JPS63266626A - Magnetic recording medium - Google Patents
Magnetic recording mediumInfo
- Publication number
- JPS63266626A JPS63266626A JP9865087A JP9865087A JPS63266626A JP S63266626 A JPS63266626 A JP S63266626A JP 9865087 A JP9865087 A JP 9865087A JP 9865087 A JP9865087 A JP 9865087A JP S63266626 A JPS63266626 A JP S63266626A
- Authority
- JP
- Japan
- Prior art keywords
- film
- coercive force
- recording medium
- perpendicularly magnetized
- exceeds
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005415 magnetization Effects 0.000 claims abstract description 11
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 3
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 3
- 239000000203 mixture Substances 0.000 claims description 9
- 238000005260 corrosion Methods 0.000 abstract description 7
- 230000007797 corrosion Effects 0.000 abstract description 7
- 230000007423 decrease Effects 0.000 abstract description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052796 boron Inorganic materials 0.000 abstract description 2
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 30
- 239000010409 thin film Substances 0.000 description 11
- 229910045601 alloy Inorganic materials 0.000 description 8
- 239000000956 alloy Substances 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- 238000004544 sputter deposition Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- ZPDRQAVGXHVGTB-UHFFFAOYSA-N gallium;gadolinium(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Gd+3] ZPDRQAVGXHVGTB-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229910017061 Fe Co Inorganic materials 0.000 description 1
- 230000005374 Kerr effect Effects 0.000 description 1
- 101100060558 Schizosaccharomyces pombe (strain 972 / ATCC 24843) coa3 gene Proteins 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000001659 ion-beam spectroscopy Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】 〔発明の目的〕 （産業上の利用分野） 本発明は光磁気記録、熱転写記録等に用いられ。[Detailed description of the invention] [Purpose of the invention] (Industrial application field) The present invention is used for magneto-optical recording, thermal transfer recording, etc.
レーザ光等を用いて情報の記録、再生を行なう光磁気記
録媒体に関する。The present invention relates to a magneto-optical recording medium that records and reproduces information using laser light or the like.
（従来の技術） 一般に、膜面に重直な方向に磁化容易軸を有し。(Conventional technology) Generally, it has an axis of easy magnetization in the direction perpendicular to the film surface.
室温より高いキュリ一温度を有する磁性薄膜は、レーザ
光等の光ビームを照射することによって数−以下の情報
を記録、再生することができ、高密膜、ＧｄＩＧ （ガ
ドリニウム鉄ガーネット）等の化合物単結晶薄膜、Ｔｂ
−Ｆａ、Ｇｄ−Ｃｏ、Ｔｂ−Ｃｏ、Ｔｂ−Ｆｅ−Ｃｏな
どの希土類−鉄族の非晶質合金膜などがある。Magnetic thin films, which have a Curie temperature higher than room temperature, can record and reproduce information of several orders of magnitude or less by irradiating them with a light beam such as a laser beam. Crystal thin film, Tb
Examples include rare earth-iron group amorphous alloy films such as -Fa, Gd-Co, Tb-Co, and Tb-Fe-Co.
ＭｎＢ１等の多結晶金属薄膜はキュリ一温度（Ｔｃ）を
利用して書き込みが行なわれるが、Ｔｃα３６０℃程度
と高いため、書き込みに大きなエネルギーを要する欠点
がある。又、多結晶体であるため化学量論的な組成の簿
膜を作成する必要が有り、製造が困難であるという欠点
もある。Writing is performed on polycrystalline metal thin films such as MnB1 using the Curie temperature (Tc), but since Tcα is as high as about 360° C., there is a drawback that writing requires a large amount of energy. In addition, since it is a polycrystalline material, it is necessary to prepare a film with a stoichiometric composition, making it difficult to manufacture.
又、ＧｄＩＧ等はＧＧＧ （ガドリニウムガリウムガー
ネット）単結晶基板上に膜形成が行なわれるため、この
基板の状態に磁気特性が影響されやすいこと、大面積の
基板を得にくい等の欠点がある。Furthermore, since a film of GdIG or the like is formed on a GGG (gadolinium gallium garnet) single crystal substrate, there are drawbacks such as the fact that the magnetic properties are easily affected by the condition of this substrate and that it is difficult to obtain a large-area substrate.
Ｃ０
これに対し、Ｇｄ！、 Ｔｂ Ｆｅ等の希土類−鉄族の
非晶質合金薄膜（ＲＥ−７Ｍ膜）は、任意の大きさの磁
性薄膜が形成できること、組成制御が容易であること、
結晶粒界がないため再生Ｓ／Ｎ比が良好である等の利点
を有し、近年研究が盛んである。しかしながらこのＲ［
！ −ＴＭ膜は一般に磁気光学ファラデー効果及びカー
効果（に６ｒｒ効果）が小さく、Ｃ／Ｎ比等が充分でな
く、また、耐食性に劣る問題があった。C0 On the other hand, Gd! , A rare earth-iron group amorphous alloy thin film (RE-7M film) such as TbFe can be formed into a magnetic thin film of any size, and its composition can be easily controlled.
Since there are no grain boundaries, it has advantages such as a good reproduced S/N ratio, and has been actively researched in recent years. However, this R[
! -TM films generally have small magneto-optical Faraday effect and Kerr effect (6rr effect), insufficient C/N ratio, etc., and also have problems of poor corrosion resistance.
（発明が解決しようとする問題点）
本発明は以上の点を考慮してなされたもので、従来とは
異なる新規な磁気記録媒体を提供することを目的とする
。(Problems to be Solved by the Invention) The present invention has been made in consideration of the above points, and an object of the present invention is to provide a novel magnetic recording medium different from conventional ones.
（問題点を解決するための手段と作用）本発明は、膜面
と垂直な方向に磁化容易軸を有し、一般式
％式％
阿＝Ｎｉ、Ｃｒ、ｃｏの少なくとも一種０．２５≦Ｘ≦
０．７
０≦ｙ≦０．４
０≦２≦３０
の組成を有する膜を用いたことを特徴とする磁気記録媒
体である。(Means and effects for solving the problems) The present invention has an axis of easy magnetization in the direction perpendicular to the film surface, and has the general formula % % A=at least one of Ni, Cr, and co0.25≦X ≦
0.7 0≦y≦0.4 0≦2≦30 This is a magnetic recording medium characterized by using a film having a composition.
本発明においてｐｔは垂直磁化膜化形成に必須の成分で
あり、Ｐｔ量を示すＸが０．２５未満あるいは０．７を
越えると保磁力が小さくなるとともに垂直磁化膜を得る
のが困難となる。Ｐｔはまた耐食性向上に著しく効果が
あるａ Ｍ （Ｎ ｘ ｔ Ｃｒ ＋ Ｃｏ ）は高保
磁力化におよびキュリ一点の調整有効な元素であるが、
その量を示すｙが０．４を越えると垂直磁化膜を得難く
なる。Ｂ（ボロン）は保磁力増大に有効な元素であるが
、その量を示す２が３０を越えると逆に保磁力が著しく
低下する。In the present invention, pt is an essential component for forming a perpendicularly magnetized film, and if X, which indicates the amount of Pt, is less than 0.25 or exceeds 0.7, the coercive force becomes small and it becomes difficult to obtain a perpendicularly magnetized film. . Pt is also extremely effective in improving corrosion resistance.a M (N x t Cr + Co) is an element effective in increasing coercive force and adjusting the Curie point.
If y, which indicates the amount, exceeds 0.4, it becomes difficult to obtain a perpendicularly magnetized film. B (boron) is an element effective in increasing coercive force, but when 2, which indicates the amount thereof, exceeds 30, the coercive force decreases significantly.
以上の組成比を同時に満足させることにより、光磁気記
録媒体として有効な、１ｋＯｅ以上の高保磁力を有する
垂直磁化膜を得ることができる。このような薄膜のキュ
リ一点Ｔｃは２００〜３００℃程度と比較的低いため、
書込みに要するレーザーパワーが少なくて済み、半導体
レーザーを用いることができる。また、Ｋａｒｒ回転角
は０．３＠以上と比較的大きく、従ってＣ／Ｎ比の大き
い記録媒体を提供できる。さらに、耐食性に富んでおり
、長時間使用に対して特性の劣化が著しく小さい。By simultaneously satisfying the above composition ratios, a perpendicularly magnetized film having a high coercive force of 1 kOe or more, which is effective as a magneto-optical recording medium, can be obtained. Since the Curie point Tc of such a thin film is relatively low at about 200 to 300°C,
The laser power required for writing is small, and a semiconductor laser can be used. In addition, the Karr rotation angle is relatively large at 0.3@ or more, and therefore a recording medium with a high C/N ratio can be provided. Furthermore, it has excellent corrosion resistance, and its properties deteriorate significantly even after long-term use.
本発明においては、磁気記録媒体の作製は蒸発法で行う
ことが好ましい、蒸発法としては例えば、高周波スパッ
タリング法、直流スパッタリング法。In the present invention, it is preferable to manufacture the magnetic recording medium by an evaporation method. Examples of the evaporation method include a high frequency sputtering method and a DC sputtering method.
マグネトロンスパッタリング法、イオンビームスパッタ
リング法、イオンブレーティング法、電子ビーム蒸着法
、真空蒸着法などが挙げられ、上記の蒸発法により形成
された本発明に係る膜は、膜面に対して垂直方向に磁化
容易軸を有する垂直磁化膜となる。Examples include magnetron sputtering method, ion beam sputtering method, ion blating method, electron beam evaporation method, vacuum evaporation method, etc. The film according to the present invention formed by the above evaporation method is This results in a perpendicularly magnetized film with an easy axis of magnetization.
基板としては成形が容易で、磁性薄膜の磁気特性に影響
を与えることがないように非磁性であれば良く、例えば
塩化ビニール、ポリカーボネイト（ｐｃ）、アクリル樹
脂等の樹脂基板、あるいはガラス基板等を用いることが
できる。また膜厚があまり大きくなると垂直磁気異方性
が損なわれるため、２０００Å以下好ましくは１００〜
１０００人程度であることが望ましい。The substrate may be one that is easy to mold and non-magnetic so as not to affect the magnetic properties of the magnetic thin film, such as a resin substrate such as vinyl chloride, polycarbonate (PC), acrylic resin, or a glass substrate. Can be used. Also, if the film thickness becomes too large, the perpendicular magnetic anisotropy will be impaired, so the film thickness is preferably 2000 Å or less, preferably 100 Å or less.
It is desirable to have around 1000 people.
（実施例） 以下、本発明を実施例に基づいて説明する。(Example) Hereinafter, the present invention will be explained based on examples.
実施例１
第１表に示した組成の本発明合金膜１は第１図に示す高
周波スパッタリング装置を用いてガラス基板１上に形成
されるが、それは次のようにして行われる。高周波電源
２を接続したＦ、Ｐｔ、Ｍ、Ｂの母合金より成る合金タ
ーゲット３を用いる。そして、Ｔｏｒｒ以上にした後、
チャンバー６内に高純度のアルゴンを導入して３ Ｘ
１０−”Ｔｏｒｒの圧力でスパッタリングを行い、上記
合金ターゲット３に対向して配置されたガラス基板１に
１０００人の合金ＩＪ７を作製した。このように作製し
た合金膜７をＸｌｉＡ回折で調べたところ、Ｃ軸が膜面
に垂直に配向した正方品（ＣｕＡｕ型）から成る膜であ
った。又、組成を分析した結果、（Ｆｅｏ、 ｎＮ１ｏ
、 ａＰｔｏ、 ａ）ａａ、２Ｂｘａ、 ａであった。Example 1 An alloy film 1 of the present invention having the composition shown in Table 1 is formed on a glass substrate 1 using the high-frequency sputtering apparatus shown in FIG. 1, as follows. An alloy target 3 made of a master alloy of F, Pt, M, and B is connected to a high-frequency power source 2. Then, after setting it above Torr,
High purity argon is introduced into chamber 6 and 3X
Sputtering was performed at a pressure of 10-'' Torr to fabricate 1000 layers of alloy IJ7 on the glass substrate 1 placed opposite the alloy target 3. The alloy film 7 thus fabricated was examined by XliA diffraction. The film was composed of a square product (CuAu type) with the C axis oriented perpendicular to the film surface.As a result of analyzing the composition, it was found that (Feo, nN1o
, aPto, a) aa, 2Bxa, a.
又、試料振動形磁力計を用い磁気特性を調べたところ、
５００℃で１時間熱処理した場合、この膜は保磁力５
、６ｋＯｅを持ち、角形性に優れた膜而に垂直方向に磁
化容易軸を有することが分った。In addition, when we investigated the magnetic properties using a sample vibrating magnetometer, we found that
When heat treated at 500°C for 1 hour, this film has a coercive force of 5
, 6 kOe, and was found to have an axis of easy magnetization in the perpendicular direction to the film with excellent squareness.
この薄膜はキュリ一温度がＴｃ＝２４０℃程度であった
。また、にｅｒｒ回転角を測定したところ０．４６と大
きいことがわかった。The Curie temperature of this thin film was approximately Tc=240°C. Furthermore, when the err rotation angle was measured, it was found to be as large as 0.46.
ｐｔを含むため耐食性がよく長時間に亘って保磁力の変
化がほとんどないこともわかった。It was also found that since it contains PT, it has good corrosion resistance and that there is almost no change in coercive force over a long period of time.
実施例２
上記組成以外の例についても磁性薄膜記録媒体を作成し
た結果を併せて第１表に示した。尚、比較例として本組
成範囲外の膜についても、ｐｔ含有量が少い場合と多い
場合を第１表に併せて示した。Example 2 Table 1 also shows the results of producing magnetic thin film recording media with compositions other than those mentioned above. As a comparative example, Table 1 also shows films with a low pt content and with a high pt content for films outside the present composition range.
これにより本発明の磁気記録媒体は、１ ｋｏｅ以上の
高い保磁力を有する膜面に垂直な方向に磁化容易軸を有
する膜であることがわかる。This shows that the magnetic recording medium of the present invention is a film that has a high coercive force of 1 koe or more and has an axis of easy magnetization in the direction perpendicular to the film surface.
以下余白
実施例２
添加元素Ｍの一例としてＮｉ添加の場合について、保磁
力ＩＨ（（ｋＯａ）、飽和磁化ａ （ｅｍｕ／ｇ） 、
キュリ一点のＮ１依存性を（Ｆ１ａ、ｓ−ｘ Ｐｔｏ、
ａ Ｎ１ｘ）ａａＢｘ７について第２図に示した。尚、
これらの膜は成膜後５００”Ｃで１時間熱処理したもの
である。Below is a blank Example 2 For the case of Ni addition as an example of the additive element M, coercive force IH ((kOa), saturation magnetization a (emu/g),
The N1 dependence of one point of Curie (F1a, s-x Pto,
aN1x)aaBx7 is shown in FIG. still,
These films were heat-treated at 500''C for 1 hour after being formed.
この図より、Ｎｌ添加量とともに保磁力が増大し。From this figure, the coercive force increases with the amount of Nl added.
飽和磁化とキュリ一点は低下することがわかる。It can be seen that the saturation magnetization and the Curie point decrease.
すなわち、Ｎｉ添加とともに光磁記録媒体として、より
好ましい材料になることがわかる。That is, it can be seen that the addition of Ni makes the material more suitable for use as a magneto-optical recording medium.
本発明の磁性薄膜記録媒体は、膜面に垂直方向に磁化容
易軸を有し、保磁力が大きく、キュリ一点も適度な大き
さを持ち、新しい光磁気記録媒体あるいは熱転写記録媒
体などを供することができる。また、本発明の磁性薄膜
記録媒体は耐食性にも優れる。The magnetic thin film recording medium of the present invention has an axis of easy magnetization in the direction perpendicular to the film surface, has a large coercive force, and has a Curie point of an appropriate size, and can be used as a new magneto-optical recording medium or a thermal transfer recording medium. Can be done. Furthermore, the magnetic thin film recording medium of the present invention also has excellent corrosion resistance.
以上説明したように本発明によれば、耐食性に優れ、保
磁力が大きいため情報記録の安定性が大きく、かつキュ
リ一温度が低いため、書き込みに要するエネルギーが少
なくてすむ新規な磁気記録媒体を得ることができる。As explained above, the present invention provides a novel magnetic recording medium that has excellent corrosion resistance and high coercive force, resulting in high stability of information recording, and low Curie temperature, which requires less energy for writing. Obtainable.
第１図は高周波スパッタ装置の概略図、第２図は本発明
の合金膜の磁気特性を示す図である。
１・・・基板 ２・・・高周波ｔａｍ３・
・・ガス導入バルブ ４・・・排気バルブ５・・・真
空チャンバー ６・・・ターゲット７・・・合金膜
代理人 弁理士 則 近 憲 佑
同 松山光之
第１図
χ
第２図FIG. 1 is a schematic diagram of a high frequency sputtering apparatus, and FIG. 2 is a diagram showing the magnetic properties of the alloy film of the present invention. 1... Board 2... High frequency tam3.
...Gas inlet valve 4...Exhaust valve 5...Vacuum chamber 6...Target 7...Alloy film agent Patent attorney Noriyuki Ken Yudo Mitsuyuki Matsuyama Figure 1 χ Figure 2
Claims (1)
＿１＿−＿ｘ＿−＿ｙＰｔ＿ｘＭ＿ｙ）＿１＿０＿０＿
−＿ｚＢ＿ｚＭ＝Ｎｉ、Ｃｒ、Ｃｏの少なくとも一種 ０．２５≦ｘ≦０．７ ０≦ｙ≦０．４ ０≦ｚ≦３０ の組成を有する膜を用いたことを特徴とする磁気記録媒
体。[Claims] It has an axis of easy magnetization in the direction perpendicular to the film surface, and has a general formula (Fe
_1_-_x_-_yPt_xM_y)_1_0_0_
-_zB_zM=at least one of Ni, Cr, and Co; A magnetic recording medium characterized by using a film having a composition of 0.25≦x≦0.7 0≦y≦0.4 0≦z≦30.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9865087A JPS63266626A (en) | 1987-04-23 | 1987-04-23 | Magnetic recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9865087A JPS63266626A (en) | 1987-04-23 | 1987-04-23 | Magnetic recording medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63266626A true JPS63266626A (en) | 1988-11-02 |
Family
ID=14225378
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9865087A Pending JPS63266626A (en) | 1987-04-23 | 1987-04-23 | Magnetic recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63266626A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0330116A2 (en) * | 1988-02-22 | 1989-08-30 | Sony Corporation | Magnetic recording medium |
| EP0415431A2 (en) * | 1989-08-30 | 1991-03-06 | Sony Corporation | Magnetic recording medium |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5714673A (en) * | 1980-06-30 | 1982-01-25 | Nitto Electric Ind Co Ltd | Pressure sensitive adhesive composition for surface protecting sheet |
-
1987
- 1987-04-23 JP JP9865087A patent/JPS63266626A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5714673A (en) * | 1980-06-30 | 1982-01-25 | Nitto Electric Ind Co Ltd | Pressure sensitive adhesive composition for surface protecting sheet |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0330116A2 (en) * | 1988-02-22 | 1989-08-30 | Sony Corporation | Magnetic recording medium |
| EP0415431A2 (en) * | 1989-08-30 | 1991-03-06 | Sony Corporation | Magnetic recording medium |
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| JPS6079702A (en) | Photomagnetic recording medium | |
| JPS63266626A (en) | Magnetic recording medium | |
| JPS63107008A (en) | Thin-film having large kerr's angle of rotation and manufacture thereof | |
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| JPH0570922B2 (en) | ||
| JPH0513323B2 (en) | ||
| JPS60101742A (en) | Photomagnetic recording medium | |
| JPS62204505A (en) | Oxide magnetic thin film | |
| JPS6251025A (en) | Magnetic recording medium | |
| JPS6137765B2 (en) | ||
| JPS60173745A (en) | Photoelectromagnetic recording medium | |
| JPS63164049A (en) | Magneto-optical recording medium and its production | |
| JP2824998B2 (en) | Magnetic film | |
| JPS59168953A (en) | Opto-thermo-magnetic recording medium | |
| JPH03273540A (en) | Magnetic recording medium and magnetic recording device and spin glass magnetic material | |
| JPS60101702A (en) | Recording method of photomagnetic recording medium | |
| JPS63122036A (en) | Magneto-optical recording medium | |
| JPS60101740A (en) | Photomagnetic recording medium | |
| JPH01214002A (en) | Magnetic thin film | |
| JPH05266525A (en) | Production of magneto-optical recording medium | |
| JPS5996713A (en) | Magnetic recording medium | |
| JPH0221440A (en) | Magneto-optical recording medium | |
| JPS62137810A (en) | Magnetic recording material | |
| JPH039532B2 (en) | ||
| Arimoto et al. | Effects of Annealing on the Magnetic Properties of High B s CoHfTa Materials |