JPS63201692U - - Google Patents
Info
- Publication number
- JPS63201692U JPS63201692U JP9493287U JP9493287U JPS63201692U JP S63201692 U JPS63201692 U JP S63201692U JP 9493287 U JP9493287 U JP 9493287U JP 9493287 U JP9493287 U JP 9493287U JP S63201692 U JPS63201692 U JP S63201692U
- Authority
- JP
- Japan
- Prior art keywords
- cleaning device
- cleaning liquid
- cleaned
- ultrasonic waves
- ultrasonic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 claims description 6
- 239000007788 liquid Substances 0.000 claims description 4
- 238000004506 ultrasonic cleaning Methods 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9493287U JPS63201692U (id) | 1987-06-18 | 1987-06-18 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9493287U JPS63201692U (id) | 1987-06-18 | 1987-06-18 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63201692U true JPS63201692U (id) | 1988-12-26 |
Family
ID=30958896
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9493287U Pending JPS63201692U (id) | 1987-06-18 | 1987-06-18 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63201692U (id) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111151500A (zh) * | 2018-11-08 | 2020-05-15 | 世源科技工程有限公司 | 一种低清洗剂现场容量的掩模板清洗的方法和装置 |
-
1987
- 1987-06-18 JP JP9493287U patent/JPS63201692U/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111151500A (zh) * | 2018-11-08 | 2020-05-15 | 世源科技工程有限公司 | 一种低清洗剂现场容量的掩模板清洗的方法和装置 |