JPS63265442A - 半導体デバイス用外観検査装置 - Google Patents

半導体デバイス用外観検査装置

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Publication number
JPS63265442A
JPS63265442A JP62089713A JP8971387A JPS63265442A JP S63265442 A JPS63265442 A JP S63265442A JP 62089713 A JP62089713 A JP 62089713A JP 8971387 A JP8971387 A JP 8971387A JP S63265442 A JPS63265442 A JP S63265442A
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JP
Japan
Prior art keywords
laser beams
inspected
laser
semiconductor device
inputted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62089713A
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English (en)
Other versions
JPH0666370B2 (ja
Inventor
Toshihiro Kato
加藤 俊博
Masamichi Shindo
進藤 政道
Yoshito Fukazawa
義人 深沢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
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Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP62089713A priority Critical patent/JPH0666370B2/ja
Priority to US07/177,412 priority patent/US4874956A/en
Priority to KR1019880004226A priority patent/KR910006368B1/ko
Publication of JPS63265442A publication Critical patent/JPS63265442A/ja
Publication of JPH0666370B2 publication Critical patent/JPH0666370B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • H01L24/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • GPHYSICS
    • G01MEASURING; TESTING
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    • H01L2224/48463Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
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Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。

Description

【発明の詳細な説明】
本発明は半導体装置の外観検査、例えば半導体装置のボ
ンディング状況を検査する装置に関するものである。
【従来の技術】
従来、半導体装置のワイヤーボンディング状態を検査す
る場合、顕微鏡を用いて人間が目視にて行なうことが主
流である。 また最近ではTVカメラを用い顕微鏡モニター映像を写
し出し、複雑な画gRIIJI理を行なうことKより検
査する方法も提案されている。 〔発明が解決しようとする問題点〕 従来の目視による検査では非常に多くの検査時間を有す
る。この丸め全ての製品を検査することができず、ロッ
ト抜取検査にならざるを得ない。 このため不良品を完全に取り除くことができない。 また最近提案されている實カメラによる映像を画像処理
する検査はWカメ2の解像度等の問題により検出精度が
悪く、これでも不良品を完全に取り除くことができなか
つ九。又画像処理というプ四セスが複雑であるOK加え
、この処理も多くの本発明によるとレーザ光を被検知物
体に照射しその反射レーザ光によりこの被検知物体の高
低の信号を得ると共にこのレーザ光を被検知物体上に走
査すゐことにより半導体上の外観を高速かつ高精度に検
知することができる。 モしてレーザ光を用いることで、レーザ光のスポット径
を小さくすることができる。このため検出エリアを小さ
くすることができ、検出感度が非常に高い。 そして高低信号を不良限界レベルと比較することにより
簡単に良・不良の判定ができる。 (実施例) 本発明の実施例装置を図を用いて説明する。 M1図に本実施例のワイヤボンディング検査装置の概要
を示す。この装置は、半導体装置Xの被検知部にレーザ
光を照射するレーザ出力部1および被検知部から反射さ
れたレーザ光を検出する光位置検出部2とからなるセン
ナユニット部3と、このセンナユニット部3を一端に保
持する指示アーム4と、このアーム4を保持しこれを半
導体装@X上で水平方向に走査・駆動させるXYテーブ
ル5、および図示しないデータ表示部とを有する。 次に本装置の動作を説明する。第2図にブロック図を示
す。レーザ出力回路6から出力されるレーザ駆動信号に
より、レーザ出力部1から、波長780f1mのレーザ
光が半導体装置の被検査部7へ照射される。なおこのレ
ーザ光は、レンズ8によりスポット径25μmφ〜50
μmφに絞られる。そして、被検査部7で反射されたレ
ーザ光は、レンズ9を通り光位置検出部2に入力される
。 この検出部2は、被検査部7の高さにより変移した位置
に入力されるレーザ光を、例えばC0D(電荷結合素子
)にて検知するものであり、この被検査部7の高さに対
応した変移信号を出力する。 この出力信号は、増幅回路101.10bにより増幅さ
れた後、CPU(中央演算処理装置)11へ入力される
。 尚、センサー3は、XYテーブル5によって走査駆動さ
れるが、このXYテーブル6によるセンサー3の走査に
対応したエンコーダ出力信号は、処理回路12を経てc
ptrllへ入力される。 CPU 11では、このエンコーダ出力信号と光位置検
出信号との同期を取り、任意の箇所のボンディングワイ
ヤーが正しくルーピングしているか否かの判定を行ない
、これをデータ表示部13にて表示する。 この検査は、半導体装置上を走査しながら行なわれるが
、第3図にその走査例を示す。 tfペレットYのボンディングパットに沿りて走査し、
続いてリードフレームのペットz上で、ボンディングワ
イヤWを順次横切るように走査する。 そして、ペットの緑に沿って走査した後、リードフレー
ムのボンディング部分vf:順次横切るように走査する
。 この判定(表示データ)の−例を第4図を用いて説明す
る。 この図には、エンコーダ出力信号により得られたセンナ
移動距離(横軸)に対応した光位置検出信号(縦軸)が
示されている。 ボンディングワイヤが正しくループしている場喜−ペレ
、に面レベル/l−1!A?ハwr中番由出14レベル
のワイヤ信号Bを得る。 そして正しくループしていない場合、この信号人よりも
低いワイヤ信号を得る。この時、信号Cのように、不良
限界レベルCより低くなると、ワイヤがペレットのエツ
ジに接触していることを示す。この信号りを得九場合、
CPUIIはNG(不良)の判定を下す。 ま九、レベル信号同志が近接している場合、ボンディン
グワイヤが左または右に変移していることを示す。この
時、信号Eのように、不良限界レベルFより近接してい
ると、この付近でワイヤ同志が接触していることを示す
。この場合もCPU 11はNGの判定を下す。 またフレームペット上の走査において、不良限界レベル
Gより低い信号Hの場合、このワイヤはフレームペット
2と接触していることを示すものであり、この場合もC
PU llはNGの判定を下す。尚、信号Iはフレーム
ペット面のレベル信号である。 本発明は、本実施例に限定されるものではなく種々変型
できるものである。 例えば本実施例ではセンナを移動させ走査したが、半導
体装置を移動させることにより走査してもよい。 また本発明はボンディング不良の検査に限定されるもの
ではなく、例えばマクントペーストの不足、過多の検査
やペレットの欠は検査、またリ一本発BAKよると、(
1)半導体の外観検査を高速度に行なうことができる。 (2)従りて製造装置との同期化が可能となる。 (3)また高速に検査を行うことが可能なため、抜き取
り検査ではなく、すべての製品を検査することが可能と
なる。 (4)また微小スポットのレーザ光を用いるため検出精
度が高くなる。 (5)画像処理に比較し、処理が極めて簡単に行なえる
。従って低コスト化が可能となる。 という効果がある。
【図面の簡単な説明】
第1図乃至第4図は本発明の一実施例を示すものであり
、tg1図は側面図、第2図は動作説明のためのブロッ
ク図、第3図は走査状況を説明するための図、第4図は
良・不良を判定するデータ出力図である。 1・・・レーザ出力部 2・・・光位置検出部 5・・・センサー駆動装置(XYテーブル)11・・・
中央演算処理装置(CPU )代理人 弁理士  則 
近 憲 佑 同        メ 覇 真 k ケを乱真先男 第1図 第2111 第3図 九 センサJIg1力距寓龜 @  4  図

Claims (1)

    【特許請求の範囲】
  1. 半導体デバイスに微小スポットのレーザ光を照射するレ
    ーザ出力部と、前記デバイスからのレーザ反射光を検知
    し、このデバイスのレーザ反射部分の高低を検知する光
    位置検出部と、前記レーザ出力装置および検出装置とを
    前記半導体デバイス上で走査させるセンサー駆動装置と
    、前記光位置検出装置からの検知信号を不良限界レベル
    と比較することにより半導体デバイスの良、不良の判定
    を行なう中央演算処理装置とを有することを特徴とする
    半導体デバイス用外観検査装置。
JP62089713A 1987-04-14 1987-04-14 半導体デバイス用外観検査装置 Expired - Fee Related JPH0666370B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP62089713A JPH0666370B2 (ja) 1987-04-14 1987-04-14 半導体デバイス用外観検査装置
US07/177,412 US4874956A (en) 1987-04-14 1988-04-04 Method and apparatus for inspecting semiconductor devices for their bonding status
KR1019880004226A KR910006368B1 (ko) 1987-04-14 1988-04-14 반도체장치의 검사방법 및 그 검사장치

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Application Number Priority Date Filing Date Title
JP62089713A JPH0666370B2 (ja) 1987-04-14 1987-04-14 半導体デバイス用外観検査装置

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JPS63265442A true JPS63265442A (ja) 1988-11-01
JPH0666370B2 JPH0666370B2 (ja) 1994-08-24

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US (1) US4874956A (ja)
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EP0430095A2 (en) * 1989-11-24 1991-06-05 Kabushiki Kaisha Toshiba Inner lead bonding inspecting method and inspection apparatus therefor
US5287759A (en) * 1991-08-29 1994-02-22 Adtec Engineering Co., Ltd. Method and apparatus of measuring state of IC lead frame
CN108663588A (zh) * 2018-04-10 2018-10-16 歌尔科技有限公司 电磁测试探头、电磁测试装置和电磁测试方法

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JPH07111998B2 (ja) * 1989-08-18 1995-11-29 株式会社東芝 ワイヤボンディング検査装置
JP2851151B2 (ja) * 1990-10-12 1999-01-27 株式会社東芝 ワイヤボンディング検査装置
ATE169123T1 (de) * 1991-03-25 1998-08-15 Heidelberger Druckmasch Ag Verfahren und vorrichtung zur optischen messung von distanzen
JP2990550B2 (ja) * 1991-12-10 1999-12-13 株式会社新川 ボンデイングワイヤ検査装置
US5212390A (en) * 1992-05-04 1993-05-18 Motorola, Inc. Lead inspection method using a plane of light for producing reflected lead images
US5600150A (en) * 1992-06-24 1997-02-04 Robotic Vision Systems, Inc. Method for obtaining three-dimensional data from semiconductor devices in a row/column array and control of manufacturing of same with data to eliminate manufacturing errors
US5406372A (en) * 1993-04-16 1995-04-11 Modular Vision Systems Inc. QFP lead quality inspection system and method
JPH07335706A (ja) * 1994-06-03 1995-12-22 Nec Corp ワイヤの高さ測定装置
US5774227A (en) * 1997-01-28 1998-06-30 The Whitaker Corporation Anomally detection machine for fabricated parts formed on a carrier strip and method of use
FR2839147B1 (fr) * 2002-04-30 2004-07-09 Soitec Silicon On Insulator Dispositif et procede de controle automatique de l'etat de surface de plaque par mesure de vitesse de collage
CN112179920B (zh) * 2020-11-29 2021-04-13 惠州高视科技有限公司 一种芯片焊线缺陷的检测方法及系统

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JPS5263755A (en) * 1975-11-22 1977-05-26 Nippon Chemical Ind Pattern line width measuring device
US4115650A (en) * 1976-11-17 1978-09-19 Hoffmann-La Roche Inc. Process for preparing 2,4-diamino-5-(substituted benzyl)-pyrimidines
US4264202A (en) * 1979-09-04 1981-04-28 Automation Systems, Inc. Pin receptacle inspection apparatus and method
JPS62195509A (ja) * 1986-02-24 1987-08-28 Mitsubishi Electric Corp 電子部品形状検査装置
US4736108A (en) * 1986-07-29 1988-04-05 Santana Engineering Systems Apparatus and method for testing coplanarity of semiconductor components

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0430095A2 (en) * 1989-11-24 1991-06-05 Kabushiki Kaisha Toshiba Inner lead bonding inspecting method and inspection apparatus therefor
US5331397A (en) * 1989-11-24 1994-07-19 Kabushiki Kaisha Toshiba Inner lead bonding inspecting method and inspection apparatus therefor
US5287759A (en) * 1991-08-29 1994-02-22 Adtec Engineering Co., Ltd. Method and apparatus of measuring state of IC lead frame
CN108663588A (zh) * 2018-04-10 2018-10-16 歌尔科技有限公司 电磁测试探头、电磁测试装置和电磁测试方法
CN108663588B (zh) * 2018-04-10 2020-06-30 歌尔科技有限公司 电磁测试探头、电磁测试装置和电磁测试方法

Also Published As

Publication number Publication date
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JPH0666370B2 (ja) 1994-08-24

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