JPS6320243B2 - - Google Patents
Info
- Publication number
- JPS6320243B2 JPS6320243B2 JP7563880A JP7563880A JPS6320243B2 JP S6320243 B2 JPS6320243 B2 JP S6320243B2 JP 7563880 A JP7563880 A JP 7563880A JP 7563880 A JP7563880 A JP 7563880A JP S6320243 B2 JPS6320243 B2 JP S6320243B2
- Authority
- JP
- Japan
- Prior art keywords
- acid
- group
- bis
- phenyl
- maleimidophenoxy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 150000001875 compounds Chemical class 0.000 claims description 12
- 239000011342 resin composition Substances 0.000 claims description 11
- 229910052739 hydrogen Inorganic materials 0.000 claims description 8
- 239000001257 hydrogen Substances 0.000 claims description 8
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 8
- BJELTSYBAHKXRW-UHFFFAOYSA-N 2,4,6-triallyloxy-1,3,5-triazine Chemical compound C=CCOC1=NC(OCC=C)=NC(OCC=C)=N1 BJELTSYBAHKXRW-UHFFFAOYSA-N 0.000 claims description 7
- 229920006015 heat resistant resin Polymers 0.000 claims description 7
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 4
- 125000003545 alkoxy group Chemical group 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052794 bromium Inorganic materials 0.000 claims description 4
- 239000000460 chlorine Substances 0.000 claims description 4
- 229910052801 chlorine Inorganic materials 0.000 claims description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 4
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 claims description 4
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims description 4
- 239000002253 acid Substances 0.000 description 14
- -1 diamine compound Chemical class 0.000 description 10
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 9
- 150000008064 anhydrides Chemical class 0.000 description 9
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 9
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 150000007513 acids Chemical class 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- 239000004641 Diallyl-phthalate Substances 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229920006337 unsaturated polyester resin Polymers 0.000 description 3
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- AYKYXWQEBUNJCN-UHFFFAOYSA-N 3-methylfuran-2,5-dione Chemical compound CC1=CC(=O)OC1=O AYKYXWQEBUNJCN-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- ATHHXGZTWNVVOU-UHFFFAOYSA-N N-methylformamide Chemical compound CNC=O ATHHXGZTWNVVOU-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 125000005907 alkyl ester group Chemical group 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 2
- ZQMIGQNCOMNODD-UHFFFAOYSA-N diacetyl peroxide Chemical compound CC(=O)OOC(C)=O ZQMIGQNCOMNODD-UHFFFAOYSA-N 0.000 description 2
- 150000002009 diols Chemical class 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 125000000623 heterocyclic group Chemical group 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- FSQQTNAZHBEJLS-UPHRSURJSA-N maleamic acid Chemical compound NC(=O)\C=C/C(O)=O FSQQTNAZHBEJLS-UPHRSURJSA-N 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 239000012778 molding material Substances 0.000 description 2
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- 150000002978 peroxides Chemical class 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- WLJVNTCWHIRURA-UHFFFAOYSA-N pimelic acid Chemical compound OC(=O)CCCCCC(O)=O WLJVNTCWHIRURA-UHFFFAOYSA-N 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000003505 polymerization initiator Substances 0.000 description 2
- YPFDHNVEDLHUCE-UHFFFAOYSA-N propane-1,3-diol Chemical compound OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229920002050 silicone resin Polymers 0.000 description 2
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 239000002966 varnish Substances 0.000 description 2
- WRXCBRHBHGNNQA-UHFFFAOYSA-N (2,4-dichlorobenzoyl) 2,4-dichlorobenzenecarboperoxoate Chemical compound ClC1=CC(Cl)=CC=C1C(=O)OOC(=O)C1=CC=C(Cl)C=C1Cl WRXCBRHBHGNNQA-UHFFFAOYSA-N 0.000 description 1
- OXYKVVLTXXXVRT-UHFFFAOYSA-N (4-chlorobenzoyl) 4-chlorobenzenecarboperoxoate Chemical compound C1=CC(Cl)=CC=C1C(=O)OOC(=O)C1=CC=C(Cl)C=C1 OXYKVVLTXXXVRT-UHFFFAOYSA-N 0.000 description 1
- ZQHJVIHCDHJVII-OWOJBTEDSA-N (e)-2-chlorobut-2-enedioic acid Chemical compound OC(=O)\C=C(\Cl)C(O)=O ZQHJVIHCDHJVII-OWOJBTEDSA-N 0.000 description 1
- PNNFEYPWPCDLOC-UPHRSURJSA-N (z)-2,3-dichlorobut-2-enedioic acid Chemical compound OC(=O)C(\Cl)=C(\Cl)C(O)=O PNNFEYPWPCDLOC-UPHRSURJSA-N 0.000 description 1
- ROLAGNYPWIVYTG-UHFFFAOYSA-N 1,2-bis(4-methoxyphenyl)ethanamine;hydrochloride Chemical compound Cl.C1=CC(OC)=CC=C1CC(N)C1=CC=C(OC)C=C1 ROLAGNYPWIVYTG-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- UICXTANXZJJIBC-UHFFFAOYSA-N 1-(1-hydroperoxycyclohexyl)peroxycyclohexan-1-ol Chemical compound C1CCCCC1(O)OOC1(OO)CCCCC1 UICXTANXZJJIBC-UHFFFAOYSA-N 0.000 description 1
- AYMDJPGTQFHDSA-UHFFFAOYSA-N 1-(2-ethenoxyethoxy)-2-ethoxyethane Chemical compound CCOCCOCCOC=C AYMDJPGTQFHDSA-UHFFFAOYSA-N 0.000 description 1
- XSZYESUNPWGWFQ-UHFFFAOYSA-N 1-(2-hydroperoxypropan-2-yl)-4-methylcyclohexane Chemical compound CC1CCC(C(C)(C)OO)CC1 XSZYESUNPWGWFQ-UHFFFAOYSA-N 0.000 description 1
- XJBSYHZLEOIPEJ-UHFFFAOYSA-N 1-[4-[2,6-dibromo-4-[2-[3,5-dibromo-4-[4-(2,5-dioxopyrrol-1-yl)phenoxy]phenyl]-1,1,1,3,3,3-hexafluoropropan-2-yl]phenoxy]phenyl]pyrrole-2,5-dione Chemical compound C=1C(Br)=C(OC=2C=CC(=CC=2)N2C(C=CC2=O)=O)C(Br)=CC=1C(C(F)(F)F)(C(F)(F)F)C(C=C1Br)=CC(Br)=C1OC(C=C1)=CC=C1N1C(=O)C=CC1=O XJBSYHZLEOIPEJ-UHFFFAOYSA-N 0.000 description 1
- OGPFZTQPAAOEAG-UHFFFAOYSA-N 1-[4-[2-bromo-4-[1-[3-bromo-4-[4-(2,5-dioxopyrrol-1-yl)phenoxy]phenyl]ethyl]phenoxy]phenyl]pyrrole-2,5-dione Chemical compound C=1C=C(OC=2C=CC(=CC=2)N2C(C=CC2=O)=O)C(Br)=CC=1C(C)C(C=C1Br)=CC=C1OC(C=C1)=CC=C1N1C(=O)C=CC1=O OGPFZTQPAAOEAG-UHFFFAOYSA-N 0.000 description 1
- QMQYJRMHXYICMD-UHFFFAOYSA-N 1-[4-[2-bromo-4-[2-[3-bromo-4-[4-(2,5-dioxopyrrol-1-yl)phenoxy]phenyl]propan-2-yl]phenoxy]phenyl]pyrrole-2,5-dione Chemical compound C=1C=C(OC=2C=CC(=CC=2)N2C(C=CC2=O)=O)C(Br)=CC=1C(C)(C)C(C=C1Br)=CC=C1OC(C=C1)=CC=C1N1C(=O)C=CC1=O QMQYJRMHXYICMD-UHFFFAOYSA-N 0.000 description 1
- MKVPTXFTWXTKBN-UHFFFAOYSA-N 1-[4-[2-bromo-4-[[3-bromo-4-[4-(2,5-dioxopyrrol-1-yl)phenoxy]phenyl]methyl]phenoxy]phenyl]pyrrole-2,5-dione Chemical compound C=1C=C(OC=2C=CC(=CC=2)N2C(C=CC2=O)=O)C(Br)=CC=1CC(C=C1Br)=CC=C1OC(C=C1)=CC=C1N1C(=O)C=CC1=O MKVPTXFTWXTKBN-UHFFFAOYSA-N 0.000 description 1
- ACJJFTVZJOVGSN-UHFFFAOYSA-N 1-[4-[2-butan-2-yl-4-[2-[3-butan-2-yl-4-[4-(2,5-dioxopyrrol-1-yl)phenoxy]phenyl]propan-2-yl]phenoxy]phenyl]pyrrole-2,5-dione Chemical compound CCC(C)C1=CC(C(C)(C)C=2C=C(C(OC=3C=CC(=CC=3)N3C(C=CC3=O)=O)=CC=2)C(C)CC)=CC=C1OC(C=C1)=CC=C1N1C(=O)C=CC1=O ACJJFTVZJOVGSN-UHFFFAOYSA-N 0.000 description 1
- MSMRYSXMPLWMFH-UHFFFAOYSA-N 1-[4-[2-butyl-4-[2-[3-butyl-4-[4-(2,5-dioxopyrrol-1-yl)phenoxy]phenyl]propan-2-yl]phenoxy]phenyl]pyrrole-2,5-dione Chemical compound CCCCC1=CC(C(C)(C)C=2C=C(CCCC)C(OC=3C=CC(=CC=3)N3C(C=CC3=O)=O)=CC=2)=CC=C1OC(C=C1)=CC=C1N1C(=O)C=CC1=O MSMRYSXMPLWMFH-UHFFFAOYSA-N 0.000 description 1
- LRLKRMWSHCJOQL-UHFFFAOYSA-N 1-[4-[2-chloro-4-[1-[3-chloro-4-[4-(2,5-dioxopyrrol-1-yl)phenoxy]phenyl]ethyl]phenoxy]phenyl]pyrrole-2,5-dione Chemical compound C=1C=C(OC=2C=CC(=CC=2)N2C(C=CC2=O)=O)C(Cl)=CC=1C(C)C(C=C1Cl)=CC=C1OC(C=C1)=CC=C1N1C(=O)C=CC1=O LRLKRMWSHCJOQL-UHFFFAOYSA-N 0.000 description 1
- UTUDZIVGWZEXJH-UHFFFAOYSA-N 1-[4-[2-chloro-4-[2-[3-chloro-4-[4-(2,5-dioxopyrrol-1-yl)phenoxy]phenyl]propan-2-yl]phenoxy]phenyl]pyrrole-2,5-dione Chemical compound C=1C=C(OC=2C=CC(=CC=2)N2C(C=CC2=O)=O)C(Cl)=CC=1C(C)(C)C(C=C1Cl)=CC=C1OC(C=C1)=CC=C1N1C(=O)C=CC1=O UTUDZIVGWZEXJH-UHFFFAOYSA-N 0.000 description 1
- TVIXEYAIMZLQSY-UHFFFAOYSA-N 1-[4-[2-chloro-4-[[3-chloro-4-[4-(2,5-dioxopyrrol-1-yl)phenoxy]phenyl]methyl]phenoxy]phenyl]pyrrole-2,5-dione Chemical compound C=1C=C(OC=2C=CC(=CC=2)N2C(C=CC2=O)=O)C(Cl)=CC=1CC(C=C1Cl)=CC=C1OC(C=C1)=CC=C1N1C(=O)C=CC1=O TVIXEYAIMZLQSY-UHFFFAOYSA-N 0.000 description 1
- LDQRVPVSQDLCBY-UHFFFAOYSA-N 1-[4-[4-[1,1,1,3,3,3-hexachloro-2-[4-[4-(2,5-dioxopyrrol-1-yl)phenoxy]phenyl]propan-2-yl]phenoxy]phenyl]pyrrole-2,5-dione Chemical compound C=1C=C(OC=2C=CC(=CC=2)N2C(C=CC2=O)=O)C=CC=1C(C(Cl)(Cl)Cl)(C(Cl)(Cl)Cl)C(C=C1)=CC=C1OC(C=C1)=CC=C1N1C(=O)C=CC1=O LDQRVPVSQDLCBY-UHFFFAOYSA-N 0.000 description 1
- OJDDBNNNPILOKG-UHFFFAOYSA-N 1-[4-[4-[1-[4-[4-(2,5-dioxopyrrol-1-yl)phenoxy]-3-methylphenyl]ethyl]-2-methylphenoxy]phenyl]pyrrole-2,5-dione Chemical compound C=1C=C(OC=2C=CC(=CC=2)N2C(C=CC2=O)=O)C(C)=CC=1C(C)C(C=C1C)=CC=C1OC(C=C1)=CC=C1N1C(=O)C=CC1=O OJDDBNNNPILOKG-UHFFFAOYSA-N 0.000 description 1
- VZBQHKQTICAEPG-UHFFFAOYSA-N 1-[4-[4-[1-[4-[4-(2,5-dioxopyrrol-1-yl)phenoxy]phenyl]ethyl]phenoxy]phenyl]pyrrole-2,5-dione Chemical compound C=1C=C(OC=2C=CC(=CC=2)N2C(C=CC2=O)=O)C=CC=1C(C)C(C=C1)=CC=C1OC(C=C1)=CC=C1N1C(=O)C=CC1=O VZBQHKQTICAEPG-UHFFFAOYSA-N 0.000 description 1
- UMMCCUYTTMFIPQ-UHFFFAOYSA-N 1-[4-[4-[1-[4-[4-(2,5-dioxopyrrol-1-yl)phenoxy]phenyl]propyl]phenoxy]phenyl]pyrrole-2,5-dione Chemical compound C=1C=C(OC=2C=CC(=CC=2)N2C(C=CC2=O)=O)C=CC=1C(CC)C(C=C1)=CC=C1OC(C=C1)=CC=C1N1C(=O)C=CC1=O UMMCCUYTTMFIPQ-UHFFFAOYSA-N 0.000 description 1
- XRHJTQFPYUPMRJ-UHFFFAOYSA-N 1-[4-[4-[2-[4-[4-(2,5-dioxopyrrol-1-yl)phenoxy]-3-ethylphenyl]propan-2-yl]-2-ethylphenoxy]phenyl]pyrrole-2,5-dione Chemical compound CCC1=CC(C(C)(C)C=2C=C(CC)C(OC=3C=CC(=CC=3)N3C(C=CC3=O)=O)=CC=2)=CC=C1OC(C=C1)=CC=C1N1C(=O)C=CC1=O XRHJTQFPYUPMRJ-UHFFFAOYSA-N 0.000 description 1
- YKSGJSKYCBPXDT-UHFFFAOYSA-N 1-[4-[4-[2-[4-[4-(2,5-dioxopyrrol-1-yl)phenoxy]-3-methoxyphenyl]propan-2-yl]-2-methoxyphenoxy]phenyl]pyrrole-2,5-dione Chemical compound COC1=CC(C(C)(C)C=2C=C(OC)C(OC=3C=CC(=CC=3)N3C(C=CC3=O)=O)=CC=2)=CC=C1OC(C=C1)=CC=C1N1C(=O)C=CC1=O YKSGJSKYCBPXDT-UHFFFAOYSA-N 0.000 description 1
- SLHJINOEGOLHQE-UHFFFAOYSA-N 1-[4-[4-[2-[4-[4-(2,5-dioxopyrrol-1-yl)phenoxy]-3-methylphenyl]propan-2-yl]-2-methylphenoxy]phenyl]pyrrole-2,5-dione Chemical compound CC1=CC(C(C)(C)C=2C=C(C)C(OC=3C=CC(=CC=3)N3C(C=CC3=O)=O)=CC=2)=CC=C1OC(C=C1)=CC=C1N1C(=O)C=CC1=O SLHJINOEGOLHQE-UHFFFAOYSA-N 0.000 description 1
- OVBYYBVBCLQSQZ-UHFFFAOYSA-N 1-[4-[4-[2-[4-[4-(2,5-dioxopyrrol-1-yl)phenoxy]-3-propan-2-ylphenyl]propan-2-yl]-2-propan-2-ylphenoxy]phenyl]pyrrole-2,5-dione Chemical compound CC(C)C1=CC(C(C)(C)C=2C=C(C(OC=3C=CC(=CC=3)N3C(C=CC3=O)=O)=CC=2)C(C)C)=CC=C1OC(C=C1)=CC=C1N1C(=O)C=CC1=O OVBYYBVBCLQSQZ-UHFFFAOYSA-N 0.000 description 1
- IAKITQMGMOKJGX-UHFFFAOYSA-N 1-[4-[4-[2-[4-[4-(2,5-dioxopyrrol-1-yl)phenoxy]-3-propylphenyl]propan-2-yl]-2-propylphenoxy]phenyl]pyrrole-2,5-dione Chemical compound CCCC1=CC(C(C)(C)C=2C=C(CCC)C(OC=3C=CC(=CC=3)N3C(C=CC3=O)=O)=CC=2)=CC=C1OC(C=C1)=CC=C1N1C(=O)C=CC1=O IAKITQMGMOKJGX-UHFFFAOYSA-N 0.000 description 1
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- HNEGQIOMVPPMNR-NSCUHMNNSA-N mesaconic acid Chemical compound OC(=O)C(/C)=C/C(O)=O HNEGQIOMVPPMNR-NSCUHMNNSA-N 0.000 description 1
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- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
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- 239000001294 propane Substances 0.000 description 1
- ULWHHBHJGPPBCO-UHFFFAOYSA-N propane-1,1-diol Chemical compound CCC(O)O ULWHHBHJGPPBCO-UHFFFAOYSA-N 0.000 description 1
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- 150000003839 salts Chemical class 0.000 description 1
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- 241000894007 species Species 0.000 description 1
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- SWAXTRYEYUTSAP-UHFFFAOYSA-N tert-butyl ethaneperoxoate Chemical compound CC(=O)OOC(C)(C)C SWAXTRYEYUTSAP-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
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- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- 238000005809 transesterification reaction Methods 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- GRPURDFRFHUDSP-UHFFFAOYSA-N tris(prop-2-enyl) benzene-1,2,4-tricarboxylate Chemical compound C=CCOC(=O)C1=CC=C(C(=O)OCC=C)C(C(=O)OCC=C)=C1 GRPURDFRFHUDSP-UHFFFAOYSA-N 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
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- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical compound [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 235000014692 zinc oxide Nutrition 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Description
本発明は耐熱性樹脂組成物に関し、詳しくは、
常温付近では貯蔵安定性にすぐれ、しかも速硬化
性を有する耐熱性樹脂組成物に関する。
近年、電気機器あるいは電子機器の大容量化、
小型軽量化、高信頼化または生産性向上に伴な
い、耐熱性のすぐれた絶縁材料が要求されてい
る。
従来、耐熱性樹脂としては、ポリイミドを代表
とするヘテロ環種合体やシリコーン樹脂などが知
られている。しかし、ヘテロ環重合体の多くは縮
合型であり、硬化時に揮発成分を生ずるとか、成
形性が劣るとか、硬化に長時間を要するとか、ワ
ニスなどの使用分野ではある特定の極性溶媒しか
使用できないなど種々難点があり、特に成形材
料、積層材料あるいは粉体材料の分野では制約が
ある。
他方、シリコーン樹脂は、高温における機械的
強度が低く、密着性が劣ること、透湿性が大きい
ことなどのために、これも用途が限られる。
これらの欠点を改善するものとしては、ポリイ
ミドとエポキシ化合物、不飽和ポリエステルなど
を併用して用いることが知られている。しかし、
この場合にも、速硬化性の付与、各種溶媒に対す
る溶解性、材料コストなどに問題がある。
本発明は、上記の現状に鑑みてなされたもので
あり、その目的は、比較的低温(150〜200℃)
で、短時間(1〜30分間)加熱するだけで、高温
強度のすぐれた硬化物に転化し、室温付近の温度
では貯蔵安定性にすぐれ、しかも低圧成形ができ
る耐熱性、可撓性にすぐれた樹脂組成物を提供す
ることである。
本発明は、上記の目的達成のため、次の構成を
とるものである。すなわち、本発明の耐熱性樹脂
組成物は、
一般式〔〕
〔式中R1〜R4は水素、低級アルキル基、低級
アルコキシ基、塩素または臭素を示し、互いに同
じであつても異なつていてもよい。R5およびR6
は水素、メチル基、エチル基、トリフルオロメチ
ル基、またはトリクロロメチル基であり、互いに
同じであつても異なつていてもよい〕で表わされ
るエーテルイミド系化合物100重量部と、トリア
リルシアヌレート系化合物5〜500重量部とから
なる耐熱性樹脂組成物である。
一般式〔〕で表されるエーテルイミド系化合
物は、
一般式〔〕
〔式中、R1〜R4は水素、低級アルキル基、低
級アルコキシ基、塩素または臭素を示し、互いに
同じであつても異なつていてもよい。R5および
R6は水素、メチル基、エチル基、トリフルオロ
メチル基またはトリクロロメチル基であり、互い
に同じであつても異なつていてもよい。〕で表わ
されるエーテル結合を有するジアミソ化合物と、
一般式〔〕
〔式中、Dは2個の炭素原子をもつ2価の基で
ある〕で表わされるエチレン性不飽和ジカルボソ
酸無水物を反応させることにより得られる。
また、一般式〔〕で表わされるエチレン性不
飽和ジカルボン酸無水物としては、例えば無水マ
レイン酸、無水シトラコン酸、無水イタコン酸、
無水ピロシンコン酸、無水ジクロルマレイン酸、
あるいはこれらの化合物と、シクロジエンとの
Dielo・Alder付加物などの少なくとも1種が用
いられる。
前記、一般式〔〕、と〔〕より、一般式
〔〕を得る反応方法については、特に限定しな
いが、第1段階で、式〔〕
〔式中、R1〜R4は水素、低級アルキル基、低
級アルコキシ基、塩素または臭素を示し、互いに
同じであつても異なつていてもよい。R5及びR6
は水素、メチル基、エチル基、トリフルオルメチ
ル基またはトリクロルメチル基であり、互いに同
じであつても異なつていてもよい。Dは2ないし
24個の炭素原子をもつ2価の有機基である。〕で
表わされる、エーテルマレインアミド酸を製造す
る。このためには公知の方法が適用される。
有利な方法は、一般式〔〕のエーテル結合を
有するジアミン化合物、および一般式〔〕のエ
チレン性不飽和カルボン酸無水物を、両者の溶剤
である有機液体中で接触させることからなる。
通常、一般に用いられている溶剤としては、ジ
メチルホルムアミド、ジメチルアセトアミド、ジ
メチルスルホキシド、N―メチルピロリドン、N
―メチルカプロラクタム、テトラヒビロフラン、
ジオキサン、アセトン、ジエチルケトンなどがあ
る。
次に、第2段階としては、エーテルマレインア
ミド酸を環化脱水させてイミド環を生成させる方
法としては、U.S.P3018290号、U.S.P3018292号
およびU.S.P3127414号などに記載の公知の方法
を用いればよい。
式〔〕のアミド酸からの脱水は、無水物とし
て、無水酢酸を、アミド酸基1モル当り、1.05な
いし1.5モルの量で用いて、第3アミンをアミド
酸基1モルに対して0.15ないし0.5モル(例えば
トリエチルアミン)を添加し、更に触媒としてア
ミド酸基1モルに対して、0.5ないし0.05モルの
酢酸ニツケルの存在下でアセトン中で行なうとよ
い。
本発明の一般式〔〕で表わされるエーテルイ
ミド系化合物としては、例えば2,2―ビス〔4
―(4―マレイミドフエノキシ)フエニル〕プロ
パン、2,2―ビス〔3―メチル―4―(4―マ
レイミドフエノキシ)フエニル〕プロパン、2,
2―ビス〔3―クロロ―4―(4―マレイミドフ
エノキシ)フエニル〕プロパン、2,2―ビス
〔3―ブロモ―4―(4―マレイミドフエノキシ)
フエニル〕プロパン、2,2―ビス〔3―エチル
―4―(4―マレイミドフエノキシ)フエニル〕
プロパン、2,2―ビス〔3―プロピル―4―
(4―マレイミドフエノキシ)フエニル〕プロパ
ン、2,2―ビス〔3―イソプロピル―4―(4
―マレイミドフエノキシ)フエニル〕プロパン、
2,2―ビス〔3―ブチル―4―(4―マレイミ
ドフエノキシ)フエニル〕プロパン、2,2―ビ
ス〔3―sec―ブチル―4―(4―マレイミドフ
エノキシ)フエニル〕プロパン、2,2―ビス
〔3―メトキシ―4―(4―マレイミドフエノキ
シ)フエニル〕プロパン、1,1―ビス〔4―
(4―マレイミドフエノキシ)フエニル〕エタン、
1,1―ビス〔3―メチル―4―(4―マレイミ
ドフエノキシ)フエニル〕エタン、1,1―ビス
〔3―クロロ―4―(4―マレイミドフエノキシ)
フエニル〕エタン、1,1―ビス〔3―ブロモ―
4―(4―マレイミドフエノキシ)フエニル〕エ
タン、ビス〔4―(4―マレイミドフエノキシ)
フエニル〕メタン、ビス〔3―メチル―4―(4
―マレイミドフエノキシ)フエニル〕メタン、ビ
ス〔3―クロロ―4―(4―マレイミドフエノキ
シ)フエニル〕メタン、ビス〔3―ブロモ―4―
(4―マレイミドフエノキシ)フエニル〕メタン、
1,1,1,3,3,3―ヘキサフルオロ―2,
2―ビス〔4―(4―マレイミドフエノキシ)フ
エニル〕プロパン、1,1,1,3,3,3―ヘ
キサクロロ―2,2―ビス〔4―(4―マレイミ
ドフエノキシ)フエニル〕プロパン、3,3―ビ
ス〔4―(4―マレイミドフエノキシ)フエニ
ル〕ペンタン、1,1―ビス〔4―(4―マレイ
ミドフエノキシ)フエニル〕プロパン、1,1,
1,3,3,3―ヘキサフルオロ―2,2―ビス
〔3,5―ジブロモ―4(4―マレイミドフエノキ
シ)フエニル〕プロパン、1,1,1,3,3,
3―ヘキサフルオロ―2,2―ビス〔3―メチル
―4(4―マレイミドフエノキシ)フエニル〕プ
ロパンなどがあり、これらの1種以上用いること
が出来る。
この発明に用いることのできるトリアリルシア
ヌレート系化合物とは多価カルボン酸またはシア
ヌル酸のアリルエステルが好ましく、例えばトリ
アリルトリメリテート、ジアリルフタレート、ジ
アリルイソフタレート、P・P―ジアリロキシカ
ルボニルジフエニルエーテル、m,p′―ジアリロ
キシカルボニルジフエニルエーテル、o,p′―ジ
アリロキシカルボニルジフエニルエーテル、トリ
アリルシアヌレート、トリアリルシアヌレートプ
レポリマなどがある。これらの多価カルボン酸ア
リルエステルは多種混合して用いることもでき
る。
本発明において、一般式〔〕で表わされるエ
ーテルイミド系化合物に対する多価カルボン酸ア
リルエステルの使用割合は、使用目的に応じてそ
の量比は決定されるが、一般的には、エーテルイ
ミド系化合物100重量部に対して、多価カルボン
酸アリルエステル類5〜500重量部であり、望ま
しくは50〜350重量部が成形加工性および硬化樹
脂の特性上好ましい。
また、本発明の樹脂組成物には不飽和ポリエス
テル樹脂を添加することも出来る。
本発明でいう不飽和ポリエステル樹脂とは、不
飽和二塩基酸、飽和二塩基酸およびその無水物ま
たはこれらの低級アルキルエステル誘導体等とジ
オールまたはアルキレンモノオキサイドおよびそ
の誘導体等から、触媒の存在または不存在下にエ
ステル化、エステル交換等の反応を利用して縮合
または付加重合することによつて合成された不飽
和基を含有するポリエステル樹脂母体と、エチレ
ン系(例えばビニル基、アリル基等)の重合性化
合物、ならびに過酸化物触媒との混合物からなる
ものである。この他に、ビスフエノールA型なら
びにノボラツク型等のエポキシ化合物とメタアク
リル酸またはアクリル酸と反応して得られるビニ
ルエステル系樹脂も有用である。
ここで、前記不飽和二塩基酸、飽和二塩基酸の
代表的なものとしてはマレイン酸、無水マレイン
酸、フマール酸、クロロマレイン酸、ジクロロマ
レイン酸、シトラコン酸、無水シトラコン酸、メ
サコン酸、イタコン酸、コハク酸、アジピン酸、
セバシン酸、アゼライン酸、フタール酸、無水フ
タール酸、イソフタール酸、テレフタール酸、無
水メチルグルタル酸、ピメリン酸、ヘキサヒドロ
フタル酸および、その無水物、テトラヒドロフタ
ル酸、無水カーピツク酸、ヘツト酸およびその無
水物、テトラクロロフタール酸およびその無水
物、テトラブロムフタール酸およびその無水物、
これらの低級アルキルエステル等が使用され、ジ
オール成分としてはエチレングリコール、ジエチ
レングリコール、トリエチレングリコール、ポリ
エチレングリコール、プロピレングリコール、ジ
プロピレングリコール、トリメチレングリコー
ル、テトラメチレングリコール、ヘキサメチレン
グリコール、2,2―ジエチルプロパンジオー
ル、1,3―ネオペンチルグリコール、ジブロム
ネオペンチルグリコール、ビスフエノールジオキ
シエチルエーテル、水素化ビスフエノールA、
2,2―ジ(4―ヒドロキシプロポキシフエニ
ル)プロパン、エチレンオキサイド、プロピレン
オキサイド、3,3,3―トリクロロプロピレン
オキサイド、フエニルグリシジルエーテル、アリ
ルグリシジルエーテル等が使用される。また、必
要に応じ、本発明の目的を損なわない範囲で、3
官能以上の多塩基酸およびまたは多価アルコール
を併用してもよい。
架橋剤としては例えばスチレン、ビニルトルエ
ン、α―メチルスチレン、ジビニルベンゼン、ジ
アリルフタレート、ジアリルフタレートプレポリ
マ、クロルスチレン、ジクロルスチレン、ジアリ
ルベンゼンホスホネート、ジアリルアリールホス
フイル酸エステル、アクリル酸エステル、メタア
クリル酸エステル、トリアリルシアヌレート、ト
リアリルシアヌレートプレポリマ、トリブロモフ
エノールアリルエーテルなどが用いられる。
本発明において、酸成分、アルコール成分、架
橋剤は1種に限定するものではなく2種以上の併
用も可能である。また、各種の変性および変性剤
の添加も可能である。また、不飽和ポリエステル
樹脂も1種に限定するするものではなく2種以上
の混合も可能である。
本発明の樹脂組成物には、短時間の加熱によつ
てその硬化を完了させる目的で、重合開始剤を添
加することが望ましい。そのような重合開始剤と
しては、ベンゾイルパーオキシド、p―クロロ―
ベンゾイルパーオキシド、2,4―ジクロロベン
ゾイルパーオキシド、カプリリルパーオキシド、
ラウロイルパーオキシド、アセチルパーオキシ
ド、メチルエチルケトンパーオキシド、シクロヘ
キサノンパーオキシド、ビス(1―ヒドロキシミ
クロヘキシルパーオキシド)、ヒドロキシヘプチ
ルパーオキシド、t―ブチルハイドロパーオキシ
ド、p―メンタンハイドロパーオキシド、t―ブ
チルパーベンゾエート、t―ブチルパーアセテー
ト、t―ブチルパーオクトエート、t―ブチルパ
ーオキシイソブチレート、ジ―t―ブチルジパー
フタレートなどの有機過酸化物が有用であり、そ
の1種または2種以上を用いることができる。
本発明においては、上述の重合触媒に、例えば
メルカプタン類、サルフアイト類、β―ジケトン
類、金属キレート類、金属石酸など公知の促進剤
を併用することも可能である。また樹脂組成物の
室温における貯蔵安定性良宏にするために、例え
ばp―ベンゾキノン、ナフトキノン、フエナント
ラキノンなどのキノン類、ハイドロキノン、p―
t―ブチルカテコール、2,5―ジ―t―ブチル
ハイドロキノンなどのフエノール類や、ニトロ化
合物、金属塩類など公知の重合防止剤を、用途に
応じて使用できる。
さらに、本発明の樹脂組成物には、その用途に
応じて、種々の素材が配合される。
すなわち、例えば成形材料としての用途には、
ジルコン、シリカ、アルミナ、水酸化アルミニウ
ム、ナタニア、亜鉛華、炭酸カルシウム、マグネ
ナイト、クレー、カオリン、タルク、珪砂、カラ
ス、溶融石英ガラス、アスベスト、マイカ、各種
ウイスカー、カーホンフラツク、黒鉛、二硫化モ
リブデンなどのような無機質充填剤、高級脂肪酸
やワツクスなどのような離型剤、エポキシシラ
ン、ビニルシラン、ボランやアルコキシチタネー
ト系化合物などのようなカツプリンク剤が配合さ
れる。また必要に従つて、含ハロゲン化合物、酸
化アンチモンやリン化合物などの難燃性付与剤な
どを用いることができる。
またワニスなどのように、溶液として使用する
こともできる。その際用いられる溶剤としては、
N―メタル―2―ピロリドン、N,N―ジメチル
アセトアミド、N,N―ジメチルホルムアミド、
N,N―ジメチルホルムアミド、N―メチルホル
ムアミド、ジメチルスルホオキシド、N,N―ジ
エチルアセトアミド、N,N―ジメチルメトキシ
アセトアミド、ヘキサメチルフオスホルアミド、
ピリシン、ジメチルスルホン、テトラメチルスル
ホン、ジメチルテトラメチレンスルホン等があ
り、また、フエノール系溶剤群としは、フエノー
ル、クレゾール、キシレノールなどがある。
以上のものについては単独または2種以上の混
合して使用される。
次に実施例によつて本発明を具体的に説明す
る。
実施例 1〜20
第1表に示した10種類の配合組成物を作製し
た。
各配合組成物は、50〜70℃、10分間混練したの
ち、冷却して目的の耐熱性樹脂組成物を得た。
各組成物を、170℃、70Kg/cm2、5分間の条件
でトランスフア成形して、各種特性測定用試片を
作製した。第1表、第2表に、ガラス転移点、
180℃に於ける曲げ強さ、曲げ弾性率、200℃、30
日放置後の加熱劣化特性、材料の貯蔵安定性を示
した。
いずれの硬化物も、ガラス転移点180℃以上、
180℃の曲げ強さ、400Kg/cm2以上、200℃、30日
放置後の強度保持率80%以上、曲げ弾性率1.30×
103Kg/mm2以下の耐熱性、可撓性にすぐれた特性
を有している。
The present invention relates to a heat-resistant resin composition, and more specifically,
The present invention relates to a heat-resistant resin composition that has excellent storage stability at around room temperature and has fast curing properties. In recent years, the capacity of electrical or electronic equipment has increased,
Insulating materials with excellent heat resistance are required as devices become smaller and lighter, have higher reliability, and improve productivity. Conventionally, as heat-resistant resins, heterocyclic species combinations represented by polyimide, silicone resins, and the like are known. However, most of the heterocyclic polymers are condensation type, and they produce volatile components during curing, have poor moldability, take a long time to cure, and can only be used in certain polar solvents for applications such as varnishes. There are various difficulties, especially in the fields of molding materials, laminated materials, and powder materials. On the other hand, silicone resins have low mechanical strength at high temperatures, poor adhesion, and high moisture permeability, which limits their uses. To improve these drawbacks, it is known to use polyimide in combination with epoxy compounds, unsaturated polyesters, and the like. but,
In this case as well, there are problems in providing fast curing properties, solubility in various solvents, material cost, etc. The present invention has been made in view of the above-mentioned current situation, and its purpose is to
By simply heating it for a short time (1 to 30 minutes), it is converted into a cured product with excellent high-temperature strength, has excellent storage stability at temperatures around room temperature, and has excellent heat resistance and flexibility that can be molded at low pressure. It is an object of the present invention to provide a resin composition that has the following properties. In order to achieve the above object, the present invention has the following configuration. That is, the heat-resistant resin composition of the present invention has the general formula [] [In the formula, R 1 to R 4 represent hydrogen, a lower alkyl group, a lower alkoxy group, chlorine or bromine, and may be the same or different from each other. R5 and R6
is hydrogen, methyl group, ethyl group, trifluoromethyl group, or trichloromethyl group, which may be the same or different] and triallyl cyanurate. It is a heat-resistant resin composition comprising 5 to 500 parts by weight of a type compound. The etherimide compound represented by the general formula [] is the general formula [] [In the formula, R 1 to R 4 represent hydrogen, a lower alkyl group, a lower alkoxy group, chlorine or bromine, and may be the same or different from each other. R5 and
R 6 is hydrogen, a methyl group, an ethyl group, a trifluoromethyl group or a trichloromethyl group, and may be the same or different. ] A diamiso compound having an ether bond represented by the general formula [] It can be obtained by reacting an ethylenically unsaturated dicarboso acid anhydride represented by the following formula: [wherein D is a divalent group having two carbon atoms]. In addition, examples of the ethylenically unsaturated dicarboxylic anhydride represented by the general formula [] include maleic anhydride, citraconic anhydride, itaconic anhydride,
Pyrosinconic anhydride, dichloromaleic anhydride,
Or these compounds and cyclodiene
At least one of Dielo and Alder adducts is used. The reaction method for obtaining the general formula [] from the general formula [], and [] is not particularly limited, but in the first step, the formula [] [In the formula, R 1 to R 4 represent hydrogen, a lower alkyl group, a lower alkoxy group, chlorine or bromine, and may be the same or different from each other. R5 and R6
are hydrogen, a methyl group, an ethyl group, a trifluoromethyl group or a trichloromethyl group, and may be the same or different. D is 2 or
It is a divalent organic group with 24 carbon atoms. ] An ether maleamic acid is produced. Known methods are used for this purpose. An advantageous method consists in bringing into contact a diamine compound having an ether linkage of the general formula [] and an ethylenically unsaturated carboxylic acid anhydride of the general formula [] in an organic liquid which is a solvent for both. Commonly used solvents include dimethylformamide, dimethylacetamide, dimethylsulfoxide, N-methylpyrrolidone, N-methylpyrrolidone,
-Methylcaprolactam, tetrahydrofuran,
Examples include dioxane, acetone, and diethyl ketone. Next, in the second step, a known method described in USP 3018290, USP 3018292, USP 3127414, etc. may be used to generate an imide ring by cyclizing and dehydrating the ether maleamic acid. For dehydration from the amic acid of formula [], acetic anhydride is used as the anhydride in an amount of 1.05 to 1.5 mol per 1 mol of the amic acid group, and a tertiary amine is used in an amount of 0.15 to 1.5 mol per 1 mol of the amic acid group. It is preferable to carry out the reaction in acetone by adding 0.5 mol (for example, triethylamine) and further in the presence of 0.5 to 0.05 mol of nickel acetate per 1 mol of amic acid group as a catalyst. Examples of the etherimide compound represented by the general formula [ ] of the present invention include 2,2-bis[4
-(4-maleimidophenoxy)phenyl]propane, 2,2-bis[3-methyl-4-(4-maleimidophenoxy)phenyl]propane, 2,
2-bis[3-chloro-4-(4-maleimidophenoxy)phenyl]propane, 2,2-bis[3-bromo-4-(4-maleimidophenoxy)
Phenyl] propane, 2,2-bis[3-ethyl-4-(4-maleimidophenoxy) phenyl]
Propane, 2,2-bis[3-propyl-4-
(4-maleimidophenoxy)phenyl]propane, 2,2-bis[3-isopropyl-4-(4
―Maleimidophenoxy)phenyl]propane,
2,2-bis[3-butyl-4-(4-maleimidophenoxy)phenyl]propane, 2,2-bis[3-sec-butyl-4-(4-maleimidophenoxy)phenyl]propane, 2,2-bis[3-methoxy-4-(4-maleimidophenoxy)phenyl]propane, 1,1-bis[4-
(4-maleimidophenoxy)phenyl]ethane,
1,1-bis[3-methyl-4-(4-maleimidophenoxy)phenyl]ethane, 1,1-bis[3-chloro-4-(4-maleimidophenoxy)
phenyl]ethane, 1,1-bis[3-bromo-
4-(4-maleimidophenoxy)phenyl]ethane, bis[4-(4-maleimidophenoxy)
phenyl]methane, bis[3-methyl-4-(4
-maleimidophenoxy)phenyl]methane, bis[3-chloro-4-(4-maleimidophenoxy)phenyl]methane, bis[3-bromo-4-
(4-maleimidophenoxy)phenyl]methane,
1,1,1,3,3,3-hexafluoro-2,
2-bis[4-(4-maleimidophenoxy)phenyl]propane, 1,1,1,3,3,3-hexachloro-2,2-bis[4-(4-maleimidophenoxy)phenyl] Propane, 3,3-bis[4-(4-maleimidophenoxy)phenyl]pentane, 1,1-bis[4-(4-maleimidophenoxy)phenyl]propane, 1,1,
1,3,3,3-hexafluoro-2,2-bis[3,5-dibromo-4(4-maleimidophenoxy)phenyl]propane, 1,1,1,3,3,
Examples include 3-hexafluoro-2,2-bis[3-methyl-4(4-maleimidophenoxy)phenyl]propane, and one or more of these can be used. The triallyl cyanurate compounds that can be used in this invention are preferably allyl esters of polyhydric carboxylic acids or cyanuric acid, such as triallyl trimellitate, diallyl phthalate, diallyl isophthalate, P.P-diallyloxycarbonyl Diphenyl ether, m,p'-diallyloxycarbonyl diphenyl ether, o,p'-diallyloxycarbonyl diphenyl ether, triallyl cyanurate, triallyl cyanurate prepolymer, and the like. These polyhydric carboxylic acid allyl esters can also be used in combination. In the present invention, the ratio of polyhydric carboxylic acid allyl ester to the etherimide compound represented by the general formula [] is determined depending on the purpose of use, but in general, the etherimide compound The polycarboxylic acid allyl ester is used in an amount of 5 to 500 parts by weight, preferably 50 to 350 parts by weight, based on 100 parts by weight in terms of moldability and properties of the cured resin. Moreover, an unsaturated polyester resin can also be added to the resin composition of the present invention. The unsaturated polyester resin as used in the present invention refers to unsaturated dibasic acids, saturated dibasic acids and their anhydrides, or lower alkyl ester derivatives thereof, diols, alkylene monooxides, derivatives thereof, etc., and the presence or absence of a catalyst. A polyester resin base containing unsaturated groups synthesized by condensation or addition polymerization using reactions such as esterification and transesterification in the presence of ethylene-based (e.g. vinyl groups, allyl groups, etc.) It consists of a mixture of a polymerizable compound and a peroxide catalyst. In addition, vinyl ester resins obtained by reacting epoxy compounds such as bisphenol A type and novolac type with methacrylic acid or acrylic acid are also useful. Here, typical unsaturated dibasic acids and saturated dibasic acids include maleic acid, maleic anhydride, fumaric acid, chloromaleic acid, dichloromaleic acid, citraconic acid, citraconic anhydride, mesaconic acid, and itaconic acid. acid, succinic acid, adipic acid,
Sebacic acid, azelaic acid, phthalic acid, phthalic anhydride, isophthalic acid, terephthalic acid, methylglutaric anhydride, pimelic acid, hexahydrophthalic acid and its anhydride, tetrahydrophthalic acid, carpicic anhydride, hectonic acid and its anhydride tetrachlorophthalic acid and its anhydride, tetrabromophthalic acid and its anhydride,
These lower alkyl esters are used, and diol components include ethylene glycol, diethylene glycol, triethylene glycol, polyethylene glycol, propylene glycol, dipropylene glycol, trimethylene glycol, tetramethylene glycol, hexamethylene glycol, and 2,2-diethyl. Propanediol, 1,3-neopentyl glycol, dibromeneopentyl glycol, bisphenol dioxyethyl ether, hydrogenated bisphenol A,
2,2-di(4-hydroxypropoxyphenyl)propane, ethylene oxide, propylene oxide, 3,3,3-trichloropropylene oxide, phenyl glycidyl ether, allyl glycidyl ether, etc. are used. In addition, if necessary, 3
A functional or higher polybasic acid and/or a polyhydric alcohol may be used in combination. Examples of crosslinking agents include styrene, vinyltoluene, α-methylstyrene, divinylbenzene, diallyl phthalate, diallyl phthalate prepolymer, chlorostyrene, dichlorostyrene, diallylbenzenephosphonate, diallylaryl phosphinate, acrylic ester, and methacrylic acid. Acid ester, triallyl cyanurate, triallyl cyanurate prepolymer, tribromophenol allyl ether, etc. are used. In the present invention, the acid component, alcohol component, and crosslinking agent are not limited to one type, and two or more types can be used in combination. Furthermore, various modifications and addition of modifiers are also possible. Further, the unsaturated polyester resin is not limited to one type, but a mixture of two or more types is also possible. It is desirable to add a polymerization initiator to the resin composition of the present invention in order to complete its curing by short-term heating. Such polymerization initiators include benzoyl peroxide, p-chloro-
Benzoyl peroxide, 2,4-dichlorobenzoyl peroxide, caprylyl peroxide,
lauroyl peroxide, acetyl peroxide, methyl ethyl ketone peroxide, cyclohexanone peroxide, bis(1-hydroxy microhexyl peroxide), hydroxyheptyl peroxide, t-butyl hydroperoxide, p-menthane hydroperoxide, t-butyl peroxide Organic peroxides such as benzoate, t-butyl peracetate, t-butyl peroctoate, t-butyl peroxyisobutyrate, and di-t-butyl diperphthalate are useful, and one or more thereof can be used. In the present invention, it is also possible to use, in combination with the above-mentioned polymerization catalyst, known promoters such as mercaptans, sulfites, β-diketones, metal chelates, and metal mineral acids. In addition, in order to improve the storage stability of the resin composition at room temperature, for example, quinones such as p-benzoquinone, naphthoquinone, and phenanthraquinone, hydroquinone, p-
Known polymerization inhibitors such as phenols such as t-butylcatechol and 2,5-di-t-butylhydroquinone, nitro compounds, and metal salts can be used depending on the purpose. Furthermore, various materials may be blended into the resin composition of the present invention depending on its use. That is, for example, for use as a molding material,
Zircon, silica, alumina, aluminum hydroxide, natania, zinc white, calcium carbonate, magneite, clay, kaolin, talc, silica sand, crow, fused silica glass, asbestos, mica, various whiskers, carphone flak, graphite, molybdenum disulfide, etc. Inorganic fillers such as, mold release agents such as higher fatty acids and waxes, and coupling agents such as epoxy silane, vinyl silane, borane and alkoxy titanate compounds are blended. Further, flame retardant imparting agents such as halogen-containing compounds, antimony oxide, and phosphorus compounds can be used as necessary. It can also be used as a solution, such as a varnish. The solvent used in this case is
N-metal-2-pyrrolidone, N,N-dimethylacetamide, N,N-dimethylformamide,
N,N-dimethylformamide, N-methylformamide, dimethylsulfoxide, N,N-diethylacetamide, N,N-dimethylmethoxyacetamide, hexamethylphosphoramide,
Examples of solvents include pyricine, dimethylsulfone, tetramethylsulfone, dimethyltetramethylenesulfone, and phenolic solvents include phenol, cresol, xylenol, and the like. The above materials may be used alone or in combination of two or more. Next, the present invention will be specifically explained with reference to Examples. Examples 1 to 20 Ten types of blended compositions shown in Table 1 were prepared. Each blended composition was kneaded at 50 to 70°C for 10 minutes, and then cooled to obtain the desired heat-resistant resin composition. Each composition was transfer molded at 170° C., 70 kg/cm 2 for 5 minutes to prepare specimens for measuring various characteristics. Tables 1 and 2 show the glass transition point,
Bending strength at 180℃, flexural modulus, 200℃, 30
The heating deterioration characteristics after being left in the sun and the storage stability of the material were shown. All cured products have a glass transition point of 180℃ or higher.
Bending strength at 180℃, 400Kg/ cm2 or more, strength retention after 30 days at 200℃, 80% or more, flexural modulus 1.30×
It has excellent heat resistance of less than 10 3 Kg/mm 2 and flexibility.
【表】【table】
Claims (1)
アルコキシ基、塩素または臭素を示し、互いに同
じであつても異なつていてもよい。R5およびR6
は水素、メチル基、エチル基、トリフルオロメチ
ル基、またはトリクロロメチル基であり、互いに
同じであつても異なつていてもよい〕で表わされ
るエーテルイミド系化合物100重量部と、トリア
リルシアヌレート系化合物5〜500重量部とから
なる耐熱性樹脂組成物。[Claims] 1. General formula [] [In the formula, R 1 to R 4 represent hydrogen, a lower alkyl group, a lower alkoxy group, chlorine or bromine, and may be the same or different from each other. R5 and R6
is hydrogen, methyl group, ethyl group, trifluoromethyl group, or trichloromethyl group, which may be the same or different] and triallyl cyanurate. A heat-resistant resin composition comprising 5 to 500 parts by weight of a type compound.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7563880A JPS572313A (en) | 1980-06-06 | 1980-06-06 | Heat-resistant resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7563880A JPS572313A (en) | 1980-06-06 | 1980-06-06 | Heat-resistant resin composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS572313A JPS572313A (en) | 1982-01-07 |
JPS6320243B2 true JPS6320243B2 (en) | 1988-04-27 |
Family
ID=13581989
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7563880A Granted JPS572313A (en) | 1980-06-06 | 1980-06-06 | Heat-resistant resin composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS572313A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01305427A (en) * | 1988-06-02 | 1989-12-08 | Fujitsu Ltd | Rom card control system |
-
1980
- 1980-06-06 JP JP7563880A patent/JPS572313A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01305427A (en) * | 1988-06-02 | 1989-12-08 | Fujitsu Ltd | Rom card control system |
Also Published As
Publication number | Publication date |
---|---|
JPS572313A (en) | 1982-01-07 |
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