JPS63187202A - Blazed holographic diffraction grating - Google Patents
Blazed holographic diffraction gratingInfo
- Publication number
- JPS63187202A JPS63187202A JP1840787A JP1840787A JPS63187202A JP S63187202 A JPS63187202 A JP S63187202A JP 1840787 A JP1840787 A JP 1840787A JP 1840787 A JP1840787 A JP 1840787A JP S63187202 A JPS63187202 A JP S63187202A
- Authority
- JP
- Japan
- Prior art keywords
- grooves
- grating
- exposed
- diffraction efficiency
- development
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000011161 development Methods 0.000 claims abstract description 7
- 239000011248 coating agent Substances 0.000 claims abstract description 4
- 238000000576 coating method Methods 0.000 claims abstract description 4
- 108091008695 photoreceptors Proteins 0.000 claims description 14
- 238000000034 method Methods 0.000 abstract description 16
- 239000000758 substrate Substances 0.000 abstract description 4
- 229920002120 photoresistant polymer Polymers 0.000 abstract description 3
- 239000011521 glass Substances 0.000 abstract description 2
- 229910052751 metal Inorganic materials 0.000 abstract description 2
- 239000002184 metal Substances 0.000 abstract description 2
- 238000001771 vacuum deposition Methods 0.000 abstract description 2
- 208000002352 blister Diseases 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000001579 optical reflectometry Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は光学回折格子の鋸歯状溝の形成に係り分光分析
分野で用いられるホログラフィック回折格子のブレード
化に好適な鋸歯状溝の形成方法に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to the formation of sawtooth grooves in optical diffraction gratings, and provides a method for forming sawtooth grooves suitable for forming blades in holographic diffraction gratings used in the field of spectroscopic analysis. Regarding.
従来１同各格子の形成方法として特開昭５４−１１０８
５７号に示された如く所望パターンの不透明薄膜で覆っ
た感光性樹脂膜に、照射角度を変えながら露光を行なう
ことが提案されている。しかし、この方法では不透明パ
ターン作成が格子ピッチが小さくなるに従って因業化し
、エツチング工程。Conventional method for forming each lattice is disclosed in Japanese Patent Application Laid-Open No. 54-1108.
As shown in No. 57, it has been proposed to expose a photosensitive resin film covered with an opaque thin film having a desired pattern while changing the irradiation angle. However, with this method, creating an opaque pattern becomes more laborious as the grating pitch becomes smaller, and the etching process becomes more difficult.
角度を変えながらの露光など多くの困難な工程があり、
高精度化が図りにくく、またブレーズ角によって感光体
の厚さのコントロールなど制御ポイントが多いという問
題がある。There are many difficult processes such as exposure while changing the angle,
There are problems in that it is difficult to achieve high precision and there are many control points such as controlling the thickness of the photoreceptor depending on the blaze angle.
一般に光学干渉によって作成するホログラフィック回折
格子は作成時の二光束干渉角度で格子のピッチを変える
ことができ、しかも任意の面積の格子が出来るなどの利
点がある。しかし、溝形状が正弦波状となるため回折効
率が低いという問題がある。そこで回折効率を向上させ
る方法として溝形状を鋸歯状にすることで理論上は１０
０％の回折効率を得ることが出来る。従来種々の鋸歯状
溝の作成方法が提案されているが回折効率が小さいこと
や迷光が大きいことなど問題が多い、また。Generally, holographic diffraction gratings created by optical interference have the advantage that the pitch of the grating can be changed depending on the two-beam interference angle at the time of creation, and that a grating of any area can be created. However, since the groove shape is sinusoidal, there is a problem that the diffraction efficiency is low. Therefore, as a way to improve the diffraction efficiency, by making the groove shape serrated, theoretically the diffraction efficiency can be increased to 10
A diffraction efficiency of 0% can be obtained. Various methods for creating sawtooth grooves have been proposed in the past, but they have many problems such as low diffraction efficiency and large stray light.
小さいブレーズ角の形成となると非常に困難になってく
ることである。It becomes very difficult to form a small blaze angle.
本発明の目的は、低迷光、高効率でしかも小さいブレー
ズ角をも容易に形成する方法を提案することにある。An object of the present invention is to propose a method for easily forming low stray light, high efficiency, and even a small blaze angle.
一般的な方法の二光束干渉縞で基板上の感光体の露光、
現像して正弦波状の格子溝を作成して。Exposure of the photoreceptor on the substrate with two-beam interference fringes in a general method,
Develop and create sinusoidal grating grooves.
この上に不透明物質をコーティングし、更にその上に感
光体を塗布する。格子溝に対し斜め方向から露光し、現
像する。感光体は露光された部分が現像で除去される種
類を用いる。An opaque substance is coated on top of this, and a photoreceptor is further coated on top of this. The grating grooves are exposed to light from an oblique direction and developed. A type of photoreceptor is used in which the exposed portion is removed by development.
尚、露光時の光照射角はほぼブレーズ角に相当する方向
から行う以上により容易にブレーズドホログラフィック
回折格子が得られる。It should be noted that a blazed holographic diffraction grating can be easily obtained if the light irradiation angle during exposure is from a direction approximately corresponding to the blaze angle.
一般的な二光束干渉露光法により基板に正弦波溝を形成
し不透明化する０次に感光体を塗布し、溝に対し斜め方
向から光を照射すると正弦波溝の山の頂上部分により溝
の谷の一部分に影が生じて。A 0-order photoreceptor is applied to form a sinusoidal groove on the substrate using a general two-beam interference exposure method to make it opaque, and when the groove is irradiated with light from an oblique direction, the tops of the ridges of the sinusoidal groove form the groove. A shadow appears in a part of the valley.
未露光部分ができる。感光体に露光部分が現像によって
除去できるものを用いれば、上記未露光部分が現像によ
り残り、溝の谷の一部が埋められて全体的には鋸歯状の
溝が形成される。鋸歯状の溝は周知の通り特定波長域で
回折効率が高くなるので上記方法により所望のブレーズ
角の鋸歯状溝を形成し回折効率を増すことができる。There will be unexposed areas. If a photoreceptor is used in which exposed portions can be removed by development, the unexposed portions will remain after development, filling in some of the valleys of the grooves and forming sawtooth grooves as a whole. As is well known, serrated grooves have a high diffraction efficiency in a specific wavelength range, so the above method can form serrated grooves with a desired blaze angle to increase the diffraction efficiency.
以下１本発明の一実施例の図面を用いて詳細に説明する
。第１図〜第３図は本発明による各プロセス説明のため
の図で、第１図は二光束干渉露光法により正弦波溝の形
成を示す、光学研磨されたガラス基板１の上に感光体２
としてホトレジストＡＺ−１３５０を０．６〜１．０μ
ｍ塗布し、二光束のレーザ光３，３′による干渉縞を感
光体２上に作り露光する０次にこれを現像することによ
り露光量に対応した凹凸、つまり正弦波溝が形成される
。つづいて溝面を不透明化するため金属など（クロムや
銀）を真空蒸着する０次にこの溝面上に感光体４のホト
レジストＡＺ−１３５０を０．６μｍ程度を塗布し、溝
方向以外の斜め方向から露光用の光６を照射し露光する
。露光は正弦波溝２の山の頂上部分により露光用光が当
らず未露光部分７が生じ、感光体４は露光されたところ
が現像で除去できるので未露光部分７が残る。これによ
り第３図に示すように鋸歯状の溝８が形成され。An embodiment of the present invention will be described in detail below with reference to the drawings. 1 to 3 are diagrams for explaining each process according to the present invention, and FIG. 1 shows the formation of sinusoidal grooves by the two-beam interference exposure method, in which a photoreceptor is placed on an optically polished glass substrate 1. 2
As photoresist AZ-1350 0.6~1.0μ
By coating the photoreceptor 2 with m coating, creating interference fringes on the photoreceptor 2 using two beams of laser beams 3 and 3', and developing the 0th order, unevenness corresponding to the amount of exposure, that is, a sine wave groove is formed. Next, a metal such as chromium or silver is vacuum-deposited to make the groove surface opaque.Next, photoresist AZ-1350 of photoreceptor 4 is applied to the groove surface to a thickness of about 0.6 μm, and diagonally in the direction other than the groove direction is applied. Exposure is performed by irradiating exposure light 6 from the direction. During exposure, the exposure light is not applied to the peaks of the sine wave grooves 2, resulting in unexposed portions 7. Since the exposed portions of the photoreceptor 4 can be removed by development, the unexposed portions 7 remain. As a result, sawtooth grooves 8 are formed as shown in FIG.
ブレーズドホログラフィック回折格子が得られる。A blazed holographic grating is obtained.
回折効率を更に高めるため光反射性の良いアルミニウム
などを鋸歯状溝面上に真空蒸着などの方法によりコーテ
ィングする。In order to further increase the diffraction efficiency, a material such as aluminum with good light reflectivity is coated on the sawtooth groove surface by a method such as vacuum deposition.
以上、簡単な方法（設備および技術）で容易に任意のブ
レーズ角を持った低迷光で回折効率の高いブレーズドホ
ログラフィック回折格子を作成できる。As described above, a blazed holographic diffraction grating with high diffraction efficiency for low stray light having an arbitrary blaze angle can be easily created using a simple method (equipment and technique).
−以上、本発明によれば正弦波状溝をベースとし、′
溝を感光体でブレーズ角に合うよう変形して、鋸；・′
歯状溝にすることでブレーズされたホログラフィックが
容易に得られる。- As described above, according to the present invention, based on the sinusoidal groove,
A blazed holographic image can be easily obtained by deforming the groove on the photoreceptor to match the blaze angle to create a sawtooth groove.
微細格子の作成も従来のようにマスクを必要としないの
でマスクによるデッドスペースもなく迷光および回折効
率が優れる等の利点があり、工業的価値は非常に高い。The production of fine gratings does not require a mask as in the conventional method, so there is no dead space caused by a mask, and there are advantages such as excellent stray light and diffraction efficiency, and the industrial value is very high.
第１図は二光束干渉露光法によるホログラフィック回折
格子を作成する概略図、第２図は本発明に係る鋸歯状溝
の形成方法を示す図、第３図は感光体で溝部が変形され
鋸歯状溝となったブレーズドホログラフィック回折格子
の断面図である。Fig. 1 is a schematic diagram of creating a holographic diffraction grating using the two-beam interference exposure method, Fig. 2 is a diagram showing a method for forming sawtooth grooves according to the present invention, and Fig. 3 is a diagram showing the formation of sawtooth grooves by deforming the grooves with a photoreceptor. FIG. 2 is a cross-sectional view of a blazed holographic diffraction grating with shaped grooves.
Claims (1)
によって露光部分が除去される感光体を塗布し、斜め方
向から露光後現像してなるブレーズドホログラフィック
回折格子。1. A blazed holographic diffraction grating made by forming opaque grating grooves in advance, coating the surface with a photoreceptor whose exposed portions are removed by development, and developing after exposure from an oblique direction.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1840787A JPS63187202A (en) | 1987-01-30 | 1987-01-30 | Blazed holographic diffraction grating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1840787A JPS63187202A (en) | 1987-01-30 | 1987-01-30 | Blazed holographic diffraction grating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63187202A true JPS63187202A (en) | 1988-08-02 |
Family
ID=11970814
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1840787A Pending JPS63187202A (en) | 1987-01-30 | 1987-01-30 | Blazed holographic diffraction grating |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63187202A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002169010A (en) * | 2000-12-04 | 2002-06-14 | Minolta Co Ltd | Diffraction optical element |
| US7175773B1 (en) | 2004-06-14 | 2007-02-13 | Carl Zeiss Laser Optics Gmbh | Method for manufacturing a blazed grating, such a blazed grating and a spectrometer having such a blazed grating |
| JP2011017748A (en) * | 2009-07-07 | 2011-01-27 | Nikon Corp | Method and device for manufacturing diffraction optical element |
| WO2013051384A1 (en) * | 2011-10-07 | 2013-04-11 | 株式会社日立製作所 | Phase shift mask, asymmetric pattern forming method, diffraction grating manufacturing method and semiconductor device manufacturing method |
| CN112313548A (en) * | 2018-08-29 | 2021-02-02 | 株式会社日立高新技术 | Concave diffraction grating, method for manufacturing same, and optical device |
-
1987
- 1987-01-30 JP JP1840787A patent/JPS63187202A/en active Pending
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002169010A (en) * | 2000-12-04 | 2002-06-14 | Minolta Co Ltd | Diffraction optical element |
| US7175773B1 (en) | 2004-06-14 | 2007-02-13 | Carl Zeiss Laser Optics Gmbh | Method for manufacturing a blazed grating, such a blazed grating and a spectrometer having such a blazed grating |
| JP2011017748A (en) * | 2009-07-07 | 2011-01-27 | Nikon Corp | Method and device for manufacturing diffraction optical element |
| WO2013051384A1 (en) * | 2011-10-07 | 2013-04-11 | 株式会社日立製作所 | Phase shift mask, asymmetric pattern forming method, diffraction grating manufacturing method and semiconductor device manufacturing method |
| JP2013083759A (en) * | 2011-10-07 | 2013-05-09 | Hitachi Ltd | Phase shift mask, method for forming asymmetric pattern, method for manufacturing diffraction grating, and method for manufacturing semiconductor device |
| US9390934B2 (en) | 2011-10-07 | 2016-07-12 | Hitachi High-Technologies Corporation | Phase shift mask, method of forming asymmetric pattern, method of manufacturing diffraction grating, and method of manufacturing semiconductor device |
| CN112313548A (en) * | 2018-08-29 | 2021-02-02 | 株式会社日立高新技术 | Concave diffraction grating, method for manufacturing same, and optical device |
| CN112313548B (en) * | 2018-08-29 | 2022-05-03 | 株式会社日立高新技术 | Concave diffraction grating, method for manufacturing same, and optical device |
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