JPS6328439A - Gas feeder - Google Patents
Gas feederInfo
- Publication number
- JPS6328439A JPS6328439A JP17015886A JP17015886A JPS6328439A JP S6328439 A JPS6328439 A JP S6328439A JP 17015886 A JP17015886 A JP 17015886A JP 17015886 A JP17015886 A JP 17015886A JP S6328439 A JPS6328439 A JP S6328439A
- Authority
- JP
- Japan
- Prior art keywords
- cylindrical body
- raw material
- level
- material liquid
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 claims description 81
- 239000002994 raw material Substances 0.000 claims description 51
- 239000000945 filler Substances 0.000 claims description 14
- 238000002309 gasification Methods 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 abstract description 18
- 230000008020 evaporation Effects 0.000 abstract description 7
- 238000001704 evaporation Methods 0.000 abstract description 7
- 239000000463 material Substances 0.000 abstract description 6
- 238000012856 packing Methods 0.000 abstract 2
- 239000007789 gas Substances 0.000 description 29
- 239000012159 carrier gas Substances 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000005587 bubbling Effects 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 238000007664 blowing Methods 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000011550 stock solution Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J4/00—Feed or outlet devices; Feed or outlet control devices
- B01J4/008—Feed or outlet control devices
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は液体（以下、原料液と称す）を高温ガス化して
供給するためのガス供給装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a gas supply device for supplying a liquid (hereinafter referred to as a raw material liquid) after being gasified at a high temperature.
化学気相蒸着法（以下、ＣＶＤ法と称す）により金属表
頁にＳｔ等の蒸着物を生成させる処理が行われる。この
ような処理では、常温で液体、高温で強い腐食性をもつ
物質を原液の状態からガス化し、これを高温状態にして
キャリアガスとともにＣＶＤ処理炉に導く必要がある。A chemical vapor deposition method (hereinafter referred to as CVD method) is used to generate deposits such as St on the metal surface. In such a process, it is necessary to gasify a substance that is liquid at room temperature and highly corrosive at high temperatures from its undiluted state, bring it to a high temperature state, and introduce it together with a carrier gas into a CVD processing furnace.
従来このような処理用ガスは、バブリングタンク内に入
れられた原料液（例えば５ｉｃ４液）中にキャリアガス
（例えばＡｒガス）を吹き込み、該キャリアガスを原料
液の蒸気で飽和蒸気圧状態にして取り出すことにより得
られ、この処理ガスは加熱後、ＣＶＤ処理炉に送り込ま
れる。Conventionally, such a processing gas is produced by blowing a carrier gas (for example, Ar gas) into a raw material liquid (for example, 5IC4 liquid) placed in a bubbling tank, and bringing the carrier gas into a saturated vapor pressure state with the vapor of the raw material liquid. This processing gas is heated and then sent to a CVD processing furnace.
しかし、このような従来の処理用ガス供給方式では、原
料液のガス化をキャリアガスによるバブリングで行うた
め、原料液そのものから生成したガスの流量計測が難し
く、処理用ガスの濃度管理が精度良く行えないという欠
点がある。特に、金属ス） ＩＪツブの連続ＣＶＤ処理
プロセス等のよう１こ、処理用ガスの濃度を常に管理す
る必要がある場合には、上記従来方式では十分な対応が
できない。However, in such conventional processing gas supply methods, the raw material liquid is gasified by bubbling with a carrier gas, which makes it difficult to measure the flow rate of the gas generated from the raw material liquid itself, making it difficult to accurately manage the concentration of the processing gas. The drawback is that it cannot be done. In particular, in cases where the concentration of the processing gas needs to be constantly controlled, such as in a continuous CVD processing process of metal (IJ) tubes, the above-mentioned conventional method cannot adequately cope with the situation.
また、従来の方式ではバブリング装置とは別１こ処理用
ガスの加熱装置が必要であり、設備全体の規模が大きく
なってしまう。Furthermore, in the conventional method, a heating device for processing gas is required in addition to the bubbling device, which increases the scale of the entire facility.
本発明はこのような従来の問題に鑑みなされたもので、
コンパクトな構造を有し、しかも処理ガスの精度良い濃
度管理を可能ならしめるガス供給装置を提供せんとする
ものである。The present invention was made in view of such conventional problems,
It is an object of the present invention to provide a gas supply device which has a compact structure and which enables highly accurate concentration control of a processing gas.
このため本発明は筒状体内液面レベル調整用の槽部が立
ち上がり状に設けられた密閉式の原料液供給槽と、下端
が原料液供給槽本体の上部を貫いて槽内に挿入され、内
部が原料液供給槽内と連通した筒状体と、該筒状体内に
充填された粗粒状充填材と、前記筒状体の外側：こ配置
される筒状体加熱装置と、原料液供給槽の前記槽部１こ
ガスを供給することによって筒状体内の原料液液面レベ
ルを調整するための液面レベルｖ４整機構とからなるこ
とをその基本的特徴とする。For this reason, the present invention provides a closed type raw material liquid supply tank in which a cylindrical internal liquid level adjustment tank part is provided in an upright shape, a lower end of which is inserted into the tank through the upper part of the raw material liquid supply tank main body, A cylindrical body whose inside communicates with the inside of the raw material liquid supply tank, a coarse granular filler filled in the cylindrical body, a cylindrical body heating device disposed on the outside of the cylindrical body, and a raw material liquid supply. Its basic feature is that it comprises a liquid level adjustment mechanism for adjusting the liquid level of the raw material liquid in the cylindrical body by supplying gas to the tank part 1 of the tank.
原料液供給槽内Ｉこは、液面レベル調整用の槽部内の所
定位置に液面レベルが形成されるよう、ぶ料液が入れら
れており、このため原料液供給槽ｌこ連通した筒状体内
下部の所定の高さに原料液の液面が形成される。液面レ
ベル調整用の槽部内には液面レベル調整機構裔こより不
活性ガスが供給されて槽内の内圧調整がなされ、筒状体
内の原料液の液面レベルの調整がなされる。The raw material liquid supply tank is filled with a raw material liquid so that a liquid level is formed at a predetermined position in the tank for liquid level adjustment. A liquid level of the raw material liquid is formed at a predetermined height in the lower part of the shaped body. Inert gas is supplied from the liquid level adjusting mechanism into the tank for adjusting the liquid level to adjust the internal pressure in the tank and adjust the level of the raw material liquid in the cylindrical body.
筒状体下部の原料液は加熱装置により加熱されることに
より蒸発する。筒状体内の原料液は、粗粒状充填材があ
るため、表面張力作用により前記液面レベルをこえて充
填材の隙間を通じて筒状体内を上昇し、これ１こより蒸
発がさら（こ促進される。このようにして原料液から生
成したガスは、さら１こ上昇する過程で高温状態に加熱
され、筒状体上部から排出される。The raw material liquid at the bottom of the cylindrical body is heated by a heating device and evaporated. Since the raw material liquid inside the cylindrical body has a coarse granular filler, it rises inside the cylindrical body through the gaps between the fillers, exceeding the liquid level due to the action of surface tension, which further accelerates evaporation. The gas thus generated from the raw material liquid is heated to a high temperature while rising one step further, and is discharged from the upper part of the cylindrical body.
筒状体内に充填された粗粒状充填材は、原料液を浸透ｌ
こより上昇させる作用と、ガス化した原料液１こ対する
大きな伝熱面積を確保しガスの加熱を効率的に行わしめ
る作用をする。The coarse granular filler filled in the cylindrical body permeates the raw material liquid.
This has the effect of raising the temperature of the gas and ensuring a large heat transfer area for the gasified raw material liquid 1 to efficiently heat the gas.
第１図は本発明の一実施例を示すものである。 FIG. 1 shows an embodiment of the present invention.
本発明の装置は、筒状体内液面レベル調整用の槽部（２
）を有する密閉式の原料液供給槽（１）、該ぶ料液供給
槽に連通した筒状体（３）、該筒状体内に充填された粗
粒状充填材（４）、筒状体の外側（こ配、１される筒状
体加熱装置（５）、及び筒状体内の液ルベルを調整する
ための液面レベルジ４整１構（６）から構成されている
。The device of the present invention has a tank part (2
), a cylindrical body (3) communicating with the raw material liquid supply tank, a coarse granular filler (4) filled in the cylindrical body, It consists of a cylindrical body heating device (5) which is heated on the outside, and a liquid level adjustment system (6) for adjusting the liquid level inside the cylindrical body.
前記原料液供給槽（１）は上部が閉塞された密閉式の構
造であり、側部には筒状体内の液面レベルを調整するた
めの前記槽部（２）が立ち上がり状に形成されている。The raw material liquid supply tank (1) has an airtight structure with a closed top, and the tank part (2) for adjusting the liquid level inside the cylindrical body is formed in a rising shape on the side. There is.
前記筒状体（３ンは、上部及び下部が開放し、その下部
が原料液供給槽ｆ１）に連通したもので、本実施例では
長尺大径の外筒体（７）とその下部の内側に配設され、
下部が外筒体下端から突出した円筒体（８）とから構成
されている。外筒体（７）はその下端が原料液供給槽（
１）本体の上部にシール装置（９）を介して固定され、
また外筒体（７）から突出した円筒体（８）の下部は、
原料液供給槽＋１）の上部を貫いて槽内に挿入され、槽
底部近傍まで達している。The cylindrical body (3) has an open upper and lower part, and the lower part communicates with the raw material liquid supply tank f1. placed inside,
It consists of a cylindrical body (8) whose lower part protrudes from the lower end of the outer cylindrical body. The lower end of the outer cylindrical body (7) is connected to the raw material liquid supply tank (
1) Fixed to the upper part of the main body via a sealing device (9),
In addition, the lower part of the cylindrical body (8) protruding from the outer cylindrical body (7) is
It is inserted into the tank through the upper part of the raw material liquid supply tank +1) and reaches near the bottom of the tank.
本実施例において、筒状体（３）を外筒体（７）と円筒
体（８）とから構成したのは次のような理由による。す
なわち、筒状体（３）の上部側は加熱装置により加熱さ
れるため耐熱性が要求され、このためセラミック等の耐
熱材料で構成する必要がある。一方、筒状体（３）の下
部は強い腐食性を有する原料液に接するが、仮に筒状体
（３）をセラミック材で構成した場合、セラミックには
気孔が存在するため原料液を含浸し。In this embodiment, the cylindrical body (3) is composed of an outer cylindrical body (7) and a cylindrical body (8) for the following reason. That is, since the upper side of the cylindrical body (3) is heated by a heating device, heat resistance is required, and therefore it is necessary to be made of a heat resistant material such as ceramic. On the other hand, the lower part of the cylindrical body (3) is in contact with the highly corrosive raw material liquid, but if the cylindrical body (3) were made of ceramic material, it would not be possible to impregnate the raw material liquid because ceramic has pores. .
この結果原料液が筒状体外に浸出してしまうおそれがあ
る。そこで、本実施例では、原料液と接する筒状体部分
を内筒体（８）で構成し、外筒体（７）をセラミック等
のＷｋ熱材で、また内筒体（８）を含浸性のない金属材
等で構成するものである。As a result, the raw material liquid may leak out of the cylindrical body. Therefore, in this example, the cylindrical body part that comes into contact with the raw material liquid is composed of an inner cylindrical body (8), the outer cylindrical body (7) is made of a Wk heat material such as ceramic, and the inner cylindrical body (8) is impregnated. It is constructed from a neutral metal material or the like.
前記粗粒状充填材（４）は、筒状体下部領域においては
、その隙間を通じて原料液を筒状体内で上昇させる役目
をし、また筒状体上部領域においてはガス化した原料液
をより高温化するためガスに対する伝熱面積を確保し高
い加熱効率を得る役目をするものであり、このため通常
、直径が数＝〜数士瓢程度の粗粒体が用いられる。との
粗粒体としては、例えばセラミック（ＳｉＣ、ＳｉＮ
、 Ａｔ２０３等）製のボール体（直径１０＋ｍ前後）
等が用いられる。なお、筒状体（３）の内部はその下部
が原料液の蒸発領域、上部が蒸発したガスの加熱領域と
なるものであり、それぞれの領域の目的に応じて充填材
の粒度を変えるようにしてもよい。In the lower region of the cylindrical body, the coarse granular filler (4) serves to raise the raw material liquid within the cylindrical body through the gap, and in the upper region of the cylindrical body, the coarse granular filler (4) serves to raise the gasified raw material liquid to a higher temperature. It serves to secure a heat transfer area for the gas and obtain high heating efficiency, and for this reason, coarse grains with a diameter of about 100 to 2000 yen are usually used. Examples of coarse grains include ceramics (SiC, SiN
, At203, etc.) ball body (diameter around 10+m)
etc. are used. In addition, inside the cylindrical body (3), the lower part is the evaporation area for the raw material liquid, and the upper part is the heating area for the evaporated gas, and the particle size of the filler is changed depending on the purpose of each area. You can.
才だ１本実施例では充填材（４）は筒状体（３）の全長
に亘って充填されているが、筒状体下部領域においては
、充填材（４）はその充填頭載の下端が少なくとも筒状
体（内筒体（８））内の液面レベル（定められた穀圧液
面レベル）より下に位置するよう充填すれば足り、これ
により液面レベルにかかわらず、原料液を表面張力によ
り充填材の隙間を通じ浸透させることができる。In this embodiment, the filler material (4) is filled over the entire length of the cylindrical body (3), but in the lower region of the cylindrical body, the filler material (4) is filled at the lower end of the filling head. It is sufficient to fill the raw material liquid so that it is located at least below the liquid level (predetermined grain pressure liquid level) in the cylindrical body (inner cylinder (8)). can penetrate through the gaps in the filler due to surface tension.
前記筒状体加熱装置（５）は外海体（力の外周に設けら
れる発熱体−こより構成され、筒状体の加熱を通じその
内部の原料液及びガスを加熱するよう（こしている。The cylindrical body heating device (5) is composed of a heating element provided on the outer periphery of the cylindrical body, and heats the raw material liquid and gas inside the cylindrical body by heating the cylindrical body.
前記液面レベル調整機構（６）は、原料液供給槽（１）
の前記檀那（２）に不活性ガス等のガスを供給し、槽内
圧の調整により筒状体（３）内の液面レベルを調整する
ためのもので、前記檀那（２）の上部に接続されたガス
供給管（１１及び排出管上υと、排出管上りに設けられ
た圧力調整弁０りとから構成されている。The liquid level adjustment mechanism (6) is connected to the raw material liquid supply tank (1).
This is for supplying gas such as inert gas to the above-mentioned dam (2) and adjusting the liquid level in the cylindrical body (3) by adjusting the tank internal pressure, and is connected to the upper part of the dam (2). It consists of a gas supply pipe (11), an upper discharge pipe υ, and a pressure regulating valve 0 provided on the upper side of the discharge pipe.
その他図面において、α３は原料液供給配置。In other drawings, α3 is the raw material liquid supply arrangement.
Ｉは流量計、叫は開閉弁、αｅはレベル計、α力は圧力
計である。I is a flowmeter, yoke is an on-off valve, αe is a level meter, and α force is a pressure gauge.
また、本実施例のガス供給装置（イ）は、ＣＶＤ処理炉
（１）の下部に直接設けているが、本発明装置は処理炉
等とは別途に設けることもできる。Further, although the gas supply device (a) of this embodiment is provided directly at the lower part of the CVD processing furnace (1), the device of the present invention can also be provided separately from the processing furnace or the like.
以上のような装置において、原料液供給槽（１）内には
、檀那（２）内で所定の液面レベルとなるよう原料液（
Ａ）が入れられ、さらに檀那（２）内に液面レベル調整
機構（６）を構成するガス供給管α１から不活性ガス等
の液面調整用ガスが供給され、槽内圧調整がなされ、こ
の結果内筒体（８）内の所定のレベルに原料液の液面が
形成される。In the above-mentioned apparatus, the raw material liquid (1) is supplied to the raw material liquid supply tank (1) so that the liquid level reaches a predetermined level in the bath (2).
A) is put into the tank (2), and a liquid level adjusting gas such as an inert gas is supplied from the gas supply pipe α1 that constitutes the liquid level adjusting mechanism (6) to adjust the tank internal pressure. As a result, a liquid surface of the raw material liquid is formed at a predetermined level within the inner cylinder (8).
内′節体（８）内の原料液は表面張力により充填材（Ｌ
＞の隙間を通じ筒状体（３）内を上昇する。The raw material liquid in the inner segment (8) is mixed with the filler (L) due to surface tension.
＞ through the gap inside the cylindrical body (3).
筒状体（３）（外向体（７））は筒状体加熱装置（５）
により加熱されており、原料液は加熱されることにより
蒸発し、次いでそのガスが高温に加熱され、筒状体（３
）の上部から炉内に供給される。ここで、筒状体内の原
液やガスの加熱は、充填材（４）により伝熱面積が非常
（こ犬きいことから効率的に行われる。The cylindrical body (3) (outward body (7)) is a cylindrical body heating device (5)
The raw material liquid is heated and evaporated, and then the gas is heated to a high temperature and the cylindrical body (3
) is fed into the furnace from the top. Here, heating of the stock solution or gas inside the cylindrical body is performed efficiently because the heat transfer area is very large due to the filler (4).
また、原料液の蒸発量の制飢は、内筒体（８）内の液面
レベルの調整により行われる。すなわち、内筒体（８）
内の液面レベルを上げると加熱装置（５）により加熱さ
れる筒状体内の原料液の範囲が大きくなり、この結果蒸
発量も増大することになる。この蒸発量制御は液面レベ
ル調整機構（６）により行われる。Further, the amount of evaporation of the raw material liquid is controlled by adjusting the liquid level within the inner cylinder (8). That is, the inner cylindrical body (8)
When the liquid level inside the cylindrical body is raised, the range of the raw material liquid inside the cylindrical body heated by the heating device (5) increases, and as a result, the amount of evaporation also increases. This evaporation amount control is performed by a liquid level adjustment mechanism (6).
また、このような本発明装置では、槽内圧を常に一定に
保ちつつ檀那（２）内のレベルを測定することにより、
原料液のガス化量が簡単に判り、このため処理用ガスの
ｅ５度管理を容易に行うことができる。In addition, in the device of the present invention, by measuring the level in the dam (2) while keeping the internal pressure of the tank constant,
The gasification amount of the raw material liquid can be easily determined, and therefore the e5 degree control of the processing gas can be easily performed.
以上述べた本発明によれば、原料液を効率的に加熱して
高温ガス化することができ、加えて、構造上生成された
ガス流量を容易１こ知ることかできるため、処理用ガス
の濃度管理を従来方式に較べ極めて容易（こ行うことが
できる。加えて、原料液の蒸発と生成したガスの加熱と
を１つの装置で行うことができるため、別個の加熱装置
や加熱装置までの配管設備等が不要であり、設備のコン
パクト化を図ることができる。According to the present invention described above, it is possible to efficiently heat the raw material liquid to gasify it at a high temperature, and in addition, it is possible to easily know the flow rate of the generated gas due to the structure, so that the processing gas can be Concentration control is extremely easy compared to conventional methods.In addition, since the evaporation of the raw material liquid and the heating of the generated gas can be performed in one device, there is no need for separate heating devices or heating devices. No piping equipment is required, and the equipment can be made more compact.
第１図は本発明の一実施例を示す縦断面図である。
図において、（１）は原料液供給槽、（２）は種部、（
３）は筒状体、（４）は充填材、（５）は筒状体加熱装
置、（６）は筒状体内液面レベル調整機構を各示す。
特許出願人 日本鋼管株式会社
発 明 者 堤 道 開園
柳 橋 泰 雄代理人弁理
士 吉 原 省 三筒 １ 図
日 １％ ＡFIG. 1 is a longitudinal sectional view showing one embodiment of the present invention. In the figure, (1) is the raw material liquid supply tank, (2) is the seed part, (
3) is a cylindrical body, (4) is a filling material, (5) is a cylindrical body heating device, and (6) is a liquid level adjustment mechanism within the cylindrical body. Patent applicant Nippon Kokan Co., Ltd. Inventor Tsutsumi Michi Opening
Yasuo Yanagibashi Patent Attorney Sho Yoshihara Santsutsu 1 Date 1% A
Claims (1)
て、 筒状体内液面レベル調整用の槽部が立ち上がり状に設け
られた密閉式の原料液供給槽と、下端が原料液供給槽本
体の上部を貫いて槽内に挿入され、内部が原料液供給槽
内部と連通した筒状体と、該筒状体内に充填された粗粒
状充填材と、前記筒状体の外側に配置される筒状体加熱
装置と、原料液供給槽の前記槽部にガスを供給すること
によつて筒状体内の原料液液面レベルを調整するための
液面レベル調整機構とからなるガス供給装置。[Claims] A gas supply device for supplying high-temperature gasification of a raw material liquid, comprising: a closed type raw material liquid supply tank in which a tank part for adjusting the liquid level in a cylindrical body is provided in an upright manner; A cylindrical body inserted into the tank through the upper part of the liquid supply tank main body and whose inside communicates with the inside of the raw material liquid supply tank, a coarse granular filler filled in the cylindrical body, and an outside of the cylindrical body. and a liquid level adjustment mechanism for adjusting the level of the raw material liquid in the cylindrical body by supplying gas to the tank section of the raw material liquid supply tank. Gas supply equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17015886A JPS6328439A (en) | 1986-07-18 | 1986-07-18 | Gas feeder |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17015886A JPS6328439A (en) | 1986-07-18 | 1986-07-18 | Gas feeder |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6328439A true JPS6328439A (en) | 1988-02-06 |
Family
ID=15899756
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17015886A Pending JPS6328439A (en) | 1986-07-18 | 1986-07-18 | Gas feeder |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6328439A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0610900A (en) * | 1992-04-27 | 1994-01-21 | Canon Inc | Method and device for moving liquid and measuring device utilizing these method and device |
| KR100438946B1 (en) * | 2001-10-12 | 2004-07-03 | 주식회사 엘지이아이 | Gas inlet-pipe condensation preventing apparatus using heated cooling water of plasma deposition apparatus |
| KR100438945B1 (en) * | 2001-10-12 | 2004-07-03 | 주식회사 엘지이아이 | Surface treatment apparatus of metal using plasma |
-
1986
- 1986-07-18 JP JP17015886A patent/JPS6328439A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0610900A (en) * | 1992-04-27 | 1994-01-21 | Canon Inc | Method and device for moving liquid and measuring device utilizing these method and device |
| KR100438946B1 (en) * | 2001-10-12 | 2004-07-03 | 주식회사 엘지이아이 | Gas inlet-pipe condensation preventing apparatus using heated cooling water of plasma deposition apparatus |
| KR100438945B1 (en) * | 2001-10-12 | 2004-07-03 | 주식회사 엘지이아이 | Surface treatment apparatus of metal using plasma |
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