JPS63284193A - Production of 2',3'-dideoxycytidine derivative - Google Patents
Production of 2',3'-dideoxycytidine derivativeInfo
- Publication number
- JPS63284193A JPS63284193A JP62117924A JP11792487A JPS63284193A JP S63284193 A JPS63284193 A JP S63284193A JP 62117924 A JP62117924 A JP 62117924A JP 11792487 A JP11792487 A JP 11792487A JP S63284193 A JPS63284193 A JP S63284193A
- Authority
- JP
- Japan
- Prior art keywords
- group
- compound
- formula
- groups
- substituted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- WREGKURFCTUGRC-POYBYMJQSA-N Zalcitabine Chemical class O=C1N=C(N)C=CN1[C@@H]1O[C@H](CO)CC1 WREGKURFCTUGRC-POYBYMJQSA-N 0.000 title claims description 4
- 150000001875 compounds Chemical class 0.000 claims abstract description 39
- 125000006239 protecting group Chemical group 0.000 claims abstract description 21
- 125000003277 amino group Chemical group 0.000 claims abstract description 20
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 18
- 125000005843 halogen group Chemical group 0.000 claims abstract description 4
- 238000002955 isolation Methods 0.000 claims abstract description 3
- 239000003153 chemical reaction reagent Substances 0.000 claims description 8
- 239000000126 substance Substances 0.000 claims description 5
- 230000002140 halogenating effect Effects 0.000 claims description 4
- -1 amine compound Chemical class 0.000 abstract description 65
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 abstract description 21
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 abstract description 10
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 abstract description 5
- GGSUCNLOZRCGPQ-UHFFFAOYSA-N diethylaniline Chemical compound CCN(CC)C1=CC=CC=C1 GGSUCNLOZRCGPQ-UHFFFAOYSA-N 0.000 abstract description 4
- 208000030507 AIDS Diseases 0.000 abstract description 2
- PBFATPYEUBCWJS-GXTWGEPZSA-N [(2s,5r)-5-(2,4-dioxopyrimidin-1-yl)oxolan-2-yl]methyl benzoate Chemical compound N1([C@H]2CC[C@H](O2)COC(=O)C=2C=CC=CC=2)C=CC(=O)NC1=O PBFATPYEUBCWJS-GXTWGEPZSA-N 0.000 abstract 1
- 230000008030 elimination Effects 0.000 abstract 1
- 238000003379 elimination reaction Methods 0.000 abstract 1
- 239000012442 inert solvent Substances 0.000 abstract 1
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 45
- 239000002904 solvent Substances 0.000 description 23
- 238000006243 chemical reaction Methods 0.000 description 22
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 20
- 125000003118 aryl group Chemical group 0.000 description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 125000003545 alkoxy group Chemical group 0.000 description 11
- 125000002252 acyl group Chemical group 0.000 description 10
- 125000000217 alkyl group Chemical group 0.000 description 10
- 239000002994 raw material Substances 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 7
- 230000035484 reaction time Effects 0.000 description 7
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 125000001931 aliphatic group Chemical group 0.000 description 5
- 125000004849 alkoxymethyl group Chemical group 0.000 description 5
- 239000005457 ice water Substances 0.000 description 5
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 4
- 150000001298 alcohols Chemical class 0.000 description 4
- 125000003710 aryl alkyl group Chemical group 0.000 description 4
- 150000002170 ethers Chemical class 0.000 description 4
- 229910052736 halogen Inorganic materials 0.000 description 4
- 150000002367 halogens Chemical class 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 238000010992 reflux Methods 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 125000005103 alkyl silyl group Chemical group 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 239000012046 mixed solvent Substances 0.000 description 3
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 125000004448 alkyl carbonyl group Chemical group 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 2
- 239000007810 chemical reaction solvent Substances 0.000 description 2
- 239000003638 chemical reducing agent Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- FKRCODPIKNYEAC-UHFFFAOYSA-N ethyl propionate Chemical compound CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 description 2
- 239000012452 mother liquor Substances 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 150000003017 phosphorus Chemical class 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- 238000007086 side reaction Methods 0.000 description 2
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 2
- 235000017557 sodium bicarbonate Nutrition 0.000 description 2
- FWMUJAIKEJWSSY-UHFFFAOYSA-N sulfur dichloride Chemical compound ClSCl FWMUJAIKEJWSSY-UHFFFAOYSA-N 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- FPGGTKZVZWFYPV-UHFFFAOYSA-M tetrabutylammonium fluoride Chemical compound [F-].CCCC[N+](CCCC)(CCCC)CCCC FPGGTKZVZWFYPV-UHFFFAOYSA-M 0.000 description 2
- 125000001412 tetrahydropyranyl group Chemical group 0.000 description 2
- 125000003774 valeryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 229960000523 zalcitabine Drugs 0.000 description 2
- OGFAWKRXZLGJSK-UHFFFAOYSA-N 1-(2,4-dihydroxyphenyl)-2-(4-nitrophenyl)ethanone Chemical compound OC1=CC(O)=CC=C1C(=O)CC1=CC=C([N+]([O-])=O)C=C1 OGFAWKRXZLGJSK-UHFFFAOYSA-N 0.000 description 1
- JQCSUVJDBHJKNG-UHFFFAOYSA-N 1-methoxy-ethyl Chemical group C[CH]OC JQCSUVJDBHJKNG-UHFFFAOYSA-N 0.000 description 1
- UTQNKKSJPHTPBS-UHFFFAOYSA-N 2,2,2-trichloroethanone Chemical group ClC(Cl)(Cl)[C]=O UTQNKKSJPHTPBS-UHFFFAOYSA-N 0.000 description 1
- YQTCQNIPQMJNTI-UHFFFAOYSA-N 2,2-dimethylpropan-1-one Chemical group CC(C)(C)[C]=O YQTCQNIPQMJNTI-UHFFFAOYSA-N 0.000 description 1
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000006201 3-phenylpropyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000006281 4-bromobenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1Br)C([H])([H])* 0.000 description 1
- 125000006283 4-chlorobenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1Cl)C([H])([H])* 0.000 description 1
- 125000004217 4-methoxybenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1OC([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000006181 4-methyl benzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1C([H])([H])[H])C([H])([H])* 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical group [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- VIZQREHVDDPWOK-UHFFFAOYSA-N IP(I)(I)=O Chemical compound IP(I)(I)=O VIZQREHVDDPWOK-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 1
- PHSPJQZRQAJPPF-UHFFFAOYSA-N N-alpha-Methylhistamine Chemical compound CNCCC1=CN=CN1 PHSPJQZRQAJPPF-UHFFFAOYSA-N 0.000 description 1
- 239000002262 Schiff base Substances 0.000 description 1
- 150000004753 Schiff bases Chemical class 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- WGPAQYSVWYWZKT-UHFFFAOYSA-N [C].[Ra] Chemical compound [C].[Ra] WGPAQYSVWYWZKT-UHFFFAOYSA-N 0.000 description 1
- PZAGQUOSOTUKEC-UHFFFAOYSA-N acetic acid;sulfuric acid Chemical compound CC(O)=O.OS(O)(=O)=O PZAGQUOSOTUKEC-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 1
- 150000008041 alkali metal carbonates Chemical class 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 229910052977 alkali metal sulfide Inorganic materials 0.000 description 1
- 125000004183 alkoxy alkyl group Chemical group 0.000 description 1
- 125000005083 alkoxyalkoxy group Chemical group 0.000 description 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- 125000002102 aryl alkyloxo group Chemical group 0.000 description 1
- 125000005129 aryl carbonyl group Chemical group 0.000 description 1
- CBHOOMGKXCMKIR-UHFFFAOYSA-N azane;methanol Chemical compound N.OC CBHOOMGKXCMKIR-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 125000001584 benzyloxycarbonyl group Chemical group C(=O)(OCC1=CC=CC=C1)* 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Chemical group BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004063 butyryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000010531 catalytic reduction reaction Methods 0.000 description 1
- 239000000460 chlorine Chemical group 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 238000004440 column chromatography Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- WGLUMOCWFMKWIL-UHFFFAOYSA-N dichloromethane;methanol Chemical compound OC.ClCCl WGLUMOCWFMKWIL-UHFFFAOYSA-N 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 125000005982 diphenylmethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 1
- 125000005745 ethoxymethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])* 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 1
- 239000011630 iodine Chemical group 0.000 description 1
- 229910052740 iodine Chemical group 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000000400 lauroyl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 1
- 239000002773 nucleotide Substances 0.000 description 1
- 125000003729 nucleotide group Chemical group 0.000 description 1
- 125000002801 octanoyl group Chemical group C(CCCCCCC)(=O)* 0.000 description 1
- 150000007530 organic bases Chemical group 0.000 description 1
- 125000006503 p-nitrobenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1[N+]([O-])=O)C([H])([H])* 0.000 description 1
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- NCCBCEHAGCSKEA-UHFFFAOYSA-N pentaiodo-$l^{5}-phosphane Chemical compound IP(I)(I)(I)I NCCBCEHAGCSKEA-UHFFFAOYSA-N 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- UYWQUFXKFGHYNT-UHFFFAOYSA-N phenylmethyl ester of formic acid Natural products O=COCC1=CC=CC=C1 UYWQUFXKFGHYNT-UHFFFAOYSA-N 0.000 description 1
- 125000001639 phenylmethylene group Chemical group [H]C(=*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- UHZYTMXLRWXGPK-UHFFFAOYSA-N phosphorus pentachloride Chemical compound ClP(Cl)(Cl)(Cl)Cl UHZYTMXLRWXGPK-UHFFFAOYSA-N 0.000 description 1
- IPNPIHIZVLFAFP-UHFFFAOYSA-N phosphorus tribromide Chemical compound BrP(Br)Br IPNPIHIZVLFAFP-UHFFFAOYSA-N 0.000 description 1
- FAIAAWCVCHQXDN-UHFFFAOYSA-N phosphorus trichloride Chemical compound ClP(Cl)Cl FAIAAWCVCHQXDN-UHFFFAOYSA-N 0.000 description 1
- PZHNNJXWQYFUTD-UHFFFAOYSA-N phosphorus triiodide Chemical compound IP(I)I PZHNNJXWQYFUTD-UHFFFAOYSA-N 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- DPLVEEXVKBWGHE-UHFFFAOYSA-N potassium sulfide Chemical compound [S-2].[K+].[K+] DPLVEEXVKBWGHE-UHFFFAOYSA-N 0.000 description 1
- 238000012746 preparative thin layer chromatography Methods 0.000 description 1
- 125000005767 propoxymethyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])[#8]C([H])([H])* 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 238000001226 reprecipitation Methods 0.000 description 1
- 238000010898 silica gel chromatography Methods 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 229910052979 sodium sulfide Inorganic materials 0.000 description 1
- GRVFOGOEDUUMBP-UHFFFAOYSA-N sodium sulfide (anhydrous) Chemical compound [Na+].[Na+].[S-2] GRVFOGOEDUUMBP-UHFFFAOYSA-N 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 150000003461 sulfonyl halides Chemical class 0.000 description 1
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical compound ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 description 1
- TWPVZKPFIMFABN-UHFFFAOYSA-N sulfuryl diiodide Chemical compound IS(I)(=O)=O TWPVZKPFIMFABN-UHFFFAOYSA-N 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000004192 tetrahydrofuran-2-yl group Chemical group [H]C1([H])OC([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000003718 tetrahydrofuranyl group Chemical group 0.000 description 1
- 125000004187 tetrahydropyran-2-yl group Chemical group [H]C1([H])OC([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000004632 tetrahydrothiopyranyl group Chemical group S1C(CCCC1)* 0.000 description 1
- 229940124597 therapeutic agent Drugs 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- DQWPFSLDHJDLRL-UHFFFAOYSA-N triethyl phosphate Chemical compound CCOP(=O)(OCC)OCC DQWPFSLDHJDLRL-UHFFFAOYSA-N 0.000 description 1
- 125000004044 trifluoroacetyl group Chemical group FC(C(=O)*)(F)F 0.000 description 1
- 125000000025 triisopropylsilyl group Chemical group C(C)(C)[Si](C(C)C)(C(C)C)* 0.000 description 1
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 238000002211 ultraviolet spectrum Methods 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups
Landscapes
- Saccharide Compounds (AREA)
- Plural Heterocyclic Compounds (AREA)
Abstract
Description
【発明の詳細な説明】 〔目的〕 本発明は、エイズ治療薬として有用である2′。[Detailed description of the invention] 〔the purpose〕 The present invention is useful as a therapeutic agent for AIDS.
3′−ジデオキシシチジン誘導体の優れた製法に関する
。This invention relates to an excellent method for producing 3'-dideoxycytidine derivatives.
〈従来の技術〉
従来 2t、3t−ジデオキシシチジン誘導体を、りが
ヌクレオシP類から合成する方法としては、ホルピツツ
らの方法(ジャーナル・オブーオーガニツクーケミスト
リー、32,817(1969))が知られているが、
最終の還元工程において副生成物ができるため生成物の
単離が困難であり、大量合成に向いていない。<Prior art> Conventionally, as a method for synthesizing 2t,3t-dideoxycytidine derivatives from nucleotide Ps, the method of Holpitz et al. (Journal of Organic Chemistry, 32, 817 (1969)) is known. There are, but
Due to the formation of by-products in the final reduction step, it is difficult to isolate the product, making it unsuitable for large-scale synthesis.
く当該発明が解決しようとする問題点〉本発明者らは、
リデヌクレオシr類を原料とした2′、3′−ジデオキ
シシチジン誘導体の合成について、長年に亘シ鋭意研究
を行った結果、本発明の方法が、収率性及び単離の簡便
性の面において、優れていることを見い出し、本発明を
完成した。Problems to be Solved by the Invention> The present inventors
As a result of extensive research conducted over many years on the synthesis of 2',3'-dideoxycytidine derivatives using Ridenucleosyl groups as raw materials, we have found that the method of the present invention has improved yield and ease of isolation. The present invention was completed based on these findings.
本発明の27.3/−ジデオキシシチジン誘導体の製法
は、次式に示すように、
(1) +If)(式中、R1
及びR2は同−又は異彦って、保護されていてもよい水
酸基又は置換された水酸基を示し、Xは一四ゲン原子を
示し、Yは保護されていてもよいアミノ基又は置換され
たアミノ基を示す、)
式(IJを有する化合物を、式■を有する化合物(式中
、Yは前記と同意義を示す、)と反応させ、所望により
、保護基を除去することを特徴とする式(n)で表わさ
れる2′、3′−ジデオキシシチジン誘導体の製法又は
、次式に示すように、([1)
(Ill(式中、 Hl 、 R2及びYは前記と同
意義を示す、)式(III)を有する化合物と、ノ〜ロ
ゲン化試薬とを反応させ、次いで、生成物を単離し、又
は単離することなく、式TH’i有する化合物(式中、
Yは前記と同意義を示す、)と反応させ、所望によ〕、
保護基を除去することt−特徴とする式(II)で表わ
される21.3/−ジデオキシシチジン誘導体の製法で
ある。The method for producing the 27.3/-dideoxycytidine derivative of the present invention is as shown in the following formula: (1) +If) (wherein, R1
and R2 are the same or different and represent an optionally protected hydroxyl group or a substituted hydroxyl group, X represents an atom, and Y represents an optionally protected amino group or a substituted amino group. A compound having the formula (IJ) (indicating a group) is reacted with a compound having the formula (in the formula, Y has the same meaning as above), and if desired, the protecting group is removed. A method for producing a 2',3'-dideoxycytidine derivative represented by (n), or as shown in the following formula, ([1)
A compound having the formula (III) (wherein Hl, R2 and Y have the same meanings as above) is reacted with a norogenating reagent, and then the product is isolated, or Compounds having the formula TH'i (wherein,
Y has the same meaning as above, and if desired],
This is a method for producing a 21.3/-dideoxycytidine derivative represented by formula (II), which is characterized by removing a protecting group.
上記式中、
Xで定義された「ハロゲン原子」とは、弗素、塩素、臭
素又は沃素を示す。In the above formula, the "halogen atom" defined by X represents fluorine, chlorine, bromine or iodine.
R1及びR2で定義された「保護されていてもよい水酸
基」の保護基としては、反応における保護基を示し、例
えば、ホルミル、アセチル、プ四ピオニル、ブチリル、
イソブチリル、ペンタノイル、ピバロイル、バレリル、
インバレリル、オクタノイル、ラウロイル、ノ臂ルミト
イル、ステアルイルのようなアルキルカルボニル基、り
四ロアセチル、ジクロロアセチル、トリクロロアセチル
、トリフルオロアセチルの↓うな^ログン化アルキルカ
ルゴニル基、メトキシアセチルのような低級アルコキシ
アルキルカルボニル基、+1> −2−メチル−2−ブ
テノイルのような不飽和アルキルカルボニル基等の脂肪
族アシル基;ベンゾイル、α−ナフトイル、β−ナフト
イルのようなアリールカルボニル基、2−ブロモベンゾ
イル、4−クロロベンゾイルのよりなハロゲン化アリー
ルカルデニル基、2,4.6−トリメチルベンゾイル、
4−トルオイルのような低級アルキル化アリールカルゴ
ニル基、4−アニソイルのような低級アルコキシ化アリ
ールカル?ニル基、4−ニトロベンソイル、2−ニトロ
ベンソイルのよりなニトロ化アリールカルデニル基、2
−(メトキシカルノニル)ベンゾイルのような低級アル
コキシカルがニル化アリールカルデニル基、4−フェニ
ルベンゾイルのような了り−ル化アリールカルゴニル基
等の芳香族アシル基;テトラヒドロピラン−2−イル、
3−ブロモテトラヒドロピラン−2−イル、4−メドキ
シテトラヒドロピラン−4−イル、テ′トラヒドロチオ
ピランー2−イル、4−メトキシテトラヒドロチオピラ
ン−4−イルのようなテトラヒドロピラニル又はテトラ
ヒドロチオピラニル基:テトラヒドロフラン−2−イル
、テトラヒドロチオ7ランー2−イルのようなテトラヒ
ドロフラニル又はテトラヒドロチオ7うニル基:)!j
メチルシリル、トリエチルシリル、イソプロピルジメチ
ルシリル、t−ジチルジメチルシリル、メチルジインプ
ロピルシリル、メチルジ−t−ブチルシリル、トリイソ
プロピルシリルのようなトリ低級アルキルシリル基、ジ
フェニルメチルシリル、ジフェニルブチルシリル、ジフ
ェニルイソプロピルシリル、フェニルジイソプロピルシ
リルのような1乃至2個のアリール基で置換されたトリ
低級アルキルシリル基等のシリル基;メトキシメチル、
1,1−ジメチル−1−メトキシメチル、エトキシメチ
ル、プロポキシメチル、イソプロポキシメチル、ブトキ
シメチル、t−ブトキシメチルのような低級アルコキシ
メチル基、2−メトキシエトキシメチルのような低級ア
ルコキシ化低級アルコキシメチル基、2,2.2−トリ
クロロエトキシメチル、ビス(2−クロロエトキシ)メ
チルのような/%0ゲン化低級アルコキシメチル等のア
ルコキシメチル基;1−エトキシエチル、1−メチル−
1−メトキシエチル、1−(イソプロポキシ)エチルの
ような低級アルコキシ化エチル基、2.2.2−トリク
ロロ写チルのようなハロゲン化エチル基、2−(フェニ
ルゼレニル)エチルのような了り−ルゼレニル化エチル
基等の置mエテル基;ベンジル、フェネチル、3−フェ
ニルプロピル、α−ナフチルメチル、β−ナフチルメチ
ル、ジフェニルメチル、トリフェニルメチル、α−ナフ
チルジフェニルメチル、9−アンスリルメチルのような
1乃至3個のアリール基で置換された低級アルキル基、
4−メチルベンジル、2.4.6− )リメチルベンジ
ル、3,4.5− )リメチルペンジル、4−メトキシ
ベンジル、4−メトキシフェニルジフェニルメチル、2
−ニド、ロペンジル、4−ニトロベンジル、4−クロロ
ベンジル、4−ブロモベンジル、4−シアノペンノル、
4−シアノヘンゾルジフェニルメチル、ビス(2−ニト
ロフェニル)メチル、ビペロニルのような低級アルキル
、低級アルコキシ、ニトロ、ハロゲン、シアノ基でアリ
ール環が置換された1乃至3個のアリール基で置換され
た低級アルキル基等のアラルキル基;メトキシカルがニ
ル、エトキシカルボニル、t−ブトキシメルゲニル、イ
ンブトキシカルブニルのような低級アルコキシカルがニ
ル基、2,2゜2−)’Jクロ四エトキシカルがニル、
2−トリメチルシリルエトキシカルlニルのようなハロ
ゲン又はトリ低級アルキルシリル基で置換された低級ア
ルコキシカル−ニル基等のアルコキシカルぎニル基:ピ
ニルオキシカルゲニル、アリルオキシカル−ニルのよう
なアルケニルオキシカルがニル基:ベンジルオキシカル
ボニル、4−メトキシベンジルオキシカルゲニル、3.
4−ジメトキシペンジルオキシカルゲニル、2−二トp
ベンジルオキシカルゲニル、4−ニトロペンジルオキシ
カルボニルのような、1乃至2個の低級アル−キシ又は
ニトロ基でアリール環が置換されていてもよいアラルキ
ルオキシカル?ニル基のような反応における保護基を挙
げることができ、好適には、脂肪族アシル基及び芳香族
アシル基である。The protecting group for the "optionally protected hydroxyl group" defined by R1 and R2 indicates a protecting group in the reaction, such as formyl, acetyl, tetrapionyl, butyryl,
isobutyryl, pentanoyl, pivaloyl, valeryl,
Alkylcarbonyl groups such as invaleryl, octanoyl, lauroyl, norumitoyl, and stearyl; lower alkoxyalkyl groups such as 4-tetraloacetyl, dichloroacetyl, trichloroacetyl, and trifluoroacetyl; alkylcargonyl groups such as methoxyacetyl; Carbonyl group, +1> Aliphatic acyl group such as unsaturated alkylcarbonyl group such as -2-methyl-2-butenoyl; arylcarbonyl group such as benzoyl, α-naphthoyl, β-naphthoyl, 2-bromobenzoyl, 4 - More halogenated arylcardenyl groups of chlorobenzoyl, 2,4.6-trimethylbenzoyl,
Lower alkylated aryl cargonyl group such as 4-toluoyl, lower alkoxylated aryl cargonyl group such as 4-anisoyl? Nyl group, 4-nitrobensoyl, 2-nitrobensoyl and more nitrated arylcardenyl groups, 2
An aromatic acyl group such as an arylcardenyl group in which a lower alkoxyl is nylated, such as -(methoxycarnonyl)benzoyl, or an arylcargonyl group, such as 4-phenylbenzoyl; tetrahydropyran-2-yl ,
Tetrahydropyranyl or tetrahydro such as 3-bromotetrahydropyran-2-yl, 4-medoxytetrahydropyran-4-yl, tetrahydrothiopyran-2-yl, 4-methoxytetrahydrothiopyran-4-yl Thiopyranyl group: Tetrahydrofuranyl or tetrahydrothio7unyl group, such as tetrahydrofuran-2-yl, tetrahydrothio7ran-2-yl:)! j
Tri-lower alkylsilyl groups such as methylsilyl, triethylsilyl, isopropyldimethylsilyl, t-dityldimethylsilyl, methyldiimpropylsilyl, methyldi-t-butylsilyl, triisopropylsilyl, diphenylmethylsilyl, diphenylbutylsilyl, diphenylisopropylsilyl, Silyl groups such as tri-lower alkylsilyl groups substituted with 1 or 2 aryl groups such as phenyldiisopropylsilyl; methoxymethyl;
Lower alkoxymethyl groups such as 1,1-dimethyl-1-methoxymethyl, ethoxymethyl, propoxymethyl, isopropoxymethyl, butoxymethyl, t-butoxymethyl, lower alkoxylated lower alkoxymethyl groups such as 2-methoxyethoxymethyl groups, such as 2,2.2-trichloroethoxymethyl, bis(2-chloroethoxy)methyl, alkoxymethyl groups such as lower alkoxymethyl; 1-ethoxyethyl, 1-methyl-
Lower alkoxylated ethyl groups such as 1-methoxyethyl and 1-(isopropoxy)ethyl, halogenated ethyl groups such as 2.2.2-trichlorophototyl, and esters such as 2-(phenylzelenyl)ethyl. Ether groups such as ruzelenylated ethyl groups; such as benzyl, phenethyl, 3-phenylpropyl, α-naphthylmethyl, β-naphthylmethyl, diphenylmethyl, triphenylmethyl, α-naphthyldiphenylmethyl, 9-anthrylmethyl a lower alkyl group substituted with 1 to 3 aryl groups,
4-Methylbenzyl, 2.4.6-)limethylbenzyl, 3,4.5-)limethylpenzyl, 4-methoxybenzyl, 4-methoxyphenyldiphenylmethyl, 2
-nido, lopenzyl, 4-nitrobenzyl, 4-chlorobenzyl, 4-bromobenzyl, 4-cyanopenol,
4-Cyanohenzoldiphenylmethyl, bis(2-nitrophenyl)methyl, biperonyl, and other aryl rings substituted with lower alkyl, lower alkoxy, nitro, halogen, or cyano groups and substituted with 1 to 3 aryl groups. Aralkyl groups such as lower alkyl groups; methoxycar is nyl, lower alkoxycars are nyl groups such as ethoxycarbonyl, t-butoxymergenyl, imbutoxycarbunyl, 2,2゜2-)'J chlorotetraethoxycar is nyl ,
Alkoxycarginyl groups, such as lower alkoxycar-nyl groups substituted with halogen or tri-lower alkylsilyl groups, such as 2-trimethylsilylethoxycargenyl: pinyloxycargenyl, allyloxycargenyl, etc. Alkenyloxycar is a nyl group: benzyloxycarbonyl, 4-methoxybenzyloxycargenyl, 3.
4-dimethoxypenzyloxycargenyl, 2-ditop
An aralkyloxycar whose aryl ring may be substituted with one or two lower alkoxy or nitro groups, such as benzyloxycargenyl and 4-nitropenzyloxycarbonyl? Mention may be made of protective groups in the reaction such as nyl groups, preferably aliphatic acyl groups and aromatic acyl groups.
R1及びR2で定義された「置換された水酸基」の置換
基としては、例えば、メチル、エチル、プロピル、イソ
プロピル、ブチル、イソブチル、8−ブチル、t−ブチ
ル、ペンチル、ヘキシルのような炭素数1乃至6個の低
級アルキル基又はフェニル、4−トリル、4−メトキシ
7エ二ル、4−り四ロフェニル、α若シくはβ−ナフチ
ルのような低級アルキル、低級アルコキシ、−ロゲン原
子で置換されていてもよいアリール基を挙げることがで
きる。Examples of substituents of the "substituted hydroxyl group" defined by R1 and R2 include those having 1 carbon number such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, 8-butyl, t-butyl, pentyl, and hexyl. Substituted with 6 to 6 lower alkyl groups or lower alkyl, lower alkoxy, -rogen atoms such as phenyl, 4-tolyl, 4-methoxy7enyl, 4-ritetraphenyl, α- or β-naphthyl Examples include aryl groups which may be substituted.
Yで定義された「保膨されていてもよいアミノ基」とは
、下記の保護基が1又は2個アミノ基を保護していても
よい基を示し、該保護基としては、通常アミン基の保護
基として使用するものであれば限定はないが、好適には
、例えば、前記脂肪族アシル基;前記芳香族アシル基:
前記アルコキシカルがニル基;前記アルケニルオキシカ
ルゲニル基;前記「1乃至2個の低級アルコキシ又はニ
トロ基でアリール環が置換されていてもよいアラルキル
オキシカルゲニル基」;前記シリル基:前記アラルキル
基;又はN、N。The "optionally swollen amino group" defined for Y refers to a group in which the amino group may be protected by one or two of the following protecting groups, and the protecting group usually includes an amine group. There is no limitation as long as it is used as a protecting group for, but preferably, for example, the aliphatic acyl group; the aromatic acyl group:
The above alkoxycargenyl group; the above alkenyloxycargenyl group; the above “aralkyloxycargenyl group whose aryl ring may be substituted with 1 to 2 lower alkoxy or nitro groups”; the above silyl group: the above Aralkyl group; or N, N.
ジメチルアミノメチレン、ベンジリデン、4−メトキシ
ベンジリデン、4−ニトロベンジリデン、サリシリデン
、5−クロロサリシリデン、ジフェニルメチレン、(5
−クロロ−2−ヒドロキシフェニル)フェニルメチレン
のようなシッフ塩基を形成する置換されたメチレン基全
挙げることができ、さらに好適にはアラルキル基である
。Dimethylaminomethylene, benzylidene, 4-methoxybenzylidene, 4-nitrobenzylidene, salicylidene, 5-chlorosalicylidene, diphenylmethylene, (5
Mention may be made of all substituted methylene groups forming Schiff bases such as -chloro-2-hydroxyphenyl)phenylmethylene, more preferably aralkyl groups.
Yで定義された「置換されたアミン基」とは、下記の置
換基が1又は2個アミノ基を置換している基を示し、該
置換基としては、例えば前記低級アルキル基;前記低級
アルコキシ基、2−メトキシエトキシのような低級アル
コキシ化低級アルコaシ基、2.2s2− )リクロロ
エトキシのようなハロゲン化低級アルコキシ基等のアル
コキシ基:ヘンジルオキシ、フェネチルオキシ、3−フ
ェニルプロポ中シ、α−ナフチルメトキシ、β−ナフチ
ルメトキシ、ジフェニルメトキシ、トリフェニルメトキ
シ、α−ナフチルジ7二二ルメトキシ、9−アンスリル
メトキシのような1乃至3個のアリール基で置換された
低級アルコキシ基、4−メチルベンジルオキシ、 2.
4.6−トリメチルベンジルオキシ、3.4.5−トリ
メチルベンジルオキシ、4−メトキシベンジルオキシ、
4−メトキシフェニルジフェニルメトキシ、2−ニトロ
ベンジルオキシ、4−ニトロベンジルオキシ、4−クロ
ロベンジルオキシ、4−ブロモベンジルオキシ、4−シ
アノベンジルオキシ、4−シアノベンジルジフェニルメ
トキシ、ビス(2−ニトロフェニル)メトキシ、ピペロ
ニルオキシのような低級アルキル、低級アルコキシ、ニ
ド寵、ハロゲン、シアノ基でアリール環が置換された1
乃至3個のアリール基で置換された低級アルコキシ基等
のアラルキルオキシ基:水酸基;ヒドロキシメチル、2
−ヒドロキシエチル、3−ヒドロキシエチルのようなヒ
ト四キシ置換低級アルキル基;2−アミノエチル、3−
アミノプロピルのよりなアミノ置換アルキル基又は前記
「低級アルキル、低級アルコキシ、ハロゲンで置換され
ていてもよいアリール基」を挙げることができ、好適に
は低級アルキル基である。The "substituted amine group" defined for Y refers to a group in which one or two of the following substituents are substituted for the amino group, and examples of the substituents include the above-mentioned lower alkyl group; the above-mentioned lower alkoxy Alkoxy groups such as lower alkoxylated lower alkoxy groups such as 2-methoxyethoxy, halogenated lower alkoxy groups such as 2-)lichloroethoxy: henzyloxy, phenethyloxy, 3-phenylpropoxy groups , a lower alkoxy group substituted with 1 to 3 aryl groups such as α-naphthylmethoxy, β-naphthylmethoxy, diphenylmethoxy, triphenylmethoxy, α-naphthyldi72nylmethoxy, 9-anthrylmethoxy, 4 -methylbenzyloxy, 2.
4.6-trimethylbenzyloxy, 3.4.5-trimethylbenzyloxy, 4-methoxybenzyloxy,
4-Methoxyphenyldiphenylmethoxy, 2-nitrobenzyloxy, 4-nitrobenzyloxy, 4-chlorobenzyloxy, 4-bromobenzyloxy, 4-cyanobenzyloxy, 4-cyanobenzyldiphenylmethoxy, bis(2-nitrophenyl) ) 1 in which the aryl ring is substituted with lower alkyl, lower alkoxy, nitrogen, halogen, or cyano group such as methoxy, piperonyloxy
Aralkyloxy group such as a lower alkoxy group substituted with 3 to 3 aryl groups: hydroxyl group; hydroxymethyl, 2
-human tetraxy-substituted lower alkyl groups such as hydroxyethyl, 3-hydroxyethyl; 2-aminoethyl, 3-
Examples include amino-substituted alkyl groups such as aminopropyl or the above-mentioned "aryl groups optionally substituted with lower alkyl, lower alkoxy, or halogen", and preferred are lower alkyl groups.
「ハロゲン化試薬」とは、例えば、スルフェニルクロリ
ド、スルフェニルプロミド、スルフェニルアイオダイド
のようなスルフェニル^ライP類、スルホニルクロリド
、スルホニルブロミr1スルホニルアイオダイPのよう
なスルホニルハライド類、三塩化燐、三臭化燐、三沃化
燐のよりな三ハロゲン化燐類、五塩化燐、五臭化燐、五
沃化燐のような五ハロゲン化燐類又はオキシ塩化燐、オ
キシ臭化燐、オキシ沃化燐のようなオキシハロゲン化燐
類を挙げることができ、好適には、オキシーロゲン化燐
類である。"Halogenating reagent" means, for example, sulfenyl chloride, sulfenyl bromide, sulfenyl iodide P such as sulfenyl chloride, sulfonyl chloride, sulfonyl bromyr1 sulfonyl halides such as sulfonyl iodide P. , phosphorus trihalides such as phosphorus trichloride, phosphorus tribromide, and phosphorus triiodide; phosphorus pentahalides such as phosphorus pentachloride, phosphorus pentabromide, and phosphorus pentaiodide; Oxyhalogenated phosphorus such as phosphorus bromide and phosphorus oxyiodide can be mentioned, and oxyhalogenated phosphorus is preferable.
第1工程は、化合物(りとアミン化合物とを溶媒中で反
応させ、所望により、アミン基の保護基又は/及び水酸
基の保護基を除去することにより、4位のハロゲン原子
を、式Yを有する基に置換した化合物(II)を展進す
る工程である。The first step is to react the compound (ri) with an amine compound in a solvent, and optionally remove the protecting group for the amine group and/or the protecting group for the hydroxyl group, thereby converting the halogen atom at the 4-position into the formula Y. This is a step of extending the compound (II) substituted with the group having the compound (II).
反応溶媒は、反応を阻害しないものであれば特に限定は
ないが、好適にはクロロホルム、ジクロルメタンのよう
なハロゲン化炭化水素類、メタノール、エタノールのよ
うな低級アルコール類、N、N−ジメチルホルムアミド
、N、N−ジメチルアセトアミドのようなアミド類又は
ジメチルスルホキシド、ヘキサメチルホスホロアミド、
トリエチルホスフェートのような極性溶媒類が用いられ
る。The reaction solvent is not particularly limited as long as it does not inhibit the reaction, but suitable examples include chloroform, halogenated hydrocarbons such as dichloromethane, lower alcohols such as methanol and ethanol, N,N-dimethylformamide, Amides such as N,N-dimethylacetamide or dimethylsulfoxide, hexamethylphosphoramide,
Polar solvents such as triethyl phosphate are used.
反応温度は、用いる原料、溶媒及び試薬により異なるが
、通常は一10℃〜100℃で、好適にはO℃〜50℃
で実施される。The reaction temperature varies depending on the raw materials, solvents and reagents used, but is usually -10°C to 100°C, preferably 0°C to 50°C.
It will be carried out in
反応時間は、用いる原料、溶媒、試薬及び反応時間によ
り異なるが、通常1時間乃至4日間であり、好適には4
時間乃至3日間である。The reaction time varies depending on the raw materials, solvents, reagents and reaction time used, but is usually 1 hour to 4 days, preferably 4 days.
It takes from 1 hour to 3 days.
所望の工程である保護基の除去反応はその種類によって
異なるが、一般にこの分野の技術において周知の方法に
よって以下の様に実施される。The desired step, the reaction for removing the protecting group, varies depending on the type, but is generally carried out as follows by methods well known in the art.
水酸基又は/及びアミノ基の保護基が、シリル基である
場合は、保護基の除去は、弗化テトラブチルアンモニウ
ムのような弗素アニオンを生成する化合物で処理するこ
とによシ実施することができる。使用される溶媒として
は特に限定はないが、テトラヒドロフラン、ジオキサン
のようなエーテル類が好適である。反応は好適には、室
温付近において10乃至18時間処理することによって
行われる。When the protecting group for the hydroxyl group and/or amino group is a silyl group, the protecting group can be removed by treatment with a compound that generates a fluorine anion, such as tetrabutylammonium fluoride. . The solvent used is not particularly limited, but ethers such as tetrahydrofuran and dioxane are suitable. The reaction is preferably carried out at around room temperature for 10 to 18 hours.
水酸基又は/及びアミノ基の保護基が、アラルキルオキ
シカル−ニル基又はアラルキル基である場合には、還元
剤と接触させることによシ除去することができる0例え
ば、/4ラジウム炭素、白金のような触媒を用い、常温
にて接触還元を行うか、または硫化ナトリウム、硫化カ
リウムのようなアルカリ金属硫化物を使用して実施され
る0反応は溶媒の存在下で行われ、使用される溶媒とし
ては本反応に関与しないものであれば特に限定はないが
、メタノール、エタノールのようなアルコール類、テト
ラヒドロフラン、ジオキサンのようなエーテル類または
酢酸のような脂肪数およびこれらの有機溶媒と水との混
合溶媒が好適である0反応温度は通常、0℃乃至室温付
近であり、反応時間は原料化合物および還元剤の種類に
よって異なるが、通常は5分乃至12時間である。When the protecting group for the hydroxyl group and/or amino group is an aralkyloxycar-nyl group or an aralkyl group, it can be removed by contacting with a reducing agent. For example, /4 radium carbon, platinum Catalytic reduction is carried out at room temperature using a catalyst such as, or an alkali metal sulfide such as sodium sulfide or potassium sulfide is used. There is no particular limitation as long as it does not participate in this reaction, but it may include alcohols such as methanol and ethanol, ethers such as tetrahydrofuran and dioxane, or fatty acids such as acetic acid, and the combination of these organic solvents and water. The reaction temperature at which a mixed solvent is suitable is usually around 0°C to room temperature, and the reaction time varies depending on the type of raw material compound and reducing agent, but is usually 5 minutes to 12 hours.
水酸基又は/及びアミノ基の保護基が、脂肪族アシル基
、芳香族アシル基又はアル;キシカルボニル基である場
合には、水性溶媒の存在下に塩基で処理することにかル
除去することができる。使用される溶媒としては通常の
加水分解反応に使用されるものであれば特に限定はなく
、水、メタノール、エタノール、n−7’ロノヤノール
のようなアルコール類、テトラヒドロ7ラン、゛ ジ
オキサンのよりなエーテル類又はこれらの混合溶媒が好
適である。塩基としては、2化合物の他の部分に影響を
与えないものであれば特に限定はないが、好適には炭酸
ナトリウム、炭酸カリウムのようなアルカリ金属炭酸塩
、水酸化ナトリウム、水酸化カリウムのようなアルカリ
金属水酸化物、溶媒として用いたアルコールのアルカリ
金属アルコキシド類又は濃アンモニア−メタノールを用
いて実施される。好適な反応条件としては、アルコール
類中で当該アルコールのアルカリ金属塩と反応させるも
のである0反応温度は特に限定はないが、副反応を抑制
するために0℃乃至150℃付近が好適である。反応時
間は原料化合物の種類および反応温度などによシ異なる
が、通常5分乃至10時間である。When the protecting group for a hydroxyl group and/or an amino group is an aliphatic acyl group, an aromatic acyl group, or an alkoxycarbonyl group, it can be removed by treatment with a base in the presence of an aqueous solvent. can. The solvent to be used is not particularly limited as long as it is used in ordinary hydrolysis reactions, and examples include water, methanol, ethanol, alcohols such as n-7'lonoyanol, tetrahydro7rane, and dioxane. Ethers or mixed solvents thereof are preferred. The base is not particularly limited as long as it does not affect other parts of the two compounds, but preferably alkali metal carbonates such as sodium carbonate and potassium carbonate, sodium hydroxide, potassium hydroxide, etc. The reaction is carried out using an alkali metal hydroxide, an alkali metal alkoxide of an alcohol, or concentrated ammonia-methanol used as a solvent. Suitable reaction conditions include reacting with an alkali metal salt of the alcohol in an alcohol.The reaction temperature is not particularly limited, but is preferably around 0°C to 150°C in order to suppress side reactions. . The reaction time varies depending on the type of raw material compound, reaction temperature, etc., but is usually 5 minutes to 10 hours.
水酸基又は/及びアミノ基の保護基が、アルコキシメチ
ル基、テトラヒドロピラニル又はテトラヒドロチオピラ
ニル基、テトラヒドロ7ラニル又はテトラヒドロチオ7
ラニル基又は置換されたエチル基である場合には、溶媒
中、酸で処理することにより、除去することができる。The protecting group for hydroxyl group and/or amino group is alkoxymethyl group, tetrahydropyranyl or tetrahydrothiopyranyl group, tetrahydro7ranyl or tetrahydrothio7
If it is a ranyl group or a substituted ethyl group, it can be removed by treatment with an acid in a solvent.
使用される酸としては、好適には塩酸、酢酸−硫酸、ト
シル酸などである。溶媒としては、本反応に関与しない
ものであれば特に限定はないが、メタノール、エタノー
ルのようなアルコール類、テトラヒドロフラン、ジオキ
サンのようなエーテル類またはこれらの有機溶媒と水と
の混合溶媒が好適である0反応温度は通常0℃乃至50
℃で実施され、反応時間は原料化合物および酸の種類に
よって異なるが、通常10分乃至18時間である。Preferred acids used include hydrochloric acid, acetic acid-sulfuric acid, and tosylic acid. The solvent is not particularly limited as long as it does not participate in this reaction, but alcohols such as methanol and ethanol, ethers such as tetrahydrofuran and dioxane, or a mixed solvent of these organic solvents and water are suitable. A certain zero reaction temperature is usually between 0°C and 50°C.
The reaction time is generally 10 minutes to 18 hours, although the reaction time varies depending on the raw material compound and the type of acid.
水酸基又は/及びアミノ基の保護基がアルケニルオキシ
カルブニル基である場合は、通常、前記水酸基の保護基
が低級脂肪族アシル基、芳香族アシル基またはアル−”
・−コ・・−1キシカルゴニル基である場合の除去反応
の条件と同様にして塩基と処理することにより脱離させ
ることができる。なおアリルオキシカルブニルの場合は
、特にノ々ラジウムおよOトリフェニルホスフィンある
いはニッケルテトラカルゲニルを使用して除去する方法
が簡便で、副反応が少な〈実施することができる。When the protecting group for the hydroxyl group and/or the amino group is an alkenyloxycarbunyl group, the protecting group for the hydroxyl group is usually a lower aliphatic acyl group, an aromatic acyl group, or an alkenyloxycarbunyl group.
It can be removed by treatment with a base in the same manner as the removal reaction conditions for the .-co.--1 xycargonyl group. In the case of allyloxycarbunyl, removal using nonoradium, Otriphenylphosphine or nickel tetracargenyl is particularly simple and can be carried out with fewer side reactions.
反応終了後、目的化合物は常法に従って反応混合物から
単離することができる0例えば、再結晶、分取用薄層ク
ロマトグラフィー、カラムクロマトグラフィー等により
精製して、純品を得ることができる。After completion of the reaction, the target compound can be isolated from the reaction mixture according to conventional methods. For example, it can be purified by recrystallization, preparative thin layer chromatography, column chromatography, etc. to obtain a pure product.
第2工程は、本庄らの方法(ケミカル・7アーマシユー
テイカル・プルティン、18* 554(1970))
に従って製造されるZ/ 3/−ジデオキシウリジン化
合物CDI)と、溶媒の存在下又は非存在下に、脱酸剤
及びノーロゲン化試薬とを反応させ、次いで、生成物を
単離し、又は単離することなく、アミン化合物と反応さ
せ、所望により、第1工程の所望の工程の記載に準じて
脱保護することにより 2/、 3/−ジデオキシシチ
ジン銹導体+Illを製造する工程である。The second step is the method of Honjo et al.
Z/3/-dideoxyuridine compound CDI) prepared according to the method of the invention is reacted with a deoxidizing agent and a norogenating reagent in the presence or absence of a solvent, and then the product is isolated or isolated. In this step, the 2/, 3/-dideoxycytidine rust conductor +Ill is produced by reacting it with an amine compound and, if desired, deprotecting it according to the description of the desired step in the first step.
溶媒を使用する場合の反応溶媒としては、反応を阻害し
ないものであれば特に限定はないが、好適には、酢酸エ
チル、プロピオン酸エチルのようなエステル類又はノク
ロルメタン、クロロホルムのようなノ・ロゲン化炭化水
素類である。When using a solvent, the reaction solvent is not particularly limited as long as it does not inhibit the reaction, but preferably esters such as ethyl acetate and ethyl propionate, or chloroforms such as nochloromethane and chloroform. Hydrocarbons.
使用される脱酸剤としては、有機塩基であれば、特に限
定はないが、好適には、ジエチルアニリン、ジメチルア
ニリンのような芳香族第三級アミン類又はトリエチルア
ミンのようなトリ低級アルキルアミン類である。The deoxidizing agent used is not particularly limited as long as it is an organic base, but aromatic tertiary amines such as diethylaniline and dimethylaniline, or tri-lower alkyl amines such as triethylamine are preferably used. It is.
反応温度は、原料、溶媒の有無、使用溶媒の種類及び使
用するハロゲン化試薬により異なるが、通常は30℃乃
至200℃で、好適には、反応液の沸点で行われる。The reaction temperature varies depending on the raw materials, the presence or absence of a solvent, the type of solvent used, and the halogenating reagent used, but it is usually carried out at 30°C to 200°C, preferably at the boiling point of the reaction solution.
反応時間は、原料、溶媒の有無、使用溶媒の種類、使用
するハロゲン化試薬及び反応温度によシ異なるが、通常
、10分乃至5時間であり、好適には20分乃至4時間
である。The reaction time varies depending on the raw materials, the presence or absence of a solvent, the type of solvent used, the halogenating reagent used, and the reaction temperature, but is usually 10 minutes to 5 hours, preferably 20 minutes to 4 hours.
反応終了後、本反応の目的化合物は常法に従って、反応
混合物から採取される0例えば、反応混合物に水と混和
しない有機溶媒を加え、水洗後、溶剤を留去することに
よって得られる。After completion of the reaction, the target compound of this reaction is collected from the reaction mixture according to a conventional method.For example, an organic solvent that is immiscible with water is added to the reaction mixture, and after washing with water, the solvent is distilled off.
得られた目的化合物は必要ならば、常法、例えば再結晶
、再沈殿又はクロマトグラフィー等によって更に精製で
きる。The obtained target compound can be further purified, if necessary, by conventional methods such as recrystallization, reprecipitation, or chromatography.
以下に実施例をあげて、更に詳しく述べる。Examples will be given below to describe in more detail.
オキシ塩化リン26.5Mに、ジエチルアニリン4.4
dを加え、還流5分後、放冷し、この溶液f 5’−o
−ベンゾイル−2/、 3/−シアオキシウリジン3.
02を酢酸エチル26.5dに懸濁した溶液に加えると
直ちに溶けた。還流23分後、溶媒を留去し、酢酸エチ
ル1100I、氷水1001を加えて溶かし、酢酸エチ
ル層を分取後、氷水1001で2回洗浄した。さらに氷
を含む5チ炭酸水素ナトリウム水溶液100反で洗浄後
、氷水1001で2回洗浄した後、酢酸エチル層を無水
硫酸マグネシウムで乾燥後、戸去し、溶媒を留去して、
4−クロロ−5′−〇−ペンソイルー2′、3′−ゾデ
オキシクリジンを得た。上記化合物を乾燥クロロホルム
180mJに溶かし、−10〜−15℃に冷却し、乾燥
アンモニアガスを1時間導通した。密@をして室温に3
日間放置後、溶媒を留去すると、粗M5メー0−ベンゾ
イル−2/、3/−ジデオキシジチゾンが得られた。こ
の化合物をさらに、乾燥メタノール’iomtに溶かし
28チナトリウムメチラート溶液1.13m/i加えて
、10分間還流を行った。溶媒を留去して、酢酸エチル
5Qm/と水50m/に溶かし、水層を分取し、更に酢
酸エチル50m1で2回洗浄した。各酢酸エチル層を水
30dで順次逆抽出した後、水層を合せて、−規定塩酸
で−7,0とした後に、cHP20P (ハイデーラス
ポリマー75〜150μ:三菱ケミカル社製)300m
/を詰め九カラム圧通し、水で溶出した1表記化合物を
含む部分を濃縮し、凍結乾燥して1.11の表記化合物
を得た。(54,9%)エタノール60m1で再結晶す
ると0.876F(43,7悌)が得られた。さらに母
液を濃縮し、エタノール10dから結晶化させて第二結
晶として、0.17tを得、合せて1.046f (5
2,2%)の表記化合物を得た。なおここで得られた表
記目的化合物の諸性質は前記ホルビツツらの報告してい
る化合物に完全に一致した。26.5M of phosphorus oxychloride, 4.4M of diethylaniline
d was added, and after refluxing for 5 minutes, it was allowed to cool, and this solution f 5'-o
-benzoyl-2/, 3/-cyaoxyuridine 3.
When added to a solution of 02 suspended in 26.5 d of ethyl acetate, it immediately dissolved. After 23 minutes of refluxing, the solvent was distilled off, 1100 l of ethyl acetate and 100 l of ice water were added to dissolve it, and the ethyl acetate layer was separated and washed twice with 100 l of ice water. Further, after washing with 100 volumes of aqueous sodium bicarbonate solution containing ice and twice with 100 parts of ice water, the ethyl acetate layer was dried over anhydrous magnesium sulfate, removed, and the solvent was distilled off.
4-chloro-5'-〇-pensoyl-2',3'-zodeoxyclidine was obtained. The above compound was dissolved in 180 mJ of dry chloroform, cooled to -10 to -15°C, and dried ammonia gas was passed through the solution for 1 hour. Closely @ and bring to room temperature 3
After standing for a day, the solvent was distilled off to obtain crude M5m 0-benzoyl-2/, 3/-dideoxydithizone. This compound was further dissolved in dry methanol'iomt and 1.13 m/i of a solution of 28tin sodium methylate was added thereto, followed by refluxing for 10 minutes. The solvent was distilled off, and the residue was dissolved in 5 Qm of ethyl acetate and 50 m of water, and the aqueous layer was separated and further washed twice with 50 ml of ethyl acetate. After sequentially back-extracting each ethyl acetate layer with 30 d of water, the aqueous layers were combined and adjusted to -7.0 with -normal hydrochloric acid, followed by cHP20P (Hydelas Polymer 75-150μ: manufactured by Mitsubishi Chemical Corporation) 300 m
The mixture was pressurized through nine columns packed with /, and the portion containing compound No. 1 eluted with water was concentrated and lyophilized to obtain compound No. 1.11. (54.9%) Recrystallized with 60ml of ethanol to obtain 0.876F (43.7°). The mother liquor was further concentrated and crystallized from 10 d of ethanol to obtain 0.17 t of second crystals, for a total of 1.046 f (5
2.2%) of the title compound was obtained. The properties of the target compound thus obtained were completely consistent with the compound reported by Horvitz et al.
窒素気流下にオキシ塩化リンQ、93mとジエチルアニ
リン1.59M、酢酸エチル10−の混液に、5′−〇
−ベンゾイルー2′、3′−ジデオキシウリジン316
1+lvを加えて、加熱還流100分行った。溶媒を留
去し、残留物に酢酸エチル20−と氷水20 d f加
え、酢酸エチル層を分取後、氷を含む希塩酸水溶液、氷
を含む炭酸水素ナトリウム水溶液、氷水各15廐で順次
洗浄後、酢酸エチル層を無水硫酸マグネシウムで乾燥後
、戸去して、溶媒を留去した。残留物をシリカゲルクロ
マトで分離精製しく1%メタノール−塩化メチレン溶液
)、250η(74,51の表記化合物を得た。Under a nitrogen stream, 5'-〇-benzoyl-2',3'-dideoxyuridine 316 was added to a mixture of phosphorus oxychloride Q, 93m, diethylaniline 1.59M, and ethyl acetate 10-.
1+lv was added and heated under reflux for 100 minutes. The solvent was distilled off, 20 df of ethyl acetate and 20 df of ice water were added to the residue, and the ethyl acetate layer was separated and washed sequentially with 15 g each of dilute hydrochloric acid aqueous solution containing ice, sodium bicarbonate aqueous solution containing ice, and ice water. After drying the ethyl acetate layer over anhydrous magnesium sulfate, it was removed and the solvent was distilled off. The residue was separated and purified using silica gel chromatography to obtain the title compound (1% methanol-methylene chloride solution), 250η (74,51).
、 THF
UVスペクトル、λ 275 nm (sh)、2
84nmax
(sh)、305nm、 314nm
NMRスペクトル(δin CDCl2 ) : 7.
4〜8.3・(611!。, THF UV spectrum, λ 275 nm (sh), 2
84nmax (sh), 305nm, 314nm NMR spectrum (δin CDCl2): 7.
4~8.3・(611!.
m、6−H,フェニル)、6.21(IEI、d、J=
7、Ocps 、 5−H)、6.00 (I Tl
、 q 、 J=2.6゜1’−H)、4.3〜4.7
(3H,m、4’、5’−1)、1.7〜2.8 (4
H、m 、 2’、3’−H)実施例2の化合物250
Wqを乾燥クロロホルム201に溶かし、−10〜−1
5℃に冷却して、乾燥アンモニアガスを15分間導通し
た。@栓をして、室温に3日間放置した。溶媒を留去す
ると、粗製51−0−ベンゾイル−2/、3/−ジデオ
キシシチジンが得られた。この化合物を乾燥メタノール
10ゴに溶かし、28チナトリウムメチラート溶液0.
15Nを加え、10分間還還流性った。溶媒を留去して
、酢酸エチル101と水10ゴに溶かし、水層を分取し
、更に酢酸エチル10ばで2回洗浄した。各酢酸エチル
層を水51で、順次逆抽出した。水層を合せて、−規定
塩酸でpH7,0とした後に、CI’1P−20P 4
0プを詰めたカラムに通し、水で溶出した。表記化合物
を含む部分を濃縮し、凍結乾燥して1301q(82,
61)の表記化合物を得た。エタノール41Ltで結晶
化させ1091F(6−9,3%)が得られた。さらに
母液を濃縮してエタノール1rILtで結晶化させて第
二結晶として9wIfを得、合せて118w(75,3
1)の表記目的化合物を得た。m, 6-H, phenyl), 6.21 (IEI, d, J=
7, Ocps, 5-H), 6.00 (I Tl
, q, J=2.6°1'-H), 4.3~4.7
(3H, m, 4', 5'-1), 1.7-2.8 (4
H, m, 2', 3'-H) Compound 250 of Example 2
Dissolve Wq in dry chloroform 201, -10 to -1
It was cooled to 5° C. and dry ammonia gas was passed through it for 15 minutes. The container was capped and left at room temperature for 3 days. After evaporating the solvent, crude 51-0-benzoyl-2/,3/-dideoxycytidine was obtained. This compound was dissolved in 10 g of dry methanol and 0.0 g of a solution of 28 titanium methylate.
15N was added and the mixture was refluxed for 10 minutes. The solvent was distilled off, the residue was dissolved in 10 parts of ethyl acetate and 10 parts of water, and the aqueous layer was separated and further washed twice with 10 parts of ethyl acetate. Each ethyl acetate layer was sequentially back-extracted with 51 portions of water. After combining the aqueous layers and adjusting the pH to 7.0 with -normal hydrochloric acid, CI'1P-20P 4
It was passed through a column packed with water and eluted with water. The portion containing the title compound was concentrated and lyophilized to yield 1301q (82,
The title compound of 61) was obtained. It was crystallized with 41 Lt of ethanol to obtain 1091F (6-9, 3%). Further, the mother liquor was concentrated and crystallized with ethanol 1rILt to obtain 9wIf as a second crystal, for a total of 118w (75,3
The title compound of 1) was obtained.
なおここに得られた表記目的化合物の諸性質は実施例1
で得られた化合物と一致した。The properties of the target compound obtained here are as shown in Example 1.
The results were consistent with the compound obtained in .
Claims (2)
いてもよい水酸基又は置換された水酸基を示す。)を有
する化合物を、式YHを有する化合物(式中、Yは保護
されていてもよいアミノ基又は置換されたアミノ基を示
す。)と反応させ、所望により、保護基を除去すること
を特徴とする 一般式 ▲数式、化学式、表等があります▼(II) (式中、Yは前記と同意義を示し、R^2はR^1と同
様の基を示す。)で表わされる2′,3′−ジデオキシ
シチジン誘導体の製法。(1) General formula▲There are mathematical formulas, chemical formulas, tables, etc.▼(I) (In the formula, X represents a halogen atom, and R^1 represents an optionally protected hydroxyl group or a substituted hydroxyl group.) is reacted with a compound having the formula YH (wherein Y represents an optionally protected amino group or a substituted amino group), and optionally, the protecting group is removed. General formula ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (II) (In the formula, Y has the same meaning as above, and R^2 represents the same group as R^1.) 2', 3 Method for producing ′-dideoxycytidine derivatives.
された水酸基を示す。)を有する化合物と、ハロゲン化
試薬とを反応させ、次いで、生成物を単離し、又は単離
することなく、式YHを有する化合物(式中、Yは保護
されていてもよいアミノ基又は置換されたアミノ基を示
す。)と反応させ、所望により保護基を除去することを
特徴とする 一般式 ▲数式、化学式、表等があります▼(II) (式中、Yは前記と同意義を示し、R^2はR^1と同
様の基を示す。)で表わされる2′,3′−ジデオキシ
シチジン誘導体の製法。(2) A compound having the general formula ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (III) (In the formula, R^1 represents an optionally protected hydroxyl group or a substituted hydroxyl group.) and a halogenating reagent and then, with or without isolation of the product, a compound having the formula YH, where Y represents an optionally protected amino group or a substituted amino group. A general formula characterized by reacting and removing a protecting group if desired ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (II) (In the formula, Y has the same meaning as above, and R^2 is R^1 A method for producing a 2',3'-dideoxycytidine derivative represented by
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62117924A JPH0686448B2 (en) | 1987-05-14 | 1987-05-14 | Process for producing 2 ', 3'-dideoxycytidine derivative |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62117924A JPH0686448B2 (en) | 1987-05-14 | 1987-05-14 | Process for producing 2 ', 3'-dideoxycytidine derivative |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63284193A true JPS63284193A (en) | 1988-11-21 |
JPH0686448B2 JPH0686448B2 (en) | 1994-11-02 |
Family
ID=14723560
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62117924A Expired - Fee Related JPH0686448B2 (en) | 1987-05-14 | 1987-05-14 | Process for producing 2 ', 3'-dideoxycytidine derivative |
Country Status (1)
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JP (1) | JPH0686448B2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07147851A (en) * | 1993-11-30 | 1995-06-13 | Kajima Corp | Apparatus for supplying water to potted plant |
-
1987
- 1987-05-14 JP JP62117924A patent/JPH0686448B2/en not_active Expired - Fee Related
Also Published As
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JPH0686448B2 (en) | 1994-11-02 |
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