JPS63183143A - Cu alloyed lead frame material for semiconductor device - Google Patents

Cu alloyed lead frame material for semiconductor device

Info

Publication number
JPS63183143A
JPS63183143A JP1308087A JP1308087A JPS63183143A JP S63183143 A JPS63183143 A JP S63183143A JP 1308087 A JP1308087 A JP 1308087A JP 1308087 A JP1308087 A JP 1308087A JP S63183143 A JPS63183143 A JP S63183143A
Authority
JP
Japan
Prior art keywords
lead frame
solder
frame material
alloy
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1308087A
Other languages
Japanese (ja)
Other versions
JPH0422978B2 (en
Inventor
Rensei Futatsuka
二塚 錬成
Shunichi Chiba
俊一 千葉
Tadao Sakakibara
直男 榊原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Shindoh Co Ltd
Original Assignee
Mitsubishi Shindoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Shindoh Co Ltd filed Critical Mitsubishi Shindoh Co Ltd
Priority to JP1308087A priority Critical patent/JPS63183143A/en
Publication of JPS63183143A publication Critical patent/JPS63183143A/en
Publication of JPH0422978B2 publication Critical patent/JPH0422978B2/ja
Granted legal-status Critical Current

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  • Lead Frames For Integrated Circuits (AREA)

Abstract

PURPOSE:To produce the titled lead frame material having high strength and having the excellent thermal exfoliation resistance to a solder by preparing a Cu alloy contg. specific ratios of Ni, Sn, Si, Zn and Ca. CONSTITUTION:The Cu alloy contg., by weight, 1-4% Ni, 1-3% Sn, 0.15-0.8% Si, 0.1-1% Zn, 0.002-0.04% Ca and the balance consisting of Cu with inevitable impurities is prepared. Said Cu alloy has high strength of about >=60kg/mm<2> tensile strength, has the excellent thermal exfoliation resistance to solder and is suitable for the Cu alloyed lead frame material for semiconductor device.

Description

【発明の詳細な説明】 〔産業上のモ1」用分野〕 この発明は、高強度と、すぐれたはんだの耐熱剥離性を
有する半導体装置用Cu合金製リードフレーム材に関す
るものであるっ 〔従来の技術〕 従来、例えば1軍歌%でC以下%は軍歌%を示す)、C
u−2%Sn −0,2%Ni −0,05%Pの代表
組成を有するCu合金が、IC−?LS1.さらにVL
SIなどの半導体装置のリードフレーム材として用いら
れている。
[Detailed Description of the Invention] [Industrial Field] This invention relates to a Cu alloy lead frame material for semiconductor devices that has high strength and excellent solder heat peeling properties. [Technology] Conventionally, for example, 1 military song % and % below C indicate military song %), C
A Cu alloy having a typical composition of u-2%Sn-0,2%Ni-0,05%P is IC-? LS1. Further VL
It is used as a lead frame material for semiconductor devices such as SI.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

しがし、近年の半導体装置の高性能(ヒおよび高集積f
ヒに伴い、これを構成するリードフレーム材にも高強度
が要求されるようになっているが、上記の従来Cu合金
製リードフレーム材は、リードフレーム材に要求される
繰り返し曲げ性や耐打抜金型摩耗性、さらに熱および電
気伝導性、めっき性。
However, in recent years, the high performance (hi and high integration f) of semiconductor devices has increased.
With the increasing demand for lead frames, the lead frame materials that make up these materials are also required to have high strength. Abrasion resistance of punching dies, thermal and electrical conductivity, and plating properties.

およびはんだ付は性にすぐれるものの1強度不足が原因
で、これらの要求に十分対応することができないば7j
=りでなく、はんだの耐熱剥離性も満足するものでない
ため、信頼性の点で問題がある。
Although soldering has excellent properties, it may not be possible to meet these requirements due to lack of strength.
However, there is a problem in terms of reliability because the heat resistance and peelability of the solder are not satisfactory.

〔問題点を解決するための手段〕[Means for solving problems]

そこで1本発明者等は、上述のような観点から。 Therefore, the inventors of the present invention, etc., from the above-mentioned viewpoint.

高強度を有し、かつはんだの耐熱剥離性のすぐれた半導
体装置用リードフレーム材を開発すべく研究を行なった
結果。
The result of research aimed at developing lead frame materials for semiconductor devices that have high strength and excellent heat-removability of solder.

Ni:1〜4%、   Sn:1〜3%。Ni: 1-4%, Sn: 1-3%.

Si: 0.15〜0.8%、 Zn : 0.1〜1
%。
Si: 0.15-0.8%, Zn: 0.1-1
%.

Ca: 0.002〜0.04%。Ca: 0.002-0.04%.

を含有し、残りがCuと不可避不純物からなる組成を有
するCu合金は、引張強さで60 K、 /−以上の高
強度を有し、かつはんだの耐熱剥離性にもすぐれ、さら
に、リードフレーム材に要求される繰り返し曲げ性、耐
打抜金型摩耗性、IP4および電気伝導性、めっき性、
はんだ付は性にもすぐれた特性をもつという知見を得た
のである。
The Cu alloy, which has a composition containing Cu and the rest consisting of Cu and unavoidable impurities, has a high tensile strength of 60 K, /- or more, has excellent heat peeling resistance of solder, and is also suitable for lead frames. Repeated bending properties required for the material, punching die wear resistance, IP4 and electrical conductivity, plating properties,
They discovered that soldering also has excellent properties.

この発明は、上記知見にもとづいてなされたものであっ
て、以下に成分組成を上記の通りに限定しt理由を説明
する。
This invention has been made based on the above knowledge, and the component composition is limited as described above and the reason will be explained below.

fal  Ni N1E分には強度および繰り返し曲げ性を向上させる作
用があるが、その含有酸が1%未満では前記作用に所望
の効果が得られず、一方その含有酸が4%を越えると熱
間加工性が低下するようになることから、その含有酸な
1〜4%と定めた。
fal Ni N1E component has the effect of improving strength and repeated bending properties, but if the acid content is less than 1%, the desired effect cannot be obtained, while if the acid content exceeds 4%, hot Since the processability deteriorates, the acid content was determined to be 1 to 4%.

(b)  5n Sn成分にもNi5!2分と同様に強度と繰り返し曲げ
性を向上させる作用があるが、その含有酸が1%未満で
は前記特性に所望の向上効果が得られず。
(b) Although the 5n Sn component also has the effect of improving strength and repeated bending properties in the same way as Ni5!2, if the acid content is less than 1%, the desired effect of improving the properties cannot be obtained.

一方その含有酸が3%を越えると、同じく熱間加工性が
低下するようになることから、その含有Iを1〜3%と
定めた。
On the other hand, if the acid content exceeds 3%, hot workability similarly decreases, so the content I was set at 1 to 3%.

tel  5i Si成分には、主としてNi2Siの「ヒ合物を形成し
て強度を向上させる作用があるが、その含有酸が0.1
5%未満では所望の高強度を確保することができず、一
方その含有酸が0.8%を越えると、遊離Siを形成す
るようになって、はんだの耐熱剥離性が損なわれるよう
になることから、その含有酸を0.15〜0.8%と定
めた。
tel 5i The Si component mainly has the effect of forming an arsenic compound of Ni2Si to improve strength, but if the acid content is 0.1
If the acid content is less than 5%, the desired high strength cannot be ensured, while if the acid content exceeds 0.8%, free Si will be formed, impairing the heat-resistant peelability of the solder. Therefore, the acid content was determined to be 0.15 to 0.8%.

fd)  Zn Zn成分には、はんだの耐熱剥離性を一段と向上させる
作用があるが、その含有lが0.1%未満では、所望の
すぐれたはんだの耐熱剥離性を確保することができず、
一方その含有酸が1%を越えると、はんだ付は性が劣化
するようになることから。
fd) Zn The Zn component has the effect of further improving the heat-resistant peelability of the solder, but if its content is less than 0.1%, the desired excellent heat-resistant peelability of the solder cannot be ensured,
On the other hand, if the acid content exceeds 1%, the soldering properties will deteriorate.

その含有酸を0.1〜1%と定めた。The acid content was determined to be 0.1 to 1%.

fel  Ca Ca成分には、プレス打抜き(スタンピングともいう)
にて1条材からリードフレーム材を成形するに際して使
用される打抜金型の摩耗を抑制する作用(耐打抜金型摩
耗性向上効果)があるが、その含有はが0.002%未
満では所望の耐打抜金型摩耗性向上効果が得られず、一
方その含有酸が0.04%を越えると冷間王延性が損な
われるようになることから、その含有酸を0.002〜
0.04%と定めたつ〔実旋例〕 つぎに、この発明のCu合金製リードフレーム材を実稚
例に工り具体的に説明する。
fel Ca For the Ca component, press punching (also called stamping)
It has the effect of suppressing the wear of the punching die used when forming lead frame material from a single strip material (effect of improving the wear resistance of the punching die), but its content is less than 0.002%. However, if the acid content exceeds 0.04%, cold ductility will be impaired.
0.04% [Actual example] Next, a practical example of the Cu alloy lead frame material of the present invention will be explained in detail.

通常の低周波溝型溶解炉を用い、木炭被覆下の大気雰囲
気中で、それぞれ第1表に示される成分組成をもった合
金浴湯を調製し、半連続鋳造法にて厚さ:160mmX
幅:450+++mX長さ:2400順の寸法をもった
鋳塊に鋳債し、この鋳塊に温度:850℃で熱間圧延を
施して厚さ:10圏の熱延機とし、熱間圧延後直ちに水
冷し、スケール除去の面前を行ない、ついで前記熱延板
に冷間圧延を旌して厚さ:0.5mmの玲延機とした時
点で、これに温度=500°Cに2時間保持の条件で焼
鈍な旋し、再び冷間圧延にて、その厚さを0.25ff
I+++とし、最終的に連続焼鈍炉を用いて温度=50
0℃に20秒間保持の条件で焼鈍を誰すことによって。
Using an ordinary low-frequency groove melting furnace, alloy baths having the compositions shown in Table 1 were prepared in an atmospheric atmosphere under charcoal coating, and cast to a thickness of 160 mm by semi-continuous casting.
An ingot with dimensions of width: 450 + + + m x length: 2400 is cast into an ingot, and this ingot is hot rolled at a temperature of 850°C to form a hot rolling mill with a thickness of 10 mm, and after hot rolling. Immediately, the hot-rolled plate was cooled with water and subjected to scale removal, and then the hot-rolled plate was cold-rolled to a thickness of 0.5 mm, and the plate was kept at a temperature of 500°C for 2 hours. Annealed and rolled under the following conditions, then cold rolled again to a thickness of 0.25ff.
I +++, and finally the temperature = 50 using a continuous annealing furnace.
By annealing at 0°C for 20 seconds.

本発明Cu合金製リすドフレーム素材c以下本発明リー
ド素材という)1〜12および比較Cu合金製リードフ
レーム素材C以下比較リード素材という)1〜6をそれ
ぞれ製造した。
Inventive Cu alloy lead frame materials (hereinafter referred to as the present invention lead materials) 1 to 12 and Comparative Cu alloy lead frame materials C (hereinafter referred to as comparative lead materials) 1 to 6 were manufactured, respectively.

なお、比較リード素材1〜6は、いずれも構成成分のう
ちのいずれかの成分含有酸(第1表に※印を付しtもの
)がこの発明の範囲刀)ら外れたものであるう つぎに、この結果得られた本発明リード素材1〜12お
工び比較リード素材1〜6、さらに市販のCu合金裂リ
ードフレーム素材(以下従来リード素材という)につい
て、引張試験、はんだの熱剥離試験、繰り返し曲げ試験
、および打抜金型摩耗試験を行ない、それぞれ強度、は
んだの耐熱剥離性、繰り返し曲げ性、および耐打抜金型
摩耗性を評価した。
In addition, comparative lead materials 1 to 6 are all materials in which one of the constituent acids (those marked with * in Table 1) is outside the scope of this invention. Next, the resulting lead materials 1 to 12 of the present invention, comparative lead materials 1 to 6, and commercially available Cu alloy split lead frame materials (hereinafter referred to as conventional lead materials) were subjected to tensile tests and thermal peeling tests of solder. , a repeated bending test, and a punching die wear test were conducted to evaluate the strength, heat peeling resistance of solder, repeated bending property, and punching die wear resistance, respectively.

なお、引張試験は、圧延方向に平行に採取したJI35
号試験片を用いて行ない、引張強さと伸びを測定した。
In addition, the tensile test was conducted using JI35 samples taken parallel to the rolling direction.
The tensile strength and elongation were measured using a No. 1 test piece.

また、はんだの熱剥離試験は、厚さ:0.25+n×幅
:1511I11×長さ二60圏の寸法をもった試験片
を、aジンフラックスで処理し、@度:230℃の60
%5n−40%pbのはんだ浴中に浸漬して、その表面
に前記はんだを付着させ、この状態で、大気中、温度:
150’C+ニ一1000時間保持の条件で加熱し、加
熱後、試験片を180°密着曲げし、再び180°曲げ
戻す条件で行ない、この180°曲げ部におけるはんだ
剥離の有無を観察した。
In addition, in the thermal peeling test of solder, a test piece with dimensions of thickness: 0.25+n x width: 1511I11 x length 260 was treated with agin flux,
%5n-40%PB solder bath to adhere the solder to the surface, and in this state, in the atmosphere, at a temperature of:
The test piece was heated at 150'C+2 and held for 1000 hours, and after heating, the test piece was closely bent 180° and then bent back 180° again, and the presence or absence of solder peeling at the 180° bent portion was observed.

繰り返し曲げ試験は、厚さ: 0.25 m X @:
 0.5晴の寸法をもった試験片を、水平に置き、中心
を皮膚として一方端に取り付けた226.8 F (8
オンス)の錘りにより90°曲げ、再び水平に戻す工程
を1サイクルとし、これを繰り返す条件でそれぞれ10
個の試験片について行ない、破断じ至るまでの曲げサイ
クル数を測定し、この測定結果にもとづいて10個の試
験片の平均値を求めた。
The repeated bending test was performed using a thickness of 0.25 m x @:
A test piece with a size of 0.5 F (226.8 F) was placed horizontally and attached to one end with the skin in the center.
One cycle is the process of bending 90 degrees with a weight of 1 ounce (oz) and returning it to the horizontal position.
The number of bending cycles until breakage was measured for each test piece, and the average value of the 10 test pieces was determined based on the measurement results.

さらに、打抜金型摩耗試験は、金型として市販のCo 
: 16%、WC:残りからなる組成を有するWC基超
硬合金製のものを用い、16リードのリードフレームを
プレス打抜き加工することにより行ない、打抜き加工後
のリードフレームに0.015閣のパリが発生するに至
るまでのスタンピング回数を測定した。これらの結果を
第1表に示した。
Furthermore, the punching die wear test was conducted using commercially available Co as the die.
A 16-lead lead frame was press punched using a WC-based cemented carbide having a composition of: 16%, WC: and the remainder. The number of times of stamping until this occurred was measured. These results are shown in Table 1.

〔発明の効果〕〔Effect of the invention〕

第1表(:示される結果がら1本発明リード素材1〜1
2は、いずれも従来リード素材と同等、あるいはこれ以
上のすぐれた繰り返し曲げ性および耐打抜金型摩耗性を
もち、かつ従来リード素材と比較して一段とすぐれた強
度およびはんだの耐熱剥離性をもつことが明らかであり
、さらに、第1表には示されていないが、いずれも半導
体装置のリードフレーム材として最低必要な3%lAC
3工り一段と高い15%lAC3以上の導電性を示し、
熱および電気伝導性のすぐれたものであった。
Table 1 (Results shown: 1 Lead materials of the present invention 1 to 1
2 has excellent repeated bending properties and punching die wear resistance that are equal to or better than conventional lead materials, and also have superior strength and heat peeling resistance of solder compared to conventional lead materials. Furthermore, although it is not shown in Table 1, both of them have the minimum required 3% lAC as lead frame material for semiconductor devices.
3-process shows even higher conductivity of 15%lAC3 or higher,
It had excellent thermal and electrical conductivity.

これに対して、比較リード素材1〜4(二見られるよう
に、構成成分のうちのいずれかの成分含有がでもこの発
明の範囲から外れると、上記の特性のうちの少なくとも
いずれかの性質が劣ることが明らがであるう 上述のように、この発明のCu合金製リードフレーム材
は、高強度とすぐれたはんだの耐熱剥離性を有し、さら
にリードフレームに要求される繰り返し曲げ性、耐打抜
金型摩耗性、熱および電気伝導性、めつき注、およびは
んだ付は性などの特性にもすぐれているので、半導体装
置の高性能化および高集積化に寄与するところ大なるも
のであり。
On the other hand, as can be seen in Comparative Lead Materials 1 to 4 (2), if the content of any one of the constituent components falls outside the scope of the present invention, at least one of the above characteristics is inferior. As is clear from the above, the Cu alloy lead frame material of the present invention has high strength and excellent solder heat peeling resistance, and also has the repeated bendability and durability required for lead frames. It has excellent properties such as punching die abrasion resistance, thermal and electrical conductivity, plating properties, and soldering properties, so it greatly contributes to higher performance and higher integration of semiconductor devices. can be.

かつすぐれた性能を長期に亘って発揮する信頼性の高い
ものである。
It is highly reliable and provides excellent performance over a long period of time.

Claims (1)

【特許請求の範囲】 Ni:1〜4%、Sn:1〜3%、 Si:0.15〜0.8%、Zn:0.1〜1%、Ca
:0.002〜0.04%、 を含有し、残りがCuと不可避不純物からなる組成(以
上重量%)を有するCu合金で構成したことを特徴とす
る高強度およびすぐれたはんだの耐熱剥離性を有する半
導体装置用Cu合金製リードフレーム材。
[Claims] Ni: 1-4%, Sn: 1-3%, Si: 0.15-0.8%, Zn: 0.1-1%, Ca
:0.002 to 0.04%, and the remainder is Cu and unavoidable impurities (weight%). High strength and excellent heat-resistant peeling properties of solder. A lead frame material made of a Cu alloy for semiconductor devices.
JP1308087A 1987-01-22 1987-01-22 Cu alloyed lead frame material for semiconductor device Granted JPS63183143A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1308087A JPS63183143A (en) 1987-01-22 1987-01-22 Cu alloyed lead frame material for semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1308087A JPS63183143A (en) 1987-01-22 1987-01-22 Cu alloyed lead frame material for semiconductor device

Publications (2)

Publication Number Publication Date
JPS63183143A true JPS63183143A (en) 1988-07-28
JPH0422978B2 JPH0422978B2 (en) 1992-04-21

Family

ID=11823187

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1308087A Granted JPS63183143A (en) 1987-01-22 1987-01-22 Cu alloyed lead frame material for semiconductor device

Country Status (1)

Country Link
JP (1) JPS63183143A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02209442A (en) * 1989-02-10 1990-08-20 Mitsubishi Shindoh Co Ltd High strength cu alloy

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63109133A (en) * 1986-10-23 1988-05-13 Furukawa Electric Co Ltd:The Copper alloy for electronic equipment and its production

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63109133A (en) * 1986-10-23 1988-05-13 Furukawa Electric Co Ltd:The Copper alloy for electronic equipment and its production

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02209442A (en) * 1989-02-10 1990-08-20 Mitsubishi Shindoh Co Ltd High strength cu alloy

Also Published As

Publication number Publication date
JPH0422978B2 (en) 1992-04-21

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