JPS6353086B2 - - Google Patents
Info
- Publication number
- JPS6353086B2 JPS6353086B2 JP56098673A JP9867381A JPS6353086B2 JP S6353086 B2 JPS6353086 B2 JP S6353086B2 JP 56098673 A JP56098673 A JP 56098673A JP 9867381 A JP9867381 A JP 9867381A JP S6353086 B2 JPS6353086 B2 JP S6353086B2
- Authority
- JP
- Japan
- Prior art keywords
- powder
- gas
- pipe
- tank body
- supply
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000843 powder Substances 0.000 claims description 72
- 238000004891 communication Methods 0.000 claims description 17
- 238000000605 extraction Methods 0.000 claims description 4
- 239000007789 gas Substances 0.000 description 61
- 239000000203 mixture Substances 0.000 description 13
- 238000002156 mixing Methods 0.000 description 8
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 239000011261 inert gas Substances 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 239000001307 helium Substances 0.000 description 3
- 229910052734 helium Inorganic materials 0.000 description 3
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- -1 oxides Chemical class 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- UBAZGMLMVVQSCD-UHFFFAOYSA-N carbon dioxide;molecular oxygen Chemical compound O=O.O=C=O UBAZGMLMVVQSCD-UHFFFAOYSA-N 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000009503 electrostatic coating Methods 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910001026 inconel Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000007751 thermal spraying Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G53/00—Conveying materials in bulk through troughs, pipes or tubes by floating the materials or by flow of gas, liquid or foam
- B65G53/34—Details
- B65G53/66—Use of indicator or control devices, e.g. for controlling gas pressure, for controlling proportions of material and gas, for indicating or preventing jamming of material
Description
【発明の詳細な説明】
本発明は気体と粉体との混合物を供給する供給
装置および供給方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a supply device and a supply method for supplying a mixture of gas and powder.
例えばプラズマ処理炉にあつては、プラズマジ
エツト発生装置に金属、セラミツクス等の材料の
粉体をヘリウム、アルゴン等のプラズマ用気体あ
るいは酸素ガス、窒素ガス等の粉体と反応せしめ
るべき気体と混合し、これらをキヤリアガスとし
てプラズマ中へ供給することが行われることがあ
る。この場合、該気体を一定量に保つて該粉体の
供給量を所定量に調節したり、該粉体と該気体と
を一定比率に混合したりすることが必要である。
粉体と気体とを混合して供給するには粉体を乗載
した傾斜面に震動を与えて粉体が傾斜面を移動す
る速度を一定ならしめたり、プランジヤーやスク
リユーによつて粉体備蓄槽から一定量を押出した
り、ベルトコンベアに供給した粉体をナイフ等で
一定厚にならしたりすることによつて粉体を流動
する気体中に一定量供給するものがあつた。この
ような従来法においては、粉体の供給量は気体の
流動量に大きく依存し、気体の流動量によつて実
質的に粉体の供給量が決定される。しかも粉体の
気体への供給は間欠的に行われるために一定の混
合比を保つことは困難である。しかしプラズマジ
エツト発生装置に気体と粉体との混合物を供給す
る場合等においてはプラズマ用気体の供給量はプ
ラズマの安定維持に必要な範囲内にし、かかる供
給量において粉体の供給量を必要な量に一定に維
持せしめたり、また粉体と反応せしめる気体と粉
体との混合比を化学反応に必要な所定の比率に調
節して一定に維持せしめると同時に気体と粉体と
の混合物の供給量も所定の量に調節することが必
要である。このように混合比率と供給量とを所定
の比率および量に同時に調節し、一定に維持する
には上記のような従来法では前記したように粉体
の供給量は気体の流動量に大きく依存するから気
体の流動量を任意に選んだ上で粉体の量を必要な
量に設定し、しかもこれを一定に維持することは
不可能に近いものであつた。 For example, in a plasma processing furnace, a plasma jet generator mixes powder of materials such as metals and ceramics with a plasma gas such as helium or argon, or a gas that is to be reacted with the powder such as oxygen gas or nitrogen gas. However, these are sometimes supplied into the plasma as a carrier gas. In this case, it is necessary to maintain the gas at a constant amount and adjust the supply amount of the powder to a predetermined amount, or to mix the powder and the gas at a constant ratio.
In order to supply a mixture of powder and gas, it is necessary to vibrate the slope on which the powder is loaded so that the speed at which the powder moves on the slope is constant, or to stockpile the powder using a plunger or screw. There was one in which a fixed amount of powder was supplied to a flowing gas by extruding a fixed amount from a tank or by smoothing the powder supplied to a belt conveyor to a fixed thickness with a knife or the like. In such conventional methods, the amount of powder supplied is largely dependent on the amount of gas flow, and the amount of powder supplied is substantially determined by the amount of gas flow. Moreover, since the supply of powder to the gas is performed intermittently, it is difficult to maintain a constant mixing ratio. However, when supplying a mixture of gas and powder to a plasma jet generator, the amount of plasma gas supplied must be within the range necessary to maintain stable plasma, and the amount of powder supplied must be within the range required to maintain stable plasma. The mixture ratio of the gas and powder to be reacted with the powder can be adjusted and maintained constant at the predetermined ratio required for chemical reaction, and at the same time, the mixture of gas and powder can be maintained constant. It is also necessary to adjust the supply amount to a predetermined amount. In this way, in order to simultaneously adjust the mixing ratio and supply amount to a predetermined ratio and amount and maintain them constant, in the conventional method described above, the powder supply amount is largely dependent on the gas flow rate, as described above. Therefore, it has been nearly impossible to arbitrarily select the amount of gas flow, set the required amount of powder, and maintain it constant.
本発明は上記従来の欠点を改良して気体と粉体
の混合物を供給する際、任意の気体流動量に対し
て粉体の所定の混合比率と供給量とが容易に得ら
れるようにすることを目的とするものであり、槽
体と、槽体に夫々連絡する流量調節弁を備えた気
体供給手段、流量調節装置を備えた粉体供給手段
および粉体、気体の取出し手段と、槽体に夫々連
絡する一対の出口管と中間にフイルターおよびコ
ンプレツサーが存在し該一対の出口管間を連絡す
る連絡管とにより構成される循還手段とからなる
供給装置を用いることを骨子とするものである。 The present invention improves the above-mentioned conventional drawbacks and makes it possible to easily obtain a predetermined mixing ratio and supply amount of powder for any gas flow rate when supplying a mixture of gas and powder. The object of the present invention is to provide a tank body, a gas supply means equipped with a flow control valve connected to the tank body, a powder supply means equipped with a flow rate control device, a means for extracting powder and gas, and a tank body. The main idea is to use a supply device consisting of a pair of outlet pipes that communicate with each other, and a communication pipe that has a filter and a compressor in between and communicates between the pair of outlet pipes. be.
本発明を図に示す一実施例によつて説明する。 The present invention will be explained with reference to an embodiment shown in the drawings.
槽体1は下半部がロート状であり、中間には流
量調節弁2Aを有する気体供給管2が連絡し、上
部には粉体供給ホツパー3が連絡し、連絡口3A
には粉体供給量調節可能なロータリーフイーダー
4が介在し、更に中間にはストツプ弁5Aを有す
る取出し管5が連絡する。気体供給管2および取
出し管5の連絡位置より上方において槽体1には
開閉弁6A,7Aを有する出口管6,7が夫々連
絡し、出口管6,7の開閉弁6A,7Aより上部
において粉体供給ホツパー3の連絡口3A付近に
連絡する返送管8,9が分岐され、返送管8,9
の先端部8A,9Aはノズル状に形成される。出
口管6,7の上部にはフイルター10,11が張
設せられ、更に出口管6,7は上端において連絡
管12によつて相互に連絡せられる。連絡管12
には切換弁13、コンプレツサー14が介在す
る。更に槽体1の中間部には投光器15、該投光
器15と相対する位置には受光器16が配され
る。 The tank body 1 has a funnel-shaped lower half, a gas supply pipe 2 having a flow rate control valve 2A communicates with the middle part, a powder supply hopper 3 communicates with the upper part, and a communication port 3A.
A rotary feeder 4 capable of adjusting the amount of powder supplied is interposed between the rotary feeder 4 and a take-out pipe 5 having a stop valve 5A communicating therebetween. Outlet pipes 6 and 7 having on-off valves 6A and 7A communicate with the tank body 1 above the communication position of the gas supply pipe 2 and the extraction pipe 5, respectively, and above the on-off valves 6A and 7A of the outlet pipes 6 and 7, The return pipes 8 and 9 connected to the vicinity of the communication port 3A of the powder supply hopper 3 are branched, and the return pipes 8 and 9
The tip portions 8A and 9A are formed into a nozzle shape. Filters 10, 11 are stretched over the outlet pipes 6, 7, and the outlet pipes 6, 7 are interconnected at their upper ends by a connecting pipe 12. Connecting pipe 12
A switching valve 13 and a compressor 14 are interposed therein. Further, a light emitter 15 is disposed in the middle of the tank body 1, and a light receiver 16 is disposed at a position facing the light emitter 15.
上記供給装置において気体、例えばプラズマ用
気体としてはヘリウム、アルゴン、窒素、水素、
酸素、炭酸ガス、空気もしくはそれらの混合気体
を気体供給管2から槽体1内に供給するが、その
供給量は気体供給管2の流量調節弁2Aにて調節
される。粉体17は粉体供給ホツパー3に備蓄せ
られ、粉体供給ホツパー3の連絡口3Aから槽体
1内に供給されるが、その供給量はロータリーフ
イーダー4によつて調節せられる。粉体はプラズ
マ用の場合には例えばチタン、タンタル、ニオ
ブ、パラジウム、白金、モリブデン、タングステ
ン、珪素、アルミニウム、マグネシウム、カルシ
ウム、カドミウム、銅、ニツケル、クロム、ホウ
素等の金属、上記金属のホウ素化物、炭化物、窒
化物、酸化物、塩化物、その他ステンレススチー
ル、インコネル、黄銅等の合金、セラミツクス等
である。槽体1内に供給せられた気体は出口管6
の開閉弁6Aを閉じ、出口管7の開閉弁7Aを開
いて取出し、同伴した粉体17をフイルター11
で別除去してから連絡管12を介して出口管6
の上部に至り、返送管8に導びき返送管8の先端
部8Aから噴射させて粉体供給ホツパー3の連絡
口3A付近で粉体17と混合し、これを撹拌して
一定化する。かくして出口管7→連絡管12→出
口管6→返送管8によつて気体の循還手段が形成
されるが、かかる循還方向は矢印Bで示される。
気体の上記循還は切換弁13を介してコンプレツ
サー14によつて行われるが矢印B方向の場合は
切換弁13のB側に連絡管12が接続される。即
ちこの場合には出口管6はコンプレツサー14の
排出側に接続し、出口管7はコンプレツサー14
の吸引側に接続する。気体と粉体との混合比は粉
体17のロータリーフイーダー4からの供給量
と、気体供給管2からの気体の供給量とによつて
決定せられ、その混合比は投光器15から投光さ
れた光の粉体17による乱反射の度合から粉体の
濃度を受光器16によつて測定することによつて
求められる。かくして循環気体により撹拌され一
定比率に混合された気体―粉体混合物は取出し管
5から取出される。この際、取出し管5からの取
出し量は気体供給管2からの供給量とバランスさ
せる。 In the above supply device, gases such as helium, argon, nitrogen, hydrogen,
Oxygen, carbon dioxide, air, or a mixture thereof is supplied from the gas supply pipe 2 into the tank 1, and the amount of supply is regulated by the flow rate control valve 2A of the gas supply pipe 2. The powder 17 is stored in the powder supply hopper 3 and is supplied into the tank 1 from the communication port 3A of the powder supply hopper 3, and the amount of powder supplied is adjusted by the rotary feeder 4. When the powder is used for plasma, for example, metals such as titanium, tantalum, niobium, palladium, platinum, molybdenum, tungsten, silicon, aluminum, magnesium, calcium, cadmium, copper, nickel, chromium, and boron, and borides of the above metals are used. , carbides, nitrides, oxides, chlorides, other alloys such as stainless steel, Inconel, and brass, and ceramics. The gas supplied into the tank body 1 is passed through the outlet pipe 6.
Close the on-off valve 6A of the outlet pipe 7, open the on-off valve 7A of the outlet pipe 7 to take out the powder, and pass the entrained powder 17 through the filter 11.
After removing it separately at the outlet pipe 6 via the connecting pipe 12
The powder is guided to the return pipe 8 and is injected from the tip 8A of the return pipe 8, mixed with the powder 17 near the communication port 3A of the powder supply hopper 3, and stirred to be constant. Thus, a gas circulation means is formed by the outlet pipe 7 → the communication pipe 12 → the outlet pipe 6 → the return pipe 8, and the direction of this circulation is indicated by arrow B.
The above-mentioned circulation of the gas is performed by the compressor 14 via the switching valve 13, and in the direction of arrow B, the communication pipe 12 is connected to the B side of the switching valve 13. That is, in this case, the outlet pipe 6 is connected to the discharge side of the compressor 14, and the outlet pipe 7 is connected to the compressor 14.
Connect to the suction side of the The mixing ratio of gas and powder is determined by the amount of powder 17 supplied from the rotary feeder 4 and the amount of gas supplied from the gas supply pipe 2. The concentration of the powder is determined by measuring the density of the powder using the light receiver 16 based on the degree of diffuse reflection of the emitted light by the powder 17. The gas-powder mixture thus stirred by the circulating gas and mixed at a constant ratio is taken out from the take-out pipe 5. At this time, the amount taken out from the extraction pipe 5 is balanced with the amount supplied from the gas supply pipe 2.
以上のようにして気体と粉体との混合比は粉体
の供給量と気体供給量とによつて任意に調節する
ことが出来、そして粉体の供給量と気体の供給量
とは各々独立に調節することが出来、かくして気
体―粉体混合物の取出し量も粉体の供給量と全く
関係なく気体の供給量との関連において調節する
ことが出来る。更に出口管7の開閉弁7Aを閉
じ、出口管6の開閉弁6Aを開き、切換弁13の
A側に連絡管12を接続すれば出口管6はコンプ
レツサー14の吸引側に接続し出口管7はコンプ
レツサー14の排出側に接続し、気体の循還方向
は矢印Aに示す方向となるが、この際、フイルタ
ー11に蓄積した粉体はフイルター11を気体が
通過する際に逆洗され除去されるからフイルター
11の目詰まりは解消される。フイルター10,
11が目詰まりを起し気体の通過が放害される前
に上記のような気体の循還方向の切換えを行えば
フイルター10,11は取はずすことなく再生さ
れる。かくして混合された気体―粉体混合物は取
出し管5から例えば第2図に示すようなプラズマ
ジエツト発生装置に供給される。第2図のプラズ
マジエツト発生装置において、取出し管5は電気
的に絶縁して内側ノズル管18に連絡し、該内側
ノズル管18は外側ノズル管19に同軸状態で挿
着され、更に内側ノズル管18と外側ノズル管1
9の間には同軸状態で筒状の陰極20が配され
る。陰極20の内側および外側の空間20A,2
0Bを通してヘリウム、アルゴン等の不活性気体
を供給する気体供給口21を設ける。外側ノズル
管19の壁部は二重にされ冷却室19Aが形成さ
れる。必要に応じて内側ノズル管18、陰極20
も同様にして水冷する。かくして陰極20には
負、外側ノズル管19または対極24には正の電
気を印加して気体供給口21から不活性気体を噴
射し、外側ノズル管19と陰極20との間に高周
波放電等の周知の方法によつて点孤を行えば内側
ノズル管18の出口において該不活性気体の放電
が起り該不活性気体のプラズマが生ずる。 As described above, the mixing ratio of gas and powder can be adjusted arbitrarily by the powder supply amount and gas supply amount, and the powder supply amount and gas supply amount are independent of each other. Thus, the amount of the gas-powder mixture taken out can also be adjusted in relation to the amount of gas fed, completely independent of the amount of powder fed. Further, by closing the on-off valve 7A of the outlet pipe 7, opening the on-off valve 6A of the outlet pipe 6, and connecting the communication pipe 12 to the A side of the switching valve 13, the outlet pipe 6 will be connected to the suction side of the compressor 14, and the outlet pipe 7 will be connected to the suction side of the compressor 14. is connected to the discharge side of the compressor 14, and the gas circulation direction is the direction shown by arrow A. At this time, the powder accumulated in the filter 11 is backwashed and removed when the gas passes through the filter 11. Therefore, the clogging of the filter 11 is eliminated. filter 10,
If the gas circulation direction is switched as described above before the filters 10 and 11 become clogged and the passage of gas is impaired, the filters 10 and 11 can be regenerated without having to be removed. The gas-powder mixture thus mixed is supplied from the take-out pipe 5 to a plasma jet generator as shown in FIG. 2, for example. In the plasma jet generator shown in FIG. 2, the extraction pipe 5 is electrically insulated and connected to the inner nozzle pipe 18, and the inner nozzle pipe 18 is coaxially inserted into the outer nozzle pipe 19. Tube 18 and outer nozzle tube 1
A cylindrical cathode 20 is disposed coaxially between the electrodes 9 . Spaces 20A, 2 inside and outside the cathode 20
A gas supply port 21 is provided for supplying an inert gas such as helium or argon through 0B. The outer nozzle pipe 19 has a double wall to form a cooling chamber 19A. Inner nozzle pipe 18 and cathode 20 as required
Cool in water in the same way. In this way, negative electricity is applied to the cathode 20 and positive electricity is applied to the outer nozzle pipe 19 or the counter electrode 24, inert gas is injected from the gas supply port 21, and a high frequency discharge or the like is generated between the outer nozzle pipe 19 and the cathode 20. When ignition is performed in a known manner, a discharge of the inert gas occurs at the outlet of the inner nozzle tube 18 and a plasma of the inert gas is generated.
しかる後内側ノズル管18から混合物を噴射す
れば該混合物も加熱されてプラズマ状態となる。
外側ノズル管19の冷却室19Aには給水口19
Bから冷却水を通しておく。プラズマを安定に発
生せしめるためには前記したようにプラズマ用気
体の供給量を一定に維持する必要があり、気体供
給口21からの気体供給量および内側ノズル管1
8から噴射する気体の量は一定であることが必要
であるが、本発明の供給装置によれば混合物の気
体と粉体との供給量は正確に所望の値で一定化さ
れ、したがつて内側ノズル管18からの気体の噴
射量は所望の値で一定であり、安定にプラズマが
発生する。 When the mixture is then injected from the inner nozzle pipe 18, the mixture is also heated and becomes a plasma state.
A water supply port 19 is provided in the cooling chamber 19A of the outer nozzle pipe 19.
Pass cooling water through B. In order to stably generate plasma, it is necessary to maintain a constant supply amount of plasma gas as described above, and the amount of gas supplied from the gas supply port 21 and the inner nozzle pipe 1 must be maintained constant.
It is necessary that the amount of gas injected from step 8 is constant, but according to the supply device of the present invention, the amount of gas and powder supplied in the mixture can be accurately kept constant at a desired value. The amount of gas injected from the inner nozzle pipe 18 is constant at a desired value, and plasma is generated stably.
本発明は上記実施例に限定されるものではな
く、例えば気体は循還方向を交互に逆向きにしな
くてもよい。また本発明はプラズマ処理炉以外、
溶射、静電塗装、流動浸漬等にも適用されること
は言うまでもない。 The present invention is not limited to the above-mentioned embodiments; for example, the gas circulation direction may not be alternately reversed. In addition, the present invention does not apply to plasma processing furnaces.
Needless to say, it can also be applied to thermal spraying, electrostatic coating, fluidized dipping, etc.
本発明は上記の構成を有するから、気体供給手
段から槽体内に供給された気体はフイルターによ
り粉体を除去されつつコンプレツサーによつて循
還手段に循還され、かかる気体の循還によつて流
量調節装置を備えた粉体供給手段と流量調節弁を
備えた気体供給手段とから夫々槽体に所定量供給
される粉体と気体とが均一に撹拌されることによ
つて一定の混合比となる。混合比の調節は粉体の
供給量と気体の供給量とを調整することによつて
行われるが上記粉体の供給量と気体の供給量とは
独立に調節することが出来るから、混合物の混合
比と取出量は特に制御装置を設けることなく広い
範囲で正確に調節することが容易である。更に該
一対の出口管の両方もしくは排出側には開閉弁を
介在させ、更に該循還手段の少くとも排出側から
は返送管を差出し、該返送管の先端部を粉体供給
手段の連絡口近傍に斜め下方に向けて接続した場
合には排出側の出口管の開閉弁を閉めれば、コン
プレツサーにより連絡管を介して排出される気体
は返送管に導びかれ、該返送管から粉体供給手段
の連絡口近傍に斜め下方に向けて噴射せしめられ
るから、粉体供給手段の連絡口から落下する粉体
は噴射される気体により散乱せしめられ、気体と
粉体とは一層均一に混合せしめられる。また更に
連絡管にコンプレツサーの吸引側と排出側とを切
換える切換え弁を介在させた場合には、コンプレ
ツサーの吸引側と排出側とを切換えることにより
フイルターを逆洗することが出来、フイルターを
取出すことなくしてフイルターの目詰まりを解消
させることが出来る。 Since the present invention has the above configuration, the gas supplied from the gas supply means into the tank body is circulated to the circulation means by the compressor while the powder is removed by the filter, and the gas is circulated by the compressor to the circulation means. A constant mixing ratio is achieved by uniformly stirring the powder and gas supplied in predetermined amounts to the tank body from the powder supply means equipped with a flow rate adjustment device and the gas supply means equipped with a flow rate adjustment valve, respectively. becomes. The mixing ratio is adjusted by adjusting the powder supply amount and the gas supply amount, but since the powder supply amount and gas supply amount can be adjusted independently, the The mixing ratio and the amount taken out can be easily adjusted accurately over a wide range without the need for any particular control device. Further, on-off valves are interposed on both of the pair of outlet pipes or on the discharge side, and a return pipe is inserted from at least the discharge side of the circulation means, and the tip of the return pipe is connected to the communication port of the powder supply means. When connected diagonally downward to the vicinity, by closing the on-off valve of the outlet pipe on the discharge side, the gas discharged by the compressor via the connecting pipe will be guided to the return pipe, and the powder will be supplied from the return pipe. Since the powder is injected obliquely downward near the communication port of the powder supply means, the powder falling from the communication port of the powder supply means is scattered by the injected gas, and the gas and powder are mixed more uniformly. . Furthermore, if a switching valve is provided in the connecting pipe to switch between the suction side and the discharge side of the compressor, the filter can be backwashed by switching between the suction side and the discharge side of the compressor, and the filter can be removed. You can eliminate clogging of the filter by removing it.
図面は本発明の一実施例を示し、第1図は供給
装置の縦断面図、第2図はプラズマジエツト発生
装置の縦断面図である。
図中 1…槽体、2…気体供給管、3…粉体供
給ホツパー、5…取出し管、6,7…出口管、
8,9…返送管、10,11…フイルター、12
…連絡管。
The drawings show an embodiment of the present invention, in which FIG. 1 is a longitudinal sectional view of a supply device, and FIG. 2 is a longitudinal sectional view of a plasma jet generator. In the figure 1... Tank body, 2... Gas supply pipe, 3... Powder supply hopper, 5... Takeout pipe, 6, 7... Outlet pipe,
8, 9... Return pipe, 10, 11... Filter, 12
...Communication pipe.
Claims (1)
えた気体供給手段、流量調節装置を備えた粉体供
給手段および粉体、気体の取出し手段と、槽体に
夫々連絡する一対の出口管と中間にフイルターお
よびコンプレツサーが存在し該一対の出口管間を
連絡する連絡管とにより構成される循還手段とか
らなる供給装置。 2 槽体と、槽体に夫々連絡する流量調節弁を備
えた気体供給手段、流量調節装置を備えた粉体供
給手段および粉体、気体の取出し手段と、槽体に
夫々連絡する一対の出口管と中間にフイルターお
よびコンプレツサーが存在し該一対の出口管間を
連絡する連絡管とにより構成される循還手段とか
らなる供給装置において、該循還手段の該一対の
出口管の少くとも排出側には開閉弁を介在させ、
更に該循還手段の少くとも排出側からは返送管を
差出し、該返送管の先端部は粉体供給手段の連絡
口近傍に斜め下方に向けて接続していることを特
徴とする供給装置。 3 槽体と、槽体に夫々連絡する流量調節弁を備
えた気体供給手段、流量調節装置を備えた粉体供
給手段および粉体、気体の取出し手段と、槽体に
夫々連絡する一対の出口管と中間にフイルターお
よびコンプレツサーが存在し該一対の出口管間を
連絡する連絡管とにより構成される循還手段とか
らなる供給装置において、該循還手段の該一対の
出口管には夫々開閉弁を介在させ、また連絡管に
はコンプレツサーの吸引側と排出側とを切換える
切換え弁を介在させたことを特徴とする供給装
置。[Scope of Claims] 1. A tank body, a gas supply means equipped with a flow control valve communicating with the tank body, a powder supply means equipped with a flow rate control device, a powder and gas extraction means, and a tank body A supply device comprising a circulation means constituted by a pair of outlet pipes that communicate with each other, and a communication pipe that has a filter and a compressor in between and communicates between the pair of outlet pipes. 2. A tank body, a gas supply means equipped with a flow control valve that communicates with the tank body, a powder supply means equipped with a flow rate control device, a means for extracting powder and gas, and a pair of outlets that respectively communicate with the tank body. In a supply device comprising a circulation means constituted by a pipe and a communication pipe having a filter and a compressor in the middle and communicating between the pair of outlet pipes, at least the discharge of the pair of outlet pipes of the circulation means is provided. An on-off valve is interposed on the side,
Furthermore, a supply device characterized in that a return pipe is extended from at least the discharge side of the circulation means, and the tip of the return pipe is connected diagonally downward to the vicinity of the communication port of the powder supply means. 3. A tank body, a gas supply means equipped with a flow control valve that communicates with the tank body, a powder supply means equipped with a flow rate control device, a means for extracting powder and gas, and a pair of outlets that respectively communicate with the tank body. In a supply device comprising a circulation means constituted by a pipe and a communication pipe having a filter and a compressor in the middle and communicating between the pair of outlet pipes, each of the pair of outlet pipes of the circulation means has an opening/closing mechanism. A supply device characterized in that a valve is interposed, and a switching valve for switching between a suction side and a discharge side of a compressor is interposed in a connecting pipe.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9867381A JPS5878916A (en) | 1981-06-24 | 1981-06-24 | Supply apparatus and method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9867381A JPS5878916A (en) | 1981-06-24 | 1981-06-24 | Supply apparatus and method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5878916A JPS5878916A (en) | 1983-05-12 |
JPS6353086B2 true JPS6353086B2 (en) | 1988-10-21 |
Family
ID=14226029
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9867381A Granted JPS5878916A (en) | 1981-06-24 | 1981-06-24 | Supply apparatus and method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5878916A (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5178362A (en) * | 1973-07-02 | 1976-07-07 | Pechiney Aluminium | |
JPS524282A (en) * | 1975-06-30 | 1977-01-13 | Nippon Steel Corp | Magnetic powder probe method |
JPS52140161A (en) * | 1976-04-22 | 1977-11-22 | Mitsui Toatsu Chem Inc | Discharge device for a solid granular substance |
JPS5357690A (en) * | 1976-11-02 | 1978-05-25 | Ai Ii Shii Kk | Supply controller of granule |
-
1981
- 1981-06-24 JP JP9867381A patent/JPS5878916A/en active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5178362A (en) * | 1973-07-02 | 1976-07-07 | Pechiney Aluminium | |
JPS524282A (en) * | 1975-06-30 | 1977-01-13 | Nippon Steel Corp | Magnetic powder probe method |
JPS52140161A (en) * | 1976-04-22 | 1977-11-22 | Mitsui Toatsu Chem Inc | Discharge device for a solid granular substance |
JPS5357690A (en) * | 1976-11-02 | 1978-05-25 | Ai Ii Shii Kk | Supply controller of granule |
Also Published As
Publication number | Publication date |
---|---|
JPS5878916A (en) | 1983-05-12 |
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