JPS63282217A - Manufacture of high-purity metal chromium - Google Patents
Manufacture of high-purity metal chromiumInfo
- Publication number
- JPS63282217A JPS63282217A JP11487187A JP11487187A JPS63282217A JP S63282217 A JPS63282217 A JP S63282217A JP 11487187 A JP11487187 A JP 11487187A JP 11487187 A JP11487187 A JP 11487187A JP S63282217 A JPS63282217 A JP S63282217A
- Authority
- JP
- Japan
- Prior art keywords
- powder
- metal
- metal chromium
- vacuum
- chromium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title claims abstract description 54
- 239000011651 chromium Substances 0.000 title claims abstract description 54
- 229910052804 chromium Inorganic materials 0.000 title claims abstract description 47
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 38
- 239000002184 metal Substances 0.000 title claims abstract description 38
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 15
- 239000000843 powder Substances 0.000 claims abstract description 13
- 238000010438 heat treatment Methods 0.000 claims abstract description 12
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 11
- 239000000203 mixture Substances 0.000 claims abstract description 10
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 9
- 239000001257 hydrogen Substances 0.000 claims abstract description 9
- 239000012535 impurity Substances 0.000 claims abstract description 8
- 229910052802 copper Inorganic materials 0.000 claims abstract description 7
- 238000002156 mixing Methods 0.000 claims abstract description 7
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 7
- 229910052753 mercury Inorganic materials 0.000 claims abstract description 6
- 229910052718 tin Inorganic materials 0.000 claims abstract description 6
- 239000003575 carbonaceous material Substances 0.000 claims abstract 2
- 238000000034 method Methods 0.000 claims description 17
- 229910052760 oxygen Inorganic materials 0.000 abstract description 8
- 229910052757 nitrogen Inorganic materials 0.000 abstract description 5
- 229910052717 sulfur Inorganic materials 0.000 abstract description 5
- 229910000601 superalloy Inorganic materials 0.000 abstract description 2
- 230000001105 regulatory effect Effects 0.000 abstract 1
- 230000000694 effects Effects 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000003832 thermite Substances 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000006477 desulfuration reaction Methods 0.000 description 2
- 230000023556 desulfurization Effects 0.000 description 2
- 238000005868 electrolysis reaction Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229940037003 alum Drugs 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、高純度金属クロムの製造方法に関し、特にＳ
、０．Ｎ含有量の低い金属クロムを製造する方法であっ
て、電子工業の分野や耐食耐熱合金（スーパーアロイ）
の製造の分野における原料として好適な高純度金属クロ
ムを有利に製造する技術についての提案である。Detailed Description of the Invention (Field of Industrial Application) The present invention relates to a method for producing high-purity metallic chromium, and in particular to a method for producing high-purity metallic chromium.
, 0. A method for producing metallic chromium with low N content, which is used in the electronic industry and corrosion-resistant and heat-resistant alloys (superalloys).
This is a proposal for a technology for advantageously producing high-purity metallic chromium, which is suitable as a raw material in the field of production.
（従来の技術）
金属クロムの製造方法としては、Ｃｒｔ（ＳＯ４）３の
電解、あるいはＣｒ、０１のＡｌテルミット還元法が知
ら五ている。これら既知の製造方法によって得られた金
属クロムは、Ｓ、Ｏ，Ｎの含有量が高く電子材料用には
不向きである。すなわち、前記電解法は、電解液にＣｒ
ｔ （ＳＯｎ）３を使用しているため、金属クロム中の
Ｓが２００〜３００ｐｐｍも含まれており、また水溶液
電解であるため０を５０００〜１００００ ｐｐｍ。(Prior Art) Five known methods for producing metallic chromium include electrolysis of Crt(SO4)3 and Al thermite reduction of Cr and 01. Metallic chromium obtained by these known production methods has a high content of S, O, and N and is unsuitable for electronic materials. That is, in the electrolytic method, Cr is added to the electrolytic solution.
Since t (SOn)3 is used, 200 to 300 ppm of S is contained in the metal chromium, and since it is an aqueous solution electrolysis, the amount of S is 5000 to 10000 ppm.
Ｎを２００〜５００ｐｐｍも含有している。一方、テル
ミット法では、原料のＣｒ、０．の析出に硫酸を使用す
ることや、反応時に原料中のＳのほとんどが金属クロム
中に留まるため、金属クロム中のＳ分は２００〜４００
Ｐｐｍもある。また、Ｏ含有量については、還元材のＡ
Ｎの配合を増量することにより低下させることが可能で
あるが、過剰分のＡｌが金属クロム中に残ることからＡ
Ｉの配合を低めにする必要があり、その結果０含有量は
３０００〜４０００ｐｐｍと高い。さらに、Ｎ含有量も
約２００ｐｐｍと高い。It also contains 200 to 500 ppm of N. On the other hand, in the thermite method, the raw material Cr, 0. Because sulfuric acid is used for precipitation and most of the S in the raw material remains in the metal chromium during the reaction, the S content in the metal chromium is between 200 and 400.
There is also PPM. In addition, regarding the O content, A of the reducing agent
It is possible to reduce the amount of N by increasing the content of N, but since the excess amount of Al remains in the metal chromium, the
It is necessary to lower the content of I, and as a result, the 0 content is as high as 3000 to 4000 ppm. Furthermore, the N content is also high at about 200 ppm.
上記の各方法で製造された金属クロムは、上述の如（い
ずれもＳ、Ｏ，Ｈの含有量が多く、使途に適合する金属
クロムを得るためにはこれらの不純物元素は除去されね
ばならない。そのため従来、真空炭素還元法、あるいは
水素還元法などにより脱ガス処理を施すことが試みられ
た。かかる真空炭素還元法は粉砕した金属クロムに炭素
粉を加えて真空中で加熱することにより、金属クロム中
の酸素をＣＯとして除去する方法であり、また、水素雰
囲気還元法は、粉砕した金属クロムを水素雰囲気で加熱
することにより酸素をＨ，Ｏとして除去する方法である
。The metallic chromium produced by each of the above methods has a high content of S, O, and H, as described above, and these impurity elements must be removed in order to obtain metallic chromium suitable for the intended use. Therefore, attempts have been made to perform degassing treatment by vacuum carbon reduction method or hydrogen reduction method.In such vacuum carbon reduction method, carbon powder is added to crushed metallic chromium and heated in vacuum. This is a method of removing oxygen in chromium as CO, and the hydrogen atmosphere reduction method is a method of removing oxygen as H and O by heating pulverized metal chromium in a hydrogen atmosphere.
（発明が解決しようとする問題点）
上記従来技術は、真空中、水素雰囲気中で加熱すること
から、Ｓ≦５０ｐｐｍ 、 Ｎ ＜ １０ｐｐｍを実現
できるが、電子材料の分野で要請されるようなＳ≦１０
ｐｐｍの金属クロムを得るまでには至っていないのが実
情である。(Problems to be Solved by the Invention) The above-mentioned conventional technology can achieve S≦50ppm and N<10ppm because it is heated in vacuum and in a hydrogen atmosphere. ≦10
The reality is that we have not yet reached the point where we can obtain ppm metallic chromium.
本発明の目的は、Ｓ、Ｏ，Ｎ等の不純物含有量がもっと
低い高純度な金属クロムを安価に製造できる方法を開発
するところにある。An object of the present invention is to develop a method that can inexpensively produce high-purity metallic chromium with a lower content of impurities such as S, O, and N.
（問題点を解決するための手段） 上述の目的を達成する課題解決手段として本発明は、 ■ 基本的には、粗金属クロム粉に対して、Ｓｎ。(Means for solving problems) As a problem-solving means for achieving the above-mentioned object, the present invention has the following features: ■Basically, Sn to coarse metal chromium powder.
Ｎｉ、 Ｃｕ、 Ｈｇなどの易硫化金属粉を加えて真空
中で加熱することにより、主として低Ｓ金属クロムを製
造する方法を提案する。そして、付随的に低０゜低Ｎを
同時に実現することとした。We propose a method for producing mainly low-S metallic chromium by adding easily sulfurized metal powder such as Ni, Cu, Hg, etc. and heating it in vacuum. Additionally, it was decided to achieve low 0° and low N at the same time.
■ そして、さらに低いレベルのＯ，Ｎを実現する方法
として本発明は、上記■の処理に加えて真空炭素還元法
と水素雰囲気還元法とを合わせて実施する方法を提案す
る。これらの方法によれば、得られる金属クロムは不純
物が極めて低いものとなり、上述の使途によく適合する
製品となる。(2) As a method for achieving even lower levels of O and N, the present invention proposes a method in which a vacuum carbon reduction method and a hydrogen atmosphere reduction method are combined in addition to the treatment (2) above. According to these methods, the resulting metallic chromium has extremely low impurities, resulting in a product that is well suited for the above-mentioned uses.
（作 用）
本発明製造方法の下で使用する出発原料である粗金属ク
ロムは、１００メツシユ以下に粉砕したものを用いる。(Function) The crude metal chromium, which is the starting material used in the production method of the present invention, is ground to 100 meshes or less.
１００メソシユ以下の粉にする理由は、金属クロムと易
硫化金属の接触を良くし反応性を高めるためである。The reason why the powder is 100 mesosius or less is to improve the contact between the metal chromium and the easily sulfurized metal and increase the reactivity.
本発明においては、脱硫を目的として易硫化金属を混合
するが、好適なものとしてはＳｎ、 Ｎｉ、 Ｃｕ。In the present invention, easily sulfurizing metals are mixed for the purpose of desulfurization, and preferred examples include Sn, Ni, and Cu.
Ｈｇなどを挙げることができる。これらは硫化物を生成
し易い金属であり、金属クロム粉（Ｍ、Ｃｒ）中のＳと
反応し、ＳｎＳ、 ＮｉＳ、 Ｃｕｂ、 ＨｇＳとなっ
て脱硫（≦１０ ｐｐｍ）に寄与する。Examples include Hg. These are metals that easily generate sulfides, and react with S in metal chromium powder (M, Cr) to become SnS, NiS, Cub, and HgS, contributing to desulfurization (≦10 ppm).
粗金属クロム粉（Ｍ、Ｃｒ）と易硫化金属（Ｄｓ、Ｍ）
との混合に当たっては、バインダ°−３例えばＰＶＡを
添加し、阿、Ｃｒ ：Ｄｓ、Ｍ＝ １ ： ０．５〜１
： ２程度の割合に混合して製団する。混合割合をか
ように限定する理由は、易硫化金属をＳに対して過少に
配合するとメタル中のＳの残留が多く、逆に過剰に配合
するとメタル中にＳｎが残留し金属クロムの純度が低下
するためである。Crude metal chromium powder (M, Cr) and easily sulfurized metal (Ds, M)
When mixing with the binder °-3, for example, PVA is added, A, Cr: Ds, M = 1: 0.5-1
: Mix at a ratio of about 2 and make a dough. The reason why the mixing ratio is limited in this way is that if the easily sulfurized metal is mixed in too little with respect to S, there will be a lot of S remaining in the metal, whereas if it is mixed in excess, Sn will remain in the metal and the purity of the metal chromium will decrease. This is because it decreases.
製団した上記の混合物は、真空中で１２００〜１５００
℃の温度域に保持して４時間加熱する。温度、時間を限
定する理由は、温度が上記の範囲よりも低いと反応が遅
く、一方、高すぎるとＣｒの蒸発損失が大きくなるから
であり、また１２００〜１５００℃の温度域の場合４Ｈ
ｒで平衡となるためである。The prepared above mixture was heated to 1200 to 1500 in vacuum.
Heat for 4 hours while maintaining the temperature in the temperature range of ℃. The reason for limiting the temperature and time is that if the temperature is lower than the above range, the reaction will be slow, while if it is too high, the evaporation loss of Cr will increase.
This is because equilibrium occurs at r.
（実施例）
史上
Ａβテルミット反応によって得られた表１に示す成分の
粗金属クロムをトップグラインダーにて１００メツシユ
以下に粉砕し、Ｓｎ、 Ｎｉ、 Ｃｕ、 Ｈｇをそれぞ
れ金属クロム中のＳに対して原子比で１．０の割合で配
合した。これらをそれぞれ製団して０．２トールの真空
度、１３５０℃で４Ｈｒ加熱した。得られた金属クロム
の分析値を表２に示す。この分析値から判るように、金
属クロム中のＳは５硫化金属を原子比１：１で配合する
ことにより１０ ｐｐｍ以下となる。(Example) Crude metallic chromium with the components shown in Table 1 obtained by historical Aβ thermite reaction was ground into 100 meshes or less using a top grinder, and Sn, Ni, Cu, and Hg were each added to S in metallic chromium. They were blended at an atomic ratio of 1.0. These were respectively prepared and heated at 1350° C. for 4 hours under a vacuum of 0.2 torr. Table 2 shows the analytical values of the obtained metallic chromium. As can be seen from this analytical value, the S content in metallic chromium is reduced to 10 ppm or less by blending metal pentasulfide at an atomic ratio of 1:1.
表１（ｐｐｍ）
表２ （ｐｐｍ）
±１
Ａｌテルミット反応によって得られた表３に示す成分の
粗金属クロムをトップグラインダーにて１００メツシユ
以下に粉砕し、Ｃを金属クロム中の０に対して原子比で
０．９となるように配合し、同時ニＳｎヲ金属りロム中
のＳに対して原子比でＯｌｌ、０．２．０の割合で配合
した。これらを混合製団して０．２トールの真空度、１
３５０℃で４Ｈｒ加熱した。Table 1 (ppm) Table 2 (ppm) ±1 Crude metallic chromium with the components shown in Table 3 obtained by the Al thermite reaction was ground to 100 meshes or less using a top grinder, and C was compared to 0 in metallic chromium. They were blended at an atomic ratio of 0.9, and at the same time, they were blended at an atomic ratio of 0.2.0 to S in the Sn metal laminate. These were mixed and prepared under a vacuum degree of 0.2 torr and 1
It was heated at 350°C for 4 hours.
得られた金属クロムの分析値を表４に示す。この分析値
から判るように、金属クロム中のＳはＳｎを原子比１：
１で配合すれば１０ ｐｐｍ以下となる。但し、過剰分
のＳｎは金属クロム中に残る。また、Ｃによる脱Ｏ効果
、真空加熱による脱Ｎ効果も同時に進行しているのが確
認された。Table 4 shows the analytical values of the obtained metallic chromium. As can be seen from this analysis value, the atomic ratio of S in metallic chromium to Sn is 1:
If it is blended at 1, the concentration will be 10 ppm or less. However, an excess amount of Sn remains in the metal chromium. It was also confirmed that the O-removal effect due to C and the N-removal effect due to vacuum heating were progressing simultaneously.
±１
クロムミョウバンの電解によって得られた表５に示す成
分の粗金属クロムをトップグラインダーにて１００メツ
シユ以下に粉砕し、Ｓｎを金属クロム中のＳに対して原
子比でＯｌｌ、０．２．０の割合に配合した。これらを
混合、製団して０．２トールの真空度、１３５０℃で４
Ｈｒ加熱し、脱Ｓ、脱Ｎを行った。その後、水素雰囲気
中の１５００℃で４Ｈｒ加熱し脱Ｏした。得られた金属
クロムの分析値を表６に示す。分析値から金属クロム中
のＳは配合したＳｎに対して原子比でほぼ１：１で減少
していることが分かる。但し、過剰のＳｎがあると金属
クロム中に残る。また、水素による脱Ｏ効果、真空加熱
による脱Ｎ効果も確認された。±1 Crude metallic chromium having the components shown in Table 5 obtained by electrolyzing chromium alum was ground to 100 mesh or less using a top grinder, and the atomic ratio of Sn to S in the metallic chromium was Oll, 0.2. It was blended at a ratio of 0. These were mixed and made into a mass at 0.2 torr vacuum and 1350°C.
The mixture was heated with Hr to remove S and N. Thereafter, O was removed by heating at 1500° C. for 4 hours in a hydrogen atmosphere. Table 6 shows the analytical values of the obtained metallic chromium. It can be seen from the analytical values that S in metallic chromium is reduced in an atomic ratio of approximately 1:1 with respect to blended Sn. However, if there is an excess of Sn, it will remain in the metal chromium. Additionally, the O removal effect due to hydrogen and the N removal effect due to vacuum heating were also confirmed.
■モ
表６ （ｐｐｍ）
（発明の効果）
以上説明したように本発明によれば、電子工業の分野で
用いられる耐食耐熱合金用原料として好適なＳ、０．Ｎ
含有量が極めて少ない高純度金属クロムを有利に製造す
ることができる。■Mo Table 6 (ppm) (Effects of the Invention) As explained above, according to the present invention, S, 0. N
High purity metallic chromium with an extremely low content can be advantageously produced.
Claims (1)
えて混合し、その後この混合物を真空中で加熱すること
を特徴とする高純度金属クロムの製造方法。 ２、上記易硫化金属粉としてＳｎ、Ｎｉ、Ｃｕ、Ｈｇを
用いることを特徴とする特許請求の範囲第１項に記載の
製造方法。 ３、不純物を多く含む金属クロム粉に易硫化金属粉およ
び炭材を加えて混合し、その後この混合物を真空中で加
熱することを特徴とする高純度金属クロムの製造方法。 ４、上記易硫化金属粉としてＳｎ、Ｎｉ、Ｃｕ、Ｈｇを
用いることを特徴とする特許請求の範囲第３項に記載の
製造方法。 ５、不純物を多く含む金属クロム粉に易硫化金属粉を加
えて混合し、次いでこの混合物を真空中で加熱し、さら
に水素雰囲気中に移して加熱することを特徴とする高純
度金属クロムの製造方法。 ６、上記易硫化金属粉としてＳｎ、Ｎｉ、Ｃｕ、Ｈｇを
用いることを特徴とする特許請求の範囲第５項に記載の
製造方法。[Claims] 1. A method for producing high-purity metallic chromium, which comprises adding and mixing easily sulfurized metal powder to metallic chromium powder containing a large amount of impurities, and then heating this mixture in a vacuum. 2. The manufacturing method according to claim 1, wherein Sn, Ni, Cu, and Hg are used as the easily sulfurized metal powder. 3. A method for producing high-purity metallic chromium, which comprises adding and mixing easily sulfurized metallic powder and carbonaceous material to metallic chromium powder containing many impurities, and then heating this mixture in a vacuum. 4. The manufacturing method according to claim 3, wherein Sn, Ni, Cu, and Hg are used as the easily sulfurized metal powder. 5. Production of high-purity metallic chromium, which is characterized by adding and mixing easily sulfurized metallic powder to metallic chromium powder containing many impurities, then heating this mixture in a vacuum, and further transferring it to a hydrogen atmosphere and heating it. Method. 6. The manufacturing method according to claim 5, wherein Sn, Ni, Cu, and Hg are used as the easily sulfurized metal powder.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11487187A JPS63282217A (en) | 1987-05-13 | 1987-05-13 | Manufacture of high-purity metal chromium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11487187A JPS63282217A (en) | 1987-05-13 | 1987-05-13 | Manufacture of high-purity metal chromium |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63282217A true JPS63282217A (en) | 1988-11-18 |
| JPH0379412B2 JPH0379412B2 (en) | 1991-12-18 |
Family
ID=14648773
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11487187A Granted JPS63282217A (en) | 1987-05-13 | 1987-05-13 | Manufacture of high-purity metal chromium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63282217A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04160124A (en) * | 1990-10-23 | 1992-06-03 | Japan Metals & Chem Co Ltd | Production of high-purity metal chromium |
| JPH0610075A (en) * | 1992-06-29 | 1994-01-18 | Japan Metals & Chem Co Ltd | Method and apparatus for producing high purity metallic chromium |
| WO2000007760A1 (en) * | 1998-08-06 | 2000-02-17 | Eramet Marietta Inc. | Purification process for chromium |
| CN102808092A (en) * | 2012-09-14 | 2012-12-05 | 苏州晶纯新材料有限公司 | Method for preparing ultra low-oxygen chromium sheets |
| CN102876905A (en) * | 2012-09-12 | 2013-01-16 | 朱刚强 | Method for producing high-purity metal chromium by using single vacuum furnace |
| CN103952574A (en) * | 2014-04-30 | 2014-07-30 | 中国科学院过程工程研究所 | Method for producing high-purity metal chromium by reducing anhydrous chromium chloride through utilizing metal magnesium |
| CN110453095A (en) * | 2019-09-17 | 2019-11-15 | 江苏隆达超合金航材有限公司 | The technique for removing impurity element in electrolytic metal chromium |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2939784A (en) * | 1958-09-26 | 1960-06-07 | Union Carbide Corp | Process for elimination of sulfur from metals |
| JPS5956540A (en) * | 1982-08-20 | 1984-04-02 | セ・デラシヨ | Manufacture of high purity metal or alloy |
| JPS6247437A (en) * | 1985-08-26 | 1987-03-02 | Toyo Soda Mfg Co Ltd | Manufacture of metallic chromium with very low nitrogen content |
-
1987
- 1987-05-13 JP JP11487187A patent/JPS63282217A/en active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2939784A (en) * | 1958-09-26 | 1960-06-07 | Union Carbide Corp | Process for elimination of sulfur from metals |
| JPS5956540A (en) * | 1982-08-20 | 1984-04-02 | セ・デラシヨ | Manufacture of high purity metal or alloy |
| JPS6247437A (en) * | 1985-08-26 | 1987-03-02 | Toyo Soda Mfg Co Ltd | Manufacture of metallic chromium with very low nitrogen content |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04160124A (en) * | 1990-10-23 | 1992-06-03 | Japan Metals & Chem Co Ltd | Production of high-purity metal chromium |
| JPH0610075A (en) * | 1992-06-29 | 1994-01-18 | Japan Metals & Chem Co Ltd | Method and apparatus for producing high purity metallic chromium |
| WO2000007760A1 (en) * | 1998-08-06 | 2000-02-17 | Eramet Marietta Inc. | Purification process for chromium |
| US6106765A (en) * | 1998-08-06 | 2000-08-22 | Eramet Marietta Inc. | Purification process for chromium |
| CN102876905A (en) * | 2012-09-12 | 2013-01-16 | 朱刚强 | Method for producing high-purity metal chromium by using single vacuum furnace |
| CN102808092A (en) * | 2012-09-14 | 2012-12-05 | 苏州晶纯新材料有限公司 | Method for preparing ultra low-oxygen chromium sheets |
| CN103952574A (en) * | 2014-04-30 | 2014-07-30 | 中国科学院过程工程研究所 | Method for producing high-purity metal chromium by reducing anhydrous chromium chloride through utilizing metal magnesium |
| CN103952574B (en) * | 2014-04-30 | 2015-08-19 | 中国科学院过程工程研究所 | A kind of method utilizing magnesium metal reduction anhyd chromic chloride to produce high-purity metal chromium |
| CN110453095A (en) * | 2019-09-17 | 2019-11-15 | 江苏隆达超合金航材有限公司 | The technique for removing impurity element in electrolytic metal chromium |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0379412B2 (en) | 1991-12-18 |
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