JPS631946B2 - - Google Patents
Info
- Publication number
- JPS631946B2 JPS631946B2 JP55035907A JP3590780A JPS631946B2 JP S631946 B2 JPS631946 B2 JP S631946B2 JP 55035907 A JP55035907 A JP 55035907A JP 3590780 A JP3590780 A JP 3590780A JP S631946 B2 JPS631946 B2 JP S631946B2
- Authority
- JP
- Japan
- Prior art keywords
- pph
- vinylalkyldichlorosilane
- carbon atoms
- alkyl group
- catalyst
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000003054 catalyst Substances 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 125000000217 alkyl group Chemical group 0.000 claims description 9
- 125000004432 carbon atom Chemical group C* 0.000 claims description 8
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims description 7
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims description 7
- 239000002904 solvent Substances 0.000 claims description 6
- 101150003085 Pdcl gene Proteins 0.000 claims description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 11
- -1 vinylpentyldichlorosilanes Chemical class 0.000 description 9
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 6
- NYKYPUSQZAJABL-UHFFFAOYSA-N dichloro(hexyl)silane Chemical compound CCCCCC[SiH](Cl)Cl NYKYPUSQZAJABL-UHFFFAOYSA-N 0.000 description 5
- YLJJAVFOBDSYAN-UHFFFAOYSA-N dichloro-ethenyl-methylsilane Chemical compound C[Si](Cl)(Cl)C=C YLJJAVFOBDSYAN-UHFFFAOYSA-N 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 101100030361 Neurospora crassa (strain ATCC 24698 / 74-OR23-1A / CBS 708.71 / DSM 1257 / FGSC 987) pph-3 gene Proteins 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- YHAYSVXJJPHCRO-UHFFFAOYSA-N but-3-enyl(dichloro)silane Chemical compound Cl[SiH](Cl)CCC=C YHAYSVXJJPHCRO-UHFFFAOYSA-N 0.000 description 3
- KTQYJQFGNYHXMB-UHFFFAOYSA-N dichloro(methyl)silicon Chemical compound C[Si](Cl)Cl KTQYJQFGNYHXMB-UHFFFAOYSA-N 0.000 description 3
- 239000005048 methyldichlorosilane Substances 0.000 description 3
- 238000005481 NMR spectroscopy Methods 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- URLKBWYHVLBVBO-UHFFFAOYSA-N Para-Xylene Chemical group CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- QVOWXLYQBBDGMO-UHFFFAOYSA-N dichloro(oct-1-enyl)silane Chemical compound C(CCCCC)C=C[SiH](Cl)Cl QVOWXLYQBBDGMO-UHFFFAOYSA-N 0.000 description 2
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 2
- 238000004817 gas chromatography Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000009776 industrial production Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 150000003003 phosphines Chemical class 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000007086 side reaction Methods 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium on carbon Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 1
- 229910002666 PdCl2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- XYBABAFBBXGTBF-UHFFFAOYSA-N dichloro(dec-9-enyl)silane Chemical class Cl[SiH](Cl)CCCCCCCCC=C XYBABAFBBXGTBF-UHFFFAOYSA-N 0.000 description 1
- PFMKUUJQLUQKHT-UHFFFAOYSA-N dichloro(ethyl)silicon Chemical compound CC[Si](Cl)Cl PFMKUUJQLUQKHT-UHFFFAOYSA-N 0.000 description 1
- KCDRSBSJSFRARY-UHFFFAOYSA-N dichloro(hex-5-enyl)silane Chemical class Cl[SiH](Cl)CCCCC=C KCDRSBSJSFRARY-UHFFFAOYSA-N 0.000 description 1
- IFBMWELUOJQSAL-UHFFFAOYSA-N dichloro(icos-19-enyl)silane Chemical class C(=C)CCCCCCCCCCCCCCCCCC[SiH](Cl)Cl IFBMWELUOJQSAL-UHFFFAOYSA-N 0.000 description 1
- SQFRBGKYRQGINC-UHFFFAOYSA-N dichloro(oct-7-enyl)silane Chemical class Cl[SiH](Cl)CCCCCCC=C SQFRBGKYRQGINC-UHFFFAOYSA-N 0.000 description 1
- ZXQZWUUHRMCPAK-UHFFFAOYSA-N dichloro(pent-4-enyl)silane Chemical class C(=C)CCC[SiH](Cl)Cl ZXQZWUUHRMCPAK-UHFFFAOYSA-N 0.000 description 1
- XNAFLNBULDHNJS-UHFFFAOYSA-N dichloro(phenyl)silicon Chemical compound Cl[Si](Cl)C1=CC=CC=C1 XNAFLNBULDHNJS-UHFFFAOYSA-N 0.000 description 1
- QDASGLPLQWLMSJ-UHFFFAOYSA-N dichloro-ethenyl-phenylsilane Chemical compound C=C[Si](Cl)(Cl)C1=CC=CC=C1 QDASGLPLQWLMSJ-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000002329 infrared spectrum Methods 0.000 description 1
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000001846 repelling effect Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Description
本発明は、新規なビニルアルキルジクロルシラ
ンの製造法に関するものである。
ビニルアルキルジクロルシランとしては、従来
ビニルメチルジクロルシラン、ビニルエチルジク
ロルシランがあるが、炭素数の多いアルキル基を
有するものは知られていない。一方、その製造法
に関してはメチルジクロルシランもしくはエチル
ジクロルシランとアセチレンとをPd−Al2O3、
Pd−C、Pt−C、などの触媒の存在下で反応し
ビニルメチルジクロルシランもしくはビニルエチ
ルジクロルシランを合成するM.F.Shostakorsli
の方法がケミカルアブストラクト第51巻、1826頁
(1957年)、同52巻、7134b頁(1958年)に記載さ
れている。また、メチルジクロルシランもしくは
フエニルジクロルシランと塩化ビニルを550〜650
℃の高温で反応しビニルメチルジクロルシラン、
ビニルフエニルジクロルシランが生成することが
英国特許752700で知られている。しかし、前者は
副反応が起り易く、生成率が悪い、後者は高温反
応である欠点がある。近年ケイ素化学の発展にと
もなう新しいビニルアルキルジクロルシランの必
要性に鑑み、本発明者らは前述の従来の問題点を
検討し研究を進めた結果、従来存在しなかつたビ
ニルアルキルジクロルシランを副生成物の生成が
少い新しい製造法で得ることに成功した。すなわ
ち本発明の目的は新規なビニルアルキルジクロル
シランの製造法を提供することである。
本発明の新規なビニルアルキルジクロルシラン
は一般式CH2=CHSiRCl2(式中Rは炭素原子数
3個以上のアルキル基を表す。)の製造法は、一
般式RHSiCl2(式中Rは炭素原子数3個以上のア
ルキル基を表す。)で示されるアルキルジクロル
シランとアセチレンをPt(PPh3)4、PdCl2
(PPh3)2、Pd(PPh3)4およびRuCl2(PPh3)4から選
ばれた錯体触媒および溶媒の存在下で反応させる
ことからなる。
本発明のビニルアルキルジクロルシランは、一
般式CH2=CHSiRCl2で示され、式中Rは炭素原
子数3個以上のアルキル基である。アルキル基は
鎖状、分岐状のいずれも含まれる。化合物の例と
しては、ビニルプロピルジクロルシラン類、ビニ
ルブチルジクロルシラン類、ビニルペンチルジク
ロルシラン類、ビニルヘキシルジクロルシラン
類、ビニルヘプチルジクロルシラン類、ビニルオ
クチルジクロルシラン類、ビニルノニルジクロル
シラン類、ビニルデシルジクロルシラン類、ビニ
ルウンデシルジクロルシラン類、ビニルドデシル
ジクロルシラン類、ビニルヘキサデシルジクロル
シラン類、ビニルオクタデシルジクロルシラン
類、ビニルエイコシルジクロルシラン類、などを
あげることができる。
本発明の製造法は、つぎの(1)式で示される反応
によつてビニルアルキルジクロルシラン()が
得られる。
使用するアルキルジクロルシラン()は、特
に制限はないが、アルキル基の炭素原子数が3個
以上が好ましく、より好ましくは炭素数20個以下
である。アセチレンは通常の方法で得られるもの
であれば如何なるものでもよい。触媒としては
Pt(PPh3)4、PdCl2(PPh3)2、Pd(PPh3)4および
RuCl2(PPh3)から選ばれるホスフイン錯体が好
ましく、特にPt(PPh3)4がよい。ホスフイン錯体
でもRhCl(PPh3)3、RhH(PPh3)4、PtCl2
(PPh3)2などはつぎの(2)式に示すような副反応で
ビス(アルキルジクロルシリル)エタン()が
多く生成するので好ましくない。本発明の触媒で
は()の生成はわずかである。
使用する溶媒としては、ベンゼン、トルエン、
キシレンなどの芳香族炭化水素が好ましく、その
使用量は特に限定しないが、好ましくはクロルシ
ラン1に対して溶媒0.3〜5である。触媒濃度は
アルキルジクロルシランに対して0.001〜1モル
%であり、好ましくは0.05〜0.5モル%である。
また、反応温度は特に限定しなくてもよいが、好
ましくは30〜200℃であり、100℃以下の条件が工
業的製造、安全上からも理想的である。
本発明の製造法は回分式、流通式、半回分式の
いずれの方式の装置も使用可能である。たとえ
ば、アルキルジクロルシラン、触媒および溶媒の
混合液中にアセチレンを吹き込むことによつて反
応は進行してビニルアルキルジクロルシランが得
られる。
本発明の新規なビニルアルキルジクロルシラン
はシリコンゴムの架橋剤、重合度増加剤として使
用され加水分解性が改良される。また、メチルビ
ニルジクロルシラン使用に比較して他の樹脂との
相溶性がよく、従来のシリコーンレジンの欠点で
ある塗料を塗つたときのはじき等が防止できると
いう特長が得られる。また、塗膜にするときの乾
燥性や可撓性が改善される。
本発明の製造法の特徴は、従来のビニルメチル
ジクロルシラン、ビニルエチルジクロルシランの
製造法において得られるようなジシリル体の生成
がきわめて少いことであり、アルキルジクロルシ
ランより高い転化率、収率で、従来存在しなかつ
た新規なビニルアルキルジクロルシランが得られ
ることである。また、反応温度が100℃以下の低
温で十分なことは工業的製造、および安全上から
もきわめて有利である。
以下、実施例にて説明する。
実施例 1
冷却機つきのガラス反応器(直径50mm、長さ20
mm)にパラキシレン30ml、n−ヘキシルジクロル
シラン40mmol、触媒〔Pt(PPh3)4〕を該ジクロ
ルシランに対して0.5mol%を仕込み温度80℃に
する。これに乾燥したアセチレンを反応器の底部
より反応液中2時間噴出させる。
反応液をガスクロマトグラフイーで分析し、そ
の結果を表1に示す。反応液を蒸留の結果、沸点
113〜115℃/51mmHgの生成物が78%の収率で得
られた。
この生成物の核磁気共鳴スペクトル(以下
NMRという)は第1図、赤外スペクトル(以下
I.R.という)は第2図であり、n−ヘキシルビニ
ルジクロルシランであることを確認した。
実施例 2
冷却機付きガラス反応器(直径50mm、長さ200
mm)にベンゼン70ml、n−ヘキシルジクロルシラ
ン40mmol、触媒〔PdCl2(PPh3)2〕を該ジクロ
ルシランに対して0.5mol%仕込み、温度80〜90
℃にする。これに対して乾燥したアセチレンを反
応器の底部より反応液中に4.5時間噴出させる。
反応液をガスクロマトグラフイーで分析をし、そ
の結果を表1に示す。
実施例 3〜4
触媒、温度、時間およびベンゼンとn−ヘキシ
ルジクロルシランの量を表1のように代えて、他
は実施例2と同様に行なつた。
比較例 1〜4
触媒、温度、時間およびベンゼンとn−ヘキシ
ルジクロルシランの量を表1のように代えて、他
は実施例2と同様に行なつた。
比較例 5〜6
n−ヘキシルジクロルシランを、メチルジクロ
ルシランに代えて、他は実施例2と同様の方法で
行なつた。その結果を表2に示す。
The present invention relates to a novel method for producing vinylalkyldichlorosilane. Conventional vinylalkyldichlorosilanes include vinylmethyldichlorosilane and vinylethyldichlorosilane, but none having an alkyl group with a large number of carbon atoms are known. On the other hand, regarding its production method, methyldichlorosilane or ethyldichlorosilane and acetylene are combined into Pd-Al 2 O 3 ,
MFShostakorsli synthesizes vinylmethyldichlorosilane or vinylethyldichlorosilane by reacting in the presence of catalysts such as Pd-C, Pt-C, etc.
The method is described in Chemical Abstracts Vol. 51, p. 1826 (1957) and Vol. 52, p. 7134b (1958). In addition, methyldichlorosilane or phenyldichlorosilane and vinyl chloride can be added at a concentration of 550 to 650.
Vinylmethyldichlorosilane, which reacts at high temperatures of °C.
It is known from British Patent 752700 that vinyl phenyldichlorosilane is produced. However, the former has the disadvantage that side reactions are likely to occur and the production rate is low, while the latter requires a high temperature reaction. In view of the need for new vinylalkyldichlorosilanes due to the recent development of silicon chemistry, the present inventors have investigated the above-mentioned conventional problems and have proceeded with research. We succeeded in obtaining it using a new manufacturing method that produces fewer by-products. That is, an object of the present invention is to provide a novel method for producing vinylalkyldichlorosilane. The novel vinylalkyldichlorosilane of the present invention has the general formula CH 2 =CHSiRCl 2 (in the formula, R represents an alkyl group having 3 or more carbon atoms). represents an alkyl group having 3 or more carbon atoms) and acetylene as Pt(PPh 3 ) 4 , PdCl 2
(PPh 3 ) 2 , Pd(PPh 3 ) 4 and RuCl 2 (PPh 3 ) 4 in the presence of a complex catalyst and a solvent. The vinylalkyldichlorosilane of the present invention is represented by the general formula CH 2 =CHSiRCl 2 , where R is an alkyl group having 3 or more carbon atoms. The alkyl group includes both chain and branched alkyl groups. Examples of compounds include vinylpropyldichlorosilanes, vinylbutyldichlorosilanes, vinylpentyldichlorosilanes, vinylhexyldichlorosilanes, vinylheptyldichlorosilanes, vinyloctyldichlorosilanes, vinyl nonyl Dichlorosilanes, vinyldecyldichlorosilanes, vinylundecyldichlorosilanes, vinyldodecyldichlorosilanes, vinylhexadecyldichlorosilanes, vinyloctadecyldichlorosilanes, vinyleicosyldichlorosilanes, etc. can be given. In the production method of the present invention, vinylalkyldichlorosilane () is obtained by the reaction represented by the following formula (1). The alkyldichlorosilane () to be used is not particularly limited, but the alkyl group preferably has 3 or more carbon atoms, more preferably 20 or less carbon atoms. Any acetylene can be used as long as it can be obtained by a conventional method. As a catalyst
Pt( PPh3 ) 4 , PdCl2 ( PPh3 ) 2 , Pd( PPh3 ) 4 and
Phosphine complexes selected from RuCl 2 (PPh 3 ) are preferred, particularly Pt(PPh 3 ) 4 . Even the phosphine complexes RhCl(PPh 3 ) 3 , RhH(PPh 3 ) 4 , PtCl 2
(PPh 3 ) 2 and the like are not preferred because they produce a large amount of bis(alkyldichlorosilyl)ethane () in a side reaction as shown in the following formula (2). The catalyst of the present invention produces only a small amount of (). Solvents used include benzene, toluene,
Aromatic hydrocarbons such as xylene are preferred, and the amount used is not particularly limited, but is preferably 0.3 to 5 parts of the solvent per 1 part of chlorosilane. The catalyst concentration is 0.001 to 1 mol%, preferably 0.05 to 0.5 mol%, based on the alkyldichlorosilane.
Further, the reaction temperature is not particularly limited, but is preferably 30 to 200°C, and conditions of 100°C or lower are ideal from the viewpoint of industrial production and safety. In the production method of the present invention, any apparatus of batch type, flow type, or semi-batch type can be used. For example, by bubbling acetylene into a mixture of alkyldichlorosilane, catalyst, and solvent, the reaction proceeds to yield vinylalkyldichlorosilane. The novel vinylalkyldichlorosilane of the present invention is used as a crosslinking agent and polymerization degree increasing agent for silicone rubber to improve its hydrolyzability. In addition, compared to the use of methylvinyldichlorosilane, it has better compatibility with other resins, and has the advantage of preventing repelling of paint when applied, which is a drawback of conventional silicone resins. Furthermore, drying properties and flexibility when forming a coating film are improved. A feature of the production method of the present invention is that the production of disilyl compounds obtained in conventional production methods of vinylmethyldichlorosilane and vinylethyldichlorosilane is extremely small, and the conversion rate is higher than that of alkyldichlorosilane. , a novel vinylalkyldichlorosilane, which has not previously existed, can be obtained with a high yield. Furthermore, it is extremely advantageous from the viewpoint of industrial production and safety that the reaction temperature is sufficient at a low temperature of 100° C. or less. Examples will be described below. Example 1 Glass reactor with cooler (diameter 50 mm, length 20
30 ml of paraxylene, 40 mmol of n-hexyldichlorosilane, and 0.5 mol % of catalyst [Pt(PPh 3 ) 4 ] based on the dichlorosilane were added to the mixture and the temperature was raised to 80°C. Dry acetylene is then spouted into the reaction solution from the bottom of the reactor for 2 hours. The reaction solution was analyzed by gas chromatography, and the results are shown in Table 1. As a result of distilling the reaction solution, the boiling point
A 78% yield of product was obtained at 113-115°C/51 mmHg. The nuclear magnetic resonance spectrum of this product (below
Figure 1 shows the infrared spectrum (hereinafter referred to as NMR).
IR) is shown in Figure 2, and it was confirmed that it was n-hexylvinyldichlorosilane. Example 2 Glass reactor with cooler (diameter 50 mm, length 200 mm)
70 ml of benzene, 40 mmol of n-hexyldichlorosilane, and 0.5 mol% of the catalyst [PdCl 2 (PPh 3 ) 2 ] based on the dichlorosilane were added to the solution at a temperature of 80 to 90 mm).
℃. On the other hand, dry acetylene is jetted into the reaction solution from the bottom of the reactor for 4.5 hours.
The reaction solution was analyzed by gas chromatography, and the results are shown in Table 1. Examples 3-4 The same procedure as in Example 2 was carried out except that the catalyst, temperature, time, and amounts of benzene and n-hexyldichlorosilane were changed as shown in Table 1. Comparative Examples 1 to 4 The same procedures as in Example 2 were carried out except that the catalyst, temperature, time, and amounts of benzene and n-hexyldichlorosilane were changed as shown in Table 1. Comparative Examples 5-6 The same method as in Example 2 was carried out except that n-hexyldichlorosilane was replaced with methyldichlorosilane. The results are shown in Table 2.
【表】【table】
【表】
溶媒 キシレン
〔A′〕=CH3SiCl2CH=CH2
〔B′〕=(CH3SiCl2CH2)CH2
[Table] Solvent xylene
[A′]=CH 3 SiCl 2 CH=CH 2
[B′]=(CH 3 SiCl 2 CH 2 )CH 2
第1図はn−ヘキシルビニルジクロルシランの
I.R.、第2図はそのNMRである。
Figure 1 shows n-hexylvinyldichlorosilane.
IR, and Figure 2 is its NMR.
Claims (1)
上のアルキル基を表す。)のアルキルジクロルシ
ランとアセチレンとをPt(PPh3)4、PdCl2
(PPh3)2、Pd(PPh3)4、およびRuCl2(PPh3)4から
選ばれた錯体触媒および溶媒の存在下で反応され
ることからなる一般式CH2=CHSiRCl2(式中R
は炭素原子数3個以上のアルキル基を表す。)で
示されるビニルアルキルジクロルシランの製造
法。1 Alkyldichlorosilane with the general formula RHSiCl 2 (in the formula, R represents an alkyl group having 3 or more carbon atoms) and acetylene are combined with Pt(PPh 3 ) 4 and PdCl 2
(PPh 3 ) 2 , Pd(PPh 3 ) 4 , and RuCl 2 (PPh 3 ) 4 in the presence of a complex catalyst and solvent selected from the general formula CH 2 =CHSiRCl 2 (wherein R
represents an alkyl group having 3 or more carbon atoms. ) A method for producing vinylalkyldichlorosilane.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3590780A JPS56133296A (en) | 1980-03-21 | 1980-03-21 | Vinylalkyldichlorosilane and its preparation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3590780A JPS56133296A (en) | 1980-03-21 | 1980-03-21 | Vinylalkyldichlorosilane and its preparation |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56133296A JPS56133296A (en) | 1981-10-19 |
JPS631946B2 true JPS631946B2 (en) | 1988-01-14 |
Family
ID=12455093
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3590780A Granted JPS56133296A (en) | 1980-03-21 | 1980-03-21 | Vinylalkyldichlorosilane and its preparation |
Country Status (1)
Country | Link |
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JP (1) | JPS56133296A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4898961A (en) * | 1989-07-17 | 1990-02-06 | Dow Corning Corporation | Method for preparing alkenylsilanes |
-
1980
- 1980-03-21 JP JP3590780A patent/JPS56133296A/en active Granted
Non-Patent Citations (1)
Title |
---|
IZV.AKAD.NAUK.SSSR.SER KHIM.5=1970 * |
Also Published As
Publication number | Publication date |
---|---|
JPS56133296A (en) | 1981-10-19 |
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