JPS6319569U - - Google Patents
Info
- Publication number
- JPS6319569U JPS6319569U JP11092886U JP11092886U JPS6319569U JP S6319569 U JPS6319569 U JP S6319569U JP 11092886 U JP11092886 U JP 11092886U JP 11092886 U JP11092886 U JP 11092886U JP S6319569 U JPS6319569 U JP S6319569U
- Authority
- JP
- Japan
- Prior art keywords
- container
- liquid supply
- carrier gas
- supply device
- raw material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007788 liquid Substances 0.000 claims description 6
- 239000012159 carrier gas Substances 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 4
- 239000007789 gas Substances 0.000 claims description 3
- 239000000945 filler Substances 0.000 claims description 2
- 239000002994 raw material Substances 0.000 claims 2
- 238000005229 chemical vapour deposition Methods 0.000 claims 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
- C23C16/4483—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material using a porous body
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Description
第１図は本考案の一実施例を示す縦断面図であ
る。 図において、１は容器、２は液供給装置、３は
粗粒状充填材、４ａ，４ｂは発熱体、５は加熱装
置、６はキヤリアガス導入口、７は処理用ガス排
出口である。
る。 図において、１は容器、２は液供給装置、３は
粗粒状充填材、４ａ，４ｂは発熱体、５は加熱装
置、６はキヤリアガス導入口、７は処理用ガス排
出口である。
Claims (1)
- 下部にキヤリアガス導入口、上部に処理用ガス
排出口を有する容器と、該容器内の上下方向中間
部に原料液を供給するための液供給装置と、容器
内部の前記液供給位置上方及び下方に充填される
粗粒状充填材と、前記液供給装置上方及び下方に
おいて容器外側に配置される発熱体と、キヤリア
ガス導入口に供給されるキヤリアガスを加熱する
加熱装置とからなる化学気相蒸着処理原料ガス供
給装置。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11092886U JPH0417561Y2 (ja) | 1986-07-18 | 1986-07-18 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11092886U JPH0417561Y2 (ja) | 1986-07-18 | 1986-07-18 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6319569U true JPS6319569U (ja) | 1988-02-09 |
| JPH0417561Y2 JPH0417561Y2 (ja) | 1992-04-20 |
Family
ID=30990385
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11092886U Expired JPH0417561Y2 (ja) | 1986-07-18 | 1986-07-18 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0417561Y2 (ja) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6181558A (ja) * | 1984-09-27 | 1986-04-25 | Honda Motor Co Ltd | 内燃機関用ピストン |
| JP2007100207A (ja) * | 2005-09-09 | 2007-04-19 | Lintec Co Ltd | 低温度で液体原料を気化させることのできる液体原料の気化方法および該方法を用いた気化器 |
-
1986
- 1986-07-18 JP JP11092886U patent/JPH0417561Y2/ja not_active Expired
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6181558A (ja) * | 1984-09-27 | 1986-04-25 | Honda Motor Co Ltd | 内燃機関用ピストン |
| JPH0423102B2 (ja) * | 1984-09-27 | 1992-04-21 | Honda Motor Co Ltd | |
| JP2007100207A (ja) * | 2005-09-09 | 2007-04-19 | Lintec Co Ltd | 低温度で液体原料を気化させることのできる液体原料の気化方法および該方法を用いた気化器 |
| EP1923485A1 (en) * | 2005-09-09 | 2008-05-21 | Lintec Co., Ltd. | Method for the vaporization of liquid raw material which enables low-temperature vaporization of liquid raw material and vaporizer for the method |
| JP4601535B2 (ja) * | 2005-09-09 | 2010-12-22 | 株式会社リンテック | 低温度で液体原料を気化させることのできる気化器 |
| US7975993B2 (en) | 2005-09-09 | 2011-07-12 | Lintec Co., Ltd | Method for vaporizing liquid material capable of vaporizing liquid material at low temperature and vaporizer using the same |
| TWI406965B (ja) * | 2005-09-09 | 2013-09-01 | ||
| EP1923485B1 (en) * | 2005-09-09 | 2015-10-28 | Lintec Co., Ltd. | Vaporizer. |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0417561Y2 (ja) | 1992-04-20 |