JPS6323196B2 - - Google Patents
Info
- Publication number
- JPS6323196B2 JPS6323196B2 JP59120997A JP12099784A JPS6323196B2 JP S6323196 B2 JPS6323196 B2 JP S6323196B2 JP 59120997 A JP59120997 A JP 59120997A JP 12099784 A JP12099784 A JP 12099784A JP S6323196 B2 JPS6323196 B2 JP S6323196B2
- Authority
- JP
- Japan
- Prior art keywords
- trialkoxysilane
- alcohol
- reaction
- alkyl alcohol
- epoxides
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 125000005233 alkylalcohol group Chemical group 0.000 claims description 14
- 150000002118 epoxides Chemical class 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 11
- 229910052710 silicon Inorganic materials 0.000 claims description 10
- 239000010703 silicon Substances 0.000 claims description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 239000007795 chemical reaction product Substances 0.000 claims description 8
- 229910052802 copper Inorganic materials 0.000 claims description 6
- 239000010949 copper Substances 0.000 claims description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 5
- 239000003054 catalyst Substances 0.000 claims description 5
- UWFRVQVNYNPBEF-UHFFFAOYSA-N 1-(2,4-dimethylphenyl)propan-1-one Chemical compound CCC(=O)C1=CC=C(C)C=C1C UWFRVQVNYNPBEF-UHFFFAOYSA-N 0.000 claims description 4
- FQYUMYWMJTYZTK-UHFFFAOYSA-N Phenyl glycidyl ether Chemical compound C1OC1COC1=CC=CC=C1 FQYUMYWMJTYZTK-UHFFFAOYSA-N 0.000 claims description 4
- ZWAJLVLEBYIOTI-UHFFFAOYSA-N cyclohexene oxide Chemical group C1CCCC2OC21 ZWAJLVLEBYIOTI-UHFFFAOYSA-N 0.000 claims description 4
- FWFSEYBSWVRWGL-UHFFFAOYSA-N cyclohexene oxide Natural products O=C1CCCC=C1 FWFSEYBSWVRWGL-UHFFFAOYSA-N 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 7
- 235000019441 ethanol Nutrition 0.000 description 6
- 238000004821 distillation Methods 0.000 description 5
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 4
- -1 triphenyl hydroxide Chemical compound 0.000 description 4
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 238000004587 chromatography analysis Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 2
- QTMDXZNDVAMKGV-UHFFFAOYSA-L copper(ii) bromide Chemical compound [Cu+2].[Br-].[Br-] QTMDXZNDVAMKGV-UHFFFAOYSA-L 0.000 description 2
- 229940045803 cuprous chloride Drugs 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000004817 gas chromatography Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- VKYKSIONXSXAKP-UHFFFAOYSA-N hexamethylenetetramine Chemical compound C1N(C2)CN3CN1CN2C3 VKYKSIONXSXAKP-UHFFFAOYSA-N 0.000 description 2
- APXNRLPBXNJAGG-UHFFFAOYSA-N 1,2:3,4-diepoxycyclohexane Chemical compound C1CC2OC2C2OC12 APXNRLPBXNJAGG-UHFFFAOYSA-N 0.000 description 1
- LKMJVFRMDSNFRT-UHFFFAOYSA-N 2-(methoxymethyl)oxirane Chemical compound COCC1CO1 LKMJVFRMDSNFRT-UHFFFAOYSA-N 0.000 description 1
- CUGZWHZWSVUSBE-UHFFFAOYSA-N 2-(oxiran-2-ylmethoxy)ethanol Chemical compound OCCOCC1CO1 CUGZWHZWSVUSBE-UHFFFAOYSA-N 0.000 description 1
- JFDMLXYWGLECEY-UHFFFAOYSA-N 2-benzyloxirane Chemical compound C=1C=CC=CC=1CC1CO1 JFDMLXYWGLECEY-UHFFFAOYSA-N 0.000 description 1
- SYURNNNQIFDVCA-UHFFFAOYSA-N 2-propyloxirane Chemical compound CCCC1CO1 SYURNNNQIFDVCA-UHFFFAOYSA-N 0.000 description 1
- CONKBQPVFMXDOV-QHCPKHFHSA-N 6-[(5S)-5-[[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]methyl]-2-oxo-1,3-oxazolidin-3-yl]-3H-1,3-benzoxazol-2-one Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)C[C@H]1CN(C(O1)=O)C1=CC2=C(NC(O2)=O)C=C1 CONKBQPVFMXDOV-QHCPKHFHSA-N 0.000 description 1
- GJEZBVHHZQAEDB-UHFFFAOYSA-N 6-oxabicyclo[3.1.0]hexane Chemical compound C1CCC2OC21 GJEZBVHHZQAEDB-UHFFFAOYSA-N 0.000 description 1
- 239000005749 Copper compound Substances 0.000 description 1
- 229910021589 Copper(I) bromide Inorganic materials 0.000 description 1
- 229910021595 Copper(I) iodide Inorganic materials 0.000 description 1
- 229910021590 Copper(II) bromide Inorganic materials 0.000 description 1
- 239000004471 Glycine Substances 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- AWMVMTVKBNGEAK-UHFFFAOYSA-N Styrene oxide Chemical compound C1OC1C1=CC=CC=C1 AWMVMTVKBNGEAK-UHFFFAOYSA-N 0.000 description 1
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- LRHPLDYGYMQRHN-UHFFFAOYSA-N butyl alcohol Substances CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 229940108928 copper Drugs 0.000 description 1
- 150000001880 copper compounds Chemical class 0.000 description 1
- RFKZUAOAYVHBOY-UHFFFAOYSA-M copper(1+);acetate Chemical compound [Cu+].CC([O-])=O RFKZUAOAYVHBOY-UHFFFAOYSA-M 0.000 description 1
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(I) oxide Inorganic materials [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 description 1
- NKNDPYCGAZPOFS-UHFFFAOYSA-M copper(i) bromide Chemical compound Br[Cu] NKNDPYCGAZPOFS-UHFFFAOYSA-M 0.000 description 1
- LSXDOTMGLUJQCM-UHFFFAOYSA-M copper(i) iodide Chemical compound I[Cu] LSXDOTMGLUJQCM-UHFFFAOYSA-M 0.000 description 1
- HCRZXNOSPPHATK-UHFFFAOYSA-L copper;3-oxobutanoate Chemical compound [Cu+2].CC(=O)CC([O-])=O.CC(=O)CC([O-])=O HCRZXNOSPPHATK-UHFFFAOYSA-L 0.000 description 1
- HFDWIMBEIXDNQS-UHFFFAOYSA-L copper;diformate Chemical compound [Cu+2].[O-]C=O.[O-]C=O HFDWIMBEIXDNQS-UHFFFAOYSA-L 0.000 description 1
- GBRBMTNGQBKBQE-UHFFFAOYSA-L copper;diiodide Chemical compound I[Cu]I GBRBMTNGQBKBQE-UHFFFAOYSA-L 0.000 description 1
- 229940076286 cupric acetate Drugs 0.000 description 1
- 229960003280 cupric chloride Drugs 0.000 description 1
- KRFJLUBVMFXRPN-UHFFFAOYSA-N cuprous oxide Chemical compound [O-2].[Cu+].[Cu+] KRFJLUBVMFXRPN-UHFFFAOYSA-N 0.000 description 1
- 229940112669 cuprous oxide Drugs 0.000 description 1
- 238000006356 dehydrogenation reaction Methods 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- KWKXNDCHNDYVRT-UHFFFAOYSA-N dodecylbenzene Chemical compound CCCCCCCCCCCCC1=CC=CC=C1 KWKXNDCHNDYVRT-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 235000010299 hexamethylene tetramine Nutrition 0.000 description 1
- 239000004312 hexamethylene tetramine Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N n-propyl alcohol Natural products CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 150000003376 silicon Chemical class 0.000 description 1
- 239000011863 silicon-based powder Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- ADXGNEYLLLSOAR-UHFFFAOYSA-N tasosartan Chemical compound C12=NC(C)=NC(C)=C2CCC(=O)N1CC(C=C1)=CC=C1C1=CC=CC=C1C=1N=NNN=1 ADXGNEYLLLSOAR-UHFFFAOYSA-N 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Landscapes
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Description
(産業上の利用分野)
本発明はトリアルコキシシランの製造方法、特
にはけい素とアルキルアルコールとの反応により
得られるアルコキシシラン含有反応生成液中での
トリアルコキシシランとアルキルアルコールとの
反応によるトリアルコキシシランの減収を防止し
て、トリアルコキシシランを高収率で得る方法に
関するものである。
(従来の技術)
トリアルコキシシランの製法についてはけい素
とアルキルアルコールとを銅触媒の存在下に反応
させるという方法が公知とされているが、この方
法はアルコールの反応率が低いので留出物として
得られる各種アルコキシシランを含有する反応生
成液が比較的多量のアルキルアルコールを含むも
のとなり、このものはその保存中あるいは精製操
作中にこの残存アルコールとトリアルコキシシラ
ンが脱水素反応を起してテトラアルコキシシラン
に変化するという欠点がある。
そのため、この方法によるトリアルコキシシラ
ンの製造についてはこの反応系または得られた反
応生成液中に安定剤として一般式
(Industrial Application Field) The present invention relates to a method for producing trialkoxysilane, and particularly to a method for producing trialkoxysilane, in particular a method for producing trialkoxysilane by reacting a trialkoxysilane with an alkyl alcohol in an alkoxysilane-containing reaction product solution obtained by the reaction of silicon and an alkyl alcohol. The present invention relates to a method for obtaining trialkoxysilane in high yield by preventing a decrease in the yield of alkoxysilane. (Prior art) Regarding the manufacturing method of trialkoxysilane, a method is known in which silicon and alkyl alcohol are reacted in the presence of a copper catalyst, but this method has a low reaction rate of alcohol, so distillate The resulting reaction product solution containing various alkoxysilanes contains a relatively large amount of alkyl alcohol, and this is due to a dehydrogenation reaction between the residual alcohol and trialkoxysilane during storage or purification. It has the disadvantage of converting into tetraalkoxysilane. Therefore, for the production of trialkoxysilane by this method, the general formula
【式】
(Rは水素原子またはアルキル基、アラルキル
基)で示されるアミノ酸を存在させる方法(特開
昭55−72197号公報参照)、3価の有機リン化合物
を存在させる方法(特開昭55−72198号公報参
照)、アミン類を添加しPHを2.0〜7.0とする方法
(特開昭57−118592号公報参照)などが提案され
ているが、これらの安定剤はトリアルコキシシラ
ンとアルキルアルコールとの反応を抑制する効果
が必ずしも良好でなく、トリアルコキシシランを
高収率で得ることができないという不利がある。
(発明の構成)
本発明はこのような不利を解決したトリアルコ
キシシランの製造方法に関するものであり、これ
はけい素とアルキルアルコールとを銅触媒の存在
下に反応させて得られるトリアルコキシシランを
含む反応生成液中にエポキサイド類を存在させる
ことを特徴とするものである。
すなわち、本発明者らはけい素とアルキルアル
コールとの反応で得られたトリアルコキシシラン
を含む反応生成液中におけるトリアルコキシシラ
ンとアルキルアルコールとの反応を防止する方法
について種々検討した結果、アルキルアルコール
を含有する反応生成液中にエポキサイド類を添加
すると、トリアルコキシシランとアルキルアルコ
ールとの反応が有効に抑制されてトリアルコキシ
シランを安定化させることができるのでこの精製
によつてトリアルコキシシランを高い収率で得る
ことができることを見出し、このエポキサイド液
の種類、添加量などについての研究を進めて本発
明を完成させた。
本発明の方法はまずけい素とアルキルアルコー
ルとを銅触媒の存在下で反応させてトリアルコキ
シシランを含むアルコキシシラン混合物を得ると
いう公知の方法で行なわれる。この場合のけい
素、アルキルアルコールはいずれも一般市販のも
のでよく、このけい素は純度が88〜99.9%の金属
けい素を100μ以下の粒度に粉砕したもの、また
アルキルアルコールはメチルアルコール、エチル
アルコール、プロピルアルコール、ブチルアルコ
ールなどのように炭素数が1〜5のアルキル基を
含むものとすることが好ましい。
また、この銅触媒は金属銅または塩化第1銅、
塩化第2銅、臭化第1銅、臭化第2銅、ヨウ化第
1銅、ヨウ化第2銅、ギ酸銅、銅アセチルアセテ
ート、酢酸第1銅、酢酸第2銅、酸化第1銅など
の銅化合物から選択されたものをけい素1モルに
対し、0.001〜0.5倍モルの範囲で使用すればよ
い。
なお、この反応によるトリアルコキシシランの
収率を高めるためにはこの反応を溶媒の存在下で
行なうことがよく、これには多環状芳香族炭化水
素、アリールメタン化合物、環状ポリエーテル、
ドデシルベンゼン、水酸化トリフエニル、ジアル
キルベンゼン、ジフエニルエーテルなどを必要に
応じ使用すればよい。
この反応は100〜300℃で減圧、常圧、加圧の条
件下で行えばよく、これによればトリメトキシシ
ランを同時に生成する他のアルコキシシランと共
に留出液として取得することができるが、本発明
の方法ではトリアルコキシシランのアルキルアル
コールとの反応によるテトラアルコキシシランへ
の移行を防止するために、エポキサイド類が添加
される。このエポキサイドは予じめこの反応系に
添加しておいてもよいが、上記した反応で得られ
る留出液中に添加してもよい。
このエポキサイド類としてはブチレンオキサイ
ド、エポキシペンタン、ヘキサンオキサイド、ペ
ンテンオキサイド、スチレンオキサイド、1,2
−エポキシ−3−フエニルプロパン、メチルグリ
シジルエーテル、エチルグリシジルエーテル、フ
エニルグリシジルエーテル、エチレングリコール
グリシジルエーテル、ジグリシジルエーテル、シ
クロペンテンオキサイド、シクロヘキセンオキサ
イド、シクロヘキサジエンジオキサイドなどが例
示されるが、この反応生成液がトリアルコキシシ
ランなどの分離精製を目的としてその後蒸留など
で処理されるので、このエポキサイド類もトリア
ルコキシシランなどの沸点以上のものとすること
がよく、この観点からはフエニルグリシジルエー
テル、エチレングリコールジグリシジルエーテ
ル、シクロヘキセンオキサイドから選択されたも
のとすることが好ましい。なお、このエポキサイ
ド類の添加量は反応生成液中に存在するトリアル
コキシシランの量によつて定めればよいが、通常
はこの反応生成液に対し0.01〜10重量%の範囲、
好ましくは0.1〜5重量%である。
つぎに本発明方法の実施例をあげる。
実施例1〜3、比較例1〜4
アルコール導入管、温度計、撹拌器および生成
物留出管を有する500mlのフラスコに、純度98%
のけい素粉末100g、塩化第1銅5gおよびジフ
エニルエーテル200mlを仕込み、生成物留出管出
口には冷却器をつけて留出してくる生成アルコキ
シシランおよび未反応アルコールを凝縮捕集でき
るようにした。
ついでこのフラスコを加温して内液温が200℃
に達したときにアルコール導入管から75ml/時の
速度でメチルアルコールを導入し、反応温度198
〜202℃で5時間反応させたところ、320.0gの留
出物が得られたが、ガスクロマトグラフ分析結果
からこれはトリメトキシシラン146.4g(46.1重
量%)、テトラメトキシシラン16.5g(50重量%)
を含むものであつた。
つぎにこの留出液からこれを10g宛取り出した
試料7本を作り、この3本にフエニルグリシジル
エーテル、エチレングリコールジグリシジルエー
テル、シクロヘキセンオキサイドを0.1g宛添加
するすると共に他の3本に比較のためにグリシ
ン、トリフエノキシリン、ヘキサメチレンテトラ
ミンを0.1g宛添加し、残余の1本は無添加とし
てこれらを室温で72時間放置したのち、ガスクロ
マトグラフ分析を行なつたところ、これらについ
てのトリメトキシシラン濃度およびその残存率は
第1表に示すとおりであつた。[Formula] A method in which an amino acid represented by (R is a hydrogen atom, an alkyl group, or an aralkyl group) is present (see JP-A-55-72197), a method in which a trivalent organic phosphorus compound is present (JP-A-55-72197), -72198), and adding amines to adjust the pH to 2.0 to 7.0 (see JP-A-57-118592), but these stabilizers are based on trialkoxysilane and alkyl alcohol. The disadvantage is that the effect of suppressing the reaction with silane is not necessarily good, and trialkoxysilane cannot be obtained in high yield. (Structure of the Invention) The present invention relates to a method for producing trialkoxysilane that solves these disadvantages, and this invention involves producing trialkoxysilane obtained by reacting silicon and alkyl alcohol in the presence of a copper catalyst. It is characterized by the presence of epoxides in the reaction product liquid. That is, the present inventors have conducted various studies on methods for preventing the reaction between trialkoxysilane and alkyl alcohol in a reaction product solution containing trialkoxysilane obtained from the reaction of silicon and alkyl alcohol. When epoxides are added to a reaction product solution containing They found that it was possible to obtain the epoxide in high yield, and conducted research on the type of epoxide liquid, the amount added, etc., and completed the present invention. The method of the present invention is carried out in a known manner by first reacting silicon with an alkyl alcohol in the presence of a copper catalyst to obtain an alkoxysilane mixture containing trialkoxysilane. Both silicon and alkyl alcohol in this case may be commercially available products, and this silicon is made by grinding metallic silicon with a purity of 88 to 99.9% to a particle size of 100μ or less, and the alkyl alcohol is methyl alcohol, ethyl alcohol, etc. It is preferable to use an alkyl group having 1 to 5 carbon atoms, such as alcohol, propyl alcohol, butyl alcohol, and the like. In addition, this copper catalyst can be metallic copper or cuprous chloride,
Cupric chloride, cuprous bromide, cupric bromide, cuprous iodide, cupric iodide, copper formate, copper acetylacetate, cuprous acetate, cupric acetate, cuprous oxide A copper compound selected from the following may be used in an amount of 0.001 to 0.5 times the mole of silicon. In order to increase the yield of trialkoxysilane from this reaction, this reaction is preferably carried out in the presence of a solvent.
Dodecylbenzene, triphenyl hydroxide, dialkylbenzene, diphenyl ether, etc. may be used as necessary. This reaction can be carried out at 100 to 300°C under reduced pressure, normal pressure, or increased pressure. According to this, trimethoxysilane can be obtained as a distillate together with other alkoxysilanes that are simultaneously produced. In the method of the present invention, epoxides are added in order to prevent transition of trialkoxysilane to tetraalkoxysilane due to reaction with alkyl alcohol. This epoxide may be added to this reaction system in advance, or may be added to the distillate obtained from the above reaction. These epoxides include butylene oxide, epoxypentane, hexane oxide, pentene oxide, styrene oxide, 1,2
-Epoxy-3-phenylpropane, methyl glycidyl ether, ethyl glycidyl ether, phenyl glycidyl ether, ethylene glycol glycidyl ether, diglycidyl ether, cyclopentene oxide, cyclohexene oxide, cyclohexadiene dioxide, etc. are exemplified, but this reaction Since the produced liquid is then treated by distillation etc. for the purpose of separating and purifying trialkoxysilane, etc., the epoxides should also have a boiling point higher than that of trialkoxysilane, etc. From this point of view, phenyl glycidyl ether, Preferably, it is selected from ethylene glycol diglycidyl ether and cyclohexene oxide. The amount of epoxide added may be determined depending on the amount of trialkoxysilane present in the reaction product solution, but it is usually in the range of 0.01 to 10% by weight based on the reaction product solution.
Preferably it is 0.1 to 5% by weight. Next, examples of the method of the present invention will be given. Examples 1 to 3, Comparative Examples 1 to 4 A 500 ml flask with an alcohol inlet tube, a thermometer, a stirrer and a product distillation tube was charged with a purity of 98%.
100 g of silicon powder, 5 g of cuprous chloride, and 200 ml of diphenyl ether were charged, and a cooler was attached to the outlet of the product distillation pipe so that the alkoxysilane produced and unreacted alcohol could be condensed and collected. did. Next, warm this flask until the internal liquid temperature reaches 200℃.
When the reaction temperature reached 198 ml, methyl alcohol was introduced from the alcohol inlet tube at a rate of 75 ml/hour.
When the reaction was carried out at ~202°C for 5 hours, 320.0 g of distillate was obtained, but gas chromatographic analysis showed that this was 146.4 g (46.1 wt%) of trimethoxysilane and 16.5 g (50 wt%) of tetramethoxysilane. )
It included: Next, 7 samples were prepared by taking 10 g of this distillate, and 0.1 g of phenyl glycidyl ether, ethylene glycol diglycidyl ether, and cyclohexene oxide were added to these three samples and compared with the other three samples. For this reason, 0.1 g of glycine, triphenoxylin, and hexamethylenetetramine were added, and the remaining one was left unadded for 72 hours at room temperature. Gas chromatography analysis was performed on these. The methoxysilane concentration and its residual rate were as shown in Table 1.
【表】【table】
【表】
実施例4、比較例5
実施例1で得られた留出液100gにエチレング
リコールジグリシジルエーテル1gを加え、これ
をガラスコイルパツクを充填した20mmφ、50cmの
蒸留塔付の200mlのガラスフラスコに入れて5時
間蒸留し、終了後留出液、釜残液をガスクロマト
グラフ分析したところ、得られたトリメトキシシ
ランは44.4gであり、その残存率は97.0%であつ
た。
しかし、比較のために上記においてエポキサイ
ド類を全く添加せずに上記と同じように処理して
得た留出液についてガスクロマトグラフ分析をし
たところ、このトリメトキシシラン量は25.2gで
残存率は55.1%であつた。[Table] Example 4, Comparative Example 5 1 g of ethylene glycol diglycidyl ether was added to 100 g of the distillate obtained in Example 1, and this was added to a 200 ml glass tube equipped with a 20 mmφ, 50 cm distillation column filled with a glass coil pack. The distillate was placed in a flask and distilled for 5 hours, and after the completion of the distillation, gas chromatography analysis of the distillate and the residue from the pot revealed that the amount of trimethoxysilane obtained was 44.4 g, with a residual rate of 97.0%. However, for comparison, gas chromatographic analysis of the distillate obtained by the same treatment as above without adding any epoxides revealed that the amount of trimethoxysilane was 25.2 g and the residual rate was 55.1. It was %.
Claims (1)
在下に反応させて得られるトリアルコキシシラン
を含む反応生成液中にエポキサイド類を存在させ
ることを特徴とするトリアルコキシシランの製造
方法。 2 エポキサイド類がフエニルグリシジルエーテ
ル、エチレングリコールジグリシジルエーテル、
シクロヘキセンオキサイドから選択される特許請
求の範囲第1項記載のトリアルコキシシランの製
造方法。 3 アルキルアルコールがメチルアルコールであ
る特許請求の範囲第1項または第2項記載のトリ
アルコキシシランの製造方法。[Claims] 1. Production of trialkoxysilane, characterized in that epoxides are present in a reaction product solution containing trialkoxysilane obtained by reacting silicon and alkyl alcohol in the presence of a copper catalyst. Method. 2 Epoxides include phenyl glycidyl ether, ethylene glycol diglycidyl ether,
The method for producing a trialkoxysilane according to claim 1, wherein the trialkoxysilane is selected from cyclohexene oxide. 3. The method for producing trialkoxysilane according to claim 1 or 2, wherein the alkyl alcohol is methyl alcohol.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59120997A JPS611694A (en) | 1984-06-13 | 1984-06-13 | Preparation of trialkoxysilane |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59120997A JPS611694A (en) | 1984-06-13 | 1984-06-13 | Preparation of trialkoxysilane |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS611694A JPS611694A (en) | 1986-01-07 |
JPS6323196B2 true JPS6323196B2 (en) | 1988-05-16 |
Family
ID=14800225
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59120997A Granted JPS611694A (en) | 1984-06-13 | 1984-06-13 | Preparation of trialkoxysilane |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS611694A (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1323037C (en) * | 1987-02-23 | 1993-10-12 | Yoshiro Ohta | Process for the production of trialkoxysilanes |
US4762939A (en) * | 1987-09-30 | 1988-08-09 | Union Carbide Corporation | Process for trialkoxysilane/tetraalkoxysilane mixtures from silicon metal and alcohol |
US4999446A (en) * | 1990-06-21 | 1991-03-12 | Union Carbide Chemicals And Plastics Company Inc. | Trimethoxysilane preparation via the methanol-silicon reaction with recycle |
-
1984
- 1984-06-13 JP JP59120997A patent/JPS611694A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS611694A (en) | 1986-01-07 |
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