JPS63279147A - Surface defect inspector - Google Patents
Surface defect inspectorInfo
- Publication number
- JPS63279147A JPS63279147A JP11394587A JP11394587A JPS63279147A JP S63279147 A JPS63279147 A JP S63279147A JP 11394587 A JP11394587 A JP 11394587A JP 11394587 A JP11394587 A JP 11394587A JP S63279147 A JPS63279147 A JP S63279147A
- Authority
- JP
- Japan
- Prior art keywords
- inspected
- reflected
- beams
- vibration
- surface defect
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000007547 defect Effects 0.000 title claims abstract description 35
- 238000007689 inspection Methods 0.000 claims description 16
- 238000005259 measurement Methods 0.000 abstract description 4
- 230000000694 effects Effects 0.000 abstract description 3
- 230000001678 irradiating effect Effects 0.000 abstract description 2
- 230000003746 surface roughness Effects 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000001514 detection method Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000011179 visual inspection Methods 0.000 description 2
- 230000005856 abnormality Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000004439 roughness measurement Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
この発明は、磁気ディスク・サブストレートなどの被検
査体について、その表面に存在する傷などの欠陥を自動
的に検査するための表面欠陥検査装置に関する。Detailed Description of the Invention (Industrial Application Field) This invention is a surface defect inspection method for automatically inspecting defects such as scratches on the surface of an object to be inspected such as a magnetic disk substrate. Regarding equipment.
(従来の技術とその問題点〉
コンピュータ用磁気ディスクのサブストレートや半導体
ウェハなどにおいては、その表面に存在するわずかな傷
などの欠陥によって製品の品質が大きく左右されるため
、その表面を鏡面に近い程度にまで超精密加工するとと
もに、加工後のサブストレート等について表面欠陥検査
を行なう必要がある。(Conventional technology and its problems) The quality of products such as substrates for magnetic disks for computers and semiconductor wafers is greatly affected by defects such as slight scratches on the surface. In addition to ultra-precise processing to a similar level, it is necessary to inspect the substrate for surface defects after processing.
このような欠陥検査は、従来、検査員の目視によって行
なわれており、熟練した検査員はサブミクロンオーダー
の欠陥を識別できるだけでなく、後の洗浄工程などによ
って除去することができる無害なホコリなどと、製品に
影響を及ぼすような欠陥とを判別することができる。そ
して、これによって当該被検査物を後工程に送ってもよ
いのか、それとも不合格品として処分すべきかを判断し
、さらに欠陥の種類によっては、表面加工装置の異常を
感じ取って適切なH7ffiを講することも行なわれて
いる。Traditionally, such defect inspections have been carried out visually by inspectors, and skilled inspectors can not only identify defects on the submicron order, but also detect harmless dust and other particles that can be removed through subsequent cleaning processes. and defects that may affect the product. Based on this, it is determined whether the object to be inspected can be sent to the subsequent process or whether it should be disposed of as a rejected item.Furthermore, depending on the type of defect, an abnormality in the surface processing equipment can be sensed and appropriate H7ffi measures taken. It is also being done.
ところが、上述のように、検査員の目視による検査は多
岐にわたる能力を必要とするため、検査員の養成も容易
ではなく、また、検査員ごとの検査能力の差によって、
製品の品質が必ずしも一様ではないという問題がある。However, as mentioned above, visual inspection by inspectors requires a wide range of abilities, so it is not easy to train inspectors, and due to differences in inspection ability among inspectors,
There is a problem that the quality of products is not necessarily uniform.
そこで、このような検査員の目視に代わる表面欠陥検査
装置が種々提案されている。例えば、特開昭60−69
539に開示されたものがあり、この装置は磁気ディス
ク等の被検査体にスポット光を照射し・被検査体表面に
よる反射光を受光しその受光レベルおよび受光位置の変
化聞と変化方向を検出し、これらを所定の基準値と比較
した判定結果に基づいて被検査体表面の欠陥の有無およ
び欠陥の種類を判別するようにしたものである。Therefore, various surface defect inspection apparatuses have been proposed to replace such visual inspection by inspectors. For example, JP-A-60-69
539, this device irradiates a spot light onto an object to be inspected such as a magnetic disk, receives reflected light from the surface of the object to be inspected, and detects the change and direction of the received light level and light receiving position. However, the presence or absence of a defect on the surface of the object to be inspected and the type of the defect are determined based on the determination results obtained by comparing these values with predetermined reference values.
上記した表面欠陥検査装置を含め、従来の表面欠陥検査
装置は測定装置(特に光学系)と被測定物との位置関係
が不変であることを前提としている。ところが、実際に
は外部からの種々の振動によって被測定物と装置との位
置関係(間隔)は時間的に変動する。そして、これを防
止するためには大きな高性能の除振台を設けねばならず
、装置の設置場所に制限が生じてしまう。また、走査を
行なうために被測定物を移動させるための機構(たとえ
ばスライド機構)の真直度に応じて被測定物が微小に上
下動すると、この振動が測定結果の中に反映されてしま
う。Conventional surface defect inspection apparatuses, including the above-mentioned surface defect inspection apparatus, are based on the premise that the positional relationship between the measurement apparatus (particularly the optical system) and the object to be measured remains unchanged. However, in reality, the positional relationship (interval) between the object to be measured and the device changes over time due to various external vibrations. In order to prevent this, a large, high-performance vibration isolating table must be provided, which limits the installation location of the device. Furthermore, if the object to be measured moves slightly up and down depending on the straightness of a mechanism (for example, a slide mechanism) for moving the object for scanning, this vibration will be reflected in the measurement results.
このため、nmオーダーの粗さ測定のような場合におい
て、実際には、種々の振動などによって被測定面と測定
系との間の間隔が変化するため、高精度の粗さ測定を行
なうことが困難であるという問題があった。For this reason, when measuring nanometer-order roughness, in reality, the distance between the surface to be measured and the measurement system changes due to various vibrations, making it difficult to perform high-precision roughness measurements. The problem was that it was difficult.
また、振動の影響による信号成分を取り除くため、フィ
ルタリング等の信号処理を行なうことができるが、この
方法を用いても被検査体の表面欠陥による信号と、振動
の影響による信号とが位相。In addition, signal processing such as filtering can be performed to remove signal components due to the influence of vibration, but even with this method, the signal due to the surface defect of the object to be inspected and the signal due to the influence of vibration may be out of phase.
周期においてほぼ同じ場合には、これら2つの信号を正
確に弁別することはほとんど不可能であるという問題点
があった。When the periods are almost the same, there is a problem in that it is almost impossible to accurately discriminate between these two signals.
(発明の目的)
この発明の目的は、上記従来技術の問題点を解消し、検
査時における振動の影響を受けることなく高精度に被検
査体の表面欠陥検査を行なうことのできる表面欠陥検査
装置を提供することである。(Object of the Invention) The object of the present invention is to solve the problems of the above-mentioned prior art, and to provide a surface defect inspection device that can perform a surface defect inspection of an object to be inspected with high accuracy without being affected by vibrations during inspection. The goal is to provide the following.
(目的を達成するための手段)
上述の目的を達成するため、この発明にかかる表面欠陥
検査装置(ま・第1および第2の光fi! 6−ら前記
被検査体の表面上の異なる位置にビーム光を各々照射し
、前記被検査体の表面からの第1及び第2の反射光を検
出し、両者の差を求めることで振動による影響を取り除
くようにしている。(Means for Achieving the Object) In order to achieve the above-mentioned object, a surface defect inspection apparatus according to the present invention (first and second light fi! The influence of vibration is removed by irradiating each with a beam of light, detecting the first and second reflected lights from the surface of the object to be inspected, and determining the difference between the two.
(実施例)
第1図はこの発明の一実施例である表面欠陥検査装置の
概略構成図である。同図において、図示しないレーザ光
源からの2つのレーザビームLl。(Embodiment) FIG. 1 is a schematic configuration diagram of a surface defect inspection apparatus which is an embodiment of the present invention. In the figure, two laser beams Ll are emitted from a laser light source (not shown).
L2は偏光ビームスプリッタ(ハーフミラ−)1を介し
て、磁気ディスク等の被検査体2の表面に各々距離lの
間隔で垂直に照射される。これらのレーザビームL1.
L2は被検査体2の表面で反射されて反射光R1,R2
となる。L2 is irradiated perpendicularly to the surface of an object to be inspected 2 such as a magnetic disk through a polarizing beam splitter (half mirror) 1 at intervals of a distance l. These laser beams L1.
L2 is reflected by the surface of the object to be inspected 2 and becomes reflected light R1, R2.
becomes.
これらの反射光R1,R2は各々偏光ビームスプリッタ
1で反則されて、PSD等の輝点位置検出器3a、3b
に至る。このうち、反射光R1は被検査体2の表面に同
図で示したような欠陥がない場合、図中破線で示すよう
な正反射光R81の経路をたどるため、正反射光R61
と反射光R1の輝点位置検出153aへの入射位置の偏
差Δ×1が所定の基準位置を越えたとき、被検査体2の
表面欠陥を検出できるのである。These reflected lights R1 and R2 are each reflected by a polarizing beam splitter 1 and sent to bright spot position detectors 3a and 3b such as PSD.
leading to. Of these, if there is no defect as shown in the figure on the surface of the object to be inspected 2, the reflected light R1 follows the path of the specularly reflected light R81 as shown by the broken line in the figure.
When the deviation Δ×1 of the incident position of the reflected light R1 on the bright spot position detection 153a exceeds a predetermined reference position, a surface defect on the object to be inspected 2 can be detected.
ところが、実際の輝点位置検出器3aにより検出された
偏差Δx1の信号S1は第2図(a)に示すように、振
動による影響が重普されたものとなっているので、被検
査体2の表面欠陥を反映した信号成分(第2図の例では
走査位置P1〜P2に発生している)のみを抽出するの
は困難である。However, as shown in FIG. 2(a), the signal S1 of the deviation Δx1 detected by the actual bright spot position detector 3a is heavily influenced by vibration, so It is difficult to extract only the signal component reflecting the surface defect (in the example of FIG. 2, it occurs at scanning positions P1 to P2).
そこで、反射光R2が入射した輝点位置検出器3bより
検出された正反射光R82と反射光R2の入射位置偏差
ΔX2の信号S2(第2図(b))も検出し、両信号8
1.82を次段の比較器4で比較して、両者の差を取る
ことで第2図(C)に示す如く、被検査体2の表面欠陥
のみを反映した信号S3が抽出できる。これは、被検査
体2の剛性が高ければ信号81.82に含まれている振
動の影響による信号成分は、同位相、同振幅と考えるこ
とができるからである。Therefore, the signal S2 (FIG. 2(b)) of the incident position deviation ΔX2 of the specularly reflected light R82 detected by the bright spot position detector 3b where the reflected light R2 is incident and the reflected light R2 is also detected, and both signals 8
1.82 in the next stage comparator 4, and by taking the difference between the two, it is possible to extract a signal S3 reflecting only the surface defects of the object to be inspected 2, as shown in FIG. 2(C). This is because if the rigidity of the inspected object 2 is high, the signal components due to the influence of vibration included in the signals 81 and 82 can be considered to have the same phase and the same amplitude.
なお、信号S1.S2双方に被検査体2の表面欠陥を反
映した信号成分が含まれる場合、その欠陥位置の検出は
困難となるが被検査体2の表面欠陥の存在する頻度は低
いことから、実用上の問題はない。Note that the signal S1. If both S2 contain a signal component that reflects a surface defect on the object to be inspected 2, it will be difficult to detect the defect position, but since the frequency of surface defects on the object to be inspected 2 is low, this is a practical problem. There isn't.
また、第3図に示すようにレーザビームし−2の入射角
度の変更等を施しても同様の効果を奏する。Further, as shown in FIG. 3, the same effect can be obtained by changing the incident angle of the laser beam by -2.
ただし、偏差信号81,82間のレンジの調整は正確に
行なう必曹があるθ
(発明の効果)
以上説明したように、この発明によれば、第1および第
2の反射光を検出し、両者の差を求めることで振動によ
る影響を取り除いたため、検査時において撮動が生じて
も、高精度の被検査体の表面欠陥の検査を行なうことが
できる。However, it is necessary to accurately adjust the range between the deviation signals 81 and 82. (Advantages of the Invention) As explained above, according to the present invention, the first and second reflected lights are detected, Since the influence of vibration is removed by determining the difference between the two, it is possible to inspect the surface defects of the object to be inspected with high precision even if imaging occurs during inspection.
第1図はこの発明の一実施例である表面欠陥検査装置の
概略構成図、第2図は第1図の表面欠陥検出gi置にお
ける信号変化を示すグラフ、第3図はこの発明の他の実
施例である表面欠陥検査装置の概略構成図である。
2・・・被検査体、
3・・・輝点位置検出装置、
4・・・比較器、
Ll、L2・・・レーザビーム、
R1,R2・・・反射光FIG. 1 is a schematic configuration diagram of a surface defect inspection apparatus that is an embodiment of the present invention, FIG. 2 is a graph showing signal changes at the surface defect detection gi position of FIG. 1, and FIG. 3 is a diagram of another embodiment of the present invention. FIG. 1 is a schematic configuration diagram of a surface defect inspection apparatus according to an embodiment. 2...Object to be inspected, 3...Bright spot position detection device, 4...Comparator, Ll, L2...Laser beam, R1, R2...Reflected light
Claims (1)
的に行なう表面欠陥検査装置において、第1および第2
の光源から前記被検査体の表面上の異なる位置にビーム
光を各々照射し、前記被検査体の表面からの第1及び第
2の反射光を検出し、両者の差を求めることで振動によ
る影響を取り除いたことを特徴とする表面欠陥検査装置
。(1) In a surface defect inspection device that optically inspects surface defects existing on the surface of an object to be inspected, a first and a second
A light beam is irradiated from a light source to different positions on the surface of the object to be inspected, the first and second reflected lights from the surface of the object to be inspected are detected, and the difference between the two is determined. A surface defect inspection device characterized by eliminating the influence.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11394587A JPS63279147A (en) | 1987-05-11 | 1987-05-11 | Surface defect inspector |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11394587A JPS63279147A (en) | 1987-05-11 | 1987-05-11 | Surface defect inspector |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63279147A true JPS63279147A (en) | 1988-11-16 |
Family
ID=14625140
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11394587A Pending JPS63279147A (en) | 1987-05-11 | 1987-05-11 | Surface defect inspector |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63279147A (en) |
-
1987
- 1987-05-11 JP JP11394587A patent/JPS63279147A/en active Pending
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