JPS63275060A - Magneto-optical recording medium - Google Patents

Magneto-optical recording medium

Info

Publication number
JPS63275060A
JPS63275060A JP11019987A JP11019987A JPS63275060A JP S63275060 A JPS63275060 A JP S63275060A JP 11019987 A JP11019987 A JP 11019987A JP 11019987 A JP11019987 A JP 11019987A JP S63275060 A JPS63275060 A JP S63275060A
Authority
JP
Japan
Prior art keywords
protective layer
metal
magneto
optical recording
carbides
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11019987A
Other languages
Japanese (ja)
Inventor
Yoshimitsu Kobayashi
喜光 小林
Yoshiyuki Shirosaka
欣幸 城阪
Toshifumi Kawano
敏史 川野
Yukio Watabe
行男 渡部
Takashi Kobayashi
孝至 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Kasei Corp
Original Assignee
Mitsubishi Kasei Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Kasei Corp filed Critical Mitsubishi Kasei Corp
Priority to JP11019987A priority Critical patent/JPS63275060A/en
Publication of JPS63275060A publication Critical patent/JPS63275060A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To improve corrosion resistance, durability, recording sensitivity and productivity by forming an intermediate protective layer of a metal oxide or metal nitride and forming a protective layer of a specific metal carbide. CONSTITUTION:The intermediate protective layer is formed of the metal oxide or metal nitride and the protective layer is formed of the metal carbide having >=40% reflectivity measured by light of 830nm wavelength. The carbides of Ti, Zr, Ta, Cr, and Mo are more preferable among the metal carbides and above all, the carbides of Ti, Ta and Mo are preferred. The metal oxide and metal nitride are dense to prevent infiltration of moisture and oxygen from the outside, have themselves the high corrosion resistance and small reactivity with a magneto-optical recording layer and have the high adhesiveness to a resin in the case of using a resin substrate as a substrate. The metal carbides are generally opaque and have high reflectivity. The recording sensitivity, corrosion resistance, stability with lapse of time and productivity are thereby improved.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、光学的記録に用いる光磁気記録媒体に関する
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a magneto-optical recording medium used for optical recording.

(従来の技術とその問題点) 光メモリー素子の中でも追加記録、消去が可能な、イレ
ーザブル型メモリーは、光磁気記録方式が最も実用化に
近い段階にいる。光磁気記録媒体の記録層としては総合
的な特性から見て、希土類、遷移金属薄膜が最も優れて
いるが、致命的欠陥として耐食性に欠けるという欠点が
挙げられる。
(Prior art and its problems) Among optical memory devices, magneto-optical recording is at the closest stage to practical use for erasable memory, which allows additional recording and erasure. As a recording layer of a magneto-optical recording medium, thin films of rare earth metals and transition metals are the most excellent in terms of overall characteristics, but a fatal flaw is that they lack corrosion resistance.

すなわち、腐食に伴ない高密度記録の必要条件である保
磁力の低下や、高S/N比の必要条件であるカー回転角
の減少、誤り率の増加など多くの欠陥を露呈する事とな
る。
In other words, many defects are exposed due to corrosion, such as a decrease in coercive force, which is a necessary condition for high-density recording, a decrease in Kerr rotation angle, which is a necessary condition for a high S/N ratio, and an increase in error rate. .

従来、その対策としては2つの方法がとられてきた。即
ち、 (i)記録層に添加物を添加して耐食性を向上する。
Conventionally, two methods have been taken as countermeasures. That is, (i) adding additives to the recording layer to improve corrosion resistance;

(ii)記録層の両側に保護層を設は耐食性を向上する
(ii) Providing protective layers on both sides of the recording layer improves corrosion resistance.

本発明は、保護層を用いる方法に注目してなされたもの
である。
The present invention has been made by focusing on a method using a protective layer.

すなわち、本発明の光磁気記録媒体は基本的に基板−保
護層一記録層一保護層の構成とされたものである。
That is, the magneto-optical recording medium of the present invention basically has a structure of a substrate, a protective layer, a recording layer, and a protective layer.

以降の説明の便宜上基板と記録層との間の保護層を中間
保護層、記録層の基板と反対側に設けられた保護層を保
護層と呼ぶこととする。
For convenience of explanation below, the protective layer between the substrate and the recording layer will be referred to as an intermediate protective layer, and the protective layer provided on the opposite side of the recording layer to the substrate will be referred to as a protective layer.

保護層や中間保護層としてはA 1 g03等の高融点
酸化物やSiNやAfN等の高融点チッ化物等が提案さ
れている。
As the protective layer and intermediate protective layer, high melting point oxides such as A 1 g03 and high melting point nitrides such as SiN and AfN have been proposed.

しかしながら、これらの物質には、夫々問題点があり、
中間保護層と保護層の両層を構成するに満゛足なものは
見出されていない。 ゛これは、中間保護層として必要
な物性は、記録層と反応しないこと、基板との密着性が
良いこと、透明性に優れること、屈折率の大きいこと、
ガスバリヤ−性に優れること等であるのに対し、保護層
としての必要物性は、記録層と反応しないこと、ガスバ
リヤ−性に優れること等は共通するが、透明性や屈折率
は要件とせず、むしろ熱伝導率の低いことがより重要と
なり、必要物性が夫々異なるためである。
However, each of these substances has its own problems.
No material has been found that is satisfactory for forming both the intermediate protective layer and the protective layer.゛This means that the physical properties required for the intermediate protective layer are that it does not react with the recording layer, has good adhesion to the substrate, has excellent transparency, and has a large refractive index.
In contrast, the physical properties necessary for a protective layer include not reacting with the recording layer and having excellent gas barrier properties, but transparency and refractive index are not required. Rather, low thermal conductivity is more important, and the required physical properties are different for each material.

本発明者等はこれらの保護層及び中間保護層に関し、種
々検討を行なった結果、中間保護層と保護層を特定の物
質で構成することにより記録感度が高く、ノイズの少な
い、また経時安定性に優れた光磁気記録媒体が得られる
ことを見出した。
The present inventors have conducted various studies regarding these protective layers and intermediate protective layers, and have found that by composing the intermediate protective layer and protective layer with specific materials, recording sensitivity is high, noise is low, and stability over time is improved. It has been found that a magneto-optical recording medium with excellent properties can be obtained.

〔発明の構成〕[Structure of the invention]

本発明の要旨は、基板上に中間保護層、光磁気記録層お
よび保護層を順次設けてなる光磁気記録媒体において、
中間保護層を金属酸化物、又は金属チッ化物によって形
成し、保護層を波長830nmの光で測定した反射率が
40%以上の金属炭化物によって形成したことを特徴と
する光磁気記録媒体に存する。
The gist of the present invention is to provide a magneto-optical recording medium in which an intermediate protective layer, a magneto-optical recording layer and a protective layer are sequentially provided on a substrate.
A magneto-optical recording medium characterized in that the intermediate protective layer is formed of a metal oxide or a metal nitride, and the protective layer is formed of a metal carbide having a reflectance of 40% or more when measured with light at a wavelength of 830 nm.

以下、本発明の詳細な説明する。The present invention will be explained in detail below.

まず、本発明において用いられる基板としては、ガラス
、アクリル樹脂、ポリカーボネート樹脂等のプラスチッ
ク、又はアルミニウム等の金属、ガラス上に溝つき樹脂
を形成した基板等が挙げられる。
First, examples of the substrate used in the present invention include glass, plastics such as acrylic resin and polycarbonate resin, metals such as aluminum, and substrates in which grooved resin is formed on glass.

基板の厚みは1〜2M程度が一般的である。The thickness of the substrate is generally about 1 to 2M.

光磁気記録層としては、たとえば、TbPe。As the magneto-optical recording layer, for example, TbPe.

TbFeCo、 TbCo、 DyFeCoなどの希土
類と遷移金属の非晶質磁性合金、及びMnB1. Mn
CuB1などの多結晶垂直磁化膜が用いられる。特に希
土系の合金磁性膜に用いて大変効果的である。光磁気記
録層の膜厚は300〜1500人、好ましくは500〜
800人である。
Amorphous magnetic alloys of rare earths and transition metals such as TbFeCo, TbCo, DyFeCo, and MnB1. Mn
A polycrystalline perpendicular magnetization film such as CuB1 is used. It is particularly effective for use in rare earth alloy magnetic films. The thickness of the magneto-optical recording layer is 300 to 1500, preferably 500 to 1,500.
There are 800 people.

本発明においては、上記基板と光磁気記録層の間に金属
酸化物または金属チッ化物を含む層を中間保護層として
形成させる。金属酸化物としてはAf203 、Tag
’s等の金属酸化物単独あるいはこれらの混合物、ある
いはAj! −Ta−0の複合酸化物等が挙げられる。
In the present invention, a layer containing a metal oxide or metal nitride is formed as an intermediate protective layer between the substrate and the magneto-optical recording layer. As a metal oxide, Af203, Tag
's alone or a mixture of these metal oxides, or Aj! -Ta-0 complex oxide, etc. can be mentioned.

また更にこれらに他の元素、例えばSt、 Ti、 Z
r、 W 、Mo、 Yb等が酸化物の形で単独あるい
はAj!、Taと複合して酸化物を形成していてもよい
。これらの金属酸化物は緻密で外部からの水分や酸素の
侵入を防ぎ、耐食性が高く光磁気記録層との反応性も小
であり、また、基板として樹脂基板を使用する場合にも
樹脂との密着性に優れる。
Furthermore, other elements such as St, Ti, Z
r, W, Mo, Yb, etc. alone in the form of oxides or Aj! , may be combined with Ta to form an oxide. These metal oxides are dense and prevent moisture and oxygen from entering from the outside, have high corrosion resistance, and have low reactivity with the magneto-optical recording layer.Also, when using a resin substrate as a substrate, it is difficult to interact with the resin. Excellent adhesion.

金属チッ化物として、具体的にはケイ素、アルミニウム
、ゲルマニウム等の金属のチッ化物あるいはこれらの2
種以上の複合チッ化物又はこれらとニオブ、タンタルと
の複合チッ化物(例えば、5iNbN+ 5iTaN等
)が挙げられる。なかでもSiを含有するチッ化物が良
好な結果をもたらす。
Specifically, metal nitrides include metal nitrides such as silicon, aluminum, and germanium, or two of these metals.
Examples include composite nitrides of more than one species or composite nitrides of these with niobium and tantalum (for example, 5iNbN+5iTaN, etc.). Among them, nitrides containing Si give good results.

金属チッ化物は緻密で外部からの水分や酸素の侵入を防
ぎ、それ自身の耐食性が高く、光磁気記録層との反応性
が小であり、また基板として樹脂基板を使用する場合に
は樹脂との密着性が高い。
Metal nitride is dense and prevents moisture and oxygen from entering from the outside, has high corrosion resistance, and has low reactivity with the magneto-optical recording layer. High adhesion.

この中間保護層の膜厚は300人〜1500人程度が適
当である。
The appropriate thickness of this intermediate protective layer is about 300 to 1,500 layers.

光磁気記録層上には金属炭化物からなる保護層を設ける
。金属炭化物としては、清浄で平坦な基板上に作成され
た膜厚2000Å以上の薄膜に波長830nmの可視光
またはレーザー光を照射した際の反射率が40%以上の
ものを使用する。
A protective layer made of metal carbide is provided on the magneto-optical recording layer. As the metal carbide, one is used that has a reflectance of 40% or more when visible light or laser light with a wavelength of 830 nm is irradiated onto a thin film with a thickness of 2000 Å or more formed on a clean and flat substrate.

このような金属炭化物としてはTi、、Zr、 lif
、 V 。
Such metal carbides include Ti, Zr, lif
, V.

Nb5Ta、 Cr、 Mo、又はWの炭化物が挙げら
れ、これらを単独で又は混合して使用する。かかる金属
炭化物としては、TiC、、ZrC、HfC、VCs 
NbC。
Examples include carbides of Nb5Ta, Cr, Mo, and W, and these may be used alone or in combination. Such metal carbides include TiC, ZrC, HfC, and VCs.
NbC.

TaC5CrC(CrsCz 、CrtCz等) 、M
oC(MozC等)、又は礼等が挙げられる。
TaC5CrC (CrsCz, CrtCz, etc.), M
Examples include oC (MozC, etc.), courtesy, etc.

これらは一般に不透明で反射率が高い。These are generally opaque and highly reflective.

一方、半金属又は半導体の炭化物としては5iC1B、
Cがあるが、これらは透明ではあるが耐食性が充分では
ない。
On the other hand, semimetal or semiconductor carbides include 5iC1B,
Although these are transparent, they do not have sufficient corrosion resistance.

上記の金属炭化物中、Ti、 Zr、 Ta、 Crs
 Moの炭化物が好ましく、中でも特にTi、 Ta、
 Moの炭化物が良い。 これらの炭化物は非晶質のも
のがより好ましい。
Among the above metal carbides, Ti, Zr, Ta, Crs
Mo carbides are preferred, especially Ti, Ta,
Mo carbide is good. These carbides are more preferably amorphous.

この保護層の厚さは10人〜5000人程度、好ましく
は50人〜1000人程度である。
The thickness of this protective layer is about 10 to 5000, preferably about 50 to 1000.

基板上に金属酸化物又は金属子フ化物の中間保護層、光
磁気記録層および金属炭化物からなる保護層等の各層を
形成するには、スパッタリング等の物理蒸着法(PVD
) 、プラズマCVDのような化学蒸着法(CVD)等
が適用される。
Physical vapor deposition (PVD) such as sputtering is used to form each layer on the substrate, such as an intermediate protective layer of metal oxide or metal fluoride, a magneto-optical recording layer, and a protective layer made of metal carbide.
), chemical vapor deposition (CVD) such as plasma CVD, etc. are applied.

PVD法にて光磁気記録層や保護層を成膜形成するには
、所定の組成をもったターゲットを用いて電子ビーム蒸
着またはスパッタリングにより基板上に各層を堆積する
のが通常の方法であるが、電子ビーム蒸着の場合には高
エネルギー粒子を膜に照射しつつ蒸着するか、また、ス
パッタリングの際には静ガス圧を低くして堆積すること
により膜の密度が轟くなり安定な膜が得られるので好ま
しい。
To form a magneto-optical recording layer and a protective layer using the PVD method, the usual method is to deposit each layer on a substrate by electron beam evaporation or sputtering using a target with a predetermined composition. In the case of electron beam evaporation, the film is deposited while irradiating the film with high-energy particles, or during sputtering, the static gas pressure is lowered to increase the density of the film and produce a stable film. This is preferable because it allows

また、反応性イオンブレーティング、反応性スパッタリ
ングを用いる方法も考えられる。
Further, methods using reactive ion blating and reactive sputtering are also considered.

膜の堆積速度は早すぎると膜応力を増加させ、遅すぎれ
ば生産性に影響するので通常0.1人/sec〜100
人/sec、好ましくは1人/sec〜20人/sec
とされる。
If the film deposition rate is too fast, it will increase the film stress, and if it is too slow, it will affect productivity, so it is usually 0.1 person/sec to 100 people/sec.
person/sec, preferably 1 person/sec to 20 people/sec
It is said that

本発明においては金属炭化物保護層に加え、SiOや5
i02などのケイ素酸化物層を50〜2000人程度好
ましくは100〜1000人程度、金属ケイ化物層上に
積層するのべ良い。SiO□系の保護層としては例えば
コーニング社製蒸着用ガラス7059や7740を用い
れば良い。
In the present invention, in addition to the metal carbide protective layer, SiO and
It is preferable to laminate about 50 to 2000 layers, preferably about 100 to 1000 layers, of silicon oxide such as i02 on the metal silicide layer. As the SiO□-based protective layer, for example, deposition glass 7059 or 7740 manufactured by Corning Corporation may be used.

〔実施例〕〔Example〕

実施例1 ポリカーボネート基板を用い、5インチφAnt’s焼
結ターゲット上に、Ta205の厚さ1III11、径
9ma+φの焼結ペレットを配置し、Arガス中でRF
スパッターを行ない800人の中間保護膜を形成した。
Example 1 Using a polycarbonate substrate, a sintered pellet of Ta205 with a thickness of 1III11 and a diameter of 9 mm + φ was placed on a 5 inch φ Ant's sintering target, and RF was conducted in Ar gas.
Sputtering was performed to form an intermediate protective film for 800 people.

中間保護膜のA15Ta比(原子比)は2:8であった
The A15Ta ratio (atomic ratio) of the intermediate protective film was 2:8.

4インチφのMO□Cターゲットと、Tb1O園口×1
wtの小片をFeターゲット上に配置したターゲットを
設置し、3 X 10−’torr以下まで排気した。
4 inch φ MO□C target and Tb1O Sonoguchi x 1
A target in which a small piece of wt was placed on an Fe target was set up, and the atmosphere was evacuated to below 3×10-'torr.

基板とターゲットの距離95 am、 ArtJi量3
03CCMとする。スパッターガス圧3 mtorrで
プレスバッターの後、直流電力(DC) 300 Wで
1分間スパッターL100O人のTbFe膜を作製し、
続いて同一真空中でAr流量30 SCCM、スパッタ
ー圧力3 mtorr直流電力(DC) 300 Wで
MO□Cターゲットをスパッターし800人堆積した。
Distance between substrate and target: 95 am, ArtJi amount: 3
03CCM. After press battering with a sputtering gas pressure of 3 mtorr, a TbFe film was prepared by sputtering with a direct current power (DC) of 300 W for 1 minute.
Subsequently, a MO□C target was sputtered in the same vacuum at an Ar flow rate of 30 SCCM, a sputtering pressure of 3 mtorr, and a direct current power (DC) of 300 W, and 800 people were deposited.

この光磁気記録媒体をAPD (アバランシェホトダイ
オード)非差動検出器をもった、動特性検出器により記
録感度、C/N比を測定した。記録感度は、2次歪みが
最小のところの記録パワーとした。
The recording sensitivity and C/N ratio of this magneto-optical recording medium were measured using a dynamic characteristic detector equipped with an APD (avalanche photodiode) non-differential detector. The recording sensitivity was set to the recording power at which the second-order distortion was minimum.

記録条件:CLV(定線速度)4m/s半径53閣位置
、溝間記録 記録周波数1. Q MHz duty50% 再生条件:CLV4m/S 再生パワー0.81 16回の平均値 本実施例では記録感度2.3mW、 C/N比39dB
であり、本実施例では後記比較例1に比べ記録パワーが
20%向上し、C/N比は4dB改善された。
Recording conditions: CLV (constant linear velocity) 4 m/s radius 53 position, recording frequency 1. Q MHz duty 50% Playback conditions: CLV4m/S Playback power 0.81 Average value of 16 times In this example, recording sensitivity 2.3mW, C/N ratio 39dB
In this example, the recording power was improved by 20% and the C/N ratio was improved by 4 dB compared to Comparative Example 1 described later.

なお静特性としては、カー回転角測定においてカー回転
角0.20°、反射率42%、抗磁力2.5KGのTb
リッチ組成のヒステリシスをもっていた。
As for the static characteristics, in the Kerr rotation angle measurement, Tb has a Kerr rotation angle of 0.20°, a reflectance of 42%, and a coercive force of 2.5 KG.
It had rich composition hysteresis.

また、記録層をX線回折により分析したところ非晶質で
あった。
Further, when the recording layer was analyzed by X-ray diffraction, it was found to be amorphous.

尚この構成の媒体を通常雰囲気中に40日間、更に70
°C85%RHの高温高湿器に200時間保持したが光
学観察及び静特性上は劣化が認められなかった。
It should be noted that the medium with this configuration was kept in a normal atmosphere for 40 days and then for a further 70 days.
It was kept in a high temperature and high humidity chamber at 85% RH for 200 hours, but no deterioration was observed in terms of optical observation and static properties.

又、ガラス基板上に作成した膜厚5000人のMo、C
膜に外気側から光(波長830nmのレーザー光)を入
射させて測定した所60%の反射率を示した。
In addition, Mo and C films with a thickness of 5000 were created on a glass substrate.
When light (laser light with a wavelength of 830 nm) was incident on the film from the outside air side, the reflectance was measured to be 60%.

比較例1 実施例1と同様にTbFe層までを作製し、次に中間保
護膜と同じ組成の保護層を800人形成した。
Comparative Example 1 The layers up to the TbFe layer were fabricated in the same manner as in Example 1, and then a protective layer having the same composition as the intermediate protective film was formed by 800 people.

実施例1と同一の条件にて記録感度、C/N比を測定し
た所、記録感度2.85 d、C/N比35dBであっ
た。(尚APD非差動系のかわりに、差動光学系で再生
した場合、PCRでは一般に10dBのC/N比が向上
することが実験的にわかっている。)実施例2 実施例1と同様にMo2C膜までを作成しついで同一条
件下高周波(RF)電力100WでSiO□を450人
形成した。この記録媒体につき実施例工と同一の条件に
て記録感度、C/N比を測定した所、記録感度2.Qm
W、C/N比39dBであった0本実施例では比較例1
に比べ記録パワーが24%向上し、C/N比は4dB改
善された。
The recording sensitivity and C/N ratio were measured under the same conditions as in Example 1, and the recording sensitivity was 2.85 d and the C/N ratio was 35 dB. (It has been experimentally found that when reproducing is performed using a differential optical system instead of the APD non-differential system, the C/N ratio generally improves by 10 dB in PCR.) Example 2 Same as Example 1 After that, 450 SiO□ films were formed using 100 W of radio frequency (RF) power under the same conditions. When the recording sensitivity and C/N ratio of this recording medium were measured under the same conditions as in the example, the recording sensitivity was 2. Qm
In this example, Comparative Example 1 had a W and C/N ratio of 39 dB.
The recording power was improved by 24% and the C/N ratio was improved by 4 dB compared to the previous version.

なお静特性としては、カー回転角測定においてカー回転
角0.19°、反射率46%、抗磁力2.2KGのTb
リッチ組成のヒステリシスをもっていた。
As for the static characteristics, in the Kerr rotation angle measurement, the Kerr rotation angle was 0.19°, the reflectance was 46%, and the Tb had a coercive force of 2.2 KG.
It had rich composition hysteresis.

面この構成の媒体を70℃85%RHの恒温恒湿槽に1
000時間保持したが光学観察及び静特性上は劣化が認
められなかった 〔発明の効果〕 本発明の光磁気記録媒体は光磁気記録層の耐食性が充分
改良され耐久性が良く、且つ記録感度も良好で、また生
産性にも優れる。
The medium with this configuration was placed in a constant temperature and humidity chamber at 70°C and 85% RH.
No deterioration was observed in optical observation or static properties after holding for 1,000 hours. [Effects of the Invention] The magneto-optical recording medium of the present invention has sufficiently improved corrosion resistance of the magneto-optical recording layer, has good durability, and has good recording sensitivity. Good quality and excellent productivity.

出  願  人 三菱化成工業株式会社代理人 弁理士
 長谷用     − (ほか1名)
Applicant Mitsubishi Chemical Industries, Ltd. Agent Patent Attorney Yo Hase - (1 other person)

Claims (4)

【特許請求の範囲】[Claims] (1)基板上に中間保護層、光磁気記録層および保護層
を順次設けてなる光磁気記録媒体において、中間保護層
を金属酸化物、又は金属チッ化物によって形成し、保護
層を波長830nmの光で測定した反射率が40%以上
の金属炭化物によって形成したことを特徴とする光磁気
記録媒体。
(1) In a magneto-optical recording medium in which an intermediate protective layer, a magneto-optical recording layer and a protective layer are sequentially provided on a substrate, the intermediate protective layer is formed of a metal oxide or a metal nitride, and the protective layer has a wavelength of 830 nm. 1. A magneto-optical recording medium formed of a metal carbide having a reflectance measured by light of 40% or more.
(2)金属炭化物がTi、Ta、Zr、Cr、又はMo
の炭化物である特許請求の範囲第1項記載の光磁気記録
媒体。
(2) Metal carbide is Ti, Ta, Zr, Cr, or Mo
The magneto-optical recording medium according to claim 1, which is a carbide of.
(3)金属炭化物がTi、Ta又はMoの炭化物である
特許請求の範囲第2項記載の光磁気記録媒体。
(3) The magneto-optical recording medium according to claim 2, wherein the metal carbide is a carbide of Ti, Ta or Mo.
(4)金属炭化物の上に更にケイ素酸化物保護層を設け
た特許請求の範囲第1項記載の光磁気記録媒体。
(4) The magneto-optical recording medium according to claim 1, further comprising a silicon oxide protective layer provided on the metal carbide.
JP11019987A 1987-05-06 1987-05-06 Magneto-optical recording medium Pending JPS63275060A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11019987A JPS63275060A (en) 1987-05-06 1987-05-06 Magneto-optical recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11019987A JPS63275060A (en) 1987-05-06 1987-05-06 Magneto-optical recording medium

Publications (1)

Publication Number Publication Date
JPS63275060A true JPS63275060A (en) 1988-11-11

Family

ID=14529560

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11019987A Pending JPS63275060A (en) 1987-05-06 1987-05-06 Magneto-optical recording medium

Country Status (1)

Country Link
JP (1) JPS63275060A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023208763A1 (en) 2022-04-29 2023-11-02 Saint-Gobain Glass France Projection assembly comprising a composite pane

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023208763A1 (en) 2022-04-29 2023-11-02 Saint-Gobain Glass France Projection assembly comprising a composite pane

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