JPS63236228A - Vacuum interruptor - Google Patents
Vacuum interruptorInfo
- Publication number
- JPS63236228A JPS63236228A JP6917487A JP6917487A JPS63236228A JP S63236228 A JPS63236228 A JP S63236228A JP 6917487 A JP6917487 A JP 6917487A JP 6917487 A JP6917487 A JP 6917487A JP S63236228 A JPS63236228 A JP S63236228A
- Authority
- JP
- Japan
- Prior art keywords
- thin plate
- electrode
- arc
- back surface
- contact part
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000009792 diffusion process Methods 0.000 claims description 28
- 239000000463 material Substances 0.000 claims description 17
- 239000002184 metal Substances 0.000 claims description 12
- 229910052751 metal Inorganic materials 0.000 claims description 12
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 claims description 8
- 239000002131 composite material Substances 0.000 claims description 7
- 239000010949 copper Substances 0.000 claims description 7
- 239000011651 chromium Substances 0.000 claims description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 3
- 238000013459 approach Methods 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 239000011733 molybdenum Substances 0.000 claims description 3
- 239000003990 capacitor Substances 0.000 description 12
- 238000005219 brazing Methods 0.000 description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 5
- 125000006850 spacer group Chemical group 0.000 description 5
- 229910001220 stainless steel Inorganic materials 0.000 description 4
- 239000010935 stainless steel Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 230000003014 reinforcing effect Effects 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- -1 Cu30-70ifi% Substances 0.000 description 1
- 206010016717 Fistula Diseases 0.000 description 1
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- 229910017709 Ni Co Inorganic materials 0.000 description 1
- 229910003267 Ni-Co Inorganic materials 0.000 description 1
- 229910003262 Ni‐Co Inorganic materials 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 229910000963 austenitic stainless steel Inorganic materials 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(I) oxide Inorganic materials [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 description 1
- KRFJLUBVMFXRPN-UHFFFAOYSA-N cuprous oxide Chemical compound [O-2].[Cu+].[Cu+] KRFJLUBVMFXRPN-UHFFFAOYSA-N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 230000003890 fistula Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910001026 inconel Inorganic materials 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
Landscapes
- High-Tension Arc-Extinguishing Switches Without Spraying Means (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
人、 産業上の利用分計
本発明は、真空インタラプタに係り、特にアークに対し
て平行な軸方向磁界を印加する手段を備えた真空インタ
ラプタに適用して有用なものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a vacuum interrupter, and is particularly useful when applied to a vacuum interrupter equipped with means for applying an axial magnetic field parallel to an arc. It is.
B、 発明の概要
本発明は、接触部とアーク拡散部とからなる笠形円板状
の電極を設け、アークに対して軸方向磁界を印加する手
段を備えた真空インタラプタにお、いて、
前記各電極の対向面を高導電率の複合金属からなる薄板
で形成するとともに、電極の対向面以外の部分を低導電
率の材料で形成し、更に薄板における接触部表面の直径
より接触部裏面の直径を大きくしかつ薄板におけるアー
ク拡散部の表面と裏面とを平行にしてアーク拡散部にお
ける薄板の板厚を接触部における薄板の板厚よ’JR<
、しかも均一に形成するとともに、接触部裏面とアーク
拡散部裏面との境界部分を曲面の面取り部とすることに
より、
再点弧の確率が極めて低く、高電圧、大電流のしゃ断能
力及び@械的耐久性に優れる電極を提供して真空インク
ラブタの多頻度開閉を行うことができるようにしたもの
である。B. Summary of the Invention The present invention provides a vacuum interrupter provided with a cap-shaped disk-shaped electrode consisting of a contact part and an arc diffusion part, and provided with means for applying an axial magnetic field to the arc, The facing surface of the electrode is formed of a thin plate made of a composite metal with high conductivity, and the parts other than the facing surface of the electrode are formed of a material with low conductivity. is made larger and the front and back surfaces of the arc diffusion part of the thin plate are made parallel, and the thickness of the thin plate in the arc diffusion part is equal to the thickness of the thin plate in the contact part.
Moreover, by forming it uniformly and by making the boundary between the back surface of the contact part and the back surface of the arc diffusion part a curved chamfer, the probability of restriking is extremely low, and the ability to interrupt high voltages and large currents is improved. The vacuum incluctor can be opened and closed frequently by providing an electrode with excellent mechanical durability.
C従来の技術
真空インタラプタの一種としてアークにこれと平行な軸
方向磁界を印加することにより、アークを電極面上に分
散せしめ°Cその局部的な集中を防止し、もって電極の
過度の溶融を防ぐことによりしゃ断性能の向上を図った
、いわゆる縦磁界印加方式の真空インタラプタが知られ
ている。C Conventional technology As a type of vacuum interrupter, by applying an axial magnetic field parallel to the arc, the arc is dispersed over the electrode surface, thereby preventing its local concentration and thereby preventing excessive melting of the electrode. A so-called vertical magnetic field application type vacuum interrupter is known, which aims to improve interrupting performance by preventing
従来技術にかかるこの種の真空インタラプタは、第4図
に示すように、真空容V!jl内にその軸線上に位置せ
しめて1対のリード棒2゜2を相対的に接近離反自在に
導入し、各IJ −ド棒2の内端部に笠形円板状の対を
なす電極3.3を絶縁スペーサを介在せしめて固着し、
各リード棒2と電極3とを、縦磁界を発生する磁界発生
部材であるコイル4,4により接続して概略構成されて
いる。This type of vacuum interrupter according to the prior art has a vacuum capacity V!, as shown in FIG. A pair of lead rods 2゜2 are positioned on the axis of the IJl and introduced so as to be able to move toward and away from each other, and a pair of electrodes 3 in the shape of a cap-shaped disk are installed at the inner end of each IJ lead rod 2. .3 is fixed with an insulating spacer interposed,
It is roughly constructed by connecting each lead rod 2 and electrode 3 with coils 4, 4, which are magnetic field generating members that generate a vertical magnetic field.
更に評言すると、真空容器1は、ガラスまたはセラミッ
クスからなる円筒状の2本の絶縁筒5,5を両端に固着
したFe−Ni−Co合金、またはFe−Ni合金等か
らなる薄肉円環状の封着金具6,6・・・の一方を介し
接合して1本の絶縁筒とするとともに、その両開口端を
他方の封着金具6,6を介し円板状の金属端板7,7に
より閉塞し、かつ内部を高真空(たとえば6.665m
pa以下の圧力)に排気して形成されている。そして、
真空容器1内には、前記各リード棒2がそれぞれの金属
端板7の中央から真空容器1の気密性を保持して相対的
に接近離反自在に導入されている。To further comment, the vacuum container 1 is a thin annular seal made of Fe-Ni-Co alloy, Fe-Ni alloy, etc., with two cylindrical insulating tubes 5, 5 made of glass or ceramics fixed to both ends. It is joined through one of the fittings 6, 6... to form a single insulating cylinder, and its both open ends are connected to disk-shaped metal end plates 7, 7 through the other sealing fittings 6, 6. closed and the inside is placed under high vacuum (e.g. 6.665 m
It is formed by evacuating to a pressure of less than Pa). and,
Each of the lead rods 2 is introduced into the vacuum container 1 from the center of each metal end plate 7 so as to be able to approach and separate from the vacuum container 1 while maintaining airtightness.
一方(第4図において上方)のリード棒2は、一方の金
属端板7に気密に挿着されているものであり、他方のリ
ード棒2は、金属ベローズ8を介し真空容器1の気密性
を保持して他方の金属端板7を軸方向へ移動自在に押通
されているものである。また、第4図において9および
10は軸シールドおよびベローズシールド、11は主シ
ールド、12は補助シールドである。One (upper in FIG. 4) lead rod 2 is hermetically inserted into one metal end plate 7, and the other lead rod 2 is connected to the vacuum vessel 1 through a metal bellows 8. is held and pushed through the other metal end plate 7 so as to be freely movable in the axial direction. Further, in FIG. 4, 9 and 10 are a shaft shield and a bellows shield, 11 is a main shield, and 12 is an auxiliary shield.
前記各リード棒2の内端部には、第5図および第6図に
示すように、Cuの如く高導電率の材料からなるととも
に、リード棒2の直径より適宜大径の円板状の取付ベー
ス4aと、取付ベース4aの外周の相対する位置から半
径方向(第5図において左右方向)外方へ延在する2本
のアーム4bと、各アーム4bの端部から取付ベース4
aを中心とし同一方向へ円弧状に彎曲した円弧部4cと
からなる棒分流タイプのコイル4が、取付ベース4aの
一方(第5図において下方)の面に形成した凹部13を
介しろう付により固着されている。At the inner end of each lead rod 2, as shown in FIGS. 5 and 6, there is a disk-shaped disc made of a material with high conductivity such as Cu and having a diameter suitably larger than the diameter of the lead rod 2. A mounting base 4a, two arms 4b extending outward in the radial direction (in the left-right direction in FIG. 5) from opposing positions on the outer periphery of the mounting base 4a, and two arms 4b extending outward from the ends of each arm 4b to the mounting base 4.
A rod-shunting type coil 4 consisting of an arcuate portion 4c curved in an arc shape in the same direction with a as its center is brazed through a recess 13 formed on one (lower side in Fig. 5) surface of the mounting base 4a. It is fixed.
そして、コイル4は、リード棒2の内端外周にろう付に
より嵌着したリング状の取付部14aと、取付部14a
の外周から半径方向外方へ放射状に延伸し?:複数の支
持腕14bと、各支持腕14bの端部を連結するリング
状の支持部14cとからなるコイル補強体14とろう付
されて補強されている。The coil 4 has a ring-shaped attachment part 14a fitted to the outer periphery of the inner end of the lead rod 2 by brazing, and an attachment part 14a.
Extending radially outward from the outer periphery of ? : It is reinforced by being brazed to the coil reinforcing body 14, which is made up of a plurality of support arms 14b and a ring-shaped support part 14c that connects the ends of each support arm 14b.
なお、コイル補強体14は、ステンレス鋼の如く機械的
強度穴にしてかつ低導電率の材料からなるものである。The coil reinforcing body 14 is made of a material having mechanical strength holes and low electrical conductivity, such as stainless steel.
前記コイル4の取付ベース4aの他方の面には、円形の
凹部15が設けられており、この凹部15には、ステン
レス鋼またはインコネルの如く機械的強度穴にしてかつ
低導電率の材料により短円筒状に形成した絶縁スペーサ
16が、その一端に形成した小径7ランジ16aを介し
ろう付により固着されている。A circular recess 15 is provided on the other side of the mounting base 4a of the coil 4, and the recess 15 is made of a mechanically strong hole and a low conductivity material such as stainless steel or Inconel. An insulating spacer 16 formed in a cylindrical shape is fixed by brazing via a small diameter 7 flange 16a formed at one end thereof.
そして、絶縁スペーサ16の他端に形成した大径フラン
ジ16bには、この大径フランジ16bより適宜大径に
してかつ絶縁スペーサ16の内径とほぼ同径の透孔を有
する円輪板状の取付ベース17aと、取付ベース17a
の外周の相対する位置から半径方向外方へ延在した2本
のアーム17bと、各アーム17bの端部からコイル4
の円弧部4Cとほぼ等しい曲率半径にしてかつこれとは
逆の同一方向へ適宜の長さで円弧状に彎曲した円弧部1
7cとからなり、銅の如く高導電率の材料により形成さ
れた補助コイル17が、取付ベース17aの一方(第5
図において下方)の面に設けた係合段部18を介しろう
付により固着されている。そして、補助コイル17とコ
イル4とは、補助コイル17の各円弧部17cの端部に
設けた凹部19に一端を固着し、かつ他端をコイル4の
各円弧部4Cの端部に設けた透孔21に挿着した軸方向
の通電ピンzOを介し電気的に接続されている。The large-diameter flange 16b formed at the other end of the insulating spacer 16 is fitted with a circular plate-shaped mounting having a diameter appropriately larger than that of the large-diameter flange 16b and having a through hole approximately the same diameter as the inner diameter of the insulating spacer 16. Base 17a and mounting base 17a
two arms 17b extending radially outward from opposing positions on the outer periphery of the coil 4;
A circular arc portion 1 having a radius of curvature approximately equal to that of the circular arc portion 4C and curved in an arc shape with an appropriate length in the same direction opposite to the circular arc portion 4C.
7c, and is made of a highly conductive material such as copper.
It is fixed by brazing via an engagement step 18 provided on the surface (lower in the figure). The auxiliary coil 17 and the coil 4 have one end fixed to a recess 19 provided at the end of each arcuate portion 17c of the auxiliary coil 17, and the other end provided at the end of each arcuate portion 4C of the coil 4. They are electrically connected via an axial current-carrying pin zO inserted into the through hole 21.
前記補助コイル17には、コイル4の直径とほぼ同径に
形成した前記量tIi 3が、背面中央に設けた凹部2
2を介しろう付により取付ベース17aと接合されると
ともに、背面を介しろう付により各アーム17bおよび
円弧部17cと接合されている。電極3は、対向面(第
5図において上面)中央に円形の凹部23を設けかつ周
辺に近づくにつれて漸次薄肉となる笠形円板状に形成さ
れたアーク拡散部3aと、対向面に平坦な円形の接触面
を有するとともに周辺に近づくにつれて漸次薄肉となる
笠形円板状に形成されかつアーク拡散部3aの凹部23
にろう付により固着された接触部3bとからなり、全体
として笠形円板状に設けられている。In the auxiliary coil 17, the amount tIi 3 formed to have approximately the same diameter as the coil 4 is connected to the recess 2 provided at the center of the back surface.
2 to the mounting base 17a by brazing, and also to each arm 17b and the arc portion 17c by brazing through the back surface. The electrode 3 has a circular recess 23 in the center of the opposing surface (upper surface in FIG. 5) and an arc diffusion section 3a formed in the shape of a hat-shaped disk that gradually becomes thinner as it approaches the periphery, and a flat circular recess 23 on the opposing surface. The concave portion 23 of the arc diffusion portion 3a is formed in the shape of a cap-shaped disk and has a contact surface of
The contact portion 3b is fixed to the contact portion 3b by brazing, and the entire contact portion 3b is provided in the shape of a cap-shaped disk.
前記Wk極3のアーク拡散部3aは、オーステナイト系
ステンレス鋼(例えばSuS 304゜316L等)3
0〜70重量%およびCu30〜701!量%からなろ
複合金属、また3よCu2O〜70重量%、クロムCr
5〜40重量%および鉄Fs5〜40重量%からなる複
合金属により形成されている。また、接触部3bは、C
u 20〜70 fflft%、Cr5〜?O3i址%
およびモリブデンMo 5〜70重量%からなろ廖合金
属により形成されている。The arc diffusion part 3a of the Wk pole 3 is made of austenitic stainless steel (for example, SuS 304°316L, etc.) 3
0-70% by weight and Cu30-701! Amount % to Naro composite metal, 3 to 70% by weight Cu2O, chromium Cr
It is made of a composite metal consisting of 5 to 40% by weight of iron Fs and 5 to 40% by weight of iron Fs. Further, the contact portion 3b is C
u 20~70 fflft%, Cr5~? O3i %
and molybdenum Mo in an amount of 5 to 70% by weight.
第7図は電極3の構造が異なる従来技術に係る電極3と
その近傍部分を抽出して示す縦断面図である。同図に示
すように、この電極3は、第5図に示すアーク拡散部3
aと接触部3bとを合わせた形状に全面均一材で形成し
である。この全面均一材は第5図に示す接触部3bと同
組成の材料で形成しである。FIG. 7 is a vertical cross-sectional view showing an extracted electrode 3 and its vicinity according to a conventional technique in which the structure of the electrode 3 is different. As shown in the figure, this electrode 3 is connected to the arc diffusion section 3 shown in FIG.
The entire surface is made of a uniform material in the shape of a combination of the contact portion 3b and the contact portion 3b. This uniform material over the entire surface is made of a material having the same composition as the contact portion 3b shown in FIG.
なお、第7図中、第5図と同一部分には同一番号を付し
て重複する説明は省略する。Note that in FIG. 7, the same parts as in FIG. 5 are given the same numbers and redundant explanations will be omitted.
D、 発明が解決しようとする問題点
上記従来の真空インクラブタは、優れたしゃ断性能を有
し、特に事故時大電流しゃ断に優れ、高耐電圧特性を示
す。D. Problems to be Solved by the Invention The above-mentioned conventional vacuum incrector has excellent interrupting performance, particularly excellent in interrupting large currents in the event of an accident, and exhibits high withstand voltage characteristics.
ところが、この真空インタラプタをコンデンサ開閉用と
して使用しなところ、再点弧の発生が見られた。However, when this vacuum interrupter was not used for opening and closing the capacitor, restriking occurred.
即ち、第5図に示す電極3の場合には、形状的にアーク
拡散部3aと接触部3bとの境界の段部にアークが集中
し易くなり、コンデンサ回路の開閉時に電極3の表面が
荒れて耐電圧特性が低下するという問題がある。That is, in the case of the electrode 3 shown in FIG. 5, the arc tends to concentrate on the stepped part of the boundary between the arc diffusion part 3a and the contact part 3b due to its shape, and the surface of the electrode 3 becomes rough when the capacitor circuit is opened and closed. Therefore, there is a problem that the withstand voltage characteristics deteriorate.
一方、第7図に示す電11i3の場合には、形状的に段
部が存在しないことから前述の第5図のri極の場合の
ような問題は生じ難い。しかし、電極3の材料であろC
u −Cr −M oの導電率が高いので、うず電流の
影響でコイル4により発生する磁束が打ち消され磁束密
度が低下してしゃ断性能が低下するという問題がある。On the other hand, in the case of the electrode 11i3 shown in FIG. 7, since there is no stepped portion in shape, the problem as in the case of the above-mentioned ri pole shown in FIG. 5 is unlikely to occur. However, if the material of electrode 3 is C
Since the conductivity of u-Cr-Mo is high, there is a problem that the magnetic flux generated by the coil 4 is canceled due to the influence of eddy current, the magnetic flux density decreases, and the interrupting performance deteriorates.
因にコンデンサ開閉の場合は、通常の負荷開閉と異なり
、開極時に系統電圧の2倍の電圧が極間にかかり、また
投入時には系統電流の5倍程度の瞬時大電流(ラッシュ
カレント)が流れる。コンデンサ開閉において、電圧、
電流の各値は系統事故時の回路しゃ断の場合に比較して
小さい(負荷開閉よりは大きい)が、−ガロ以上確実に
開閉しなければ、コンデンサ回路を破壊させてしまう虞
れがある。Incidentally, when switching a capacitor, unlike normal load switching, a voltage twice the grid voltage is applied between the poles when the capacitor is opened, and an instantaneous large current (rush current) about five times the grid current flows when the capacitor is turned on. . When switching a capacitor, the voltage,
Each value of the current is small compared to the circuit cutoff at the time of a system fault (larger than the load switching), but if the capacitor circuit is not switched reliably by more than -Gallo, there is a risk that the capacitor circuit will be destroyed.
E 問題点を解決するための手段
上記従来の問題点を解決するための本発明の構成は、縦
硼界形の真空インクラブタにおいて、笠形円板状のff
i極の対向面を銅、クロムおよびモリブデンからなる全
面均一材の薄板で、また、この薄板の裏面を高抵抗部材
で形成するとともに、薄板の平面部である接触部の裏面
と、薄板の接触部の周辺部分であるアーク拡散部の裏面
との境界部分を曲面の面取り部とした電極を有すること
を特徴とする。E Means for Solving the Problems The structure of the present invention for solving the above-mentioned conventional problems is that in a vertical boron vacuum incluctor, a cap-shaped disk-shaped ff
The facing surface of the i-pole is made of a thin plate made of copper, chromium, and molybdenum that is uniform over the entire surface, and the back surface of this thin plate is made of a high-resistance material. The electrode is characterized by having a curved chamfered portion at the boundary with the back surface of the arc diffusion portion, which is the peripheral portion of the arc diffusion portion.
F 作 用
上記構成の本発明によれば電極の対向面である薄板は背
面部で機械的に補強される。特に、薄板の平面部である
接触部の裏面と、薄板の接触部の周辺部分であるアーク
拡散部の裏面との境界部分を曲面としたので、この部分
に作用する真空インタラプタの投入時の機械的応力が分
散される。また、薄板は高導電率材料の均−材で形成し
たので、真空インタラプタの開閉時に発生するアークは
薄板の表面部で良好に分散される。更に、高導電率材料
で形成された部分は薄板であり、背面部は高抵抗部材で
形成したので、電極部におけるうず電流は小さなものと
なる。F Effect According to the present invention having the above configuration, the thin plate that is the opposing surface of the electrode is mechanically reinforced at the back surface. In particular, since the boundary between the back surface of the contact part, which is a flat part of the thin plate, and the back face of the arc diffusion part, which is the peripheral part of the thin plate contact part, is made into a curved surface, the machine when the vacuum interrupter is turned on acts on this part. target stress is dispersed. Further, since the thin plate is made of a uniform material of high conductivity, the arc generated when the vacuum interrupter is opened and closed is well dispersed on the surface of the thin plate. Further, since the portion made of a high conductivity material is a thin plate and the back portion is made of a high resistance material, the eddy current in the electrode portion is small.
G、実施例
以下、本発明を第1図に示す一実施例に基づき詳細に説
明する。なお、第1図において従来と同一部分について
は第5図及び第7図と同一符号をもって示し重複する説
明を省略する。G. Example Hereinafter, the present invention will be explained in detail based on an example shown in FIG. In FIG. 1, parts that are the same as those in the prior art are designated by the same reference numerals as in FIGS. 5 and 7, and redundant explanation will be omitted.
第1図は本発明の一実施例における電極を示すもので、
補助コイル17には、コイル4の直径とほぼ同径(外径
80m)に形成した笠形円板状の電場30が、その背面
中央に設けた凹部31を介しろう付けにより取付ベース
17aと接合されるとともに、背面を介しろう付けによ
り各アーム17bおよび円弧部17cと接合されている
。FIG. 1 shows an electrode in an embodiment of the present invention.
In the auxiliary coil 17, an electric field 30 in the shape of a cap-shaped disk formed with approximately the same diameter as the diameter of the coil 4 (outer diameter 80 m) is joined to the mounting base 17a by brazing through a recess 31 provided at the center of the back surface. At the same time, it is joined to each arm 17b and arc portion 17c by brazing through the back surface.
電極30の対向面は、Cu 49重量%、M。The opposing surface of the electrode 30 is made of Cu 49% by weight, M.
38!!量%およびCr 13重量%で導電率(IAC
3%)が50〜60%の複合金属からなる笠形円板状の
全面均一材の薄板32で形成されている。すなわち、薄
板32の中央部には、外径30mの円板状にして対向電
極と接離自在の接触部33が設けられており、接触部3
3より大径の部分は、接触部33表面とのなす角度が約
5度に設けられた傾斜面のアーク拡散部34となってい
る。38! ! electrical conductivity (IAC
3%) and 50 to 60% composite metal, the thin plate 32 is made of a hat-shaped disk-shaped material that is uniform over the entire surface. That is, a contact part 33 is provided in the center of the thin plate 32 in the shape of a disc with an outer diameter of 30 m and can freely come into contact with and separate from the counter electrode.
The portion having a diameter larger than 3 is an arc diffusion portion 34 having an inclined surface formed at an angle of about 5 degrees with the surface of the contact portion 33.
また、薄板32における接触部33表面の直径D1より
接触部33裏面の直径D2の方が大きく形成され、かつ
薄板32におけるアーク拡散部34の表面と裏面とは平
行に形成されている。したがって、アーク拡散部34に
おける薄板32の板厚t2は、接触部33における薄板
32の板厚t1より薄クシてかつ均一に形成されている
。Further, the diameter D2 of the back surface of the contact portion 33 is larger than the diameter D1 of the front surface of the contact portion 33 in the thin plate 32, and the front and back surfaces of the arc diffusion portion 34 in the thin plate 32 are formed in parallel. Therefore, the thickness t2 of the thin plate 32 in the arc diffusion part 34 is thinner and uniform than the thickness t1 of the thin plate 32 in the contact part 33.
本実施例において、接触部33における薄板32の板厚
t、は約2.5m+a、アーク拡散部34における薄板
32の板厚t2は約2mにそれぞれ形成されている。In this embodiment, the thickness t of the thin plate 32 in the contact portion 33 is approximately 2.5 m+a, and the thickness t2 of the thin plate 32 in the arc diffusion portion 34 is approximately 2 m.
一般に薄板32における接触部33の板厚は、4〜2m
mが好ましく、4IIII11を越えるとうす電流の増
加が著しくなってしゃ断性能が低下してしまい、2II
!1未満であると多頻度開閉によるエロージョンに対応
できない。さらに、薄板32におけるアーク拡散部34
の板厚は、2IIlll以下が好ましく、2閣を越える
とうず電流が増加してしゃ断性能が低下してしまう。Generally, the thickness of the contact portion 33 of the thin plate 32 is 4 to 2 m.
m is preferable; if it exceeds 4III11, the increase in the thin current will be significant and the breaking performance will deteriorate;
! If it is less than 1, it will not be possible to cope with erosion due to frequent opening and closing. Further, the arc diffusion portion 34 in the thin plate 32
The plate thickness is preferably 2IIll or less; if it exceeds 2IIll, eddy current will increase and the breaking performance will deteriorate.
さらに、絶縁スペーサ16の大径フランジ16bの径D
3と、薄板32における接触部33表面の直径り、とは
、D、≦D3となるように形成されている。D1≦D3
としたのは、機械的補強のためで、接触部33に力を作
用させるのは大径フランジ16bだからである。Furthermore, the diameter D of the large diameter flange 16b of the insulating spacer 16
3 and the diameter of the surface of the contact portion 33 of the thin plate 32 are formed so that D, ≦D3. D1≦D3
This is for mechanical reinforcement, and it is the large diameter flange 16b that applies force to the contact portion 33.
一方、電極30の対向面以外(薄板32以外)の部分で
ある背面部35は、導電率(IAC3%)が7%の40
Cu−20Cr−40Feにより形成されている。薄板
32と背面部35とは、ろう骨接合ずろか、またはCu
を除いた成分で薄板32と背面部35とを形成するスケ
ルトンを作り、両者を重ね合せ、一括してCuを溶浸し
て製作する。即ち、背面部35は薄板32の裏面に貼り
合わされている。On the other hand, the back surface portion 35, which is a portion other than the facing surface of the electrode 30 (other than the thin plate 32), has a conductivity of 40% (IAC 3%) of 7%.
It is made of Cu-20Cr-40Fe. The thin plate 32 and the back part 35 are connected to the fistula or Cu.
A skeleton forming the thin plate 32 and the back surface part 35 is made from the components except for , the two are overlapped, and Cu is infiltrated all at once. That is, the back surface portion 35 is bonded to the back surface of the thin plate 32.
このとき背面部35は、40%を越える導電率を有して
いると、うず電流が発生して縦磁界による効果を減衰さ
せてしまい、大電流しゃ断ができなくなる。ここに、う
ず電流の防止と通電電流の容量とを考慮すると、導電率
は4〜10%が望ましく、アーク拡散部下での板厚は5
fl以下が良好な結果を示し、接触部下での板厚はでき
るだけ薄い方が良い。At this time, if the back surface portion 35 has a conductivity exceeding 40%, eddy currents will be generated and the effect of the vertical magnetic field will be attenuated, making it impossible to cut off the large current. Considering prevention of eddy current and current carrying capacity, the conductivity is preferably 4 to 10%, and the plate thickness below the arc diffusion is 5%.
A value of fl or less shows good results, and it is better that the thickness of the plate below the contact area be as thin as possible.
なお、導電率が40%以下の材料としては、例えばステ
ンレス鋼、Cu30〜70ifi%およびステンレス5
v430〜70重址%からなる複合金属またはCu 2
0〜70重址%、Cr5〜40重量%およびFe5〜4
0重量%からなろ複合金属等がある。Examples of materials with electrical conductivity of 40% or less include stainless steel, Cu30-70ifi%, and stainless steel 5.
Composite metal consisting of v430-70% or Cu2
0-70% by weight, 5-40% by weight of Cr and 5-4% by weight of Fe
There are composite metals starting from 0% by weight.
また、薄板32における接触部表面とアーク拡散部表面
とのなす角度が2〜10゛であると優れたしゃ断性能を
示し、特に上記角度が3〜5°であると最も良好である
。Further, when the angle between the surface of the contact portion and the surface of the arc diffusion portion in the thin plate 32 is between 2 and 10 degrees, excellent breaking performance is exhibited, and particularly when the angle is between 3 and 5 degrees, the best performance is achieved.
更に、薄板32の平面部である接触部33の裏面と、薄
板32の傾斜部であるアーク拡散部34の裏面との境界
部分は、第1図のA部を抽出拡大して第2図に示すよう
に、曲面の面取り部Rとなっている。換言すれば、背面
部35のうち接触部33と平行な部分である平面部36
と、同様に背面部35のうちアーク拡散部34と平行な
部分である傾斜部37との境界部分は前記面取り部Rと
同様の面取り部となっている。Furthermore, the boundary between the back surface of the contact part 33, which is a flat part of the thin plate 32, and the back surface of the arc diffusion part 34, which is an inclined part of the thin plate 32, is shown in FIG. 2 by extracting and enlarging part A in FIG. As shown, the chamfered portion R is a curved surface. In other words, the plane portion 36 that is a portion of the back surface portion 35 that is parallel to the contact portion 33
Similarly, the boundary portion of the back surface portion 35 with the inclined portion 37, which is a portion parallel to the arc diffusion portion 34, is a chamfered portion similar to the chamfered portion R described above.
上記構成の電極を第4図に示す真空インタラプタに適用
し、その真空インクラブタをコンデンサ開閉用として回
路に組込み、閃絡確率を調べた。その結果を次表に示す
。The electrode with the above configuration was applied to the vacuum interrupter shown in FIG. 4, and the vacuum interrupter was incorporated into a circuit for opening and closing a capacitor, and the flash fault probability was investigated. The results are shown in the table below.
試験方法は、66 kV −60MVA(7):I ン
y’ンサ容址の開閉条件と等価となるようにした。The test method was made to be equivalent to the opening/closing conditions of a 66 kV-60 MVA (7): I-in-sa container.
投入条件は、予めコンデンサに直流電圧54k V r
* m 6 S11を充電し、LC振動により370
0Aピーク、200サイクルの電流を流した。The input conditions are that a DC voltage of 54k Vr is applied to the capacitor in advance.
* Charge m6 S11 and use LC vibration to 370
A current of 0 A peak and 200 cycles was applied.
一方、しゃ断は、50サイクル電源電圧501(Vr、
rn6 so p電流520Aの進相電流とし、この
条件で投入しゃ断を多数回繰り返した。On the other hand, the 50-cycle power supply voltage 501 (Vr,
The rn6 so p current was set to a leading phase current of 520 A, and the switching on and off was repeated many times under this condition.
また、極間ギャップは15m、投入スピードはim/s
ee、Lt4p断スピードは2m/seaである。In addition, the gap between poles is 15m, and the input speed is im/s.
ee, Lt4p breaking speed is 2 m/sea.
また、大電流しゃ断簡力についても、次表中に併記した
。しゃ新条件は、定格電圧72kV (再起電圧123
kV) 、t/+断速度3.5rn/ sとした。In addition, the large current breaking strength is also listed in the table below. The new conditions are rated voltage 72kV (restart voltage 123kV)
kV), t/+ breaking velocity was 3.5 rn/s.
なお、比較のために、第5図に示す従来の電極をもった
真空インタラプタ (従来例1)および第7図に示す従
来の電極をもった真空インタラプタ(従来例2)につい
ても、上記実施例のものと同一の試験条件で閃絡確率お
よび大電流しゃ断簡力を調べ、その結果を次表中に示し
た。For comparison, the vacuum interrupter with conventional electrodes shown in FIG. 5 (Conventional Example 1) and the vacuum interrupter with conventional electrodes (Conventional Example 2) shown in FIG. The flash fault probability and large current breaking power were investigated under the same test conditions as those of the previous model, and the results are shown in the table below.
表
上記表から判るように、実施例によるものは、従来例1
のものに比較して著しく閃絡確率が低(な外、再点弧の
発生がほとんどなくなった。すなわち、実施例の真空イ
ンクラブタは、コンデンサ開閉用として最適である。As can be seen from the table above, the example according to the example is the conventional example 1.
In addition, the flashover probability is significantly lower than that of the conventional vacuum incluctor, and the occurrence of restrike is almost eliminated.In other words, the vacuum incluctor of this embodiment is most suitable for opening and closing capacitors.
また、実施例の真空インタラプタは、従来例1の電極構
造による真空インクラブタと同様のしゃ断性能を示した
。Further, the vacuum interrupter of the example exhibited the same interrupting performance as the vacuum interrupter of the conventional example 1 having the electrode structure.
更に、前記電極30を有する真空インタラプタを用いて
10,000回の開閉耐久試験を行なったところ、電極
30には機械的な損傷は全く認められなかった。Furthermore, when a vacuum interrupter having the electrode 30 was subjected to an opening/closing durability test of 10,000 times, no mechanical damage was observed in the electrode 30.
このときの投入速度は1.3 m / see、 l、
や断速度は3.5 m / seeとした。The input speed at this time was 1.3 m/see, l,
The breaking speed was 3.5 m/see.
一方、第3図に示す電極40では同条件の開閉耐久試験
の3,000回終了時点で薄板42にクラックCを生起
した。第3図は第1図のA部分に対応する部分を抽出し
て示す拡大図、即ち第2図に対応する拡大図である。同
図に示すように、この電極40では接触部43の裏面と
、アーク拡散部44の裏面との境界部分に面取り部を設
けず、断面形状では両裏面が直線的に交叉するようにし
たものである。On the other hand, in the electrode 40 shown in FIG. 3, a crack C occurred in the thin plate 42 after 3,000 cycles of the opening/closing durability test under the same conditions. FIG. 3 is an enlarged view extracting and showing a portion corresponding to portion A in FIG. 1, that is, an enlarged view corresponding to FIG. 2. As shown in the figure, this electrode 40 does not have a chamfered portion at the boundary between the back surface of the contact portion 43 and the back surface of the arc diffusion portion 44, and the cross-sectional shape is such that the two back surfaces intersect linearly. It is.
前記耐久試験によりこの交叉点から薄板42の表面に向
かうクラックCが発生した。In the durability test, a crack C was generated from this intersection point toward the surface of the thin plate 42.
これは投入時の衝撃による応力が前記境界部分に集中す
るからである。本実施例の電極30では前記境界部分に
面取り部Rを設けたので、投入時の衝撃による応力は分
散され、この結果充分な開閉耐久性能を有するものとな
る。This is because the stress caused by the impact at the time of injection is concentrated at the boundary portion. In the electrode 30 of this embodiment, the chamfered portion R is provided at the boundary portion, so that the stress caused by the impact at the time of insertion is dispersed, and as a result, it has sufficient opening and closing durability.
なお、第3図中45は背頭部、46は背面部45の平面
部、47は背面部45の傾斜部である。In addition, in FIG. 3, 45 is the back head, 46 is a flat part of the back part 45, and 47 is an inclined part of the back part 45.
I(発明の効果
以上のように本発明の真空インクラブタによれば、笠形
円板上の電極の対向面を高導電率の全面均一材からなる
薄板で形成するとともに、対向面以外の背面部分を低導
電率にして機械的強度の十分な材料で形成したので、再
点弧の確率が極めて低く、多頻度開閉も可能であってコ
ンデンサ開閉用として最適であるうえに、通常の真空イ
ンクラブタとしての高電圧、大電流しゃ断簡力にも優れ
た特性を示す。I (Effects of the Invention As described above, according to the vacuum incluctor of the present invention, the facing surface of the electrode on the cap-shaped disk is formed of a thin plate made of a highly conductive uniform material over the entire surface, and the back surface other than the facing surface is Since it is made of a material with low conductivity and sufficient mechanical strength, the probability of restriking is extremely low and frequent switching is possible, making it ideal for switching capacitors. It also exhibits excellent characteristics in terms of high voltage and large current breaking ability.
更に、前記電極の接触部の裏面と、薄板のアーク拡散部
の裏面との境界部分を曲面の面取り部としたので、真空
インクラブタの投入時の機械的な応力が分散され充分な
開閉耐久特性を有するものとなる。Furthermore, since the boundary between the back surface of the contact part of the electrode and the back surface of the arc diffusion part of the thin plate is a curved chamfer, the mechanical stress when the vacuum incretor is turned on is dispersed, and sufficient opening/closing durability is achieved. Become what you have.
第1図は本発明の真空インタセプタの一実施例における
電極の縦断正面図、第2図は第1図のA部分を抽出して
示す拡大図、第3図は他のTsmの第2図と対応する部
分を抽出して示す拡大図、第4図は従来の真空インタラ
プタの縦断正面図、第5図は第4図における電極の一例
を示す縦断正面図、第6図は第5図に示す電極の分解斜
視図、第7図(よ第4図におけるfa極の他の例を示す
縦断正面図である。
図 面 中、
1は真空容器、2は電極棒、4はコイル(磁界発生部材
)、30は電極、32は薄板、33は接触部、34はア
ーク拡散部、35は背面部(対向面以外の部分)、Rは
面取り部である。
第1図
本雇明の一寅S伊H;hけb電極II咲断正面図nつ
第2図
第1図のA邸分
第3図
イt!!めe羽とのAssクナ
第4図
真空イン7ラアタの 季従断正面図
第5図FIG. 1 is a longitudinal sectional front view of an electrode in an embodiment of the vacuum interceptor of the present invention, FIG. 2 is an enlarged view showing part A of FIG. 1, and FIG. An enlarged view showing the corresponding parts extracted, FIG. 4 is a vertical sectional front view of a conventional vacuum interrupter, FIG. 5 is a vertical sectional front view showing an example of the electrode in FIG. 4, and FIG. 6 is shown in FIG. 5. FIG. 7 is an exploded perspective view of the electrode, and a longitudinal sectional front view showing another example of the FA pole in FIG. ), 30 is an electrode, 32 is a thin plate, 33 is a contact part, 34 is an arc diffusion part, 35 is a back part (a part other than the facing surface), and R is a chamfered part. IH;hke b Electrode II bloom front view Figure 5
Claims (1)
導入するとともに、各リード棒の内端部に接触部とアー
ク拡散部とからなる笠形円板状の電極を固着し、アーク
に対してこれと平行な軸方向磁界を印加する磁界発生部
材を備えてなる真空インタラプタにおいて、 前記各電極の対向面を銅20〜80重量%、クロム5〜
70重量%およびモリブデン5〜70重量%で導電率が
40〜70%の複合金属からなる薄板で形成するととも
に、電極の対向面以外の部分を導電率が40%未満の材
料で形成し、更に薄板における接触部表面の直径より接
触部裏面の直径を大きくしかつ薄板におけるアーク拡散
部の表面と裏面とを平行にしてアーク拡散部における薄
板の板厚を接触部における薄板の板厚より薄く、しかも
均一に形成するとともに、接触部裏面とアーク拡散部裏
面との境界部分を曲面の面取り部としたことを特徴とす
る真空インタラプタ。[Claims] A pair of lead rods are introduced into a vacuum container so as to be able to approach and separate from each other, and a cap-shaped disk-shaped electrode consisting of a contact part and an arc diffusion part is provided at the inner end of each lead rod. In a vacuum interrupter comprising a magnetic field generating member that is firmly fixed and applies an axial magnetic field parallel to the arc, the opposing surfaces of each electrode are made of 20 to 80% by weight of copper and 5 to 5% by weight of chromium.
The electrode is made of a thin plate made of a composite metal containing 70% by weight and 5% to 70% molybdenum and has an electrical conductivity of 40% to 70%, and the parts other than the facing surface of the electrode are made of a material having an electrical conductivity of less than 40%, and The diameter of the back surface of the contact part in the thin plate is larger than the diameter of the front surface of the contact part, and the front and back surfaces of the arc diffusion part in the thin plate are made parallel, so that the thickness of the thin plate in the arc diffusion part is thinner than the thickness of the thin plate in the contact part, Moreover, the vacuum interrupter is characterized in that it is formed uniformly and that the boundary between the back surface of the contact part and the back surface of the arc diffusion part is a curved chamfer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6917487A JPH07111856B2 (en) | 1987-03-25 | 1987-03-25 | Vacuum interrupter |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6917487A JPH07111856B2 (en) | 1987-03-25 | 1987-03-25 | Vacuum interrupter |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63236228A true JPS63236228A (en) | 1988-10-03 |
JPH07111856B2 JPH07111856B2 (en) | 1995-11-29 |
Family
ID=13395093
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6917487A Expired - Fee Related JPH07111856B2 (en) | 1987-03-25 | 1987-03-25 | Vacuum interrupter |
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Country | Link |
---|---|
JP (1) | JPH07111856B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003331699A (en) * | 2002-05-09 | 2003-11-21 | Toshiba Corp | Vacuum valve |
WO2023276217A1 (en) * | 2021-06-29 | 2023-01-05 | 三菱電機株式会社 | Vacuum valve |
-
1987
- 1987-03-25 JP JP6917487A patent/JPH07111856B2/en not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003331699A (en) * | 2002-05-09 | 2003-11-21 | Toshiba Corp | Vacuum valve |
WO2023276217A1 (en) * | 2021-06-29 | 2023-01-05 | 三菱電機株式会社 | Vacuum valve |
Also Published As
Publication number | Publication date |
---|---|
JPH07111856B2 (en) | 1995-11-29 |
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