JPS63319287A - Single crystal pulling up device - Google Patents

Single crystal pulling up device

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Publication number
JPS63319287A
JPS63319287A JP15633887A JP15633887A JPS63319287A JP S63319287 A JPS63319287 A JP S63319287A JP 15633887 A JP15633887 A JP 15633887A JP 15633887 A JP15633887 A JP 15633887A JP S63319287 A JPS63319287 A JP S63319287A
Authority
JP
Japan
Prior art keywords
pulling
single crystal
raw material
furnace
crucible
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15633887A
Other languages
Japanese (ja)
Other versions
JP2519459B2 (en
Inventor
Kazuya Suzuki
一也 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Coorstek KK
Original Assignee
Toshiba Ceramics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Ceramics Co Ltd filed Critical Toshiba Ceramics Co Ltd
Priority to JP62156338A priority Critical patent/JP2519459B2/en
Publication of JPS63319287A publication Critical patent/JPS63319287A/en
Application granted granted Critical
Publication of JP2519459B2 publication Critical patent/JP2519459B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE:To continuously produce a single crystal and to improve the production efficiency of the title single crystal pulling up device by rotating plural pulling up chambers, and successively pulling up a single crystal from a crucible device through the pulling up hole of the pulling up furnace. CONSTITUTION:The inside of the pulling up furnace 20 is evacuated 26, an inert gas is supplied, and then a raw material 61 is supplied 64 in the outer vessel 42 of the quartz crucible 42. One of the pulling up chambers 70 is simultaneously rotated to a pulling up station ST1, and a pulling up wire 74 is lowered toward the crucible device 40 kept at an adjusted vacuum. A seed crystal held 73 by the wire 74 is dipped in the raw material melt 61 in the inner vessel 42A of the crucible 42, and then slowly wound up in the direction B to pull up and grow a single crystal 90. The single crystal 90 is then pulled up to a specified length, and placed in a main chamber body 71. The chamber 70 is then separated from the furnace 20 and rotated from the station ST1 to a pulling up station ST2, another chamber 70 placed at the station ST2 is rotated to the station ST1, a single crystal 90 is pulled up by the same operation as above, and the above-mentioned operation is repeated.

Description

【発明の詳細な説明】 (1)発明の目的 [産業上の利用分野] 本発明は、単結晶引上装置に関し、特に複数の引上チャ
ンバを包有してなる単結晶引上装置に関するものである
Detailed Description of the Invention (1) Purpose of the Invention [Field of Industrial Application] The present invention relates to a single crystal pulling apparatus, and particularly to a single crystal pulling apparatus including a plurality of pulling chambers. It is.

[従来の技術] 従来この種の単結晶引上装置としては、第2図に示すよ
うに、引上炉翻の引上孔23に対し引上チャンバ沖の開
ロア1aを連通せしめた引上ステーションST、て引上
チャンバUより引上ワイヤ74を降下せしめ、その先端
の種結晶ホルダー73に保持された種結晶なルツボ装置
並の溶融原料61に対して浸漬せしめ、次いて緩徐に巻
上部材72により引上ワイヤ74を巻き上げることによ
って引き」二げ成長せしめた単結晶凹を引上チャンバ社
のチャンバ本体71に収容した状態て不活性ガスにより
冷却せしめ、そののちゲートバルブ25を閉鎖して引上
炉興を気密状態に保持しつつ回動装置靭によって引上チ
ャンバ刊を引上1興の蓋体24から引き離し取出ステー
ション5T2(二点斜線て示しである)へ回動して単結
晶凹を取り出すものが提案されていた。
[Prior Art] Conventionally, as shown in FIG. 2, this type of single crystal pulling apparatus includes a pulling station in which an open lower 1a located off a pulling chamber is connected to a pulling hole 23 of a pulling furnace. ST, the pulling wire 74 is lowered from the pulling chamber U, immersed in a molten raw material 61 similar to a seed crystal crucible device held in a seed crystal holder 73 at its tip, and then slowly pulled up into the hoisting member. The single-crystal concavity that has been grown by winding up the pulling wire 74 using the pulling wire 72 is housed in the chamber body 71 of the Pulling Chamber Co., Ltd., and is cooled with an inert gas.Then, the gate valve 25 is closed. While keeping the pulling furnace in an airtight state, the pulling chamber is separated from the lid 24 of the pulling furnace by the rotating device and rotated to the take-out station 5T2 (indicated by two diagonal lines) to remove the single crystal. A method was proposed that would take out the dent.

[解決すべき問題点] しかしながら従来の単結晶引上装置では、引上チャンバ
神が一個包有されているのみてあったので、単結晶並の
引上完了ののち引上チャンバ神内で十分に冷却されるま
て引上炉興を使用することができない欠点があり、ひい
てはその単結晶凹の生産能率を改善できない欠点があっ
た。
[Problems to be solved] However, in the conventional single crystal pulling apparatus, only one pulling chamber was included, so after pulling the same level as a single crystal, the pulling chamber was sufficiently closed. There is a drawback that it is not possible to use a drawing furnace that is cooled, and furthermore, it is not possible to improve the production efficiency of the single crystal concavity.

そこで本発明は、この欠点を解決すべく、引上チャンバ
を複数包有せしめることにより単結晶の生産を連続化し
その生産能率を向上せしめてなる単結晶引上装置を提供
せんとするものである。
Therefore, in order to solve this drawback, the present invention aims to provide a single crystal pulling apparatus that includes a plurality of pulling chambers to continuously produce single crystals and improve production efficiency. .

(2)発明の構成 [問題点の解決手段] 本発明により提供される問題点の解決手段は、「引上炉
の引上孔に対して連通された引上チャンバから先端部に
種結晶の保持された引上ワイヤを鉾下せしめて、前記引
上炉の内部に配置されたルツボ装置の溶融原料に対し前
記種結晶を浸漬せしめて単結晶を引き上げる単結晶引上
装置において、前記引上チャンバを回動装置に対して複
数個配設しておき、順次回動して前記引上炉の引上孔に
対し連通せしめて前記ルツボ装置の溶融原料から単結晶
を引き上げてなることを特徴とする単結晶引上装置」 である。
(2) Structure of the Invention [Means for Solving the Problems] The means for solving the problems provided by the present invention is as follows. In the single crystal pulling apparatus for pulling up the single crystal by lowering the held pulling wire and immersing the seed crystal in the molten raw material of the crucible apparatus disposed inside the pulling furnace, A plurality of chambers are disposed relative to the rotating device, and the single crystal is pulled from the molten raw material of the crucible device by sequentially rotating the chambers so as to communicate with the pulling hole of the pulling furnace. ``Single crystal pulling device''.

[作用] 本発明にかかる単結晶引上装置は、引上チャンバが複数
個包有されてなるので、引上炉から引き上げられた単結
晶を引上チャンバ内て冷却しつつ、並行して他の引上チ
ャンバにより引上炉から他の単結晶を引き上げる作用を
なしており、ひいては単結晶の生産能率を向上せしめる
作用をなす。
[Function] Since the single crystal pulling apparatus according to the present invention includes a plurality of pulling chambers, the single crystal pulled from the pulling furnace is cooled in the pulling chamber, and is simultaneously The pulling chamber serves to pull up other single crystals from the pulling furnace, which in turn serves to improve the production efficiency of single crystals.

[実施例] 次に本発明について、添付図面を参照しつつ具体的に説
明する。
[Example] Next, the present invention will be specifically described with reference to the accompanying drawings.

第1図は、本発明にかかる単結晶引上装置の一実施例を
示す断面図である。
FIG. 1 is a sectional view showing an embodiment of a single crystal pulling apparatus according to the present invention.

まず本発明にかかる単結晶引上装置の一実施例について
、その構成を詳細に説明する。
First, the configuration of an embodiment of the single crystal pulling apparatus according to the present invention will be described in detail.

10は本発明の単結晶引上装置で、引上1興と、引上1
神の内部に配設された加熱用ヒータ川と、加熱用ヒータ
廷の内部に配設されたルツボ装置赳と、引上1翻の下方
に配設されかっルツボ装置凹を回転昇降せしめるルツボ
回転昇降装置利と、引上1跋の外側に配設されておりル
ツボ装置並に対して原料(たとえばシリコン材料)61
を供給する原料供給装置並と、引上1神の上方位置に相
当する引上ステーションST、と引上ステーションST
10 is a single crystal pulling apparatus of the present invention;
A heating heater arranged inside the heater, a crucible device arranged inside the heating heater plate, and a crucible rotating which rotates and lowers the crucible device recess arranged below the lifting unit. It is arranged on the outside of the lifting device and the lifting device, and the raw material (for example, silicon material) 61 is placed in the crucible device.
A raw material supply device that supplies
.

とは異なる取出ステーションST2との間を回動せしめ
られる複数(以下、2つの場合につき主として説明する
)の引上チャンバUと、複数の引上チャン)<”HJを
保持しており引上ステーションST。
A pulling station ST2 holding a plurality of lifting chambers U (hereinafter, two cases will be mainly explained) and a plurality of lifting chambers U and a pulling station ST2 different from the pulling station ST2 ST.

と取出ステーションST2との間を回動せしめる回動装
置並とを包有している。
and a rotation device for rotating between the extraction station ST2 and the take-out station ST2.

引上1翻は、基台すなわちルツボ回転昇降装置刹の収容
されたハウジング52の上底板21に載置された炉本体
22と、炉本体22の上部に対して配置されておりかつ
引上ステーションST、に配置された引上チャンバ洩に
対して連通可能な引上孔23を有する蓋体24とを有し
ている。引上孔23には、ゲートパルプ25が配置され
ており、閉鎖することによって引上炉」内を気密状態と
することができる。また基台21には、引上炉並内を排
気するために、排気手段としての真空ポンプ(図示せず
)に対し連通された排気管26が開口されている。加え
て、蓋体24には、単結晶凹の引上中ならびにゲートバ
ルブ25の閉鎖中に引上炉社内に不活性ガス(たとえば
アルゴンガス)を矢印り方向に供給するためのガス供給
管27が配設されている。
The lifting station is placed against the furnace body 22 placed on the upper bottom plate 21 of the housing 52 that houses the base, that is, the crucible rotation lifting device, and the upper part of the furnace body 22. ST, and a lid body 24 having a pulling hole 23 that can communicate with a pulling chamber leak located at ST. A gate pulp 25 is disposed in the pulling hole 23, and by closing it, the inside of the pulling furnace can be made airtight. In addition, an exhaust pipe 26 is opened in the base 21 and communicated with a vacuum pump (not shown) as an exhaust means for evacuating the inside of the pulling furnace. In addition, the lid body 24 is provided with a gas supply pipe 27 for supplying inert gas (for example, argon gas) into the pulling furnace in the direction indicated by the arrow while the single crystal recess is being pulled and the gate valve 25 is closed. is installed.

加熱用ヒータ邦は、基台21上に載置された筒状の保持
部材31と、保持部材31の内側に保持されかつ適宜の
電源(図示せず)に対して接続された円筒状のヒータ部
材32とを包有している。
The heater unit includes a cylindrical holding member 31 placed on the base 21 and a cylindrical heater held inside the holding member 31 and connected to an appropriate power source (not shown). member 32.

ルツボ装置並は、ルツボ回転昇降装置廷の回転シャフト
51の一端部に対して載置された炭素ルツボ41と、炭
素ルツボ41内に配設されかつ原料61を収容する石英
ルツボ42とを包有している。石英ルツボ42は、底部
に連通孔42bを有した隔壁42aによって内槽42A
と外槽42Bとに分割されている。
The crucible device includes a carbon crucible 41 placed on one end of a rotating shaft 51 of a crucible rotating and lifting device, and a quartz crucible 42 disposed within the carbon crucible 41 and containing a raw material 61. are doing. The quartz crucible 42 is connected to an inner tank 42A by a partition wall 42a having a communication hole 42b at the bottom.
and an outer tank 42B.

原料供給装置観は、原料(たとえばシリコン材料)61
を収容するための原料収容槽62と、原料収容槽62の
下部に配置されておりその下部開口62aを開閉しかつ
原料収容槽62に対する原料61の補給に際して引上1
翻を気密状態に維持するためのゲート部材63と、原料
収容槽62から落下された原料(たとえばシリコン材料
)61を蓋体24を貫通して石英ルツボ42の外槽42
Aに対して供給するための樋部材64とを包有している
。原料収容槽62は、ゲート部材63が開放されたとき
気密状態とされ、引上1翻の真空度を維持するよう配慮
されている。
The view of the raw material supply device is that the raw material (for example, silicon material) 61
A raw material storage tank 62 for accommodating the raw material 61, and a lower opening 62a of the raw material storage tank 62, which is disposed at the lower part of the raw material storage tank 62, and a lower opening 62a of the raw material storage tank 62 for storing the raw material 61, and a pulling 1
A gate member 63 for maintaining the container in an airtight state, and a gate member 63 for passing the raw material (for example, silicon material) 61 dropped from the raw material storage tank 62 through the lid 24 to the outer tank 42 of the quartz crucible 42.
It includes a gutter member 64 for supplying water to A. The raw material storage tank 62 is brought into an airtight state when the gate member 63 is opened, and is designed to maintain the degree of vacuum during pulling.

引上チャンバWは、引上ステーションST、において引
上1翻の蓋体24に形成された引上孔23に対して連通
される開ロア1aを有するチャンバ本体71と、チャン
バ本体71の上端部に配置された巻上部材72と、巻上
部材72から垂下されかつ自由端部に種結晶ホルダー7
3か配設された引上ワイヤ74とを包有している。チャ
ンバ本体71の上端部近傍には、単結晶廷を冷却しかつ
酸化防止するために、不活性ガス(たとえばアルゴンガ
ス)を供給するだめのガス供給手段(図示せず)が配設
されている。チャンバ本体71の開ロア1aには、ゲー
トバルブ75が配設されており、閉鎖することによって
引、上チャンへU内を気密状態とすることができる。
The lifting chamber W includes a chamber body 71 having an open lower part 1a that communicates with a lifting hole 23 formed in a lid 24 of a lifting station ST, and an upper end portion of the chamber body 71. a winding member 72 disposed on the winding member 72;
It includes three pulling wires 74 arranged therein. A gas supply means (not shown) for supplying an inert gas (for example, argon gas) is disposed near the upper end of the chamber body 71 in order to cool the single crystal matrix and prevent oxidation. . A gate valve 75 is disposed in the open lower portion 1a of the chamber body 71, and when it is closed, it can be pulled out and the inside of the U to the upper chamber can be made airtight.

またチャンバ本体71の下端部近傍には、少なくともゲ
ートバルブ75の閉鎖中などに内部を排気するために、
排気手段としての真空ポンプ(図示せず)に対し連通さ
れた排気管76が開口されている。
Further, near the lower end of the chamber body 71, there is provided a valve for evacuating the inside at least while the gate valve 75 is closed.
An exhaust pipe 76 is opened and communicated with a vacuum pump (not shown) as an exhaust means.

回動装置肚は、2つの引上チャンハフ0,70をそれぞ
れ支持するための2組の支持アーム81A。
The rotating device has two sets of support arms 81A for supporting the two lifting shafts 0 and 70, respectively.

81Bおよび82A、82Bと、支持アーム81A、8
1Bおよび82A、82Bを保持しかつ回動するための
回動シャフト83と、回動シャフト83の下端部に配設
されかつハウジング52内に収容されており回動シャフ
ト83を昇降しかつ回動するための駆動装置84とを包
有している。
81B and 82A, 82B and support arms 81A, 8
1B, 82A, and 82B, and a rotating shaft 83 for holding and rotating the rotating shaft 83; The drive device 84 includes a drive device 84 for

更に本発明にかかる単結晶引上装置の一実施例について
、その作用を詳細に説明する。
Furthermore, the operation of an embodiment of the single crystal pulling apparatus according to the present invention will be explained in detail.

引上1践の蓋体24を炉本体22に対して載置したのち
、適宜の排気手段たとえば真空ポンプにより引上1並の
内部を排気管26を介して矢印A方向に排気し、ガス供
給管27を介して適宜の不活性ガスを供給する。また原
料供給装置並のゲート部材63を開放し、樋部材64を
介して原料61を石英ルツボ42の外槽42Bに対して
供給する。これに並行して回動装置観によって引上チャ
ンバUの一方を引上ステーションST、まて回動じ、引
上1廷の蓋体24の引上孔23に対して開ロア1aを連
通可能な状態とし、併せて排気管76を介して適宜の排
気手段たとえば真空ポンプにより引上チャンバ艮の内部
を矢印M方向に排気し、ガス供給手段によって適宜の不
活性ガスを供給する。引上炉践および引上チャンバUの
内部の真空度か適宜の値に達したとき、ゲートハルツ2
5(ゲートハルツ75が開放されていないときにはゲー
トバルブ25.75)を開放して引上ワイヤ74をルツ
ボ装置並に向けて降下せしめる。このときまてにルツボ
装置便に供給された原料61は、加熱用ヒータ30によ
って溶融されている。引上ワイヤ74の種結晶ホルダー
73に保持された種結晶が、ルツボ装置便すなわち石英
ルツボ42の内槽42Aの溶融原料61に到達し一旦浸
漬されたのち、緩徐に矢印B方向に向けて巻上部材72
によって巻き上げ始められる。これによって単結晶共が
、引き上げ成長せしめられる。
After placing the lid 24 of the lifting unit on the furnace body 22, the inside of the lifting unit is evacuated in the direction of arrow A through the exhaust pipe 26 using an appropriate evacuation means such as a vacuum pump to supply gas. A suitable inert gas is supplied via pipe 27. Furthermore, the gate member 63, which is equivalent to a raw material supply device, is opened, and the raw material 61 is supplied to the outer tank 42B of the quartz crucible 42 via the gutter member 64. In parallel with this, one side of the lifting chamber U is rotated to the lifting station ST using the rotating device, and the opening lower 1a can be communicated with the lifting hole 23 of the lid 24 of the first lifting chamber. At the same time, the inside of the pulling chamber is evacuated in the direction of arrow M through the exhaust pipe 76 using an appropriate evacuation means such as a vacuum pump, and an appropriate inert gas is supplied by a gas supply means. When the degree of vacuum inside the pulling furnace and pulling chamber U reaches an appropriate value, the Gate Harz 2
5 (or the gate valve 25.75 when the gate hartz 75 is not opened) and the pulling wire 74 is lowered toward the crucible device. At this time, the raw material 61 previously supplied to the crucible device is melted by the heater 30 . The seed crystal held in the seed crystal holder 73 of the pulling wire 74 reaches the molten raw material 61 of the crucible device, that is, the inner tank 42A of the quartz crucible 42, is immersed therein, and is then slowly rolled in the direction of arrow B. Upper member 72
The winding can be started by . This allows the single crystal to be pulled and grown.

単結晶すの引上中は、単結晶すが酸化されることを防止
するよう冷却し、かつ引上炉翻において発生されるSi
n、 CO2,GOなどのガスを効率よく排除するため
に、引上チャンバ刊において不活性ガス(たとえばアル
ゴンガス)が矢印E方向に向けて流下されている。更に
不活性ガスは、引上1廷に対し引上孔23から矢印F方
向に向けて流入し、かつ引上炉廷内を矢印G方向に移動
せしめられ、最終的に排気管26を介して引上炉翻から
矢印A方向に向けて排除される。これによって単結晶す
の冷却ならびに酸化防止に加え、溶融原料61の酸化防
止が図られ、かつSin、 Co2. GOなどのガス
の排除も効率よく達成されている。
During pulling of the single crystal, the single crystal is cooled to prevent it from being oxidized, and the Si generated in the pulling furnace is cooled.
In order to efficiently eliminate gases such as n, CO2, and GO, an inert gas (for example, argon gas) is flowed down in the direction of arrow E in the pulling chamber. Furthermore, the inert gas flows into the pulling furnace from the pulling hole 23 in the direction of arrow F, is moved inside the pulling furnace in the direction of arrow G, and finally passes through the exhaust pipe 26. It is removed from the pulling furnace in the direction of arrow A. As a result, in addition to cooling and preventing oxidation of the single crystal, oxidation of the molten raw material 61 is prevented, and Sin, Co2. Gases such as GO are also efficiently eliminated.

このとき少なくとも単結晶印の引上中は、単結高利の単
結晶化界面の温度および不純物濃度などを均一化するた
めに、ルツボ回転昇降装置興によってルツボ装置赳が、
矢印C方向に緩徐に回転され、また溶融原料61の液面
を所定の位置に維持するために矢印り方向に昇降されて
いることが、好ましい。
At this time, at least during the pulling of the single crystal mark, in order to equalize the temperature and impurity concentration of the single crystallization interface of the single crystal, the crucible equipment is moved by the crucible rotating and lifting equipment.
Preferably, it is rotated slowly in the direction of arrow C, and raised and lowered in the direction of arrow C in order to maintain the liquid level of the molten raw material 61 at a predetermined position.

単結晶すが所定の長さまで引上げられると、引上ワイヤ
74が、巻上部材72によって矢印B方向に向は急速に
引き上げられる。これにより単結晶共の引上成長が終了
され、それまでに引上成長された単結晶共が、引上チャ
ンバ神のチャンバ本体71内に完全に収容される。その
のちゲートバルブ25およびゲートバルブ75が、とも
に閉鎖される。
When the single crystal is pulled up to a predetermined length, the pulling wire 74 is rapidly pulled up in the direction of arrow B by the hoisting member 72. As a result, the pulling growth of the single crystal is completed, and the single crystals pulled and grown up to that point are completely accommodated in the chamber body 71 of the pulling chamber. After that, both gate valve 25 and gate valve 75 are closed.

ゲートバルブ25.75の閉鎖ののち、回動装置靭の駆
動部材84によって回動シャフト83が矢印H方向に上
昇せしめられ、引上チャンバ刊が引上1翻の蓋体24か
ら離間せしめられる。次いで駆動装置84によって回動
シャフト83が、矢印1方向に回動せしめられ、更に矢
印J方向に降下せしめられる。これによって引上ステー
ションST、にあった引上チャンバ」が取出ステーショ
ンST2まて回動され、かつ取出ステーションST、に
あった引上チャンバ四が引上ステーションST、まで回
動せしめられる。
After the gate valve 25.75 is closed, the rotating shaft 83 is raised in the direction of arrow H by the driving member 84 of the rotating device, and the lifting chamber is separated from the lid 24 of the lifting chamber. Next, the rotating shaft 83 is rotated in the direction of arrow 1 by the drive device 84, and further lowered in the direction of arrow J. As a result, the pulling chamber 4 located at the pulling station ST is rotated to the unloading station ST2, and the pulling chamber 4 located at the unloading station ST is rotated to the pulling station ST.

取出ステーションST2に回動された引上チャンバ刈は
、単結晶共が十分に冷却されるまで静置される。単結晶
共が十分に冷却されたのち、ゲートバルブ75が開放さ
れ、開ロア1aが開放される。巻上部材72によって引
上ワイヤ74か巻き戻され、単結晶すが矢印に方向に移
動される。このため単結晶共が引上チャンバ神のチャン
バ本体71から下方に降下せしめられ、種結晶ホルダー
73から単結晶90を取外可能とされる。
The pulling chamber cutter rotated to the take-out station ST2 is left still until the single crystal is sufficiently cooled. After the single crystals have been sufficiently cooled, the gate valve 75 is opened and the lower opening 1a is opened. The pulling wire 74 is unwound by the winding member 72, and the single crystal body is moved in the direction of the arrow. Therefore, the single crystal is lowered from the chamber body 71 of the pulling chamber, and the single crystal 90 can be removed from the seed crystal holder 73.

単結晶共を取り外したのち、種結晶ホルダー73に対し
て新たな種結晶が取り付けられる。そののち巻上部材7
2によって引上ワイヤ74が、巻き上げられチャンバ本
体71内に収容され、引上ステーションSTsへの回動
のために待機せしめられる。
After removing the single crystal, a new seed crystal is attached to the seed crystal holder 73. Then the hoisting member 7
2, the pulling wire 74 is wound up and accommodated in the chamber body 71, and is kept on standby for rotation to the pulling station STs.

このときゲートバルブ75を閉鎖し、かつ引上チャンバ
70の内部を不活性ガスで置換しておけば、次回の単結
晶引上操作を開始するまでの準備時間を短縮することが
てき、好ましい。
At this time, it is preferable to close the gate valve 75 and replace the inside of the pulling chamber 70 with an inert gas, since this can shorten the preparation time before starting the next single crystal pulling operation.

これに対し、引上ステーションST、に回動された引上
チャンバUは、上述した引上動作を反復する。
On the other hand, the pulling chamber U rotated to the pulling station ST repeats the above-described lifting operation.

上述の動作を反復して、本発明の単結晶引上操作刊は、
単結晶共を連続的に引き上げ成長せしめる。
By repeating the above operations, the single crystal pulling operation of the present invention is performed.
Both single crystals are continuously pulled and grown.

なお上述においては引上1翻の外部に配置された原料供
給装置並からルツボ装置並に対して原料61を連続して
供給しているが、本発明は、これに限定されるものでは
なく、原料供給装置並が除去されており蓋体24を間歇
的に開閉して原料61をルツボ装置並に補給してなる単
結晶引上装置も包摂している。
In the above description, the raw material 61 is continuously supplied from the raw material supply device arranged outside the pulling unit to the crucible device, but the present invention is not limited to this. It also includes a single-crystal pulling device in which the raw material supply device or the like is removed and the lid 24 is opened and closed intermittently to supply the raw material 61 similar to the crucible device.

また引上チャンバ四の開ロア1aに対してゲートバルブ
75が配置されているが、本発明は、これに限定される
ものてはなく、ゲートバルブ75が除去された単結晶引
上装置も包摂している。この場合には、ゲートハルツ2
5の開放に先立って排気管76あるいはゲートハルツ2
5の直上に形成した排気孔を介して引上チャンバW内を
排気し、不活性ガスで充満せしめておけばよい。
Furthermore, although the gate valve 75 is disposed with respect to the open lower portion 1a of the pulling chamber 4, the present invention is not limited to this, and also includes a single crystal pulling apparatus in which the gate valve 75 is removed. are doing. In this case, Gateharz 2
5, before opening the exhaust pipe 76 or Gate Harz 2.
The inside of the pulling chamber W may be evacuated through an exhaust hole formed directly above the chamber 5 and filled with an inert gas.

更に単結高利を降下せしめて引上チャンバ」から取り出
しているが、本発明は、これに限定されるものではなく
、チャンバ本体71の周面に対し開閉扉を形成して単結
晶を取り出す単結晶引上装置も包摂している。
Although the single crystal is further lowered and taken out from the "pulling chamber," the present invention is not limited to this. It also includes crystal pulling equipment.

(3)発明の効果 上述より明らかなように、本発明にかかる単結晶引上装
置は、引上炉の引上孔に対して連通された引上チャンバ
から先端部に種結晶の保持された引上ワイヤを降下せし
めて、前記引上炉の内部に配置されたルツボ装置の溶融
原料に対し前記種結品を浸漬せしめて単結晶を引き上げ
る単結晶引上装置であって、 前記引上チャンバを回動装置に対して複数個配設してお
き、順次回動して前記引上炉の引上孔に対し連通せしめ
て前記ルツボ装置の溶融原料から単結晶を引き上げ てなるので (i)引上炉から引き上げられた単結晶を引上チャンバ
内で冷却しつつ、並行して 他の引上チャンバによって新たな単結 晶を引上炉から引き上げることができ る効果 を有しており、ひいては (ii)単結晶の生産能率を改善できる効果を有してる
(3) Effects of the Invention As is clear from the above, the single crystal pulling device according to the present invention has a seed crystal held at the tip from the pulling chamber that communicates with the pulling hole of the pulling furnace. A single crystal pulling device for pulling a single crystal by lowering a pulling wire and immersing the seed into the molten raw material of a crucible device disposed inside the pulling furnace, the device comprising: (i) A plurality of crystals are disposed on the rotating device, and are sequentially rotated to communicate with the pulling hole of the pulling furnace to pull the single crystal from the molten raw material of the crucible device. This has the effect that while the single crystal pulled from the pulling furnace is cooled in the pulling chamber, a new single crystal can be pulled from the pulling furnace in parallel by another pulling chamber. ii) It has the effect of improving single crystal production efficiency.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明にかかる単結晶引上装置の一実施例を示
す断面図、第2図は従来例を示す断面図である。
FIG. 1 is a sectional view showing an embodiment of a single crystal pulling apparatus according to the present invention, and FIG. 2 is a sectional view showing a conventional example.

Claims (3)

【特許請求の範囲】[Claims] (1)引上炉の引上孔に対して連通された引上チャンバ
から先端部に種結晶の保持された引上ワイヤを降下せし
めて、前記引上炉の内部に配置されたルツボ装置の溶融
原料に対し前記種結晶を浸漬せしめて単結晶を引き上げ
る単結晶引上装置において、前記引上チャンバを回動装
置に対して複数個配設しておき、順次回動して前記引上
炉の引上孔に対し連通せしめて前記ルツボ装置の溶融原
料から単結晶を引き上げてなることを特徴とする単結晶
引上装置。
(1) A pulling wire with a seed crystal held at its tip is lowered from a pulling chamber that communicates with a pulling hole of a pulling furnace, and a crucible device disposed inside the pulling furnace is opened. In a single crystal pulling apparatus for pulling a single crystal by immersing the seed crystal in the molten raw material, a plurality of the pulling chambers are disposed relative to the rotating device, and the pulling chambers are sequentially rotated to lift the single crystal. A single crystal pulling device, characterized in that the single crystal is pulled from the molten raw material of the crucible device by communicating with the pulling hole of the crucible device.
(2)引上チャンバの開口に対してゲートバルブが配設
されてなることを特徴とする特許請求の範囲第(1)項
記載の単結晶引上装置。
(2) The single crystal pulling apparatus according to claim (1), further comprising a gate valve disposed at the opening of the pulling chamber.
(3)引上炉のルツボ装置に対して原料が引上炉外の原
料供給装置から連続して供給されてなることを特徴とす
る特許請求の範囲第(1)項もしくは第(2)項記載の
単結晶引上装置。
(3) Claims (1) or (2) characterized in that the raw material is continuously supplied to the crucible device of the pulling furnace from a raw material supply device outside the pulling furnace. The single crystal pulling device described above.
JP62156338A 1987-06-23 1987-06-23 Single crystal pulling device Expired - Fee Related JP2519459B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62156338A JP2519459B2 (en) 1987-06-23 1987-06-23 Single crystal pulling device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62156338A JP2519459B2 (en) 1987-06-23 1987-06-23 Single crystal pulling device

Publications (2)

Publication Number Publication Date
JPS63319287A true JPS63319287A (en) 1988-12-27
JP2519459B2 JP2519459B2 (en) 1996-07-31

Family

ID=15625587

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62156338A Expired - Fee Related JP2519459B2 (en) 1987-06-23 1987-06-23 Single crystal pulling device

Country Status (1)

Country Link
JP (1) JP2519459B2 (en)

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JPH0431400A (en) * 1990-05-28 1992-02-03 Shin Etsu Handotai Co Ltd Device for transporting single crystal rod
WO2009141963A1 (en) * 2008-05-20 2009-11-26 信越半導体株式会社 Single crystal manufacturing apparatus
JP2012001435A (en) * 2011-10-05 2012-01-05 Solaicx Inc System for continuous growth of single crystal silicon
CN102770952A (en) * 2009-12-14 2012-11-07 株式会社Kcc Apparatus and method for extracting a silicon ingot
US11426775B2 (en) * 2017-12-20 2022-08-30 Sumco Corporation Cleaning method, method for producing silicon single crystal, and cleaning device

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Publication number Priority date Publication date Assignee Title
CN102443845B (en) * 2011-12-31 2015-06-24 北京中晶华业科技有限公司 Equipment for continuously producing single crystal

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0431400A (en) * 1990-05-28 1992-02-03 Shin Etsu Handotai Co Ltd Device for transporting single crystal rod
WO2009141963A1 (en) * 2008-05-20 2009-11-26 信越半導体株式会社 Single crystal manufacturing apparatus
JP5152328B2 (en) * 2008-05-20 2013-02-27 信越半導体株式会社 Single crystal manufacturing equipment
US8821636B2 (en) 2008-05-20 2014-09-02 Shin-Etsu Handotai Co., Ltd. Single-crystal manufacturing apparatus
CN102770952A (en) * 2009-12-14 2012-11-07 株式会社Kcc Apparatus and method for extracting a silicon ingot
JP2013512180A (en) * 2009-12-14 2013-04-11 ケーシーシー コーポレーション Silicon ingot drawing apparatus and method
US9017478B2 (en) 2009-12-14 2015-04-28 Kcc Corporation Apparatus and method for extracting a silicon ingot made by an electromagnetic continuous casting method
CN102770952B (en) * 2009-12-14 2016-06-22 株式会社Kcc The extraction element of silicon ingot and method
JP2012001435A (en) * 2011-10-05 2012-01-05 Solaicx Inc System for continuous growth of single crystal silicon
US11426775B2 (en) * 2017-12-20 2022-08-30 Sumco Corporation Cleaning method, method for producing silicon single crystal, and cleaning device

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