JPS6319853B2 - - Google Patents
Info
- Publication number
- JPS6319853B2 JPS6319853B2 JP21927383A JP21927383A JPS6319853B2 JP S6319853 B2 JPS6319853 B2 JP S6319853B2 JP 21927383 A JP21927383 A JP 21927383A JP 21927383 A JP21927383 A JP 21927383A JP S6319853 B2 JPS6319853 B2 JP S6319853B2
- Authority
- JP
- Japan
- Prior art keywords
- mask
- pattern
- light
- common pattern
- common
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/76—Patterning of masks by imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/44—Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58219273A JPS60111245A (ja) | 1983-11-21 | 1983-11-21 | マスクの製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58219273A JPS60111245A (ja) | 1983-11-21 | 1983-11-21 | マスクの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60111245A JPS60111245A (ja) | 1985-06-17 |
| JPS6319853B2 true JPS6319853B2 (OSRAM) | 1988-04-25 |
Family
ID=16732937
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58219273A Granted JPS60111245A (ja) | 1983-11-21 | 1983-11-21 | マスクの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60111245A (OSRAM) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0250182A (ja) * | 1988-05-30 | 1990-02-20 | Canon Inc | 現像装置 |
-
1983
- 1983-11-21 JP JP58219273A patent/JPS60111245A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0250182A (ja) * | 1988-05-30 | 1990-02-20 | Canon Inc | 現像装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60111245A (ja) | 1985-06-17 |
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