JPS6350357B2 - - Google Patents
Info
- Publication number
- JPS6350357B2 JPS6350357B2 JP57050249A JP5024982A JPS6350357B2 JP S6350357 B2 JPS6350357 B2 JP S6350357B2 JP 57050249 A JP57050249 A JP 57050249A JP 5024982 A JP5024982 A JP 5024982A JP S6350357 B2 JPS6350357 B2 JP S6350357B2
- Authority
- JP
- Japan
- Prior art keywords
- powder
- filter
- gas
- organohalosilane
- sintered metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000843 powder Substances 0.000 claims description 58
- 238000000034 method Methods 0.000 claims description 49
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims description 20
- 239000005046 Chlorosilane Substances 0.000 claims description 19
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 19
- 239000002184 metal Substances 0.000 claims description 19
- 229910052751 metal Inorganic materials 0.000 claims description 19
- 229910052710 silicon Inorganic materials 0.000 claims description 15
- 239000010703 silicon Substances 0.000 claims description 15
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 14
- YGZSVWMBUCGDCV-UHFFFAOYSA-N chloro(methyl)silane Chemical group C[SiH2]Cl YGZSVWMBUCGDCV-UHFFFAOYSA-N 0.000 claims description 11
- 239000011863 silicon-based powder Substances 0.000 claims description 4
- 238000007664 blowing Methods 0.000 claims description 3
- 230000000737 periodic effect Effects 0.000 claims description 3
- 125000001930 alkyl chloride group Chemical group 0.000 claims 1
- 238000004064 recycling Methods 0.000 claims 1
- 239000007789 gas Substances 0.000 description 29
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 description 28
- 239000000047 product Substances 0.000 description 25
- 229940050176 methyl chloride Drugs 0.000 description 14
- 238000004519 manufacturing process Methods 0.000 description 10
- 229910052802 copper Inorganic materials 0.000 description 9
- 239000010949 copper Substances 0.000 description 9
- 239000000428 dust Substances 0.000 description 9
- 239000002002 slurry Substances 0.000 description 9
- 239000012043 crude product Substances 0.000 description 8
- 229920001296 polysiloxane Polymers 0.000 description 7
- 239000002245 particle Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- JTJMJGYZQZDUJJ-UHFFFAOYSA-N phencyclidine Chemical class C1CCCCN1C1(C=2C=CC=CC=2)CCCCC1 JTJMJGYZQZDUJJ-UHFFFAOYSA-N 0.000 description 4
- 229910001220 stainless steel Inorganic materials 0.000 description 4
- 239000010935 stainless steel Substances 0.000 description 4
- 239000007795 chemical reaction product Substances 0.000 description 3
- 229920001971 elastomer Polymers 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 239000000806 elastomer Substances 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- -1 polysiloxane Polymers 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 239000011856 silicon-based particle Substances 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 229910000792 Monel Inorganic materials 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 150000001350 alkyl halides Chemical class 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- NEHMKBQYUWJMIP-NJFSPNSNSA-N chloro(114C)methane Chemical compound [14CH3]Cl NEHMKBQYUWJMIP-NJFSPNSNSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000008246 gaseous mixture Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910001026 inconel Inorganic materials 0.000 description 1
- 229910001055 inconels 600 Inorganic materials 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000001367 organochlorosilanes Chemical class 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000012716 precipitator Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 238000005201 scrubbing Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/20—Purification, separation
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
- C07F7/16—Preparation thereof from silicon and halogenated hydrocarbons direct synthesis
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Silicon Compounds (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/248,779 US4328353A (en) | 1981-03-30 | 1981-03-30 | Process for the manufacture of organohalosilanes |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57176992A JPS57176992A (en) | 1982-10-30 |
| JPS6350357B2 true JPS6350357B2 (enExample) | 1988-10-07 |
Family
ID=22940645
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57050249A Granted JPS57176992A (en) | 1981-03-30 | 1982-03-30 | Manufacture of organohalosilane |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4328353A (enExample) |
| JP (1) | JPS57176992A (enExample) |
| DE (1) | DE3210379A1 (enExample) |
| FR (1) | FR2502625A1 (enExample) |
| GB (1) | GB2095576A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9732000B2 (en) | 2008-05-02 | 2017-08-15 | L. M. Scofield Company | High SRI systems for cementitious applications |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5239102A (en) * | 1992-04-13 | 1993-08-24 | General Electric Company | Method for making organohalosilanes |
| JPH1171383A (ja) * | 1997-08-29 | 1999-03-16 | Shin Etsu Chem Co Ltd | アルキルハロシランの製造方法 |
| DE19837957C1 (de) * | 1998-08-21 | 2000-01-05 | Krupp Uhde Gmbh | Verfahren zur Steuerung der Feinstaubpartikelmenge in einem Wirbelschichtreaktor, insbesondere zur Oxichlorierung von Ethylen |
| DE19951773C1 (de) | 1999-10-27 | 2001-03-15 | Wacker Chemie Gmbh | Verfahren zur Herstellung von Methylchlorsilanen |
| DE10118483C1 (de) | 2001-04-12 | 2002-04-18 | Wacker Chemie Gmbh | Staubrückführung bei der Direktsynthese von Chlor- und Methylchlorsilanen in Wirbelschicht |
| WO2008133525A1 (en) * | 2007-04-25 | 2008-11-06 | Norsk Hydro Asa | A process for the recycling of high purity silicon metal |
| EP3039027B1 (en) | 2013-08-30 | 2017-12-06 | Momentive Performance Materials Inc. | Slurry phase direct synthesis of organohalosilanes from cyclone fines |
| EP3744774B1 (de) | 2019-05-28 | 2021-09-01 | Evonik Operations GmbH | Verfahren zum recycling von silikonen |
| CN110787543A (zh) * | 2019-10-25 | 2020-02-14 | 上海黔宝环保新材料有限公司 | 一种活性粉体复合新材料的生产方法 |
| CN110694388A (zh) * | 2019-11-12 | 2020-01-17 | 四川永祥新能源有限公司 | 一种用于去除尾气中硅粉的系统 |
| KR20250156738A (ko) | 2023-03-14 | 2025-11-03 | 모멘티브 퍼포먼스 머티리얼즈 인크. | 알케닐할로실란의 개선된 직접 합성 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA731174A (en) * | 1966-03-29 | General Electric Company | Silicone compound process and apparatus | |
| FR55262E (enExample) * | 1943-09-27 | 1952-01-09 | ||
| US2595767A (en) * | 1950-08-10 | 1952-05-06 | Gen Electric | Synthesis of phenylchlorosilanes |
| US2803521A (en) * | 1952-03-05 | 1957-08-20 | Wacker Chemie Gmbh | Method of treating spent metallic reaction masses from the direct process production of organohalosilanes |
| US3655709A (en) * | 1969-10-11 | 1972-04-11 | Bayer Ag | Process for the manufacture of arylchlorosilanes in accordance with the rochow synthesis |
-
1981
- 1981-03-30 US US06/248,779 patent/US4328353A/en not_active Expired - Lifetime
-
1982
- 1982-02-19 GB GB8205004A patent/GB2095576A/en not_active Withdrawn
- 1982-03-20 DE DE19823210379 patent/DE3210379A1/de not_active Withdrawn
- 1982-03-30 JP JP57050249A patent/JPS57176992A/ja active Granted
- 1982-03-30 FR FR8205398A patent/FR2502625A1/fr active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9732000B2 (en) | 2008-05-02 | 2017-08-15 | L. M. Scofield Company | High SRI systems for cementitious applications |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2502625A1 (fr) | 1982-10-01 |
| DE3210379A1 (de) | 1982-11-04 |
| FR2502625B1 (enExample) | 1984-12-14 |
| US4328353A (en) | 1982-05-04 |
| JPS57176992A (en) | 1982-10-30 |
| GB2095576A (en) | 1982-10-06 |
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