JPS63180924U - - Google Patents
Info
- Publication number
- JPS63180924U JPS63180924U JP7163487U JP7163487U JPS63180924U JP S63180924 U JPS63180924 U JP S63180924U JP 7163487 U JP7163487 U JP 7163487U JP 7163487 U JP7163487 U JP 7163487U JP S63180924 U JPS63180924 U JP S63180924U
- Authority
- JP
- Japan
- Prior art keywords
- infrared light
- rod lens
- light source
- reactive ion
- ion etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 3
- 238000001020 plasma etching Methods 0.000 claims 2
- 230000000149 penetrating effect Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7163487U JPH0617282Y2 (ja) | 1987-05-15 | 1987-05-15 | リアクティブイオンエッチング装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7163487U JPH0617282Y2 (ja) | 1987-05-15 | 1987-05-15 | リアクティブイオンエッチング装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63180924U true JPS63180924U (enExample) | 1988-11-22 |
| JPH0617282Y2 JPH0617282Y2 (ja) | 1994-05-02 |
Family
ID=30914364
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7163487U Expired - Lifetime JPH0617282Y2 (ja) | 1987-05-15 | 1987-05-15 | リアクティブイオンエッチング装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0617282Y2 (enExample) |
-
1987
- 1987-05-15 JP JP7163487U patent/JPH0617282Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0617282Y2 (ja) | 1994-05-02 |