JPS632136B2 - - Google Patents
Info
- Publication number
- JPS632136B2 JPS632136B2 JP14554082A JP14554082A JPS632136B2 JP S632136 B2 JPS632136 B2 JP S632136B2 JP 14554082 A JP14554082 A JP 14554082A JP 14554082 A JP14554082 A JP 14554082A JP S632136 B2 JPS632136 B2 JP S632136B2
- Authority
- JP
- Japan
- Prior art keywords
- photomask
- pattern
- reticle
- patterns
- reticle pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007689 inspection Methods 0.000 claims description 42
- 230000003287 optical effect Effects 0.000 claims description 25
- 230000000052 comparative effect Effects 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 14
- 238000012795 verification Methods 0.000 claims description 9
- 230000001678 irradiating effect Effects 0.000 claims description 4
- 230000007246 mechanism Effects 0.000 description 15
- 239000000758 substrate Substances 0.000 description 9
- 238000012545 processing Methods 0.000 description 8
- 230000002950 deficient Effects 0.000 description 7
- 230000007547 defect Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 239000000428 dust Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000012360 testing method Methods 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57145540A JPS58168228A (ja) | 1982-08-24 | 1982-08-24 | フオトマスクの比較検査方法と装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57145540A JPS58168228A (ja) | 1982-08-24 | 1982-08-24 | フオトマスクの比較検査方法と装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58168228A JPS58168228A (ja) | 1983-10-04 |
JPS632136B2 true JPS632136B2 (US06272168-20010807-M00014.png) | 1988-01-18 |
Family
ID=15387546
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57145540A Granted JPS58168228A (ja) | 1982-08-24 | 1982-08-24 | フオトマスクの比較検査方法と装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58168228A (US06272168-20010807-M00014.png) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50127574A (US06272168-20010807-M00014.png) * | 1974-03-27 | 1975-10-07 | ||
JPS5354479A (en) * | 1976-10-28 | 1978-05-17 | Toshiba Corp | Comparative inspecting apparatus of pattern plate |
JPS5619622A (en) * | 1979-07-26 | 1981-02-24 | Fujitsu Ltd | Photomask comparison inspecting mechanism |
JPS5639516A (en) * | 1979-09-10 | 1981-04-15 | Fujitsu Ltd | Comparative inspecting mechanism of photomask |
-
1982
- 1982-08-24 JP JP57145540A patent/JPS58168228A/ja active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50127574A (US06272168-20010807-M00014.png) * | 1974-03-27 | 1975-10-07 | ||
JPS5354479A (en) * | 1976-10-28 | 1978-05-17 | Toshiba Corp | Comparative inspecting apparatus of pattern plate |
JPS5619622A (en) * | 1979-07-26 | 1981-02-24 | Fujitsu Ltd | Photomask comparison inspecting mechanism |
JPS5639516A (en) * | 1979-09-10 | 1981-04-15 | Fujitsu Ltd | Comparative inspecting mechanism of photomask |
Also Published As
Publication number | Publication date |
---|---|
JPS58168228A (ja) | 1983-10-04 |
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