JPS63185224U - - Google Patents

Info

Publication number
JPS63185224U
JPS63185224U JP1987075706U JP7570687U JPS63185224U JP S63185224 U JPS63185224 U JP S63185224U JP 1987075706 U JP1987075706 U JP 1987075706U JP 7570687 U JP7570687 U JP 7570687U JP S63185224 U JPS63185224 U JP S63185224U
Authority
JP
Japan
Prior art keywords
ray
thin film
exposure mask
mask
absorbing pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1987075706U
Other languages
English (en)
Japanese (ja)
Other versions
JPH066504Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1987075706U priority Critical patent/JPH066504Y2/ja
Publication of JPS63185224U publication Critical patent/JPS63185224U/ja
Application granted granted Critical
Publication of JPH066504Y2 publication Critical patent/JPH066504Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP1987075706U 1987-05-20 1987-05-20 X線露光用マスク Expired - Lifetime JPH066504Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1987075706U JPH066504Y2 (ja) 1987-05-20 1987-05-20 X線露光用マスク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987075706U JPH066504Y2 (ja) 1987-05-20 1987-05-20 X線露光用マスク

Publications (2)

Publication Number Publication Date
JPS63185224U true JPS63185224U (US20110232667A1-20110929-C00004.png) 1988-11-29
JPH066504Y2 JPH066504Y2 (ja) 1994-02-16

Family

ID=30922101

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987075706U Expired - Lifetime JPH066504Y2 (ja) 1987-05-20 1987-05-20 X線露光用マスク

Country Status (1)

Country Link
JP (1) JPH066504Y2 (US20110232667A1-20110929-C00004.png)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60176751A (ja) * 1984-02-23 1985-09-10 セイコーエプソン株式会社 マスク
JPS60257518A (ja) * 1984-06-04 1985-12-19 Hitachi Ltd 転写マスク及びその製造方法
JPS6132425A (ja) * 1984-07-24 1986-02-15 Nec Corp X線露光マスク
JPS61198722A (ja) * 1985-02-28 1986-09-03 Nec Corp X線露光マスク及びその製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60176751A (ja) * 1984-02-23 1985-09-10 セイコーエプソン株式会社 マスク
JPS60257518A (ja) * 1984-06-04 1985-12-19 Hitachi Ltd 転写マスク及びその製造方法
JPS6132425A (ja) * 1984-07-24 1986-02-15 Nec Corp X線露光マスク
JPS61198722A (ja) * 1985-02-28 1986-09-03 Nec Corp X線露光マスク及びその製造方法

Also Published As

Publication number Publication date
JPH066504Y2 (ja) 1994-02-16

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