JPS63313790A - Method for separating and purifying trialkoxysilane - Google Patents
Method for separating and purifying trialkoxysilaneInfo
- Publication number
- JPS63313790A JPS63313790A JP62147886A JP14788687A JPS63313790A JP S63313790 A JPS63313790 A JP S63313790A JP 62147886 A JP62147886 A JP 62147886A JP 14788687 A JP14788687 A JP 14788687A JP S63313790 A JPS63313790 A JP S63313790A
- Authority
- JP
- Japan
- Prior art keywords
- trialkoxysilane
- reaction mixture
- alcohol
- weight
- reaction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 20
- 239000011541 reaction mixture Substances 0.000 claims abstract description 39
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 31
- 150000004820 halides Chemical class 0.000 claims abstract description 13
- -1 alkenyl halide Chemical class 0.000 claims abstract description 11
- 150000001350 alkyl halides Chemical class 0.000 claims abstract description 5
- 150000001502 aryl halides Chemical class 0.000 claims abstract description 3
- 239000000203 mixture Substances 0.000 claims description 11
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 238000000746 purification Methods 0.000 claims description 3
- 238000000926 separation method Methods 0.000 claims description 3
- 238000011084 recovery Methods 0.000 abstract description 2
- 235000019441 ethanol Nutrition 0.000 description 27
- 238000006243 chemical reaction Methods 0.000 description 22
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 20
- 229910052710 silicon Inorganic materials 0.000 description 18
- 239000010703 silicon Substances 0.000 description 17
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 13
- 229910052802 copper Inorganic materials 0.000 description 12
- 239000010949 copper Substances 0.000 description 12
- 239000002184 metal Substances 0.000 description 12
- 229910052751 metal Inorganic materials 0.000 description 12
- 239000003054 catalyst Substances 0.000 description 11
- 238000004821 distillation Methods 0.000 description 10
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 description 8
- 238000009835 boiling Methods 0.000 description 7
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 7
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 229930195733 hydrocarbon Natural products 0.000 description 6
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 4
- 229910001873 dinitrogen Inorganic materials 0.000 description 4
- 238000004817 gas chromatography Methods 0.000 description 4
- 150000004678 hydrides Chemical class 0.000 description 4
- 239000007791 liquid phase Substances 0.000 description 4
- 229940050176 methyl chloride Drugs 0.000 description 4
- 230000000087 stabilizing effect Effects 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 239000007810 chemical reaction solvent Substances 0.000 description 3
- HRYZWHHZPQKTII-UHFFFAOYSA-N chloroethane Chemical compound CCCl HRYZWHHZPQKTII-UHFFFAOYSA-N 0.000 description 3
- 229960003750 ethyl chloride Drugs 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 150000002430 hydrocarbons Chemical class 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000012071 phase Substances 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 239000003381 stabilizer Substances 0.000 description 3
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- FYGHSUNMUKGBRK-UHFFFAOYSA-N 1,2,3-trimethylbenzene Chemical compound CC1=CC=CC(C)=C1C FYGHSUNMUKGBRK-UHFFFAOYSA-N 0.000 description 2
- KVNYFPKFSJIPBJ-UHFFFAOYSA-N 1,2-diethylbenzene Chemical compound CCC1=CC=CC=C1CC KVNYFPKFSJIPBJ-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- 239000005749 Copper compound Substances 0.000 description 2
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 2
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- 125000005233 alkylalcohol group Chemical group 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 150000001413 amino acids Chemical class 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- GZUXJHMPEANEGY-UHFFFAOYSA-N bromomethane Chemical compound BrC GZUXJHMPEANEGY-UHFFFAOYSA-N 0.000 description 2
- OCKPCBLVNKHBMX-UHFFFAOYSA-N butylbenzene Chemical compound CCCCC1=CC=CC=C1 OCKPCBLVNKHBMX-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- NEHMKBQYUWJMIP-NJFSPNSNSA-N chloro(114C)methane Chemical compound [14CH3]Cl NEHMKBQYUWJMIP-NJFSPNSNSA-N 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 150000001880 copper compounds Chemical class 0.000 description 2
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 2
- QTMDXZNDVAMKGV-UHFFFAOYSA-L copper(ii) bromide Chemical compound [Cu+2].[Br-].[Br-] QTMDXZNDVAMKGV-UHFFFAOYSA-L 0.000 description 2
- 229940045803 cuprous chloride Drugs 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002118 epoxides Chemical class 0.000 description 2
- DCAYPVUWAIABOU-UHFFFAOYSA-N hexadecane Chemical compound CCCCCCCCCCCCCCCC DCAYPVUWAIABOU-UHFFFAOYSA-N 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- RZJRJXONCZWCBN-UHFFFAOYSA-N octadecane Chemical compound CCCCCCCCCCCCCCCCCC RZJRJXONCZWCBN-UHFFFAOYSA-N 0.000 description 2
- 150000002903 organophosphorus compounds Chemical class 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 238000011403 purification operation Methods 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- WJECKFZULSWXPN-UHFFFAOYSA-N 1,2-didodecylbenzene Chemical compound CCCCCCCCCCCCC1=CC=CC=C1CCCCCCCCCCCC WJECKFZULSWXPN-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- CYNYIHKIEHGYOZ-UHFFFAOYSA-N 1-bromopropane Chemical compound CCCBr CYNYIHKIEHGYOZ-UHFFFAOYSA-N 0.000 description 1
- ZRNSSRODJSSVEJ-UHFFFAOYSA-N 2-methylpentacosane Chemical compound CCCCCCCCCCCCCCCCCCCCCCCC(C)C ZRNSSRODJSSVEJ-UHFFFAOYSA-N 0.000 description 1
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 229910021589 Copper(I) bromide Inorganic materials 0.000 description 1
- 229910021595 Copper(I) iodide Inorganic materials 0.000 description 1
- 229910021590 Copper(II) bromide Inorganic materials 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 1
- PWATWSYOIIXYMA-UHFFFAOYSA-N Pentylbenzene Chemical compound CCCCCC1=CC=CC=C1 PWATWSYOIIXYMA-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- WETWJCDKMRHUPV-UHFFFAOYSA-N acetyl chloride Chemical compound CC(Cl)=O WETWJCDKMRHUPV-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- RDHPKYGYEGBMSE-UHFFFAOYSA-N bromoethane Chemical compound CCBr RDHPKYGYEGBMSE-UHFFFAOYSA-N 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- RFKZUAOAYVHBOY-UHFFFAOYSA-M copper(1+);acetate Chemical compound [Cu+].CC([O-])=O RFKZUAOAYVHBOY-UHFFFAOYSA-M 0.000 description 1
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(I) oxide Inorganic materials [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 description 1
- NKNDPYCGAZPOFS-UHFFFAOYSA-M copper(i) bromide Chemical compound Br[Cu] NKNDPYCGAZPOFS-UHFFFAOYSA-M 0.000 description 1
- LSXDOTMGLUJQCM-UHFFFAOYSA-M copper(i) iodide Chemical compound I[Cu] LSXDOTMGLUJQCM-UHFFFAOYSA-M 0.000 description 1
- ZKXWKVVCCTZOLD-UHFFFAOYSA-N copper;4-hydroxypent-3-en-2-one Chemical compound [Cu].CC(O)=CC(C)=O.CC(O)=CC(C)=O ZKXWKVVCCTZOLD-UHFFFAOYSA-N 0.000 description 1
- HFDWIMBEIXDNQS-UHFFFAOYSA-L copper;diformate Chemical compound [Cu+2].[O-]C=O.[O-]C=O HFDWIMBEIXDNQS-UHFFFAOYSA-L 0.000 description 1
- GBRBMTNGQBKBQE-UHFFFAOYSA-L copper;diiodide Chemical compound I[Cu]I GBRBMTNGQBKBQE-UHFFFAOYSA-L 0.000 description 1
- 229940076286 cupric acetate Drugs 0.000 description 1
- 229960003280 cupric chloride Drugs 0.000 description 1
- 229960004643 cupric oxide Drugs 0.000 description 1
- KRFJLUBVMFXRPN-UHFFFAOYSA-N cuprous oxide Chemical compound [O-2].[Cu+].[Cu+] KRFJLUBVMFXRPN-UHFFFAOYSA-N 0.000 description 1
- 229940112669 cuprous oxide Drugs 0.000 description 1
- 229930007927 cymene Natural products 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- KWKXNDCHNDYVRT-UHFFFAOYSA-N dodecylbenzene Chemical compound CCCCCCCCCCCCC1=CC=CC=C1 KWKXNDCHNDYVRT-UHFFFAOYSA-N 0.000 description 1
- UHCBBWUQDAVSMS-UHFFFAOYSA-N fluoroethane Chemical compound CCF UHCBBWUQDAVSMS-UHFFFAOYSA-N 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 238000004508 fractional distillation Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- HVTICUPFWKNHNG-UHFFFAOYSA-N iodoethane Chemical compound CCI HVTICUPFWKNHNG-UHFFFAOYSA-N 0.000 description 1
- INQOMBQAUSQDDS-UHFFFAOYSA-N iodomethane Chemical compound IC INQOMBQAUSQDDS-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229940102396 methyl bromide Drugs 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N monofluoromethane Natural products FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- SNMVRZFUUCLYTO-UHFFFAOYSA-N n-propyl chloride Chemical compound CCCCl SNMVRZFUUCLYTO-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229940038384 octadecane Drugs 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- VXNSQGRKHCZUSU-UHFFFAOYSA-N octylbenzene Chemical compound [CH2]CCCCCCCC1=CC=CC=C1 VXNSQGRKHCZUSU-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- HFPZCAJZSCWRBC-UHFFFAOYSA-N p-cymene Chemical compound CC(C)C1=CC=C(C)C=C1 HFPZCAJZSCWRBC-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- USDBETPKXUMMRW-UHFFFAOYSA-N tetrazocane Chemical compound C1CCNNNNC1 USDBETPKXUMMRW-UHFFFAOYSA-N 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Landscapes
- Catalysts (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
この発明は、トリアルコキシシランの分離精製法に係り
、詳しくは未反応アルコールが存在する反応混合物中の
トリアルコキシシランを安定化させてトリアルコキシシ
ランを効率良く分離精製する方法に関する。Detailed Description of the Invention [Industrial Application Field] The present invention relates to a method for separating and purifying trialkoxysilane, and more specifically, it stabilizes trialkoxysilane in a reaction mixture in which unreacted alcohol is present to produce trialkoxysilane. The present invention relates to a method for efficiently separating and purifying silane.
[従来の技術]
例えばトリメトキシシランやトリエトキシシラン等のよ
うに、1つの硅素原子に3つのアルコキシ基と1つの水
素原子が結合したトリアルコキシシランは、それ自体極
めて反応性に富み、多くの有機化合物に対して付加、共
重合、共縮合等の反応をして有用な物質を生成し、例え
ばシランカップリング剤、コーティング剤、耐熱塗料等
を製造する際の原料物質として使用されている。[Prior Art] Trialkoxysilane, in which three alkoxy groups and one hydrogen atom are bonded to one silicon atom, such as trimethoxysilane and triethoxysilane, is itself extremely reactive and has many Useful substances are produced by reactions such as addition, copolymerization, and cocondensation with organic compounds, and are used as raw materials for producing, for example, silane coupling agents, coating agents, heat-resistant paints, and the like.
このようなトリアルコキシシランを製造する方法として
は、例えば、銅触媒の存在下に気相あるいは液相で金属
硅素とアルコールとを直接反応させる方法が知られてい
る。しかしながら、この方法においては、アルコールの
反応率が低く、反応混合物中には、目的物のトリアルコ
キシシランのほかにテトラアルコキシシラン、ジアルコ
キシシラン、ジアルコキシアルキルシラン、トリアルコ
キシアルキルシランあるいはこれらの二量体等の種々の
アルコキシシランに加え、多量の未反応アルコールが含
有され、この反応混合物はその精製操作までの保存中あ
るいは精製操作中に未反応アルコールが目的物のトリア
ルコキシシランと反応してテトラアルコキシシランを生
成し、結果としてトリアルコキシシランの収率が著しく
低下するという問題がある。As a method for producing such trialkoxysilane, for example, a method is known in which silicon metal and alcohol are directly reacted in the gas phase or liquid phase in the presence of a copper catalyst. However, in this method, the reaction rate of alcohol is low, and the reaction mixture contains, in addition to the target trialkoxysilane, tetraalkoxysilane, dialkoxysilane, dialkoxyalkylsilane, trialkoxyalkylsilane, or two of these. In addition to various alkoxysilanes such as trialkoxysilanes, a large amount of unreacted alcohol is contained, and this reaction mixture is produced by reacting the unreacted alcohol with the target trialkoxysilane during storage or during the purification operation. There is a problem in that tetraalkoxysilane is produced, resulting in a significant decrease in the yield of trialkoxysilane.
そこで、従来においては、例えば反応混合物を0℃以下
の温度で保存したり、あるいは、反応混合物を安定化さ
せるための方法としてその反応混合物中に、所定のアミ
ノ酸を存在させる方法(特開昭55−72,197号公
報)、アミン類を添加しIIを2.0〜7.0に調整す
る方法(特開昭57−118.592号公報)、3価の
有機リン化合物を存在させる方法(特公昭61−21,
478号公報〉や、その反応混合物中にエポキサイド類
を存在させる方法(特開昭61−1,694号公報)等
が提案されている。Therefore, in the past, there have been methods for storing the reaction mixture at a temperature below 0°C, or for stabilizing the reaction mixture by adding a predetermined amino acid to the reaction mixture (Japanese Unexamined Patent Application Publication No. 55-115). -72,197), a method of adding amines to adjust II to 2.0 to 7.0 (JP-A-57-118,592), a method of adding a trivalent organic phosphorus compound ( Tokuko Sho 61-21,
No. 478] and a method in which epoxides are present in the reaction mixture (Japanese Patent Laid-Open No. 1,694/1983) have been proposed.
[発明が解決しようとする問題点]
しかしながら、反応混合物をO′C以下の温度で保存す
る方法については、その保存のために冷蔵庫や冷凍庫が
必要になって多大の保存コストがかかるほか、この反応
混合物を精留して精製する際には加熱が必要になるので
この際におけるトリアルコキシシランの分解は防止し得
ないという問題があり、また、安定剤として使用するア
ミノ酸、アミン類、3価の有機リン化合物あるいはエポ
キサイド類を使用する方法については、反応混合物を蒸
留して得られた精製トリアルコキシシラン中にこれらの
安定剤が不純物として混入したり、トリアルコキシシラ
ンと未反応アルコールとの反応を抑制する効果が必ずし
も充分でなかったり、あるいは、反応混合物を蒸留して
トリアルコキシシランを精製する際における安定化効果
に問題がある等、いずれにしても満足できるものではな
かった。[Problems to be Solved by the Invention] However, the method of preserving the reaction mixture at a temperature below O'C requires a refrigerator or freezer, which incurs a large storage cost. Since heating is required when rectifying and purifying the reaction mixture, there is a problem in that decomposition of trialkoxysilane cannot be prevented at this time, and amino acids, amines, and trivalent For methods using organic phosphorus compounds or epoxides, these stabilizers may be mixed as impurities into the purified trialkoxysilane obtained by distilling the reaction mixture, or the reaction between trialkoxysilane and unreacted alcohol may occur. In any case, they were not satisfactory, such as not necessarily having a sufficient effect of suppressing the reaction mixture, or having problems with the stabilizing effect when purifying trialkoxysilane by distilling the reaction mixture.
従って、本発明の目的は、未反応アルコールを含有する
反応混合物からトリアルコキシシランを分離精製するに
当り、この反応混合物中のトリアルコキシシランを安定
化させ、しかも、反応混合物を精留して容易に高純度の
トリアルコキシシランを収率良く得ることができるトリ
アルコキシシランの分離精製法を提供することにある。Therefore, an object of the present invention is to stabilize trialkoxysilane in the reaction mixture when separating and purifying trialkoxysilane from a reaction mixture containing unreacted alcohol, and to easily rectify the reaction mixture. The object of the present invention is to provide a method for separating and purifying trialkoxysilane, which can obtain highly pure trialkoxysilane in good yield.
[問題点を解決するための手段]
すなわち、本発明は、未反応アルコールを含有する反応
混合物からトリアルコキシシランを分離精製するに当り
、この反応混合物中に有機ハロゲン化物0.0001〜
10重量%を共存させるトリアルコキシシランの分離精
製法である。[Means for Solving the Problems] That is, in the present invention, when separating and purifying trialkoxysilane from a reaction mixture containing unreacted alcohol, 0.0001 to 0.0001 of an organic halide is added to the reaction mixture.
This is a separation and purification method for trialkoxysilane in which 10% by weight is coexisting.
本発明において、未反応アルコールを含有する反応混合
物としては、トリクロルシランとアルコールとの反応に
よって得られた反応混合物であってもよいが、トリアル
コキシシランの収率の点から好ましくは銅触媒の存在下
に気相あるいは液相で金属硅素とアルコールとを直接反
応させて得られる反応混合物である。In the present invention, the reaction mixture containing unreacted alcohol may be a reaction mixture obtained by the reaction of trichlorosilane and alcohol, but from the viewpoint of the yield of trialkoxysilane, the presence of a copper catalyst is preferable. It is a reaction mixture obtained by directly reacting metallic silicon and alcohol in the gas phase or liquid phase.
この銅触媒の存在下に行う金属硅素とアルコールの直接
反応において、原料として使用する金属硅素は、その純
度が80重量%以上であってその平均粒径が200μ而
以下の粉末であればよく、例えば振動ミル、ボールミル
等の手段で製造され、その純度が80〜99重量%であ
って平均粒径50〜100μ辺の安価な一般市販品をそ
のまま使用することができる。In the direct reaction of metallic silicon and alcohol carried out in the presence of a copper catalyst, the metallic silicon used as a raw material may be a powder with a purity of 80% by weight or more and an average particle size of 200 μm or less, For example, an inexpensive general commercially available product manufactured by means such as a vibrating mill or a ball mill and having a purity of 80 to 99% by weight and an average particle size of 50 to 100 μm can be used as is.
また、原料として使用するアルコールとしては、通常ア
ルキルアルコールが使用され、好ましくはメチルアルコ
ール、エチルアルコール、n−プロピルアルコール、1
so−プロピルアルコール、n−ブチルアルコール、i
s叶ブチルア、ルコール、アミルアルコール等の炭素数
1〜6の低級アルキルアルコールが使用される。これら
のアルコールについては、その純度が98重量%以上、
好ましくは99゜9重量%以上であって、その水分含有
量が0.2重量%以下、好ましくは0.1重量%以下の
ものがよい。このアルコールの使用量は、金属硅素1モ
ルに対して通常3〜10モルであるが、金属硅−〇 −
素の反応率を向上させるためには金属硅素に対して過剰
に使用するのがよく、好ましくは4〜8モルである。In addition, as the alcohol used as a raw material, alkyl alcohol is usually used, preferably methyl alcohol, ethyl alcohol, n-propyl alcohol,
so-propyl alcohol, n-butyl alcohol, i
Lower alkyl alcohols having 1 to 6 carbon atoms such as butyl alcohol, alcohol, and amyl alcohol are used. For these alcohols, the purity is 98% by weight or more,
Preferably, the water content is 99.9% by weight or more, and the water content is 0.2% by weight or less, preferably 0.1% by weight or less. The amount of alcohol used is usually 3 to 10 moles per mole of metal silicon, but in order to improve the reaction rate of metal silicon, it is best to use it in excess of the metal silicon. , preferably 4 to 8 mol.
さらに、銅触媒としては、例えば、金属銅粉末や、塩化
第一銅、塩化第二銅、臭化第一銅、臭化第二銅、沃化第
一銅、沃化第二銅、弗化第一銅、蟻酸銅、銅アセチルア
セトナート、酢酸第一銅、酢酸第二銅、酸化第一銅、酸
化第二銅等の銅化合物等を挙げることかできる。これら
金属銅粉末や銅化合物についてはその1種のみを使用し
てもよく、また、2種以上を組合せて使用してもよい。Furthermore, examples of copper catalysts include metallic copper powder, cuprous chloride, cupric chloride, cuprous bromide, cupric bromide, cuprous iodide, cupric iodide, and fluoride. Examples include copper compounds such as cuprous cuprous, copper formate, copper acetylacetonate, cuprous acetate, cupric acetate, cuprous oxide, cupric oxide, and the like. Regarding these metallic copper powders and copper compounds, only one type thereof may be used, or two or more types may be used in combination.
これらの銅触媒は、金属硅素1モルに対して通常0.0
05〜0.5モル、好ましくは0.01〜0.1モルの
範囲で使用され、この使用量が0゜005モルより少な
いと金属硅素の反応率の低下という問題が生じ、また、
0.5モルより多くしても金属硅素の反応率やトリアル
コキシシランの選択率の向上はみられず、かえって不経
済である。These copper catalysts are usually used in an amount of 0.0 per mole of metal silicon.
It is used in the range of 0.05 to 0.5 mol, preferably 0.01 to 0.1 mol, and if the amount used is less than 0.005 mol, there will be a problem of a decrease in the reaction rate of metal silicon, and
Even if the amount is more than 0.5 mol, no improvement in the reaction rate of metal silicon or the selectivity of trialkoxysilane is observed, which is rather uneconomical.
また、この銅触媒については、これを上記金属硅素と予
め混合粉砕し、窒素気流中200〜600°C1好まし
くは200〜400’Cで熱処理して活性化させてから
使用してもよい。Further, the copper catalyst may be used after being mixed with the metal silicon and pulverized in advance, and activated by heat treatment at 200 to 600°C, preferably 200 to 400'C, in a nitrogen stream.
また、銅触媒の存在下に行う金属硅素とアルコールの直
接反応を液相で行う場合に使用する溶媒としては、それ
が反応系で安定であって所定の反応温度にまで上昇可能
なものであればよく、種々の炭化水素化合物を使用する
ことができ、例えば、オクタン、デカン、ドデカン、テ
トラゾ゛カン、ヘキサデカン、オクタデカン、エイ」サ
ン等のパラフィン系炭化水素、エチルベンゼン、トリメ
チルベンゼン、シメン、ジエチルベンゼン、ブチルベン
ゼン、ブチルトルエン、オクチルベンゼン、ドデシルベ
ンゼン、ジドデシルベンゼン等のアルキルベンゼン系炭
化水素あるいはその水素化物、ジフェニル、ジフェニル
エーテル、モノエチルジフェニル、ジエチルジフェニル
、トリエチルジフェニル等のジフェニル系炭化水素ある
いはその水素化物、アルキルナフタリン系炭化水素ある
いはその水素化物、トリフェニル系炭化水素あるいはそ
の水素化物等を挙げることができ、その1種のみを使用
してもよく、また、2種以上を組合せて使用してもよい
。これらの溶媒のうち好ましいのは、反応中に発泡しな
いものであってその沸点が常圧で100〜400’C1
好ましくは150〜300℃のものである。In addition, when carrying out the direct reaction of metallic silicon and alcohol in the presence of a copper catalyst in the liquid phase, the solvent used is one that is stable in the reaction system and can be raised to the specified reaction temperature. Various hydrocarbon compounds can be used, for example paraffinic hydrocarbons such as octane, decane, dodecane, tetrazocane, hexadecane, octadecane, ethylbenzene, ethylbenzene, trimethylbenzene, cymene, diethylbenzene, etc. Alkylbenzene hydrocarbons or their hydrides such as butylbenzene, butyltoluene, octylbenzene, dodecylbenzene, and didodecylbenzene; diphenyl hydrocarbons or their hydrides such as diphenyl, diphenyl ether, monoethyldiphenyl, diethyldiphenyl, and triethyldiphenyl; Examples include alkylnaphthalene hydrocarbons or their hydrides, triphenyl hydrocarbons or their hydrides, etc., and only one type thereof may be used, or two or more types may be used in combination. . Among these solvents, those that do not foam during the reaction and have a boiling point of 100 to 400'C1 at normal pressure are preferred.
Preferably it is 150 to 300°C.
銅触媒の存在下に行う金属硅素とアルコールの直接反応
を液相で行う場合、その反応は例えば以下のような方法
で行う。すなわち、攪拌機付反応容器にアルコール導入
管、生成物留出管及び温度計をセットし、反応容器内に
は金属硅素、銅触媒及び反応溶媒を仕込み、必要により
窒素ガス等の不活性ガスや水素ガスを吹込みながら、攪
拌下に反応溶媒の沸点く通常100〜400℃の範囲内
)、好ましくは150〜300℃に加熱し、次いでアル
コール導入管からアルコールを反応容器内に一定の速度
で流し込んで反応させ、生成物留出管より留出してくる
反応混合物をこの生成物留出管の出口に接続した冷却器
で冷却し凝縮して捕集する。When the direct reaction between metal silicon and alcohol in the presence of a copper catalyst is carried out in a liquid phase, the reaction is carried out, for example, in the following manner. That is, an alcohol introduction tube, a product distillation tube, and a thermometer are set in a reaction vessel equipped with a stirrer, and metal silicon, a copper catalyst, and a reaction solvent are charged into the reaction vessel, and if necessary, inert gas such as nitrogen gas or hydrogen While blowing gas, the reaction solvent is heated under stirring to the boiling point of the reaction solvent (usually within the range of 100 to 400°C), preferably 150 to 300°C, and then alcohol is poured into the reaction vessel from the alcohol inlet tube at a constant rate. The reaction mixture distilled out from the product distillation tube is cooled, condensed, and collected by a condenser connected to the outlet of the product distillation tube.
また、銅触媒の存在下に行う金属硅素とアルコ一ルの直
接反応を気相で行う場合、その反応は縦型反応器あるい
は横型反応器を使用する従来公知の方法と同じでよく、
金属硅素及び銅触媒が充填された反応器を通常150〜
600℃、好ましくは200〜400℃に加熱しながら
、アルコールを不活性ガスや水素ガスで希釈しあるいは
希釈することなく導入し、留出してくる反応混合物を反
応器の出口に接続した冷却器で冷却し凝縮して捕集する
。In addition, when the direct reaction of metallic silicon and alcohol in the presence of a copper catalyst is carried out in the gas phase, the reaction may be the same as the conventionally known method using a vertical reactor or a horizontal reactor.
The reactor filled with metal silicon and copper catalyst is usually 150 ~
While heating to 600°C, preferably 200 to 400°C, alcohol is introduced with or without dilution with an inert gas or hydrogen gas, and the distilled reaction mixture is poured into a cooler connected to the outlet of the reactor. Cool, condense and collect.
このようにして得られた反応混合物には、好ましくは直
ちに有機ハロゲン化物を添加し、その精製操作までの保
存中あるいは精製操作中に安定剤として有機ハロゲン化
物が所定の割合で共存するようにする。この目的で使用
する有機ハロゲン化物としては、それが蒸留により容易
に分離除去できるものであればよく、例えば、塩化メチ
ル、臭化メチル、弗化メチル、沃化メチル、塩化エチル
、臭化エチル、弗化エヂル、沃化エチル、塩化n−プロ
ピル、臭化n−プロピル等のハロゲン化アルキルや、ジ
クロルメタン、ジクロルエタン等のハロゲン化アルケニ
ルや、クロルベンゼン、ジクロルベンゼン等のハロゲン
化アリールや、その他クロロホルム、四塩化炭素、酢酸
クロライド等を挙げることができ、好ましくはトリアル
コキシシランのアルキル基と同じ炭素数のハロゲン化ア
ルキルがよい。そして、この有機ハロゲン化物の使用量
については、上記反応混合物中に通常0.0001〜2
0重量%、好ましくは0.001〜10重量%であり、
より好ましくは0.01〜6重量%である。0.000
1モルより少ないと充分な安定化効果を発揮することが
できず、また、20重量%より多く使用しても安定化効
果の向上は認められず、経済的に不利である。Preferably, an organic halide is immediately added to the reaction mixture obtained in this way, so that the organic halide coexists as a stabilizer at a predetermined ratio during storage or during the purification operation. . The organic halides used for this purpose may be those that can be easily separated and removed by distillation, such as methyl chloride, methyl bromide, methyl fluoride, methyl iodide, ethyl chloride, ethyl bromide, Alkyl halides such as ethyl fluoride, ethyl iodide, n-propyl chloride, n-propyl bromide, alkenyl halides such as dichloromethane and dichloroethane, aryl halides such as chlorobenzene and dichlorobenzene, and other chloroform , carbon tetrachloride, acetic chloride, etc., and preferably an alkyl halide having the same number of carbon atoms as the alkyl group of the trialkoxysilane. The amount of organic halide used in the reaction mixture is usually 0.0001 to 2.
0% by weight, preferably 0.001 to 10% by weight,
More preferably, it is 0.01 to 6% by weight. 0.000
If the amount is less than 1 mol, a sufficient stabilizing effect cannot be exhibited, and even if the amount is more than 20% by weight, no improvement in the stabilizing effect is observed, which is economically disadvantageous.
安定剤として有機ハロゲン化物が共存する反応混合物に
ついてはこれを蒸留により精製し、特にトリアルコキシ
シランに対して沸点差の大きい有機ハロゲン化物を使用
することにより容易に高純度のトリアルコキシシランを
得ることができる。For reaction mixtures in which an organic halide coexists as a stabilizer, it is purified by distillation, and in particular, by using an organic halide that has a large boiling point difference with respect to trialkoxysilane, highly pure trialkoxysilane can be easily obtained. Can be done.
[実施例]
以下、実施例、比較例及び試験例に基いて、本発明方法
を具体的に説明する。[Example] Hereinafter, the method of the present invention will be specifically explained based on Examples, Comparative Examples, and Test Examples.
実施例1
平均粒度200μmの金属硅素500gと塩化第一銅2
5gとを磁性ボールミルで2時間粉砕混合し、これを石
英管に充填し、電気炉で窒素ガス気流中600℃で3時
間熱処理した。Example 1 500 g of silicon metal with an average particle size of 200 μm and 2 cuprous chlorides
5 g was pulverized and mixed in a magnetic ball mill for 2 hours, filled in a quartz tube, and heat-treated in an electric furnace at 600° C. in a nitrogen gas stream for 3 hours.
次に、アルコール導入管、窒素ガス導入管、生成物留出
管及び温度計を備えた直径10cm×高さ23cmのス
テンレス製攪拌機付き反応器に上記の如く熱処理した金
属硅素と塩化第一銅の混合物と沸点280℃のアルキル
ベンゼン系炭化水素(三菱油化■製商品名:AB−HL
>1,000.11を仕込み、反応温度170〜180
℃で純度99゜9重量%以上のメチルアルコール30m
/hr、及び窒素ガス20m1/min、を導入しなが
ら80時間反応させ、生成物留出管から反応混合物2.
2809を回収した。この反応混合物をガスクロマトグ
ラフィで分析した結果、その組成はメタノール13.3
重量%、トリメトキシシラン60.8重量%、テトラメ
トキシシラン21.5重量%及びその他4.4重量%で
あり、金属硅素の反応率は81.9重量%でトリメトキ
シシランの選択率は77.9重量%であった。Next, the heat-treated metal silicon and cuprous chloride were placed in a stainless steel reactor with a diameter of 10 cm and a height of 23 cm equipped with an alcohol inlet tube, a nitrogen gas inlet tube, a product distillation tube, and a thermometer. A mixture and an alkylbenzene hydrocarbon with a boiling point of 280°C (product name: AB-HL manufactured by Mitsubishi Yuka)
>1,000.11, reaction temperature 170-180
30ml of methyl alcohol with a purity of 99°C or more 9% by weight
/hr and nitrogen gas at a rate of 20 ml/min, the reaction was allowed to proceed for 80 hours, and the reaction mixture 2.
2809 were recovered. Analysis of this reaction mixture by gas chromatography revealed that its composition was methanol 13.3
% by weight, 60.8% by weight of trimethoxysilane, 21.5% by weight of tetramethoxysilane, and 4.4% by weight of others, the reaction rate of metal silicon is 81.9% by weight, and the selectivity of trimethoxysilane is 77% by weight. It was .9% by weight.
このようにして得られた反応混合物を二分し、その一方
(A>には23g〈約2重量%に相当〉の塩化メチルを
添加し、また、他方(B)には何も添加せず、それぞれ
の反応混合物(A>及び(B)について蒸留を行い、沸
点範囲60℃までの初留、沸点範囲79〜81°Cの水
留、沸点範囲120〜122°Cの後留及び釜残とに分
留し、各留分についてガスクロマトグラフィによりその
組成を調べた。分留の結果を第1表に、また、ガスクロ
マトグラフィ分析の結果を第2表にそれぞれ示す。The reaction mixture thus obtained was divided into two parts, 23 g (corresponding to about 2% by weight) of methyl chloride was added to one part (A), and nothing was added to the other part (B). Distillation was carried out for each reaction mixture (A> and (B), and the initial distillation up to a boiling point range of 60°C, the water distillation with a boiling point range of 79 to 81°C, the after-distillation with a boiling point range of 120 to 122°C, and the bottom residue. The composition of each fraction was investigated by gas chromatography.The results of fractional distillation are shown in Table 1, and the results of gas chromatography analysis are shown in Table 2.
第1表
第2表
(注)TMSニトリメトキシシラン
QMS :テトラメトキシシラン
実施例2
上記実施例1と同様にして得られた反応混合物に塩化メ
チルを添加し、トリメトキシシラン50重量%、テトラ
メトキシシラン20重量%、未反応メチルアルコール2
5重量%、塩化メチル1゜5重量%及びその他3.5重
量%の組成を有する反応混合物とした。Table 1 Table 2 (Note) TMS Nitrimethoxysilane QMS: Tetramethoxysilane Example 2 Methyl chloride was added to the reaction mixture obtained in the same manner as in Example 1 above, and 50% by weight of trimethoxysilane and tetramethoxysilane were added. 20% by weight of silane, 2% of unreacted methyl alcohol
The reaction mixture had a composition of 5% by weight, 1.5% by weight of methyl chloride, and 3.5% by weight of others.
この反応混合物をガス後口に塩化カルシウム管を取付け
たステンレス容器中に充填して15〜20℃の室温中に
放置し、]O日ごとにガスクロマトグラフィ分析を行っ
てトリメトキシシランとテトラメトキシシランの含有量
についてその経時変化を調べた。結果を第3表に示す。This reaction mixture was filled into a stainless steel container with a calcium chloride pipe attached to the gas outlet and left at room temperature of 15 to 20°C, and gas chromatography analysis was performed every 20 days to determine whether trimethoxysilane and tetramethoxysilane were detected. Changes in the content over time were investigated. The results are shown in Table 3.
試験例l
l11!度99重量%のトリメトキシシラン122g中
にメチルアルコール32gと塩化メチル4.6g(2,
9重量%)とを添加し混合して試料混合物を調製した。Test example l l11! 32 g of methyl alcohol and 4.6 g of methyl chloride (2,
9% by weight) and mixed to prepare a sample mixture.
この試料混合物について、上記実施例2と同様にしてト
リメトキシシランとテトラメトキシシランの含有量につ
いてその経時変化を調べた。結果を第3表に示す。Regarding this sample mixture, changes over time in the contents of trimethoxysilane and tetramethoxysilane were investigated in the same manner as in Example 2 above. The results are shown in Table 3.
試験例2
塩化メチルの添加を行わなかった以外は上記試験例1と
同様にして試料混合物を調製し、トリメトキシシランと
テトラメトキシシランの含有量についてその経時変化を
調べた。結果を第3表に示す。Test Example 2 A sample mixture was prepared in the same manner as in Test Example 1 above, except that methyl chloride was not added, and changes over time in the contents of trimethoxysilane and tetramethoxysilane were investigated. The results are shown in Table 3.
= 15−
試験例3
純度99重量%のトリエトキシシラン164g中にエチ
ルアルコール46tjと塩化エチル6.39 (2,9
重量%〉とを添加し混合して試料混合物を調製した。こ
の試料混合物について、上記実施例2と同様にしてトリ
エトキシシランとテトラエトキシシランの含有量につい
てその経時変化を調べた。結果を第3表に示す。= 15- Test Example 3 46 tj of ethyl alcohol and 6.39 ethyl chloride (2,9
% by weight> and mixed to prepare a sample mixture. Regarding this sample mixture, changes over time in the content of triethoxysilane and tetraethoxysilane were investigated in the same manner as in Example 2 above. The results are shown in Table 3.
試験例4
塩化エチルの添加を行わなかった以外は上記試験例3と
同様にして試料混合物を調製し、トリエトキシシランと
テトラエトキシシランの含有量についてその経時変化を
調べた。結果を第3表に示す。Test Example 4 A sample mixture was prepared in the same manner as in Test Example 3 above, except that ethyl chloride was not added, and changes in the contents of triethoxysilane and tetraethoxysilane over time were investigated. The results are shown in Table 3.
第3表
(注)TMSコトリメトキシシラン
QMS :テトラメトキシシラン
TESニトリエトキシシラン
QES :テトラエトキシシラン
[発明の効果]
本発明方法によれば、未反応アルコールを含有する反応
混合物中のトリアルコキシシランの安定性が著しく向上
し、これを蒸留してトリアルコキジシランを分離精製す
る際にその回収率が著しく向上するほか、反応混合物を
蒸留して容易に高純度のトリアルコキシシランを収率良
く得ることができる。Table 3 (Note) TMS Cotrimethoxysilane QMS: Tetramethoxysilane TES Nitriethoxysilane QES: Tetraethoxysilane [Effects of the Invention] According to the method of the present invention, trialkoxysilane in the reaction mixture containing unreacted alcohol can be The stability is significantly improved, and the recovery rate is significantly improved when distilling this to separate and purify trialkoxysilane, and it is also possible to easily obtain high-purity trialkoxysilane in good yield by distilling the reaction mixture. Can be done.
Claims (3)
アルコキシシランを分離精製するに当り、この反応混合
物中に有機ハロゲン化物0.0001〜20重量%を共
存させることを特徴とするトリアルコキシシランの分離
精製法。(1) Separation of trialkoxysilane characterized by allowing 0.0001 to 20% by weight of an organic halide to coexist in the reaction mixture when separating and purifying trialkoxysilane from a reaction mixture containing unreacted alcohol. Purification method.
ゲン化アルケニル、ハロゲン化アリール、ハロゲン化第
四アルキルアンモニウムから選択された1種又は2種以
上の混合物である特許請求の範囲第1項記載のトリアル
コキシシランの分離精製法。(2) The organic halide according to claim 1, wherein the organic halide is one or a mixture of two or more selected from alkyl halides, alkenyl halides, aryl halides, and quaternary alkylammonium halides. Separation and purification method for alkoxysilane.
そのアルキル基がトリアルコキシシランのアルキル基と
同じである特許請求の範囲第1項又は第2項記載のトリ
アルコキシシランの分離精製法。(3) the organic halide is an alkyl halide,
3. The method for separating and purifying trialkoxysilane according to claim 1 or 2, wherein the alkyl group is the same as the alkyl group of the trialkoxysilane.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62147886A JP2584775B2 (en) | 1987-06-16 | 1987-06-16 | Separation and purification method of trialkoxysilane |
CA000559356A CA1323037C (en) | 1987-02-23 | 1988-02-19 | Process for the production of trialkoxysilanes |
US07/158,480 US4931578A (en) | 1987-02-23 | 1988-02-22 | Process for the production of trialkoxysilanes |
EP88301550A EP0280517B1 (en) | 1987-02-23 | 1988-02-23 | Process for the production of trialkoxysilanes |
DE3851243T DE3851243T2 (en) | 1987-02-23 | 1988-02-23 | Process for the preparation of trialkoxysilanes. |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62147886A JP2584775B2 (en) | 1987-06-16 | 1987-06-16 | Separation and purification method of trialkoxysilane |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63313790A true JPS63313790A (en) | 1988-12-21 |
JP2584775B2 JP2584775B2 (en) | 1997-02-26 |
Family
ID=15440421
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62147886A Expired - Lifetime JP2584775B2 (en) | 1987-02-23 | 1987-06-16 | Separation and purification method of trialkoxysilane |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2584775B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7659419B2 (en) | 2003-07-30 | 2010-02-09 | Dow Corning Corporation | Stabilizing agent for hydroalkoxysilane, stabilization method, and stabilized hydroalkoxysilane |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60252488A (en) * | 1984-05-28 | 1985-12-13 | Toray Ind Inc | Method for purifying trialkoxysilane |
JPS6165889A (en) * | 1984-09-07 | 1986-04-04 | Shin Etsu Chem Co Ltd | Separation and purification of trimethoxysilane |
-
1987
- 1987-06-16 JP JP62147886A patent/JP2584775B2/en not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60252488A (en) * | 1984-05-28 | 1985-12-13 | Toray Ind Inc | Method for purifying trialkoxysilane |
JPS6165889A (en) * | 1984-09-07 | 1986-04-04 | Shin Etsu Chem Co Ltd | Separation and purification of trimethoxysilane |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7659419B2 (en) | 2003-07-30 | 2010-02-09 | Dow Corning Corporation | Stabilizing agent for hydroalkoxysilane, stabilization method, and stabilized hydroalkoxysilane |
Also Published As
Publication number | Publication date |
---|---|
JP2584775B2 (en) | 1997-02-26 |
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