JPS63305359A - Pellicle film storing case for semiconductor - Google Patents
Pellicle film storing case for semiconductorInfo
- Publication number
- JPS63305359A JPS63305359A JP62141769A JP14176987A JPS63305359A JP S63305359 A JPS63305359 A JP S63305359A JP 62141769 A JP62141769 A JP 62141769A JP 14176987 A JP14176987 A JP 14176987A JP S63305359 A JPS63305359 A JP S63305359A
- Authority
- JP
- Japan
- Prior art keywords
- pellicle
- base
- case
- frame
- dust
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims 2
- 239000012790 adhesive layer Substances 0.000 abstract description 3
- 238000007689 inspection Methods 0.000 abstract description 3
- 239000011521 glass Substances 0.000 abstract description 2
- 239000010453 quartz Substances 0.000 abstract description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 2
- 239000012780 transparent material Substances 0.000 abstract description 2
- 239000007787 solid Substances 0.000 abstract 1
- 239000000428 dust Substances 0.000 description 22
- 239000010410 layer Substances 0.000 description 8
- 239000012528 membrane Substances 0.000 description 7
- 239000000853 adhesive Substances 0.000 description 5
- 230000001070 adhesive effect Effects 0.000 description 5
- 238000004140 cleaning Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 235000001270 Allium sibiricum Nutrition 0.000 description 1
- 241000218691 Cupressaceae Species 0.000 description 1
- 241000270666 Testudines Species 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
【発明の詳細な説明】
〔頬業上の利用分野」
本発明は半畳体用ペリクルの連撮ならびに保管に使うた
めのケースに関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of practical application] The present invention relates to a case for use in continuous photographing and storage of a pellicle for a semi-folded body.
従来、この檜のケースは、第４図に示すような構造とな
っていた。Conventionally, this cypress case had a structure as shown in Fig. 4.
〔発明が解決しようとする問題点Ｊ
上述した従来のケースを使った場合は、ペリクルがその
ままケースに入っているので
（１）強度の弱いフレームをペリクルにされらぬ様横か
らハンドリングしなければならず自動化が困難０
（２）弱い７レームをしっかり支えながら、７−ルテー
グをう１ぐはかれやすい方向にはがさなければならず、
自動化が融かしい。[Problem to be solved by the invention J] When using the conventional case described above, the pellicle remains in the case, so (1) the weak frame must be handled from the side to avoid becoming a pellicle. (2) While firmly supporting the weak 7-reim, the 7-luteigue must be peeled off in a direction that makes it easier to peel off.
Automation is easy.
（３）ペリクル膜単体でのゴミ検量をする際、ペリクル
の内面や、フレーム内面 かゴミ九対して無防備となる
。(3) When measuring dust on a single pellicle membrane, the inner surface of the pellicle and the inner surface of the frame are exposed to dust.
（４）フレームを直接ハンドリングする機会が多く、フ
レームやペリクル膜にゴミやキズがつきやすい。(4) The frame is often handled directly, and the frame and pellicle membrane are prone to dust and scratches.
（５）ケース内面の洗浄でとり切れなかったゴミや、ケ
ース開閉時のゴミが、ペリクル内面や、フレーム内面に
つきやすい。(5) Dust that cannot be removed by cleaning the inside of the case, or dust from opening and closing the case, tends to stick to the inside of the pellicle or frame.
というような欠点があった。There were some drawbacks.
＊ｌ ペリクルやフレームの内面にゴミが、ちるとペリ
クル貼付後ゴミがペリクル内に射入されるため問題が大
きい。*l If dust falls on the inside of the pellicle or frame, the problem is serious because the dust will enter the pellicle after the pellicle is attached.
第１図は本発明の一実施例の断面図である。フレーム３
に貼シつけられたペリクル膜２を接着層９をかいしてベ
ースＩＫ貼り、ケース内で支柱６によシなるべく接触面
積を少なくした状態で、支持しておく。この状態でケー
ス上ブタ４を、取手８を図の右方向に引っ張υながら上
にはねあげるト、ケース上ブタ４はペリクルフレーム３
やベース１にこすらず（つまシゴミを発生せず）Ｋ持ち
上げられる。FIG. 1 is a sectional view of an embodiment of the present invention. frame 3
The pellicle membrane 2 pasted on the base IK is pasted through the adhesive layer 9, and is supported by the pillars 6 in the case with the contact area as small as possible. In this state, flip up the case top 4 while pulling the handle 8 to the right in the figure.
It can be lifted without rubbing against the base 1 (without creating dust).
ペリクル（以後フレーム３にペリクル膜２を貼ったもの
全体をこういう）をゴミ検量してからレチクルやマスク
に貼る場合は、フォークのようなものをつかってベース
１をケース上ブタ５の支柱６から持ち上げ、ベース１に
ペリクルを貼ったままでまずゴミ検量を行なう。この際
、ベース１をガラスや石英等の透明な材質で、平面度が
良い板にすれば、ベース下部からもペリクルの検査がで
きるし、図の上側からレーザ等を使ってゴミ検量する際
も、レーザ光の角度を適当に決めてやれば、レーザの検
査光を図の上側に反射させずにベース１を透過させるこ
とができるので、検査光の処理（吸収等）上有利である
。又、ベース１を真黒な色の材質で、表面が散乱光を発
しない処理をしておけば、スボ、ドライド等による目視
検量の際、ペリクル上のよ〕小さなゴミまでうまく見て
検査することができる。いずれのゴミ検糞力法を使った
場合でもペリクルはベース１に貼ったまま、検査できる
ため、ペリクル膜２やフレーム３の内面にゴミが付着す
る可能性をゼロにできるという特徴がある。父、この場
合、ベースｌをハンドリングすることによりペリクルに
ゴミやキズがつくのを防止することもできる。When attaching a pellicle (hereinafter referred to as the entire frame 3 with pellicle membrane 2 attached) to a reticle or mask after measuring dust, use a fork-like object to move the base 1 from the support 6 of the cover 5 on the case. Lift it up and first perform a dust measurement with the pellicle still attached to base 1. At this time, if the base 1 is made of a transparent material such as glass or quartz with good flatness, the pellicle can be inspected from the bottom of the base, and it can also be used when measuring dust using a laser etc. from the top of the figure. If the angle of the laser beam is appropriately determined, the laser inspection light can be transmitted through the base 1 without being reflected upward in the figure, which is advantageous in terms of processing (absorption, etc.) of the inspection light. In addition, if the base 1 is made of a jet black material and the surface is treated to not emit scattered light, it will be possible to see and inspect even the smallest particles on the pellicle during visual inspection using a subo, dry drive, etc. Can be done. Regardless of which dust detection force method is used, the pellicle can be inspected while attached to the base 1, so the possibility of dust adhering to the inner surface of the pellicle membrane 2 or frame 3 can be reduced to zero. In this case, handling the base l can also prevent dirt and scratches from forming on the pellicle.
ゴミ検量で合格となったペリクルは次の段階で、きれい
に洗＃されたレチクルやマスクに貼りつければ良い。The next step is to attach a pellicle that passes the dust calibration to a clean reticle or mask.
もしゴミ検量せずにレチクルやマスクにペリクルを貼り
つければ良い時には、ゴミ検がない分ペリクルの外側に
ゴミかっ＜ｏｌＪ惰性を減らすことができる。If it is sufficient to attach the pellicle to the reticle or mask without checking for dust, the inertia of dust on the outside of the pellicle can be reduced since there is no dust check.
次に接層層９について詳しく説明する。第２図は接層層
９の拡大図である。通常は７−ルテーグ９−２をペリク
ルフレームから、はがす作業を省くため、／−ルテーグ
９−２とＢ接層層９−３の接着力を、シールチーブ９−
２とＡ接層層９−１より弱くしておき、フＶ−ム３を持
ち上げるだけでベース１と分離できる様にしておく。も
ちろん何らかの理由で、ペリクルとベース１を分離した
後で、シールチーブ９−２をはがしたい場合は、上とは
逆に７−ルデーグ９−２とＢ接層層９−３の接着力を、
７−ルテーグ９−２とＡ接層層９−１より頚くしておけ
ば艮い。Next, the contact layer 9 will be explained in detail. FIG. 2 is an enlarged view of the contact layer 9. Normally, in order to save the work of peeling off the 7-Letegue 9-2 from the pellicle frame, the adhesive strength between the /-Letegue 9-2 and the B contact layer 9-3 is
2 and A contact layer 9-1, so that it can be separated from the base 1 by simply lifting the frame 3. Of course, if for some reason you want to peel off the sealing chip 9-2 after separating the pellicle and base 1, change the adhesive strength between the 7-rudaigue 9-2 and the B contact layer 9-3 in the opposite way to the above.
7- It will be fine if the neck is set higher than the luteague 9-2 and the A contact layer 9-1.
第３図は本発明の実施例２０萌囲図である。基本的な考
え刀は夾Ｍ？ＩＪｌと同じであるがペリクルとベース１
（１）関係が逆にしである。これはベース１を完揄に洗
浄できる場合、ケース上ブタ等からペリクル上に落下し
てきて付層するゴミを防ぐことができるオリ点を有する
。ただし、この場合、ベース１とペリクルの接着強度は
、ペリクルが落下しない程度にする心安がある。FIG. 3 is a diagram showing a 20th embodiment of the present invention. Basic idea: Is the sword Kyo M? Same as IJl but with pellicle and base 1
(1) The relationship is reversed. If the base 1 can be thoroughly cleaned, it has an origin point that can prevent dust from falling from the top of the case, etc. onto the pellicle and forming a layer on the pellicle. However, in this case, it is safe to ensure that the adhesive strength between the base 1 and the pellicle is such that the pellicle does not fall.
〔発明の効果Ｊ
以上説明したように本発明は、固い板状でペリクルを持
ち上げるだけで簡単にはがせるベースをケース内に有し
、ケースをフォーク等を入れやすい構造としてやること
Ｋより、
（１）ペリクルをケースの外へ取り出す作業の自動化が
容易。[Effects of the Invention J As explained above, the present invention has a hard plate-shaped base in the case that can be easily removed by simply lifting the pellicle, and the case has a structure in which a fork etc. can be easily inserted. ) Easy to automate the process of taking the pellicle out of the case.
（２）シールチーブをはがす作業と、その自動化が容易
。(2) The work of peeling off the seal chives is easy to automate.
（３）ペリクル膜単体でのゴミ恢食時、ペリクルやフレ
ームの内面にゴミがつかない。(3) When removing dust from the pellicle membrane alone, dust does not stick to the inner surface of the pellicle or frame.
（４）フレームを直接ハンドリングする機会を最少限に
でき、フレームやペリクルにキズやゴミがつきにくい。(4) Opportunities for directly handling the frame can be minimized, and the frame and pellicle are less prone to scratches and dirt.
（５）ケース内面の洗浄でとりきれなかったゴミや、ケ
ース開閉時のゴミが、ペリクル内面やフレーム内面につ
きにくい。(5) Dust that cannot be removed by cleaning the inside of the case or dust from opening and closing the case is less likely to stick to the inside of the pellicle or frame.
というような効果がある。There is an effect like this.
第１図は本発明の実施例１の断面図、第２図は接Ｎ層部
の拡大図、第３図は本発明の実施例２０町面図、第４図
は従来のペリクルケースの断面図例である。
１・・・・・・ベース、２・・・・・・ペリクル膜、３
・・・・・・（ペリクル）フレーム、４・・・・・・ケ
ース上ブタ、５・・・・・・ケース上ブタ、６・・・・
・・（ペリクル）支柱、７・・・・・・ケース足、８・
・・・・・（ケース開閉用）取手、９・・・・・・接着
層、９−１・・・・・・Ａ接層剤、９−２・・・・・・
ンールテーグ、９−３・・・・・・Ｂ接層剤。
亀＼ Ｎ〕
第２図
＼へ ｃＦ−煩Fig. 1 is a cross-sectional view of Embodiment 1 of the present invention, Fig. 2 is an enlarged view of the contact N layer portion, Fig. 3 is a top view of Embodiment 20 of the present invention, and Fig. 4 is a cross-section of a conventional pellicle case. This is an example. 1... Base, 2... Pellicle membrane, 3
...... (pellicle) frame, 4... Case top cover, 5... Case top cover, 6...
...(pellicle) pillar, 7...Case foot, 8.
......Handle (for opening and closing the case), 9...Adhesive layer, 9-1...A adhesive, 9-2...
Nurteig, 9-3...B adhesive. Turtle＼ N〕 Go to Figure 2＼ cF-N
Claims (1)
いて、ペリクル膜付フレームを簡単にはがせる固い板状
のベースを、ケース内部に有することを特徴とするケー
ス。A case for transporting and storing a pellicle film for semiconductors, characterized by having a hard plate-shaped base inside the case from which a frame with a pellicle film can be easily removed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62141769A JPS63305359A (en) | 1987-06-05 | 1987-06-05 | Pellicle film storing case for semiconductor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62141769A JPS63305359A (en) | 1987-06-05 | 1987-06-05 | Pellicle film storing case for semiconductor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63305359A true JPS63305359A (en) | 1988-12-13 |
Family
ID=15299747
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62141769A Pending JPS63305359A (en) | 1987-06-05 | 1987-06-05 | Pellicle film storing case for semiconductor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63305359A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09138498A (en) * | 1996-08-30 | 1997-05-27 | Nikon Corp | Pellicle housing container |
| EP0840169A1 (en) * | 1996-10-30 | 1998-05-06 | Micro Lithography, Inc. | Optical pellicle and package |
| JP2002323753A (en) * | 2001-04-25 | 2002-11-08 | Asahi Kasei Electronics Co Ltd | Pellicle housing container |
| US7780440B2 (en) | 2004-10-19 | 2010-08-24 | Canon Anelva Corporation | Substrate supporting/transferring tray |
| JP2011075662A (en) * | 2009-09-29 | 2011-04-14 | Toppan Printing Co Ltd | Pellicle, photomask, and semiconductor device |
| JP2016114905A (en) * | 2014-12-18 | 2016-06-23 | 信越化学工業株式会社 | Pellicle container for lithography |
-
1987
- 1987-06-05 JP JP62141769A patent/JPS63305359A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09138498A (en) * | 1996-08-30 | 1997-05-27 | Nikon Corp | Pellicle housing container |
| EP0840169A1 (en) * | 1996-10-30 | 1998-05-06 | Micro Lithography, Inc. | Optical pellicle and package |
| JP2002323753A (en) * | 2001-04-25 | 2002-11-08 | Asahi Kasei Electronics Co Ltd | Pellicle housing container |
| US7780440B2 (en) | 2004-10-19 | 2010-08-24 | Canon Anelva Corporation | Substrate supporting/transferring tray |
| JP2011075662A (en) * | 2009-09-29 | 2011-04-14 | Toppan Printing Co Ltd | Pellicle, photomask, and semiconductor device |
| JP2016114905A (en) * | 2014-12-18 | 2016-06-23 | 信越化学工業株式会社 | Pellicle container for lithography |
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