JPS6329932U - - Google Patents

Info

Publication number
JPS6329932U
JPS6329932U JP12331586U JP12331586U JPS6329932U JP S6329932 U JPS6329932 U JP S6329932U JP 12331586 U JP12331586 U JP 12331586U JP 12331586 U JP12331586 U JP 12331586U JP S6329932 U JPS6329932 U JP S6329932U
Authority
JP
Japan
Prior art keywords
load section
electrodes
plasma
capacitor
matching device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12331586U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12331586U priority Critical patent/JPS6329932U/ja
Publication of JPS6329932U publication Critical patent/JPS6329932U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Drying Of Semiconductors (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の一実施例であるプラズマ装置
の電源回路を示す回路図、第2図は従来例である
。 1……高周波電源、2……整合装置、3……負
荷部、6……容量。
FIG. 1 is a circuit diagram showing a power supply circuit of a plasma device which is an embodiment of the present invention, and FIG. 2 is a conventional example. 1... High frequency power supply, 2... Matching device, 3... Load section, 6... Capacity.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 真空容器内に電極を有し該電極間でプラズマを
発生可能な負荷部と、該負荷部にコイルを可変容
量とを組み合わせた整合装置を介して接続した高
周波電源とから成るプラズマ装置において、前記
整合装置の前記負荷部側の可変容量と前記負荷部
との間に容量を設けたことを特徴とするプラズマ
装置。
A plasma device comprising a load section having electrodes in a vacuum container and capable of generating plasma between the electrodes, and a high frequency power source connected to the load section via a matching device combining a coil and a variable capacitance. A plasma device characterized in that a capacitor is provided between a variable capacitor on the load section side of the matching device and the load section.
JP12331586U 1986-08-13 1986-08-13 Pending JPS6329932U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12331586U JPS6329932U (en) 1986-08-13 1986-08-13

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12331586U JPS6329932U (en) 1986-08-13 1986-08-13

Publications (1)

Publication Number Publication Date
JPS6329932U true JPS6329932U (en) 1988-02-27

Family

ID=31014304

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12331586U Pending JPS6329932U (en) 1986-08-13 1986-08-13

Country Status (1)

Country Link
JP (1) JPS6329932U (en)

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