JPS6350336A - Method for molding glass - Google Patents
Method for molding glassInfo
- Publication number
- JPS6350336A JPS6350336A JP19328786A JP19328786A JPS6350336A JP S6350336 A JPS6350336 A JP S6350336A JP 19328786 A JP19328786 A JP 19328786A JP 19328786 A JP19328786 A JP 19328786A JP S6350336 A JPS6350336 A JP S6350336A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- substrate
- target
- molding
- metallic plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011521 glass Substances 0.000 title claims abstract description 42
- 238000000465 moulding Methods 0.000 title claims abstract 7
- 238000000034 method Methods 0.000 title claims description 8
- 239000000758 substrate Substances 0.000 claims abstract description 24
- 229910052582 BN Inorganic materials 0.000 claims description 6
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 239000006060 molten glass Substances 0.000 claims description 2
- 238000000137 annealing Methods 0.000 claims 1
- 238000004544 sputter deposition Methods 0.000 abstract description 8
- 238000005336 cracking Methods 0.000 abstract description 5
- 238000011109 contamination Methods 0.000 abstract description 4
- 238000010583 slow cooling Methods 0.000 abstract description 4
- 229920002313 fluoropolymer Polymers 0.000 abstract 2
- 206010041662 Splinter Diseases 0.000 abstract 1
- 229910001220 stainless steel Inorganic materials 0.000 description 6
- 239000010935 stainless steel Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 239000003921 oil Substances 0.000 description 3
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000002480 mineral oil Substances 0.000 description 2
- 235000010446 mineral oil Nutrition 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 239000005297 pyrex Substances 0.000 description 2
- 238000005488 sandblasting Methods 0.000 description 2
- 229910000859 α-Fe Inorganic materials 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910001018 Cast iron Inorganic materials 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 238000007507 annealing of glass Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B9/00—Blowing glass; Production of hollow glass articles
- C03B9/30—Details of blowing glass; Use of materials for the moulds
- C03B9/48—Use of materials for the moulds
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/02—Other methods of shaping glass by casting molten glass, e.g. injection moulding
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B40/00—Preventing adhesion between glass and glass or between glass and the means used to shape it, hold it or support it
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Physical Vapour Deposition (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明はスパッタ等に用いられるガラス製ターゲットの
製造方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a method of manufacturing a glass target used for sputtering and the like.
従来の技術
近年薄膜化技術の進歩により、スパッタターゲットとし
て様々な酸化物が用いられるようになってきた。ガラス
もそのひとつであり、セラミックス、フェライト等の接
着用途に際し、所定の膜厚の接着層を形成するため、ス
パッタ法が用いられている。BACKGROUND OF THE INVENTION With recent advances in film thinning technology, various oxides have come to be used as sputter targets. Glass is one such example, and sputtering is used to form an adhesive layer with a predetermined thickness when bonding ceramics, ferrite, and the like.
従来ガラスターゲットは、鋳鉄、ステンレス等の金型に
溶解したガラスを流し込み、放冷して作製されていだが
、作製中割れたり基板と焼きついて離型が困難となるこ
とが多かった。これを防ぐため基板を予熱したり、金型
上に油脂を塗布したりする方法が行なわれているが、そ
れでもなお暁きつきが生じたり、ガラスを流し込んだ際
に油脂が揮発してガラス中に混入して気泡を生じたり、
油脂の炭化物がガラスを汚染したりしていた。さらに得
られたガラスは冷却中に歪みと残しており、このためス
パッタ時にターゲットに急激な温度上昇が加わるため割
れることが多かった。Conventionally, glass targets have been made by pouring molten glass into a mold made of cast iron, stainless steel, etc. and leaving it to cool, but this often results in cracking or burning to the substrate during manufacture, making it difficult to release from the mold. In order to prevent this, methods such as preheating the substrate and applying oil on the mold are used, but even then, the crackling still occurs, and when the glass is poured, the oil and fat evaporate and get stuck in the glass. It may get mixed in and create bubbles,
Carbonized oil and fat were contaminating the glass. Furthermore, the resulting glass remained distorted during cooling, and as a result, the target was subject to a rapid temperature rise during sputtering, which often caused it to break.
発明が解決しようとする問題点
本発明はガラスとの離型性が良い基析全用い、これを適
当な温度に予熱しておくとともに、後α理を適当な温度
で行なうことによって、上記問題点分解法しようとする
ものである。Problems to be Solved by the Invention The present invention solves the above problems by using a substrate that has good mold releasability from glass, preheating it to an appropriate temperature, and performing post-alpha treatment at an appropriate temperature. This is a point-resolution method.
問題点分解法するための手段
本発明は、ガラスとの離型性の良い基板として、窒化ほ
う素板、窒化ほう素を被覆した金属板、フ・ノ素樹脂を
被覆した金属板のいずれか全用い、これをガラスの徐冷
温度に予熱しておくとともに、得られたターゲットを軟
化温度以上の温度で後処理すること?特徴とする。Means for resolving the problem The present invention uses any one of a boron nitride plate, a metal plate coated with boron nitride, and a metal plate coated with a fluorine resin as a substrate with good mold releasability from glass. In addition to preheating this to the slow cooling temperature of glass, the obtained target is post-treated at a temperature higher than the softening temperature? Features.
作用
本発明の方法によると、作製中に割れたり焼きついたり
することなく、気泡や汚染のないガラスターゲットを容
易に得ることが出来る。Effect: According to the method of the present invention, a glass target that is free from bubbles and contamination can be easily obtained without cracking or burning during production.
実施例 以下本発明の実施例と従来例を比較しながら説明する。Example Embodiments of the present invention will be described below while comparing them with conventional examples.
なお、直径100騒のターゲットを作製することを例と
して、本発明を説明する。The present invention will be explained using an example in which a target with a diameter of 100 mm is manufactured.
(実施例1)
パイレフクス(コーニング社Nl17740)ガラスタ
ーゲットを作製する例を説明する。(Example 1) An example of producing a Pyrex (Corning Corporation N117740) glass target will be described.
ガラスの徐冷温度(約560°C)に予熱した窒化ほう
素基板(例えば電気化学工業(株)製1品番N−1.大
きさ160X150X10JEm )上に、内径100
mのステンレスリングラ置キ、パイレックスガラスを白
金ルツボ中で1500°Cで溶解後、110o〜12o
O゛Cに冷却し、前記リング内に流し込んで、放置した
。得られたターゲットを基板とともに電気炉に設置し、
560″Cから軟化温度以上(例えば860°C)まで
1時間かけて昇温し、850’Cで1時間保持後、電気
炉内で放冷した。こうして得られたターゲットは、基板
と焼き付くこともなく、またガラス中に気泡や不純物?
全く含まないものであり、さらにスパッタ時に割れるこ
ともなかった。On a boron nitride substrate (for example, manufactured by Denki Kagaku Kogyo Co., Ltd., product number N-1, size 160 x 150 x 10 JEm) preheated to the slow cooling temperature of glass (about 560°C),
After melting the Pyrex glass in a platinum crucible at 1500°C, it was heated to 110°C to 12°C.
It was cooled to 0°C, poured into the ring, and allowed to stand. Place the obtained target together with the substrate in an electric furnace,
The temperature was raised from 560'C to above the softening temperature (e.g. 860°C) over a period of 1 hour, held at 850'C for 1 hour, and then allowed to cool in an electric furnace.The target obtained in this way did not burn into the substrate. No bubbles or impurities in the glass?
It contained no particles at all, and also did not crack during sputtering.
(実施例2) 窒化ほう素を被覆した基板を次のようにして作製した。(Example 2) A substrate coated with boron nitride was prepared as follows.
大きさ150X160X10鵡のステンレス板の片面を
脱脂、サンドブラスト後、ボロンコーティングS(電気
化学工業(株)製)をスプレーがけし、800′Cで2
0分焼付した。この基板を用いた以外は実施例1と同様
の方法でターゲ・7)を得た。得られたターゲットの性
状は実施例1と同様であった。After degreasing and sandblasting one side of a stainless steel plate of size 150 x 160 x 10, sprayed with boron coating S (manufactured by Denki Kagaku Kogyo Co., Ltd.) and heated at 800'C for 2 hours.
Baked for 0 minutes. Target 7) was obtained in the same manner as in Example 1 except that this substrate was used. The properties of the obtained target were similar to those in Example 1.
(実施例3)
フェライト封着用ガラス(コーニング社随8463 )
ターゲットを作製する例を説明する。(Example 3) Glass for ferrite sealing (Corning Co., Ltd. 8463)
An example of creating a target will be explained.
フッ素樹脂を被覆した基板を次のようにして作製した。A substrate coated with a fluororesin was prepared as follows.
大きさ150X160X101mのステンレス板の片面
を脱脂、サンドブラスト後、フッ素樹脂コーティングD
−1(ダイキン工業(株)製)をスプレーがけし、38
0°Cで20分焼付した。After degreasing and sandblasting one side of a stainless steel plate measuring 150 x 160 x 101 m, coated with fluororesin D.
-1 (manufactured by Daikin Industries, Ltd.) was sprayed, 38
Baking was performed at 0°C for 20 minutes.
ガラスの徐冷温度(約320’C)に予熱した前記基板
上に、内1100Mのステンレスリングを置き、ガラス
を白金ルツボ中で900’Cで俗解後、600〜800
’Cに冷却し、前記リング内に流し込んで放置した。得
られたターゲットト基板とともに電気炉に設置し、32
0°Cから軟化温度以上(例えば400’C)まで半時
間で昇温し、400°Cで1時間保持後、電気炉内で放
冷した。こうして得られたターゲットは基板との離型性
に優れ、ガラス中に気泡や不純物を全く含まず、さらに
スパッタ時に割れることもなかった。A 1100M stainless steel ring is placed on the substrate that has been preheated to the glass annealing temperature (approximately 320'C), and the glass is heated to 900'C in a platinum crucible, then heated to 600~800°C.
It was cooled to 'C, poured into the ring and left to stand. Placed in an electric furnace together with the obtained target substrate, and heated for 32 hours.
The temperature was raised from 0°C to above the softening temperature (for example, 400'C) in half an hour, held at 400°C for 1 hour, and then allowed to cool in an electric furnace. The target thus obtained had excellent releasability from the substrate, contained no bubbles or impurities in the glass, and did not break during sputtering.
(従来例1)
実施例1において、基板としてステンレス板を予熱しな
いで用いた。この上にガラスを流し込んだところ、基板
とガラスが一部焼付けをおこし、焼付きしなかった部分
は速く冷却されるために、ターゲットが不規則に割れて
しまった。(Conventional Example 1) In Example 1, a stainless steel plate was used as the substrate without preheating. When glass was poured on top of this, some parts of the substrate and glass were baked, and the parts that weren't baked cooled down quickly, causing the target to crack irregularly.
(従来例2)
実施例1において、基板として鉱油分塗布したステンレ
ス板を660°Cに予熱して用いた。この上にガラスを
流し込んだところ、鉱油が燃焼しガラス中に気泡や炭化
物が混入した。まだ基板とガラスの焼付きも発生し、タ
ーゲットが割れてしまった。(Conventional Example 2) In Example 1, a stainless steel plate coated with mineral oil was preheated to 660° C. and used as a substrate. When glass was poured over this, the mineral oil burned and air bubbles and carbide were mixed into the glass. Seizure of the substrate and glass still occurred, and the target was broken.
(従来例3)
実施例1において、ガラスをリング内に流し込んだ後予
熱を止め、放冷した。こうして得られたターゲットは表
面と基板接触面との冷却速度の違いから歪を残している
ため、スパッタ時に割れが生じた。(Conventional Example 3) In Example 1, after the glass was poured into the ring, preheating was stopped and the glass was allowed to cool. The target thus obtained remained distorted due to the difference in cooling rate between the surface and the surface in contact with the substrate, which caused cracks during sputtering.
(従来例4)
実施例1において、基材を徐冷温度以下の温度(例えば
350’C)で予熱して用いた。この結果は従来例1と
同様であった。(Conventional Example 4) In Example 1, the base material was preheated at a temperature below the slow cooling temperature (for example, 350'C). This result was similar to Conventional Example 1.
(従来レリ5)
実施例1において、後処理温度をガラスの軟化温度以下
(例えば700’C)にて行ったところ、この結果は従
来例3と同様であった。(Conventional Reli 5) In Example 1, the post-treatment temperature was set below the softening temperature of glass (for example, 700'C), and the results were the same as in Conventional Example 3.
発明の効果
以上のように本発明の方法によれば、作製中に割れたり
焼付いたりすることなく、気泡や汚染のないガラスター
ゲ・フトを容易に得ることができ、まだスパッタ時の割
れをなくすことができる。Effects of the Invention As described above, according to the method of the present invention, it is possible to easily obtain a glass target/feet without cracking or burning during production, without bubbles or contamination, and without cracking during sputtering. Can be done.
Claims (3)
ッ素樹脂を被覆した金属板のいずれかの基板上に、溶解
したガラスを流し出してガラス成型体を得ることを特徴
とするガラスの成型方法。(1) Glass characterized in that a glass molded body is obtained by pouring molten glass onto a substrate such as a boron nitride plate, a metal plate coated with boron nitride, or a metal plate coated with fluororesin. molding method.
特徴とする特許請求の範囲第1項記載のガラスの成型方
法。(2) The method for molding glass according to claim 1, characterized in that the substrate is preheated to an annealing temperature of glass.
することを特徴とする特許請求の範囲第1項又は第2項
記載のガラスの成型方法。(3) The glass molding method according to claim 1 or 2, characterized in that the glass molded body is post-treated at a temperature higher than its softening temperature.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19328786A JPH0674151B2 (en) | 1986-08-19 | 1986-08-19 | Molding method of glass target for magnetic head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19328786A JPH0674151B2 (en) | 1986-08-19 | 1986-08-19 | Molding method of glass target for magnetic head |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6350336A true JPS6350336A (en) | 1988-03-03 |
JPH0674151B2 JPH0674151B2 (en) | 1994-09-21 |
Family
ID=16305408
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19328786A Expired - Fee Related JPH0674151B2 (en) | 1986-08-19 | 1986-08-19 | Molding method of glass target for magnetic head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0674151B2 (en) |
-
1986
- 1986-08-19 JP JP19328786A patent/JPH0674151B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH0674151B2 (en) | 1994-09-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |