JPS63258629A - Plurality of liquid mixers - Google Patents

Abstract

PURPOSE:To prepare mixed liquid in a short period of time while maintaining the accurate mixing ratio by alternating the feeding order from respective liquid feeding source to a graduate before or every time the mixed liquid weighed respectively by a weighing machine is transferred to a preservation container. CONSTITUTION:First, the total weight of good solvent and a load solvent to be supplied to a graduate 21 is set, and then the mixing ratio and the number of repeating respective feeding are decided. Under said condition, before or every time the liquid is moved to a preservation container 41 through an on-off valve 27, respective liquid feeding sourrces 1 and 2 to the graduate 21 is controlled to be replaced alternatively. As a result, before being transferred to the preservation container 41, the mixed liquid is preliminarily mixed in the graduate 21. When said tow liquids are transferred to the preservation container 41, therefore, the mixing time of two liquids in an agitator 43 can be shortened, and a developing liquid can be prepared quickly.

Description

[Detailed description of the invention] (Industrial application field) The present invention relates to a multi-liquid mixing device.

(Prior Art) In the manufacturing process of semiconductor devices, a resist pattern is used as a mask for substrate etching and ion implantation. This resist pattern is formed by irradiating a resist film coated on a substrate with high-energy rays such as electron beams or ultraviolet rays according to a predetermined pattern, and then performing a development process.

By the way, semiconductor integrated circuits are becoming smaller and more highly integrated year by year because miniaturization makes them more economical, faster, and more reliable. Correspondingly, resist patterns have also become finer, which has made dimensional accuracy even more demanding, and the formation of highly accurate resist patterns in the submicron region has become necessary. Therefore, in such submicron regions, electron beams, etc., which can draw patterns even finer than ultraviolet light, are effectively used, and the drawn resist is developed using this, and resist patterns are created with precision commensurate with the minimum dimensions of submicrons. is formed. In this case, one of the factors that has an important effect on the dimensional accuracy of the resist pattern is the concentration of the developer. The main composition of the developer is a parent solvent and a poor solvent, but the parent solvent tends to shorten the development time when developing resists, but has a tendency to reduce resolution due to its high sensitivity. Poor solvents have a tendency to improve resolution due to low sensitivity, but to lengthen development time. Figure 14 shows fluororesist pBh-1.
Ethyl alcohol (parent solvent) and isobutyl alcohol (
The mixing ratio (expressed as a percentage) of ethyl alcohol and the sensitivity (μc/cf
fl ) is shown under the conditions of temperature 20'C and 126°C. Further, as shown in FIG. 17, when the mixing ratio of the parent solvent increases, film thinning T occurs in the positive portions of the resist. Therefore, in order to improve dimensional accuracy, it is required to use a developer with a high concentration of poor solvent even if the development time is long.

However, as a condition for mass production of resist patterns, shortening the developing time is also an important factor, and therefore various development methods have been considered that satisfy the shortening of the developing time as well as improving the dimensional accuracy. As such a developing method, for example, the developing method described in JP-A-58-111318 can be mentioned. In this method, multiple types of developing solutions with different mixing ratios of parent solvent and poor solvent are prepared, and during development, the developing solutions with the highest mixing ratio of parent solvent are supplied sequentially. According to the above, in the early stage of development, the parent solvent acts strongly and the development progresses at high speed although the resolution is poor, and after the latter half of the development, the effect of the poor solvent becomes strong and the above-mentioned poor resolution occurs. This will cover the following. Therefore, according to this method, the development time can be shortened, and a resist pattern with improved dimensional accuracy can be obtained.

By the way, when implementing the above development method, it is necessary to determine the mixing ratio of the parent solvent and poor solvent in the developer in order to shorten the development time to the maximum while improving dimensional accuracy. (Figures 15 and 16 show the relationship between the amount of resist remaining film and development time when different types of resist are developed with a developer of a fixed concentration), electron beam, etc. It is necessary to take into account the irradiation dose and various changes in the process. Conventionally, solvents for each composition were purchased separately, and the user mixed each solvent taking into account the above conditions. However, a developer with the most suitable concentration was obtained. However, such a method has problems in that it is time-consuming and in accuracy. Furthermore, when purchasing a developer having a predetermined concentration, it is difficult to adapt it to various conditions. Furthermore, a method using a two-liquid warming device as shown in FIG. 18 is known. As shown in the figure, each solvent constituting the developer is stored in a pressurized tank 70.71, and each tank 70.71 is connected to a mixing unit 74 via a pipe 72.73. and each of the above piping 7
The flowmeter 75.76 installed in 2.73 is connected to the control unit 7
The mixing ratio of each solvent is adjusted based on the signal from 7. However, when adjusting the concentration of the developer based on the flow rate, it is currently difficult to obtain sufficient results regarding concentration accuracy. In other words, flowmeters 75 and 76 include, for example, strain gauge type, volumetric type, turbine type, electromagnetic type, gear pump type, etc., but even the ones with the best measurement accuracy have a reading value of ±0.25%. An error occurs, and as a result, an error greater than the above-mentioned error occurs in the concentration of the developer obtained. On the other hand, the sensitivity of the resist changes significantly when the concentration of the developer changes by only 0.1%, and therefore it is difficult to use a two-liquid heating device based on a flow meter as described above. .

(Problems to be Solved by the Invention) By the way, when a weight meter is used instead of a flow meter, it is possible to significantly improve the accuracy of measuring the amount of liquid.

For example, when using a precision balance, the accuracy is ±0 of the reading value.
．． It is within 0.01%. Therefore, a two-liquid heating device using a weighing scale such as a precision balance can be considered.

That is, each solvent is supplied from each supply source of a parent solvent and a poor solvent to a weighing container placed on the measuring section of a weighing scale, the weight of each solvent is measured with this weighing container, and the weight of each solvent is measured in this weighing container. The mixed solution made to a predetermined weight at a predetermined mixing ratio is transferred to a storage container, and the mixed solution is stirred by a stirrer in the storage container to form a developer. When attempting to put such a two-liquid warming device into practical use, it is required to manufacture a predetermined mixed liquid within a short time while maintaining an accurate mixing ratio.

Therefore, it is an object of the present invention to provide a multi-liquid mixing device that can produce a predetermined mixed liquid within a short time while maintaining an accurate mixing ratio.

(Means for solving the problem) Therefore, in the multiple liquid mixing device of the present invention, the stirrer 4
3 is connected to the measuring container 21 placed on the measuring section 23 of the weighing scale 22 via the on-off valve 27, and each of the plurality of liquids is supplied to the measuring container 21. source 1.2, and the weight of each method supplied from each liquid supply source 1.2 to the measuring container 21 is weighed in the measuring container 21.
By opening the opening/closing valve 27, a mixed liquid having a predetermined weight at a predetermined mixing ratio is stored in the storage container 41.
A multi-liquid mixing device configured to mix the mixed liquid with the stirrer 43 from each liquid supply source 1.2 to the measuring container 21 before or every time the mixed liquid is transferred to the storage container 41. It has a control means for controlling the feeding order of each method to be changed.

(Function) In the multi-liquid mixing device having the above configuration, the order of supplying each method from each liquid supply source 1.2 to the measuring container 21 is changed before or every time the mixed liquid is transferred to the storage container 41. , Therefore, before being transferred to the storage container 41, the weighing container 21
The mixed liquid will be mixed together in advance. Therefore, in the storage container 41, it is sufficient to stir the liquid mixture mixed in the measuring container 21.

(Example) Next, a specific example of the multiple liquid mixing device of the present invention will be described in detail with reference to the drawings.

In FIG. 1, reference numerals 1 and 2 are pressurized liquid supply tanks, where one liquid supply tank 1 contains a solvent such as ethyl alcohol that makes up the developer, and the other liquid supply tank 2 contains isobutyl alcohol. and other poor solvents are accommodated. A liquid supply pipe 3.4 extends from each liquid supply tank 1.2, and each pipe 3.4 branches in the middle, and the branch part 5.6
and 7.8 face the inside of the measuring container 21.

A small amount discharge valve 9.11 is interposed in one branch part 6.8 of the liquid supply pipe 3.4, and the other branch part 5.7
A rough discharge valve 10.12 is provided in each. As the minute amount discharge valve 9.11, for example, a dosing valve with a controlled liquid amount of 0.01 cc can be mentioned. The structure of this dosing valve is shown in FIG.
is urged and seated inside the valve body 15 by the urging force of the spring 16 toward the valve seat 17 made of a packing, and by supplying air from the air supply port 18, the valve body 14 is moved by the urging force of the spring 16. At this time, the liquid being supplied under pressure from the liquid supply port 19 into the valve body 15 is supplied to the nozzle 20 (diameter 1.8M) at the tip.
It is like discharging from. The valve with the above configuration can achieve a minimum discharge amount of 0.0 by controlling the air supply time.
This makes it possible to eject a minute amount of liquid of 0.1 cc.

In addition, as the pulp 10.12 for coarse quantity discharge, a valve for large quantity discharge such as a large-diameter dosing valve (nozzle diameter of about 4.5 In+1) can be mentioned.

On the other hand, as shown in FIG.
As the weight measuring device 22, for example, a weighing device with a balance 2 as shown in principle in FIG. 3 can be used.

As shown in the figure, the weighing container 2 is placed on one weighing pan 23 of the weight scale, and the weighing container 2 is placed on the other weighing pan 23.
A weight 24 made of a magnetic material that balances the weight of 1 is attached, and a coil 25 is arranged with respect to this weight 24. This device supplies liquid to a measuring container 21, and when the weight of this container 21 increases, the position of the weight 24 changes. By detecting the change in the current flowing through the coil 25 at that time, The weight has been made to be able to be measured.

Further, as shown in FIG. 1, the measuring container 21 is provided with a supply pipe section 26, and this supply pipe section 26 has an on-off valve
7 is provided. As such an on-off valve 27,
For example, valves having structures shown in FIGS. 4 to 6 can be mentioned. First, the on-off valve 27 shown in FIG. 4 will be explained.
28 is a solenoid valve provided in the supply pipe section 26,
This electromagnetic valve 28 is provided with an outlet portion 29 for receiving current supply. On the other hand, 30 is a rod, and this rod 30 can be freely moved in and out by an air cylinder 31 (which may be a solenoid). A socket 32 for power supply connected to the outlet section 29 is attached to this rod 30. In this device, by driving and controlling the air cylinder 31,
A power supply socket 32 is connectable to the outlet section 29. In this case, in order to ensure the connection between the socket 32 and the outlet section 29, it is preferable that a magnet be incorporated in each opposing surface. By employing the on-off valve 27 configured as described above, errors in measuring the liquid can be reduced by keeping the socket 32 away from the outlet section 29 while measuring the liquid in the measuring container 21. becomes possible. Figure 5 also shows measuring container 2.
Although an example is shown in which an air valve 33 is interposed as an on-off valve 27 in the supply pipe portion 26 of 1, in this case as well, a rod 30 that can be freely extended and retracted by an air cylinder 31 (or solenoid) is used. , connect the air supply hose 3 to this rod 30.
4, so that an air supply hose 34 can be freely connected to an air socket 35 of the air valve 33. Further, as another example shown in FIG.
A cock 39 having a hole 38 on the distal end side is fitted from the side into the supply pipe portion 26 adjacent to the valve seat member 37. By interposing a spring 40 between the outer circumferential surface of the supply pipe section 26 and biasing the cock 39 toward the proximal end, the hole 36 of the valve seat member 37 is positioned closer to the distal end than the hole 38 of the cock 39. Make sure to do so.

Then, a rod 30 is arranged opposite to the base end surface of the cock 39, and this rod 30 can be freely protruded and retracted by an air cylinder 31 (or solenoid), and by protruding this rod 30, the cock 39 is moved to the distal end side. , cook 3
9 and the hole 36 of the valve seat member 37 are coaxially located. In this case as well, errors in measuring the liquid in the measuring container 21 can be reduced. That is, when trying to use the solenoid valve 28, air valve 33, etc. as the on-off valve 27, it is necessary to connect the power supply cable and air supply hose 34 to the on-off valve 27, but these cables and If the hose 34 is always connected to the on-off valve 27, there is a risk that measurement errors may occur when measuring the liquid in the measuring container 21 due to swinging of the cable or hose 34 or adhesion of foreign matter to the cable or hose 34. Therefore, as shown in FIGS. 4 to 6, a configuration is adopted in which the cable or hose 34 is connected to the on-off valve 27 after the measurement is completed, in order to reduce the above-mentioned errors.

On the other hand, as shown in FIG. 1, the supply pipe section 26 of the measuring container 21 faces inward of the receiving pipe section 42 of the storage container 41. In this case, the inner diameter of the receiving tube section 42 is set to a size such that the supply tube section 26 does not come into contact with the receiving tube section 42 while the liquid is being measured in the measuring container 21 . This storage container 41 is provided with a stirrer 43 for mixing the parent solvent and poor solvent sent from the measuring container 21, and detects when the mixed liquid in the storage container 41 has reached a certain level. A level sensor 44 is provided. On the other hand, one end of a pressure pipe 45 faces the space above the inside of the storage container 41, and the other end of this pressure pipe 45 is connected to a three-way valve 46.
It is connected to a pressurizing pipe 47 and a discharge pipe 48 via. On the other hand, one end of a discharge pipe 49 is connected to the bottom of the storage container 41, and the other end is connected to a developing device 5 through an on-off valve 50.
Connected to 1. Therefore, by pressurizing the internal space of the storage container 41, the mixed liquid can be supplied to the developing device 51 through the discharge pipe 49. Note that an on-off valve 52 is interposed in the receiving tube 42 of the storage container 41, and when sending the two liquids from the measuring container 21 to the storage container 41, the on-off valve 52 is opened, and on the other hand, the developing device is removed from the storage container 41. When sending the mixed liquid to the storage container 51 side, the on-off valve 52 is closed to make the inside of the storage container 41 airtight. Further, a drain pipe 53 is connected to the bottom of the storage container 41, so that the remaining liquid in the storage container 41 can be drained by operating a valve cock 54.

On the other hand, the developing device 51 connects the rotating shaft 56 of the motor 55 to the developing tank 5.
The wafer 5 is placed at the tip of the wafer 5 facing inward from the bottom of the wafer 7.
8, and the wafer 5 is rotated by the motor 55.
8 is designed to rotate. On the other hand, a nozzle 59 is attached to the upper wall of the developer tank 57, and a discharge pipe 49 from the storage container 41 is connected to this nozzle 59, and the developer is jetted from the nozzle 59 toward the wafer 58. It's been like that.

Next, the basic discharge operations of the coarse discharge valve 10.12 and the minute discharge valve 9.11 will be explained based on the flowchart of FIG. First, the total weight M of the parent solvent and poor solvent supplied to the measuring container 21 is set (step S
t). Next, the mixing ratios kA and kB of the parent solvent and poor solvent are set (step S2). Next, set the switching points MkA~α1, , MkB−α2 between particle volume discharge and minute volume discharge (
Step S3). Here, α1 and α2 are determined by preliminary tests of particle quantity discharge and minute quantity discharge. Next, the coarse discharge valve 10 on the parent solvent side is opened to supply the parent solvent into the measuring container 21 (step S4). Then, it is determined whether the weight of the parent solvent in the measuring container 21 has reached approximately MkA-α1 (step s5), and if the weight has not reached MkA-α1, the supply continues; While closing the pulp lO, the valve 9 for discharging a small amount is opened, and the parent solvent is supplied into the measuring container 21 in small amounts (step S6). Then, it is determined whether the weight of the parent solvent in the measuring container 21 has reached MkA (step S7), and if the weight has not reached MkA, the parent solvent continues to be discharged in a small amount; Close 9. Next, the valve 12 for discharging a rough amount of poor solvent is opened, and the poor solvent is supplied into the measuring container 21 (step S8). Then, it is determined whether the weight of the parent solvent and poor solvent in the measuring container 21 has reached approximately MkA + MkB - α2 (step S9). While closing the pulp 12, the valve 11 for discharging a small amount is opened to supply the poor solvent into the measuring container 2I in small amounts (step SI).
O). Then, it is determined whether the weight of the parent solvent and poor solvent in the weighing container 21 has reached MkA+MkB (step 511). If the amount has not been reached, the supply continues, and if the amount has been reached, the minute amount discharge valve 11 is closed.

Since each solvent is configured to be supplied into the measuring container 21 by first discharging a particle amount and then discharging a small amount, it is possible to quickly and accurately supply a predetermined weight of each solvent. Therefore, two liquids having a predetermined mixing ratio can be obtained quickly and accurately.

In this embodiment, the parent solvent and poor solvent are supplied to the coarse discharge valves 1o and 12 and the minute discharge valve 9.
．． Incorporating the above-mentioned basic ejection operation by No. 11, it is performed as follows. This supply method will be explained based on the flowchart shown in FIG. In this flowchart, the explanation of the above-mentioned basic discharge operation by each valve 9.10, 11.12 is omitted. First, the total weight M of the parent solvent and poor solvent to be supplied to the measuring container 21 is set (step 520). Next, set the mixing ratio kA and kB of the parent solvent and poor solvent (
Step 521). Next, the number N of repetitions of supplying the parent solvent and poor solvent is set (step 522). For example, if a parent solvent is supplied first, then a poor solvent is supplied, and then a parent solvent is supplied, N is 3. Next, n is set to the initial value O (step 523). Next, it is determined whether N is an odd number (step S24), and if N is an odd number, the process moves to step S25, and if N is an even number, the process moves to step S30. First, if N is an odd number, then Mk
11 solvent is provided in an amount of A.2/(N+1) (step 525). In other words, when supplying the parent solvent for the first time when N is an odd number, the number of times the parent solvent is supplied is (N+1)/2, and the amount of parent solvent supplied per time is the total amount of parent solvent supplied, MkA, as above. The amount divided by the number of times (N+1)/2, that is, MkA·2/(N+1). Then M
Provide an antisolvent in an amount of kB·2/(N−1) (step 526). In other words, when N is an odd number and the parent solvent is supplied first, the number of times the poor solvent is supplied is (N-1)/2
Therefore, the amount of poor solvent supplied per time is the amount obtained by dividing the total amount of poor solvent supplied MkB by the number of times (N-1)/2, that is, MkB·2/(N-1). Next, 1 is added to n (step 527).

It is then determined whether the value of n has reached the value of (N-1)/2 (step 328). That is, (N-L
L/2 means the number of repetitions of the process when step S25 and step S26 are considered as one process, for N-1 times excluding the last supply of the parent solvent. n is (
If the value has not reached N-1)/2, the process moves to step S25, and steps S25, S26, and S2
Repeat step 7. If n reaches (N-1)/2, the process moves to step S29, and MkA・2/(N+
Stop after supplying the amount of parent solvent in 1). On the other hand, if N is determined to be an even number in step S24, MkA.
A 2/N amount of parent solvent is provided (step 530). That is, when N is an even number, the number of times the parent solvent is supplied is N/2, and the amount of parent solvent supplied per time is the amount obtained by dividing the total supply amount MkA by the number of times N/2. Next, MkB・2/H
(step 531). The same applies to this. Next, add 1 to n in step S.
32), then it is determined whether the value of n has reached N/2 (step 533). When n has not reached N/2, the process moves to step S30, and step S30
and steps S31 and S32 are repeated. When n reaches N/2, the supply is stopped at that point.

By supplying the parent solvent and the poor solvent alternately in this way, the parent solvent and the poor solvent are mixed in the measuring container 21, and therefore, when such two liquids are sent to the storage container 41, The time for stirring the two liquids by the stirrer 43 can be shortened, and as a result, it is possible to quickly obtain a developer.

Furthermore, as another embodiment, it is also possible to supply the parent solvent and the poor solvent as follows. This supply method will be explained based on the flowchart shown in FIG. 9. First, the total weight M of the parent solvent and poor solvent to be supplied to the measuring container 21 is set (step 540). Next, the mixing ratios kA and kB of the parent solvent and poor solvent are set (step 541). Then set n to initial (+!IO) (step 542)
. Next, 1 is added to n (step S43). Next, it is determined whether the value of n is an odd number or not in step S44.
), when the value of n is an odd number, the process moves to step S45, and when it is an even number, the process moves to step S48. When proceeding to step S45, a poor solvent in an amount of MkB is supplied.

A parent solvent is then provided in an amount of MkA (step 546
). Then, in step S47, it is determined whether new replenishment of the two liquids is necessary. This determination is made based on the presence or absence of an output from the level sensor 44 of the storage container 41. If replenishment is not necessary, the process remains on standby; if replenishment is necessary, the process moves to step S43, and 1 is added to the value of n. If the value of n in the previous supply was an odd number, the value of n will be an even number this time, and step S
In step S44, it is determined that the value of n is an even number, and the process moves to step S48. Therefore, first, a parent solvent in an amount of MkA is supplied, and then, in step S49, a poor solvent in an amount of MkB is supplied. Since the supply order of the parent solvent and the poor solvent is changed each time they are supplied, the solvents that come into contact with the inner wall surface of the measuring container 21 are replaced with the parent solvent and the poor solvent, and the amount of the solvent is measured accordingly. The mixed liquid is mixed in the container 21, and as in the above case, the storage container 41
It is possible to shorten the stirring time by the stirrer 43 after the mixture is transferred to the liquid mixture, and therefore it is possible to quickly obtain a mixed liquid.

Next, the operating state of the answering device having the above structure will be explained based on the timing diagram shown in FIG. 10. First, the coarse quantity discharge valve 10
．． 12 and the small amount discharge valve 9. The parent solvent and poor solvent are supplied into the measuring container 2 according to the control system as described above. Next, the on-off valve 27.52 is opened to transfer the two liquids into the storage container 41, and the on-off valve 27.52 is closed again. After stirring the two liquids in the storage container 41 with the stirrer 43,
The three-way valve 46 is switched so that the pressure piping 45 and the pressurizing piping 47 communicate with each other, and the space above the liquid level in the storage container 41 is pressurized. When preparation for development within the developing device 51 is completed, the on-off valve 50 is opened and the developing solution is sprayed onto the wafer 58 from the nozzle 59. On the other hand, when the level sensor 44 detects that the developer in the storage container 41 has reached a predetermined level, the coarse amount discharge valve 10.12 and the minute amount discharge valve 9.11 are activated in the same manner as described above. The solvent and poor solvent are controlled to be supplied into the measuring container 21. When the two liquids are supplied from the measuring container 21 to the storage container 41, the three-way valve 46 is switched so that the pressure piping 45 and the discharge piping 48 are communicated, and the space inside the storage container 41 is returned to normal pressure. After that, the on-off valve 52 is opened. Note that when changing the mixing ratio, the remaining liquid in the storage container 41 may be discharged by opening the valve cock 54.

In each of the above-mentioned embodiments, each liquid is transferred from each liquid supply tank 1.2 to the measuring container 21 before or every time the mixed liquid, which has been made to a predetermined weight at a predetermined mixing ratio in the measuring container 21, is transferred to the storage container 41. Since the supply order of the solvents is controlled to be changed, the mixed liquids are mixed even in the measuring container 21, and therefore it is possible to shorten the stirring time of the mixed liquid transferred to the storage container 41. .

If the optimal relationship between the development time and the mixing ratio for developing resist, which is very sensitive to the concentration of the developer, is determined through a preliminary test, as shown in Figure 11, for example, it is possible to faithfully follow such a relationship. It is possible to supply the developer in a timely manner.

Therefore, it is possible to improve the dimensional accuracy of the resist pattern.

FIG. 12 shows a modification of the above configuration.

As shown in the figure, a weighing container 21.21.21 is placed on each weighing part 23.23.23 of three weighing scales 22.22.22, and each weighing container 21.21.21 is A storage container 41.41.41 is arranged. In this modification, each measuring container 21, 21, 2
Supply 2 liquids at respective mixing ratios to 1 and each storage container 4.
1.41.41. The developer in each storage container 41, 41, 41 is sprayed onto the wafer 58 from each nozzle 59, 59, 59 provided in the developing device 51 in accordance with the timing of the spray.

Further, FIG. 13 shows still another embodiment. In this modification, as shown in the figure, one weighing container 21 is provided in the weighing section 23 of one weighing scale 22! 5! The supply pipe section 26 of this measuring container 21 is branched into three parts.
Three storage containers 4 corresponding to each branch 60.61.62
1.41.41 are arranged respectively. This modification also has substantially the same effect as the modification described above. Note that the same parts as in the above embodiment are designated by the same reference numerals.
The explanation is omitted.

In each of the above-mentioned modifications, the two solvents are mixed in advance in the measuring container 21 as in the above-mentioned embodiments,
Therefore, the stirring time by the stirrer 43 in the storage container 41 can be shortened.

Although specific examples of the multiple liquid mixing device of the present invention have been described above, the liquid measuring device of the present invention is not limited to the above embodiments, and can be implemented with various modifications within the scope of the present invention. . For example, in the above embodiments, a developer is obtained from a parent solvent and a poor solvent, but it can be applied to any method that produces a stirred mixture of two different types of liquids. It is possible.

(Effects of the Invention) As explained above, in the multiple liquid mixing device of the present invention, before or every time the mixed liquid is transferred from the measuring container to the storage container, the supply order of the capacity from each liquid supply source to the measuring container is determined. Since the liquid mixture is controlled to be exchanged, the liquid mixture is mixed in the measuring container, and therefore, it is possible to shorten the stirring time of the liquid mixture transferred to the storage container.

[Brief explanation of the drawing]

FIG. 1 is an explanatory diagram showing one implementation of the multiple liquid mixing device of the present invention, FIG. 2 is a partial cross-sectional view showing an example of a small amount discharge valve used in the multiple liquid mixing device, and FIG. A principle explanatory diagram showing an example of a weight measuring device used in a liquid mixing device, Figures 4 to 6 are explanatory diagrams of on-off valves provided in the supply pipe portion of the measuring container, and Figures 7 to 9 are control flowchart diagrams. , Fig. 10 is a timing diagram of the opening and closing of the valve used in the device shown in Fig. 1, Fig. 11 is a graph showing the relationship between development time and developer concentration, and Figs. 12 and 13 are respectively An explanatory diagram showing a modification of the above embodiment, FIG. 14 is a graph showing the relationship between ethanol concentration and degree of anger for resist, and FIGS. 15 and 16 are different types when using a developer with a constant concentration. Graph showing the relationship between development time and resist remaining film thickness for resist, No. 17
The figure is an explanatory diagram of film reduction in the positive portion of the resist, and FIG. 18 is an explanatory diagram showing a conventional two-liquid heating device. 1.2...Liquid supply tank (liquid supply source), 21...Measuring container, 22...Weighing device, 23...Measuring part, 27
... Opening/closing valve, 41... Storage container, 43... Stirrer. Patent applicant: Daikin Industries, Ltd. +7″
− Agent Masahiro Nishimori：：・
..., 1 - ,, (...2 Figure 3 Figure 7 Figure 14 (Ethanol/Itzuhandururoruko-7to) Figure 15 Present I & [1 Rugo (#)

Claims (1)

[Claims] 1. A storage container (41) equipped with a stirrer (43) is connected to the weighing section (2) of a weighing scale (22) via an on-off valve (27).
3) and connected to the measuring container (21) placed on the
Each liquid supply source (1
) (2), and the weight of each liquid supplied from each of the liquid supply sources (1) and (2) to the measuring container (21) is measured in the measuring container (21). The mixed liquid, which has a predetermined weight at a predetermined mixing ratio in the container (21), is transferred to the storage container (41) by opening the on-off valve (27), and is stirred by the stirrer (43). A multi-liquid mixing device configured to mix liquids from each of the liquid supply sources (1) and (2) to the measuring container (21) before or every time the mixed liquid is transferred to the storage container (41). A multi-liquid mixing device characterized by having a control means for controlling the supply order of liquids to be changed.