JPS6340970A - Image pickup method for object having prescribed height - Google Patents

Image pickup method for object having prescribed height

Info

Publication number
JPS6340970A
JPS6340970A JP18604586A JP18604586A JPS6340970A JP S6340970 A JPS6340970 A JP S6340970A JP 18604586 A JP18604586 A JP 18604586A JP 18604586 A JP18604586 A JP 18604586A JP S6340970 A JPS6340970 A JP S6340970A
Authority
JP
Japan
Prior art keywords
slit light
image
slit
width
reference surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18604586A
Other languages
Japanese (ja)
Inventor
Noriyuki Takemoto
武本 憲幸
Chikaya Miyasaka
宮坂 新哉
Satoru Yokogawa
横川 悟
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP18604586A priority Critical patent/JPS6340970A/en
Publication of JPS6340970A publication Critical patent/JPS6340970A/en
Pending legal-status Critical Current

Links

Landscapes

  • Image Input (AREA)
  • Closed-Circuit Television Systems (AREA)

Abstract

PURPOSE:To obtain a higher object image then a reference surface by converting photoelectrically and storing only a slit light irradiating part on an object and storing a series of images, by utilizing a fact that radiated parts on the object and on the reference surface are shifted in the horizontal direction, when a slit light is radiated obliquely to the object having height from the reference surface. CONSTITUTION:A printed board 10 is fixed to an XY base having a reference surface, and a CCD camera 1, and a laser slit light source 12 are provided right above and in the diagonal upper direction, respectively. A slit light is projected at an angle alpha, a camera window W is made a little narrower than slit width/cosalpha, an image pickup is executed and an image is stored. An irradiation is executed by the width W each, partial images of chip parts 13-15 are accumulated successively, and in the end, the whole images 13'-15' are formed. By outputting them, a chip image is obtained. By selecting suitably the projection angle of the slit light, the slit width and the window width in accordance with the height of the chip parts, a minute object on a substrate can be distinguished from the substrate and can be recognized easily and exactly.

Description

【発明の詳細な説明】 [発明の技術分野] 本発明はプリント基板上にマウントされたチップ部品の
取付状態を検査するのに応用して好適な撮像方法に係り
5特にスリット光と光電変換装置を組み合わせた。規準
面から所定の高さを持つ物体の撮像方法に関する。
[Detailed Description of the Invention] [Technical Field of the Invention] The present invention relates to an imaging method suitable for application to inspecting the mounting state of chip components mounted on a printed circuit board, and particularly relates to a slit light and a photoelectric conversion device. combined. The present invention relates to a method of imaging an object having a predetermined height from a reference plane.

[発明の技術的背景及びその問題点コ 一般に、パターニングを施したプリント基板上に各種チ
ップ部品を塔載後、ハンダ付けする工程において、チッ
プ部品をプリント基板上に仮付けした状態でチップ部品
が正しく貼着されているかどうかを検査することが行わ
れている。このような検査法として、従来は第9図及び
第10図に示すように、チップ部品21を塔載したプリ
ント基板20のななめから光を照射し、チップ部品21
の高さによって生じる影(黒)と光が当るチップ部品上
面との明暗(白黒)の差を真上に設置したカメラ23に
よって認識していた。しかし、このような撮像方法にお
いては、プリント基板20の凹凸や光の反射によって影
の部分が明確な黒とはならなかったり、部品によっては
両端の電極(金属)部分(21a)だけが白いものがあ
り、このような部品は1個の部分として認識できなかっ
たり、正確な部品の撮像、認定が不可能な場合があった
[Technical background of the invention and its problems] In general, in the process of mounting various chip components on a patterned printed circuit board and then soldering them, the chip components are temporarily attached to the printed circuit board. An inspection is being carried out to see if it is attached correctly. Conventionally, as shown in FIGS. 9 and 10, as such an inspection method, light is irradiated from the diagonal of the printed circuit board 20 on which the chip component 21 is mounted, and the chip component 21 is
The difference in brightness (black and white) between the shadow (black) caused by the height of the chip and the top surface of the chip component that is illuminated by the light was recognized by a camera 23 installed directly above. However, in such an imaging method, the shadow part may not be clearly black due to the unevenness of the printed circuit board 20 and the reflection of light, and depending on the part, only the electrode (metal) part (21a) at both ends may be white. In some cases, such parts cannot be recognized as a single part, or it is impossible to accurately image or identify such parts.

[発明の目的コ 本発明はこのような従来の撮像方法の難点を解消し、プ
リント基板上のチップ部品など高さのある物体を正確に
認定できる撮像方法を提供するものである。
[Objective of the Invention] The present invention solves the difficulties of the conventional imaging methods and provides an imaging method that can accurately identify tall objects such as chip components on a printed circuit board.

[発明の概要] このような目的を達成するために1本発明の撮像方法に
おいては、規準面から高さを持つ物体に対し、ななめ方
向からスリット光を照射した場合、高さを持つ物体上の
スリット光照射部分と規準面上のスリット光照射部分が
水平方向にず九ることを利用したもので、物体上のスリ
ット光照射部分のみを光電変換素子によって切り出し、
これを記憶装置に記憶し、このような動作をスリット光
と光電変換素子に対し物体を相対的に水平方向に移動し
ながらくり返す即ち走査することにより記憶装置内に一
連の映像を貯え、これを出力することにより基準面より
高い物体の画像を得るものである。
[Summary of the Invention] In order to achieve such an object, in the imaging method of the present invention, when a slit light is irradiated from a diagonal direction to an object having a height from a reference plane, a This method takes advantage of the fact that the slit light irradiation part on the object and the slit light irradiation part on the reference surface are horizontally spaced, and only the slit light irradiation part on the object is cut out by a photoelectric conversion element.
This is stored in a storage device, and by repeating this operation while moving the object in the horizontal direction relative to the slit light and the photoelectric conversion element, a series of images is stored in the storage device, and this image is stored in the storage device. By outputting , an image of an object higher than the reference plane is obtained.

次に5図面により本発明の撮像方法の原理を説明する。Next, the principle of the imaging method of the present invention will be explained with reference to five drawings.

第1図において、スリット光1例えばレーザ光のスリッ
ト光はLWのスリット幅を有し、規準面2に対し所定の
角度αをもって投射する。光電変換装置例えばマトリク
スカメラ3は規準面2の上方に設置され、カメラの視野
(F、O,V)のうち、ウィンドウ4の部分にレーザ光
の反射光を捕えることができる。この際、ウィンドウ4
で捕えられる規準面2の部分には、スリット光が照射さ
れず一定の高さくht)以上にある物体のみにスリット
光が照射されることが必要条件であるから、そのような
スリット光の投射角度(α)及びウィンドウ4の幅(W
)及びカメラ等の位置を選ばなければならない。
In FIG. 1, a slit beam 1, such as a laser beam, has a slit width of LW and is projected onto a reference plane 2 at a predetermined angle α. A photoelectric conversion device, such as a matrix camera 3, is installed above the reference plane 2, and the reflected light of the laser beam can be captured in the window 4 of the field of view (F, O, V) of the camera. At this time, window 4
Since it is a necessary condition that the slit light is not irradiated on the part of the reference surface 2 that is captured by the slit light and that the slit light is irradiated only on objects that are above a certain height (ht), such projection of the slit light Angle (α) and width of window 4 (W
) and the location of the camera, etc. must be selected.

又、規準面2からの高さHが一定範囲(h!〈H<h2
)の物体をカメラのウィンドウレ;捕えるためにはスリ
ット光の上限は所望の高さh2とウィンドウ左端との交
点Bを通るか、それ以上でなければならない。そのため
には、スリット光の幅LWは、レーザ光1の下限とウィ
ンドウの右端(図中)との交点Aの規準面からの高さを
hlとし、レーザ光の上限とウィンドウの右端との交点
A′の規準面からの高さをh2′とする時、0式及び(
0式が成り立つから、■式を満たさなければならない。
Also, the height H from the reference plane 2 is within a certain range (h!<H<h2
) In order to capture the object below the camera window, the upper limit of the slit light must pass through the intersection B between the desired height h2 and the left edge of the window, or exceed it. To do this, the width LW of the slit light is defined as hl, which is the height from the reference plane of the intersection A of the lower limit of the laser beam 1 and the right edge of the window (in the figure), and the intersection of the upper limit of the laser beam and the right edge of the window. When the height of A' from the reference plane is h2', formula 0 and (
Since the formula 0 holds true, the formula ■ must be satisfied.

LW=  (h 2 ’ −h I) 5ina  −
・(’Dh2 ’−h2 =W tanα ・・・・・
・・・・・・・・■h2  ’=W  11.ana 
 + h2  − ・・t■′*”−t、w= (h 
2− h 1+W tanα)sinα・−t;3+と
いうことは、h2が高いほど(すなわち、より広範囲の
高さの物体を捕える場合)、スリット幅(LW)を広く
する必要がある。同様にウィンドウの幅Wを大きくとろ
うとするならば、やはりスリット幅(LW)を拡げなけ
ればならない。しかし、現実にはスリット光は第2図に
示すような分布を有するもので、その幅が広くなる程シ
ャープなスリット光が得られにくくなるので、撮像する
物体の高さの範囲との兼ね合いで適宜選ぶべきであろう
。高さの異なる物体に対する対応方法は後述の実施例で
詳述する。又、スリット光としては、シャープ度の高い
ものがよくレーザースリット光が好適に用いられる。そ
して本発明の撮像方法においては、このように規準面に
はスリット光が照射されず所定の高さの物体のみにスリ
ット光が照射される部分をカメラのウィンドウに捕え、
記憶装置に入力し、カメラ及びスリット光と物体とを相
対的に移動しながらこのような所定の高さの物体の画像
の切り出しと記憶装置への入力を繰り返した後、記憶装
置に貯積された画像を再生することによって物体全体像
を得るものである。
LW= (h2'-hI) 5ina-
・('Dh2'-h2 = W tanα...
・・・・・・・・・■h2'=W 11. ana
+ h2 − ・・t■′*”−t, w= (h
2- h 1+W tan α) sin α·-t; 3+ means that the higher h2 (that is, when capturing objects with a wider range of heights), the wider the slit width (LW) needs to be. Similarly, if the width W of the window is to be increased, the slit width (LW) must also be increased. However, in reality, slit light has a distribution as shown in Figure 2, and the wider the width of the slit light, the more difficult it becomes to obtain sharp slit light. You should choose appropriately. A method for dealing with objects of different heights will be described in detail in the embodiments described later. Further, as the slit light, one having a high degree of sharpness is preferred, and a laser slit light is preferably used. In the imaging method of the present invention, the part where the slit light is not irradiated on the reference plane but only on the object at a predetermined height is captured in the window of the camera,
After inputting the image into the storage device and repeating the cutting out of the image of the object at a predetermined height and inputting it into the storage device while moving the camera and slit light relative to the object, the image is stored in the storage device. By reproducing the captured image, the entire image of the object is obtained.

[発明の実施例] 以下1本発明の好ましい実施例について図面に基き説明
する。
[Embodiments of the Invention] A preferred embodiment of the present invention will be described below with reference to the drawings.

実施例1 第3図においてプリント基板10は、規準面2を有する
X−Yステージ(図示せず)に固定され、その上方には
カメラ11例えばCCDカメラ、ななめ上方にはレーザ
スリット光の光源12が設置されている。プリント基板
10は基板面が平担で且つ望ましくは、黒あるいは黒ν
こ近い着色のものとし、その表面に、厚さ0 、5 m
m程度のチップ部品13.14.15が仮付けされてい
る。このようなプリント基板IOにレーザスリット光を
照射すると第4図(a)に示すように斜線で示す範囲に
光が照射される。カメラのウィンドウWをその照射幅(
スリット幅/cosα、但しαは投射角)と同じかわす
かに狭く設定し、撮像し、それを記憶装置(バッファ)
B2に入力する(第4図(b))。
Embodiment 1 In FIG. 3, a printed circuit board 10 is fixed to an X-Y stage (not shown) having a reference plane 2, a camera 11 such as a CCD camera is mounted above the stage, and a light source 12 of laser slit light is mounted diagonally above the stage. is installed. The printed circuit board 10 has a flat board surface and is preferably black or black ν.
The surface should be colored with a thickness of 0.5 m.
Chip parts 13, 14, and 15 of about m size are temporarily attached. When such a printed circuit board IO is irradiated with laser slit light, the light is irradiated onto the shaded area as shown in FIG. 4(a). The window W of the camera is defined by its irradiation width (
Set the slit width/cosα (where α is the projection angle) to be slightly narrower, capture the image, and store it in the storage device (buffer).
B2 (Fig. 4(b)).

次いで、X−Yステージによってプリント基板をウィン
ドウ幅だけ走査して、同様の撮像(第5図(a))及び
バッファB2への入力(第5図(b))を行う。このよ
うな工程の繰返しにより、バッファB2にはレーザスリ
ット光が照射されたチップ13、I4.15の部分画像
が順次貯積され、ついには第6図に示すような全体像1
3′、14′及び15′が形成される。これを出力し、
チップ画像を得る。レーザスリット光の投射角、スリッ
ト幅及びウィンドウ幅はチップ部品の高さによって適宜
選択する。
Next, the printed circuit board is scanned by the window width using the XY stage, and similar imaging (FIG. 5(a)) and input to the buffer B2 (FIG. 5(b)) are performed. By repeating these steps, partial images of the chip 13 and I4.15 irradiated with the laser slit light are sequentially stored in the buffer B2, and finally the entire image 1 as shown in FIG.
3', 14' and 15' are formed. Output this,
Get the chip image. The projection angle of the laser slit light, the slit width, and the window width are appropriately selected depending on the height of the chip component.

実施例2 本例は、高さの異なる部品16及び17を塔載したプリ
ント基板10′を一度に走査、撮像するもので、カメラ
の視野内に2つのウィンドウW1、W2を並設した。こ
れにより高さの異なる2つの部品16及び17の一方(
低い方)16をウィンドウWlで捕え、他方(高い方)
17をウィンドウW2で捕え、切り出した画像をそれぞ
れ異なるバッファB2及びB3に出力して貯え、それぞ
れのバッファ2.3に像16′及び17゛を形成し、出
力時に合成し、全体の画像を得る。
Example 2 In this example, a printed circuit board 10' on which components 16 and 17 of different heights are mounted is simultaneously scanned and imaged, and two windows W1 and W2 are arranged side by side within the field of view of the camera. This allows one of the two parts 16 and 17 with different heights (
The lower one) 16 is captured in window Wl, the other (higher one)
17 is captured in window W2, the cut-out images are output and stored in different buffers B2 and B3, and images 16' and 17' are formed in the respective buffers 2.3, which are combined at the time of output to obtain the entire image. .

実施例3 本例においては、カメラ11′の視野の向きがスリット
光に対し略直角になるようにカメラ11を設置したもの
である(第8図)。カメラ11を規準面2に対し垂直上
方(破線の位置)に設置した場合には1部品18の後端
18aにおけるスリット光の反射光が、規準面2で反射
し、カメラのウィンドウに捕えられるということがあっ
た。この場合、部品18の後方は、明確な画像が得られ
にくい。本実施例はこのようなノイズとなる反射光の影
響を排除するもので、第8図から明らかなように、規準
面2でのレーザスリット光の反射光はカメラ11のウィ
ンドウWの向きとほぼ直交しているのでほとんどウィン
ドウWには入光されない。
Embodiment 3 In this embodiment, the camera 11 is installed so that the field of view of the camera 11' is substantially perpendicular to the slit light (FIG. 8). When the camera 11 is installed perpendicularly above the reference plane 2 (the position indicated by the broken line), the reflected light of the slit light at the rear end 18a of one component 18 is reflected by the reference plane 2 and captured by the window of the camera. Something happened. In this case, it is difficult to obtain a clear image behind the component 18. This embodiment eliminates the influence of reflected light that causes noise, and as is clear from FIG. Since they are perpendicular to each other, almost no light enters the window W.

また、部品表面18bで反射する反射光はほぼ正反射に
近い光としてウィンドウWに捕えられるため照度が高く
なり、従ってコントラストの良い画像が得られる。
Further, since the reflected light reflected by the component surface 18b is captured by the window W as almost regular reflection light, the illuminance becomes high, and therefore an image with good contrast can be obtained.

[発明の効果コ 以上の実施例からも明らかなように1本発明に係る高さ
をもつ物体の撮像方法においては、ある高さの物体に対
しななめにスリット光を照射し、ある高さの物体にのみ
スリット光が照射している部分を光電変換装置で切り出
していくので、プリント基板上のチップ部品など微細な
物体をプリント基板と区別して簡単且つ正確に認定する
ことができる。またスリット光の角度、スリット幅、カ
メラのウィンドウの幅及び数を適宜選択することにより
1種々の高さ及びサイズの物体に対応できる。
[Effects of the Invention] As is clear from the above embodiments, in the method of imaging an object with a certain height according to the present invention, a slit light is irradiated diagonally to an object of a certain height, Since only the part of the object that is irradiated with the slit light is cut out using a photoelectric conversion device, minute objects such as chip components on a printed circuit board can be easily and accurately identified by distinguishing them from the printed circuit board. Furthermore, objects of various heights and sizes can be handled by appropriately selecting the angle of the slit light, the slit width, and the width and number of camera windows.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の概要を示す図、第2図は第1図のスリ
ット光の光度を示す図、第3図は本発明方法の第1実施
例の概略を示す図、第4図及び第5図はそれぞれ上記第
1実施例の工程を示す図、第6図は上記第1実施例で得
た画像を示す図、第7図は第4図及び第5図の他の実施
例である第2実施例の工程を示す図、第8図は第7図の
第3実施例の概略を示す図、第9図及び第10図はそれ
ぞれ従来のチップ部品検査法を示す図である。 1 ・・・・・・・・・・・・・・スリット光2・・・
・・・・・・・・・・・規準面3、11.11’ ・・
・・・マトリクスカメラ3、W、 W、 、V、 ・−
ウィンドウB1、B2・・・・・・・・・・記憶装@(
バッファ)10.10′ ・・・・・・・・・プリント
基板13.14.15.16.17.18・・・・・チ
ップ部品(物体)代理人 弁理士  守 谷 −雄 第1図 第2図 第3図 第4図 (a)                (b)第5図 (a)         (b) 第6図 第9図
FIG. 1 is a diagram showing an overview of the present invention, FIG. 2 is a diagram showing the luminous intensity of the slit light in FIG. 1, FIG. 3 is a diagram showing an outline of the first embodiment of the method of the present invention, and FIG. FIG. 5 is a diagram showing the steps of the first embodiment, FIG. 6 is a diagram showing an image obtained in the first embodiment, and FIG. 7 is a diagram showing the steps of the first embodiment. FIG. 8 is a diagram showing the outline of the third embodiment of FIG. 7, and FIGS. 9 and 10 are diagrams showing the conventional chip component inspection method. 1 ・・・・・・・・・・・・・・・Slit light 2...
........Reference plane 3, 11.11'...
...Matrix camera 3, W, W, ,V, ・-
Window B1, B2......Memory @(
Buffer) 10.10' ...... Printed circuit board 13.14.15.16.17.18 ... Chip parts (object) agent Patent attorney Moritani - Figure 1 Figure 2 Figure 3 Figure 4 (a) (b) Figure 5 (a) (b) Figure 6 Figure 9

Claims (1)

【特許請求の範囲】[Claims] 規準面は照射せずにこの基準面から所定の高さを持つ物
体のみに斜めからスリット光を照射し、前記照射による
反射光を前記物体上方に設置した光電変換装置で撮像し
記憶装置に記憶し、前記スリット光及び前記光電変換装
置に対し前記物体を相対的に一方向に移動させながら前
記撮像し、前記記憶装置内に一連の映像を貯え、これを
出力することにより前記物体の全体の画像を得ることを
特徴とする所定の高さの物体の撮像方法。
A slit light is irradiated obliquely only onto an object at a predetermined height from this reference surface without irradiating the reference surface, and the reflected light from the irradiation is imaged by a photoelectric conversion device installed above the object and stored in a storage device. The object is imaged while moving in one direction relative to the slit light and the photoelectric conversion device, a series of images are stored in the storage device, and this is output, thereby capturing the entire image of the object. A method for imaging an object at a predetermined height, characterized by obtaining an image.
JP18604586A 1986-08-06 1986-08-06 Image pickup method for object having prescribed height Pending JPS6340970A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18604586A JPS6340970A (en) 1986-08-06 1986-08-06 Image pickup method for object having prescribed height

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18604586A JPS6340970A (en) 1986-08-06 1986-08-06 Image pickup method for object having prescribed height

Publications (1)

Publication Number Publication Date
JPS6340970A true JPS6340970A (en) 1988-02-22

Family

ID=16181434

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18604586A Pending JPS6340970A (en) 1986-08-06 1986-08-06 Image pickup method for object having prescribed height

Country Status (1)

Country Link
JP (1) JPS6340970A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02105263A (en) * 1988-10-13 1990-04-17 Nec Corp Irregular character recording method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60235281A (en) * 1984-05-08 1985-11-21 Fujitsu Ltd Pattern checking device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60235281A (en) * 1984-05-08 1985-11-21 Fujitsu Ltd Pattern checking device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02105263A (en) * 1988-10-13 1990-04-17 Nec Corp Irregular character recording method

Similar Documents

Publication Publication Date Title
US6091488A (en) Method of and apparatus for automatic high-speed optical inspection of semi-conductor structures and the like through fluorescent photoresist inspection
EP0501683B1 (en) Technique for enhanced two-dimensional imaging
JP3020280B2 (en) Method and system for three-dimensional imaging based on triangulation
US4965665A (en) 3D imaging of a substrate using perpendicular scanning directions
CA1252216A (en) Apparatus for automatically inspecting objects and identifying or recognizing known and unknown portions thereof, including defects and the like and method
US6487307B1 (en) System and method of optically inspecting structures on an object
JP2001194323A (en) Method and device for inspecting pattern defect
JP4939843B2 (en) Defect inspection method and apparatus
JP2953736B2 (en) Solder shape inspection method
JPH04105341A (en) Method and equipment for detecting bending and floating of lead of semiconductor device
JPH06109647A (en) Device for inspecting defect
JP4375596B2 (en) Surface inspection apparatus and method
JPH08247736A (en) Mounted substrate inspecting device
JP2001155160A (en) Device for inspecting external appearance of electronic component
JPS6340970A (en) Image pickup method for object having prescribed height
JP2577805B2 (en) Inspection method and apparatus for soldered part and method for inspecting electronic component mounting state
JP3366211B2 (en) Mirror object imaging method
JP2728368B2 (en) Exposure method
JPH0711410B2 (en) Parts inspection device
JPH06102024A (en) Method and equipment for inspecting wire
JPH11296657A (en) Image pickup optical system for image processor
JPH0771930A (en) Slit light projector
JP3721847B2 (en) How to detect solder balls
JPH09281053A (en) Pattern inspection apparatus
JPH05157702A (en) Method and device for inspecting soldering lead