged in an intersecting manner with a plurality of equal intervals in a grid-like concavo-convex pattern, and the concave and convex grooves on the front and back surfaces are provided so as not to face each other. The sheet-like abrasive according to claim 6.
研磨材表裏面は、孔部が複数均等に表裏面に貫設して配されてなる水玉凹凸模様の研磨面とされている
ことを特徴とする請求項1に記載のシート状研磨材。
2. The sheet-like abrasive according to claim 1, wherein the front and back surfaces of the abrasive material are a polishing surface having a polka-dot uneven pattern in which a plurality of holes are provided so as to penetrate the front and back surfaces evenly.
前記基材がスチレン系樹脂である
ことを特徴とする請求項1に記載のシート状研磨材。
The sheet-like abrasive according to claim 1, wherein the substrate is a styrene resin.
スチレン系樹脂100重量部に対し、研磨剤が10〜1300重量部である
ことを特徴とする請求項9に記載のシート状研磨材。
The sheet-like abrasive according to claim 9, wherein the abrasive is 10 to 1300 parts by weight with respect to 100 parts by weight of the styrene resin.
前記基材がオレフィン系樹脂である
ことを特徴とする請求項1に記載のシート状研磨材。
The sheet-like abrasive according to claim 1, wherein the substrate is an olefin resin.
オレフィン系樹脂100重量部に対し、研磨剤が10〜1300重量部である
ことを特徴とする請求項11に記載のシート状研磨材。
The sheet-like abrasive according to claim 11, wherein the abrasive is 10 to 1300 parts by weight with respect to 100 parts by weight of the olefin resin.
前記基材がエチレン−酢酸ビニル系樹脂である
ことを特徴とする請求項1に記載のシート状研磨材。
The sheet-like abrasive according to claim 1, wherein the substrate is an ethylene-vinyl acetate resin.
エチレン−酢酸ビニル系樹脂100重量部に対し、研磨剤が10〜1300重量部である
ことを特徴とする請求項13に記載のシート状研磨材。
14. The sheet-like abrasive according to claim 13, wherein the abrasive is 10 to 1300 parts by weight with respect to 100 parts by weight of the ethylene-vinyl acetate resin.
前記基材が塩化ビニル系樹脂である
ことを特徴とする請求項1に記載のシート状研磨材。
The sheet-like abrasive according to claim 1, wherein the substrate is a vinyl chloride resin.
塩化ビニル系樹脂100重量部に対し、研磨剤が10〜1300重量部である
ことを特徴とする請求項15に記載のシート状研磨材。
The abrasive sheet according to claim 15, wherein the abrasive is 10 to 1300 parts by weight with respect to 100 parts by weight of the vinyl chloride resin.
前記基材がゴム系樹脂である
ことを特徴とする請求項1に記載のシート状研磨材。
The sheet-like abrasive according to claim 1, wherein the base material is a rubber-based resin.
ゴム系樹脂100重量部に対し、研磨剤が10〜1300重量部である
ことを特徴とする請求項17に記載のシート状研磨材。
The sheet-like abrasive according to claim 17, wherein the abrasive is 10 to 1300 parts by weight with respect to 100 parts by weight of the rubber-based resin.
前記研磨剤の砥粒の粒径が0.5μm〜2.5mmである
ことを特徴とする請求項1に記載のシート状研磨材。
The sheet-like abrasive according to claim 1, wherein the abrasive has a grain size of 0.5 μm to 2.5 mm.
前記研磨剤が天然砥粒からなる
ことを特徴とする請求項19に記載のシート状研磨材。
The sheet-like abrasive according to claim 19, wherein the abrasive comprises natural abrasive grains.
前記天然砥粒は、ダイヤモンド、コランダム、エメリー、ガーネット、珪石、スピネル、珪藻土、ドロマイド、トリポリ、浮石粉から選ばれた少なくとも1種の砥粒からなる
ことを特徴とする請求項20に記載のシート状研磨材。
21. The sheet according to claim 20, wherein the natural abrasive grains are composed of at least one abrasive grain selected from diamond, corundum, emery, garnet, silica, spinel, diatomaceous earth, dolomide, tripoly, and pumice powder. Abrasive.
前記天然砥粒は、植物性研磨剤である
ことを特徴とする請求項20に記載のシート状研磨材。
The sheet-like abrasive according to claim 20, wherein the natural abrasive is a vegetable abrasive.
前記植物性研磨剤は、ピーチの種、杏の種、クルミの殻、コーンの芯から選ばれた少なくとも1種の乾燥粉砕物からなる
ことを特徴とする請求項22に記載のシート状研磨材。
The sheet-like abrasive according to claim 22, wherein the vegetable abrasive comprises at least one dry pulverized material selected from peach seeds, apricot seeds, walnut shells, and corn cores. .
前記研磨剤が人造砥粒からなる
ことを特徴とする請求項19に記載のシート状研磨材。
The sheet-like abrasive according to claim 19, wherein the abrasive comprises artificial abrasive grains.
前記人造砥粒は、人造ダイヤモンド、炭化ホウ素、炭化ケイ素、溶融アルミナ、酸化鉄、酸化クロム、仮焼アルミナから選ばれた少なくとも1種の砥粒からなる
ことを特徴とする請求項24に記載のシート状研磨材。
25. The artificial abrasive grain according to claim 24, comprising at least one abrasive grain selected from artificial diamond, boron carbide, silicon carbide, fused alumina, iron oxide, chromium oxide, and calcined alumina. Sheet abrasive.
JP2013187794A 2013-09-10 2013-09-10 Sheet-like polishing material Pending JP2015054368A (en)

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