JPS63301000A - Exposing device - Google Patents

Abstract

PURPOSE:To obviate unequal exposing by extending a scanning range by synchrotron radiation light to the range on the outside of the pattern region of an original pattern. CONSTITUTION:The exposure of the synchrotron radiation light is more uniform nearer the central part of the scanning range and is not uniform at both end parts on account of the inertia of a reflecting mirror or the like. The incident synchrotron radiation light 5 on the reflecting mirror 4 is, therefore, reflected by the mirror 4 to reflected light 3. The mirror 4 is oscillated by an oscillating means, not shown in the figure, at this time. The scanning range 1 by the oscillated mirror 4 is extended to the outside of the mash exposing range 2, by which the exposure in the mask exposing range 2 is uniformized and the equal exposing is executed.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an exposure apparatus that uses synchrotron radiation, and particularly to an exposure apparatus that can uniformly transfer a large area mask pattern with high precision.

[Prior Art] Conventionally, in exposure equipment that uses synchrotron synchrotron radiation as a light source, since the synchrotron radiation has strong directionality, when directly projected onto a mask, only a band-shaped radiation beam is obtained. In order to spread the light, a method has been considered in which a reflecting mirror is provided in the optical path and the mirror is slightly oscillated to cause the band-shaped emitted light to reciprocate in the vertical direction.

[Problems to be Solved by the Invention] However, in the above conventional example, the distribution of the exposure amount within the scanning range of the synchrotron radiation light is not uniform due to the influence of the inertia of the reflecting mirror, resulting in uneven exposure. There were drawbacks.

In view of this drawback of the conventional example, an object of the present invention is to equalize the amount of exposure and eliminate uneven exposure in an exposure apparatus using synchrotron radiation as a light source.

[Means for Solving the Problems] In order to achieve the above object, the present invention provides an exposure method in which a pattern of the original is transferred onto a substrate by scanning an original with synchrotron radiation light by reflecting it with an oscillating reflecting mirror. In the apparatus, the scanning range by synchrotron radiation light extends to a predetermined range outside the pattern area of the original plate.

[Operation] In this configuration, the exposure amount of synchrotron radiation light is uniform in the center of the scanning range and non-uniform at both ends due to the inertia of the reflecting mirror, but the scanning range extends to the above-mentioned predetermined range. Therefore, in the pattern area of the original plate, synchrotron radiation light is irradiated in a relatively central area of the scanning range, and therefore in a portion where the exposure amount is relatively uniform.

That is, the predetermined range is determined so that the exposure amount in the pattern area of the original plate becomes a desired uniformity, thereby achieving even and uniform exposure.

[Example] Hereinafter, the present invention will be explained in detail using the drawings.

FIG. 1 is an explanatory diagram showing a synchrotron radiation scanning method in an exposure apparatus according to an embodiment of the present invention.

In the figure, synchrotron radiation 5 incident on a reflecting mirror 4 is reflected by the reflecting mirror 4 and becomes reflected light 3. At this time, the reflecting mirror 4 is swung by a swinging means (not shown), and the reflected light 3 Accordingly, a scanning range 1 including a mask exposure range 2 is scanned. This scanning range 1 corresponds to an area obtained by extending the mask exposure range 2 in the vertical direction. In this way, the pattern within the mask exposure range is transferred by the reflected light 3 onto a wafer (not shown) via a transfer means (not shown).

FIG. 2 is a graph showing the relationship between the position in the scanning direction and the exposure amount when the reflecting mirror 4 is vibrated in a sinusoidal manner within the scanning range 1 in FIG. As shown in the figure, the mask exposure range 2 corresponds to a relatively central part of the scanning range 1 as shown in the figure, and corresponds to a part where the exposure amount changes little. Therefore, according to this method, the exposure amount can be made uniform within the mask exposure range.

In the above description, an example has been described in which the reflecting mirror 4 is vibrated with a sine wave, but the present invention is not limited to this, and the reflecting mirror 4 may be operated with a movement that includes, for example, rotational movement.

[Effects of the Invention] As explained above, according to the present invention, in an exposure apparatus using synchrotron radiation as a light source, the exposure amount within the exposure range of an original plate, for example, a mask, can be made uniform to perform even exposure. Can be done.

[Brief explanation of the drawing]

FIG. 1 is an explanatory diagram showing a synchrotron radiation scanning method in an exposure apparatus according to an embodiment of the present invention, and FIG. 2 shows the exposure amount and exposure position in the synchrotron radiation scanning range of FIG. 1. It is a graph showing the relationship between 1: Scanning range, 2: Mask exposure range, 3: Reflected light, 4: Reflector, 5 Synchrotron radiation light. Patent Applicant Canon Co., Ltd. Representative Patent Attorney Tetsuya Ito Representative Patent Attorney Tatsuo Ito Figure 1-10- Food candles Figure 2

Claims (2)

[Claims] (1) A reflecting mirror that reflects synchrotron radiation; and by causing the reflecting mirror to move in a predetermined manner, the synchrotron radiation reflected by the reflecting mirror is directed onto the original in a predetermined direction and into a pattern on the original. and reflector driving means for scanning so that the scanning range extends to a predetermined range outside the area,
An exposure apparatus characterized in that an image of a pattern of the original is projected onto a substrate by synchrotron radiation light that is scanned over the original by the reflecting mirror drive means. (2) The exposure apparatus according to claim 1, wherein the movement of the reflecting mirror by the reflecting mirror driving means includes rotational movement or sinusoidal vibration.