JPS6322853A - Siliconephenolic compound composition and use thereof - Google Patents
Siliconephenolic compound composition and use thereofInfo
- Publication number
- JPS6322853A JPS6322853A JP2969987A JP2969987A JPS6322853A JP S6322853 A JPS6322853 A JP S6322853A JP 2969987 A JP2969987 A JP 2969987A JP 2969987 A JP2969987 A JP 2969987A JP S6322853 A JPS6322853 A JP S6322853A
- Authority
- JP
- Japan
- Prior art keywords
- compound
- formula
- diisocyanate
- formulas
- general formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 150000001875 compounds Chemical class 0.000 title claims abstract description 27
- 239000000203 mixture Substances 0.000 title abstract description 10
- -1 isocyanate compound Chemical class 0.000 claims abstract description 48
- 150000002989 phenols Chemical class 0.000 claims abstract description 23
- 239000004593 Epoxy Substances 0.000 claims abstract description 18
- VKYKSIONXSXAKP-UHFFFAOYSA-N hexamethylenetetramine Chemical compound C1N(C2)CN3CN1CN2C3 VKYKSIONXSXAKP-UHFFFAOYSA-N 0.000 claims abstract description 16
- 239000004312 hexamethylene tetramine Substances 0.000 claims abstract description 8
- 235000010299 hexamethylene tetramine Nutrition 0.000 claims abstract description 8
- 239000012948 isocyanate Substances 0.000 claims abstract description 8
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 8
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 7
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 5
- 239000004065 semiconductor Substances 0.000 claims abstract description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract 3
- 229920001296 polysiloxane Polymers 0.000 claims description 27
- 239000000126 substance Substances 0.000 claims description 8
- 239000004480 active ingredient Substances 0.000 claims description 2
- 239000008393 encapsulating agent Substances 0.000 claims 2
- 229910052739 hydrogen Inorganic materials 0.000 claims 2
- 239000001257 hydrogen Substances 0.000 claims 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 2
- 229920003002 synthetic resin Polymers 0.000 claims 1
- 239000000057 synthetic resin Substances 0.000 claims 1
- 229920003986 novolac Polymers 0.000 abstract description 9
- 125000000524 functional group Chemical group 0.000 abstract description 5
- 238000006243 chemical reaction Methods 0.000 abstract description 4
- 238000010438 heat treatment Methods 0.000 abstract description 4
- 238000002156 mixing Methods 0.000 abstract description 4
- 238000007789 sealing Methods 0.000 abstract 1
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical compound C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 abstract 1
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 18
- 229920005989 resin Polymers 0.000 description 14
- 239000011347 resin Substances 0.000 description 14
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- 229910052757 nitrogen Inorganic materials 0.000 description 9
- 239000000843 powder Substances 0.000 description 9
- 238000012360 testing method Methods 0.000 description 7
- 229920001187 thermosetting polymer Polymers 0.000 description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 239000000945 filler Substances 0.000 description 6
- 239000012778 molding material Substances 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 239000007822 coupling agent Substances 0.000 description 5
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000006229 carbon black Substances 0.000 description 4
- 239000003086 colorant Substances 0.000 description 4
- 239000003822 epoxy resin Substances 0.000 description 4
- 239000005350 fused silica glass Substances 0.000 description 4
- 238000000465 moulding Methods 0.000 description 4
- 229920000647 polyepoxide Polymers 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 235000021355 Stearic acid Nutrition 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000004305 biphenyl Substances 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000006082 mold release agent Substances 0.000 description 3
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 3
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- 239000011342 resin composition Substances 0.000 description 3
- 239000008117 stearic acid Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- KMBSSXSNDSJXCG-UHFFFAOYSA-N 1-[2-(2-hydroxyundecylamino)ethylamino]undecan-2-ol Chemical compound CCCCCCCCCC(O)CNCCNCC(O)CCCCCCCCC KMBSSXSNDSJXCG-UHFFFAOYSA-N 0.000 description 2
- NKTOLZVEWDHZMU-UHFFFAOYSA-N 2,5-xylenol Chemical compound CC1=CC=C(C)C(O)=C1 NKTOLZVEWDHZMU-UHFFFAOYSA-N 0.000 description 2
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 2
- ZLPORNPZJNRGCO-UHFFFAOYSA-N 3-methylpyrrole-2,5-dione Chemical compound CC1=CC(=O)NC1=O ZLPORNPZJNRGCO-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 239000007983 Tris buffer Substances 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 230000001588 bifunctional effect Effects 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- 125000006267 biphenyl group Chemical group 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 239000004927 clay Substances 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 150000003949 imides Chemical class 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 229920003192 poly(bis maleimide) Polymers 0.000 description 2
- 229920001843 polymethylhydrosiloxane Polymers 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 2
- 238000001721 transfer moulding Methods 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- ZWVMLYRJXORSEP-LURJTMIESA-N (2s)-hexane-1,2,6-triol Chemical compound OCCCC[C@H](O)CO ZWVMLYRJXORSEP-LURJTMIESA-N 0.000 description 1
- RXUVWJWQFPJWOV-OWOJBTEDSA-N (e)-1,2-diisocyanatoethene Chemical compound O=C=N\C=C\N=C=O RXUVWJWQFPJWOV-OWOJBTEDSA-N 0.000 description 1
- VGHSXKTVMPXHNG-UHFFFAOYSA-N 1,3-diisocyanatobenzene Chemical compound O=C=NC1=CC=CC(N=C=O)=C1 VGHSXKTVMPXHNG-UHFFFAOYSA-N 0.000 description 1
- CDMDQYCEEKCBGR-UHFFFAOYSA-N 1,4-diisocyanatocyclohexane Chemical compound O=C=NC1CCC(N=C=O)CC1 CDMDQYCEEKCBGR-UHFFFAOYSA-N 0.000 description 1
- SIZPGZFVROGOIR-UHFFFAOYSA-N 1,4-diisocyanatonaphthalene Chemical compound C1=CC=C2C(N=C=O)=CC=C(N=C=O)C2=C1 SIZPGZFVROGOIR-UHFFFAOYSA-N 0.000 description 1
- SBJCUZQNHOLYMD-UHFFFAOYSA-N 1,5-Naphthalene diisocyanate Chemical compound C1=CC=C2C(N=C=O)=CC=CC2=C1N=C=O SBJCUZQNHOLYMD-UHFFFAOYSA-N 0.000 description 1
- DDHYZBVBQZYMTO-UHFFFAOYSA-N 1-(dimethylamino)pentan-1-ol Chemical compound CCCCC(O)N(C)C DDHYZBVBQZYMTO-UHFFFAOYSA-N 0.000 description 1
- FXEKNWLZNLIDNR-UHFFFAOYSA-N 1-[3-(2,5-dioxopyrrol-1-yl)propyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1CCCN1C(=O)C=CC1=O FXEKNWLZNLIDNR-UHFFFAOYSA-N 0.000 description 1
- PYVHLZLQVWXBDZ-UHFFFAOYSA-N 1-[6-(2,5-dioxopyrrol-1-yl)hexyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1CCCCCCN1C(=O)C=CC1=O PYVHLZLQVWXBDZ-UHFFFAOYSA-N 0.000 description 1
- NUOLPDLNDZRSPI-UHFFFAOYSA-N 1-benzyl-2-butylimidazole Chemical compound CCCCC1=NC=CN1CC1=CC=CC=C1 NUOLPDLNDZRSPI-UHFFFAOYSA-N 0.000 description 1
- MCMFEZDRQOJKMN-UHFFFAOYSA-N 1-butylimidazole Chemical compound CCCCN1C=CN=C1 MCMFEZDRQOJKMN-UHFFFAOYSA-N 0.000 description 1
- AXFVIWBTKYFOCY-UHFFFAOYSA-N 1-n,1-n,3-n,3-n-tetramethylbutane-1,3-diamine Chemical compound CN(C)C(C)CCN(C)C AXFVIWBTKYFOCY-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- BPHYZRNTQNPLFI-UHFFFAOYSA-N 2,4,6-trihydroxytoluene Chemical compound CC1=C(O)C=C(O)C=C1O BPHYZRNTQNPLFI-UHFFFAOYSA-N 0.000 description 1
- KPRZOPQOBJRYSW-UHFFFAOYSA-N 2-(aminomethyl)phenol Chemical compound NCC1=CC=CC=C1O KPRZOPQOBJRYSW-UHFFFAOYSA-N 0.000 description 1
- QIRNGVVZBINFMX-UHFFFAOYSA-N 2-allylphenol Chemical compound OC1=CC=CC=C1CC=C QIRNGVVZBINFMX-UHFFFAOYSA-N 0.000 description 1
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- SIQHSJOKAUDDLN-UHFFFAOYSA-N 2-methyl-1-propylimidazole Chemical compound CCCN1C=CN=C1C SIQHSJOKAUDDLN-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- WMNWJTDAUWBXFJ-UHFFFAOYSA-N 3,3,4-trimethylheptane-2,2-diamine Chemical compound CCCC(C)C(C)(C)C(C)(N)N WMNWJTDAUWBXFJ-UHFFFAOYSA-N 0.000 description 1
- SESYNEDUKZDRJL-UHFFFAOYSA-N 3-(2-methylimidazol-1-yl)propanenitrile Chemical compound CC1=NC=CN1CCC#N SESYNEDUKZDRJL-UHFFFAOYSA-N 0.000 description 1
- BVYPJEBKDLFIDL-UHFFFAOYSA-N 3-(2-phenylimidazol-1-yl)propanenitrile Chemical compound N#CCCN1C=CN=C1C1=CC=CC=C1 BVYPJEBKDLFIDL-UHFFFAOYSA-N 0.000 description 1
- SZUPZARBRLCVCB-UHFFFAOYSA-N 3-(2-undecylimidazol-1-yl)propanenitrile Chemical compound CCCCCCCCCCCC1=NC=CN1CCC#N SZUPZARBRLCVCB-UHFFFAOYSA-N 0.000 description 1
- RVOLLKNEKYKCQB-UHFFFAOYSA-N 3-methyl-1-[6-(3-methyl-2,5-dioxopyrrol-1-yl)hexyl]pyrrole-2,5-dione Chemical compound O=C1C(C)=CC(=O)N1CCCCCCN1C(=O)C(C)=CC1=O RVOLLKNEKYKCQB-UHFFFAOYSA-N 0.000 description 1
- WLDMPODMCFGWAA-UHFFFAOYSA-N 3a,4,5,6,7,7a-hexahydroisoindole-1,3-dione Chemical compound C1CCCC2C(=O)NC(=O)C21 WLDMPODMCFGWAA-UHFFFAOYSA-N 0.000 description 1
- OECTYKWYRCHAKR-UHFFFAOYSA-N 4-vinylcyclohexene dioxide Chemical compound C1OC1C1CC2OC2CC1 OECTYKWYRCHAKR-UHFFFAOYSA-N 0.000 description 1
- RIAHASMJDOMQER-UHFFFAOYSA-N 5-ethyl-2-methyl-1h-imidazole Chemical compound CCC1=CN=C(C)N1 RIAHASMJDOMQER-UHFFFAOYSA-N 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- VUPOPVGVEARXGA-UHFFFAOYSA-N C[SiH2]C.N=C=O.N=C=O Chemical compound C[SiH2]C.N=C=O.N=C=O VUPOPVGVEARXGA-UHFFFAOYSA-N 0.000 description 1
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 1
- IUJJPSLPEWPXBV-UHFFFAOYSA-N N=C=O.N=C=O.C(C=C1)=CC=C1[SiH2]C1=CC=CC=C1 Chemical compound N=C=O.N=C=O.C(C=C1)=CC=C1[SiH2]C1=CC=CC=C1 IUJJPSLPEWPXBV-UHFFFAOYSA-N 0.000 description 1
- QORUGOXNWQUALA-UHFFFAOYSA-N N=C=O.N=C=O.N=C=O.C1=CC=C(C(C2=CC=CC=C2)C2=CC=CC=C2)C=C1 Chemical compound N=C=O.N=C=O.N=C=O.C1=CC=C(C(C2=CC=CC=C2)C2=CC=CC=C2)C=C1 QORUGOXNWQUALA-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229920000538 Poly[(phenyl isocyanate)-co-formaldehyde] Polymers 0.000 description 1
- VBIIFPGSPJYLRR-UHFFFAOYSA-M Stearyltrimethylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[N+](C)(C)C VBIIFPGSPJYLRR-UHFFFAOYSA-M 0.000 description 1
- AWMVMTVKBNGEAK-UHFFFAOYSA-N Styrene oxide Chemical compound C1OC1C1=CC=CC=C1 AWMVMTVKBNGEAK-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 239000010425 asbestos Substances 0.000 description 1
- VZWMKHUMEIECPK-UHFFFAOYSA-M benzyl-dimethyl-octadecylazanium;bromide Chemical compound [Br-].CCCCCCCCCCCCCCCCCC[N+](C)(C)CC1=CC=CC=C1 VZWMKHUMEIECPK-UHFFFAOYSA-M 0.000 description 1
- AFBPHRMRBXPVPX-UHFFFAOYSA-M benzyl-dimethyl-tetradecylazanium;acetate Chemical compound CC([O-])=O.CCCCCCCCCCCCCC[N+](C)(C)CC1=CC=CC=C1 AFBPHRMRBXPVPX-UHFFFAOYSA-M 0.000 description 1
- OCBHHZMJRVXXQK-UHFFFAOYSA-M benzyl-dimethyl-tetradecylazanium;chloride Chemical compound [Cl-].CCCCCCCCCCCCCC[N+](C)(C)CC1=CC=CC=C1 OCBHHZMJRVXXQK-UHFFFAOYSA-M 0.000 description 1
- XYBQTTAROZGWOZ-UHFFFAOYSA-N bis[[hydroxy(dimethyl)silyl]oxy]-dimethylsilane Chemical compound C[Si](C)(O)O[Si](C)(C)O[Si](C)(C)O XYBQTTAROZGWOZ-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- WOWHHFRSBJGXCM-UHFFFAOYSA-M cetyltrimethylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[N+](C)(C)C WOWHHFRSBJGXCM-UHFFFAOYSA-M 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229940125904 compound 1 Drugs 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- NZNMSOFKMUBTKW-UHFFFAOYSA-M cyclohexanecarboxylate Chemical compound [O-]C(=O)C1CCCCC1 NZNMSOFKMUBTKW-UHFFFAOYSA-M 0.000 description 1
- 229960002887 deanol Drugs 0.000 description 1
- QFLLWLFOOHGSBE-UHFFFAOYSA-N dichloro-methyl-trimethylsilyloxysilane Chemical compound C[Si](C)(C)O[Si](C)(Cl)Cl QFLLWLFOOHGSBE-UHFFFAOYSA-N 0.000 description 1
- KORSJDCBLAPZEQ-UHFFFAOYSA-N dicyclohexylmethane-4,4'-diisocyanate Chemical compound C1CC(N=C=O)CCC1CC1CCC(N=C=O)CC1 KORSJDCBLAPZEQ-UHFFFAOYSA-N 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- DAKRXZUXJUPCOF-UHFFFAOYSA-N diethyl(dihydroxy)silane Chemical compound CC[Si](O)(O)CC DAKRXZUXJUPCOF-UHFFFAOYSA-N 0.000 description 1
- VSYLGGHSEIWGJV-UHFFFAOYSA-N diethyl(dimethoxy)silane Chemical compound CC[Si](CC)(OC)OC VSYLGGHSEIWGJV-UHFFFAOYSA-N 0.000 description 1
- UCXUKTLCVSGCNR-UHFFFAOYSA-N diethylsilane Chemical compound CC[SiH2]CC UCXUKTLCVSGCNR-UHFFFAOYSA-N 0.000 description 1
- OLLFKUHHDPMQFR-UHFFFAOYSA-N dihydroxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](O)(O)C1=CC=CC=C1 OLLFKUHHDPMQFR-UHFFFAOYSA-N 0.000 description 1
- 125000005442 diisocyanate group Chemical group 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000004205 dimethyl polysiloxane Substances 0.000 description 1
- UBHZUDXTHNMNLD-UHFFFAOYSA-N dimethylsilane Chemical compound C[SiH2]C UBHZUDXTHNMNLD-UHFFFAOYSA-N 0.000 description 1
- XCLIHDJZGPCUBT-UHFFFAOYSA-N dimethylsilanediol Chemical compound C[Si](C)(O)O XCLIHDJZGPCUBT-UHFFFAOYSA-N 0.000 description 1
- LTYMSROWYAPPGB-UHFFFAOYSA-N diphenyl sulfide Chemical compound C=1C=CC=CC=1SC1=CC=CC=C1 LTYMSROWYAPPGB-UHFFFAOYSA-N 0.000 description 1
- CZZYITDELCSZES-UHFFFAOYSA-N diphenylmethane Chemical compound C=1C=CC=CC=1CC1=CC=CC=C1 CZZYITDELCSZES-UHFFFAOYSA-N 0.000 description 1
- VDCSGNNYCFPWFK-UHFFFAOYSA-N diphenylsilane Chemical compound C=1C=CC=CC=1[SiH2]C1=CC=CC=C1 VDCSGNNYCFPWFK-UHFFFAOYSA-N 0.000 description 1
- DDXLVDQZPFLQMZ-UHFFFAOYSA-M dodecyl(trimethyl)azanium;chloride Chemical compound [Cl-].CCCCCCCCCCCC[N+](C)(C)C DDXLVDQZPFLQMZ-UHFFFAOYSA-M 0.000 description 1
- YIFWXQBNRQNUON-UHFFFAOYSA-M dodecyl(trimethyl)azanium;iodide Chemical compound [I-].CCCCCCCCCCCC[N+](C)(C)C YIFWXQBNRQNUON-UHFFFAOYSA-M 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- SLGWESQGEUXWJQ-UHFFFAOYSA-N formaldehyde;phenol Chemical compound O=C.OC1=CC=CC=C1 SLGWESQGEUXWJQ-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 239000010440 gypsum Substances 0.000 description 1
- 229910052602 gypsum Inorganic materials 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- WJRBRSLFGCUECM-UHFFFAOYSA-N hydantoin Chemical compound O=C1CNC(=O)N1 WJRBRSLFGCUECM-UHFFFAOYSA-N 0.000 description 1
- 229940091173 hydantoin Drugs 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- XJRAOMZCVTUHFI-UHFFFAOYSA-N isocyanic acid;methane Chemical compound C.N=C=O.N=C=O XJRAOMZCVTUHFI-UHFFFAOYSA-N 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 235000014380 magnesium carbonate Nutrition 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 229910052982 molybdenum disulfide Inorganic materials 0.000 description 1
- 239000010680 novolac-type phenolic resin Substances 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid group Chemical group C(CCCCCCC\C=C/CCCCCCCC)(=O)O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- PLIKAWJENQZMHA-UHFFFAOYSA-N p-hydroxyphenylamine Natural products NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- QCDYQQDYXPDABM-UHFFFAOYSA-N phloroglucinol Chemical compound OC1=CC(O)=CC(O)=C1 QCDYQQDYXPDABM-UHFFFAOYSA-N 0.000 description 1
- 229960001553 phloroglucinol Drugs 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 1
- 229960001755 resorcinol Drugs 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- AGGKEGLBGGJEBZ-UHFFFAOYSA-N tetramethylenedisulfotetramine Chemical compound C1N(S2(=O)=O)CN3S(=O)(=O)N1CN2C3 AGGKEGLBGGJEBZ-UHFFFAOYSA-N 0.000 description 1
- RYYWUUFWQRZTIU-UHFFFAOYSA-K thiophosphate Chemical compound [O-]P([O-])([O-])=S RYYWUUFWQRZTIU-UHFFFAOYSA-K 0.000 description 1
- 235000010215 titanium dioxide Nutrition 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- UHUUYVZLXJHWDV-UHFFFAOYSA-N trimethyl(methylsilyloxy)silane Chemical compound C[SiH2]O[Si](C)(C)C UHUUYVZLXJHWDV-UHFFFAOYSA-N 0.000 description 1
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical compound [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 235000014692 zinc oxide Nutrition 0.000 description 1
- XOOUIPVCVHRTMJ-UHFFFAOYSA-L zinc stearate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O XOOUIPVCVHRTMJ-UHFFFAOYSA-L 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Polyurethanes Or Polyureas (AREA)
- Epoxy Resins (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の利用分野〕
本発明は、新規シリコーンフェノール系化合物、その製
造方法及び該化合物を含有する熱硬化性樹脂組成物、そ
の硬化物に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a novel silicone phenolic compound, a method for producing the same, a thermosetting resin composition containing the compound, and a cured product thereof.
従来、半導体製品や、電気機器の分野においては、その
封止材料や、絶縁材料には金属インサート物との密着性
、接着性に優れ、耐クラツク性、耐熱性に優れた熱硬化
型の熱低応力樹脂の要求が強い。Conventionally, in the field of semiconductor products and electrical equipment, thermosetting materials have been used as sealing materials and insulating materials, which have excellent adhesion and adhesion to metal inserts, as well as excellent crack resistance and heat resistance. There is a strong demand for low stress resins.
これらの用途には、主としてエポキシ樹脂やウレタン樹
脂、付加型イミド系化合物などが用いられてきた。しか
し、これらはいずれも上述の金属インサートとの密着性
、耐クラツク性、耐熱性などのバランスの点から問題が
あり、新規な材料システムの開発が強く望まれていた。For these purposes, epoxy resins, urethane resins, addition type imide compounds, etc. have been mainly used. However, all of these have problems in terms of the balance of adhesion with the metal insert, crack resistance, heat resistance, etc., and there has been a strong desire to develop a new material system.
本発明は上記の現状にかんがみなされたものであり、本
発明の目的は、金属インサートの密着性(界面よりの水
の侵入の防止)に優れ、モールド硬化物の耐クラツク性
(可とう性)K優れ、しかも耐熱性の優れた材料組成物
を提供可能な、新しい各種の熱硬化性樹脂の反応性架橋
剤(硬化剤)として有用な素材を提供することにある。The present invention was conceived in view of the above-mentioned current situation, and an object of the present invention is to improve the adhesion of metal inserts (preventing water from entering from the interface), and to improve the crack resistance (flexibility) of molded cured products. The object of the present invention is to provide a material useful as a reactive crosslinking agent (curing agent) for various new thermosetting resins, which can provide a material composition with excellent K and heat resistance.
本発明を概説すれば、本発明の第1の発明は、シリコー
ンフェノール系化合物の発明であり、下記一般式I:
〔式中、R1は同−又は異なり、H,0H1aFLRo
n 、 低級アルキル、低級アルコキシ、シアノアル
中々、フェニル、ビニル、アリル、Flol、 Br%
HB4、BTl を示し、R3は同−又は異なり、低
級アルキル、ビニル、アリル、IF、C/。To summarize the present invention, the first invention of the present invention is an invention of a silicone phenolic compound, which has the following general formula I: [wherein R1 is the same or different, H,0H1aFLRo
n, lower alkyl, lower alkoxy, cyanoal, phenyl, vinyl, allyl, Flol, Br%
HB4, BTl, and R3 are the same or different, lower alkyl, vinyl, allyl, IF, C/.
Br を示し、また、m% pは1〜10000を、T
’s qは1〜1000を、そしてlは0〜5を示す。Br, m% p is 1 to 10000, T
's q represents 1 to 1000, and l represents 0 to 5.
〕 で表される。] It is expressed as
また、本発明の第2の発明は、前記一般式Iで表される
シリコーンフェノール系化合物の製造方法の発明であっ
て、ノボラック型フエノール樹脂(4)と末端に1個以
上の反応性官能基を有するシロキサン化合物CBIとを
加熱反応させることを特徴とする。Further, a second invention of the present invention is an invention of a method for producing a silicone phenolic compound represented by the general formula I, which comprises a novolac type phenol resin (4) and one or more reactive functional groups at the terminal. The siloxane compound CBI having the following characteristics is heated and reacted with the siloxane compound CBI.
また、本発明の第3の発明は、熱硬化性樹脂組成物の発
明であって、前記一般式!で表されルシリコーンフェノ
ール系化合物ト、エポキシ系化合物、付加型イミド系化
合物、イソシアネート系化合物又はヘキサメチレンテト
ラミンとを包含することを特徴とする。Moreover, the third invention of the present invention is an invention of a thermosetting resin composition, which has the above general formula! It is characterized by containing a silicone phenol compound, an epoxy compound, an addition type imide compound, an isocyanate compound, or hexamethylenetetramine.
また、本発明の第4の発明は、樹脂硬化物の発明であっ
て、前記一般式■で表されるシリコーンフェノール系化
合物とエポキシ系化合物、付加型イミド系化合物、イン
シアネート系化合物又はヘキサメチレンテトラミンとを
包含することを特徴とする。Further, a fourth invention of the present invention is an invention of a cured resin product, which comprises a silicone phenol compound represented by the general formula (1) and an epoxy compound, an addition type imide compound, an incyanate compound, or hexamethylene. Tetramine.
そして、本発明の第5の発明はエポキシ樹脂又は付加型
イミド樹脂の硬化剤の発明であって、前記一般式lで表
されるシリコーンフェノール系化合物を有効成分とする
ことを特徴とする。A fifth invention of the present invention is an invention of a curing agent for an epoxy resin or an addition type imide resin, which is characterized in that the silicone phenol compound represented by the general formula 1 is used as an active ingredient.
本発明において、ノボラック型フェノール樹脂囚として
は、フェノール、o、m、pのクレゾール、o、to、
pのキシレノール、アリルフェノールあるいはそれらの
誘導体のそれぞれとホルムアルデヒドを塩酸、しゆう酸
等酸性触媒のもとで反応させて得られる通常、フェノー
ルノボラック樹脂と呼ばれるものを使用できる。In the present invention, the novolac type phenolic resin particles include phenol, o, m, p cresol, o, to,
What is usually called a phenol novolak resin, which is obtained by reacting p-xylenol, allylphenol, or their derivatives with formaldehyde in the presence of an acidic catalyst such as hydrochloric acid or oxalic acid, can be used.
また、末端に1個以上の官能基を有するシロキサン系化
合物の)としては、例えば一般式■:R重
R,−81−R,・ ・ ・ (111〔式中、R1
は前記一般式lと同義である。〕で表される化合物があ
り、ジメチルシランジオール、ジエチルシランジオール
、ジフェニルシランジオール、ジエチルジメトキシシン
、ジエチルジメトキシシラン、ジフェニルジメトキシシ
ラン、ジメチルシラン、ジエチルシラン、ジフェニルシ
ランなどがある。In addition, examples of the siloxane compound having one or more functional groups at the end include, for example, the general formula (1): R R, -81-R, . . .
has the same meaning as the general formula 1 above. ] Examples include dimethylsilanediol, diethylsilanediol, diphenylsilanediol, diethyldimethoxycin, diethyldimethoxysilane, diphenyldimethoxysilane, dimethylsilane, diethylsilane, and diphenylsilane.
また、一般式■:
〔式中、Roは前記一般式Iと同義であり、kは0〜1
0000を示す。〕で表される化合物があυ、テトラメ
チルジシロキサン、ヘキサメチレントリシロキサン、1
−ビニル−5−ヒドロキシテトラメチルジシロキサン、
1,5−ジヒドロキシヘキサメチルトリシロキサン、1
.5−ジヒドロキシテトラメチルジシロキサン、1,3
−ジクロロテトラメチルジシロキサン、1.7−シヒド
ロキシオクチルメチルテトラシロキサン、1.7−シヒ
ドロオキシオクタエチルテトラシロキサン、1,7−シ
ヒドロキシオクタプチルシロキサンなど、ポリメチルハ
イドロシロキサンやそのオレイン付加物、例えばポリメ
チルハイドロメチルシアノプロピルシロキサンコポリマ
ー、ポリメチルハイドロメチルオクチルシロキサンコポ
リマー、ポリメチルハイドロメチルフルオロメチルプロ
ピルシロキサンコホリマーナト、あるいは、ポリメチル
オクチルシロキサンなどのポリメチルアルキルシロキサ
ンなどがある。Further, general formula ■: [wherein, Ro has the same meaning as the above general formula I, and k is 0 to 1
Shows 0000. ] is the compound represented by υ, tetramethyldisiloxane, hexamethylenetrisiloxane, 1
-vinyl-5-hydroxytetramethyldisiloxane,
1,5-dihydroxyhexamethyltrisiloxane, 1
.. 5-dihydroxytetramethyldisiloxane, 1,3
-Polymethylhydrosiloxane and its oleic adducts such as dichlorotetramethyldisiloxane, 1,7-cyhydroxyoctylmethyltetrasiloxane, 1,7-cyhydroxyoctaethyltetrasiloxane, 1,7-cyhydroxyoctaptylsiloxane, etc. Examples include polymethylhydromethylcyanopropylsiloxane copolymers, polymethylhydromethyloctylsiloxane copolymers, polymethylhydromethylfluoromethylpropylsiloxane copolymers, and polymethylalkylsiloxanes such as polymethyloctylsiloxane.
上記のシロキサン系化合物は、チッソ、信越化学、東し
シリコーン、GKなどより市販されている。The above-mentioned siloxane compounds are commercially available from Chisso, Shin-Etsu Chemical, Toshi Silicone, GK, etc.
本発明のシリコーンフェノール系化合物lの製造法とし
ては、(5)とCB)とを単に加熱することにより簡単
に得ることができるが(4)、CB)画成分ヲ溶媒中(
メタノール、エタノール、メチルエチルケトン、ベンゼ
ン、トルエン、キシレン、アセトン、酢酸セロソルブ、
酢酸セロソルブアセテート、N−メチルピロリドン、ジ
メチルホルムアミド、ジメチルアセトアミドなどを単独
あるいは混合して用いてもよい)で反応させるととKよ
り得ることもできる。囚とCB)との配合割合について
は囚103)=1/n、o1〜1.00の範囲で反応さ
せることが良い。得られたシリコーンフェノール系化合
物■の中でも分子量500〜50000のものが有用で
ある。The silicone phenolic compound 1 of the present invention can be easily obtained by simply heating (5) and CB).
Methanol, ethanol, methyl ethyl ketone, benzene, toluene, xylene, acetone, cellosolve acetate,
It can also be obtained from K by reacting with cellosolve acetate, N-methylpyrrolidone, dimethylformamide, dimethylacetamide, etc., which may be used alone or in combination. It is preferable that the reaction is carried out in a mixing ratio of 103) = 1/n, o1 to 1.00. Among the obtained silicone phenolic compounds (1), those having a molecular weight of 500 to 50,000 are useful.
上述の方法により、得られたシリコーンフエノール系化
合物は、室温で液状のものから軟化点200℃の範囲を
有することが特徴である。The silicone phenol compound obtained by the above method is characterized by having a softening point ranging from a liquid at room temperature to 200°C.
本発明により得られたシリコーンフェノール系化合物は
フェノール樹脂の従来公知の硬化剤(促進剤を含む)例
えば、ヘキサメチレンテトラミン乏どを適量加えること
により簡単に硬化し、電気特性、耐熱性、可とり性、耐
湿性に優れた樹脂硬化物と々る。また、エポキシ樹脂、
付加型イミド樹脂、尿素樹脂、ウレタン樹脂、メラミン
樹脂などの熱硬化性樹脂の架橋剤(硬化剤)として有効
である。The silicone phenolic compound obtained by the present invention can be easily cured by adding an appropriate amount of a conventionally known curing agent (including accelerator) for phenolic resins, such as hexamethylenetetramine, and has excellent electrical properties, heat resistance, and potency. A cured resin with excellent properties and moisture resistance. Also, epoxy resin,
It is effective as a crosslinking agent (curing agent) for thermosetting resins such as addition-type imide resins, urea resins, urethane resins, and melamine resins.
熱硬化性樹脂に対する配合割合は、その目的、用途によ
って異なり、特に限定するものではないが、好ましくは
対象とする熱硬化性樹脂の反応性官能基とシリコーンフ
ェノール系化合物のヒドロキシル基が化学量論比を中心
にかなりの幅で可変に使用できる。The blending ratio for the thermosetting resin varies depending on its purpose and use and is not particularly limited, but preferably the reactive functional groups of the thermosetting resin and the hydroxyl groups of the silicone phenolic compound are stoichiometric. It can be used variably over a wide range, centering on the ratio.
これらの用途としては、フェス、塗料、プリプレグ、プ
リント回路板などの積層板、コイルや半導体製品(:[
O,I、8工々ど)などの封止材を始めとする成形材な
どに幅広い展開が可能である。These applications include festivals, paints, prepregs, laminates such as printed circuit boards, coils and semiconductor products (:[
It can be used in a wide range of applications, including molding materials such as sealants such as O, I, and 8 parts).
本発明のシリコーンフェノール系化合物は公知のエポキ
シ化合物を添加するととくより、耐熱性、成形加工性の
優れた硬化物にもなる。When the silicone phenol compound of the present invention is added with a known epoxy compound, it becomes a cured product with excellent heat resistance and moldability.
本発明でいうエポキシ化合物としては、例えばビスフェ
ノールAのグリシジルエーテル、ブタジエンジエボキシ
ド、3.−一エボキシシクロヘキシルメチルー(so’
−エポキシ)シクaヘキサンカルボキシレート、ビニル
シクロヘキセンジオキシド、4.4’−ジ(1,2−エ
ポキシエチル)ジフェニルエーテル、2.2−ビス(5
,A−エポキシシクロヘキシル)プロパン、レゾルシン
のグリシジルエーテル、フロログルシンのジグリシジル
エーテル、メチルフロログルシンのジグリシジルエーテ
ル、ビス−(2,5−エボキシシクロベンテル)エーテ
ル、2−(L’−エポキシ)シクロヘキサン−5,5−
スピロ(5,4−エポキシ)シクロヘキサ7− m−ジ
オキサン、ビx−(5,j−エポキシ−6−メチルシク
ロヘキシル)アジベー)、N、11’−m−フェニレン
ビス(4,5−エポキシ−1,2−シクロヘキサンジカ
ルボキシイミドなどの2官能のエポキシ化合物、p−ア
ミノフェノールのトリグリ、シジル誘導体、ポリアリル
グリシジルエーテル、1,5,5−トIJ(1,2−エ
ポキシエチル)ベンゼン、2゜2’、 A 、 J’−
テトラグリシドキシベンゾフェノン、フェノールホルム
アルデヒドノボラック樹脂のポリグリシジルエーテル、
グリセリンのトリグリシジルエーテル、トリメチロール
プロパンのトリグリシジルエーテルなどの3官能以上の
エポキシ化合物、また、臭素化エポキシ等のハロゲン化
エポキシ化合物、あるいはヒダントインエポキシ化合物
が用いられる。Examples of the epoxy compound in the present invention include glycidyl ether of bisphenol A, butadiene dieboxide, 3. -mono-epoxycyclohexylmethyl- (so'
-epoxy)cyclohexane carboxylate, vinylcyclohexene dioxide, 4,4'-di(1,2-epoxyethyl)diphenyl ether, 2,2-bis(5
, A-epoxycyclohexyl)propane, glycidyl ether of resorcin, diglycidyl ether of phloroglucin, diglycidyl ether of methylphloroglucin, bis-(2,5-epoxycyclohexyl) ether, 2-(L'-epoxy) Cyclohexane-5,5-
spiro(5,4-epoxy)cyclohexane7-m-dioxane, bix-(5,j-epoxy-6-methylcyclohexyl)azibe), N,11'-m-phenylenebis(4,5-epoxy-1 , bifunctional epoxy compounds such as 2-cyclohexanedicarboximide, p-aminophenol triglycerides, cidyl derivatives, polyallyl glycidyl ether, 1,5,5-toIJ (1,2-epoxyethyl)benzene, 2° 2', A, J'-
Tetraglycidoxybenzophenone, polyglycidyl ether of phenol formaldehyde novolak resin,
Tri- or higher functional epoxy compounds such as triglycidyl ether of glycerin and triglycidyl ether of trimethylolpropane, halogenated epoxy compounds such as brominated epoxy, or hydantoin epoxy compounds are used.
また本発明のシリコーンフェノール系化合物は下式
〔式中、R7はH又はOH8を表し、R1は2価の有機
基を表す。〕で表される公知のビスマレイミド化合物と
も組合せて使用することができ、耐熱性の優れた硬化物
を得ることができる。上記ビスマレイミド化合物として
は、例えば、N。Moreover, the silicone phenol compound of the present invention can be obtained by the following formula: [wherein, R7 represents H or OH8, and R1 represents a divalent organic group. It can also be used in combination with a known bismaleimide compound represented by the following formula, and a cured product with excellent heat resistance can be obtained. Examples of the bismaleimide compound include N.
W−エチレンジマレイミド、 N、N’−エチレンビス
〔2−メチルマレイミド) 、N、N’−トリメチレン
シマレイミド、NIN′−テトラメチレンジマレイミド
、N、N’−へキサメチレンジマレイミド、N 、N’
−へキサメチレンビス〔2−メチルマレイミド)、Nt
l?’−ドデカメチレンジマレイミド、N、N’−m−
7二二レンジマレイミド、N、N’−p−フ二二レしジ
マレイミド、NUN’ −(オキシ−p−フェニレン)
シマレイミド、N、N’−(メチレン−ジーp−)ユニ
しン)シマレイミド、MIN′−(メチレン−ジーp−
)ユニしン)ビス〔2−メチルマレイミド〕、”、N’
−2,A−トリレンジマレイミド、L”−2+6− )
!Jレンジマレイミドs kJtW −m−キシリレ
ンシマレイミド、N、N’−p−キシリレンシマレイミ
ド、IJ 、 N’−オキシグロビレンジマレイミド、
N、N’−エテレンビス(オキシプロピレンマレイミド
)、a、N’−オキシジエチレンシマレイミドなどがあ
り\単独若しくは2種以上あわせて使用される。W-ethylene dimaleimide, N,N'-ethylenebis[2-methylmaleimide), N,N'-trimethylene dimaleimide, NIN'-tetramethylene dimaleimide, N,N'-hexamethylene dimaleimide, N ,N'
-hexamethylenebis[2-methylmaleimide], Nt
l? '-Dodecamethylene dimaleimide, N, N'-m-
722 dimaleimide, N,N'-p-furin2 dimaleimide, NUN'-(oxy-p-phenylene)
Simaleimide, N, N'-(methylene-p-)unisine) simalimide, MIN'-(methylene-p-
) Bis[2-methylmaleimide],”,N'
-2, A-tolylene dimaleimide, L”-2+6-)
! J rangemaleimide s kJtW -m-xylylene cymaleimide, N, N'-p-xylylene cymaleimide, IJ, N'-oxyglobylene dimaleimide,
Examples include N,N'-ethylenebis(oxypropylenemaleimide) and a,N'-oxydiethylene simalimide, which may be used alone or in combination of two or more.
本発明のシリコーンフェノール系化合物は公知の多官能
イソシアネート系化合物を添加することにより耐熱性、
成形加工性の優れた硬化物にもなる。The silicone phenol compound of the present invention has heat resistance,
It also becomes a cured product with excellent moldability.
本発明において多官能のインシアネート系化合物として
メタンジイソシアネート、ブタン−1,1−ジイソシア
ネート、エタン−1,2−ジイソシアネート、ブタン−
1,2−ジイソシアネート、トランスビニレンジイソシ
アネート、プロパン−1,3−ジイソシアネート、ブタ
ン−1,4−ジイソシアネート、2−ブテン−1,4−
ジイソシアネート、ペンタン−1,5−ジイソシアネー
ト、ヘキサン−1,6−ジインシアネート、ヘプタン−
1,7−ジイソシアネート、オクタン−1,8−ジイソ
シアネート、ノナン−1,9−ジイソシアネート、デカ
ン−1,10−ジイソシアネート、ジメチルシランジイ
ソシアネート、ジフェニルシランジイソシアネート、ω
、/−1,3−ジメチルベンゼンジイソシアネート、ω
、Ql’−1゜4−ジメチルベンゼンジイソシアネート
、ω、(/−1,3−ジメチルシクロヘキサンジイソシ
アネート、ω、a/−1.4−ジメチルシクロヘキサン
ジイソシアネート、ω、tJ−1.a−ジメチルナフタ
レンジインシアネート、ω、i/−1.5−ジメチルナ
フタレンジイソシアネート、シクロへウザンー1,5−
ジイソシアネート、シクロヘキサン−1,4−ジイソシ
アネート、ジシクロヘキシルメタン−4,4′−ジイソ
シアネート、1,3−フェニレンジイソシアネート、1
.4−)ユニレンジイソシアネート、1−メチルベンゼ
ン−2,4−ジイソシアネート、1−メチルベンゼン−
2,5−ジイソシアネート、1−メチルベンゼン−2,
6−ジイソシアネート、1−メチルベンゼン−5゜5−
ジイソシアネート、ジフェニルエーテル−4,4′−ジ
イソシアネート、ジフェニルエーテル−2,41−ジイ
ソシアネート、ナフタリン−1,4−ジイソシアネート
、ナフタリン−1,5−ジイソシアネート、ビフェニル
−4,4′−ジインシアネート、3.ダージメチルビフ
ェニル−4,4′−ジイソシアネート、2.5’−ジメ
トキシビフェニル−4,J’−ジイソシアネート、ジフ
ェニルメタン+ 4 、41−ジイソシアネート、3,
3′−ジメトキシジフェニルメタン−4,4′−ジイソ
シアネート、4.4′−ジメトキシジフェニルメタン−
5−′−ジイソシアネート、ジフェニルサルファイド−
4゜4′−ジイソシアネート、ジフェニルスルホン−4
,4′−ジイソシアネートなどの2官能のインシアネー
ト化合物、ポリメチレンポリフェニルイソシアネート、
トリフェニルメタントリイソシアネート、トリス(4−
インシアネートフェニル)チオフォスフェート、515
’l ’ l ”−ジフェニルメタ/テトライブシアネ
ートなどの5官能以上のイソシアネート化合物が用いら
れる。また、これらイソシアネート系化合物の2量体、
s量体も用いることができる。In the present invention, polyfunctional incyanate compounds include methane diisocyanate, butane-1,1-diisocyanate, ethane-1,2-diisocyanate, and butane-1,2-diisocyanate.
1,2-diisocyanate, transvinylene diisocyanate, propane-1,3-diisocyanate, butane-1,4-diisocyanate, 2-butene-1,4-
Diisocyanate, pentane-1,5-diisocyanate, hexane-1,6-diincyanate, heptane-
1,7-diisocyanate, octane-1,8-diisocyanate, nonane-1,9-diisocyanate, decane-1,10-diisocyanate, dimethylsilane diisocyanate, diphenylsilane diisocyanate, ω
, /-1,3-dimethylbenzene diisocyanate, ω
, Ql'-1゜4-dimethylbenzene diisocyanate, ω, (/-1,3-dimethylcyclohexane diisocyanate, ω, a/-1.4-dimethylcyclohexane diisocyanate, ω, tJ-1.a-dimethylnaphthalene diisocyanate ,ω,i/-1.5-dimethylnaphthalene diisocyanate, cyclohexane-1,5-
Diisocyanate, cyclohexane-1,4-diisocyanate, dicyclohexylmethane-4,4'-diisocyanate, 1,3-phenylene diisocyanate, 1
.. 4-) Unilene diisocyanate, 1-methylbenzene-2,4-diisocyanate, 1-methylbenzene-
2,5-diisocyanate, 1-methylbenzene-2,
6-Diisocyanate, 1-methylbenzene-5゜5-
Diisocyanate, diphenyl ether-4,4'-diisocyanate, diphenyl ether-2,41-diisocyanate, naphthalene-1,4-diisocyanate, naphthalene-1,5-diisocyanate, biphenyl-4,4'-diincyanate, 3. dimethylbiphenyl-4,4'-diisocyanate, 2,5'-dimethoxybiphenyl-4,J'-diisocyanate, diphenylmethane+4, 41-diisocyanate, 3,
3'-dimethoxydiphenylmethane-4,4'-diisocyanate, 4,4'-dimethoxydiphenylmethane-
5-'-diisocyanate, diphenyl sulfide
4゜4'-diisocyanate, diphenylsulfone-4
, bifunctional incyanate compounds such as 4'-diisocyanate, polymethylene polyphenylisocyanate,
Triphenylmethane triisocyanate, tris(4-
Incyanate phenyl) thiophosphate, 515
Isocyanate compounds having 5 or more functional groups such as 'l'l''-diphenyl meta/tetribucyanate are used.Also, dimers of these isocyanate compounds,
S-mers can also be used.
これらの樹脂組成物には、硬化性を高める上で重要な各
種の触媒を添加することができる。Various catalysts that are important for improving curability can be added to these resin compositions.
そのような触媒としては例えば、テトラメチルブタンジ
アミン、テトラメチルヘキサンジアミン、トリエチレン
ジアミン、ジメチルアニリンなどの三級アミン、ジメチ
ルアミノエタノール、トリエタノールアミン、ジメチル
アミノペンタノールなどのオキシアルキルアミンやトリ
ス(ジメチルアミノメチル)フェノール、N−メチルモ
ルホリンなどのアミン類がおる。Examples of such catalysts include tertiary amines such as tetramethylbutanediamine, tetramethylhexanediamine, triethylenediamine, and dimethylaniline, oxyalkylamines such as dimethylaminoethanol, triethanolamine, and dimethylaminopentanol, and tris(dimethyl There are amines such as (aminomethyl)phenol and N-methylmorpholine.
また、セチルトリメチルアンモニウムブロマイド、セチ
ルトリメチルアンモニウムクロライド、ドデシルトリメ
チルアンモニウムアイオダイド、トリメチルドデシルア
ンモニウムクロライド、ベンジルジメチルテトラデシル
アンモニウムクロライド、ペンジルジメチルパルミチル
アンモニウムクロライド、アリルドデシルトリメチルア
ンモニウムブロマイド、ベンジルジメチルステアリルア
ンモニウムプロマイト、ステアリルトリメチルアンモニ
ウムクロライド、ベンジルジメチルテトラデシルアンモ
ニウムアセテートなど第4級アンモニウム塩がある。2
−エチルイミダゾール、2−ウンデシルイミダゾール、
2−ヘプタデシルイミダゾール、2−メチル−4−エチ
ルイミダゾール、1−ブチルイミダゾール、1−プロピ
ル−2−メチルイミダゾール、1−ベンジル−2−ブチ
ルイミダゾール、1−シアノエチル−2−メチルイミダ
ゾール、1−シアノエチル−2−ウンデシルイミダゾー
ル、1−シアノエチル−2−フェニルイミダゾール、1
−アジ/−2−メチルイミダゾール、1−アジン−2−
ウンデシルイミダゾールなどのイミダゾール類、トリフ
ェニルホスフィンテトラフェニルボレート、テトラフェ
ニルホスホニウムテトラフェニルボレート、トリエチル
アミンテトラフェニルボレート、N−メチルモルホリン
テトラフェニルボレート、ピリジンテトラフェニルボレ
ート、2−エチル−4−メチルイミダゾールテトラフェ
ニルボレート、2−エチル−1,4−ジメチルイミダゾ
ールテトラフェニルホレートナトのテトラフェニルボロ
ン塩も有用である。Also, cetyltrimethylammonium bromide, cetyltrimethylammonium chloride, dodecyltrimethylammonium iodide, trimethyldodecylammonium chloride, benzyldimethyltetradecylammonium chloride, penzyldimethylpalmitylammonium chloride, allyldodecyltrimethylammonium bromide, benzyldimethylstearylammonium bromide , stearyltrimethylammonium chloride, benzyldimethyltetradecylammonium acetate, and other quaternary ammonium salts. 2
-ethylimidazole, 2-undecylimidazole,
2-heptadecylimidazole, 2-methyl-4-ethylimidazole, 1-butylimidazole, 1-propyl-2-methylimidazole, 1-benzyl-2-butylimidazole, 1-cyanoethyl-2-methylimidazole, 1-cyanoethyl -2-undecylimidazole, 1-cyanoethyl-2-phenylimidazole, 1
-Azi/-2-methylimidazole, 1-azine-2-
Imidazoles such as undecylimidazole, triphenylphosphine tetraphenylborate, tetraphenylphosphonium tetraphenylborate, triethylaminetetraphenylborate, N-methylmorpholinetetraphenylborate, pyridinetetraphenylborate, 2-ethyl-4-methylimidazoletetraphenyl Also useful is the tetraphenylboron salt of the borate, 2-ethyl-1,4-dimethylimidazoletetraphenylphorate.
また、そのほかに上記の目的、用途に応じて、各種の公
知の添加剤を加えることもできる。例えば、無機質フィ
ラーとしては、ジルコン、シリカ、溶融石英ガラス、ア
ルミナ、水酸化アルミニウム、ガラス、ケイ酸カルシウ
ム、石コウ、炭eカルシウム、マグネサイト、クレー、
メルク、マイカ、アスベスト、鉛酸化物、亜鉛華、チタ
ン白、二硫化モリブデンなどがある。まだ、その他必要
に応じて、高級脂肪酸、ワックス類々どの離型剤、エポ
キシシラン、ビニルシランポラン系化合物、アルコキシ
チタネート系化合物などのカップリング剤を使用できる
。更に、アンチモン、リン化合物などからなる難燃化材
を用いることができる。In addition, various known additives may be added depending on the above-mentioned purpose and use. For example, inorganic fillers include zircon, silica, fused silica glass, alumina, aluminum hydroxide, glass, calcium silicate, gypsum, calcium carbonate, magnesite, clay,
Examples include Merck, mica, asbestos, lead oxide, zinc white, titanium white, and molybdenum disulfide. In addition, release agents such as higher fatty acids and waxes, and coupling agents such as epoxysilane, vinyl silane porane compounds, and alkoxy titanate compounds can be used as necessary. Furthermore, flame retardant materials made of antimony, phosphorus compounds, etc. can be used.
以下、実施例を挙げて本発明を例証するが、本発明はこ
れに限定されない。EXAMPLES Hereinafter, the present invention will be illustrated by giving Examples, but the present invention is not limited thereto.
実施例1〜5
フェノール系化合物として、ノボラック型のフェノール
とホルムアルデヒドとの縮合物(平均分子1i、37s
)too重量部にシロキサン化合物としてヒドロキシル
基末端ポリジフェニルシロキサン化合物(’pe−oa
o :チッソ社製)5.10.20.50.40重量部
をそれぞれ別個に添加して120℃〜180℃で2〜3
時間加熱反応させて〔表1記載の(イ)〜(ホ)〕の5
5種のシリコーンフェノール系化合物を得た。Examples 1 to 5 As a phenolic compound, a condensate of novolac type phenol and formaldehyde (average molecular 1i, 37s
) Too weight part of hydroxyl group-terminated polydiphenylsiloxane compound ('pe-oa
o: Chisso Corporation) 5, 10, 20, 50.40 parts by weight were added separately and heated at 120°C to 180°C for 2 to 3 hours.
5 of [(a) to (e) in Table 1] by heating reaction for a period of time
Five types of silicone phenolic compounds were obtained.
実施例6〜10
フェノール系化合物として、ノボラック型のフェノール
とホルムアルデヒドとの縮合物(平均分子Jim:41
0)100重量部に、シロキサン化合物としてメチロー
ル基末端ポリジメチルシロキサン化合物(PS−197
:チッソ社製)10.20.’50.40.50重量部
をそれぞれ別個に添加して120〜180℃、1〜2時
間反応させて表1に記載の(へ)〜図の5種類のシリコ
ーンフェノール系化合物を得た。Examples 6 to 10 As a phenolic compound, a condensate of novolac type phenol and formaldehyde (average molecular Jim: 41
0) Add a methylol group-terminated polydimethylsiloxane compound (PS-197) as a siloxane compound to 100 parts by weight.
: Manufactured by Chisso Corporation) 10.20. 50.40.50 parts by weight were added separately and reacted at 120 to 180°C for 1 to 2 hours to obtain five types of silicone phenolic compounds shown in Table 1.
実施例11〜12
フェノール系化合物としてノボラック型オルトクレゾー
ルとホルムアルデヒドとの縮合物(平均分子量:aso
)1oo重量部に、シロキサン化合物としてポリメチル
ハイドロシロキサン(PS−120:チツソ社製)10
.20重量部をそれぞれ別個に添加して150〜200
℃、1〜2時間加熱反応させて表1記載の四(6)の2
種類のシリコーンフェノール系化合物を得た。Examples 11-12 As a phenolic compound, a condensate of novolak-type ortho-cresol and formaldehyde (average molecular weight: aso
)10 parts by weight of polymethylhydrosiloxane (PS-120: manufactured by Chitsuso Corporation) as a siloxane compound.
.. Add 20 parts by weight separately to 150-200
℃ for 1 to 2 hours to produce 4(6)-2 listed in Table 1.
Various silicone phenolic compounds were obtained.
実施例13〜16
フェノール系化合物としてノボラック型のフェノールと
ホルムアルデヒドとの縮合物(平均分子量:J50)1
00重量部に対して、シロキサン化合物として、シリコ
ーンオイルKF−96(信越化学社製)、KIF−54
(信越化学社製)をそれぞれ5.10重量部添加して、
150〜200℃で約1〜2時間加熱反応させて表1記
載のM〜(イ)の4種類のシリコーンフェノール系化合
物を得た。Examples 13 to 16 Condensate of novolac type phenol and formaldehyde as phenolic compound (average molecular weight: J50) 1
00 parts by weight, as a siloxane compound, silicone oil KF-96 (manufactured by Shin-Etsu Chemical Co., Ltd.), KIF-54
(manufactured by Shin-Etsu Chemical Co., Ltd.) by adding 5.10 parts by weight,
A heating reaction was carried out at 150 to 200° C. for about 1 to 2 hours to obtain four types of silicone phenol compounds M to (a) listed in Table 1.
実施例17
実施例1〜5で得たシリコーンフェノール系化合物ビ)
〜(ホ)をそれぞれ100重量部に対し、ヘキサメチレ
ンテトラミンを7重量部、離型剤としてステアリン酸亜
鉛1重量部、充てん剤として、シリカ粉180重量部、
クレー粉末90重量部、カップリング剤として、エポキ
シシラー ンIBM −Ass (信越化学社製)1重
量部、着色剤としてカーボンブラック1重量部を配合し
た後、80〜95℃、10分間ロール混練した後冷却し
て、成形材料組成物を得た。Example 17 Silicone phenolic compounds obtained in Examples 1 to 5)
- (E) to 100 parts by weight each, 7 parts by weight of hexamethylenetetramine, 1 part by weight of zinc stearate as a mold release agent, 180 parts by weight of silica powder as a filler,
After blending 90 parts by weight of clay powder, 1 part by weight of epoxysilane IBM-Ass (manufactured by Shin-Etsu Chemical Co., Ltd.) as a coupling agent, and 1 part by weight of carbon black as a coloring agent, the mixture was roll-kneaded at 80 to 95°C for 10 minutes. After cooling, a molding material composition was obtained.
次いで、150〜160℃、2分間トランスファ成形し
て、各特性測定用の試片を作成した。Next, transfer molding was performed at 150 to 160° C. for 2 minutes to prepare specimens for measuring each characteristic.
上記硬化物の曲げ強さは室温で1000〜1200ゆ/
iで、180℃SO日後の曲げ強さの保持率はいずれも
90〜100チてあった。The bending strength of the above cured product is 1000 to 1200 Yu/
The retention rate of bending strength after 180°C SO was 90 to 100 degrees.
また、硬化物の吸水率は24時間水浸漬で(15〜0.
6チであった。In addition, the water absorption rate of the cured product after immersion in water for 24 hours was 15 to 0.
It was 6chi.
実施例18
実施例6〜16で得たシリコーンフェノール系化合物(
へ)〜力を、それぞれ70重量部に対して、エポキシ樹
脂としてノボラック型エポキシDInN −4513(
ダウ ケミカル社製)100重量部、離型剤としてヘキ
ストワックスEを1重量部、充てん剤として石英粉29
0重陸部、溶融石英ガラス粉250重量部、硬化促進剤
として、トリエチルアミンテトラフェニルボレート2重
量部、カップリング剤としてエポキシシラ/KBM 5
05 (信越化学社製)2重量部、着色剤としてカーボ
ンブラック1重量部を配合し、60〜70℃、10分間
ロール混練した後、冷却し、粉砕して成形材料組成物を
得た。次いで、これらの成形粉を用いて(a)成形品(
硬化後)のガラス転移点及びヤング率、(′b)ヒート
サイクル試験、(e)締付は応力測定試験、(d)成形
品(硬化後)の高温体積抵抗率の試験を行った。ただし
、成形先住は180℃、2分でその後180℃で6時間
のボストキュアを行った。Example 18 Silicone phenolic compounds obtained in Examples 6 to 16 (
) to 70 parts by weight, respectively, and novolac type epoxy DInN-4513 (as the epoxy resin)
Dow Chemical Company) 100 parts by weight, 1 part by weight of Hoechstwax E as a mold release agent, 29 parts by weight of quartz powder as a filler.
0 heavy land parts, 250 parts by weight of fused silica glass powder, 2 parts by weight of triethylamine tetraphenylborate as a curing accelerator, and epoxy sila/KBM 5 as a coupling agent.
05 (manufactured by Shin-Etsu Chemical Co., Ltd.) and 1 part by weight of carbon black as a coloring agent were blended, roll-kneaded at 60 to 70°C for 10 minutes, cooled, and pulverized to obtain a molding material composition. Next, using these molding powders, (a) molded products (
Glass transition point and Young's modulus (after curing), ('b) heat cycle test, (e) stress measurement test for tightening, and (d) high temperature volume resistivity test of molded product (after curing) were conducted. However, the molding process was performed at 180°C for 2 minutes and then post cured at 180°C for 6 hours.
ヒートサイクル試験は5×511IIIのMO8型LE
I工実装品(各20個)を作成し、150℃のオイルバ
スに2分間浸漬したあと直ちに一196℃の液体窒素に
2分間浸漬する、耐熱衝撃試験を繰返して行った。締付
は応力測定は成形材料を使ってトランスファモールドし
た場合の発生応力をモデル的に測定した。モデルとして
は、スチール製の円筒(外径10φ、厚みα5111m
%高さ20.)の内側に歪ゲージを貼り、外側をレジ/
モールドした。樹脂の厚みは10m″′Cある。Heat cycle test was conducted using 5x511III MO8 type LE.
I-manufactured products (20 pieces each) were prepared and repeatedly subjected to a thermal shock test in which they were immersed in an oil bath at 150°C for 2 minutes and then immediately immersed in liquid nitrogen at -196°C for 2 minutes. Tightening stress was measured by modeling the stress generated when transfer molding was performed using a molding material. The model is a steel cylinder (outer diameter 10φ, thickness α5111m).
% height 20. ) and pasted the strain gauge on the inside of the
Molded. The thickness of the resin is 10 m''C.
モールド後、円周方向に生じた応力をスチールの変形量
から求めた。また、耐熱性の判断基準となるガラス転移
温度はA8TM D−696に準じて測定した。その結
果を比較例と共に表2に示す。After molding, the stress generated in the circumferential direction was determined from the amount of deformation of the steel. Further, the glass transition temperature, which is a criterion for determining heat resistance, was measured according to A8TM D-696. The results are shown in Table 2 together with comparative examples.
実施例19〜21
実施例で得たシリコーンフェノール系化合物PI、(ト
1、wをそれぞれ70重量部に対して、イソシアネート
化合物としてトリレンジイソシアネート(住友バイエル
社製TD工)100重量部、離型剤としてステアリン酸
1重量部、充てん剤として石英粉290重量部、溶融石
英ガラス粉250重量部、硬化促進剤としてヘキサメチ
レンテトラミン3重量部、カップリング剤としてエポキ
シシランIBM −505(信越化学社製)2重量部、
着色剤としてカーボンブラック1重量部を配合し、60
〜70℃、10分間ロール混練し、成形材料組成物を得
た。次いで、これらの成形材料を用いて、170℃、3
分間成形して実施例18と同様に各種硬化物(試片)を
作成した。その結果を表5に記載した。Examples 19 to 21 Silicone phenolic compound PI obtained in the example, 100 parts by weight of tolylene diisocyanate (TD technology manufactured by Sumitomo Bayer) as an isocyanate compound, mold release 1 part by weight of stearic acid as a filler, 290 parts by weight of quartz powder as a filler, 250 parts by weight of fused silica glass powder, 3 parts by weight of hexamethylenetetramine as a hardening accelerator, and epoxysilane IBM-505 (manufactured by Shin-Etsu Chemical Co., Ltd.) as a coupling agent. ) 2 parts by weight,
Adding 1 part by weight of carbon black as a coloring agent, 60
Roll kneading was carried out at ~70°C for 10 minutes to obtain a molding material composition. Next, using these molding materials, 170°C, 3
Various cured products (test pieces) were prepared in the same manner as in Example 18 by molding for minutes. The results are listed in Table 5.
実施例22〜24
実施例で得たシリコーンフェノール系化合物ヒ→、什)
、力をそれぞれ70重量部に対して、付加型ポリイミド
樹脂としてN、N’−(メチレン−p−フェニレン)シ
マレイミド1o o 重Jt 部、離型剤としてステア
リン酸1平易部、充てん剤として石英粉290重量部、
溶融石英ガラス粉250重量部、硬化促進剤としてヘキ
サメチレンテトラミン3重量部、カップリング剤として
エポキシシランIBM −505(信越化学社製)2重
量部、着色剤としてカーボンブラック1重量部を配合し
、実施例19〜21と同様の条件で混練し、各棟の特性
試験用の試片を作成した。Examples 22 to 24 Silicone phenolic compounds obtained in Examples
, 70 parts by weight of the addition type polyimide resin, 10 parts of N,N'-(methylene-p-phenylene) simaleimide, 1 part of stearic acid as a mold release agent, and 1 part of stearic acid as a filler, and quartz powder as a filler. 290 parts by weight,
250 parts by weight of fused silica glass powder, 3 parts by weight of hexamethylenetetramine as a hardening accelerator, 2 parts by weight of epoxysilane IBM-505 (manufactured by Shin-Etsu Chemical Co., Ltd.) as a coupling agent, and 1 part by weight of carbon black as a coloring agent, The mixture was kneaded under the same conditions as in Examples 19 to 21 to prepare specimens for characteristic testing of each building.
その結果を表3に記載した。The results are listed in Table 3.
実施例25〜26
メチルエチルケトン50〇−中にフェノール系化合物と
して、ノボラック型のp−t−ブチルフェノールとホル
ムアルデヒドとの縮合物(平均分子量475)100重
量部に対してシロキサン化合物として:l−080、P
S−197をそれぞれ20重量部ずつ別個に添加し、加
熱して、メチルエチルケトンの還流状態で3時間加熱反
応させて、2種類のシリコーンフェノール系(フェス状
態)化合物を得た。Examples 25-26 As a phenolic compound in 500 ml of methyl ethyl ketone, as a siloxane compound for 100 parts by weight of a condensate of novolac type pt-butylphenol and formaldehyde (average molecular weight 475): l-080, P
20 parts by weight of each of S-197 were added separately, heated, and reacted under reflux of methyl ethyl ketone for 3 hours to obtain two types of silicone phenol compounds (face state).
表2及び5の結果よシ、ヒートサイクル不良品のモール
ド品を200℃の熱濃硫酸で樹脂を分解し、不良の要因
を解析した結果、素子表面の保膿膜S10.にクラック
が発生していた。中にはパッケージが割れてるものもあ
った。According to the results in Tables 2 and 5, we decomposed the resin of molded products with heat cycle defects with hot concentrated sulfuric acid at 200°C and analyzed the causes of the defects. Cracks were occurring. Some of the packages were broken.
以上の実施例より、明らかなように、本発明のシリコー
ンフェノール系化合物を用いることKよって、耐熱性、
耐クラツク性に優れた樹脂硬化物を提供できるという顕
著汝効果を持っている。As is clear from the above examples, by using the silicone phenol compound of the present invention, heat resistance,
It has a remarkable effect of being able to provide a cured resin product with excellent crack resistance.
Claims (1)
繰返し単位をもつノボラック型フェノール系化合物と、
下記一般式(B): ▲数式、化学式、表等があります▼・・・(B) (式中R_1は同一又は異なり、H、水酸基、メチル基
又はフェニル基、Yはフェノール性水酸基と反応性の官
能基、xは0〜1000の数を示す)で表される化合物
とを加熱反応させることにより、得られる下記一般式〔
I 〕:▲数式、化学式、表等があります▼・・・〔 I
〕 〔式中R及びR_1は前記式(A)及び(B)と同義で
ある〕で表される特性基を含有するシリコーンフェノー
ル系化合物と、エポキシ系化合物、付加型イミド系化合
物、イソシアネート系化合物又はヘキサメチレンテトラ
ミンとを包含することを特徴とする熱硬化性樹脂組成物
。 2、合成樹脂系封止材で封止された樹脂封止型半導体装
置において、該封止材が、下記一般式(A): ▲数式、化学式、表等があります▼・・・(A) (式中Rは水素又は低級アルキル基を示す)で表される
繰返し単位をもつノボラック型フェノール系化合物と、
下記一般式(B): ▲数式、化学式、表等があります▼・・・(B) (式中R_1は同一又は異なり、H、水酸基、メチル基
又はフェニル基、Yはフェノール性水酸基と反応性の官
能基、xは0〜1000の数を示す)で表される化合物
とを加熱反応させることにより得られる下記一般式〔
I 〕:▲数式、化学式、表等があります▼・・・〔 I
〕 〔式中R及びR_1は前記式(A)及び(B)と同義で
ある〕で表される特性基を含有するシリコーンフェノー
ル系化合物と、エポキシ系化合物、付加型イミド系化合
物、イソシアネート系化合物又はヘキサメチレンテトラ
ミンとを包含する樹脂組成物を有効成分とする熱硬化性
組成物であることを特徴とする樹脂封止型半導体装置。[Claims] 1. A repeating unit represented by the following general formula (A): ▲There are mathematical formulas, chemical formulas, tables, etc.▼...(A) (in the formula, R represents hydrogen or a lower alkyl group) a novolak-type phenolic compound having
The following general formula (B): ▲There are mathematical formulas, chemical formulas, tables, etc.▼... (B) (In the formula, R_1 is the same or different, H, hydroxyl group, methyl group or phenyl group, Y is reactive with phenolic hydroxyl group The following general formula [
I〕:▲There are mathematical formulas, chemical formulas, tables, etc.▼・・・〔I
] [In the formula, R and R_1 have the same meanings as the above formulas (A) and (B)] A silicone phenol compound containing a characteristic group, an epoxy compound, an addition type imide compound, an isocyanate compound or hexamethylenetetramine. 2. In a resin-encapsulated semiconductor device encapsulated with a synthetic resin encapsulant, the encapsulant has the following general formula (A): ▲There are mathematical formulas, chemical formulas, tables, etc.▼...(A) A novolak-type phenol compound having a repeating unit represented by (in the formula, R represents hydrogen or a lower alkyl group),
The following general formula (B): ▲There are mathematical formulas, chemical formulas, tables, etc.▼... (B) (In the formula, R_1 is the same or different, H, hydroxyl group, methyl group or phenyl group, Y is reactive with phenolic hydroxyl group (x represents a number from 0 to 1000) with the following general formula
I〕:▲There are mathematical formulas, chemical formulas, tables, etc.▼・・・〔I
] [In the formula, R and R_1 have the same meanings as the above formulas (A) and (B)] A silicone phenol compound containing a characteristic group, an epoxy compound, an addition type imide compound, an isocyanate compound or hexamethylenetetramine as an active ingredient.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2969987A JPS6322853A (en) | 1987-02-13 | 1987-02-13 | Siliconephenolic compound composition and use thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2969987A JPS6322853A (en) | 1987-02-13 | 1987-02-13 | Siliconephenolic compound composition and use thereof |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57203776A Division JPS5993729A (en) | 1982-11-22 | 1982-11-22 | Silicone phenolic compound, its preparation and composition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6322853A true JPS6322853A (en) | 1988-01-30 |
Family
ID=12283358
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2969987A Pending JPS6322853A (en) | 1987-02-13 | 1987-02-13 | Siliconephenolic compound composition and use thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6322853A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008179819A (en) * | 2000-10-13 | 2008-08-07 | Hitachi Chem Co Ltd | Flame-retardant resin composition, prepreg using it, laminated board, metal-clad laminated board, printed wiring board and multi-layer printed wiring board |
JP2012153829A (en) * | 2011-01-27 | 2012-08-16 | Iteq Corp | Halogen-free epoxy resin composition, prepreg and printed circuit board made using the same |
CN102731744A (en) * | 2011-03-31 | 2012-10-17 | 太阳控股株式会社 | Conductive resin combination |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5821417A (en) * | 1981-07-29 | 1983-02-08 | Shin Etsu Chem Co Ltd | Curable epoxy composition |
JPS5847014A (en) * | 1981-09-17 | 1983-03-18 | Shin Etsu Chem Co Ltd | Epoxy-silicone resin composition |
-
1987
- 1987-02-13 JP JP2969987A patent/JPS6322853A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5821417A (en) * | 1981-07-29 | 1983-02-08 | Shin Etsu Chem Co Ltd | Curable epoxy composition |
JPS5847014A (en) * | 1981-09-17 | 1983-03-18 | Shin Etsu Chem Co Ltd | Epoxy-silicone resin composition |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008179819A (en) * | 2000-10-13 | 2008-08-07 | Hitachi Chem Co Ltd | Flame-retardant resin composition, prepreg using it, laminated board, metal-clad laminated board, printed wiring board and multi-layer printed wiring board |
JP2011099113A (en) * | 2000-10-13 | 2011-05-19 | Hitachi Chem Co Ltd | Incombustible resin composition, and prepreg, laminated plate, metal-clad laminated plate, printed wiring board and multi-layer printed wiring board using the same |
JP2012153829A (en) * | 2011-01-27 | 2012-08-16 | Iteq Corp | Halogen-free epoxy resin composition, prepreg and printed circuit board made using the same |
CN102731744A (en) * | 2011-03-31 | 2012-10-17 | 太阳控股株式会社 | Conductive resin combination |
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