JPS63300940A - Particle analyzing device - Google Patents

Particle analyzing device

Info

Publication number
JPS63300940A
JPS63300940A JP62135638A JP13563887A JPS63300940A JP S63300940 A JPS63300940 A JP S63300940A JP 62135638 A JP62135638 A JP 62135638A JP 13563887 A JP13563887 A JP 13563887A JP S63300940 A JPS63300940 A JP S63300940A
Authority
JP
Japan
Prior art keywords
light
photoelectric detector
scattered
particles
detector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62135638A
Other languages
Japanese (ja)
Inventor
Moritoshi Miyamoto
守敏 宮本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP62135638A priority Critical patent/JPS63300940A/en
Publication of JPS63300940A publication Critical patent/JPS63300940A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To adjust the quantity of light incident on a photoelectric detector corresponding to the intensity of forward scattered light by providing a means which adjusts the quantity of light incident on the photoelectric detector according to the intensity of light scattered by particles to be inspected. CONSTITUTION:Laser light L passes through an image formation optical system 2 and is projected on the particles to be inspected which flow in the communication part 3a of a flow cell 3, and the resulting forward scattered light passes through a convergence lens 5 and is incident on a halfmirror 7. Then, the scattered light after being reflected by the mirror 7 enters the photoelectric detector 9 and is converted into an electric signal, which is inputted to an arithmetic circuit 10 to calculate the quantity of scattered light passing through the mirror 7 from the quantity of the light incident on the photoelectric detector 9; and one of ND filters on an ND filter plate 8 is selected so that the detector 6 is not saturated, and moved by a driving circuit 11 on the optical axis 0. Thus, the means which adjusts the quantity of light incident on the detector 6 is provided to accurately measure the intensity of the light scattered by the particles to be inspected without saturating the detector 6.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、フローサイトメータ等に用いられ、検体粒子
による散乱光及び蛍光を検出することによって検体粒子
の性質を解析する粒子解析装置に関するものである。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a particle analysis device used in a flow cytometer or the like, which analyzes the properties of sample particles by detecting scattered light and fluorescence from the sample particles. It is.

[従来の技術] フローサイトメータとは、高速で流れる細胞浮遊溶液、
即ちサンプル液に例えばレーザー光を照射し、その散乱
光・蛍光による光電信号を検出し、細胞の性質・構造を
解明する装置であり、細胞化学、免疫学、血液学、腫瘍
学、遺伝学等の分野で使用されている。
[Conventional technology] A flow cytometer is a cell suspension solution that flows at high speed.
In other words, it is a device that elucidates the properties and structure of cells by irradiating a sample liquid with, for example, a laser beam and detecting a photoelectric signal from the scattered light and fluorescence.It is used in cytochemistry, immunology, hematology, oncology, genetics, etc. used in the field of

このフローサイトメータ等に用いられる従来の粒子解析
装置では、フローセルの中央部の例えば200 gmX
 200ルmの・微小な矩形断面を有する流通部内を、
シース液に包まれて通過する血球細胞などの被検粒子に
レーザー光等の照射光を照射し、その結果として生ずる
前方及び側方散乱光により、被検粒子の形状・大きさ・
屈折率等の粒子的性質を得ることが可使である。また、
蛍光剤により染色され得る被検粒子に対しては、照射光
とほぼ直角方向の側方散乱光から被検粒子の蛍光を検出
することにより、被検粒子を解析するための重要な情報
を求めることができる。
In conventional particle analysis devices used in flow cytometers, for example, 200 gm
Inside the flow section with a minute rectangular cross section of 200 lm,
Laser light or other light is irradiated onto test particles such as blood cells that pass through the sheath fluid, and the resulting forward and side scattered light is used to determine the shape, size, and shape of the test particles.
It is possible to obtain particle-like properties such as refractive index. Also,
For test particles that can be stained with a fluorescent agent, important information for analyzing the test particles is obtained by detecting the fluorescence of the test particles from side scattered light in a direction almost perpendicular to the irradiation light. be able to.

第2図は従来の粒子解析装置の構成図であり、レーザー
光源1から光軸Oに沿って、結像光学系2、フローセル
3、遮光板4、集光レンズ5、光電検出器6が順次に配
置されており、フローセル3の中央部に設けられた流通
部3aには、紙面に対して垂直な方向に被検粒子が流れ
ている。また、結像光学系2は例えば2個のシリンドリ
カルレンズの軸を互いに直交に配置した光学系とされて
いる。
FIG. 2 is a configuration diagram of a conventional particle analysis device, in which an imaging optical system 2, a flow cell 3, a light shielding plate 4, a condensing lens 5, and a photoelectric detector 6 are sequentially arranged along the optical axis O from a laser light source 1. The particles to be detected flow in a direction perpendicular to the plane of the paper through a flow section 3a provided at the center of the flow cell 3. Further, the imaging optical system 2 is, for example, an optical system in which the axes of two cylindrical lenses are arranged orthogonally to each other.

レーザー光源lから出射するレーザー光束りは、結像光
学系2において任意の長径拳短径を有する楕円形のビー
ムに形成され、フローセル3の流通部3aを流れる被検
粒子に照射される。被検粒子によって散乱されないレー
ザー光束りは、遮光板4によって遮光され、被検粒子に
よる散乱光は集光レンズ5を介して光電検出器6に入射
し、光強度に応じた電気信号に変換される。
A laser beam emitted from the laser light source 1 is formed into an elliptical beam having an arbitrary major axis and minor axis in the imaging optical system 2, and is irradiated onto the test particles flowing through the flow section 3a of the flow cell 3. The laser beam that is not scattered by the test particles is blocked by the light shielding plate 4, and the light scattered by the test particles enters the photoelectric detector 6 via the condenser lens 5, where it is converted into an electrical signal according to the light intensity. Ru.

一般に、前方散乱光の強度は被検粒子の径に比例してい
るので、得られた光強度から被検粒子の径を算出するこ
とが可能であるが、同時に径の大き過ぎる被検粒子を4
1確定する際には、光電検出器6の出力が飽和し測定不
能となる問題点がある。
Generally, the intensity of forward scattered light is proportional to the diameter of the test particle, so it is possible to calculate the diameter of the test particle from the obtained light intensity. 4
1, there is a problem that the output of the photoelectric detector 6 becomes saturated and measurement becomes impossible.

このため従来の粒子解析装置においては、光電検出器日
の出力が飽和しないように光電検出器6の1■■にND
Dフイルタを配置し、光電検出器6への入射光量を調整
しながら測定を行っている。
For this reason, in conventional particle analyzers, in order to prevent the output of the photoelectric detector from becoming saturated, it is necessary to
A D filter is arranged and the measurement is performed while adjusting the amount of light incident on the photoelectric detector 6.

しかし、この方法では光電検出器6への入射光量を調整
する際に、過大な光量の光束が光電検出器6に入射する
虞れがあり、光電検出器6を損傷しその寿命を早めてし
まうことになる。また、この方法では光電検出器6への
入射光量に合わせてNDDフイルタ交換する必要があり
、誤操作を行う可能性があるばかりでなく、作業能率を
低下させてしまうという欠点がある。
However, in this method, when adjusting the amount of light incident on the photoelectric detector 6, there is a risk that an excessive amount of light may enter the photoelectric detector 6, which may damage the photoelectric detector 6 and shorten its lifespan. It turns out. In addition, this method requires replacing the NDD filter in accordance with the amount of light incident on the photoelectric detector 6, which has the drawback that not only is there a possibility of erroneous operation, but the work efficiency is reduced.

[発明の目的] 本発明の目的は、従来例の欠点を解除し、前方散乱光の
強度に対応して光電検出器に入射する光量を調節するこ
とが可能な粒子解析装置を提供することにある。
[Object of the Invention] An object of the present invention is to provide a particle analysis device capable of eliminating the drawbacks of the conventional example and adjusting the amount of light incident on a photoelectric detector in accordance with the intensity of forward scattered light. be.

[発明の概要] 上述の目的を達成するための本発明の要旨は、検体粒子
に光ビームを照射する照射光学系と、検体粒子による散
乱光を検出する光電検出器を含む検出光学系とを有し、
検体粒子による散乱光の強度に応じて前記光電検出器へ
の入射光量を調整する手段を備えたことを特徴とする粒
子解析装置である。
[Summary of the Invention] The gist of the present invention for achieving the above-mentioned object is to include an irradiation optical system that irradiates a light beam onto specimen particles, and a detection optical system that includes a photoelectric detector that detects light scattered by the specimen particles. have,
The particle analysis apparatus is characterized by comprising means for adjusting the amount of light incident on the photoelectric detector according to the intensity of light scattered by sample particles.

[発明の実施例] 本発明を第1図に図示の実施例に基づいて詳細に説明す
る。
[Embodiments of the Invention] The present invention will be explained in detail based on the embodiment shown in FIG.

第1図は本発明の実施例であり、第2図に示した従来例
と同一符号の部材は同じ部材を示し、同一の機能を有す
るものとする0本実施例においては、第2図に示す従来
例の集光レンズ5と光電検出器6の間の光軸O上に、斜
めに設けたハーフミラ−7、NDフィルタ板8が配置さ
れ、ハーフミラ−7の反射方向に光電検出器9が設けら
れ、光電検出器9の出力は演算回路10、駆動回路11
に順次に接続され、駆動回路11の出力によりNDフィ
ルタ板8を駆動するようになっている。
Fig. 1 shows an embodiment of the present invention, and members with the same symbols as those in the conventional example shown in Fig. 2 indicate the same members and have the same functions. A half mirror 7 and an ND filter plate 8 are disposed obliquely on the optical axis O between the condensing lens 5 and the photoelectric detector 6 in the conventional example shown in FIG. The output of the photoelectric detector 9 is connected to an arithmetic circuit 10 and a drive circuit 11.
are sequentially connected to the drive circuit 11, and the ND filter plate 8 is driven by the output of the drive circuit 11.

ハーフミラ−7は例えば入射光量の5%を反射し、残り
の95%を透過する特性を有しており、NDフィルタ板
8にはNDDフイルタ取り付けられており、駆動回路1
1により複数のNDDフイルタ内の1個が光軸O上に移
動される。
The half mirror 7 has a characteristic of, for example, reflecting 5% of the amount of incident light and transmitting the remaining 95%.An NDD filter is attached to the ND filter plate 8, and the drive circuit 1
1, one of the plurality of NDD filters is moved onto the optical axis O.

このように構成された粒子解析装置において、レーザー
光源1から出射されるレーザー光束りは、結像光学系2
を通りフローセル3の流通部3aを流れる被検粒子に照
射され、被検粒子による前方散乱光は集光レンズ5を介
してハーフミラ−7に入射する。ハーフミラ−7によっ
て反射された散乱光は光電検出器9に入射し、電気信号
に変換された後に演算回路10に入力される。そして演
算回路10において、光電検出器9に入射した光量から
ハーフミラ−7を通過する散乱光量を算出して、光電検
出器6が飽和しないようにNDフィルタ板板上上複数の
NDDフイルタ内の1個を選択して駆動回路11によっ
て光軸O上に移動する。これにより、光電検出器6が飽
和することなく前方散乱光の強度を測定することが可能
となる。
In the particle analysis apparatus configured in this way, the laser beam emitted from the laser light source 1 is transmitted through the imaging optical system 2.
The forward scattered light from the test particles enters the half mirror 7 via the condenser lens 5. The scattered light reflected by the half mirror 7 enters the photoelectric detector 9, converts it into an electrical signal, and then inputs it to the arithmetic circuit 10. Then, in the arithmetic circuit 10, the amount of scattered light passing through the half mirror 7 is calculated from the amount of light incident on the photoelectric detector 9, and one of the plurality of NDD filters on the ND filter plate is calculated so that the photoelectric detector 6 is not saturated. is selected and moved onto the optical axis O by the drive circuit 11. This makes it possible to measure the intensity of the forward scattered light without the photoelectric detector 6 becoming saturated.

上述した実施例においては、NDフィルタを用いて光電
検出器6への入射光量の調節を行っているが、電気的に
各領域の透過率を可変にすることができる液晶素子を用
いることも可能である。また、前方散乱光の光電検出器
6への入射光量を調節することによって、光電検出器6
が飽和することを防止しているが、側方散乱光について
も同様に光電検出器は飽和する可能性があるので、本発
明を適用することによって同様の効果を得ることができ
る。
In the embodiment described above, the amount of light incident on the photoelectric detector 6 is adjusted using an ND filter, but it is also possible to use a liquid crystal element that can electrically change the transmittance of each region. It is. In addition, by adjusting the amount of light incident on the photoelectric detector 6 of the forward scattered light, the photoelectric detector 6
However, since the photoelectric detector may be similarly saturated with side scattered light, the same effect can be obtained by applying the present invention.

更に、上述した実施例においてはハーフミラ−7とND
フィルタ板8を集光レンズ5と光電検出器6との間に配
置しているが、フローセル3と光電検出器6の間の光軸
O上であれば他の位置に配置してもよい、また、ハーフ
ミラ−7、光電検出器9を用いずに、光電検出器6の出
力によって光電検出器6への入射量を制御するようにし
てもよい。
Furthermore, in the embodiment described above, the half mirror 7 and the ND
Although the filter plate 8 is disposed between the condenser lens 5 and the photoelectric detector 6, it may be disposed at any other position as long as it is on the optical axis O between the flow cell 3 and the photoelectric detector 6. Alternatively, the amount of light incident on the photoelectric detector 6 may be controlled by the output of the photoelectric detector 6 without using the half mirror 7 or the photoelectric detector 9.

また、実施例は光量調整手段を検出光学系に設けたが、
レーザー光源1を含めた照射光学系に設けてもよい。
Further, in the embodiment, a light amount adjusting means was provided in the detection optical system, but
It may be provided in the irradiation optical system including the laser light source 1.

[発明の効果] 以上説明したように本発明に係る粒子解析装置は、光電
検出器への入射光量を調節する手段を設けることによっ
て、光電検出器が飽和することなく、被検粒子による散
乱光の強度を正確に測定できるという効果がある。
[Effects of the Invention] As explained above, the particle analysis device according to the present invention prevents the photoelectric detector from becoming saturated by providing a means for adjusting the amount of light incident on the photoelectric detector, and reduces the amount of light scattered by the particles to be detected. This has the effect of being able to accurately measure the strength of

【図面の簡単な説明】[Brief explanation of the drawing]

図面第1図は本発明に係る粒子解析装置の一実施例の構
成図であり、第2図は従来例の構成図である。 符号lはレーザー光源、2は結像光学系、3はフローセ
ル、4は遮光板、5は集光レンズ、6は光電検出器、7
はハーフミラ−18はNDフィルタ板、9は光電検出器
、10は演算回路、11は駆動回路である。
FIG. 1 is a block diagram of an embodiment of a particle analysis apparatus according to the present invention, and FIG. 2 is a block diagram of a conventional example. Symbol l is a laser light source, 2 is an imaging optical system, 3 is a flow cell, 4 is a light shielding plate, 5 is a condensing lens, 6 is a photoelectric detector, 7
The half mirror 18 is an ND filter plate, 9 is a photoelectric detector, 10 is an arithmetic circuit, and 11 is a drive circuit.

Claims (1)

【特許請求の範囲】 1、検体粒子に光ビームを照射する照射光学系と、検体
粒子による散乱光を検出する光電検出器を含む検出光学
系とを有し、検体粒子による散乱光の強度に応じて前記
光電検出器への入射光量を調整する手段を備えたことを
特徴とする粒子解析装置。 2、前記光量を調整する手段は光学的フィルタとした特
許請求の範囲第1項に記載の粒子解析装置。 3、前記光量を調整する手段は液晶素子とした特許請求
の範囲第1項に記載の粒子解析装置。
[Scope of Claims] 1. A detection optical system including an irradiation optical system that irradiates the sample particles with a light beam and a photoelectric detector that detects the light scattered by the sample particles, A particle analysis device characterized by comprising means for adjusting the amount of light incident on the photoelectric detector accordingly. 2. The particle analysis device according to claim 1, wherein the means for adjusting the amount of light is an optical filter. 3. The particle analysis device according to claim 1, wherein the means for adjusting the amount of light is a liquid crystal element.
JP62135638A 1987-05-30 1987-05-30 Particle analyzing device Pending JPS63300940A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62135638A JPS63300940A (en) 1987-05-30 1987-05-30 Particle analyzing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62135638A JPS63300940A (en) 1987-05-30 1987-05-30 Particle analyzing device

Publications (1)

Publication Number Publication Date
JPS63300940A true JPS63300940A (en) 1988-12-08

Family

ID=15156488

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62135638A Pending JPS63300940A (en) 1987-05-30 1987-05-30 Particle analyzing device

Country Status (1)

Country Link
JP (1) JPS63300940A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008241672A (en) * 2007-03-29 2008-10-09 Sysmex Corp Analyzer
JP2012108161A (en) * 2012-03-09 2012-06-07 Sysmex Corp Sample analyzer and sample analysis method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008241672A (en) * 2007-03-29 2008-10-09 Sysmex Corp Analyzer
JP2012108161A (en) * 2012-03-09 2012-06-07 Sysmex Corp Sample analyzer and sample analysis method

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