JPS63176187A - Manufacture of base material for printing form plate - Google Patents
Manufacture of base material for printing form plateInfo
- Publication number
- JPS63176187A JPS63176187A JP832487A JP832487A JPS63176187A JP S63176187 A JPS63176187 A JP S63176187A JP 832487 A JP832487 A JP 832487A JP 832487 A JP832487 A JP 832487A JP S63176187 A JPS63176187 A JP S63176187A
- Authority
- JP
- Japan
- Prior art keywords
- waveform
- electrolytic
- surface roughening
- current
- direct current
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007639 printing Methods 0.000 title claims abstract description 38
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 239000000463 material Substances 0.000 title abstract description 10
- 238000007788 roughening Methods 0.000 claims abstract description 48
- 238000000034 method Methods 0.000 claims abstract description 36
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 32
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 32
- 239000003792 electrolyte Substances 0.000 claims abstract description 11
- 239000007864 aqueous solution Substances 0.000 claims abstract description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910000041 hydrogen chloride Inorganic materials 0.000 claims abstract description 4
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 claims abstract description 4
- 238000011282 treatment Methods 0.000 claims description 27
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 14
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 8
- 229910017604 nitric acid Inorganic materials 0.000 claims description 8
- 239000010407 anodic oxide Substances 0.000 claims 1
- 239000002245 particle Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 abstract description 4
- 238000005868 electrolysis reaction Methods 0.000 abstract description 3
- 239000004411 aluminium Substances 0.000 abstract 1
- 239000007788 liquid Substances 0.000 description 7
- 238000007645 offset printing Methods 0.000 description 7
- 230000003746 surface roughness Effects 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 238000005406 washing Methods 0.000 description 5
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000000866 electrolytic etching Methods 0.000 description 3
- 239000002253 acid Substances 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 238000002048 anodisation reaction Methods 0.000 description 2
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- PYRZPBDTPRQYKG-UHFFFAOYSA-N cyclopentene-1-carboxylic acid Chemical compound OC(=O)C1=CCCC1 PYRZPBDTPRQYKG-UHFFFAOYSA-N 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
Landscapes
- Printing Plates And Materials Therefor (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、印刷版用支持体の製造方法に関するものであ
り、特にオフセット印刷版用に適する、粗面化されたア
ルミニウム板からなる印刷版用支持体の製造方法に関す
るものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for producing a support for a printing plate, and in particular a printing plate made of a roughened aluminum plate suitable for offset printing plates. The present invention relates to a method for manufacturing a support for
印刷版用支持体、とくにオフセット印刷版用支持体とし
てはアルミニウム板が用いられている。An aluminum plate is used as a support for printing plates, especially as a support for offset printing plates.
一般にアルミニウム板をオフセット印刷用版材（支持体
）として使用するためには、感光材との適度な接着性と
保水性を有していることが必要である。このためにはア
ルミニウム板の表面を均一かつ緻密な砂目な有するよう
に粗面化しなければならない。この粗面化処理は製版後
実際にオフセット印刷をおこなったときに版材の印刷性
能や耐刷力に著しい影響をおよぼすので、その良否は版
材製造上１要な要素となっている。Generally, in order to use an aluminum plate as a plate material (support) for offset printing, it is necessary to have appropriate adhesion to a photosensitive material and water retention. For this purpose, the surface of the aluminum plate must be roughened to have a uniform and dense grain. This surface roughening treatment has a significant effect on the printing performance and printing durability of the plate material when offset printing is actually performed after plate making, so its quality is an important factor in the manufacture of the plate material.
アルミニウムの粗面化法としては交流電解エツチング法
が一般的に採用されており、電流としては、普通の正弦
波交流電流、矩形波などの特殊交番波形電流が用いられ
ている。そして、黒鉛等の適当な■極を対極として交流
電流により、アルミニウム板の粗面化処理をおこなうも
ので、通常−回の処理で行われているが、そこで得られ
るピット深さは全体的に浅く、耐刷性能に劣るものであ
った。このため、その直径に比して深さの深いピットが
均一かつ緻密に存在する砂目な有する印刷版用支持体と
して好適なアルミニウム板が得るように、アルミニウム
板を電解浴中で、正弦波交流電流をサイリスターで位相
制御した電流を用いて電解エツチングする方法が提案さ
れている（特開昭５５−２５３８１号公報）。AC electrolytic etching is generally used as a method for roughening aluminum, and the current used is a special alternating current waveform such as an ordinary sine wave alternating current or a rectangular wave. Then, the surface of the aluminum plate is roughened using an alternating current using a suitable electrode such as graphite as the counter electrode, and the process is usually carried out in one cycle, but the resulting pit depth is It was shallow and had poor printing durability. For this reason, in order to obtain an aluminum plate suitable as a support for a printing plate, which has a rough texture in which pits with a deep depth compared to its diameter are uniformly and densely present, the aluminum plate is heated in an electrolytic bath using a sine wave waveform. A method of electrolytic etching using alternating current whose phase is controlled by a thyristor has been proposed (Japanese Unexamined Patent Publication No. 55-25381).
しかし、前記の方法で得られるアルミニウム板でも生成
しているピットは深さが十分深くなく、均一さも不足し
、それよりオフセット印刷版を形成したときに印刷性能
や耐刷力が不十分で満足するものが得られない。However, the pits generated even on the aluminum plate obtained by the above method are not deep enough and lack uniformity, and when an offset printing plate is formed, the printing performance and printing durability are insufficient and unsatisfactory. I can't get what I want.
本発明はオフセット印刷などにおいて満足すべき印刷性
能や耐刷力を得ることができる、その直径に比して深さ
の深いピットが均一かつ緻密に存在する砂目を有するア
ルミニウム板からなる印刷版用支持体を得ようとするも
のである。The present invention is a printing plate made of an aluminum plate having a grain pattern in which pits deep in comparison to its diameter are uniformly and densely distributed, and which can obtain satisfactory printing performance and printing durability in offset printing and the like. The purpose is to obtain a support for
本発明者らは、種々研究の結果、電解浴中で交番電流波
形を用いて電解粗面化する工程と、直流電流波形を用い
て電解粗面化する工程とを組み合せてアルミニウム板を
電解粗面化すれば、その直径に比べて深さが深く、かつ
二重構造的なピットを均一に存在する砂目を有する、印
刷版用支持体として適するアルミニウム粗面板を工業的
に有利に製造できることを見い出した。As a result of various studies, the present inventors have discovered that an aluminum plate can be electrolytically roughened by combining the process of electrolytically roughening using an alternating current waveform in an electrolytic bath and the process of electrolytically roughening using a direct current waveform. When flattened, it is possible to industrially advantageously produce a rough-surfaced aluminum plate suitable as a support for printing plates, which has a grain that is deep compared to its diameter and has double-structured pits uniformly present therein. I found out.
すなわち、本発明は、アルミニウム板を電解浴中で、交
番電流波形を用いて電解粗面化する工程と直流電流波形
を用いて電解粗面化する工程とを組み合わせて粗面化処
理をすることを特徴とする印刷版用支持体の製造方法で
ある。That is, the present invention provides surface roughening treatment for an aluminum plate in an electrolytic bath by combining a step of electrolytically roughening using an alternating current waveform and a step of electrolytically roughening using a direct current waveform. A method for producing a printing plate support, characterized by:
本発明の実施に先立ち、アルミニウム板に次のような周
知の処理を施してよいことはいうまでもない。例えは、
アルミニウム板表面に存在する油分、汚れ、酸化皮膜、
加工変質層などを除去する目的で、アルカリエツチング
、酸洗等の処理をしてもよ−・。It goes without saying that prior to carrying out the present invention, the aluminum plate may be subjected to the following well-known treatment. For example,
Oil, dirt, oxide film on the aluminum plate surface,
Treatments such as alkali etching and pickling may be used to remove damaged layers.
また、本発明でいう交番電流波形とは、正負の極性を交
互に変換せしめられて得られる波形の電流であって、第
１図にその電圧波形図を例示する。Further, the alternating current waveform as used in the present invention is a current having a waveform obtained by alternating positive and negative polarities, and an example of the voltage waveform diagram is shown in FIG.
第１図において、ｆａｌは正弦波、（ｂｔは正弦波をサ
イリスタで位相角制御したもの、（Ｃ１は矩形波の電圧
波形を示すが、本発明の交番電流波形は、上記したもの
の電圧波形に限るものではない。In FIG. 1, fal is a sine wave, (bt is a sine wave whose phase angle is controlled by a thyristor, and C1 is a rectangular wave voltage waveform. However, the alternating current waveform of the present invention is similar to the voltage waveform described above. It is not limited.
本発明でいう直流電流波形とは、極性の変化しない電流
の波形であり、第２図にその電圧波形を例示する。（ａ
ｔは全波整流した電圧波形、（ｂ）は断続直流、（Ｃ）
は連続直流を示すが、本発明の交番電流波形は上記した
ものの電圧波形に限るものではなく、サイリスタを用い
た混合ブリッジ、順ブリッジなどを使って整流した波形
を用いてもよい。The DC current waveform referred to in the present invention is a current waveform whose polarity does not change, and FIG. 2 illustrates the voltage waveform thereof. (a
t is a full-wave rectified voltage waveform, (b) is an intermittent DC, (C)
indicates a continuous direct current, but the alternating current waveform of the present invention is not limited to the voltage waveform described above, and a waveform rectified using a mixed bridge using a thyristor, a forward bridge, etc. may also be used.
本発明における粗面化処理では、交番電流波形を用いる
電解粗面化工程（以下「交流電解粗面化工程」ともいう
）と直流電流波形を用いる電解粗面化工程（以下「直流
電解粗面化工程」ともいう）とを組合せて行うものであ
るが、交流電解粗面化工程を先に行ってから直流電解化
粗面化工程を後に行ってもよいし、その逆を行ってもよ
いし、またその組合せを繰り返えし行ってもよいし、さ
らに交流電解粗面化工程を２回行ってから直流電解粗面
化工程を行うようにしてもよく、直流電解粗面化工程を
２回行ってから交流電解粗面化工程を行うようにしても
よいが、同じ流れの電解粗面化工程を縁り返えすさいに
は、前の工程と後の工程とで電解条件を変えるのが好ま
しい。In the surface roughening treatment in the present invention, an electrolytic surface roughening process using an alternating current waveform (hereinafter also referred to as "AC electrolytic surface roughening process") and an electrolytic surface roughening process using a DC current waveform (hereinafter referred to as "DC electrolytic surface roughening process") Although the AC electrolytic surface roughening step may be performed first, the DC electrolytic surface roughening step may be performed afterwards, or vice versa. However, the combination may be repeated, or the AC electrolytic surface roughening step may be performed twice and then the DC electrolytic surface roughening step is performed, or the DC electrolytic surface roughening step may be performed. You may perform the AC electrolytic surface roughening process twice, but if you repeat the same electrolytic surface roughening process, change the electrolytic conditions between the previous process and the subsequent process. is preferable.
本発明において使用するに解浴としては、通常の電解エ
ツチングに用いられるものがいずれも使用できるが、と
くに塩化水素５〜５０ ｊｉ／ｌ含有する水溶液、硝酸
を５〜４００１！／ｌ含有する水溶液、または硫酸５０
〜４００９／ｌを含有する水溶液を使用するのが好まし
い。また電流密度は、１〜２００ ＡＡｍ２であること
が好ましい。電解時間は１組み合わせる各工程ごとに、
５〜９０秒間の範囲にあることが好ましく、粗面化処理
は３０〜８０℃の温度範囲の電解液中で実施される。As the bath solution used in the present invention, any of those used in ordinary electrolytic etching can be used, but in particular, an aqueous solution containing 5 to 50 ji/l of hydrogen chloride, and nitric acid containing 5 to 4,001 ji/l of hydrogen chloride. Aqueous solution containing /l or sulfuric acid 50
Preference is given to using an aqueous solution containing ˜4009/l. Further, the current density is preferably 1 to 200 AAm2. The electrolysis time is for each combined process.
Preferably, the time is in the range of 5 to 90 seconds, and the surface roughening treatment is carried out in an electrolytic solution at a temperature in the range of 30 to 80°C.
本発明方法によるアルミニウム板粗面化処理は、例えば
アルミニウム帯を複数の電解槽中に連続的に通過させる
ことによっておこなうことができるが、このとき電解槽
中のアルミニウム板に印加する電流波形は交番電流波形
、直流電流波形のいづれかを各電解僧ごとに選定し、こ
れを組み合わせて用いてよい。電解槽中の電解浴の組成
もこれと同様に組み合わせて用いることが可能である。The roughening treatment of an aluminum plate according to the method of the present invention can be carried out, for example, by passing the aluminum strip continuously through a plurality of electrolytic cells, but at this time, the current waveform applied to the aluminum plate in the electrolytic cells is alternating. Either the current waveform or the DC current waveform may be selected for each electrolyzer, and these may be used in combination. The compositions of the electrolytic baths in the electrolytic cell can also be used in combination in the same manner.
また、このようにして粗面化したアルミニウム板は、常
法に従い、酸またはアルカリにより軽度にエツチングし
た後、酸にてスマット除去をおこない、陽極酸化処理、
親水化処理を施してもよい。In addition, the aluminum plate whose surface has been roughened in this way is lightly etched with acid or alkali according to a conventional method, and then smut is removed with acid, anodized, and
Hydrophilic treatment may also be applied.
本発明によれば、ｉ１丁述したように、直流電解粗面化
工程と直流電解粗面化工程、直流電解粗面化工程と交流
電解粗面化工程；あるいは交流電解粗面化工程と交流電
解粗面化工程を組み合わせて２重構造的な凹凸を有する
表面形状を得た後、直流電解粗面化工程にて、ピットの
エツジ部分の溶解、ビ゛ット径の増大と大きさを整えろ
目的の処理をおこない、砂目深さのより深い均一かつち
密な２市構造的凹凸を有する砂目を電解処理て効率的に
イｌ）ることができる。According to the present invention, as described above, a DC electrolytic surface roughening process and a DC electrolytic surface roughening process, a DC electrolytic surface roughening process and an AC electrolytic surface roughening process; or an AC electrolytic surface roughening process and an AC electrolytic surface roughening process; After combining the electrolytic surface roughening process to obtain a surface shape with a double structure of unevenness, a DC electrolytic surface roughening process is performed to melt the edges of the pits and increase the diameter and size of the pits. By carrying out a treatment for the purpose of smoothing, it is possible to efficiently remove grains having deeper grain depths, uniform and dense structural irregularities by electrolytic treatment.
次に、実施例により本発明を具体的に説明するが、本発
明はこれらの実施例のみに限定されるものではない。Next, the present invention will be specifically explained with reference to Examples, but the present invention is not limited only to these Examples.
実施例１
アルミニウム板（材質１０５０−Ｈ２Ｓ、厚さ０３朋）
を苛性ソーダ溶液で脱脂洗浄した後、濃度１００ｇ／ｌ
、液温５０’Ｃの硝酸電解液を使用し、三相混合ブリ
ッジにて整流した直流電流を用い、アルミニウム板を陽
極として電流密度１００Ａ／ｄｍ２で４０秒間電電解面
化処理をおこなった。史に、濃度１１ｇ／ｌ液温４０℃
の硝酸電解液を使用し、誘導電圧≠整器を用いて電圧制
御した商用三相交流波形を用い、電流密度５０ Ａ／ｄ
ｍ２で加秒間電解粗面化処理をおこなった後水洗処理を
おこない更に濃度３００ｇ／ｌ。Example 1 Aluminum plate (material 1050-H2S, thickness 03 mm)
After degreasing and cleaning with caustic soda solution, the concentration was 100g/l.
Electrolytic surface treatment was carried out using a nitric acid electrolyte with a liquid temperature of 50'C, a direct current rectified by a three-phase mixed bridge, and a current density of 100 A/dm2 for 40 seconds using an aluminum plate as an anode. Historically, concentration 11g/l liquid temperature 40℃
Using a nitric acid electrolyte of
Electrolytic surface roughening treatment was performed at m2 for a second, followed by water washing treatment to obtain a concentration of 300 g/l.
液温７０℃の硫酸電解液中で三相混合ブリッジにて整流
した直流電流を用い電流密度５ Ａ／ａｍ２で８秒間ア
ルミニウム板を陽極とした電解処理をおこない硝酸電解
液中で生成したスマットの除去と電解粗面化処理にて生
じたピットのエツジ部分の鋭角部分の溶解、ピットの径
の増大と大きさを変える目的の処理を同時に行った。こ
の処理によって得られた粗面化アルミニウム板は平均表
面粗さ０．８μｍで、ピットの平均深さは１．０μｍで
あった。Electrolytic treatment was performed in a sulfuric acid electrolyte at a temperature of 70°C using a DC current rectified by a three-phase mixed bridge at a current density of 5 A/am2 for 8 seconds with an aluminum plate as an anode. At the same time, treatments were carried out to dissolve the sharp edges of the pits that were generated during the removal and electrolytic surface roughening treatment, and to increase the diameter and change the size of the pits. The roughened aluminum plate obtained by this treatment had an average surface roughness of 0.8 μm and an average pit depth of 1.0 μm.
次いで、債度２５０ｇ／′ｌ液温３５’Ｃの硫酸電解液
を用い、電流密度ＩＱ Ｖｄｍ２で（至）秒間直流によ
る陽極酸化処理を施し、水洗の後、濃度３チ、液温（イ
）℃のケイ酸ソーダ中に１０秒間侵潰した後に、水洗、
乾燥処理をおこなった。このようにして得られた粗面板
は、平均表面粗さ０８μｍで均一かつち密な二重構造的
凹凸を有するものであった。このようにして得られたア
ルミニウム粗面板に、ジアゾ系感光材を塗布し乾燥した
。得られた印刷版は保水性、耐刷性、ともに良好な優秀
な印刷版であった。Next, using a sulfuric acid electrolyte with a density of 250 g/'l and a liquid temperature of 35'C, anodization treatment was performed by direct current at a current density of IQ Vdm2 for (up to) seconds, and after washing with water, the concentration was 3C and the liquid temperature was (A). After crushing in sodium silicate at ℃ for 10 seconds, washing with water,
A drying process was performed. The roughened plate thus obtained had an average surface roughness of 08 μm and a uniform and dense double-structured unevenness. A diazo photosensitive material was applied to the rough aluminum plate thus obtained and dried. The obtained printing plate was an excellent printing plate with good water retention and printing durability.
実施例２
実施例１において最初におこなう硝酸電解液中の直流Ｎ
、流を印加する電解粗面化工程の処理時間を（イ）秒間
に変化させた以外は全（同様にして′１１工解粗面化処
理をおこなった。このようにして得られたアルミニウム
粗面板を用いて実施例１と同様に印刷版を製造したとこ
ろ、通電時間に比例した表面粗さと耐刷性能を有する優
秀な印刷版であった。Example 2 DC N in the nitric acid electrolyte initially performed in Example 1
The '11 electrolytic surface roughening treatment was carried out in the same manner except that the treatment time of the electrolytic surface roughening step in which a current was applied was changed to (a) seconds. When a printing plate was manufactured using the face plate in the same manner as in Example 1, it was an excellent printing plate with surface roughness and printing durability proportional to the current application time.
実施５１１３
アルミニウム板（材質１０５０−Ｈ２Ｓ、嵐さ０３朋）
を濃度１１１／ｌ液温４５℃の硝酸電解液を使用し、最
初に、誘導電圧調整器を用いて電圧制御した三相交流波
形を用い、電流密度５０ ＡＡｍ２で、４０秒間虞解徂
面化処理をおこなった後、前記電解浴と１Ｆｒｌじ条件
の電解浴を用い、誘導電圧Ｘ整器を用いて″Ｉ−６圧制
御した三相交流波形を用いて電流密度４ＯＡ／ｃ１ｍ２
で１０秒間電電解面化処理をおこなった後水洗処理をお
こなった。次に濃度３００９／１．液温７０℃の硫酸電
解夜中で、三相混合ブリッジにて金泥した直流電流を用
い、電流密度５ＩＶ／ｄｍ２で８秒間アルミニウム板を
陽極とした電解処理をおこない、硝酸電解液中で生成し
たスマットの除去と電解粗面化処理にて生じたピットの
エツジの鋭角部分の溶解、ビット径の増大と大きさを整
える目的の処理を同時におこなった。次いで、濃度２５
０９／１．液温あ℃の硫酸′電解液を用い、常流密度Ｉ
Ｑ Ａ／ｄｍ２で加秒間直流による陽極酸化処理を施し
、水洗の後、濃度３チ、液温ω℃のケイ酸ソーダ中に１
０秒間浸漬し、水洗、乾燥処理をおこなった。このよう
にして得られた粗面板は、平均表面粗さ０．８５μｍで
均一かつち密な二重構造的凹凸を有するものであった。Implementation 5113 Aluminum plate (Material 1050-H2S, Arashisa 03 Tomo)
Using a nitric acid electrolyte with a concentration of 111/l and a liquid temperature of 45°C, first, a dithering treatment was performed for 40 seconds at a current density of 50 AAm2 using a three-phase AC waveform whose voltage was controlled using an induction voltage regulator. After that, using an electrolytic bath under the same conditions as the electrolytic bath described above, and using a three-phase AC waveform controlled by the "I-6 pressure" using an induced voltage
After performing an electrolytic surface treatment for 10 seconds, a water washing treatment was performed. Next, the concentration is 3009/1. Sulfuric acid electrolysis with a liquid temperature of 70°C was carried out in the middle of the night using a gold-plated DC current in a three-phase mixed bridge at a current density of 5 IV/dm2 for 8 seconds with an aluminum plate as the anode, and the smut produced in the nitric acid electrolyte. At the same time, the removal of the pits, the dissolution of the sharp edges of the pits caused by the electrolytic surface roughening treatment, and the treatment aimed at increasing the bit diameter and adjusting the size were carried out at the same time. Then, concentration 25
09/1. Using a sulfuric acid electrolyte with a liquid temperature of ℃, the normal flow density I
After applying direct current anodization treatment at Q A/dm2 for a few seconds, and washing with water, 1.
It was immersed for 0 seconds, washed with water, and dried. The roughened plate thus obtained had an average surface roughness of 0.85 μm and a uniform and dense double-structured unevenness.
このようにして得られたアルミニウム粗面板にジアゾ系
感光材を塗布し、乾燥した。得られた印刷版は保水性、
耐刷性ともに良好な優秀な印刷版であった。A diazo-based photosensitive material was applied to the rough aluminum plate thus obtained and dried. The resulting printing plate has water retention,
It was an excellent printing plate with good printing durability.
実施例４
実施例３において最初におこなう硝酸電解液中の交ｔＪ
ｒｆ、′ｖｔ、流波形を印加する電解粗面化工程の処理
時間を（資）秒■」に変化させた以外は全く同様にして
電解粗面化処理をおこなった。このようにして得られた
アルミニウム粗面板を用いて実施例３と同様に印刷版を
製造したところ通電時間に比例した表面粗さと耐刷性能
を有する優秀な印刷版であった。Example 4 Exchange tJ in nitric acid electrolyte first performed in Example 3
The electrolytic surface roughening treatment was carried out in exactly the same manner except that the processing time of the electrolytic surface roughening step in which rf, 'vt, and flow waveforms were applied was changed to (2) seconds. When a printing plate was produced in the same manner as in Example 3 using the rough aluminum plate thus obtained, it was an excellent printing plate having surface roughness and printing durability proportional to the current application time.
本発明によれば、−回の処理では従来印刷性について実
用性があるものの、耐刷力において劣ることのあったｔ
解粗面化方法を用い、交＃、雷、解粗面化工程と直流電
解粗面化工程の両者を組み合わせて砂目深さのより深い
均一かつち密な２重嘴造的凹凸を有する砂目を有する表
面を得ることができた。According to the present invention, although conventionally, the -th treatment is practical in terms of printability, the printing durability is sometimes inferior.
Using the electrolytic roughening method, we combine both the AC #, lightning, electrolytic roughening process and the DC electrolytic roughening process to produce sand with uniform and dense double-beaked unevenness with deeper grain depth. A surface with eyes could be obtained.
この粗面化されたアルミニウム板を陽極酸化したものは
、印刷板として適する平均表面粗さを有し、均一でかつ
ち密な２重購造的凹凸を有するものであって、オフセッ
ト印刷に使用した場合印刷性について実用性があるばか
りでなく、耐刷性も優れている。This roughened aluminum plate, which has been anodized, has an average surface roughness suitable for printing plates, and has uniform and dense double-layered unevenness, and is suitable for use in offset printing. Not only is it practical in terms of printability, but it also has excellent printing durability.
また、その凹凸形状も各粗面化工程における電解条件を
適当に選定することにより任意に調整することかできる
ので、印刷性能及び耐刷性の両者をその印刷目的に適合
するものとすることができる。In addition, the shape of the unevenness can be adjusted arbitrarily by appropriately selecting the electrolytic conditions in each roughening process, so that both printing performance and printing durability can be matched to the printing purpose. can.
第１図は、交番電流波形として得られる電流の電圧波形
図である。
ａ：正弦波
ｂ＝サイン波をサイタリスで位相角制御した波形
Ｃ：矩形波
第２図は、直流電流波形として得られる電流の電圧波形
図である。
ａ：全波整流波形
ｂ＝断続直流波形
Ｃ：連続直流波形
１・ぐ二゛。
代理人 弁理士（８１０７）佐々木 清 隆゛（ほか３
名）FIG. 1 is a voltage waveform diagram of a current obtained as an alternating current waveform. a: sine wave b = waveform obtained by controlling the phase angle of a sine wave with a citalis C: rectangular wave FIG. 2 is a voltage waveform diagram of a current obtained as a DC current waveform. a: Full-wave rectified waveform b = Intermittent DC waveform C: Continuous DC waveform 1/2. Agent: Patent attorney (8107) Kiyoshi Sasaki (and 3 others)
given name)
Claims (4)
いて電解粗面化する工程と直流電流波形を用いて電解粗
面化する工程とを組み合わせて粗面化処理をすることを
特徴とする印刷版用支持体の製造方法。(1) The aluminum plate is subjected to surface roughening treatment in an electrolytic bath by combining a process of electrolytically roughening using an alternating current waveform and a process of electrolytically roughening using a DC current waveform. A method for producing a support for a printing plate.
溶液、硝酸５〜４００ｇ／ｌを含有する水溶液、又は硫
酸５０〜４００ｇ／ｌを含有する水溶液であることを特
徴とする特許請求の範囲第１項記載の印刷版用支持体の
製造方法。(2) A patent claim characterized in that the electrolytic bath is an aqueous solution containing 5 to 50 g/l of hydrogen chloride, 5 to 400 g/l of nitric acid, or 50 to 400 g/l of sulfuric acid. A method for producing a printing plate support according to item 1.
ｍ＾２であることを特徴とする特許請求の範囲第１項又
は第２項記載の印刷版用支持体の製造方法。(3) Current density in electrolytic surface roughening is 1 to 200 A/d
The method for producing a support for a printing plate according to claim 1 or 2, characterized in that the particle size is m^2.
で陽極酸化処理をして凹凸を有する陽極酸化皮膜を形成
することを特徴とする特許請求の範囲第１、２又は３項
記載の印刷版用支持体の製造方法。(4) Claim 1, 2 or 3, characterized in that an aluminum plate subjected to electrolytic roughening is anodized in a sulfuric acid electrolyte to form an anodic oxide film having irregularities. A method for producing a support for a printing plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP832487A JPS63176187A (en) | 1987-01-19 | 1987-01-19 | Manufacture of base material for printing form plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP832487A JPS63176187A (en) | 1987-01-19 | 1987-01-19 | Manufacture of base material for printing form plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63176187A true JPS63176187A (en) | 1988-07-20 |
Family
ID=11689996
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP832487A Pending JPS63176187A (en) | 1987-01-19 | 1987-01-19 | Manufacture of base material for printing form plate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63176187A (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0379800A (en) * | 1989-08-21 | 1991-04-04 | Fuji Photo Film Co Ltd | Electrolytic treating method |
| EP1013468A1 (en) * | 1998-12-21 | 2000-06-28 | Agfa-Gevaert AG | Method and apparatus for roughening the surface of a support for light-sensistive coating |
| EP1712368A1 (en) | 2005-04-13 | 2006-10-18 | Fuji Photo Film Co., Ltd. | Method of manufacturing a support for a lithographic printing plate |
| EP2100677A1 (en) | 2008-03-06 | 2009-09-16 | Fujifilm Corporation | Method of manufacturing aluminum alloy plate for lithographic printing plate, aluminum alloy plate for lithographic printing plate obtained thereby and lithographic printing plate support |
| WO2010150810A1 (en) | 2009-06-26 | 2010-12-29 | 富士フイルム株式会社 | Light reflecting substrate and process for manufacture thereof |
| WO2011037005A1 (en) | 2009-09-24 | 2011-03-31 | 富士フイルム株式会社 | Lithographic printing original plate |
| EP2384100A2 (en) | 2010-04-28 | 2011-11-02 | Fujifilm Corporation | Insulated light-reflective substrate |
| EP2586621A1 (en) | 2011-10-28 | 2013-05-01 | Fujifilm Corporation | Manufacturing method and manufacturing apparatus of support for planographic printing plate |
| WO2018235659A1 (en) | 2017-06-21 | 2018-12-27 | 富士フイルム株式会社 | Composite aluminum material |
-
1987
- 1987-01-19 JP JP832487A patent/JPS63176187A/en active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0379800A (en) * | 1989-08-21 | 1991-04-04 | Fuji Photo Film Co Ltd | Electrolytic treating method |
| EP1013468A1 (en) * | 1998-12-21 | 2000-06-28 | Agfa-Gevaert AG | Method and apparatus for roughening the surface of a support for light-sensistive coating |
| EP1712368A1 (en) | 2005-04-13 | 2006-10-18 | Fuji Photo Film Co., Ltd. | Method of manufacturing a support for a lithographic printing plate |
| EP2100677A1 (en) | 2008-03-06 | 2009-09-16 | Fujifilm Corporation | Method of manufacturing aluminum alloy plate for lithographic printing plate, aluminum alloy plate for lithographic printing plate obtained thereby and lithographic printing plate support |
| WO2010150810A1 (en) | 2009-06-26 | 2010-12-29 | 富士フイルム株式会社 | Light reflecting substrate and process for manufacture thereof |
| WO2011037005A1 (en) | 2009-09-24 | 2011-03-31 | 富士フイルム株式会社 | Lithographic printing original plate |
| EP2384100A2 (en) | 2010-04-28 | 2011-11-02 | Fujifilm Corporation | Insulated light-reflective substrate |
| EP2586621A1 (en) | 2011-10-28 | 2013-05-01 | Fujifilm Corporation | Manufacturing method and manufacturing apparatus of support for planographic printing plate |
| WO2018235659A1 (en) | 2017-06-21 | 2018-12-27 | 富士フイルム株式会社 | Composite aluminum material |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4902389A (en) | Process for producing aluminum support for printing plate | |
| JPS63176187A (en) | Manufacture of base material for printing form plate | |
| JPH0729507B2 (en) | Method for producing aluminum support for printing plate | |
| US5152877A (en) | Method for producing support for printing plate | |
| JPS585795B2 (en) | Manufacturing method of rough aluminum plate for offset printing | |
| JPH01118489A (en) | Method of manufacturing aluminum support for print | |
| JPH01249494A (en) | Production of aluminum base for printing plate | |
| JPH03257199A (en) | Production of aluminum base for printing plate | |
| JP3738940B2 (en) | Method for producing aluminum support for lithographic printing plate for calibration | |
| JP3695618B2 (en) | Method for producing aluminum support for lithographic printing plate | |
| JPS585796B2 (en) | Manufacturing method of rough aluminum plate for offset printing | |
| JP3817006B2 (en) | Method for producing support for lithographic printing plate | |
| JPS6312159B2 (en) | ||
| JPS58147592A (en) | Method for pigmenting aluminum or aluminum alloy | |
| JP3717025B2 (en) | Method for producing aluminum support for lithographic printing plate | |
| JP3599210B2 (en) | Method for producing aluminum support for lithographic printing plate | |
| JPH10183400A (en) | Surface roughening method for aluminum plate | |
| JPS63307990A (en) | Production of base for printing plate | |
| JPH03173800A (en) | Production of substrate for printing plate | |
| JPH10130897A (en) | Aluminum plate and its surface roughening method | |
| JP2945502B2 (en) | Continuous electrolytic surface roughening method of aluminum support for offset printing plate | |
| JP2707339B2 (en) | Method for producing a lithographic printing plate support | |
| JPH0798427B2 (en) | Method for producing aluminum support for printing plate | |
| JPH10251900A (en) | Method for surface roughening aluminum sheet | |
| JPH03191100A (en) | Production of support for printing plate |