JPS63255343A - Material for soft magnetic thin film - Google Patents
Material for soft magnetic thin filmInfo
- Publication number
- JPS63255343A JPS63255343A JP8758987A JP8758987A JPS63255343A JP S63255343 A JPS63255343 A JP S63255343A JP 8758987 A JP8758987 A JP 8758987A JP 8758987 A JP8758987 A JP 8758987A JP S63255343 A JPS63255343 A JP S63255343A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- soft magnetic
- magnetic thin
- corrosion resistance
- magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 28
- 239000000463 material Substances 0.000 title claims abstract description 18
- 229910052761 rare earth metal Inorganic materials 0.000 claims abstract description 13
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 238000005260 corrosion Methods 0.000 abstract description 21
- 230000007797 corrosion Effects 0.000 abstract description 21
- 230000035699 permeability Effects 0.000 abstract description 13
- 229910052733 gallium Inorganic materials 0.000 abstract description 7
- 229910052710 silicon Inorganic materials 0.000 abstract description 6
- 238000000034 method Methods 0.000 abstract description 5
- 229910000807 Ga alloy Inorganic materials 0.000 abstract description 4
- 229910052804 chromium Inorganic materials 0.000 abstract description 4
- 238000007747 plating Methods 0.000 abstract description 3
- 238000004544 sputter deposition Methods 0.000 abstract description 3
- 238000007740 vapor deposition Methods 0.000 abstract description 3
- 239000010408 film Substances 0.000 description 8
- 229910045601 alloy Inorganic materials 0.000 description 7
- 239000000956 alloy Substances 0.000 description 7
- 239000000203 mixture Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 4
- 230000004907 flux Effects 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 229910001092 metal group alloy Inorganic materials 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 229910003271 Ni-Fe Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000009864 tensile test Methods 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Landscapes
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
く技術分野〉
本発明は、薄膜磁気ヘッド又は磁気スイッチ、各種検出
器等に用いて好適なＦｅ５ｉ−Ｇａ系合金からなる軟磁
性薄膜用材料の改良に関する。DETAILED DESCRIPTION OF THE INVENTION Technical Field The present invention relates to improvements in soft magnetic thin film materials made of Fe5i-Ga alloys suitable for use in thin film magnetic heads, magnetic switches, various detectors, and the like.
〈従来技術とその問題点〉
近年、磁気応用分野では、磁心の小型化、高周波化、高
密度化の傾向にあり、特に磁気記録分野では高記録密度
化に伴ない、狭トラツク、短波長、高周波帯域の方向に
進んでいる。例えば固定ヘッド型デジタルオーディオ、
ＰＣＭ、直重磁気記録分野等がそうである６
磁性素子の小型化、高周波化に対しては、軟磁性材料の
薄板、薄帯が利用されつつあるが、充分に対応できる材
料であるとはいえない。そこで注目されているのがスパ
ッタ法、蒸着法、メッキ法等により製造される軟磁性薄
膜である。この薄膜は低周波領域では保磁力、透磁率の
点で劣るが、その形状の有利さから高周波領域では格段
に優れている。すなわち薄膜は、電気抵抗の低い金属材
料に特有の渦電流損失を著しく低減することが可能であ
るために、高周波帯域における透磁率の低下を抑えるこ
とができる。<Prior art and its problems> In recent years, in the field of magnetic applications, there has been a trend toward smaller magnetic cores, higher frequencies, and higher densities.In particular, in the field of magnetic recording, with the increase in recording density, narrower tracks, shorter wavelengths, It is moving towards high frequency bands. For example, fixed head digital audio,
This is the case in the field of PCM, direct gravity magnetic recording, etc. 6. Thin sheets and ribbons of soft magnetic materials are being used to miniaturize magnetic elements and increase frequencies, but it is unclear whether these materials are fully capable of responding. I can't say that. Therefore, soft magnetic thin films manufactured by sputtering, vapor deposition, plating, etc. are attracting attention. Although this thin film is inferior in terms of coercive force and magnetic permeability in the low frequency range, it is significantly superior in the high frequency range due to its advantageous shape. That is, the thin film can significantly reduce eddy current loss peculiar to metal materials with low electrical resistance, and therefore can suppress a decrease in magnetic permeability in a high frequency band.
一般に、薄膜材料は薄膜磁性素子の主要構成要素であり
、その中でも軟磁性薄膜は磁性素子の性能を決定するも
のである。これには、Ｎｉ Ｆｅ係合金、Ｆｅ−３ｉ
−ＡＩ係金合金さらにはアモルファス系磁性薄膜が試作
、検討されており、一部実用化されている。In general, thin film materials are the main components of thin film magnetic elements, and among them, soft magnetic thin films determine the performance of the magnetic element. This includes Ni-Fe alloy, Fe-3i
-AI metal alloys and amorphous magnetic thin films have been prototyped and studied, and some have been put into practical use.
しかし、上記軟磁性薄膜用材料には夫々一長一短があり
、これまでの報告では必ずしも満足し得る結果が得られ
ていない。なかんずく、Ｆｅ−３ｉ−ＡＩ係金合金、媒
体の高抗磁力化に対応できる飽和磁束密度の高い材料と
して期待されており、一部磁気ヘッドに実用化されてい
る。However, each of the above-mentioned materials for soft magnetic thin films has advantages and disadvantages, and reports to date have not necessarily yielded satisfactory results. In particular, the Fe-3i-AI metal alloy is expected to be a material with a high saturation magnetic flux density that can be used to increase the coercive force of media, and has been put into practical use in some magnetic heads.
一方、記録密度を向上させるために覆体の高検磁束密度
を有する材料の検討が行なわれている。On the other hand, in order to improve the recording density, studies are being conducted on materials having a high detectable magnetic flux density for the cover.
この−例としては、特開昭６１−２３４５０９号公報に
Ｆｅ、Ｇａ、Ｓｉから成る軟磁性薄膜が提案されている
。As an example of this, a soft magnetic thin film made of Fe, Ga, and Si is proposed in Japanese Patent Laid-Open No. 61-234509.
しかし、本発明者らによれば、Ｆｅ、 Ｇａ、 Ｓｉか
らなる薄膜は、透磁率、飽和磁束密度は高いが、耐蝕性
及び機械的強度に実用上の問題があることが判明した。However, according to the present inventors, it has been found that although thin films made of Fe, Ga, and Si have high magnetic permeability and saturation magnetic flux density, they have practical problems in corrosion resistance and mechanical strength.
ここで耐蝕性はＦｅ−８ｉ−ＡＩからなる薄膜とほぼ同
程度であるが、薄膜用材料として実用化するには更に耐
蝕性を向上させる必要がある。Although the corrosion resistance is approximately the same as that of a thin film made of Fe-8i-AI, it is necessary to further improve the corrosion resistance in order to put it into practical use as a thin film material.
く本発明の目的〉
本発明はかかる点に鑑み、透磁率が高く、耐蝕性に優れ
、しかも機械的強度の高い軟磁性薄膜用材料を提案する
ことを主たる目的とする。OBJECTS OF THE INVENTION In view of these points, the main object of the present invention is to propose a material for soft magnetic thin films that has high magnetic permeability, excellent corrosion resistance, and high mechanical strength.
〈本発明の構成〉
上記目的は軟磁性薄膜用材料の合金組成を、重量比で５
ｉ４＝１２％、Ｇａ８〜２０％、Ｃｒ０．１〜３％、希
土類元素の１種又は２種以上を０．００１〜２％含み、
残部Ｆｅとすることにより達成される。（以下、重量％
を単に％で示す。）すなわち軟磁性薄膜用材料として、
Ｆｅ５ｉ−Ｇａ合金に０．１〜３％のＣｒと０．００１
−２％の希土類元素を同時に添加することにより、透磁
率、耐蝕性機械的強度を大きく向上させることができる
。<Structure of the present invention> The above object is to reduce the alloy composition of the soft magnetic thin film material to 5% by weight.
i4=12%, Ga8-20%, Cr0.1-3%, containing 0.001-2% of one or more rare earth elements,
This is achieved by making the balance Fe. (Hereinafter, weight%
is simply expressed as a percentage. ) In other words, as a material for soft magnetic thin films,
Fe5i-Ga alloy with 0.1-3% Cr and 0.001
By simultaneously adding -2% of rare earth elements, magnetic permeability, corrosion resistance, and mechanical strength can be greatly improved.
Ｓｉ量、Ｇａ量は夫／２７〜１０％、１２−１８％の範
囲で透磁率が高くなるので、この組成範囲が上り好まし
い。Ｃｒは機械的強度を向上させないが、耐蝕性、透磁
率を改善し０．１％未満ではその効果が明確でなく、３
％を超えて添加した場合は耐蝕性は更に改善されるが、
その反面、飽和磁束密度の低下が著しいために、添加量
は０．１〜３％の範囲がよい。希土類元素は透磁率、耐
蝕性、機械的強度の改善のために添加するものであり、
０．００１％未満ではその効果が明確ではなく、２％を
超えて添加しても磁気特性の飛躍的な向上は認められな
いので、添加量は０．００１〜２％の範囲がよい。Since magnetic permeability increases when the amount of Si and Ga is in the range of /27% to 10% and 12% to 18%, this composition range is preferable. Although Cr does not improve mechanical strength, it improves corrosion resistance and magnetic permeability, but the effect is not clear at less than 0.1%, and 3
If it is added in excess of %, the corrosion resistance will be further improved, but
On the other hand, since the saturation magnetic flux density decreases significantly, the amount added is preferably in the range of 0.1 to 3%. Rare earth elements are added to improve magnetic permeability, corrosion resistance, and mechanical strength.
If it is less than 0.001%, the effect is not clear, and if it is added in excess of 2%, no dramatic improvement in magnetic properties is observed, so the amount added is preferably in the range of 0.001 to 2%.
また、本発明の軟磁性薄膜を製造する方法は特に規定し
ないが、各種のスパッタ法、蒸着法、メッキ法等により
任意に選択できる。Further, the method for manufacturing the soft magnetic thin film of the present invention is not particularly specified, but can be arbitrarily selected from various sputtering methods, vapor deposition methods, plating methods, etc.
く本発明の実施例〉
実施例−１
基板として５ｃ−四方のポリイミドフィルムを用い、こ
の上にマグネトロンスパッタ法により第１表に示した組
成の合金を厚さ５μ輸被着した。尚、Ｃｒ及び希土類元
素の添加効果を明確にするために、Ｓｉ量は９％、Ｇａ
量は１６％と一定にした（試料Ｎｏ、１．１１〜１３．
２０〜２３を除く）、ここで用いたターゲラＦの組成は
Ｓｉｌ ０％、Ｇａ１７％であり、Ｃｒ及び希土類元素
は膜の組成と同一であった（試料Ｎｏ、１．１１〜１３
．２０−２３を除く）、これらの膜を分析した結果、第
１表に示した元素の池に３ ｐｐｍ以下のＳ、５ ｐｐ
ｍ以下のＣが検出された。Ｓ、Ｃ等の不純物が多く含ま
れていると、Ｃｒを添加しても、これらの不純物に起因
する孔食が発生し、また希土類元素の添加はかえって耐
蝕性を害することになるので好ましくない。Examples of the Present Invention Example 1 A 5C square polyimide film was used as a substrate, and an alloy having the composition shown in Table 1 was deposited to a thickness of 5μ by magnetron sputtering. In addition, in order to clarify the effect of adding Cr and rare earth elements, the amount of Si was 9% and the amount of Ga was 9%.
The amount was kept constant at 16% (sample No., 1.11 to 13.
The composition of Targera F used here was 0% Sil, 17% Ga, and the Cr and rare earth elements were the same as the composition of the film (sample Nos. 1.11 to 13).
．． 20-23), and as a result of analyzing these films, the elements listed in Table 1 contained less than 3 ppm S, 5 ppm
m or less C was detected. If a large amount of impurities such as S and C is contained, even if Cr is added, pitting corrosion will occur due to these impurities, and addition of rare earth elements will actually impair corrosion resistance, which is undesirable. .
また、スパッタ膜の組織観察によりは第２相の析出は認
められなかった。膜形成後、１０−’ Ｔｏｒｒの真空
中で６００℃、３０分間熱処理を行ない、以下の試験に
供した。Furthermore, no second phase precipitation was observed by observing the structure of the sputtered film. After the film was formed, it was heat-treated at 600°C for 30 minutes in a vacuum of 10-' Torr, and then subjected to the following tests.
これらのスパッタ膜について、耐蝕性試験を行なった。Corrosion resistance tests were conducted on these sputtered films.
耐蝕性試験としては塩水噴霧試験法（ＪＩＳ Ｚ
２３７１）を用いた。噴霧時間は４８時間とした。評価
方法は、試料Ｎｏ、１のＦｅ−３ｉ９．５％−Ａｌｌ
７％の腐食面積を１００として相対腐食面積を算出した
。As a corrosion resistance test, the salt spray test method (JIS Z
2371) was used. The spraying time was 48 hours. The evaluation method was as follows: Sample No. 1 Fe-3i9.5%-All
The relative corrosion area was calculated by setting the corrosion area of 7% as 100.
また、同時に作成した同一組成のスパッタ膜について引
張試験を行ない、合金膜にクラックが発生するときの強
度を測定した。評価方法は上記と同様に試料Ｎｏ、１の
強度を１００として相対評価した。In addition, a tensile test was conducted on sputtered films of the same composition that were created at the same time, and the strength at which cracks occurred in the alloy film was measured. The evaluation method was a relative evaluation using the strength of sample No. 1 as 100 in the same manner as above.
これらの結果を第１表に示す。この結果よりＦｅ−３ｉ
−Ｇａ合金にＣｒ、希土類元素を添加することにより、
耐蝕性及Ｖ８１１械的強度が向上していることがわかる
（Ｎｏ、５〜１９）。特に、本試験結果のなかでは合金
Ｎｏ、１０（１，０％Ｃｒ、２．０％Ｃｅ）はＮｏ、１
に比べ耐蝕性が２．５倍、強度が１゜５倍という良好な
特性が得られている。またＳｉ及びＧａ量は耐蝕性、８
１１械的強度にはほとんど影響していないことも認めら
れる。（Ｎｏ、２０〜２３）。一方、Ｃ「は耐蝕性の向
上には寄与するが、機械的強度にはほとんど寄与してい
ない。（ＮＯ０７，１１，１２，１３）
実施例−２
外径１０ｎ＋ｍ、内径６ｍｍ、厚さ０．５ＩＩｌｆｆｌ
の結晶化プラス基板を用いて、これに実施例−１と同一
条件で合金膜を５μｍ被着した。実施例−１と同じ熱処
理を行なった後、巻線を施し、５ＭＨｚにおける実効当
時率を測定した。この結果を第１表に示す。これにより
、Ｃ「、希土類元素を添加すると実効透磁率は向上して
いることがわかる。特に、合金Ｎｏ、 １０１．ｔＮｏ
、１に比べ１．５倍以上の透磁率が得られる。These results are shown in Table 1. From this result, Fe-3i
-By adding Cr and rare earth elements to the Ga alloy,
It can be seen that the corrosion resistance and V811 mechanical strength are improved (No. 5 to 19). In particular, in this test result, alloy No. 10 (1.0% Cr, 2.0% Ce) is
It has good properties such as 2.5 times the corrosion resistance and 1.5 times the strength compared to the conventional steel. In addition, the amount of Si and Ga is corrosion resistance, 8
11 It was also observed that the mechanical strength was hardly affected. (No. 20-23). On the other hand, C" contributes to improving corrosion resistance, but hardly contributes to mechanical strength. (NO07, 11, 12, 13) Example-2 Outer diameter 10n+m, inner diameter 6mm, thickness 0. 5IIlffl
Using a crystallized plus substrate, an alloy film having a thickness of 5 μm was deposited thereon under the same conditions as in Example-1. After performing the same heat treatment as in Example-1, winding was performed, and the effective current ratio at 5 MHz was measured. The results are shown in Table 1. This shows that the effective magnetic permeability improves when rare earth elements are added.Especially, alloy No., 101.tNo.
, 1. A magnetic permeability of 1.5 times or more can be obtained compared to .
く本発明の効果〉
以上述べたごとく本発明によれば、重量比でＳｉ４〜１
２％、Ｇａ８〜２０％、ＣｒＯ，１−３％、希土類元素
の１種又は２種以上を０．００１〜２％含み、残部Ｆｅ
としたので、
耐蝕性に優れ、機械的強度の大きく、しかも透磁率の高
い薄膜が実現され、従来の問題点及び課題を解消し得る
軟磁性薄膜用材料が実現でき、薄膜磁性素子、特に薄膜
磁気ヘッドの実用化に大きく貢献できるものである。Effects of the present invention> As described above, according to the present invention, Si4 to 1 in weight ratio
2%, Ga8-20%, CrO, 1-3%, 0.001-2% of one or more rare earth elements, balance Fe
As a result, a thin film with excellent corrosion resistance, high mechanical strength, and high magnetic permeability has been realized, and a material for soft magnetic thin films that can solve the conventional problems and issues has been realized, and it has become possible to realize thin film materials for thin film magnetic elements, especially thin films. This can greatly contribute to the practical application of magnetic heads.
Claims (1)
〜３％、希土類元素の１種又は２種以上を０．００１〜
２％含み、残部Ｆｅとしたことを特徴とする軟磁性薄膜
用材料。Weight ratio: Si4-12%, Ga8-20%, Cr0.1
~3%, one or more rare earth elements 0.001~
A soft magnetic thin film material characterized by containing 2% Fe and the balance being Fe.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8758987A JPS63255343A (en) | 1987-04-09 | 1987-04-09 | Material for soft magnetic thin film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8758987A JPS63255343A (en) | 1987-04-09 | 1987-04-09 | Material for soft magnetic thin film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63255343A true JPS63255343A (en) | 1988-10-21 |
Family
ID=13919186
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8758987A Pending JPS63255343A (en) | 1987-04-09 | 1987-04-09 | Material for soft magnetic thin film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63255343A (en) |
-
1987
- 1987-04-09 JP JP8758987A patent/JPS63255343A/en active Pending
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