JPS6328805A - Method for preventing sticking of splash to water or gas spraying nozzle - Google Patents

Method for preventing sticking of splash to water or gas spraying nozzle

Info

Publication number
JPS6328805A
JPS6328805A JP17135186A JP17135186A JPS6328805A JP S6328805 A JPS6328805 A JP S6328805A JP 17135186 A JP17135186 A JP 17135186A JP 17135186 A JP17135186 A JP 17135186A JP S6328805 A JPS6328805 A JP S6328805A
Authority
JP
Japan
Prior art keywords
molten metal
gas
nozzle
water
pressure water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17135186A
Other languages
Japanese (ja)
Inventor
Kiyohide Hayashi
林 清英
Kiyoshi Suzuki
喜代志 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daido Steel Co Ltd
Original Assignee
Daido Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daido Steel Co Ltd filed Critical Daido Steel Co Ltd
Priority to JP17135186A priority Critical patent/JPS6328805A/en
Publication of JPS6328805A publication Critical patent/JPS6328805A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To prevent metal splashes from sticking to a nozzle for spraying high-pressure water, etc., and to efficiently pulverize a molten metal by allowing low pressure water or gas to flow down along the wall surface of said nozzle at the time of blowing the high-pressure water or gaseous flow to the flowing down molten metal and producing the fine particulate powder. CONSTITUTION:The molten metal in a crucible 5 is dropped in the form of molten metal flow 6 from the hole in the bottom of the crucible and the high- pressure water or high-pressure gas from a conduit 2 is ejected from a diagonal downward ejection port 3 of the annular nozzle 1 to the molten metal flow 6 in such a manner that the energy focus 4 thereof aligns to the molten metal flow 6 to pulverize the molten metal to the fine metallic powder 7. A nozzle 8 to eject the low-pressure water or gas is provided above the annular nozzle 1 to allow the water or gas to flow down along the inside wall provided with the ejection port 3 of the nozzle 1. The clogging of the ejection port 3 by the splashes of the molten metal generated at the time of pulverizing the molten metal by the high-pressure water or the like is prevented and the fine metallic powder is produced with the stable operation at a high yield.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は水又はガス噴霧法による金属微粉末の製造技術
に係り、より詳細には、水噴霧又はガス噴霧時に発生す
るスプラッシュの噴霧ノズルへの付着防止方法に関する
Detailed Description of the Invention (Industrial Application Field) The present invention relates to a technology for producing fine metal powder by water or gas spraying, and more specifically, to a spray nozzle for generating splash generated during water or gas spraying. This invention relates to a method for preventing the adhesion of.

(従来の技術及び解決しようとする問題点)金属粉末の
製造法には種々の方法があるが、就中、水噴霧法やガス
噴霧法は良好な性状の微粉末を製造し得る方法として知
られている。
(Prior art and problems to be solved) There are various methods for producing metal powder, and among them, water spraying and gas spraying are known as methods that can produce fine powder with good properties. It is being

これらの噴霧法は、第4図に示すように、導管2から環
状のノズル1に供給した高圧の水又はガスを噴出孔3よ
り科目下向きに噴出させることにより、円錐状の水又は
ガス流を形成し、その頂点であるエネルギー集束部4に
上方のルツボ5から溶湯金属6を供給、て霧化させ、微
粉末7を得る方法である。
These spraying methods produce a conical water or gas stream by jetting high-pressure water or gas supplied from a conduit 2 to an annular nozzle 1 downward from an ejection hole 3, as shown in Figure 4. In this method, a fine powder 7 is obtained by supplying molten metal 6 from an upper crucible 5 to an energy convergence part 4, which is the apex thereof, and atomizing it.

ところで、この水噴霧法及びガス噴霧法では、第5図に
示すように、水又はガス流が形成する円錐の頂点4の角
度θ、底辺のノズル間隔り及び斜辺の長さQが適切な値
となるように高圧水又はガスの圧力、速度等を決定する
ことが良好な性状の微粉末を効率よく製造するうえで重
要であり、例えば、角度Oは通常30〜60℃の範囲で
選定され、効率を上げるにはQを小さくし、高圧水又は
ガスの圧力、速度を増大して頂点のエネルギーを大きく
する。
By the way, in this water spray method and gas spray method, as shown in FIG. 5, the angle θ of the apex 4 of the cone formed by the water or gas flow, the nozzle interval at the base, and the length Q of the oblique side are set to appropriate values. It is important to determine the pressure, velocity, etc. of high-pressure water or gas so that the To increase efficiency, reduce Q and increase the pressure and velocity of high-pressure water or gas to increase the energy at the peak.

一方、水又はガス圧は100kg/cm2以上、通常1
50kg/cnT程度であるが、より微細な微粉末(例
、I Q μm以下)を得るには500 kg/Cod
位の高圧にする必要がある。
On the other hand, the water or gas pressure is 100 kg/cm2 or more, usually 1
It is about 50 kg/cnT, but to obtain finer powder (e.g. I Q μm or less), it is 500 kg/Cod.
It is necessary to make the pressure as high as possible.

しかし乍ら、粒径の小さな微粉末を得ようとして水又は
ガス圧、速度を大きくしたり、或いは底辺り及び斜辺葛
を小さくしたりすると、頂点のエネルギー集束部からス
プラッシュが発生し、上方に飛散する現象が生ずる。こ
れは霧化効率を低下させると共にノズルの環状内壁にス
プラッシュが付着し、極端な場合にはノズル噴出孔に堆
積して閉塞することになる。
However, if the water or gas pressure and speed are increased in an attempt to obtain fine powder with a small particle size, or if the bottom and diagonal angles are decreased, a splash is generated from the energy convergence part at the apex and upward. A scattering phenomenon occurs. This reduces the atomization efficiency and also causes the splash to adhere to the annular inner wall of the nozzle and, in extreme cases, to deposit and block the nozzle nozzle orifice.

(発明の目的) 本発明は、上記従来技術の欠点を解消し、水又はガス噴
霧時に発生するスプラッシュがノズル環状内壁に付着す
るのを効果的に防止し、効率よく溶湯金属を霧化する方
法を提供することを目的とするものである。
(Object of the Invention) The present invention solves the above-mentioned drawbacks of the prior art, effectively prevents the splash generated during water or gas spraying from adhering to the annular inner wall of the nozzle, and efficiently atomizes molten metal. The purpose is to provide the following.

(発明の構成) 上記目的を達成するため、本発明者は、霧化効率を向上
する条件にて水又はガス噴霧を実施しても、発生したス
プラッシュがノズル環状内壁に付着乃至堆積しない方策
を見い出すべく鋭意研究を重ねた結果、スプラッシュが
付着し易い噴霧ノズル壁面に沿って低圧水又はガスを流
下させるならば、−旦付着したスプラッシュが容易に洗
い流され、ノズル壁面でのスプラッシュ堆積を防止でき
ることを見い出し、本発明をなしたものである。
(Structure of the Invention) In order to achieve the above object, the present inventor devised a method to prevent the generated splash from adhering to or accumulating on the annular inner wall of the nozzle even when water or gas is sprayed under conditions that improve the atomization efficiency. As a result of intensive research to find out, if low-pressure water or gas is allowed to flow down along the spray nozzle wall where splash easily adheres, the splash that has already adhered can be easily washed away and splash accumulation on the nozzle wall can be prevented. The present invention was made based on this discovery.

以下に本発明を実施例に基づいて詳細に説明する。The present invention will be explained in detail below based on examples.

前述の如く、水噴霧法又はガス噴霧法においてより微細
で性状のよい微粉末を得るためには、スプラッシュの発
生を容認した条件で噴霧することになるが、この場合、
本発明によれば、簡易な手段によってスプラッシュの付
着乃至堆積を防止できるので、霧化効率を大幅に向上で
き、しかも噴霧ノズルの目詰りを生じることなく安定し
て水噴霧又はガス噴霧を行うことが可能となる。
As mentioned above, in order to obtain finer powder with better properties in the water atomization method or the gas atomization method, spraying must be performed under conditions that allow the generation of splash, but in this case,
According to the present invention, adhesion or accumulation of splash can be prevented by simple means, so atomization efficiency can be greatly improved, and water spray or gas spray can be performed stably without clogging the spray nozzle. becomes possible.

(実施例) 第1図は本発明の一実施例を示す図であり、スプラッシ
ュ付着防止のための水又はガスをノズル内側にスパイラ
ル状に供給する態様である。この場合、低圧ノズル8を
噴霧ノズル1の上方に臨ませて、このノズル8から水又
はガスを噴霧用水又はガス圧(例、200kg/aI)
よりも低圧でスパイラル状に噴出させ、噴霧ノズル1の
噴出孔3が設けられている環状内壁面に沿って流下させ
る。そのための水又はガスは噴霧用水又はガス圧よりも
約20%程度低い圧力とするのが好ましい。
(Embodiment) FIG. 1 is a diagram showing an embodiment of the present invention, in which water or gas for preventing splash adhesion is supplied spirally inside a nozzle. In this case, the low pressure nozzle 8 is placed above the spray nozzle 1, and water or gas is sprayed from the nozzle 8 at a spraying water or gas pressure (for example, 200 kg/aI).
The liquid is ejected in a spiral manner at a lower pressure than the above, and is caused to flow down along the annular inner wall surface where the ejection holes 3 of the spray nozzle 1 are provided. The pressure of the water or gas for this purpose is preferably about 20% lower than the pressure of the water or gas for spraying.

スプラッシュ付着防止用の水又はガスは、水噴霧時には
水を用いる如く、同種の流体を用いるのが望ましいが、
それ以外の態様であっても支障はない。
It is desirable to use the same type of fluid as water or gas for preventing splash adhesion, just as water is used when spraying water.
There is no problem even in other embodiments.

なお、噴霧条件は従来と同様であるが、上記手段を採用
することにより、−層好条件で水噴霧又はガス噴霧する
ことができる。
Although the spraying conditions are the same as those of the conventional method, water spraying or gas spraying can be performed under favorable conditions by employing the above-mentioned means.

第2図は本発明の他の実施例を示す図であり、スプラッ
シュ付着防止のための水又はガスを低圧ノズル9から噴
霧ノズル1の環状内壁面に沿って平行に流下させる態様
である。
FIG. 2 is a diagram showing another embodiment of the present invention, in which water or gas for preventing splash adhesion is caused to flow down from the low-pressure nozzle 9 in parallel along the annular inner wall surface of the spray nozzle 1.

第3図は第2図に示した態様の変形例を示しており、低
圧水又はガスを低圧ノズル9から内壁面に沿って流下さ
せた場合、発生する水蒸気を上方に円滑に逸散させて滞
留するのを防止するために予備板10を設けた例である
。この予備板1oは、低圧水又はガスの流下を内壁面に
できるだけ近接させて行うためには、可能な限り薄いも
のが好ましい。なお、必ずしも全面に延在させる必要は
なく、噴出孔3の上方で円周方向に処々設けてもより)
FIG. 3 shows a modification of the embodiment shown in FIG. 2, in which when low-pressure water or gas is made to flow down from the low-pressure nozzle 9 along the inner wall surface, the generated water vapor is smoothly dissipated upward. This is an example in which a spare plate 10 is provided to prevent stagnation. The preliminary plate 1o is preferably as thin as possible in order to allow the low-pressure water or gas to flow down as close to the inner wall surface as possible. Note that it does not necessarily have to extend over the entire surface, and may be provided here and there in the circumferential direction above the nozzle 3).
.

なお、上記各実施例では、低圧水又はガスの供給をスパ
イラル状又は鉛直状に行う場合を例示したが、それらの
態様を組合わせてもよく、また噴震ノズル1の内壁面に
角度をもたせて吹き付けるなど、適宜に設計変更が可能
である。
In each of the above embodiments, low-pressure water or gas is supplied in a spiral or vertical manner, but these modes may be combined, or the inner wall surface of the seismic nozzle 1 may be provided at an angle. The design can be changed as appropriate, such as by spraying with

(発明の効果) 以上詳述したように1本発明によれば、水噴霧又はガス
噴霧時に発生するスプラッシュが噴霧ノズルに付着乃至
堆積するのを防止することができるので、スプラッシュ
付着によるトラブルを懸念することなく好条件で水噴霧
又はガス噴霧を実施することができ、霧化効率を20〜
30%の如く大幅に向上でき、しかも10μm以下の微
粉末も容易に製造することが可能である。
(Effects of the Invention) As detailed above, according to the present invention, it is possible to prevent the splash generated during water spraying or gas spraying from adhering or accumulating on the spray nozzle, so there is no concern about troubles due to splash adhesion. Water atomization or gas atomization can be carried out under favorable conditions without
This can be significantly improved by 30%, and it is also possible to easily produce fine powder of 10 μm or less.

【図面の簡単な説明】[Brief explanation of drawings]

第1図乃至第3図は各々本発明の一実施例を示す説明図
、第4図は従来の水噴霧又はガス噴霧法を示す説明図、
第5図は水噴霧又はガス噴霧時の高圧水又はガス流の形
状を示す説明図である。 1・水又はガス噴霧ノズル、2・・・導管、3・・噴出
孔、4・・・高圧水又はガス流のエネルギー集束部、5
・・ルツボ、6・・・溶湯金属、7・・・微粉末、8.
9・・低圧ノズル、10・・予備板。 特許出願人   大同特殊鋼株式会社 代理人弁理士  中  村   尚 第1図 第2図 第3図 第4図 第5図
FIGS. 1 to 3 are explanatory diagrams each showing an embodiment of the present invention, FIG. 4 is an explanatory diagram showing a conventional water spray or gas spray method,
FIG. 5 is an explanatory diagram showing the shape of high-pressure water or gas flow during water spray or gas spray. 1. Water or gas spray nozzle, 2.. Conduit, 3.. Ejection hole, 4.. Energy concentrator for high pressure water or gas flow, 5.
... Crucible, 6. Molten metal, 7. Fine powder, 8.
9. Low pressure nozzle, 10. Spare plate. Patent applicant: Daido Steel Co., Ltd. Patent attorney Hisashi Nakamura Figure 1 Figure 2 Figure 3 Figure 4 Figure 5

Claims (1)

【特許請求の範囲】[Claims] 噴霧ノズルから噴出させた高圧水又はガス流によって溶
融金属を霧化するに際し、該噴霧ノズル壁面に沿って低
圧水又はガスを流下させることを特徴とする水又はガス
噴霧ノズルへのスプラッシュ付着防止方法。
A method for preventing splash adhesion to a water or gas spray nozzle, which comprises causing low-pressure water or gas to flow down along the wall surface of the spray nozzle when molten metal is atomized by a high-pressure water or gas stream ejected from the spray nozzle. .
JP17135186A 1986-07-21 1986-07-21 Method for preventing sticking of splash to water or gas spraying nozzle Pending JPS6328805A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17135186A JPS6328805A (en) 1986-07-21 1986-07-21 Method for preventing sticking of splash to water or gas spraying nozzle

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17135186A JPS6328805A (en) 1986-07-21 1986-07-21 Method for preventing sticking of splash to water or gas spraying nozzle

Publications (1)

Publication Number Publication Date
JPS6328805A true JPS6328805A (en) 1988-02-06

Family

ID=15921592

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17135186A Pending JPS6328805A (en) 1986-07-21 1986-07-21 Method for preventing sticking of splash to water or gas spraying nozzle

Country Status (1)

Country Link
JP (1) JPS6328805A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104858431A (en) * 2015-05-28 2015-08-26 江苏共昌轧辊股份有限公司 Non-restriction type metal atomization and deposition spray nozzle system
CN110653377A (en) * 2019-10-18 2020-01-07 郑州机械研究所有限公司 Gas-water coupling preparation method of metastable silicon brass particles

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104858431A (en) * 2015-05-28 2015-08-26 江苏共昌轧辊股份有限公司 Non-restriction type metal atomization and deposition spray nozzle system
CN104858431B (en) * 2015-05-28 2017-05-03 江苏共昌轧辊股份有限公司 Non-restriction type metal atomization and deposition spray nozzle system
CN110653377A (en) * 2019-10-18 2020-01-07 郑州机械研究所有限公司 Gas-water coupling preparation method of metastable silicon brass particles

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