JPH0674151B2 - Molding method of glass target for magnetic head - Google Patents

Molding method of glass target for magnetic head

Info

Publication number
JPH0674151B2
JPH0674151B2 JP19328786A JP19328786A JPH0674151B2 JP H0674151 B2 JPH0674151 B2 JP H0674151B2 JP 19328786 A JP19328786 A JP 19328786A JP 19328786 A JP19328786 A JP 19328786A JP H0674151 B2 JPH0674151 B2 JP H0674151B2
Authority
JP
Japan
Prior art keywords
glass
target
substrate
magnetic head
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP19328786A
Other languages
Japanese (ja)
Other versions
JPS6350336A (en
Inventor
康男 水野
西野  敦
正樹 池田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP19328786A priority Critical patent/JPH0674151B2/en
Publication of JPS6350336A publication Critical patent/JPS6350336A/en
Publication of JPH0674151B2 publication Critical patent/JPH0674151B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B9/00Blowing glass; Production of hollow glass articles
    • C03B9/30Details of blowing glass; Use of materials for the moulds
    • C03B9/48Use of materials for the moulds
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00Other methods of shaping glass
    • C03B19/02Other methods of shaping glass by casting molten glass, e.g. injection moulding
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B40/00Preventing adhesion between glass and glass or between glass and the means used to shape it, hold it or support it
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3407Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Physical Vapour Deposition (AREA)
  • Thin Magnetic Films (AREA)

Description

【発明の詳細な説明】 産業上の利用分野 本発明はスパッタ等に用いられるガラス製ターゲットの
製造方法に関するものである。
TECHNICAL FIELD The present invention relates to a method for manufacturing a glass target used for sputtering or the like.

従来の技術 近年薄膜化技術の進歩により、スパッタターゲットとし
て様々な酸化物が用いられるようになってきた。ガラス
もそのひとつであり、セラミックス,フェライト等の接
着用途に際し、所定の膜厚の接着層を形成するため、ス
パッタ法が用いられている。とくに近年磁気記録の高密
度化にともない、磁気ヘッドのギャップはサブミクロン
になっており、このような狭いギャップを精度良く形成
するために、ギャップ材としてスパッタリングによるガ
ラス膜が重要になってきている。
2. Description of the Related Art With the progress of thinning technology in recent years, various oxides have come to be used as sputter targets. Glass is one of them, and a sputter method is used to form an adhesive layer having a predetermined film thickness when bonding ceramics, ferrite and the like. In particular, with the recent increase in density of magnetic recording, the gap of the magnetic head has become submicron, and in order to accurately form such a narrow gap, a glass film by sputtering has become important as a gap material. .

従来ガラスターゲットは、鋳鉄,ステンレス等の金型に
溶解したガラスを流し込み、放冷して作製されていた
が、作製中割れたり基板と焼きついて離型が困難となる
ことが多かった。これを防ぐため基板を予熱したり、金
型上に油脂を塗布したりする方法が行なわれているが、
それでもなお焼きつきが生じたり、ガラスを流し込んだ
際に油脂が揮発してガラス中に混入して気泡を生じた
り、油脂の炭化物がガラスを汚染したりしていた。この
ようなガラス中の気泡はスパッタ時のターゲットの割れ
をひきおこしていた。また不純物は、スパッタリングに
よって成膜したガラス膜の品質の低下を招き、高精度な
ギャップの形成を不可能にしていた。
Conventionally, a glass target was manufactured by pouring molten glass into a mold such as cast iron or stainless steel and allowing it to cool, but it was often difficult to release the mold because it cracked during manufacture and seized with the substrate. In order to prevent this, a method of preheating the substrate or applying oil or fat on the mold is used.
Nevertheless, seizure still occurred, oil and fat volatilized when the glass was poured and mixed into the glass to form bubbles, and carbides of oil and fat contaminate the glass. Such bubbles in the glass caused cracking of the target during sputtering. Further, the impurities deteriorate the quality of the glass film formed by sputtering, making it impossible to form a highly accurate gap.

さらに得られたガラスは冷却中に歪みを残しており、こ
のためスパッタ時にターゲットに急激な温度上昇が加わ
るため割れることが多かった。
Further, the obtained glass remained strained during cooling, so that the target was rapidly cracked due to a rapid temperature rise applied during sputtering.

発明が解決しようとする問題点 本発明はガラスとの離型性が良い基板を用い、これを適
当な温度に予熱しておくとともに、後処理を適当な温度
で行なうことによって、上記問題点を解決しようとする
ものである。
DISCLOSURE OF THE INVENTION Problems to be Solved by the Invention The present invention solves the above problems by using a substrate having good releasability from glass, preheating this to an appropriate temperature, and performing post-treatment at an appropriate temperature. It is something to solve.

問題点を解決するための手段 本発明は、ガラスとの離型性の良い基板として、窒化ほ
う素板、窒化ほう素を被覆した金属板、フッ素樹脂を被
覆した金属板のいずれかを用い、これをガラスの徐冷温
度に予熱しておくとともに、得られたターゲットを軟化
温度以上の温度で後処理することを特徴とする。
Means for Solving the Problems The present invention uses a boron nitride plate, a metal plate coated with boron nitride, or a metal plate coated with a fluororesin as a substrate having good releasability from glass, It is characterized in that this is preheated to the slow cooling temperature of the glass and that the obtained target is post-treated at a temperature of the softening temperature or higher.

作 用 本発明の方法によると、作製中に割れたり焼きついたり
することなく、気泡や汚染のないガラスターゲットを容
易に得ることが出来る。
Working According to the method of the present invention, it is possible to easily obtain a glass target free from bubbles and contamination without cracking or burning during manufacturing.

実施例 以下本発明の実施例と従来例を比較しながら説明する。
なお、直径100mmのターゲットを作製することを例とし
て、本発明を説明する。
Example Hereinafter, an example of the present invention and a conventional example will be compared and described.
The present invention will be described by taking as an example the production of a target having a diameter of 100 mm.

(実施例1) パイレックス(コーニング社No.7740)ガラスターゲッ
トを作製する例を説明する。
Example 1 An example of producing a Pyrex (Corning No. 7740) glass target will be described.

ガラスの徐冷温度(約560℃)に予熱した窒化ほう素基
板(例えば電気化学工業(株)製,品番N−1,大きさ15
0×150×10mm)上に、内径100mmのステンレスリングを
置き、パイレックスガラスを白金ルツボ中で1500℃で溶
解後、1100〜1200℃に冷却し、前記リング内に流し込ん
で、放置した。得られたターゲットを基板とともに電気
炉に設置し、560℃から軟化温度以上(例えば850℃)ま
で1時間かけて昇温し、850℃で1時間保持後、電気炉
内で放冷した。こうして得られたターゲットは、基板と
焼き付くこともなく、またガラス中に気泡や不純物を全
く含まないものであり、さらにスパッタ時に割れること
もなかった。
Boron nitride substrate preheated to the gradual cooling temperature (about 560 ° C) of glass (eg, manufactured by Denki Kagaku Kogyo Co., Ltd., product number N-1, size 15)
A stainless steel ring having an inner diameter of 100 mm was placed on (0 × 150 × 10 mm), Pyrex glass was melted at 1500 ° C. in a platinum crucible, cooled to 1100 to 1200 ° C., poured into the ring, and left to stand. The obtained target was placed in an electric furnace together with the substrate, heated from 560 ° C to a softening temperature or higher (for example, 850 ° C) over 1 hour, kept at 850 ° C for 1 hour, and then left to cool in the electric furnace. The target thus obtained did not stick to the substrate, contained no bubbles or impurities in the glass, and did not crack during sputtering.

(実施例2) 窒化ほう素を被覆した基板を次のようにして作製した。
大きさ150×150×10mmのステンレス板の片面を脱脂、サ
ンドブラスト後、ボロンコーティングS(電気化学工業
(株)製)をスプレーがけし、800℃で20分焼付けし
た。この基板を用いた以外は実施例1と同様の方法でタ
ーゲットを得た。得られたターゲットの性状は実施例1
と同様であった。
Example 2 A substrate coated with boron nitride was manufactured as follows.
One side of a stainless steel plate having a size of 150 × 150 × 10 mm was degreased, sandblasted, sprayed with boron coating S (produced by Denki Kagaku Kogyo KK), and baked at 800 ° C. for 20 minutes. A target was obtained in the same manner as in Example 1 except that this substrate was used. The properties of the obtained target are shown in Example 1.
Was similar to.

(実施例3) フェライト封着用ガラス(コーニング社No.8463)ター
ゲットを作製する例を説明する。
(Example 3) An example of producing a glass for sealing ferrite (No.8463, Corning) will be described.

フッ素樹脂を被覆した基板を次のようにして作製した。
大きさ150×150×10mmのステンレス板の片面を脱脂、サ
ンドブラスト後、フッ素樹脂コーティングD−1(ダイ
キン工業(株)製)をスプレーがけし、380℃で20分焼
付けした。
A substrate coated with a fluororesin was produced as follows.
One side of a stainless steel plate having a size of 150 × 150 × 10 mm was degreased, sandblasted, then sprayed with fluororesin coating D-1 (manufactured by Daikin Industries, Ltd.) and baked at 380 ° C. for 20 minutes.

ガラスの徐冷温度(約320℃)に予熱した前記基板上
に、内径100mmのステンレスリングを置き、ガラスを白
金ルツボ中で900℃で溶解後、500〜600℃に冷却し、前
記リング内に流し込んで放置した。得られたターゲット
を基板とともに電気炉に設置し、320℃から軟化温度以
上(例えば400℃)まで半時間で昇温し、400℃で1時間
保持後、電気炉内で放冷した。こうして得られたターゲ
ットは基板との離型性に優れ、ガラス中に気泡や不純物
を全く含まず、さらにスパッタ時に割れることもなかっ
た。
Place a stainless steel ring with an inner diameter of 100 mm on the substrate preheated to the gradual cooling temperature of glass (about 320 ℃), melt the glass in a platinum crucible at 900 ℃, cool to 500 ~ 600 ℃, and put in the ring. It was poured and left. The obtained target was placed in an electric furnace together with the substrate, heated from 320 ° C. to a softening temperature or higher (for example, 400 ° C.) in half an hour, kept at 400 ° C. for 1 hour, and then left to cool in the electric furnace. The target thus obtained had excellent releasability from the substrate, contained no bubbles or impurities in the glass, and did not crack during sputtering.

(従来例1) 実施例1において、基板としてステンレス板を予熱しな
いで用いた。この上にガラスを流し込んだところ、基板
とガラスが一部焼付きをおこし、焼付けしなかった部分
は速く冷却されるために、ターゲットが不規則に割れて
しまった。
(Conventional Example 1) In Example 1, a stainless steel plate was used as a substrate without preheating. When glass was poured over this, the substrate and the glass partially burned, and the non-baked portion was quickly cooled, so the target was cracked irregularly.

(従来例2) 実施例1において、基板として鉱油を塗布したステンレ
ス板を560℃に予熱して用いた。この上にガラスを流し
込んだところ、鉱油が燃焼しガラス中に気泡や炭化物が
混入した。また基板とガラスの焼付きも発生し、ターゲ
ットが割れてしまった。
(Conventional Example 2) In Example 1, a stainless steel plate coated with mineral oil was used as a substrate after preheating to 560 ° C. When glass was poured on this, mineral oil burned and bubbles and carbides were mixed in the glass. In addition, seizure of the substrate and glass also occurred, and the target was broken.

(従来例3) 実施例1において、ガラスをリング内に流し込んだ後予
熱を止め、放冷した。こうして得られたターゲットは表
面と基板接触面との冷却速度の違いから歪を残している
ため、スパッタ時に割れが生じた。
(Conventional Example 3) In Example 1, glass was poured into the ring, preheating was stopped, and the glass was allowed to cool. Since the target thus obtained had some distortion due to the difference in cooling rate between the surface and the substrate contact surface, cracking occurred during sputtering.

(従来例4) 実施例1において、基材を徐冷温度以下の温度(例えば
350℃)で予熱して用いた。この結果は従来例1と同様
であった。
(Prior Art Example 4) In Example 1, the temperature of the base material is not more than the slow cooling temperature (for example,
It was used after preheating at 350 ° C. This result was similar to that of Conventional Example 1.

(従来例5) 実施例1において、後処理温度をガラスの軟化温度以下
(例えば700℃)にて行なったところ、この結果は従来
例3と同様であった。
(Conventional Example 5) In Example 1, when the post-treatment temperature was lower than the softening temperature of glass (for example, 700 ° C.), the result was the same as that in Conventional Example 3.

発明の効果 以上のように本発明の方法によれば、作製中に割れたり
焼付いたりすることなく、気泡や汚染のないガラスター
ゲットを容易に得ることができ、またスパッタ時の割れ
をなくすことができる。
EFFECTS OF THE INVENTION As described above, according to the method of the present invention, it is possible to easily obtain a glass target free from bubbles and contamination without cracking or burning during fabrication, and to eliminate cracking during sputtering. it can.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】窒化ほう素板、窒化ほう素を被覆した金属
板、フッ素樹脂を被覆した金属板のいずれかの基板上
に、溶解したガラスを流し出してガラス成型体を得るこ
とを特徴とする磁気ヘッド用ガラスターゲットの成形方
法。
1. A glass molded body is obtained by casting molten glass on a substrate of any one of a boron nitride plate, a metal plate coated with boron nitride, and a metal plate coated with fluororesin. Method for forming a glass target for a magnetic head.
【請求項2】前記基板を、ガラスの徐冷温度に予熱する
ことを特徴とする特許請求の範囲第1項記載の磁気ヘッ
ド用ガラスターゲットの成形方法。
2. The method of molding a glass target for a magnetic head according to claim 1, wherein the substrate is preheated to a glass annealing temperature.
【請求項3】前記ガラス成型体を軟化温度以上の温度で
後処理することを特徴とする特許請求の範囲第1項又は
第2項記載の磁気ヘッド用ガラスターゲットの成形方
法。
3. The method for molding a glass target for a magnetic head according to claim 1 or 2, wherein the glass molded body is post-treated at a temperature of a softening temperature or higher.
JP19328786A 1986-08-19 1986-08-19 Molding method of glass target for magnetic head Expired - Fee Related JPH0674151B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19328786A JPH0674151B2 (en) 1986-08-19 1986-08-19 Molding method of glass target for magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19328786A JPH0674151B2 (en) 1986-08-19 1986-08-19 Molding method of glass target for magnetic head

Publications (2)

Publication Number Publication Date
JPS6350336A JPS6350336A (en) 1988-03-03
JPH0674151B2 true JPH0674151B2 (en) 1994-09-21

Family

ID=16305408

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19328786A Expired - Fee Related JPH0674151B2 (en) 1986-08-19 1986-08-19 Molding method of glass target for magnetic head

Country Status (1)

Country Link
JP (1) JPH0674151B2 (en)

Also Published As

Publication number Publication date
JPS6350336A (en) 1988-03-03

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