JPS63308321A - Device for washing semiconductor wafer - Google Patents

Abstract

PURPOSE:To always hold the quality of pure water preferable by controlling the flow rate of the water by a signal from a measuring unit for measuring the specific resistance of the water and a signal from a particle counter for detecting the number of particles in the water. CONSTITUTION:A sensor 2 for measuring pure water specific resistance in a pure water tank 1, a particle counter 3a for detecting the number of particles in the water, a sampling tube 3b and a flowrate controller 4 are provided. The specific resistance of the water and the number of the particles are detected, electric signals are fed to the controller 4 to control the flow rate of the water flowing through a feed pipe 5, and the water is supplied to the tank 1. The water accumulated in the tank 1 always overflows or is exhausted through drain pipes 6a, 6b, or exhausted by opening a drain valve 7. Thus, when washing is not conducted, the least necessary flow rate of the wafer is maintained, and the washing is treated with optimum quality of the water, thereby shortening the recovery time of the quality of the water.

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a semiconductor water washing device, and more particularly to a device that senses the quality of pure water and supplies pure water at an optimal flow rate.

[Conventional technology]

Conventionally, the pure water flow rate control device of this type of semiconductor water washing equipment simply controls the flow rate of the delivered pure water of a certain quality, and has the function of sending only a certain amount into the equipment.

[Problem that the invention seeks to solve]

The conventional pure water flow rate control device for semiconductor wafer washing equipment described above simply keeps the flow rate of pure water constant and controls the quality of the pure water, so even when semiconductor wafers are not being washed, This consumes the same amount of pure water as washing the wafer with water, and the flow rate of pure water supplied into the equipment is constant, so there is a drawback that it takes a long time to recover after the quality of pure water deteriorates. .

SUMMARY OF THE INVENTION An object of the present invention is to provide a semiconductor wafer washing apparatus in which the above-mentioned drawbacks are solved and the quality of pure water can always be maintained at a good level.

[Means for solving problems]

The configuration of the semiconductor wafer washing apparatus of the present invention includes a sensor that measures the resistivity of pure water, and a particle counter that detects the number of particles in the pure water, and is controlled based on the resistivity value and the number of particles. It is characterized by being equipped with a flow rate controller.

〔Example〕

Next, the present invention will be explained in detail with reference to the drawings.

FIG. 1 is a sectional view of a semiconductor wafer/washing apparatus according to a first embodiment of the present invention. In the figure, the present semiconductor wafer washing apparatus includes a pure water tank 1, a sensor 2 for measuring the specific resistance of pure water in the main tank 1, a particle counter 3a for detecting the number of particles in the pure water, and a sampling tube 3b. and a flow rate controller 4, the specific resistance of pure water,
The number of particles is detected and an electric signal is sent to the flow rate controller 4 to control the flow rate of pure water flowing through the water pipe 5 and supplied to the pure water tank 1. The pure water accumulated in the pure water tank 1 always overflows and is drained through the drain pipes 6a, 6b or by opening the drain pulp 7.

FIG. 2 is a sectional view showing a semiconductor wafer/washing apparatus according to a second embodiment of the present invention. In the figure, the quality of pure water in a pure water tank 1 of the semiconductor wafer washing apparatus of this embodiment is determined by a flow rate controller 4 in a water pipe 5 based on values from a resistivity measuring device 2 and particle counters 3a and 3b. The flow rate of pure water flowing through is controlled and kept constant. In addition, when taking out a semiconductor wafer from the pure water tank 1, in order to prevent particles floating on the water surface from adhering to the semiconductor wafer, the pure water is removed by overflowing, but when the number of particles increases, The pump 8 is started, and the pure water on the water surface is forcibly drained from the suction ports 9a and 9b. In this embodiment, the particles on the water surface are not only removed by overflowing, but also forcibly discharged, which has the advantage that the time required for the quality of pure water to recover is quicker. In FIG. 2, parts similar to those in FIG. 1 are designated by the same numbers.

〔Effect of the invention〕

As explained above, the present invention enables the flow rate of pure water to be supplied to be controlled by the specific resistance value of pure water and the number of particles in the pure water, so that when no washing process is performed, the flow rate of pure water is the minimum necessary. This has the effect that the water can be treated in the optimal quality of pure water during maintenance and washing, and the time required to recover the quality of pure water can be shortened.

[Brief explanation of the drawing]

FIG. 1 is a sectional view of a semiconductor wafer washing apparatus according to a first embodiment of the invention, and FIG. 2 is a sectional view of a semiconductor wafer washing apparatus according to a second embodiment of the invention. 1... Pure water tank, 2... Sensor of specific resistance measuring device, 3a
... Particle counter, 3b... Sampling tube, 4... Flow rate controller, 5... Pure water supply pipe, 6a, 6b... Drainage pipe, 7... Drainage pulp, 8... Suction pump, 9a, 9b,... suction port. Agent Patent Attorney Otoki Uchihara 17

Claims (1)

[Claims] It is characterized by comprising a flow rate controller that controls the flow rate of pure water based on a signal from a measuring device that measures the specific resistance value of pure water and a signal from a particle counter that detects the number of particles in the pure water. Semiconductor wafer washing equipment.