JPS6325033A - Laminated film - Google Patents
Laminated filmInfo
- Publication number
- JPS6325033A JPS6325033A JP16810386A JP16810386A JPS6325033A JP S6325033 A JPS6325033 A JP S6325033A JP 16810386 A JP16810386 A JP 16810386A JP 16810386 A JP16810386 A JP 16810386A JP S6325033 A JPS6325033 A JP S6325033A
- Authority
- JP
- Japan
- Prior art keywords
- film
- metal oxide
- layer
- transparent
- organic polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910044991 metal oxide Inorganic materials 0.000 claims description 23
- 150000004706 metal oxides Chemical class 0.000 claims description 23
- 229920000620 organic polymer Polymers 0.000 claims description 15
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 13
- 239000001301 oxygen Substances 0.000 claims description 13
- 229910052760 oxygen Inorganic materials 0.000 claims description 13
- 238000004544 sputter deposition Methods 0.000 claims description 10
- 229910021595 Copper(I) iodide Inorganic materials 0.000 claims description 8
- LSXDOTMGLUJQCM-UHFFFAOYSA-M copper(i) iodide Chemical compound I[Cu] LSXDOTMGLUJQCM-UHFFFAOYSA-M 0.000 claims description 7
- 238000007733 ion plating Methods 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 2
- 239000010408 film Substances 0.000 description 68
- 239000010410 layer Substances 0.000 description 16
- 230000003647 oxidation Effects 0.000 description 11
- 238000007254 oxidation reaction Methods 0.000 description 11
- GBRBMTNGQBKBQE-UHFFFAOYSA-L copper;diiodide Chemical compound I[Cu]I GBRBMTNGQBKBQE-UHFFFAOYSA-L 0.000 description 10
- 239000000463 material Substances 0.000 description 9
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 4
- 229910000831 Steel Inorganic materials 0.000 description 3
- -1 alkyl titanate Chemical compound 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229920000298 Cellophane Polymers 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000006260 foam Substances 0.000 description 2
- 239000008204 material by function Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920006267 polyester film Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 238000005546 reactive sputtering Methods 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- 229920002302 Nylon 6,6 Polymers 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 230000000536 complexating effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 229940045803 cuprous chloride Drugs 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000012770 industrial material Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- YADSGOSSYOOKMP-UHFFFAOYSA-N lead dioxide Inorganic materials O=[Pb]=O YADSGOSSYOOKMP-UHFFFAOYSA-N 0.000 description 1
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、有機高分子の上に形成された金属酸化物層（
膜）好ましくは化学量論的な酸化度が制御された金属酸
化物層（膜）を宮む積層膜に関するものである。Detailed Description of the Invention (Industrial Field of Application) The present invention provides a metal oxide layer (
(Membrane) Preferably, it relates to a laminated film comprising a metal oxide layer (film) with a controlled stoichiometric degree of oxidation.
（従来技術）
金属酸化物は、近年機能性セラミックスとじてセンサー
、透明導電膜１反射防止膜、エレクトロクロミズム材料
等に広く利用されつつあるが、（工業材料３Ｊム８．Ｐ
、５２）これ等に使用する金属酸化物の酸化度は制御さ
れる。父、これ等の酸化物を有機高分子物体の表面に生
成せしめる事は、有機高分子の特徴である形状の自由度
、軽量電気絶縁性、可撓性、加工の容易性を活用する為
に極めて望ましい事であり、既に実用化されている例と
しては透明導電性フィルム、熱線反射フィルム等がある
が今后更に多くの機能材料の出現が予想される。(Prior art) In recent years, metal oxides have been widely used in functional ceramics, sensors, transparent conductive films, anti-reflection films, electrochromic materials, etc.
, 52) The degree of oxidation of the metal oxide used in these is controlled. Father, the purpose of producing these oxides on the surface of organic polymer objects is to take advantage of the characteristics of organic polymers: freedom of shape, lightweight electrical insulation, flexibility, and ease of processing. This is extremely desirable, and examples that have already been put into practical use include transparent conductive films and heat ray reflective films, but it is expected that many more functional materials will appear in the future.
金属酸化物を物体上に生成せしめる方法は化学的方法、
物理的方法夫々に於て斐に様々な数多くの方法が存在す
るが、酸化度が制御された金属酸化物膜を生成せしめる
目的からは酸素を含むプラズマを利用した物理的プロセ
スすなわちスパタリング或はイオンプレーティングが最
適である。例えば、アルキルチタネートの溶液から化学
プロセスで生成された酸化チタンは酸化度が不充分の為
にその可視光線領域の屈折率は１．８〜２．４であり、
（ｐ＃開昭５３−１２８７９８（５））通常のスパタリ
ングで得られる酸化チタンの屈折率（２，１〜２．７）
に比べかな夛低い。（ＳＰＩＥ３２５０ｐｔｉｃａｌ
Ｔｈ１ｎＦｉ １ｍｓ （１９８２）１０５ ）ちなみ
に、熱線反射フィルムの作成には出来るだけ屈折率の高
い膜が望ましい。（オーム社刊、薄膜ハンドブックＰ、
８２１）従って高機能性金属酸化物の膜はスパタリング
によシ生成せしめる事が多い（工業材料３０Ａ８゜５２
（１９８２））。Chemical methods are used to generate metal oxides on objects.
There are many different physical methods, but for the purpose of producing a metal oxide film with a controlled oxidation degree, physical processes using oxygen-containing plasma, such as sputtering or ion Plating is best. For example, titanium oxide produced by a chemical process from an alkyl titanate solution has an insufficient degree of oxidation, so its refractive index in the visible light range is 1.8 to 2.4.
(p# Kaisho 53-128798 (5)) Refractive index of titanium oxide obtained by normal sputtering (2.1 to 2.7)
It's much lower than that. (SPIE3250ptical
Th1nFi 1ms (1982) 105) Incidentally, when creating a heat ray reflective film, it is desirable to use a film with as high a refractive index as possible. (Published by Ohmsha, Thin Film Handbook P,
821) Therefore, films of highly functional metal oxides are often formed by sputtering (Industrial Materials 30A8゜52
(1982)).
（発明が解決すべき問題点）
然しなから、基材として有機高分子物体を使用する場合
には、その有機高分子の耐プラズマ性、％に耐含酸素プ
ラズマ性が問題となシ、単に有機高分子上に含酸素プラ
ズマによるスパタリング法で製膜しても構造が緻密で、
且つ基材との密着性の良い膜は得られない。従って基材
表面に１あらかじめ他の物質をプレコートする事が行わ
れている。（特開昭６０−１３１７１１号、１５９−１
２４８号。(Problems to be Solved by the Invention) However, when using an organic polymer as a base material, the plasma resistance of the organic polymer, particularly oxygen-containing plasma resistance, is a problem. Even when a film is formed on an organic polymer by sputtering method using oxygen-containing plasma, the structure is dense,
Moreover, a film with good adhesion to the base material cannot be obtained. Therefore, the surface of the base material is precoated with another substance in advance. (Unexamined Japanese Patent Publication No. 60-131711, 159-1
No. 248.
５９−２０１８５３号等）このプレコート手法は大別す
ると（ａ）アルコキシ金属類の溶液を塗布後加熱酸化に
よる金属酸化物膜の形成か（ｂ）架橋性緻密高分子膜の
形成に分類されるが、何れも加熱酸化或いは、架橋促進
の為に非常に時間がかかる工程であろう
本発明は、上述の如き情況に基き、よシ簡易な方法によ
シ、有機高分子物体上に生成された構造が緻密で接着性
に優れた金属酸化物層（膜）好ましくは酸化度の制御さ
れた金属酸化物層（膜）を提供するものである。59-201853, etc.) This pre-coating method can be roughly divided into (a) formation of a metal oxide film by heating and oxidation after applying a solution of alkoxy metals, and (b) formation of a crosslinkable dense polymer film. Based on the above-mentioned circumstances, the present invention is based on the above-mentioned circumstances, and the present invention is a process that takes a very long time due to thermal oxidation or promotion of crosslinking. The present invention provides a metal oxide layer (film) with a dense structure and excellent adhesive properties, preferably a metal oxide layer (film) with a controlled degree of oxidation.
（問題点解決の手段）
本発明は、有機高分子物体の上に生成せしめた積層膜に
於て、有機高分子物体に直接接する第一層が、沃化第一
銅からなシ、更にその上に積層する第二層が、金属酸化
物好ましくは酸化度の制御された金属酸化物からなる事
を特徴とする積層膜に関する。(Means for Solving Problems) The present invention provides that in a laminated film formed on an organic polymer object, the first layer in direct contact with the organic polymer object is not made of cuprous iodide; The present invention relates to a laminated film characterized in that the second layer laminated thereon is made of a metal oxide, preferably a metal oxide with a controlled degree of oxidation.
さらに本発明は、有機高分子物体の上に沃化第一銅の層
を生成せしめる第一工程と、その上に、含酸素プラズマ
を用いたス）Ｒタリング或はイオンプレーティングに依
シ金属酸化物層を積層せしめる第二工程からなる積層膜
の製造方法釦関する。Furthermore, the present invention includes a first step of forming a layer of cuprous iodide on an organic polymeric object, and then a step of forming a layer of metal using an oxygen-containing plasma or ion plating. The present invention relates to a method for producing a laminated film, which comprises a second step of laminating oxide layers.
本発明で用うる有機高分子物体としては、熱可塑性樹脂
、熱硬化性樹脂の何れでも使用し得る。As the organic polymer substance that can be used in the present invention, either a thermoplastic resin or a thermosetting resin can be used.
例えば、Ｍｏｄｅｒｎ Ｐｌａｓｔｉｃｓ Ｅｎｃｙｃ
ｌｏｐｅｄｉａ１９８５−１９８６年版のＰ、４４８〜
４８３に記載の有機高分子などをあけることができる。For example, Modern Plastics Encyc
ropedia 1985-1986 edition P, 448~
483, etc. can be used.
又、その形態は糸、フィルム、成型品１発泡体等如何な
る形態でも良い。Moreover, the form may be any form such as a thread, a film, a molded product, or a foam.
例えば、フィラメント表面に沃化銅／ニオブ酸リチウム
の積層（積層膜）を生成せしめると特殊形態の焦電素子
として使用出来る。又、押２タンの形に成型した透明な
プラスチックスの底面に沃化銅／ＩＴＯの層（膜）を作
れば、透明なスイッチとして使用出来る。又、透明なポ
リメチルメタアクリレート成型板に、沃化銅／Ｗ０３の
膜を積層して、調光窓材として使用し得る。又成型品の
上に沃化銅／ Ｔ ａ ２０５或いは、沃化銅／ Ｓ
ｉ ０２等の膜を作シ、太陽電池用素材として使用し得
る。又、発泡体の表面忙沃化銅／ Ｔ ｉＯ２膜を形成
して、他物質への接着性を向上せしめる手が出来る。モ
ノフィラメントの表面を沃化銅／ Ａｉｔ Ｏｓ Ｊ［
で覆うことに依シ、これから作る濾布類の耐摩擦抵抗を
著しく改善することが出来る。For example, if a laminated layer (laminated film) of copper iodide/lithium niobate is formed on the filament surface, it can be used as a special type of pyroelectric element. Also, if a layer (film) of copper iodide/ITO is formed on the bottom of a transparent plastic molded into the shape of a push button, it can be used as a transparent switch. Furthermore, a copper iodide/W03 film can be laminated on a transparent polymethyl methacrylate molded plate and used as a light control window material. Also, copper iodide/T a 205 or copper iodide/S is applied on the molded product.
Films such as i02 can be used as materials for solar cells. It is also possible to form a copper iodide/TiO2 film on the surface of the foam to improve its adhesion to other materials. The surface of the monofilament is coated with copper iodide/Ait Os J [
By covering the filter fabric with a coating, it is possible to significantly improve the friction resistance of the filter fabric to be manufactured.
有機高分子物体に直接接する第一層としての沃化第一銅
は通常の試薬級の純度９５％以上の純度であれば良いが
、長期安定性の観点から出来得る限シ高純度である事が
望ましい。この沃化銅の層（膜）の厚さは、有機高分子
物体の表面を完全に覆う事が出来れば、如何に薄くとも
良いが、確実性を高める為には５００Å以上の厚さが望
ましい。Cuprous iodide, which serves as the first layer in direct contact with the organic polymer substance, should have a purity of 95% or higher than that of a normal reagent grade, but it should be as pure as possible from the viewpoint of long-term stability. is desirable. The thickness of this copper iodide layer (film) can be as thin as it can be as long as it can completely cover the surface of the organic polymer object, but a thickness of 500 Å or more is preferable to increase reliability. .
又、膜厚の上限も特に明確な限界はないが、積層膜の柔
軟性を保つ為には５μ以下が望ましい。沃化銅膜の生成
方法は特に限定するものではない。Further, there is no particular upper limit to the film thickness, but it is preferably 5 μm or less in order to maintain the flexibility of the laminated film. The method for producing the copper iodide film is not particularly limited.
米国特許ＵＳＰ−３，２４５，８３３に記述される如き
ＣｕＩをＣｏｍｐｌｅｘ化し溶剤に溶解しこれをコーテ
ィングする方法でも、真空蒸着法でもスパタリング法で
も良い。A method of complexing CuI, dissolving it in a solvent, and coating it as described in US Pat. No. 3,245,833, a vacuum evaporation method, or a sputtering method may be used.
、次に沃化鋼膜上に積層される金属酸化物層（膜）の積
層は、特に限定するものではない。例えば、Ｔ ｉＯ２
ｈＩｎｚＯ３＋ ＩＴＯ（Ｉｎ２０３と５ｎ０２混合物
） 、 ５ｉ０２ 。The lamination of the metal oxide layer (film) that is then laminated on the iodized steel film is not particularly limited. For example, T iO2
hInzO3+ ITO (In203 and 5n02 mixture), 5i02.
ＺｎＯ、ＷＯ３、ＬｉＮｂＯ３１ＡＡ！２０３ 、 Ｔ
ａ２０５ 、 ＰｂＯ＊ＰｂＯ２、ＺｒＯ２などその他
、有機高分子物体が耐え得る温度で膜を生成せしめ得る
金属酸化物であれば差支えない。（共立出版刊；薄膜化
技術。ZnO, WO3, LiNbO31AA! 203, T
Other metal oxides such as a205, PbO*PbO2, ZrO2, etc., which can form a film at a temperature that the organic polymer substance can withstand, may be used. (Published by Kyoritsu Shuppan; Thin film technology.
Ｐ、１４２．Ｐ、１８８参照）膜の厚さも限定するもの
ではなく、この厚さは、金属酸化物膜の機能を発揮し得
る最適厚さで決定される。P, 142. (See P., 188) The thickness of the film is not limited either, and this thickness is determined to be the optimum thickness that can exhibit the function of the metal oxide film.
次にこの金属酸化物膜の生成方法は、先述の如く、酸化
度を制御する目的からスパタリング或いはイオンプレー
ティングが望ましい、
更に、好ましくは、反応性スパタリング或いは、反応性
イオンプレーティングに依るのが望ましい。Next, as the method for producing this metal oxide film, as mentioned above, sputtering or ion plating is preferable for the purpose of controlling the degree of oxidation.Moreover, it is preferable to use reactive sputtering or reactive ion plating. desirable.
反応性スパタリングとは、酸素、窒素、硫化水素等の反
応性のガスを含むプラズマに依りスＡタリングを行う事
で、本発明の場合は、酸素を含むプラズマに依るスパタ
リングを用いる事になる。酸素を含むプラズマの使用に
依り、その酸素濃度を制御する事に依シ生成する金属酸
化物膜の酸化度を制御する事が出来る。これらの例とし
て東京大学出版会列；スノソタリング現象Ｐ、１２０〜
をあげることができる。イオンプレーティングに於ても
、同様に酸素を含むプラズマの使用忙依夛同様な効果が
得られる。成膜の条件は、酸化物の種類に依シ異るが、
これらの例としては、共立出版刊、薄膜化技術、又は、
技能材料１９８４年９月号、更に、５ｏｌａｒ Ｅｎｅ
ｒｇｙ Ｍａｔｅｒｉａｌｓ ６（１９８１）１〜４
１等の記載をあげることができる。Reactive sputtering refers to sputtering using plasma containing reactive gas such as oxygen, nitrogen, hydrogen sulfide, etc. In the case of the present invention, sputtering using plasma containing oxygen is used. By using plasma containing oxygen, it is possible to control the degree of oxidation of the produced metal oxide film by controlling the oxygen concentration. Examples of these include the University of Tokyo Press; Snowsotaring Phenomenon P, 120~
can be given. In ion plating, similar effects can be obtained by using oxygen-containing plasma. The conditions for film formation vary depending on the type of oxide, but
Examples of these are published by Kyoritsu Shuppan, thin film technology, or
Technical materials September 1984 issue, and 5olar Ene
rgy Materials 6 (1981) 1-4
I can list the first prize.
本発明の積層膜を利用する際に、この積層膜の上に更に
１層以上の膜を積層する事は当然考えられる。例えば透
明導電フィルムに応用する際は、ＩＴＯの膜の上に保護
膜として極薄のＳｉＯ膜を塗工したシ、又、熱線反射膜
に応用する際はＴｉＯ２の膜の上に順次金属膜とＴｉＯ
２膜を重ねる事になる。When using the laminated film of the present invention, it is naturally conceivable to further laminate one or more layers on this laminated film. For example, when applied to a transparent conductive film, an extremely thin SiO film is coated as a protective film on an ITO film, and when applied to a heat ray reflective film, a metal film is sequentially coated on a TiO2 film. TiO
Two films will be stacked on top of each other.
（発明の効果）
本発明の重点の一つは、沃化第一銅の耐酸素プラズマ性
が優れている事の発見に：ある。又本発明の重点の他の
一つは沃化第一銅がその生成方法の如何によらず、有機
側分子物体との接着性が優れている事の発見にある。こ
の接着性は、ＯＨ基、・Ｃ０ＯＨ基、 ＣＯ基、 ＣＮ
基 等を側鎖に持つ高分子に於て特に著しい。従ってこ
れ等の基を持たぬ高分子に利用する際は、その高分子の
表面を予め化学処理を行いこれらの活性基を枝つぎして
おくことは、本発明の効果をよシ艮〈利用し得るのく役
立つ。更に本発明の特徴の一つは、沃化鋼が電気導電体
（半導体）である事にある。この事は、本発明をＩＴＯ
、５ｎ０２ 、 Ｃｄ０等透明導電膜に利用する際に、
ＩＴＯ等の持つ導電性を補助し、より高い導電膜が得ら
れる。(Effects of the Invention) One of the main points of the present invention is the discovery that cuprous iodide has excellent oxygen plasma resistance. Another important point of the present invention is the discovery that cuprous iodide has excellent adhesion to organic molecular objects, regardless of its production method. This adhesive property is based on OH group, ・C0OH group, CO group, CN
This is particularly noticeable in polymers that have groups such as , in their side chains. Therefore, when using a polymer that does not have these groups, chemically treating the surface of the polymer in advance to attach these active groups will enhance the effects of the present invention. As helpful as possible. Furthermore, one of the features of the present invention is that iodized steel is an electrical conductor (semiconductor). This makes the present invention
, 5n02, Cd0, etc. when used in transparent conductive films,
It assists the conductivity of ITO and the like, allowing a higher conductivity film to be obtained.
かくして、本発明の効果は、極めて容易に、有機高分子
物体上に、形成された構造が緻密で、密着性の優れた金
属酸化物膜好ましくは酸化度の敗＃禮制御された金属酸
化物膜を提供し得る事である。Thus, the effect of the present invention is that it is extremely easy to form a metal oxide film with a dense structure and excellent adhesion on an organic polymer object, preferably a metal oxide film with a controlled oxidation degree. It is possible to provide a membrane.
本発明に依り、有機高分子の軽量性、形態の自由さ、等
の有利性と金属酸化物の高機能性を結合した各種機能材
料の作成が容易になる。The present invention makes it easy to create various functional materials that combine the advantages of organic polymers, such as light weight and freedom of form, with the high functionality of metal oxides.
（実施例）
本実施例の沃化鋼は、総べて、渋川理化学■製の比変９
９チ以上の粉末であ）、その製膜法は、真空度１０−’
ｔｏｒｒ に於ける真空蒸着である。(Example) All iodized steels in this example were made of Nihen 9 manufactured by Shibukawa Rikagaku ■.
powder of 9 cm or more), and the film forming method is a vacuum degree of 10-'
Vacuum deposition at torr.
又、酸化物膜の製膜法は、酸素３０憾ｖｏｌを含むアル
ゴンプラズマを便用する２ Ｘ ＩＱ−３ｔｏｒｒ Ｋ
於けるスパタリングである。The method for forming the oxide film is 2X IQ-3torr K, which conveniently uses argon plasma containing 30 vol of oxygen.
sputtering.
又、評価法として、膜の密着性は、セロテープを５に２
／−の圧力で抑圧後剥離し膜の外観の変化及び膜の剥離
の有無を観察する。又、膜の緻密さは外観から明らかに
判断される。すなわち緻密な膜は、透明な膜になるのに
対し、粗な膜は白濁する。In addition, as an evaluation method, the adhesion of the film was determined by comparing cellophane tape to 5 to 2.
After being compressed with a pressure of /-, the film was peeled off, and changes in the appearance of the film and the presence or absence of peeling of the film were observed. Moreover, the denseness of the film can be clearly judged from its appearance. That is, a dense film becomes a transparent film, whereas a rough film becomes cloudy.
以下余白
１、 ポリエステルフィルム ９００１００
μｍｔ
２、 ＰＭＭＡキャストシート ９００
３００μｍｔ
３、 ポリエステルフィルム ３５０１００
μｍｔ
（ＡＮ含量２ｓ％）
５、 ポリカーゼネートフィルム ９００２
０μｍｔ
６、 ポリサルホンシート ９００３００
／ｊｍｔ
７、 ポリエーテルスルホン ９００フイル
ム ５０μｍｔ ’
８、 ボリピロメリットイミ）’ ９００
フイルム ８０μｍｔ
金属酸化物膜 評 価物質 厚さく
λ） セロテープ剥離テスト外観ＴｉＯ２２６０不変
透明
ＴｉＯ２２６０不変 透明
ＴｉＯ２２６０不変 はぼ透明
ＴｉＯ２２６０不変 透明
ＴｉＯ２１２０不変 透明
Ｔｉ０．２６０ 不変 透明ＴｉＯ２２６０
不変 透明
ＴｉＯ寞２６０ 不変 透明比較例１〜８
実施例１〜８に対応して、沃化銅膜を存在→めない各フ
ィルムシートに同じ厚さのＴｉ０２Ｌ’生成せしめた新
船て膜は白濁し、且つセロチーで剥離テストの結果表層
部が剥離し変色した。Margin 1 below, Polyester film 900100
μmt 2, PMMA cast sheet 900
300μmt 3, polyester film 350100
μmt (AN content 2s%) 5. Polycarbonate film 9002
0μmt 6, polysulfone sheet 900300
/jmt 7, Polyether sulfone 900 film 50μmt' 8, Polypyromellitimi)' 900
Film 80 μmt Metal oxide film Evaluation substance Thickness λ) Sellotape peel test appearance TiO2260 unchanged Transparent TiO2260 unchanged Transparent TiO2260 unchanged Transparent TiO2260 unchanged Transparent TiO2120 unchanged Transparent Ti0.260 unchanged Transparent TiO2260
Unchanged Transparent TiO layer 260 Unchanged Transparent Comparative Examples 1 to 8 Corresponding to Examples 1 to 8, the same thickness of Ti02L' was formed on each film sheet with no copper iodide film.The new film was cloudy. However, as a result of a peel test using cellophane, the surface layer peeled off and discolored.
比較例９
ポリエステルシート（厚さ１ＯＯＰＬ）の上り（１５０
０人の塩化第一銅を蒸着した後、その上り・化チタン膜
を含酸素プラズマを用いるスフクツ５ングによ、９２６
０人の厚さまで生成せしめる）白濁した膜となる。Comparative Example 9 Polyester sheet (thickness 1OOPL) up (150
After vapor-depositing cuprous chloride, the resulting titanium chloride film was processed using oxygen-containing plasma, 926
A cloudy film is formed (up to a thickness of 0.0 cm).
以下余二
共重合体成型品
１０． ポリアクリロニトリル Ｓ
ＯＯモノフィラメント ０．５九〇
１１、 メチルメタクリレートグラフト ９０
０ＰＰ シート
（３０μｍ厚さくｔ））
１２、 エポキシ樹脂シート ９００（０
，５％（ｔ））
１３、 尿素樹脂シート ５００（０，５九（ｔ
））
１４、 ナイロン６６スクリーン ５００８０
メツシユ
１５、 サランスクリーン ５００８０
メツシユThe following Yoji copolymer molded products 10. Polyacrylonitrile S
OO monofilament 0.59011, methyl methacrylate graft 90
0PP sheet (30μm thickness)) 12, Epoxy resin sheet 900 (0
,5%(t)) 13. Urea resin sheet 500(0.59(t)
)) 14. Nylon 66 screen 50080
Metsuyu 15, Saran Screen 50080
Metsushiyu
Claims (2)
からなり、さらにその上に積層する第二層が金属酸化物
からなる積層膜(1) A laminated film in which the first layer in direct contact with the organic polymer object is made of cuprous iodide, and the second layer laminated on top of it is made of metal oxide.
める第一工程と、その上に、含酸素プラズマを用いたス
パタリング或はイオンプレーティングに依り金属酸化物
層を積層せしめる第二工程からなる積層膜の製造方法(2) A first step of forming a layer of cuprous iodide on the organic polymer object, and depositing a metal oxide layer thereon by sputtering or ion plating using oxygen-containing plasma. Method for producing a laminated film consisting of the second step
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16810386A JPS6325033A (en) | 1986-07-18 | 1986-07-18 | Laminated film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16810386A JPS6325033A (en) | 1986-07-18 | 1986-07-18 | Laminated film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6325033A true JPS6325033A (en) | 1988-02-02 |
Family
ID=15861895
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16810386A Pending JPS6325033A (en) | 1986-07-18 | 1986-07-18 | Laminated film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6325033A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0438148A (en) * | 1990-05-31 | 1992-02-07 | Mitsuba Electric Mfg Co Ltd | Generator for vehicle |
| JP2011254578A (en) * | 2010-05-31 | 2011-12-15 | Aisin Seiki Co Ltd | Rotor for rotary electric machine |
| CN110760881A (en) * | 2019-11-29 | 2020-02-07 | 南开大学 | Organic photocathode taking copper nanosheet as supporting framework and preparation method thereof |
-
1986
- 1986-07-18 JP JP16810386A patent/JPS6325033A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0438148A (en) * | 1990-05-31 | 1992-02-07 | Mitsuba Electric Mfg Co Ltd | Generator for vehicle |
| JP2011254578A (en) * | 2010-05-31 | 2011-12-15 | Aisin Seiki Co Ltd | Rotor for rotary electric machine |
| CN110760881A (en) * | 2019-11-29 | 2020-02-07 | 南开大学 | Organic photocathode taking copper nanosheet as supporting framework and preparation method thereof |
| CN110760881B (en) * | 2019-11-29 | 2021-03-26 | 南开大学 | Organic photocathode taking copper nanosheet as supporting framework and preparation method thereof |
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