JPS63217529A - Production of magnetic recording medium - Google Patents
Production of magnetic recording mediumInfo
- Publication number
- JPS63217529A JPS63217529A JP4867087A JP4867087A JPS63217529A JP S63217529 A JPS63217529 A JP S63217529A JP 4867087 A JP4867087 A JP 4867087A JP 4867087 A JP4867087 A JP 4867087A JP S63217529 A JPS63217529 A JP S63217529A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic recording
- ferromagnetic metal
- recording medium
- film layer
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 40
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 239000002184 metal Substances 0.000 claims abstract description 33
- 229910052751 metal Inorganic materials 0.000 claims abstract description 33
- 230000005294 ferromagnetic effect Effects 0.000 claims abstract description 32
- 239000010408 film Substances 0.000 claims abstract description 30
- 239000010409 thin film Substances 0.000 claims abstract description 24
- 230000001590 oxidative effect Effects 0.000 claims abstract description 11
- 239000000758 substrate Substances 0.000 claims abstract description 10
- 238000007664 blowing Methods 0.000 claims abstract description 3
- 238000000034 method Methods 0.000 claims description 19
- 238000007738 vacuum evaporation Methods 0.000 claims description 7
- 238000007740 vapor deposition Methods 0.000 claims description 5
- 230000015572 biosynthetic process Effects 0.000 claims description 4
- 238000004544 sputter deposition Methods 0.000 claims description 4
- 229910045601 alloy Inorganic materials 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims description 3
- 238000007737 ion beam deposition Methods 0.000 claims description 3
- 238000007733 ion plating Methods 0.000 claims description 3
- 239000007789 gas Substances 0.000 abstract description 11
- 229910052760 oxygen Inorganic materials 0.000 abstract description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 6
- 239000001301 oxygen Substances 0.000 abstract description 6
- 229920001721 polyimide Polymers 0.000 abstract description 5
- 229910000599 Cr alloy Inorganic materials 0.000 abstract description 3
- 230000008021 deposition Effects 0.000 abstract description 3
- 238000001704 evaporation Methods 0.000 abstract description 3
- 230000008020 evaporation Effects 0.000 abstract description 3
- 238000007792 addition Methods 0.000 abstract 1
- 230000003449 preventive effect Effects 0.000 abstract 1
- 230000001681 protective effect Effects 0.000 description 6
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 5
- 229910001882 dioxygen Inorganic materials 0.000 description 5
- -1 nickel oxide Chemical class 0.000 description 5
- 229910052804 chromium Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000005415 magnetization Effects 0.000 description 3
- 229910020630 Co Ni Inorganic materials 0.000 description 2
- 229910002440 Co–Ni Inorganic materials 0.000 description 2
- 229910018104 Ni-P Inorganic materials 0.000 description 2
- 229910018536 Ni—P Inorganic materials 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- 229910020598 Co Fe Inorganic materials 0.000 description 1
- 229910002519 Co-Fe Inorganic materials 0.000 description 1
- 229910020708 Co—Pd Inorganic materials 0.000 description 1
- 229910020707 Co—Pt Inorganic materials 0.000 description 1
- 229910020516 Co—V Inorganic materials 0.000 description 1
- 229910017061 Fe Co Inorganic materials 0.000 description 1
- 229910002593 Fe-Ti Inorganic materials 0.000 description 1
- 229910017112 Fe—C Inorganic materials 0.000 description 1
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- 229910018054 Ni-Cu Inorganic materials 0.000 description 1
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- 229910018481 Ni—Cu Inorganic materials 0.000 description 1
- 229910018605 Ni—Zn Inorganic materials 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003302 ferromagnetic material Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000001883 metal evaporation Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- FPVKHBSQESCIEP-JQCXWYLXSA-N pentostatin Chemical compound C1[C@H](O)[C@@H](CO)O[C@H]1N1C(N=CNC[C@H]2O)=C2N=C1 FPVKHBSQESCIEP-JQCXWYLXSA-N 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は磁気記録媒体に係わり、さらに詳しくは耐摩耗
性が良好で耐久性に優れた信頼性の高い強磁性金属薄膜
を有する磁気記録媒体の製造方法に関する。[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to a magnetic recording medium, and more specifically, a magnetic recording medium having a highly reliable ferromagnetic metal thin film with good wear resistance and excellent durability. Relating to a manufacturing method.
真空蒸着法、スパッタリング法あるいはメッキ法などで
作られるＣｏ−Ｎｉ、 Ｇｏ−Ｃｒ、 Ｇｏ−Ｎｉ−Ｐ
などの強磁性体薄膜を有する、いわゆるＣ。Co-Ni, Go-Cr, Go-Ni-P made by vacuum evaporation, sputtering, plating, etc.
The so-called C has a ferromagnetic thin film such as.
を主成分とする強磁性金属薄膜型の磁気記録媒体は、高
密度磁気記録に適した優れた磁気特性を持つ反面、耐摩
耗性に劣るという欠点があり実用上問題になっている。Although ferromagnetic metal thin film type magnetic recording media mainly composed of ferromagnetic metal have excellent magnetic properties suitable for high-density magnetic recording, they have the drawback of poor wear resistance, which has become a practical problem.
特に、垂直磁気記録用のＣ。In particular, C for perpendicular magnetic recording.
−Ｃｒ系磁性膜、ハードディスク用のＣｏ−Ｎｉ系磁性
膜など、Ｃｏを主成分として酸素濃度が１０原子％以゛
下含有する磁性膜を有する磁気記録媒体においては耐摩
耗性が悪く、磁気ヘッドなどとの摺接によって磁性膜が
摩耗あるいは損傷を受は易く、そのため磁気記録媒体と
しての耐久性ならびに信頼性が劣るという欠点があった
。この欠点を解消するために、例えばポリエステルやポ
リスチレンなどの高分子物質からなる保護膜、あるいは
種々の金属保護膜を磁性膜の上に設けることが試みられ
ているが、前者においては磁性膜との接着力が弱いため
に剥離され易いという欠点があり、後者においては金属
の保護膜が軟らかいために十分な耐摩耗性が得られない
という問題があった。- Magnetic recording media with magnetic films containing Co as a main component and an oxygen concentration of 10 atomic % or less, such as Cr-based magnetic films and Co-Ni-based magnetic films for hard disks, have poor wear resistance, and magnetic heads The magnetic film is easily abraded or damaged due to sliding contact with other objects such as the like, and as a result, the durability and reliability of the magnetic recording medium are poor. In order to overcome this drawback, attempts have been made to provide a protective film made of polymeric substances such as polyester or polystyrene, or various metal protective films on the magnetic film, but in the former case, They have the disadvantage that they are easily peeled off due to their weak adhesive strength, and in the latter case, there is a problem that sufficient abrasion resistance cannot be obtained because the metal protective film is soft.
また、金属の酸化物、例えば酸化ニッケルの保護膜を設
けた磁気記録媒体が特開昭５９−１９３５３６号公報に
おいて提案されているが、これらの金属酸化物からなる
保護膜は硬さの点においては十分であるが、かなり脆い
ために磁気ヘッドなどとの摺接によって削り取られてし
まい、磁気記録媒体としての耐久性に劣るという欠点が
あり、さらに、磁性膜の形成と保護膜の形成という２つ
の工程が必要であり量産性に問題があった。Furthermore, a magnetic recording medium provided with a protective film of a metal oxide, such as nickel oxide, has been proposed in Japanese Patent Application Laid-Open No. 59-193536, but these protective films made of metal oxides have a hardness. Although this is sufficient, it has the disadvantage that it is quite brittle and can be scraped off by sliding contact with a magnetic head, resulting in inferior durability as a magnetic recording medium. This method requires two steps, which poses problems in mass production.
また、酸素などを主成分とする酸化性ガス雰囲気中での
プラズマによる酸化処理、あるいはオゾン雰囲気中での
酸化処理によって、強磁性金属薄膜層の最表面に含まれ
ているＣＯを酸化して保護膜とする方法が種々提案され
ている（特開昭５８−１７５４４号公報、同５８−４１
４３９号公報、同５８−２６３１９号公報、同５８−２
６３２２号公報、同５８−１３３６２８号公報）。In addition, the CO contained in the outermost surface of the ferromagnetic metal thin film layer is oxidized and protected by plasma oxidation treatment in an oxidizing gas atmosphere containing oxygen as the main component, or oxidation treatment in an ozone atmosphere. Various methods have been proposed for forming films (Japanese Patent Application Laid-open No. 58-17544, 58-41).
Publication No. 439, Publication No. 58-26319, Publication No. 58-2
No. 6322, No. 58-133628).
しかし、これらの方法では強磁性金属薄膜層の表面に形
成されるＣｏの酸化層は、厚さが薄いため耐摩耗性保護
膜として必ずしも十分でなく、強磁性金属薄膜層の表面
に十分な膜厚の安定した耐摩耗性の酸化層を形成させる
ためには長時間処理が必要となり、そのため磁気記録媒
体の量産性が非常に悪いという問題があった。However, in these methods, since the Co oxide layer formed on the surface of the ferromagnetic metal thin film layer is thin, it is not necessarily sufficient as a wear-resistant protective film. In order to form a wear-resistant oxide layer with a stable thickness, a long treatment time is required, which poses a problem in that the mass production of magnetic recording media is extremely poor.
本発明は、上述した従来技術における強磁性金属薄膜型
磁気記録媒体の耐摩耗性に劣るという問題点を解消し、
耐摩耗性に優れた強磁性金属薄膜層を有する磁気記録媒
体を量産性よく製造する方法を提供することを目的とす
る。The present invention solves the problem of poor wear resistance of ferromagnetic metal thin film magnetic recording media in the prior art described above,
An object of the present invention is to provide a method for mass-producing a magnetic recording medium having a ferromagnetic metal thin film layer with excellent wear resistance.
上記本発明の目的は、真空蒸着法、スパッタリング法、
イオンプレーティング法、イオンビームデポジション法
などのベーパデポジション法によって、非磁性基体上に
、磁気記録層である強磁性金属薄膜層を形成させる場合
に、上記強磁性金属薄膜層の表面部分が形成される部位
に酸化性ガスを吹き付けることによって、強磁性金属薄
膜層の表面に酸化物を含む層を形成させることにより、
達成される。The purpose of the present invention is to use a vacuum evaporation method, a sputtering method,
When a ferromagnetic metal thin film layer, which is a magnetic recording layer, is formed on a nonmagnetic substrate by a vapor deposition method such as an ion plating method or an ion beam deposition method, the surface portion of the ferromagnetic metal thin film layer is By spraying an oxidizing gas onto the ferromagnetic metal thin film layer to form a layer containing an oxide on the surface of the ferromagnetic metal thin film layer,
achieved.
そして１本発明の方法により強磁性金属薄膜層を形成さ
せる場合に、特に成膜速度を５００Å／ｓ以上とすると
、吹き付けた酸化性ガスが、強磁性金属蒸気によってシ
ールドされて１強磁性金属薄膜層の内部が形成される部
位に酸化性ガスが拡散するのを防止できるので、強磁性
金属薄膜層内部における酸化性ガスによる結晶配向の乱
れを防ぐことができ磁気特性の低下を招くことがない。When a ferromagnetic metal thin film layer is formed by the method of the present invention, especially when the film formation rate is set to 500 Å/s or more, the blown oxidizing gas is shielded by the ferromagnetic metal vapor and the ferromagnetic metal thin film layer is Since it is possible to prevent oxidizing gas from diffusing into the area where the inside of the layer is formed, it is possible to prevent the crystal orientation from being disturbed by the oxidizing gas inside the ferromagnetic metal thin film layer, thereby preventing deterioration of magnetic properties. .
上記成膜速度は速い程、酸化性ガスの拡散防止効果は大
きくなるが、その上限は、使用するベーパデポジション
装置の成膜能力の限界まで許される。The higher the film formation rate, the greater the effect of preventing the diffusion of oxidizing gas, but its upper limit is allowed up to the limit of the film formation capacity of the vapor deposition apparatus used.
本発明の強磁性金属薄膜層を形成する強磁性材料は、Ｃ
ｏ、Ｎｉ、Ｆａなどの単体金属もしくはこれらを主成分
とする合金、例えばＦｅ−Ｃｏ、Ｆｅ−３ｉ、Ｆｅ−Ｒ
ｈ、Ｆｅ−Ｖ、Ｆｅ−Ｔｉ、Ｆｅ−Ｃ。The ferromagnetic material forming the ferromagnetic metal thin film layer of the present invention is C
Single metals such as O, Ni, and Fa, or alloys containing these as main components, such as Fe-Co, Fe-3i, and Fe-R
h, Fe-V, Fe-Ti, Fe-C.
−Ｃｒ、 Ｃｏ−Ｐ、 Ｃｒｏ−Ｂ、 Ｃｏ−３Ｌ、
Ｃｏ−Ｖ、Ｇｏ−Ｙ、 Ｃｏ−８＋ａ、 Ｇｏ−Ｍｎ、
Ｃｏ−Ｐｄ、Ｃｏ −Ｐｔ、 Ｇｏ−Ｔｉ、 Ｃｏ−
５ｂ、 Ｃｏ−Ｆｅ、 Ｇｏ−Ｆｅ−Ｎｉ、Ｇｏ−Ｎｉ
、Ｃｏ−Ｎｉ−８ｂ、Ｇｏ−Ｎｉ−Ｐ、Ｇｏ−Ｎｉ−Ｂ
、Ｇｏ−Ｃｒ、Ｃｏ−Ｎｉ−Ｃｒ、Ｃｏ−Ｎｉ−Ａｇ、
Ｇｏ−Ｎｉ−Ｐｄ、 Ｇｏ−Ｎｉ−Ｚｎ、 Ｇ。-Cr, Co-P, Cro-B, Co-3L,
Co-V, Go-Y, Co-8+a, Go-Mn,
Co-Pd, Co-Pt, Go-Ti, Co-
5b, Co-Fe, Go-Fe-Ni, Go-Ni
, Co-Ni-8b, Go-Ni-P, Go-Ni-B
, Go-Cr, Co-Ni-Cr, Co-Ni-Ag,
Go-Ni-Pd, Go-Ni-Zn, G.
−Ｃｕ、Ｃｏ−Ｎｉ−Ｃｕ、Ｇｏ−Ｗ、Ｃｏ−Ｎ１−Ｗ
、Ｃｏ−Ｍｎ−Ｐ、Ｃｏ−５ｕ＋−Ｃｕ、Ｇｏ−Ｎｉ−
Ｚｎ−Ｐ、Ｃｏ−Ｎｉ−Ｍｏ−Ｃｒ、Ｃｏ−Ｖ−Ｃｒな
どを用いることができ、これらを真空蒸着、イオンプレ
ーティング、スパッタリング、イオンビームデポジショ
ン法などのベーパデポジション法によって基体上に形成
させることができる。-Cu, Co-Ni-Cu, Go-W, Co-N1-W
, Co-Mn-P, Co-5u+-Cu, Go-Ni-
Zn-P, Co-Ni-Mo-Cr, Co-V-Cr, etc. can be used, and these can be deposited onto a substrate by a vapor deposition method such as vacuum evaporation, ion plating, sputtering, or ion beam deposition method. can be formed.
本発明の方法において、強磁性金属薄膜層の表面部に形
成させる酸化物を含む層の膜厚は、５０〜５００人の範
囲が好ましく、より好ましい範囲は１００〜２００人で
ある。上記膜厚が５０人未満であると耐摩耗性の向上効
果が少なく、また５００人を超えるとスペーシングロス
が大きくなるので好ましくない。In the method of the present invention, the thickness of the layer containing an oxide formed on the surface of the ferromagnetic metal thin film layer is preferably in the range of 50 to 500 layers, and more preferably in the range of 100 to 200 layers. If the film thickness is less than 50, the effect of improving wear resistance will be small, and if it exceeds 500, spacing loss will increase, which is not preferable.
本発明の方法に用いる酸化性ガスは、酸素、酸素リッチ
ガス、空気、あるいはＨｅ、Ａｒなどの不活性ガス、ま
たはＮ２などに希釈された酸素ガスを用いることができ
る。The oxidizing gas used in the method of the present invention may be oxygen, oxygen-rich gas, air, an inert gas such as He or Ar, or oxygen gas diluted with N2 or the like.
また、本発明の方法が適用できる磁気記録媒体は、ポリ
エチレンテレフタレート、ポリエステル、ポリイミド、
ポリアミド、ポリ塩化ビニルなどの合成樹脂製のフィル
ムあるいはＡＡ、ＡＩ１合金、Ｔｉ、Ｔｉ合金、ステン
レスなどの金属板を基体とするテープ、シート、カード
、ディスク状などの種々の形態の磁気記録媒体を包含す
る。Further, magnetic recording media to which the method of the present invention can be applied include polyethylene terephthalate, polyester, polyimide,
Magnetic recording media in various forms such as tapes, sheets, cards, and disks are based on films made of synthetic resins such as polyamide and polyvinyl chloride, or metal plates such as AA, AI1 alloy, Ti, Ti alloy, and stainless steel. include.
以下に本発明の一実施例を挙げ１図面に基づいてさらに
詳細に説明する。An embodiment of the present invention will be described below in more detail based on one drawing.
第２図に示す真空蒸着装置を用い、第１図に示す断面構
造の垂直磁化膜を有する磁気記録媒体を作製した。なお
、第３図は、第２図に示した真空蒸着装置の要部（蒸着
部）拡大図である。図に示すごとく、真空排気系４によ
って高真空に保たれた真空槽５内において、送り出しロ
ール６から送り出されたポリイミドフィルムの基体１は
、２５０℃に加熱された円筒状キャンロール７に沿って
移動した後、巻き取りロール８によって巻き取られる。A magnetic recording medium having a perpendicularly magnetized film having the cross-sectional structure shown in FIG. 1 was manufactured using the vacuum evaporation apparatus shown in FIG. In addition, FIG. 3 is an enlarged view of the main part (evaporation part) of the vacuum evaporation apparatus shown in FIG. 2. As shown in the figure, in a vacuum chamber 5 maintained at a high vacuum by an evacuation system 4, a polyimide film substrate 1 sent out from a delivery roll 6 is moved along a cylindrical can roll 7 heated to 250°C. After moving, it is wound up by a winding roll 8.
このとき１円筒状キャンロール７の下部に配置されてい
るＧｏ−２０ａｔ％Ｃｒ合金からなる強磁性金属の蒸発
源９を加熱し１強磁性金属を蒸発させて、防着板１０に
よって強磁性金属蒸気流のポリイミドフィルムの基体１
に対する入射角を制御すると共に、酸素ガス導入口１１
から、垂直磁化膜の表面部分が形成される部位Ｐ（第３
図）に向けて、酸素ガスを１００ ｍ Ｑ ／ ｗｉｎ
吹き付けつつ、蒸着速度１０００Å／ｓで、膜厚が３０
００人のＧｏ−２０ａｔ％Ｃｒ合金からなる垂直磁化膜
を有する磁気記録媒体を製造した後、これを打ち抜き、
５インチ径のフロッピーディスクを作製した。At this time, the ferromagnetic metal evaporation source 9 made of Go-20 at% Cr alloy placed at the bottom of the first cylindrical can roll 7 is heated to evaporate the first ferromagnetic metal, and the ferromagnetic metal is Vapor flow polyimide film substrate 1
In addition to controlling the incident angle to the oxygen gas inlet 11
, a portion P where the surface portion of the perpendicular magnetization film is formed (third
100 m Q/win of oxygen gas toward
While spraying, the deposition rate was 1000 Å/s, and the film thickness was 30 Å/s.
After manufacturing a magnetic recording medium having a perpendicular magnetization film made of 00000 Go-20 at% Cr alloy, it was punched out.
A floppy disk with a diameter of 5 inches was prepared.
酸素ガスの導入を省略した以外は、実施例と同様にして
フロッピーディスクを作製した。A floppy disk was produced in the same manner as in the example except that the introduction of oxygen gas was omitted.
以上の実施例および比較例によって作製したフロッピー
ディスクについて、磁気ヘッドをコンタクト状態にして
、記録密度１５０ｋＢＰＩで、再生出力が初期値の半分
になるまでのパス回数を測定し、磁気記録媒体としての
耐摩耗性を評価した。For the floppy disks manufactured according to the above examples and comparative examples, the number of passes until the reproduction output becomes half of the initial value at a recording density of 150 kBPI was measured with the magnetic head in contact state, and the durability as a magnetic recording medium was measured. Wear resistance was evaluated.
その結果を第１表に示す。The results are shown in Table 1.
第 １ 表
第１表から明らかなごとく、本発明の方法によって製造
した磁気記録媒体は、極めて耐摩耗性に優れていること
が判る。Table 1 As is clear from Table 1, the magnetic recording medium manufactured by the method of the present invention has extremely excellent wear resistance.
以上詳細に説明したごとく１本発明の強磁性金属薄膜層
の表面部分が形成される部位に向けて酸化性ガスを吹き
つけることにより、十分な膜厚で安定した組成の耐摩耗
性に優れた酸化物を含む層を極めて容易に形成させるこ
とができるので、耐久性ならびに信頼性の高い磁気記録
媒体を量産性よく安価に製造することができる。As explained in detail above, (1) By blowing an oxidizing gas toward the area where the surface portion of the ferromagnetic metal thin film layer of the present invention is formed, a film with a sufficient thickness and a stable composition with excellent wear resistance can be obtained. Since a layer containing an oxide can be formed extremely easily, a magnetic recording medium with high durability and reliability can be manufactured at low cost with good mass productivity.
第１図は本発明の実施例において作製した磁気記録媒体
の断面構造を示す模式図、第２図は本発明の実施例にお
いて用いた真空蒸着装置の構造を示す模式図、第３図は
第２図に示す真空蒸着装置の要部（蒸着部）拡大図であ
る。
１・・・基体 ２・・・垂直磁化膜３・・
・酸化物を含む層 ４・・・真空排気系５・・・真空
槽 ６・・・送り出しロール７・・・円筒状
キャンロール
８・・・巻き取りロール ９・・・蒸発源１０・・・
防着板 １１・・・酸素ガス導入口Ｐ・・・
垂直磁化膜の表面部分が形成される部位才１ 図
才２図
十３ 図
７−−−日商Ａ大′キＶ〉ロール
９−−一χ、２ミンノ呼叱
１０−−−ア古廂す反
１１−一−ρ襲東ガ°ス溝入口FIG. 1 is a schematic diagram showing the cross-sectional structure of a magnetic recording medium manufactured in an example of the present invention, FIG. 2 is a schematic diagram showing the structure of a vacuum evaporation apparatus used in an example of the present invention, and FIG. FIG. 3 is an enlarged view of the main part (deposition part) of the vacuum evaporation apparatus shown in FIG. 2; 1...Substrate 2...Perpendicular magnetization film 3...
- Layer containing oxide 4... Vacuum exhaust system 5... Vacuum tank 6... Delivery roll 7... Cylindrical can roll 8... Winding roll 9... Evaporation source 10...
Anti-adhesion plate 11...Oxygen gas inlet P...
The part where the surface portion of the perpendicularly magnetized film is formed Figure 1 Figure Figure 2 Figure 7 Sutan 11-1-ρ East Gas Ditch Entrance
Claims (1)
磁性金属薄膜よりなる磁気記録層を形成させて磁気記録
媒体を製造する方法において、上記強磁性金属薄膜層の
表面部分が形成される部位に酸化性ガスを吹き付けなが
ら強磁性金属薄膜層を成膜し、該強磁性金属薄膜層の表
面部分に酸化物を含む層を形成させることを特徴とする
磁気記録媒体の製造法。 ２、ベーパデポジション法が、真空蒸着法、スパッタリ
ング法、イオンプレーティング法、イオンビームデポジ
ション法のうちより選ばれる少なくとも１種の方法であ
り、強磁性金属薄膜層の形成速度が５００Å／ｓ以上で
あることを特徴とする特許請求の範囲第１項に記載の磁
気記録媒体の製造法。 ３、強磁性金属薄膜層が、Ｃｏの単体金属もしくはＣｏ
を主成分とする合金よりなる垂直磁化膜であることを特
徴とする特許請求の範囲第１項または第２項に記載の磁
気記録媒体の製造法。[Claims] 1. A method for manufacturing a magnetic recording medium by forming a magnetic recording layer made of a ferromagnetic metal thin film on a non-magnetic substrate by a vapor deposition method, wherein the surface portion of the ferromagnetic metal thin film layer is 1. Manufacturing a magnetic recording medium characterized by forming a ferromagnetic metal thin film layer while blowing an oxidizing gas onto a region where oxidizing gas is formed, and forming a layer containing an oxide on the surface portion of the ferromagnetic metal thin film layer. Law. 2. The vapor deposition method is at least one method selected from vacuum evaporation, sputtering, ion plating, and ion beam deposition, and the formation rate of the ferromagnetic metal thin film layer is 500 Å/s. A method for manufacturing a magnetic recording medium according to claim 1, which is characterized in that the method is as follows. 3. The ferromagnetic metal thin film layer is a simple metal of Co or Co
3. The method of manufacturing a magnetic recording medium according to claim 1, wherein the magnetic recording medium is a perpendicularly magnetized film made of an alloy containing as a main component.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4867087A JPS63217529A (en) | 1987-03-05 | 1987-03-05 | Production of magnetic recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4867087A JPS63217529A (en) | 1987-03-05 | 1987-03-05 | Production of magnetic recording medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63217529A true JPS63217529A (en) | 1988-09-09 |
Family
ID=12809761
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4867087A Pending JPS63217529A (en) | 1987-03-05 | 1987-03-05 | Production of magnetic recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63217529A (en) |
-
1987
- 1987-03-05 JP JP4867087A patent/JPS63217529A/en active Pending
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